Device and method for inhibiting scrap pollution in EUV light source

Abstract

The invention relates to the technical field of photoetching, in particular to a device and a method for inhibiting debris pollution in an EUV light source, and the device for inhibiting debris pollution in the EUV light source comprises a conical barrel body, one end, close to a conical tip, of the conical barrel body is provided with a filter fixing piece, and one end, close to a conical bottom, of the conical barrel body is provided with an EUV collecting mirror fixing part; the filter is arranged at the filter fixing piece; the EUV collecting mirror is arranged on the EUV collecting mirror fixing part; the blowing needle head is arranged at one end, close to the filter sheet, of the conical barrel body. The device for inhibiting scrap pollution in the EUV light source is of a conical barrel structure, the filter is loaded inside the front end of the conical barrel body, the blowing needle is loaded outside the front end of the conical barrel body, and the EUV collecting mirror is loaded inside the rear end of the conical barrel body. According to the device, the speed of chippings generated in a plasma area is reduced through local high-flux airflow injection of the blowing needle head, the chippings are blocked by the filter piece, and the EUV collecting mirror is effectively protected.

Description

Technical Field

[0001] The present invention relates to the field of photolithography technology, and in particular to a device and method for suppressing debris contamination in an EUV light source. Background Art

[0002] In LPP (Laser Produced Plasma) light sources based on tin metal targets, high-energy pulsed lasers are usually used to bombard tin metal targets to obtain the required extreme ultraviolet (EUV) light. EUV light is used in the semiconductor industry for the most advanced chip etching, metrology and inspection, and is used to manufacture and inspect technology nodes of 7nm or less. The byproduct of the emission of EUV light by the LPP light source is the expansion of the plasma region, including ions and micro-nano sized debris. The debris emitted from the plasma region will interact with the sensitive functional surfaces of nearby devices, especially deposited on the surface of the EUV collection mirror with a multi-layer nano-thin film structure, contaminating the surface of the EUV collection mirror and even causing irreversible damage to the mirror, which makes the EUV collection mirror a key component that limits the continuous working time of the LPP light source, and the EUV collection mirror is very expensive and has a high replacement cost.

[0003] Currently, technologies to prevent debris from contaminating and damaging EUV collector mirrors include:

[0004] 1) Hydrogen purge: The entire area of ​​the reflector is purged with dilute hydrogen. The gas molecules slow down or change the direction of the debris through collision. At the same time, hydrogen reacts with tin to form gaseous SnH4, which can be removed by suction. However, low-pressure hydrogen is difficult to completely suppress large-sized and high-deformation debris. If high-flow hydrogen is used, the concentration of hydrogen in the equipment will be significantly increased, thereby increasing the absorption rate of EUV light.

[0005] 2) Electromagnetic field deflection: A strong electromagnetic field is set between the laser impact point and the EUV reflector to deflect the charged debris away from the EUV collection mirror. However, this method is only applicable to charged debris and cannot deflect or suppress neutral debris.

[0006] 3) Mirror coating: Add a protective coating to the surface of the EUV collector to reduce damage to the mirror by debris. However, mirror coating is a passive protection and cannot reduce the debris reaching the EUV collector. And its use has limitations. The coating has a limited service life and is prone to wear or failure during long-term experimental operation, resulting in poor protection of the EUV collector.

[0007] Therefore, the prior art still needs to be improved and developed. Summary of the invention

[0008] In view of the above-mentioned deficiencies in the prior art, an object of the present invention is to provide a device and method for suppressing debris contamination in EUV light sources, aiming to solve the problem that the existing devices for preventing contamination and damage to EUV collecting mirrors have poor protection effect and cannot effectively block debris.

[0009] The technical solution of the present invention is as follows:

[0010] A device for suppressing debris contamination in an EUV light source, comprising:

[0011] A conical barrel body, wherein a filter plate fixing piece is provided at one end of the conical barrel body close to the cone tip, and an EUV collecting mirror fixing part is provided at one end of the conical barrel body close to the cone bottom;

[0012] A filter sheet, arranged at the filter sheet fixing part;

[0013] An EUV collecting mirror is disposed on the EUV collecting mirror fixing portion;

[0014] The blowing needle is arranged on the conical cylinder body and close to one end of the filter sheet.

