Substrate processing apparatus mounted with heating portion

Abstract

The present invention relates to a substrate processing apparatus having a heat generating unit mounted thereon, comprising: a chuck base capable of rotating about a rotation center axis and including a rotating chuck and a chuck supporting unit; the rear nozzle assembly is arranged through a hollow part formed in the center of the chuck base and used for spraying the processing liquid to the lower surface of the substrate; a glass cover sheet disposed between the upper surface of the rotary chuck and the rear nozzle assembly when viewed from a top view, the glass cover sheet having a through-hole formed in the center thereof, the through-hole allowing the rear nozzle assembly to pass therethrough; and a heat generating part which is located between the cover glass and the chuck support part, is provided inside the inner peripheral surface of the rotary chuck, and has an inclined refracting surface of a predetermined width formed on the cover glass so as to surround the periphery of the through-hole when viewed from a top view, and has an inclined refracting surface of a predetermined width formed on the cover glass when viewed from a main cross-sectional view. The inclined refracting surface is formed on the upper surface of the cover glass and is inclined upward in the radial direction with respect to the rotation center axis.

Description

Technical Field

[0001] The present invention relates to a substrate processing device equipped with a heating unit, and more particularly, to a substrate processing device equipped with a heating unit, which can uniformly transfer radiant heat from the heating unit to the entire substrate. Background Art

[0002] The substrate processing apparatus refers to an apparatus that uses a processing liquid to perform vapor deposition, development, etching or cleaning on substrates such as semiconductor wafers, display substrates, optical disk substrates, magnetic disk substrates, photomask substrates, ceramic substrates, and solar cell substrates.

[0003] The cleaning process is used to remove foreign matter or particles present on the substrate, and typically refers to a process of supplying a processing liquid to the surface or back side of the substrate while rotating the substrate at high speed while being supported by a chuck base (spinning head).

[0004] In this case, if a heat generating portion such as a light emitting diode (LED) is installed under the substrate and the substrate is rotated in a heated state to process the substrate, the amount of processing liquid used can be reduced due to the rapid reaction. This not only minimizes environmental pollution but also shortens the processing time. Therefore, there is an advantage of improving productivity and significantly reducing power consumption.

[0005] For this reason, various technologies related to a substrate processing apparatus for rotating a substrate in a heated state are being studied.

[0006] On the other hand, Figure 1 As shown, a chuck pin 5 is provided on the upper surface of the chuck base 1, and a rear nozzle assembly 2 is provided at the center lower part of the substrate W fixed on the chuck pin 5 and passes through the chuck base 1, so that the processing liquid can be sprayed toward the bottom surface of the substrate W.

[0007] Furthermore, a cover glass 4 is provided between the heating portion 3 and the substrate W to prevent the processing liquid sprayed from the rear nozzle assembly 2 from flowing into the heating portion 3 and to allow the radiant heat of the heating portion 3 to pass smoothly.

[0008] The heating portion 3 is disposed between the inner circumference of the annular chuck base 1 and the outer circumference of the rear nozzle assembly 2 , and the glass cover 4 is disposed on the chuck base 1 in a state of being spaced apart upward from the heating portion 3 .

[0009] In this case, the rear nozzle assembly 2 is formed to protrude above the heating portion 3, and the chuck base 1 for fixing the glass cover 4 is also located at a position higher than the heating portion 3. Therefore, the radiant heat generated from the heating portion 3 is affected by the rear nozzle assembly 2 and the chuck base 1, and there is a disadvantage of reduced thermal conductivity.

[0010] In order to prevent such interference with heat conduction, the heat generating portion 3 may be distributed and arranged in a portion which is separated from the outer peripheral surface of the rear nozzle assembly 2 and the inner peripheral surface of the chuck base 1 by a specified degree. However, in this case, the problem of insufficient overall heat conduction will arise due to the narrowing of the distribution area of ​​the heat generating portion 3.

