Time type rapid coating atomic layer deposition device

Abstract

The invention belongs to the technical field of atomic layer deposition, and relates to a time type rapid coating atomic layer deposition device which comprises a transportation assembly, a first heating assembly, a second heating assembly, a first reaction assembly, a second reaction assembly, a precursor conveying assembly, a first extraction assembly and a second extraction assembly. The time type rapid coating atomic layer deposition device provided by the invention is provided with the heat preservation cavity specially used for sample heat preservation and the process cavity used for depositing the thin film, so that the time required by heating the sample to the growth temperature of the thin film is saved, the production efficiency is improved, and a rapid coating process can be realized; and meanwhile, the method has the advantages of low cost, high efficiency and stable production.

Description

Technical Field

[0001] The present invention relates to the technical field of atomic layer deposition, and in particular to a time-type rapid film-plating atomic layer deposition device. Background Art

[0002] Atomic layer deposition is a method that can deposit materials layer by layer on the surface of a substrate in the form of a single atomic film. However, during the atomic layer deposition process, the chemical reaction of the new layer of atomic film is directly related to the previous layer, so that only one layer of atoms is deposited each time the reaction occurs.

[0003] The film layer made by the atomic layer deposition process has the advantages of high purity and good uniformity, so the atomic layer deposition process is widely used in various fields. Atomic layer deposition is a method of forming a deposited film by alternately passing gas phase precursor pulses into the reactor and chemically adsorbing and reacting on the deposition substrate. When the precursors reach the surface of the deposition substrate, they will chemically adsorb on its surface and react on the surface. The atomic layer deposition reactor needs to be cleaned with an inert gas between the precursor pulses.

[0004] Conventional ALD (atomic layer deposition) technology is mostly used on small-sized flat samples. It started late in the preparation of large-sized thin film materials and lacks experience. In practical applications, large-sized thin film ALD equipment is an industrialized equipment, and production efficiency and film quality are crucial. Due to the characteristics of ALD, the film deposition rate is slower than other thin film deposition methods, and the expected production cycle cannot be achieved in industrial applications. Summary of the invention

[0005] In view of this, the present invention provides a time-based rapid film-coating atomic layer deposition device.

[0006] Specifically, the present invention is achieved through the following technical solutions:

[0007] According to a first aspect of the present invention, there is provided a time-based rapid film-coating atomic layer deposition device, comprising:

[0008] A transport assembly for transporting samples;

[0009] A first heating component is used to provide a preheating space; the first heating component at least partially wraps the transport component;

[0010] A second heating component, used for providing a preheating space; the second heating component is connected to the first heating component and at least partially wraps the transport component;

[0011] A first reaction component is used to provide a reaction space; the first reaction component is connected to the second heating component and at least partially wraps the transport component;

[0012] A second reaction component, used to provide a reaction space; the second reaction component is connected to the first reaction component and at least partially wraps the transport component;

[0013] A precursor delivery component, used for delivering precursors to the first reaction component and the second reaction component; the precursor delivery component is connected to the first reaction component and the second reaction component respectively;

[0014] A first extraction component, used to form a vacuum in the first heating component and the second heating component; the first extraction component is connected to the first heating component and the second heating component respectively;

[0015] The second extraction component is used to form a vacuum in the first reaction component and the second reaction component; the first extraction component is connected to the first reaction component and the second reaction component respectively.

[0016] Optionally, the transport component includes: a conveyor belt, a conveyor wheel and a drive motor, wherein both ends of the conveyor belt are wrapped around the conveyor wheels on corresponding sides, the conveyor wheels are rotatably connected to the drive motor, and the conveyor belt passes through the internal spaces of the first heating component, the second heating component, the first reaction component and the second reaction component in sequence.

[0017] Optionally, the first heating component includes: a first heating chamber, a first heater and a first gate valve, wherein the conveyor belt in the transport component passes through the openings at both ends of the first heating chamber in sequence and enters the internal space of the second heating component, the first heater is arranged on the inner wall of the first heating chamber, the first gate valve is arranged at the opening at the first end of the first heating chamber, and the opening at the second end of the first heating chamber is connected to the internal space of the second heating component.