[0015] The device for suppressing debris contamination in an EUV light source, wherein the filter comprises a metal carrier mesh and a nano film attached to the metal carrier mesh.

[0016] In the device for suppressing debris contamination in EUV light sources, the material of the metal grid includes one of copper, nickel, molybdenum and gold; and the nano film is a carbon-based material.

[0017] The device for suppressing debris contamination in EUV light source, wherein the conical tube body comprises a conical tube upper part, a conical tube lower part, and a receiving space surrounded by the conical tube upper part and the conical tube lower part; the filter and the EUV collecting mirror are clamped in the receiving space.

[0018] The device for suppressing debris contamination in an EUV light source, wherein a first needle fixing portion and a second needle fixing portion spaced apart from the first needle fixing portion are provided on the outer side of the conical tube body near the cone tip end of the conical tube body; and the blowing needle is fixed between the first needle fixing portion and the second needle fixing portion by a fastening bolt.

[0019] The device for suppressing debris contamination in an EUV light source, wherein the blowing needle includes a needle tail for introducing gas and a needle tip for releasing gas; the needle tip is arranged on one side of the needle tail and close to the cone tip of the conical tube body.

[0020] The device for suppressing debris contamination in EUV light sources, wherein a fixing portion is provided at one end of the outer side of the conical tube body close to the cone bottom of the conical tube body, for fixing the device for suppressing debris contamination in EUV light sources on a carrier.

[0021] The device for suppressing debris contamination in EUV light sources, wherein a first collecting plate, a second collecting plate, a third collecting plate and a fourth collecting plate are provided in the conical cylinder body; the first collecting plate, the second collecting plate, the third collecting plate and the fourth collecting plate are sequentially arranged between the filter and the EUV collecting mirror.

[0022] The device for suppressing debris contamination in EUV light sources, wherein the first collecting plate, the second collecting plate, the third collecting plate and the fourth collecting plate are respectively provided with a 1 / 4 baffle, and the baffle projections of the first collecting plate, the second collecting plate, the third collecting plate and the fourth collecting plate together form a complete circle.

[0023] A method for suppressing debris contamination in an EUV light source comprises the steps of:

[0024] A pulsed laser is used to bombard a solid tin target to form a plasma region;

[0025] The device for suppressing debris contamination in the EUV light source is aimed at the plasma region, and a gas source is introduced into the blowing needle so that the needle tip of the blowing needle releases gas in the plasma region, thereby suppressing debris contamination in the EUV light source.

[0026] Beneficial effects: The present invention provides a device and method for suppressing debris contamination in EUV light sources. The device for suppressing debris contamination in EUV light sources comprises: a conical barrel body, wherein the end of the conical barrel body close to the cone tip is provided with a filter fixing piece, and the end close to the cone bottom is provided with an EUV collecting mirror fixing part; a filter is arranged at the filter fixing piece; an EUV collecting mirror is arranged on the EUV collecting mirror fixing part; and an air blowing needle is arranged at the conical barrel body and at one end close to the filter. The device for suppressing debris contamination in EUV light sources provided by the present invention is a conical barrel structure, wherein a filter is loaded inside the front end of the conical barrel body and an air blowing needle is loaded outside the front end, and an EUV collecting mirror is loaded inside the rear end. The device combines the deceleration of debris generated in the plasma region by local high-flux airflow injection through the air blowing needle and the blocking effect of the filter on debris, thereby providing a device for effectively protecting the EUV collecting mirror. Specifically, by releasing gas in the plasma area through the blowing needle, the faster gas flow rate can effectively decelerate the debris, and changing the direction of gas blowing can change the movement trajectory of the debris, thereby preventing the debris from entering from the front opening of the conical tube, protecting the EUV collecting mirror at the rear; at the same time, after a small amount of debris enters the conical tube body, the filter set at the tip of the conical tube body serves as the second interception guarantee, which can well intercept the debris from entering the conical tube body, while allowing EUV light to pass smoothly to reach the EUV collecting mirror, ensuring optical performance. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 This is a schematic diagram of the overall structure of a device for suppressing debris contamination in an EUV light source according to the present invention;

