UV-cured black resin composition and black matrix and display thereof

Abstract

The invention belongs to the technical field of photoresist, and particularly relates to a UV-cured black resin composition and a black matrix and a display thereof. The UV-curable black resin composition comprises: 40 to 70 wt% of a resin oligomer; 20 to 50 wt% of a photosensitive resin, wherein the photosensitive resin comprises a monofunctional monomer or a polyfunctional monomer containing an ethylenically unsaturated bond; the photoinitiators comprise m different free radical type photoinitiators and n different cationic photoinitiators, and the sum of m and n is larger than or equal to 3; the free radical type photoinitiators are identical or different and are selected from splitting type photoinitiators or hydrogen abstracting type photoinitiators; 1 to 10 wt% of a colorant; and 0-2 wt% of a functional auxiliary agent. Through the combination of the specific photoinitiator, the specific photosensitive resin and the specific resin oligomer, the adhesive force of the cured resin can be remarkably improved.

Description

Technical Field

[0001] The invention belongs to the technical field of photoresists, and in particular relates to a UV-curable black resin composition and a black matrix and a display thereof. Background Art

[0002] In recent years, with the rapid development of various liquid crystal display technologies, in order to improve the contrast and display quality of current liquid crystal displays, a black matrix is ​​usually placed in the stripes and dot gaps of the color filter in the liquid crystal display to prevent the loss of contrast and color purity caused by light leakage between pixels.

[0003] Black photoresist is a negative photoresist, and its main components are film-forming resin, colorant, active monomer, photoinitiator and additives. Carbon black is generally selected as the colorant, but since carbon black almost completely absorbs all bands of UV light, UV light cannot penetrate to the bottom of the ink. Therefore, after UV or LED UV curing, UV light can only cure the surface of the black ink, and the bottom layer cannot be cured because it is not exposed to UV light. The bottom of the formed coating cannot be completely attached to the surface of the material and is easy to fall off. In addition, due to incomplete curing, the performance of the formed coating is also poor. Therefore, it is necessary to take effective measures to improve the adhesion of the coating after curing. Summary of the invention

[0004] To solve the deficiencies of the prior art, the present invention provides a UV curable black resin composition, a black matrix and a display thereof. The present invention can significantly improve the adhesion of the curable resin through the combination of a specific photoinitiator, a specific photosensitive resin and a specific resin oligomer.

[0005] The technical solution provided by the present invention is as follows:

[0006] A UV curable black resin composition comprises the following components in percentage by weight:

[0007] 40-70wt% resin oligomer;

[0008] 20-50 wt% of a photosensitive resin, wherein the photosensitive resin comprises a monofunctional monomer or a multifunctional monomer containing an ethylenically unsaturated bond;

[0009] 1-10 wt% of a photoinitiator, wherein the photoinitiator comprises: m different free radical photoinitiators and n different cationic photoinitiators, wherein m is a natural number greater than or equal to 2, n is zero or a natural number, and m+n is greater than or equal to 3;

[0010] The various free radical photoinitiators are the same or different and are selected from cleavage photoinitiators or hydrogen abstraction photoinitiators;

[0011] 1-10 wt% colorant;

[0012] 0~2wt% functional additives.

[0013] Right now:

[0014] There are at least two types of free radical photoinitiators;

[0015] The number of cationic photoinitiators can be zero;

[0016] The sum of the types of free radical photoinitiators and cationic photoinitiators is at least three;

[0017] Each free radical photoinitiator can independently be a self-cleavage photoinitiator or a hydrogen abstraction photoinitiator.

[0018] Based on the above technical solution:

[0019] The combination of a specific photoinitiator, a specific photosensitive resin, and a specific resin oligomer can significantly improve the adhesion of the cured resin;

[0020] The surface chemical properties of the substrate can be used to form a strong bond between the substrate surface and the curing resin. For example, the active hydrogen on the surface of the substrate can form a chemical bond with the oligomers in the resin under the action of a hydrogen abstraction photoinitiator to improve the adhesion of the material.

[0021] Specifically, the cleavage-type photoinitiator is selected from benzoin and its derivatives, acylphosphine oxides or acetophenone photoinitiators; the hydrogen-abstracting photoinitiator is selected from anthraquinone photoinitiators, benzophenone and its derivatives or thioxanthone and its derivatives.

