Tunnel type drying device of groove type equipment cleaning machine
Through the tunnel structure and the design of the chain conveyor belt, uniform drying of the flower basket and silicon wafer is achieved, solving the problems of dead corners of hot air and water droplets in the drying tank, improving production capacity and reducing energy consumption.
Patent Information
- Application Number
- CN202420697855.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-07
- Publication Date
- 2024-12-06
- Estimated Expiration
- 2034-04-07
AI Technical Summary
There are dead corners of hot air blowing during the drying process of existing tank equipment, resulting in residual water droplets at the bottom of the flower basket, affecting the cleanliness of subsequent processes, and the drying time is long, affecting production capacity.
Using a tunnel structure instead of the traditional drying tank, the flower basket and silicon wafer are uniformly dried through the chain conveyor belt, and the water droplet residue is reduced by using the lower-up blowing and angle control (30°-60°), and the water droplet residue is reduced through brushes and water trays. Clean the structure to reduce impurities and water droplet residue.
Shorten the drying time to 500S, improve production capacity, avoid water droplet residue, reduce the number of robots, reduce the risk of silicon wafer crushing, reduce energy consumption, and simplify structural and material costs.
Smart Images
Figure CN222123874U_ABST
Abstract
Description
Technical Field
[0001] The utility model belongs to the technical field of trough type equipment cleaning machines, in particular to a tunnel type drying device for trough type equipment cleaning machines. Background Art
[0002] The main raw material used to make silicon semiconductor circuits is silicon wafers, which are widely used in chip manufacturing. When processing silicon wafers, the equipment will use flower baskets to store, transport, clean, and dry silicon wafers. It is easy to use, economical and reliable. The flower baskets used for silicon wafer transportation will have dirt during use. Dirt sticking to the silicon wafers will cause quality problems for subsequent products, so the flower baskets need to be cleaned.
[0003] The equipment used to clean the flower baskets will be integrated into the silicon wafer production line, and a drying tank is used for drying. At present, the mainstream equipment on the market is that the robot 1 on the production line moves the cleaned flower baskets and the silicon wafers in the flower baskets to the drying tank for drying, so that the silicon wafers and flower baskets can be dried simultaneously in the same tank, and the drying time is set to 600s. Most drying structures require 600S drying, but after 600S, there will be a small amount of water droplets on the bottom of the flower basket in the drying tank, which will bring cleanliness risks to the next process.
[0004] In addition, the industry uses a flower basket to dehydrate silicon wafers in the drying tank, and the silicon wafers are placed vertically in the flower basket. The flower basket is stationary inside the tank, and hot air is blown into the drying tank for drying. However, this blowing method has dead corners, resulting in residual water droplets on the bottom rod of the flower basket, affecting the next process. Utility Model Content
[0005] In order to solve the problems in the related technology, the present application provides a tunnel drying device for a trough-type equipment cleaning machine, which adopts a tunnel structure instead of a drying trough structure. The structural design is simple, and the material cost and production cost are greatly reduced. At the same time, the flower basket on the chain can achieve uniform blowing up and down as the chain moves. There is no dead corner for hot air blowing silicon wafers, the drying time is reduced to 500S, the production capacity is improved, and there will be no residual water droplets, which solves the problems mentioned in the background technology.
[0006] The technical solution of this application is as follows:
[0007] A tunnel drying device for a trough type equipment cleaning machine is installed in the trough type equipment cleaning machine, and the trough type equipment cleaning machine is equipped with a loading manipulator corresponding to the tunnel drying device and a unloading rack corresponding to the tunnel drying device; the tunnel drying device comprises: a drying frame; a tunnel type shell installed on the upper part of the drying frame; a conveying mechanism arranged on the drying frame, the conveying mechanism comprises a conveying power unit installed on the drying bracket, and two rows of rollers are arranged in sequence on the drying frame; a conveyor belt is wound around the conveying power unit and the two rows of rollers; a cleaning structure corresponding to the conveyor belt mechanism is installed on the drying frame; a plurality of drying mechanisms arranged in sequence on the drying frame and corresponding to the conveyor belt; the drying mechanism comprises: a hot air mechanism installed on the drying frame; a hot air pipeline connected to the hot air mechanism; a lower drying unit arranged at the lower part of the conveyor belt on the drying frame and an upper drying unit above the conveyor belt; the upper drying unit and the lower drying unit are connected to the hot air pipeline.