[0011] Prior art literature

[0012] Patent Literature

[0013] Patent Document 1: Korean Patent Gazette No. 10-2186337 (November 27, 2020) Summary of the invention

[0014] In order to solve the above-mentioned problems in the prior art, an object of the present invention is to provide a substrate processing apparatus equipped with a heat generating unit, which can evenly transfer the radiant heat of the heat generating unit to the entire substrate.

[0015] In order to achieve the above-mentioned purpose, the substrate processing device equipped with a heating part of the present invention comprises: a chuck base, which can rotate around a rotation center axis, including a rotating chuck and a chuck support part, the rotating chuck is annular, and a chuck pin for supporting the substrate is arranged on the upper part, and the chuck support part is formed at the inner lower part of the rotating chuck; a rear nozzle assembly is arranged through a hollow part, and is used to spray a processing liquid onto the lower surface of the substrate, and the hollow part is formed at the center of the chuck base; a glass cover is arranged between the upper surface of the rotating chuck and the rear nozzle assembly when viewed from a top view, and a through hole is formed in the center to allow the rear nozzle assembly to pass through; and a heating part is located between the glass cover and the chuck support part, and is arranged on the inner side of the inner circumferential surface of the rotating chuck, when viewed from a top view, an inclined refractive surface of a specified width is formed on the glass cover to surround the through hole, and when viewed from a main sectional view, the inclined refractive surface is formed on the upper surface of the glass cover and is inclined upward along the radial direction with the rotation center axis as a reference.

[0016] The thickness of the glass cover sheet outside the inclined refractive surface along the radial direction is greater than that inside the inclined refractive surface.

[0017] The vertical line passing through the innermost heating portion passes through the inclined refractive surface.

[0018] The inclination angle of the inclined refractive surface decreases as the relative height between the glass cover and the rear nozzle assembly increases, and the inclination angle of the inclined refractive surface increases as the diameter of the rear nozzle assembly increases.

[0019] The inclination angle of the inclined refractive surface relative to the horizontal plane is in the range of 2 degrees to 10 degrees.

[0020] The width of the inclined refractive surface increases as the diameter of the rear nozzle assembly increases and as the relative height of the rear nozzle assembly relative to the glass cover increases.

[0021] An inclined heat generating portion inclined toward the inclined refractive surface is provided at a portion close to the rotation center axis of the heat generating portion.

[0022] The inclined heating portion has an inclination angle relative to a horizontal plane in a range of 2 to 15 degrees.

[0023] An inclined surface or an inclined step portion is formed at the upper end of the inner circumferential surface of the rotating chuck, which is inclined outward in the radial direction relative to the vertical line. When observed from the main cross-sectional view, the rotating chuck does not interfere with the reference line used to connect the edge of the substrate and the outermost position of the heating part.

[0024] The connecting surface connecting the starting end and the ending end of the above-mentioned inclined surface or inclined step portion constitutes a surface that is the same as the above-mentioned reference line or is more inclined toward the outer contour.

[0025] At least a portion of the rear nozzle assembly located inside the inclined refractive surface is made of a transparent material or a translucent material.

[0026] The above-mentioned rear nozzle assembly includes: a rear nozzle support shaft; a nozzle body, supported on the above-mentioned rear nozzle support shaft; a nozzle guard, arranged on the upper part of the above-mentioned nozzle body through a glass cover; and a rear nozzle, which is arranged to penetrate the above-mentioned rear nozzle support shaft, nozzle body and nozzle guard in the up and down directions, and the above-mentioned nozzle guard, nozzle body and rear nozzle are made of transparent material or translucent material.

[0027] The transparent material or translucent material used in a part of the above-mentioned rear nozzle assembly is selected from quartz, sapphire, fusible polytetrafluoroethylene (PFA, PerFluoroAlkoxy), and polytrifluorochloroethylene (PCTFE, PolyChloroTriFluoroEthylene).