[0022] Preferably, the types of cleavage-type photoinitiators include at least two essential types, and the two essential types are independently and differently selected from benzoin and its derivatives photoinitiators, acylphosphine oxides or acetophenone photoinitiators.

[0023] Specifically, when the free radical photoinitiator contains both a cleavage photoinitiator and a hydrogen abstraction photoinitiator, the weight fraction ratio of the cleavage photoinitiator to the hydrogen abstraction photoinitiator is (1-4):1.

[0024] Preferably, the benzoin and its derivatives photoinitiators include, but are not limited to, benzoin dimethyl ether, benzoin isopropyl ether, and the like.

[0025] Preferably, the acylphosphine oxide photoinitiator includes, but is not limited to, initiator TEPO, bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (initiator 819), 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (initiator TPO), ethyl 2,4,6-trimethylbenzoylphenylphosphonate (initiator TPO-L), etc.

[0026] Further preferably, the cleavage-type photoinitiator includes at least one or more acylphosphine oxide photoinitiators.

[0027] Further preferably, the cleavage-type photoinitiator includes at least one or more acetophenone-based photoinitiators.

[0028] Preferably, the acetophenone photoinitiator is selected from one or more of α-hydroxyphenone photoinitiators and α-aminoalkylphenone photoinitiators.

[0029] The α-hydroxybenzophenone photoinitiator includes, but is not limited to, 2-hydroxy-methylphenylpropane-1-one (initiator 1173), 1-hydroxy-cyclohexyl-phenyl ketone (initiator 184), and 2-hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone (initiator 2959).

[0030] The α-aminoalkylphenone photoinitiator includes, but is not limited to, 2-methyl-2-(4-morpholinyl)-1-[4-(methylthio)phenyl]-1-propanone (initiator 907) and 2-phenylbenzyl-2-dimethylamine-1-(4-morpholinobenzylphenyl)butanone (initiator 369).

[0031] Specifically, the hydrogen abstraction type photoinitiator includes at least one or more combinations of thioxanthone and its derivative photoinitiators or anthraquinone photoinitiators.

[0032] In the technical solution of the present application, the hydrogen abstraction type photoinitiator is preferably one. That is, in the technical solution of the present application, the hydrogen abstraction type photoinitiator is preferably a thioxanthone and its derivatives photoinitiator or an anthraquinone photoinitiator.

[0033] Preferably, the thioxanthone and its derivatives photoinitiators include, but are not limited to, initiator TX, initiator ITX, initiator CTX, initiator DETX, and initiator CPTX.

[0034] Preferably, the anthraquinone photoinitiator includes, but is not limited to, 2-ethylanthraquinone, 2,4-diaminoanthraquinone, and 2,6-diaminoanthraquinone.

[0035] Furthermore, the weight fraction ratio of the cleavage-type photoinitiator to the hydrogen-abstraction-type photoinitiator is (1-3):1.

[0036] As described above, when the free radical photoinitiator contains both a self-cleavage photoinitiator and a hydrogen abstraction photoinitiator, the weight fraction ratio of the cleavage photoinitiator to the hydrogen abstraction photoinitiator is (1-4): 1. In this regard, in the technical solution of the present application, the total weight fraction ratio of two or more initiators selected from benzoin and its derivatives photoinitiators, acylphosphine oxides and acetophenone photoinitiators to any one of thioxanthone and its derivatives photoinitiators or any one of anthraquinone photoinitiators is (1-4): 1.

[0037] Preferably, the weight fraction ratio of the cleavage-type photoinitiator to the hydrogen-abstraction-type photoinitiator is (1-3):1.

[0038] In the preferred embodiment of the present application, the cleavage-type photoinitiator comprises at least one acylphosphine oxide and one acetophenone photoinitiator, and the weight fraction ratio of the acylphosphine oxide to the acetophenone photoinitiator is 1:(1-3).

[0039] Preferably, the weight fraction ratio of the acylphosphine oxide to the acetophenone photoinitiator is 1:(1-2).

[0040] The cationic photoinitiator is selected from one or more of iodonium salts or sulfonium salts.