[0018] Optionally, the second heating component includes: a second heating chamber, a second heater and a second gate valve, wherein the conveyor belt in the transport component passes through the two end openings of the second heating chamber in sequence and enters the internal space of the first reaction component, the second heater is arranged on the inner wall of the second heating chamber, the second gate valve is arranged between the second end opening of the first heating chamber in the first heating component and the first end opening of the second heating chamber, and the second end opening of the second heating chamber is connected to the internal space of the first reaction component.

[0019] Optionally, the first reaction component includes: a first reaction chamber, a third heater and a third gate valve, wherein the conveyor belt in the transport component passes through the two end openings of the first reaction chamber in sequence and enters the internal space of the second reaction component, the third heater is arranged on the inner wall of the first reaction chamber, and the third gate valve is arranged between the second end opening of the second heating chamber in the second heating component and the first end opening of the first reaction chamber, and the second end opening of the first reaction chamber is connected to the internal space of the second reaction component.

[0020] Optionally, the second reaction component includes: a second reaction chamber, a fourth heater, a fourth gate valve and a fifth gate valve, wherein the conveyor belt in the transport component passes through the two end openings of the second reaction chamber in sequence, the fourth heater is arranged on the inner wall of the second reaction chamber, the fourth gate valve is arranged between the second end opening of the second heating chamber in the second heating component and the first end opening of the first reaction chamber, and the fifth gate valve is arranged at the second end opening of the second reaction chamber.

[0021] Optionally, the precursor delivery component includes: a precursor source bottle, a source inlet pipeline, a first source inlet valve and a second source inlet valve, wherein the precursor source bottle is connected to the first reaction chamber in the first reaction component and the second reaction chamber in the second reaction component respectively through the source inlet pipeline, the first source inlet valve is arranged on the source inlet pipeline between the precursor source bottle and the first reaction chamber, and the second source inlet valve is arranged on the source inlet pipeline between the precursor source bottle and the second reaction chamber.

[0022] Optionally, the first extraction component includes: a first fore-stage valve, a second fore-stage valve and a first vacuum pump, wherein the first vacuum pump is respectively connected to the first heating chamber in the first heating component and the second heating chamber in the second heating component, the first fore-stage valve is arranged on the pipeline between the first heating chamber and the first vacuum pump, and the second fore-stage valve is arranged on the pipeline between the second heating chamber and the first vacuum pump.

[0023] Optionally, the second extraction component includes: a third fore-stage valve, a fourth fore-stage valve and a second vacuum pump, wherein the second vacuum pump is respectively connected to the first reaction chamber in the first reaction component and the second reaction chamber in the second reaction component, the third fore-stage valve is arranged on the pipeline between the first reaction chamber and the second vacuum pump, and the fourth fore-stage valve is arranged on the pipeline between the second reaction chamber and the first vacuum pump.

[0024] Optionally, a sample tray is disposed in the first heating chamber in the first heating assembly and the second heating chamber in the second heating assembly.

[0025] The technical solution provided by the present invention brings at least the following beneficial effects:

[0026] The present application provides a time-type rapid film-coating atomic layer deposition device, which is provided with a heat preservation chamber specially used for sample heat preservation and a process chamber for depositing thin films, thereby saving the time required for heating the sample to the film growth temperature, improving production efficiency, and realizing a rapid film-coating process; at the same time, it has the advantages of low cost, high efficiency and stable production. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments consistent with the invention and, together with the description, serve to explain the principles of the invention.

[0028] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or related technical descriptions are briefly introduced below. Obviously, for ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative labor.

[0029] Figure 1 A schematic structural diagram of a time-based rapid film-coating atomic layer deposition device provided in an embodiment of the present invention. DETAILED DESCRIPTION

[0030] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0031] Figure 1 A time-based rapid film-coating atomic layer deposition device suitable for an embodiment of the present invention is schematically shown.