[0028] The present invention of the above structure has the following effects, that is, since the present invention comprises: a chuck base, which can rotate around a rotation center axis, and comprises a rotating chuck and a chuck support portion, the rotating chuck is annular, and a chuck pin for supporting a substrate is arranged at the upper portion, and the chuck support portion is formed at the inner lower portion of the rotating chuck; a rear nozzle assembly, which is arranged through a hollow portion and is used to spray a processing liquid onto the lower surface of the substrate, and the hollow portion is formed at the center of the chuck base; a glass cover, which is arranged between the upper surface of the rotating chuck and the rear nozzle assembly when viewed from a top view, and a through hole is formed in the center to allow the rear nozzle assembly to pass through; and a heat generating The part is located between the glass cover and the chuck supporting part and is arranged on the inner side of the inner circumference of the rotating chuck. When observed from a top view, an inclined refractive surface of a specified width is formed on the glass cover to surround the through hole. When observed from a main sectional view, the inclined refractive surface is formed on the upper surface of the glass cover and is inclined upward along the radial direction with the above-mentioned rotation center axis as a reference. As a result, light incident on the glass cover from a heat-generating part such as a light-emitting diode can be refracted by the inclined refractive surface and irradiated to the center of the substrate without being interfered by the rear nozzle assembly arranged in the center. Therefore, there is an advantage of being able to uniformly transfer radiant heat to the entire substrate.

[0029] Furthermore, in the present invention, since the thickness of the glass cover sheet along the outer side of the inclined refractive surface along the radial direction is greater than the thickness on the inner side, there is an advantage that the present invention can be easily manufactured by simply cutting the flat glass cover sheet so that the periphery of the through hole is inclined.

[0030] Furthermore, in the present invention, since the vertical line passing through the innermost heating portion passes through the inclined refractive surface, the light irradiated from the inner heating portion is appropriately refracted outside the rear nozzle assembly, so that the radiant heat can be effectively transferred to the center of the substrate.

[0031] Furthermore, in the present invention, since an inclined heating portion inclined toward the inclined refractive surface is provided in a portion close to the rotation center axis of the heating portion, light incident from the heating portion can be bent more sharply toward the center of the substrate to further effectively heat the center of the substrate.

[0032] Furthermore, in the present invention, since an inclined surface or an inclined step portion inclined outwardly in the radial direction relative to a vertical line is formed on the upper end of the inner circumferential surface of the rotating chuck, when observed from the main sectional view, the rotating chuck and the reference line used to connect the edge of the substrate and the outermost position of the heat generating portion do not interfere with each other. Therefore, the radiant heat irradiated from the heat generating portion can be stably transferred to the edge of the substrate without being interfered by the corners on the upper end of the inner circumferential surface of the rotating chuck.

[0033] Furthermore, in the present invention, since at least a portion of the rear nozzle assembly located inside the inclined refractive surface is made of a transparent material or a translucent material, the transmitted light of the glass cover plate is not blocked by the rear nozzle assembly but is directly directed toward the center of the substrate, thereby allowing the entire substrate to be heated more evenly. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] Figure 1 The figure is a front cross-sectional view showing an example of a substrate processing apparatus equipped with a heat generating unit according to the prior art.

[0035] Figure 2 It is a three-dimensional view of the substrate processing apparatus of the present invention.

[0036] Figure 3 It is a main cross-sectional view of the substrate processing device of the present invention.

[0037] Figure 4 It is a top view of the substrate processing apparatus of the present invention.

[0038] Figure 5 FIG. 1 is a front cross-sectional view showing a substrate processing apparatus according to another embodiment of the present invention.