[0041] Examples of the iodonium salt include, but are not limited to, diaryl iodonium salts. Examples of the sulfonium salt include, but are not limited to, triphenylsulfonium salts.

[0042] The photosensitive resin is selected from monomers containing one or more ethylenically unsaturated reactive functional groups at the end.

[0043] The resin oligomer includes at least one or more combinations of polyester acrylate, epoxy acrylate and polyether acrylate.

[0044] Resin oligomer: The resin oligomer used in the present invention is alkali soluble, and is generally prepared by cross-linking one or more photosensitive polymerizable monomers having photosensitive polymerizable groups that are known in the art and can participate in a cross-linking reaction. The weight average molecular weight of the resin oligomer is not limited.

[0045] The photosensitive polymerizable monomer is a bifunctional photosensitive resin or a multifunctional photosensitive resin, preferably an acrylate monomer, including but not limited to polyester acrylate, polyether acrylate, and epoxy acrylate.

[0046] Examples of photopolymerizable monomers include:

[0047] Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl methacrylate, butyl acrylate, hydroxyethyl acrylate, hydroxyethyl methacrylate, hydroxypropyl acrylate, hydroxypropyl methacrylate, dimethylaminoethyl acrylate, dimethylaminoethyl methacrylate, glycidyl acrylate, glycidyl methacrylate, ethylene glycol diacrylate, ethylene glycol dimethacrylate, diethylene glycol diacrylate, diethylene glycol dimethacrylate, triethylene glycol diacrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, tetraethylene glycol dimethacrylate, propylene glycol diacrylate, propylene glycol dimethacrylate, neopentyl glycol diacrylate, neopentyl glycol dimethacrylate, 1, A mixture of one or more of 6-hexanediol diacrylate, 1,6-hexanediol dimethacrylate, trimethylolpropane triacrylate, trimethylolpropane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, pentaerythritol tetramethacrylate, dipentaerythritol pentaacrylate, dipentaerythritol pentamethacrylate, dipentaerythritol hexaacrylate, dipentaerythritol hexamethacrylate, ethylene glycol diglycidyl ether diacrylate, ethylene glycol diglycidyl ether dimethacrylate, phthalic acid diglycidyl diacrylate, phthalic acid diglycidyl dimethacrylate, 3,4-epoxycyclohexyl methacrylate, and glycidyl methacrylate.

[0048] In the technical solution of the present application, the resin oligomer is preferably one or more combinations of polyester acrylate (Sartomer CN7001NS), polyester acrylate (Sartomer CN2254NS), and epoxy acrylate (Sartomer CN104NS).

[0049] The colorant includes carbon black or titanium black pigment.

[0050] Carbon black is preferred in the present application.

[0051] Furthermore, the average particle size of carbon black is preferably less than 30nm, more preferably less than 25nm, and preferably more than 5nm, more preferably more than 10nm. When the average particle size of carbon black is below the above upper limit, the sedimentation rate of the photosensitive resin composition is low, the storage stability of the composition is improved, and the light-shielding performance after curing is effectively improved; when the average particle size of carbon black is above the above lower limit, the agglomeration of carbon black is effectively avoided, and the dispersion stability of carbon black is improved. The above upper and lower limits can be arbitrarily combined. For example, it can be more than 5nm and less than 30nm, or it can be more than 5nm and less than 25nm. Preferably, it is more than 10nm and less than 25nm.

[0052] In the present application, other pigments other than carbon black may be further contained as needed. As other pigments, various pigments used for coloring the photosensitive resin composition may be used, for example. Examples include: blue pigment, green pigment, red pigment, yellow pigment, purple pigment, orange pigment, brown pigment. All may be selected according to conventional use by those skilled in the art.

[0053] The functional additives include one or more combinations of surfactants, dispersants, antioxidants, and leveling agents.

[0054] In the second aspect, please provide a matrix, which is prepared from the above composition and obtained through exposure, development and etching.

[0055] In a third aspect, the present invention further provides a display, comprising at least a substrate and a black matrix formed on the substrate, wherein the black matrix is ​​formed by UV curing the UV curable black resin composition provided by the present invention.

[0056] Preferably, the substrate is a material substrate having active hydrogen on its surface.

[0057] More preferably, the substrate is a PC / PET substrate.