[0028] Figure 2 It is a schematic diagram of the explosion structure of a device for suppressing debris contamination in an EUV light source according to the present invention;

[0029] Figure 3 A schematic diagram of the working principle of a device for suppressing debris contamination in an EUV light source according to the present invention;

[0030] Figure 4 Another schematic diagram of the working principle of a device for suppressing debris contamination in an EUV light source according to the present invention;

[0031] Figure 5 This is a physical picture of the filter;

[0032] Figure 6 The figure is a distribution diagram of debris collected on the silicon wafer when the device is not loaded with the air blowing needle and the nano film and when the air blowing needle and the nano film are loaded;

[0033] Figure 7 This is a microscopic representation of the debris intercepted by the filter;

[0034] Explanation of the accompanying drawings: conical cylinder body 10, conical cylinder upper part 11, first positioning piece 111, second positioning piece 121, conical cylinder lower part 12, accommodating space 13, first needle fixing part 14, second needle fixing part 15, fixing part 16, fixing hole 161, filter fixing part 20, EUV collecting mirror fixing part 30, filter 40, metal carrier mesh 41, nano film 42, EUV collecting mirror 50, blowing needle 60, needle tail 61, needle tip 62, fastening bolt 70, connecting bolt 80, baffle 90, first collecting plate 91, second collecting plate 92, third collecting plate 93, fourth collecting plate 94. DETAILED DESCRIPTION

[0035] The present invention provides a device and method for suppressing debris contamination in an EUV light source. To make the purpose, technical solution and effect of the present invention clearer and more specific, the present invention is further described in detail below. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0036] It will be understood by those skilled in the art that, unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as generally understood by those skilled in the art in the art to which the present invention belongs. It should also be understood that terms such as those defined in general dictionaries should be understood to have meanings consistent with the meanings in the context of the prior art, and will not be interpreted with idealized or overly formal meanings unless specifically defined as herein.

[0037] like Figure 1 and Figure 2 As shown, the present invention provides a device for suppressing debris contamination in an EUV light source, comprising:

[0038] A conical barrel body 10, wherein a filter plate fixing part 20 is provided at one end of the conical barrel body 10 close to the cone tip, and an EUV collecting mirror fixing part 30 is provided at one end close to the cone bottom;

[0039] A filter sheet 40 is disposed at the filter sheet fixing member 20;

[0040] An EUV collecting mirror 50 is disposed on the EUV collecting mirror fixing portion 30;

[0041] The blowing needle 60 is disposed on one end of the conical barrel body 10 and close to the filter plate 40 .

[0042] In this embodiment, the device provided for suppressing debris contamination in the EUV light source is a conical cylindrical structure, with a filter plate loaded inside the front end of the conical barrel body, a blowing needle loaded outside the front end, and an EUV collecting mirror loaded inside the rear end. The device combines the deceleration of debris generated in the plasma region by local high-flux airflow injection through the blowing needle, and the blocking effect of the filter plate on the debris, providing a device for effectively protecting the EUV collecting mirror. Specifically, the gas is released in the plasma region by the blowing needle, and the faster gas flow rate can effectively decelerate the debris, and changing the direction of the gas blowing can change the movement trajectory of the debris, thereby preventing the debris from entering from the front opening of the conical barrel, protecting the rear EUV collecting mirror; at the same time, after a small amount of debris enters the conical barrel body, the filter plate set at the cone tip of the conical barrel body serves as a second interception guarantee, which can well intercept the debris from entering the conical barrel body, while allowing EUV light to pass smoothly to reach the EUV collecting mirror, ensuring optical performance.