[0032] Reference Figure 1 As shown, the present application provides a time-type rapid film-coating atomic layer deposition device, comprising:

[0033] A transport assembly for transporting samples;

[0034] A first heating component is used to provide a preheating space; the first heating component at least partially wraps the transport component;

[0035] A second heating component, used for providing a preheating space; the second heating component is connected to the first heating component and at least partially wraps the transport component;

[0036] A first reaction component is used to provide a reaction space; the first reaction component is connected to the second heating component and at least partially wraps the transport component;

[0037] A second reaction component, used to provide a reaction space; the second reaction component is connected to the first reaction component and at least partially wraps the transport component;

[0038] A precursor delivery component, used for delivering precursors to the first reaction component and the second reaction component; the precursor delivery component is connected to the first reaction component and the second reaction component respectively;

[0039] A first extraction component, used to form a vacuum in the first heating component and the second heating component; the first extraction component is connected to the first heating component and the second heating component respectively;

[0040] The second extraction component is used to form a vacuum in the first reaction component and the second reaction component; the first extraction component is connected to the first reaction component and the second reaction component respectively.

[0041] In the embodiment of the present application, the transport component can transport the sample to the internal space of the first heating component, the second heating component, the first reaction component and the second reaction component in sequence, the first heating component and the second heating component can heat the sample in sequence, and the first extraction component vacuumizes the internal space of the first heating component and the second heating component respectively, after the heating of the sample is completed, the transport component can transport the sample from the second heating component to the first reaction component and the second reaction component in sequence, and the second extraction component vacuumizes the internal space of the first reaction component and the second reaction component respectively, the precursor delivery component alternately delivers the precursor material to the first reaction component and the second reaction component respectively, and reacts with the sample to obtain a product, and then the product is output by the transport component. This efficient and ingeniously designed time-type rapid film-coating atomic layer deposition (ALD) device significantly improves the coating efficiency by optimizing the structure and process, and maintains the economy and stability of production.

[0042] Transport component: Responsible for the precise and rapid movement of the sample to be coated within the device. It may be automated or mechanized to ensure that the sample is quickly and accurately transferred between the heating, reaction and extraction steps.

[0043] The first heating assembly and the second heating assembly are used to preheat and precisely control the sample to reach the temperature required for thin film growth. Rapid heating reduces the time required to heat up to the target temperature, thereby improving production efficiency.

[0044] The first reaction component and the second reaction component provide the chemical reaction environment required for thin film deposition. By precisely controlling the reaction conditions (such as temperature, pressure, precursor concentration, etc.), high-quality growth of the thin film is ensured.

[0045] Precursor delivery component: responsible for delivering precursor gas (or liquid) into the reaction chamber to react chemically with the sample surface. Precisely control the delivery amount and speed of the precursor to optimize the growth process of the thin film.

[0046] The first extraction component and the second extraction component are responsible for extracting the unreacted precursors and by-products from the reaction chamber after the reaction is completed. Keep the reaction chamber clean and stable to prepare for the next round of coating process.

[0047] Insulation chamber and process chamber: The insulation chamber is used to preheat and keep the sample warm before coating to reduce the heating time. The process chamber is the main area for thin film deposition and has the ability to accurately control the reaction conditions.

[0048] Technical advantages: Efficient production: Rapid heating and precise control of reaction conditions significantly shorten the coating cycle and improve production efficiency. Low cost: Optimized design and efficient coating process reduce energy consumption and material waste, thereby reducing production costs. Stability: Precise control system and efficient extraction components ensure the stability and repeatability of the coating process and improve product quality. Flexibility: The device can adapt to the deposition requirements of different materials and thin films of different thicknesses, and has a wide range of application prospects.

[0049] Exemplarily, the transport component includes: a conveyor belt 1, a conveyor wheel and a drive motor, wherein both ends of the conveyor belt 1 are wrapped around the conveyor wheels on corresponding sides, the conveyor wheels are rotatably connected to the drive motor, and the conveyor belt 1 passes through the internal spaces of the first heating component, the second heating component, the first reaction component and the second reaction component in sequence.

[0050] In the embodiment of the present application, after the driving motor is started, it drives the conveying wheels on both sides to rotate, and the conveyor belt 1 wrapped around the conveying wheels on both sides passes through the internal spaces of the first heating component, the second heating component, the first reaction component and the second reaction component in sequence, thereby completing the transportation of the sample.