[0058] Compared with the existing technical solutions, the present application uses a special combination of photoinitiators selected through experiments, which can effectively utilize 365nm UV light. In combination with other specific components, the UV light can reach the bottom of the ink, thereby curing the surface and bottom of the film together, thereby improving the adhesion performance between the film layer formed after the UV-curable black ink is cured and the substrate (PC / PET). DETAILED DESCRIPTION

[0059] The principles and features of the present invention are described below. The examples are only used to explain the present invention and are not intended to limit the scope of the present invention. If no specific conditions are specified in the examples, the conditions are carried out according to conventional conditions or the conditions recommended by the manufacturer. If the manufacturer of the reagents or instruments is not specified, they are all conventional products that can be obtained commercially.

[0060] Embodiment 1:

[0061] 55 parts by weight of acrylate oligomer (Sartomer CN7001NS), 28 parts by weight of 4-biphenylmethanol acrylate, 8 parts by weight of ethoxylated trimethylolpropane triacrylate and 2.5 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35°C and stirred evenly. Then, 1 part by weight of 1-hydroxy-cyclohexyl-phenyl ketone (initiator 184), 0.5 parts by weight of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (initiator 819), 0.5 parts by weight of 2,4-diaminoanthraquinone and 4.5 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0062] Embodiment 2:

[0063] 60 parts by weight of acrylate oligomer (Sartomer CN7001NS), 28 parts by weight of butyl methacrylate, 4 parts by weight of bisether fluorene acrylate and 2.5 parts by weight of polyether modified polydimethylsiloxane were put into a reaction kettle and stirred. The temperature was controlled at about 35°C and stirred evenly. Then, 0.25 parts by weight of 2-methyl-2-(4-morpholinyl)-1-[4-(methylthio)phenyl]-1-propanone (initiator 907), 0.25 parts by weight of ethyl 2,4,6-trimethylbenzoylphenylphosphonate (initiator TPO-L), 0.5 parts by weight of isopropylthioxanthone (ITX) and 4.5 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0064] Embodiment 3:

[0065] 50 parts by weight of acrylate oligomer (Sartomer CN2254NS), 20 parts by weight of 2-hydroxyethyl methacrylate, 14 parts by weight of pentaerythritol tetraacrylate and 2 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35° C. and stirred evenly. Then, 5 parts by weight of 2-methyl-2-(4-morpholinyl)-1-[4-(methylthio)phenyl]-1-propanone (initiator 907), 3 parts by weight of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (initiator 819), 2 parts by weight of 2,4-diethylthioxanthone (DETX) and 4 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0066] Embodiment 4:

[0067] 55 parts by weight of acrylate oligomer (Sartomer CN104NS), 25 parts by weight of butyl methacrylate, 10 parts by weight of bisetherfluorene acrylate and 3.1 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35°C and stirred evenly. Then, 0.8 parts by weight of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (initiator 819), 0.8 parts by weight of ethyl 2,4,6-trimethylbenzoylphenylphosphonate (initiator TPO-L), 0.8 parts by weight of 2,4-diethylthioxanthone (DETX) and 4.5 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0068] Embodiment 5:

[0069] 55 parts by weight of acrylate oligomer (Sartomer CN104NS), 25 parts by weight of butyl methacrylate, 10 parts by weight of bisetherfluorene acrylate and 3.1 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35° C. and stirred evenly. Then, 0.8 parts by weight of 2-methyl-2-(4-morpholinyl)-1-[4-(methylthio)phenyl]-1-propanone (initiator 907), 0.8 parts by weight of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (initiator 819), 0.8 parts by weight of 2,4-diethylthioxanthone (DETX) and 4.5 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0070] Embodiment 6:

[0071] 56 parts by weight of acrylate oligomer (Sartomer CN2254NS), 28 parts by weight of 2-hydroxyethyl methacrylate, 8 parts by weight of ethoxylated trimethylolpropane triacrylate and 2.5 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35° C. and stirred evenly. Then, 0.6 parts by weight of 2-methyl-2-(4-morpholinyl)-1-[4-(methylthio)phenyl]-1-propanone (initiator 907), 0.4 parts by weight of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (initiator 819), 0.5 parts by weight of isopropylthioxanthone (ITX) and 4 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0072] Embodiment 7:

[0073] 56 parts by weight of acrylate oligomer (Sartomer CN2254NS), 28 parts by weight of 4-biphenylmethanol acrylate, 8 parts by weight of ethoxylated trimethylolpropane triacrylate and 2.5 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35° C. and stirred evenly. Then, 0.6 parts by weight of 2-methyl-2-(4-morpholinyl)-1-[4-(methylthio)phenyl]-1-propanone (initiator 907), 0.4 parts by weight of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (initiator 819), 0.5 parts by weight of isopropylthioxanthone (ITX) and 4 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0074] Embodiment 8:

[0075] 56 parts by weight of acrylate oligomer (Sartomer CN2254NS), 28 parts by weight of 2-hydroxyethyl methacrylate, 8 parts by weight of ethoxylated trimethylolpropane triacrylate and 2 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35° C. and stirred evenly. Then, 1.2 parts by weight of 2-methyl-2-(4-morpholinyl)-1-[4-(methylthio)phenyl]-1-propanone (initiator 907), 0.6 parts by weight of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (initiator 819), 0.8 parts by weight of isopropylthioxanthone (ITX), 0.4 parts by weight of triphenylsulfonium salt and 3 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0076] Embodiment 9:

[0077] 50 parts by weight of acrylate oligomer (Sartomer CN2254NS), 20 parts by weight of 2-hydroxyethyl methacrylate, 14 parts by weight of pentaerythritol tetraacrylate and 2 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35° C. and stirred evenly. Then, 5 parts by weight of benzoin dimethyl ether, 3 parts by weight of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (initiator 819), 2 parts by weight of 2,4-diethylthioxanthone (DETX) and 4 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0078] Embodiment 10:

[0079] 55 parts by weight of acrylate oligomer (Sartomer CN104NS), 25 parts by weight of butyl methacrylate, 10 parts by weight of bisetherfluorene acrylate and 3.1 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35°C and stirred evenly. Then, 0.8 parts by weight of OXE-01, 0.8 parts by weight of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (initiator 819), 0.8 parts by weight of 2,4-diethylthioxanthone (DETX) and 4.5 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0080] Embodiment 11:

[0081] 56 parts by weight of acrylate oligomer (Sartomer CN2254NS), 28 parts by weight of 2-hydroxyethyl methacrylate, 8 parts by weight of ethoxylated trimethylolpropane triacrylate and 2.5 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35° C. and stirred evenly. Then, 0.6 parts by weight of 2-methyl-2-(4-morpholinyl)-1-[4-(methylthio)phenyl]-1-propanone (initiator 907), 0.4 parts by weight of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (initiator 819), 0.5 parts by weight of methyl o-benzoylbenzoate and 4 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0082] Comparative Example 1:

[0083] 60 parts by weight of acrylate oligomer (Sartomer CN7001NS), 28 parts by weight of butyl methacrylate, 4 parts by weight of dietherfluorene acrylate and 2.5 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35°C and stirred evenly. Then, 0.5 parts by weight of ethyl 2,4,6-trimethylbenzoylphenylphosphonate (initiator TPO-L), 0.5 parts by weight of isopropylthioxanthone (ITX) and 4.5 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0084] Comparative Example 2:

[0085] 56 parts by weight of acrylate oligomer (Sartomer CN2254NS), 28 parts by weight of 2-hydroxyethyl methacrylate, 8 parts by weight of ethoxylated trimethylolpropane triacrylate and 2 parts by weight of polyether modified polydimethylsiloxane were added into a reaction kettle and stirred. The temperature was controlled at about 35° C. and stirred evenly. Then, 1.8 parts by weight of 2-methyl-2-(4-morpholinyl)-1-[4-(methylthio)phenyl]-1-propanone (initiator 907), 0.8 parts by weight of isopropylthioxanthone (ITX), 0.4 parts by weight of triphenylsulfonium salt and 3 parts by weight of carbon black were added and stirred evenly to obtain a black photosensitive resin composition.

[0086] Performance testing:

[0087] Viscosity: For the compositions prepared in Examples 1-11 and Comparative Examples 1-2, their viscosities at 25° C. were measured using a viscometer.