[0008] Furthermore, the hot air mechanism includes: a drying rack installed on the drying rack; a high-efficiency filter installed on the upper part of the drying rack; a PTC heater connected to the high-efficiency filter; a blower connected to the PTC heater, and the blower is connected to the hot air pipeline.
[0009] Furthermore, the lower drying unit includes a lower blowing box installed on the drying bracket, and a plurality of lower blowing pipes with openings facing the bottom of the conveyor belt are installed in the lower blowing box; each of the lower blowing pipes is connected to a hot air pipeline; and a lower wind speed regulating valve is installed on the hot air pipeline.
[0010] Furthermore, the upper drying unit comprises an upper exhaust box installed on the drying bracket, an upper exhaust duct is installed in the upper exhaust box; and the upper exhaust duct is connected to a high-efficiency filter.
[0011] Furthermore, the conveying power unit adopts a conveying motor, and the conveyor belt adopts a chain; sprockets are provided on both sides of the roller shaft; the number of the chains is two, which are respectively engaged with two rows of sprockets; the conveying motor is transmission-connected to one of the roller shafts.
[0012] Furthermore, the tunnel-type shell is provided with an upper gate and a lower gate respectively according to the moving direction of the conveyor belt.
[0013] Furthermore, the cleaning structure is a plurality of brushes installed at the lower part of the drying bracket and located below the tunnel-type housing, and the brushes clean the outer surface of the conveyor belt.
[0014] Furthermore, a long strip of water receiving tray is installed at the lower part of the drying bracket and between the annular conveyor belts.
[0015] By adopting the above technical solution, compared with the prior art, the beneficial effects of the utility model are:
[0016] 1. The present invention adopts a tunnel structure instead of a drying trough structure to dry the flower basket and the silicon wafers loaded in the flower basket. The flower basket can be blown evenly up and down as the chain moves on the chain. There is no dead corner for hot air blowing silicon wafers, the drying time is reduced to 500S, there will be no residual water droplets, and the production capacity is improved.
[0017] 2. The present invention realizes that the wind blowing direction is from bottom to top in the tunnel structure, and the angle can be controlled at 30°-60°. The bottom rod of the flower basket can be blown dry first, and the next process can be carried out normally without rework or secondary processing.
[0018] 3. The present invention adopts a tunnel structure to replace the drying tank structure, which has a simple structural design and greatly reduces material costs and production costs.
[0019] 4. The present invention adopts a tunnel structure and achieves the effect of transportation through chains, which can save a manipulator, reduce a lifting and lowering action, and reduce the risk of silicon wafer breakage. The tunnel space of the present invention is smaller than that of the traditional drying tank, so the heat loss is small, which can reduce the drying energy consumption.
[0020] It should be understood that the above general description and the following detailed description are merely exemplary and do not limit the present invention. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] The accompanying drawings herein are incorporated in and constitute a part of the specification, illustrate embodiments consistent with the present utility model, and together with the description, are used to explain the principles of the present utility model.
[0022] Figure 1 It is a schematic diagram of the overall structure of the utility model.
[0023] Figure 2 It is a schematic diagram of the front structure of the utility model.
[0024] Figure 3 It is a schematic diagram of the front structure of the utility model. DETAILED DESCRIPTION
[0025] The following is a description of the implementation of the present invention by means of specific embodiments. People familiar with the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification.
[0026] See also Figure 1-3It should be noted that the structures, proportions, sizes, etc. illustrated in the drawings in this specification are only used to match the contents disclosed in the specification for people familiar with this technology to understand and read, and are not used to limit the limiting conditions for the implementation of the utility model, so they have no substantial technical significance. Any modification of the structure, change in the proportion relationship, or adjustment of the size should still fall within the scope of the technical content disclosed by the utility model without affecting the effects and purposes that can be achieved by the utility model. At the same time, the terms such as "upper", "lower", "left", "right", "middle" and "one" quoted in this specification are only for the convenience of description, and are not used to limit the scope of the implementation of the utility model. The change or adjustment of their relative relationship should also be regarded as the scope of the implementation of the utility model without substantially changing the technical content.