[0043] Specifically, Figure 3 and Figure 4 As shown, after the end of the device provided with the filter 40 is directed toward the plasma region, the debris splashed out of the plasma region is blown by the high-flow gas and blocked by the filter, and the debris that finally reaches the EUV collection mirror is significantly reduced. In the process of blocking the debris, the high-flow gas blown out of the blowing needle blows the debris out of the conical cylinder, making it difficult for it to reach the EUV collection mirror installed behind the conical cylinder body; the filter is installed in the position in front of the conical cylinder body, and when debris flies out of the plasma region, the debris is first blown by the high-speed gas flow, and the remaining debris is blocked by the filter, thereby significantly reducing the deposition rate of the debris on the EUV collection mirror.

[0044] In some embodiments, the gas used by the blowing needle is nitrogen or argon. When the EUV mirror is purged in a traditional way, since the area of ​​the reflector is large, if a high flow rate of hydrogen is used, a large flow rate of hydrogen must be used, which will greatly increase the concentration of hydrogen in the equipment. However, the present invention purges the plasma area, and since the area of ​​the plasma area is small, a high flow rate can be maintained at a lower gas concentration, thereby significantly reducing the deposition rate of debris on the EUV collection mirror.

[0045] In some embodiments, Figure 5 As shown, the filter 40 includes a metal mesh 41 and a nano film 42 attached to the metal mesh 41. The nano film 42 is attached to the metal mesh 41, and the metal mesh 41 provides a solid support structure for the nano film 42, which can well intercept debris and prevent the debris from entering the interior of the conical tube body, while allowing EUV light to pass smoothly to ensure optical performance.

[0046] In some embodiments, the material of the metal grid includes but is not limited to one of copper, nickel, molybdenum, and gold; the nanofilm is a carbon-based material. The metal grid can provide a solid support structure for the nanofilm.

[0047] In some embodiments, the nanofilm includes but is not limited to one of a graphene film and a carbon nanotube (CNT) film. Compared with early nanofilms, carbon-based material films have higher EUV transmittance, excellent thermal conductivity and mechanical stability, and can improve the interception efficiency of debris.

[0048] Specifically, the nanofilm performs well in intercepting debris. The filter 40 is composed of a metal mesh and an attached nanofilm. The nanofilm can effectively allow extreme ultraviolet light (EUV) to pass through while blocking smaller debris, thereby protecting the optical elements behind. However, for larger debris, the interception effect is relatively limited. Since larger debris has higher kinetic energy and mass, it can break through the barrier of the nanofilm. Therefore, the present invention also uses a blowing needle to release a high-speed airflow purge protection measure to improve the protection capability of the device. The dual structural design combining the filter and airflow purge not only ensures the light transmission efficiency, but also provides a certain degree of protection for the long-term stable operation of the device. Furthermore, in order to achieve a balance between the debris blocking effect and the EUV pass rate, the coverage of the metal mesh and the thickness of the nanofilm can be changed.

[0049] In some embodiments, the conical barrel body 10 includes a conical barrel upper portion 11, a conical barrel lower portion 12, and a receiving space 13 surrounded by the conical barrel upper portion 11 and the conical barrel lower portion 12; the filter 40 and the EUV collecting mirror 50 are clamped in the receiving space 13. The use of a separate structure facilitates the disassembly of the components in the receiving space 13; the detachable conical barrel body is formed by assembling the conical barrel upper portion and the conical barrel lower portion, which facilitates the installation and maintenance of the filter 40 and the EUV collecting mirror 50 and reduces the production difficulty and cost.

[0050] In some embodiments, a first positioning member 111 is provided on the conical cylinder upper portion 11, and a second positioning member 121 is provided on the conical cylinder lower portion 12. Both the first positioning member 111 and the second positioning member 121 are provided with through holes, and the conical cylinder upper portion 11 and the conical cylinder lower portion 12 are assembled by passing connecting bolts 80 through the through holes.