[0088] OD value: First, a 100 mm square PC substrate was cleaned with pure water and dried in an oven at 160°C. The resin composition obtained in the embodiment and the comparative example was coated on the dried glass substrate using a rotary coater. After curing with a UV lamp, a coating film with a film thickness of 10 μm was obtained to obtain a test sample. The OD values ​​of Examples 1-11 and Comparative Examples 1-2 were measured using a densitometer. The composition obtained in Example 5 was coated on a glass substrate (as Example 12) using the same test method.

[0089] Adhesion: The test sample was tested using the hundred-grid knife test method; after boiling in 100℃ water for 12h, the adhesion was tested using the same method.

[0090] The test results are shown in Table 1 below:

[0091] Table 1

[0092]

[0093] Refer to Examples 1 to 12 and Comparative Examples 1 to 2. Compared with Example 2 and Example 8, the adhesion level of Comparative Examples 1 and 2 only reaches 3B, which is difficult to meet the adhesion requirements of the substrate. Although the adhesion level of Comparative Example 1 can reach 3B, after high-temperature boiling, the adhesion level can only reach 2B, the adhesion between the resin and the substrate decreases, and the high-temperature resistance is weak. Using the specific combination of photoinitiator types of this application and the photoinitiator within the content range disclosed in this application, the obtained black numerical composition can ensure excellent OD value, light shielding ability, adhesion and high-temperature resistance at a viscosity suitable for construction.

[0094] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A UV-curable black resin composition, characterized in that: Contains the following components in percentage by weight: 40-70wt% resin oligomer; 20-50 wt% of a photosensitive resin, wherein the photosensitive resin comprises a monofunctional monomer or a multifunctional monomer containing an ethylenically unsaturated bond; 1-10 wt% of a photoinitiator, wherein the photoinitiator comprises: m different free radical photoinitiators and n different cationic photoinitiators, wherein m is a natural number greater than or equal to 2, n is zero or a natural number, and m+n is greater than or equal to 3; The various free radical photoinitiators are the same or different and are selected from cleavage photoinitiators or hydrogen abstraction photoinitiators; 1-10 wt% colorant; 0~2wt% functional additives.

2. The UV curable black resin composition according to claim 1, characterized in that: The cleavage-type photoinitiator is selected from benzoin and its derivatives, acylphosphine oxides or acetophenone photoinitiators; The hydrogen abstraction type photoinitiator is selected from anthraquinone photoinitiators, benzophenone and its derivative photoinitiators or thioxanthone and its derivative photoinitiators.

3. The UV curable black resin composition according to claim 2, characterized in that: The cleavage-type photoinitiator includes at least one or more acetophenone-based photoinitiators.

4. The UV curable black resin composition according to claim 2, characterized in that: The weight fraction ratio of the cleavage type photoinitiator to the hydrogen abstraction type photoinitiator is (1-4):

1.

5. The UV curable black resin composition according to claim 1, characterized in that: The cationic photoinitiator is selected from one or more of iodonium salts or sulfonium salts.

6. The UV curable black resin composition according to claim 1, characterized in that: The photosensitive resin is selected from monomers containing one or more ethylenically unsaturated reactive functional groups at the end.

7. The UV curable black resin composition according to claim 1, characterized in that: The resin oligomer includes at least one or more of polyester acrylate, epoxy acrylate or polyether acrylate.

8. The UV curable black resin composition according to claim 1, characterized in that: The colorant includes carbon black or titanium black pigment.

9. The UV curable black resin composition according to any one of claims 1 to 8, characterized in that: The functional additives include one or more of surfactants, dispersants, antioxidants, and leveling agents.

10. A display, characterized in that: At least comprising a substrate, and a cured layer formed on the substrate; the cured layer is formed by UV curing the UV curable black resin composition according to any one of claims 1 to 9; Alternatively, the invention at least comprises a substrate and a cured layer formed on the substrate, wherein the substrate is a material substrate having active hydrogen on its surface; the cured layer is formed by UV curing the UV curable black resin composition according to any one of claims 1 to 9; Alternatively, it at least comprises a substrate and a cured layer formed on the substrate, wherein the substrate is a PC or PET substrate; the cured layer is formed by UV curing the UV curable black resin composition according to any one of claims 1 to 9.

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