[0051] Exemplarily, the first heating component includes: a first heating chamber 61, a first heater 71 and a first gate valve 21, wherein the conveyor belt 1 in the transport component passes through the openings at both ends of the first heating chamber 61 in sequence and enters the internal space of the second heating component, the first heater 71 is arranged on the inner wall of the first heating chamber 61, the first gate valve 21 is arranged at the opening at the first end of the first heating chamber 61, and the opening at the second end of the first heating chamber 61 is connected to the internal space of the second heating component.

[0052] In the embodiment of the present application, the first gate valve 21 is used to isolate the outside and the first heating chamber 61 , and when the sample is transported to the internal space of the first heating chamber 61 , the first heater 71 heats the sample.

[0053] Exemplarily, the second heating component includes: a second heating chamber 62, a second heater 72 and a second gate valve 22, wherein the conveyor belt 1 in the transport component passes through the openings at both ends of the second heating chamber 62 in sequence and enters the internal space of the first reaction component, the second heater 72 is arranged on the inner wall of the second heating chamber 62, the second gate valve 22 is arranged between the second end opening of the first heating chamber 61 in the first heating component and the first end opening of the second heating chamber 62, and the second end opening of the second heating chamber 62 is connected to the internal space of the first reaction component.

[0054] In the embodiment of the present application, the second gate valve 22 is used to separate the first heating chamber 61 and the second heating chamber 62 . When the sample is transported to the inner space of the second heating chamber 62 , the second heater 72 heats the sample.

[0055] Exemplarily, the first reaction component includes: a first reaction chamber 63, a third heater 73 and a third gate valve 23, wherein the conveyor belt 1 in the transport component passes through the two end openings of the first reaction chamber 63 in sequence and enters the internal space of the second reaction component, the third heater 73 is arranged on the inner wall of the first reaction chamber 63, and the third gate valve 23 is arranged between the second end opening of the second heating chamber 62 in the second heating component and the first end opening of the first reaction chamber 63, and the second end opening of the first reaction chamber 63 is connected to the internal space of the second reaction component.

[0056] In the embodiment of the present application, the third gate valve 23 is used to separate the first reaction chamber 63 and the second heating chamber 62. When the sample is transported to the internal space of the first reaction chamber 63, the precursor material is also transported into the first reaction chamber 63. The third heater 73 heats the sample and the precursor material to obtain a product after the reaction.

[0057] Exemplarily, the second reaction component includes: a second reaction chamber 64, a fourth heater 74, a fourth gate valve 24 and a fifth gate valve 25, wherein the conveyor belt 1 in the transport component passes through the two end openings of the second reaction chamber 64 in sequence, the fourth heater 74 is arranged on the inner wall of the second reaction chamber 64, the fourth gate valve 24 is arranged between the second end opening of the second heating chamber 62 in the second heating component and the first end opening of the first reaction chamber 63, and the fifth gate valve 25 is arranged at the second end opening of the second reaction chamber 64.

[0058] In the embodiment of the present application, the fourth gate valve 24 is used to isolate the first reaction chamber 63 and the second heating chamber 62, and the fifth gate valve 25 is used to isolate the outside and the second heating chamber 62. When the sample is transported to the inner space of the second reaction chamber 64, the precursor material is transported to the second reaction chamber 64. Since there is a possibility that some raw materials are not fully reacted in the first reaction chamber 63, these raw materials can be heated by the third heater 73 in the second heating chamber 62 to obtain products after reaction. , and are output by the conveyor belt 1.

[0059] Exemplarily, the precursor delivery component includes: a precursor source bottle 8, a source inlet pipeline 9, a first source inlet valve 45 and a second source inlet valve 46, wherein the precursor source bottle 8 is connected to the first reaction chamber 63 in the first reaction component and the second reaction chamber 64 in the second reaction component through the source inlet pipeline 9, respectively, the first source inlet valve 45 is arranged on the source inlet pipeline 9 between the precursor source bottle 8 and the first reaction chamber 63, and the second source inlet valve 46 is arranged on the source inlet pipeline 9 between the precursor source bottle 8 and the second reaction chamber 64.

[0060] In the embodiment of the present application, the precursor material is stored in the precursor source bottle 8, and the precursor material is transmitted to the first reaction chamber 63 and the second reaction chamber 64 respectively through the source inlet pipeline 9. The first source inlet valve 45 is used to control the precursor material entering the first reaction chamber 63, and the second source inlet valve 46 is used to control the precursor material entering the second reaction chamber 64.