[0051] In some embodiments, a first needle fixing portion 14 and a second needle fixing portion 15 spaced apart from the first needle fixing portion 14 are provided on the outer side of the conical barrel body 10 near the conical tip of the conical barrel body 10; the insufflation needle 60 is fixed between the first needle fixing portion 14 and the second needle fixing portion 15 by a fastening bolt 70. The insufflation needle 60 is fixed between the first needle fixing portion 14 and the second needle fixing portion 15 by the fastening bolt 70, which facilitates the disassembly of the insufflation needle, facilitates subsequent maintenance and replacement, and can fasten the insufflation needle 60 to prevent it from falling off under the reaction force of high-flow gas.

[0052] In another embodiment, the blowing needle 60 can be arranged inside the conical tube body 10, that is, arranged in the receiving space 13. The blowing needle 60 can release gas in the direction of the filter 40 to effectively slow down the debris, and changing the direction of the gas blowing can change the movement trajectory of the debris, thereby preventing the debris from entering the conical tube body 10 from the front opening of the conical tube, thereby protecting the EUV collecting mirror at the rear.

[0053] In some embodiments, the blowing needle 60 includes a needle tail 61 for introducing gas, and a needle tip 62 for releasing gas; the needle tip 62 is arranged on one side of the needle tail 61 and close to the cone tip of the conical barrel body 10. The blowing needle 60 is connected to an external gas source, and the gas enters from the needle tail, and the gas is released in the plasma region through the needle tip. A faster gas flow rate can effectively decelerate the debris, and changing the direction of gas blowing can change the movement trajectory of the debris, thereby preventing the debris from entering from the front opening of the conical barrel body, protecting the EUV collection mirror at the rear, that is, this structure can better control the gas flow rate and effectively decelerate the debris.

[0054] Specifically, local high-flux airflow is injected into the front opening of the conical tube to form a high-speed flow field, which effectively blocks the splash of tin liquid; the kinetic energy generated by the high-speed airflow can significantly change the movement trajectory of the debris and deviate it from the front opening of the conical tube; this process not only reduces the potential contamination of the debris on the collecting mirror, but also can dynamically adjust the direction and speed of the airflow to flexibly respond to the behavior of debris under different experimental conditions, thereby protecting the optical components and maintaining the efficient operation of the system.

[0055] In some embodiments, the blowing needle 60 may also be positioned at the EUV collecting mirror for blowing, and the debris reaching the collecting mirror may also be reduced by the gas blowing.

[0056] In some embodiments, a fixing portion 16 is provided at one end of the outer side of the conical barrel body 10 near the bottom of the conical barrel body 10, which is used to fix the device for suppressing debris contamination in the EUV light source on a carrier. The fixing portion 16 can be used to fix the device on a robot arm to achieve position control of the device. Preferably, a fixing hole 161 is provided on the fixing portion 16, and a fixing member such as a bolt is passed through the fixing hole 161 to fix the device.

[0057] In some embodiments, a first collecting plate 91, a second collecting plate 92, a third collecting plate 93 and a fourth collecting plate 94 are provided in the conical barrel body 10; the first collecting plate 91, the second collecting plate 92, the third collecting plate 93 and the fourth collecting plate 94 are sequentially arranged between the filter 40 and the EUV collecting mirror 50. The first collecting plate 91, the second collecting plate 92, the third collecting plate 93 and the fourth collecting plate 94 are used to count the number of debris at different positions in the conical barrel, which can be removed when collecting EUV light.

[0058] In some embodiments, a quarter baffle 90 is provided on each of the first collecting plate 91, the second collecting plate 92, the third collecting plate 93 and the fourth collecting plate 94, and the baffle projections of the first collecting plate 91, the second collecting plate 92, the third collecting plate 93 and the fourth collecting plate 94 are combined to form a complete circle. The baffles on the collecting plates can be used to count the number of debris at different positions in the conical cylinder, and the collecting plates can be removed when the device is used to collect EUV light.