[0039] Figure 6 As an example Figure 3 A transverse cross-sectional view of the inclined surface and the inclined step portion shown. DETAILED DESCRIPTION

[0040] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

[0041] like Figures 2 to 4As shown, a substrate processing device 1000 equipped with a heating unit according to an embodiment of the present invention comprises: a chuck base 200, which can rotate around a rotation center axis A, and comprises a rotating chuck 210 and a chuck support portion 220, wherein the rotating chuck 210 is annular, and a chuck pin 250 for supporting a substrate W is arranged at the upper portion, and the chuck support portion 220 is formed at the inner lower portion of the rotating chuck 210; a rear nozzle assembly 400, which is arranged through a hollow portion 240 and is used to spray a processing liquid onto the lower surface of the substrate W, and the hollow portion 240 is formed at the center of the chuck base 200; a glass cover 500, which is arranged at the upper portion of the rotating chuck 210 when viewed from a top view. A through hole 510 is formed in the center between the upper surface of the rotating chuck 210 and the above-mentioned rear nozzle assembly 400, through which the above-mentioned rear nozzle assembly 400 passes; and a heating portion 600 is located between the above-mentioned glass cover 500 and the chuck support portion 220, and is arranged on the inner side of the inner circumference of the above-mentioned rotating chuck 210. When observed from a top view, an inclined refractive surface 520 of a specified width is formed on the above-mentioned glass cover 500 to surround the above-mentioned through hole 510. When observed from a main sectional view, the above-mentioned inclined refractive surface 520 is formed on the upper surface of the above-mentioned glass cover 500 and is inclined upward along the radial direction with the above-mentioned rotation center axis A as a reference.

[0042] Based on the above structure, the light incident from the above-mentioned heat generating portion 600 such as the light-emitting diode to the glass cover 500 can be refracted by the above-mentioned inclined refractive surface 520 and irradiated to the center of the substrate W without being interfered by the rear nozzle assembly 400 arranged in the center. Therefore, there is an advantage of being able to uniformly transfer radiant heat to the entire substrate W.

[0043] In this case, the thickness of the glass cover 500 outside the inclined refractive surface 520 along the radial direction may be greater than that inside, so that the flat glass cover 500 can be simply cut so as to be inclined around the through hole 510 .

[0044] Of course, in addition to the cutting process, the glass cover 500 with the inclined refractive surface 520 can also be formed in one step by using a mold.

[0045] When observed from the main cross-sectional view, the inclined refractive surface 520 may be a straight line, or a convex or concave curve.

[0046] Furthermore, the inclined refractive surface 520 may be formed directly from the through hole 510 or may be formed at a predetermined interval along the radial direction.

[0047] Furthermore, if the edge portion of the through hole 510 of the glass cover 500 is formed along the horizontal direction, interference with the rear nozzle assembly 400 can be blocked to the greatest extent, making it easier to insert the through hole 510 into a groove formed on the outer peripheral surface of the rear nozzle assembly 400.

[0048] On the other hand, if a vertical line passing through the innermost heating portion 600 passes through the inclined refractive surface 520, the light irradiated from the inner heating portion 600 is appropriately refracted outside the rear nozzle assembly 400, so that the radiant heat can be effectively transferred to the center of the substrate W.

[0049] The width W of the inclined refractive surface 520 can be set within an appropriate range through experiments. In particular, different widths W can be set based on the diameter of the rear nozzle assembly 400, the relative height between the glass cover 500 and the rear nozzle assembly 400, etc.

[0050] For example, the width W of the inclined refractive surface 520 increases with the diameter of the rear nozzle assembly 400 and with the relative height between the cover glass 500 and the rear nozzle assembly 400 , preferably so that the transmitted light is as close to the center of the substrate W as possible.

[0051] Moreover, in the case where the width W is too large, as the refraction ratio toward the rotation center axis A increases, it will be difficult to achieve uniform heating because the center side between the center of the substrate W and the outer peripheral surface is not sufficiently heated. In the case where the width W is too small, it will be difficult to achieve uniform heating because the center of the substrate W cannot be sufficiently heated.

[0052] Considering the above problems, preferably, the width W of the inclined refractive surface 520 is set within 1 / 20 to 1 / 10 of the diameter of the heating portion 600 , and may be slightly beyond this range.