[0061] Exemplarily, the first extraction component includes: a first fore-stage valve 41, a second fore-stage valve 42 and a first vacuum pump 51, wherein the first vacuum pump 51 is respectively connected to a first heating chamber 61 in the first heating component and a second heating chamber 62 in the second heating component, the first fore-stage valve 41 is arranged on a pipeline between the first heating chamber 61 and the first vacuum pump 51, and the second fore-stage valve 42 is arranged on a pipeline between the second heating chamber 62 and the first vacuum pump 51.

[0062] In the embodiment of the present application, the first vacuum pump 51 performs a vacuum operation on the internal space of the first heating chamber 61 and the second heating chamber 62 through a pipeline, the first front-stage valve 41 is used to open and close the connection between the first vacuum pump 51 and the first heating chamber 61, and the second front-stage valve 42 is used to open and close the connection between the first vacuum pump 51 and the second heating chamber 62.

[0063] Exemplarily, the second extraction component includes: a third fore-stage valve 43, a fourth fore-stage valve 44 and a second vacuum pump 52, wherein the second vacuum pump 52 is respectively connected to the first reaction chamber 63 in the first reaction component and the second reaction chamber 64 in the second reaction component, the third fore-stage valve 43 is arranged on the pipeline between the first reaction chamber 63 and the second vacuum pump 52, and the fourth fore-stage valve 44 is arranged on the pipeline between the second reaction chamber 64 and the first vacuum pump 51.

[0064] In the embodiment of the present application, the second vacuum pump 52 performs a vacuum operation on the internal space of the first reaction chamber 63 and the second reaction chamber 64 through a pipeline, the third front-stage valve 43 is used to open and close the connection between the second vacuum pump 52 and the first reaction chamber 63, and the fourth front-stage valve 44 is used to open and close the connection between the second vacuum pump 52 and the second reaction chamber 64.

[0065] Exemplarily, a sample tray 3 is disposed in both the first heating chamber 61 in the first heating assembly and the second heating chamber 62 in the second heating assembly.

[0066] In the embodiment of the present application, the sample tray 3 is used to receive the sample transmitted by the conveyor belt 1 .

[0067] The time-type fast film-coating atomic layer deposition device provided by the present application deposits thin films by alternately introducing precursor sources to react in the reaction chamber. Compared with the space-type ALD equipment, the thin films prepared by the time-type fast film-coating atomic layer deposition device provided by the present application are more dense, and the performance of the thin films in various aspects is better, which can achieve the purpose of preparing high-quality thin films. In view of the slow deposition rate of the time-type ALD, the time-type fast film-coating atomic layer deposition device provided by the present application is provided with a heat preservation chamber specially used for sample heat preservation and a process chamber for depositing thin films, which saves the time required for the sample to be heated to the film growth temperature, improves production efficiency, and can realize a fast film coating process.

[0068] Comprehensive analysis of the time-based rapid film-coating atomic layer deposition device provided in the embodiment of the present application:

[0069] 1. Detailed explanation of device structure and function

[0070] (1) Transport components

[0071] Conveyor belt 1: As the main conveying tool for samples, it is wound on the conveyor wheel and driven by the drive motor to achieve continuous or intermittent conveying of samples. The conveyor wheel and the drive motor work together to ensure the smooth and accurate movement of the conveyor belt 1.

[0072] (2) Heating component

[0073] First heating assembly: First heating chamber 61: A first heater 71 is arranged inside for preliminary heating of the sample. First gate valve 21: Controls the inlet of the first heating chamber 61 to ensure sealing during the heating process.

[0074] Second heating assembly: Second heating chamber 62: A second heater 72 is provided inside for further heating the sample to a temperature required for thin film growth. Second gate valve 22: Separates the first heating chamber 61 from the second heating chamber 62 to ensure the independence of the heating process.

[0075] (3) React Components

[0076] First reaction assembly: First reaction chamber 63: A third heater 73 is provided inside, which is used to react chemically with the sample in the presence of the precursor material. Third gate valve 23: Separates the first reaction chamber 63 and the second heating chamber 62 to ensure the independence of the reaction process.