[0059] In addition, the device for suppressing debris contamination in the EUV light source can also only use the combination of a conical barrel body + a filter, a conical barrel body + an air-blowing needle, or a filter + an air-blowing needle to intercept debris. When the debris is charged, an electromagnetic field can be applied to change the direction of movement of the debris, which can reduce the use of physical barriers. In addition, a micro-motion device can be installed on the collection mirror to prevent debris from adhering and remove the debris through vibration.

[0060] In some embodiments, a dynamic adjustment system can be introduced into the device. By introducing sensors and intelligent control systems, the airflow can be dynamically adjusted according to the debris concentration, and an automated system can be designed for cleaning and replacement to improve the operating efficiency of the equipment.

[0061] In addition, the present invention also provides a method for suppressing debris contamination in an EUV light source, comprising the steps of:

[0062] Step S10: using pulsed laser to bombard a solid tin target to form a plasma region;

[0063] Step S20: aligning the device for suppressing debris contamination in the EUV light source with the plasma region, and introducing a gas source into the blowing needle, so that the tip of the blowing needle releases gas in the plasma region, thereby suppressing debris contamination in the EUV light source.

[0064] In this embodiment, gas is released in the plasma area through the blowing needle, and the faster gas flow rate can effectively decelerate the debris, and changing the direction of gas blowing can change the movement trajectory of the debris, thereby preventing the debris from entering from the front opening of the conical tube, thereby protecting the EUV collecting mirror at the rear; at the same time, after a small amount of debris enters the conical tube body, the filter set at the cone tip of the conical tube body serves as the second interception guarantee, which can well intercept the debris from entering the conical tube body, and at the same time allow EUV light to pass smoothly to reach the EUV collecting mirror, thereby ensuring optical performance.

[0065] The following examples are further given to illustrate the present invention in detail. It should also be understood that the following examples are only used to further illustrate the present invention and cannot be understood as limiting the scope of protection of the present invention. Some non-essential improvements and adjustments made by those skilled in the art based on the above content of the present invention belong to the scope of protection of the present invention.

[0066] Example 1

[0067] The test and characterization were carried out under the condition of 1064nm pulsed laser bombarding solid tin target. During the experiment, silicon wafer was used instead of EUV collecting mirror, and the effect of loading blowing needle and nano film on debris blocking effect was determined by observing the amount of debris deposition on the silicon wafer. Figure 6 (Left) shows the distribution of debris collected on the silicon wafer when the conical cylinder is not loaded with a blowing needle and a nanofilm. Figure 6 (Right) shows the distribution of debris collected on the silicon wafer when the conical cylinder is loaded with the blowing needle and the nanofilm. After comparison, it can be seen that the amount of debris is significantly reduced after loading the blowing needle and the nanofilm, proving the effectiveness of this protection scheme. The nanofilm performs well in intercepting debris, such as Figure 7 shown.

[0068] Multiple experimental data show that compared with the experimental results without the device, the number of debris is significantly reduced after the conical tube device is used, and the cleaning frequency of EUV collection mirrors and other optical components is greatly reduced, which prolongs the operating life of the equipment. The above experimental results prove that the device has a significant effect on suppressing the number of debris.

[0069] In summary, the present invention provides a device and method for suppressing debris contamination in an EUV light source. The device for suppressing debris contamination in an EUV light source comprises: a conical barrel body, wherein the end of the conical barrel body close to the cone tip is provided with a filter fixing part, and the end close to the cone bottom is provided with an EUV collecting mirror fixing part; a filter is arranged at the filter fixing part; an EUV collecting mirror is arranged on the EUV collecting mirror fixing part; and an air blowing needle is arranged at the conical barrel body and at one end close to the filter. The device for suppressing debris contamination in an EUV light source provided by the present invention is a conical barrel structure, wherein a filter is loaded inside the front end of the conical barrel body and an air blowing needle is loaded outside the front end, and an EUV collecting mirror is loaded inside the rear end. The device combines the deceleration of debris generated in the plasma region by local high-flux airflow injection through the air blowing needle, and the blocking effect of the filter on debris, thereby providing a device for effectively protecting the EUV collecting mirror. Specifically, by releasing gas in the plasma area through the blowing needle, the faster gas flow rate can effectively decelerate the debris, and changing the direction of gas blowing can change the movement trajectory of the debris, thereby preventing the debris from entering from the front opening of the conical tube, protecting the EUV collecting mirror at the rear; at the same time, after a small amount of debris enters the conical tube body, the filter set at the tip of the conical tube body serves as the second interception guarantee, which can well intercept the debris from entering the conical tube body, while allowing EUV light to pass smoothly to reach the EUV collecting mirror, ensuring optical performance.