[0053] Furthermore, preferably, the inclined refractive surface 520 has an inclination angle relative to the horizontal plane in a range of 2 to 10 degrees, so as to effectively transfer radiant heat to the center of the substrate W while avoiding interference from the rear nozzle assembly 400 .

[0054] If the inclined refractive surface 520 is a curve, it is regarded as representing the angle formed by its connecting line and the horizontal plane.

[0055] This depends on the relative height between the glass cover 500 and the rear nozzle assembly 400 and the diameter of the rear nozzle assembly 400 .

[0056] For example, the inclination angle α of the inclined refractive surface 520 (see Figure 5 ) decreases as the relative height between the glass cover 500 and the rear nozzle assembly 400 increases, so that the transmitted light can be irradiated to the center of the substrate W at a relaxed angle without being interfered by the rear nozzle assembly 400.

[0057] Furthermore, the inclination angle of the inclined refractive surface 520 increases as the diameter of the rear nozzle assembly 400 increases, so that the transmitted light can be irradiated to the center of the substrate W in an oblique direction.

[0058] On the other hand, preferably, at least a portion of the rear nozzle assembly 400 located on the inner side of the inclined refractive surface 520 is made of a transparent material or a translucent material, so that the transmitted light of the glass cover 500 is not blocked by the rear nozzle assembly 400 but is directly directed toward the center of the substrate W, thereby allowing the entire substrate W to be heated more evenly.

[0059] The transparent material or translucent material used for a part of the rear nozzle assembly 400 is selected from quartz, sapphire, fusible polytetrafluoroethylene (PFA, PerFluoroAlkoxy), and polytrifluorochloroethylene (PCTFE, PolyChloroTriFluoroEthylene).

[0060] For example, Figure 3 As shown, the rear nozzle assembly 400 may include: a rear nozzle support shaft 460; a nozzle body 480, supported on the rear nozzle support shaft 460; a nozzle guard 490, arranged on the upper part of the nozzle body 480 via a glass cover 500; and a rear nozzle 470, arranged to pass through the rear nozzle support shaft 460, the nozzle body 480 and the nozzle guard 490 in the up and down directions, and the nozzle guard 490, the nozzle body 480 and the rear nozzle 470 may be made of transparent material or translucent material.

[0061] And, if Figure 5 As shown, preferably, an inclined heating portion 630 inclined toward the inclined refractive surface 520 is provided at a portion close to the rotation center axis A of the heating portion 600 .

[0062] Thus, the light incident from the heating unit 600 can be bent more sharply toward the center of the substrate W, thereby heating the center of the substrate W more effectively.

[0063] In this case, preferably, the inclined heating portion 630 has an inclination angle β (refer to Figure 5 ) is in the range of 2 degrees to 15 degrees.

[0064] On the other hand, Figure 3 and Figure 6As shown, an inclined surface 215 or an inclined step portion 216 is formed at the upper end of the inner circumference of the rotating chuck 210, which is inclined outward along the radial direction relative to the vertical line. When observed from the main cross-sectional view, the rotating chuck 210 does not interfere with the reference line used to connect the edge of the substrate W and the outermost position of the heating part, so that the radiant heat irradiated from the heating part 600 can be stably transferred to the edge of the substrate W without being interfered by the upper edge corner of the inner circumference of the rotating chuck 210.

[0065] In this case, preferably, the connecting surface of the starting end and the ending end of the inclined surface 215 or the inclined step portion 216 is the same as the reference line or forms a surface that is more inclined toward the outer contour.

[0066] However, there is no need to particularly limit the angle of the connecting surface of the starting end and the ending end of the inclined surface 215 or the inclined step portion 216 relative to the rotation center axis.

[0067] like Figure 4 As shown, the inclined surface 215 may be formed discontinuously along the circumference of the chuck base 200 so as not to be interfered by the chuck pin 250 and the support portion 260 .

[0068] It should be understood that the embodiments of the present invention are merely examples, and a person skilled in the art can implement various modifications and other equivalent embodiments within the scope of protection claimed by the invention.