[0077] Second reaction assembly: Second reaction chamber 64: A fourth heater 74 is provided inside for further reaction of possible incompletely reacted precursor materials with samples. Fourth gate valve 24 (the description here is incorrect, it should be located between the first reaction chamber 63 and the second reaction chamber 64) and fifth gate valve 25: respectively control the inlet and outlet of the second reaction chamber 64 to ensure the sealing and independence of the reaction process. However, please note that according to the description, the position of the fourth gate valve 24 is incorrectly described. It should be located at the connection between the first reaction chamber 63 and the second reaction chamber 64, not between the second heating chamber 62 and the second reaction chamber 64.

[0078] (4) Precursor delivery components

[0079] Precursor source bottle 8: for storing precursor materials.

[0080] The source inlet pipeline 9, the first source inlet valve 45 and the second source inlet valve 46 respectively control the flow rate and timing of the precursor material entering the first reaction chamber 63 and the second reaction chamber 64.

[0081] (5) Extracting components

[0082] The first extraction component includes a first front-stage valve 41, a second front-stage valve 42 and a first vacuum pump 51, and is used to extract the gas in the heating chamber to maintain a clean environment before the reaction.

[0083] The second extraction component includes a third fore-stage valve 43, a fourth fore-stage valve 44 and a second vacuum pump 52, and is used to extract the reaction products and unreacted precursors in the reaction chamber to ensure the continuity and efficiency of the reaction process.

[0084] (6) Sample tray 3: arranged in the heating chamber, used to receive and support the sample.

[0085] The present application provides a time-type rapid film-coating atomic layer deposition device, which is provided with a heat preservation chamber specially used for sample heat preservation and a process chamber for depositing thin films, thereby saving the time required for heating the sample to the film growth temperature, improving production efficiency, and realizing a rapid film-coating process; at the same time, it has the advantages of low cost, high efficiency and stable production.

[0086] It should be noted that, in the present application, the terms "upper", "lower", "left", "right", "front", "back", "top", "bottom", "inner", "outer", "vertical", "horizontal", "lateral", "longitudinal" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the drawings. These terms are mainly used to better describe the present application and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific orientation, or to be constructed and operated in a specific orientation.

[0087] In addition, some of the above terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in this application can be understood according to specific circumstances.

[0088] In addition, the terms "installed", "set", "provided with", "connected", and "connected" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection, or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, elements, or components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0089] In addition, the terms "first", "second", etc. are mainly used to distinguish different devices, elements or components (the specific types and structures may be the same or different), and are not used to indicate or imply the relative importance and quantity of the indicated devices, elements or components. Unless otherwise specified, "plurality" means two or more.

[0090] The foregoing is merely a specific embodiment of the present invention, which enables those skilled in the art to understand or implement the present invention. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present invention. Therefore, the present invention will not be limited to the embodiments shown herein, but rather to the widest scope consistent with the principles and novel features claimed herein.

Claims

1. A time-based rapid film-coating atomic layer deposition device, characterized in that: include: A transport assembly for transporting samples; A first heating component, used to provide a preheating space; The first heating assembly at least partially wraps the transport assembly; A second heating component, used for providing a preheating space; the second heating component is connected to the first heating component and at least partially wraps the transport component; A first reaction component is used to provide a reaction space; the first reaction component is connected to the second heating component and at least partially wraps the transport component; A second reaction component, used to provide a reaction space; the second reaction component is connected to the first reaction component and at least partially wraps the transport component; A precursor delivery component, used for delivering precursors to the first reaction component and the second reaction component; the precursor delivery component is connected to the first reaction component and the second reaction component respectively; A first extraction component, used to form a vacuum in the first heating component and the second heating component; the first extraction component is connected to the first heating component and the second heating component respectively; The second extraction component is used to form a vacuum in the first reaction component and the second reaction component; the first extraction component is connected to the first reaction component and the second reaction component respectively.