[0070] It should be understood that the application of the present invention is not limited to the above examples. For ordinary technicians in this field, improvements or changes can be made based on the above description. All these improvements and changes should fall within the scope of protection of the claims attached to the present invention.

Claims

1. A device for suppressing debris contamination in an EUV light source, characterized in that: include: A conical barrel body, wherein a filter plate fixing piece is provided at one end of the conical barrel body close to the cone tip, and an EUV collecting mirror fixing part is provided at one end of the conical barrel body close to the cone bottom; A filter sheet, arranged at the filter sheet fixing part; An EUV collecting mirror is disposed on the EUV collecting mirror fixing portion; The air blowing needle is arranged on the conical cylinder body and close to one end of the filter sheet.

2. The device for suppressing debris contamination in EUV light source according to claim 1, characterized in that: The filter sheet comprises a metal mesh and a nano-film attached to the metal mesh.

3. The device for suppressing debris contamination in EUV light source according to claim 2, characterized in that: The material of the metal grid includes one of copper, nickel, molybdenum and gold; the nano film is a carbon-based material.

4. The device for suppressing debris contamination in EUV light source according to claim 1, characterized in that: The conical cylinder body comprises a conical cylinder upper part, a conical cylinder lower part, and a receiving space surrounded by the conical cylinder upper part and the conical cylinder lower part; the filter and the EUV collecting mirror are clamped in the receiving space.

5. The device for suppressing debris contamination in EUV light source according to claim 1, characterized in that: A first needle fixing portion and a second needle fixing portion spaced apart from the first needle fixing portion are provided on the outer side of the conical barrel body near the conical tip end of the conical barrel body; the blowing needle is fixed between the first needle fixing portion and the second needle fixing portion by a fastening bolt.

6. The device for suppressing debris contamination in EUV light source according to claim 1, characterized in that: The blowing needle comprises a needle tail for introducing gas and a needle tip for releasing gas; the needle tip is arranged at one side of the needle tail and close to the conical tip of the conical cylinder body.

7. The device for suppressing debris contamination in EUV light source according to claim 1, characterized in that: A fixing portion is provided at one end of the outer side of the conical barrel body close to the cone bottom of the conical barrel body, which is used to fix the device for suppressing debris contamination in the EUV light source on a carrier.

8. The device for suppressing debris contamination in EUV light source according to claim 1, characterized in that: A first collecting plate, a second collecting plate, a third collecting plate and a fourth collecting plate are arranged in the conical cylinder body; the first collecting plate, the second collecting plate, the third collecting plate and the fourth collecting plate are arranged in sequence between the filter and the EUV collecting mirror.

9. The device for suppressing debris contamination in EUV light source according to claim 8, characterized in that: The first collecting plate, the second collecting plate, the third collecting plate and the fourth collecting plate are respectively provided with 1 / 4 baffles, and the baffle projections of the first collecting plate, the second collecting plate, the third collecting plate and the fourth collecting plate together form a complete circle.

10. A method for suppressing debris contamination in an EUV light source, characterized in that: Includes steps: A pulsed laser is used to bombard a solid tin target to form a plasma region; The device for suppressing debris contamination in an EUV light source as described in any one of claims 1 to 9 is aligned with the plasma region, and a gas source is introduced into the blowing needle so that the tip of the blowing needle releases gas in the plasma region, thereby suppressing debris contamination in the EUV light source.

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