Claims

1. A substrate processing device equipped with a heating unit, characterized in that: include: A chuck base, which can rotate around a rotation center axis, comprises a rotating chuck and a chuck support portion, wherein the rotating chuck is annular and has a chuck pin for supporting a substrate disposed on the upper portion, and the chuck support portion is formed on the inner lower portion of the rotating chuck; a rear nozzle assembly, arranged through a hollow portion, for spraying a processing liquid toward a lower surface of the substrate, the hollow portion being formed at a center of the chuck base; A glass cover sheet, when viewed from above, is disposed between the upper surface of the spin chuck and the rear nozzle assembly, and has a through hole formed in the center thereof for passing the rear nozzle assembly; and The heating part is located between the glass cover and the chuck support part and is arranged inside the inner peripheral surface of the rotating chuck. When viewed from above, the glass cover is provided with an inclined refractive surface of a predetermined width to surround the through hole. When viewed from the front, the inclined refractive surface is formed on the upper surface of the glass cover and is inclined upward in a radial direction with respect to the rotation center axis.

2. The substrate processing device equipped with a heat generating unit according to claim 1, wherein: The vertical line passing through the innermost heating portion passes through the inclined refractive surface.

3. The substrate processing device equipped with a heat generating unit according to claim 2, wherein: The inclination angle of the inclined refractive surface decreases as the relative height between the glass cover and the rear nozzle assembly increases, and the inclination angle of the inclined refractive surface increases as the diameter of the rear nozzle assembly increases.

4. The substrate processing device equipped with a heat generating unit according to claim 3, characterized in that: The inclination angle of the inclined refractive surface relative to the horizontal plane is in the range of 2 degrees to 10 degrees.

5. The substrate processing device equipped with a heat generating unit according to claim 2, wherein: The width of the inclined refractive surface increases as the diameter of the rear nozzle assembly increases and as the relative height of the rear nozzle assembly relative to the glass cover increases.

6. The substrate processing device equipped with a heat generating unit according to any one of claims 1 to 5, characterized in that: An inclined heat generating portion inclined toward the inclined refractive surface is provided at a portion close to the rotation center axis of the heat generating portion.

7. The substrate processing device equipped with a heat generating unit according to claim 6, characterized in that: The inclined heating portion has an inclination angle relative to a horizontal plane in a range of 2 to 15 degrees.

8. The substrate processing device equipped with a heat generating unit according to any one of claims 1 to 5, characterized in that: An inclined surface or an inclined step portion is formed at the upper end of the inner circumferential surface of the rotating chuck, which is inclined radially outward relative to the vertical line. When viewed from the front, the rotating chuck does not interfere with the reference line connecting the edge of the substrate and the outermost position of the heating part.

9. The substrate processing device equipped with a heat generating unit according to claim 8, characterized in that: The connecting surface connecting the starting end and the ending end of the above-mentioned inclined surface or inclined step portion constitutes a surface that is the same as the above-mentioned reference line or is more inclined toward the outer contour.

10. The substrate processing device equipped with a heat generating unit according to claim 1, wherein: At least a portion of the rear nozzle assembly located inside the inclined refractive surface is made of a transparent material or a translucent material.

11. The substrate processing device equipped with a heat generating unit according to claim 10, wherein: The above-mentioned rear nozzle assembly comprises: rear nozzle support shaft; The nozzle body is supported on the rear nozzle support shaft; a nozzle guard, arranged on the upper part of the nozzle body through a glass cover; and The rear nozzle is arranged to penetrate the rear nozzle support shaft, the nozzle body and the nozzle guard in the up-down direction. The nozzle shield, nozzle body and rear nozzle are made of transparent material or translucent material.

12. The substrate processing device equipped with a heat generating unit according to claim 10 or 11, characterized in that: The transparent material or translucent material used in a part of the above-mentioned rear nozzle assembly is selected from quartz, sapphire, fusible polytetrafluoroethylene, and polychlorotrifluoroethylene.

Images