2. The time-based rapid film-coating atomic layer deposition device according to claim 1 is characterized in that: The transport component includes: a conveyor belt, a conveyor wheel and a drive motor, wherein two ends of the conveyor belt are wound around the conveyor wheels on corresponding sides, the conveyor wheels are rotatably connected to the drive motor, and the conveyor belt passes through the internal spaces of the first heating component, the second heating component, the first reaction component and the second reaction component in sequence.

3. The time-based rapid film-coating atomic layer deposition device according to claim 1 is characterized in that: The first heating component includes: a first heating chamber, a first heater and a first gate valve, wherein the conveyor belt in the transport component passes through the openings at both ends of the first heating chamber in sequence and enters the internal space of the second heating component, the first heater is arranged on the inner wall of the first heating chamber, the first gate valve is arranged at the opening at the first end of the first heating chamber, and the opening at the second end of the first heating chamber is connected to the internal space of the second heating component.

4. The time-based rapid film-coating atomic layer deposition device according to claim 1, characterized in that: The second heating component includes: a second heating chamber, a second heater and a second gate valve, wherein the conveyor belt in the transport component passes through the two end openings of the second heating chamber in sequence and enters the internal space of the first reaction component, the second heater is arranged on the inner wall of the second heating chamber, the second gate valve is arranged between the second end opening of the first heating chamber in the first heating component and the first end opening of the second heating chamber, and the second end opening of the second heating chamber is connected to the internal space of the first reaction component.

5. The time-based rapid film-coating atomic layer deposition device according to claim 1, characterized in that: The first reaction component includes: a first reaction chamber, a third heater and a third gate valve, wherein the conveyor belt in the transport component passes through the openings at both ends of the first reaction chamber in sequence and enters the inner space of the second reaction component, the third heater is arranged on the inner wall of the first reaction chamber, and the third gate valve is arranged between the second end opening of the second heating chamber in the second heating component and the opening of the first end of the first reaction chamber, and the opening at the second end of the first reaction chamber is connected to the inner space of the second reaction component.

6. The time-based rapid film-coating atomic layer deposition device according to claim 1, characterized in that: The second reaction component includes: a second reaction chamber, a fourth heater, a fourth gate valve and a fifth gate valve, wherein the conveyor belt in the transport component passes through the two end openings of the second reaction chamber in sequence, the fourth heater is arranged on the inner wall of the second reaction chamber, the fourth gate valve is arranged between the second end opening of the second heating chamber in the second heating component and the first end opening of the first reaction chamber, and the fifth gate valve is arranged at the second end opening of the second reaction chamber.

7. The time-based rapid film-coating atomic layer deposition device according to claim 1, characterized in that: The precursor delivery component includes: a precursor source bottle, a source inlet pipeline, a first source inlet valve and a second source inlet valve, wherein the precursor source bottle is connected to the first reaction chamber in the first reaction component and the second reaction chamber in the second reaction component through the source inlet pipeline, respectively, the first source inlet valve is arranged on the source inlet pipeline between the precursor source bottle and the first reaction chamber, and the second source inlet valve is arranged on the source inlet pipeline between the precursor source bottle and the second reaction chamber.

8. The time-based rapid film-coating atomic layer deposition device according to claim 1, characterized in that: The first extraction component includes: a first fore-stage valve, a second fore-stage valve and a first vacuum pump, wherein the first vacuum pump is respectively connected to the first heating chamber in the first heating component and the second heating chamber in the second heating component, the first fore-stage valve is arranged on the pipeline between the first heating chamber and the first vacuum pump, and the second fore-stage valve is arranged on the pipeline between the second heating chamber and the first vacuum pump.

9. The time-based rapid film-coating atomic layer deposition device according to claim 1, characterized in that: The second extraction component includes: a third fore-stage valve, a fourth fore-stage valve and a second vacuum pump, wherein the second vacuum pump is respectively connected to the first reaction chamber in the first reaction component and the second reaction chamber in the second reaction component, the third fore-stage valve is arranged on the pipeline between the first reaction chamber and the second vacuum pump, and the fourth fore-stage valve is arranged on the pipeline between the second reaction chamber and the first vacuum pump.

10. The time-based rapid film-coating atomic layer deposition device according to claim 1, characterized in that: A sample tray is disposed in the first heating chamber in the first heating assembly and the second heating chamber in the second heating assembly.

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