[0027] Example
[0028] like Figure 1-3 As shown, this embodiment provides a tunnel drying device for a tank-type equipment cleaning machine, which is installed in the tank-type equipment cleaning machine, and the tank-type equipment cleaning machine is equipped with a loading manipulator 1 corresponding to the tunnel drying device, and a material unloading rack 15 corresponding to the tunnel drying device. In order to facilitate unloading, the unloading rack 15 is provided with a photoelectric counting device, a material platform lifting component 16 and a weighing platform 17.
[0029] The tunnel drying device includes a drying frame, a tunnel housing installed on the upper part of the drying frame, and a conveying mechanism installed on the drying frame. The conveying mechanism includes a conveying power unit installed on the drying bracket, and two rows of rollers are arranged in sequence on the drying frame. A conveyor belt 5 is wound around the conveying power unit and the two rows of rollers. The conveying power unit adopts a conveying motor, and the conveyor belt 5 adopts a chain. Sprockets are provided on both sides of the roller; the number of the chains is two, which are respectively engaged with the two rows of sprockets. The conveying motor is connected to one of the rollers. The tunnel housing is provided with an upper gate 9 and a lower gate 14 according to the movement direction of the conveyor belt. The flower basket 8 is installed on the chain and passes through the tunnel housing during transportation for drying.
[0030] The drying rack is equipped with a cleaning structure corresponding to the chain. The cleaning structure is a plurality of brushes 6 installed at the bottom of the drying bracket and located below the tunnel-type housing. The brushes clean the outer surface of the conveyor belt. A long water receiving tray 7 is installed at the bottom of the drying bracket and between the annular conveyor belts. The brushes can clean the debris on the chain, and the water receiving tray can hold the water droplets blown off the flower basket and silicon wafers, which cannot flow to other locations.
[0031] A plurality of drying mechanisms are sequentially arranged on the drying rack and correspond to the conveyor belt. The drying mechanism includes a hot air mechanism installed on the drying rack, a hot air pipeline connected to the hot air mechanism, a lower drying unit arranged below the conveyor belt on the drying rack, and an upper drying unit above the conveyor belt. The upper drying unit and the lower drying unit are connected to the hot air pipeline 2.
[0032] The hot air mechanism includes a drying rack installed on the drying machine frame, a high-efficiency filter 3 installed on the upper part of the drying rack, a PTC heater 13 connected to the high-efficiency filter 3, a blower 10 connected to the PTC heater 13, and the blower 10 is connected to the hot air pipeline 2.
[0033] The lower drying unit comprises a lower blowing box 11 mounted on the drying bracket, wherein a plurality of lower blowing pipes with openings facing the bottom of the conveyor belt are installed in the lower blowing box 11. Each lower blowing pipe is connected to the hot air pipeline 2. A lower wind speed regulating valve 12 is installed on the hot air pipeline.
[0034] The upper drying unit comprises an upper exhaust box 4 mounted on the drying bracket, and an upper exhaust duct is installed in the upper exhaust box 4; the upper exhaust duct is connected to the high-efficiency filter 3.
[0035] Working process: Robot 1 moves the flower basket and silicon wafers from the previous process to the pre-dehydration area and places them on the chain. The chain can be designed with a limit block to prevent the flower basket from moving a long distance. The water on the flower basket drips into the water receiving tray. The water receiving tray is placed at an angle, and the dripping water will be drained along the pipeline.
[0036] The chain starts to move under the drive of the conveying motor, and the upper gate starts to rise to ensure that there is enough space for the flower basket to pass through. The chain continues to move, and when the flower basket is completely in the tunnel shell, the upper gate starts to drop to make the entire drying area in a relatively closed space. When the chain is running, the brush will continue to wipe the chain to keep the chain clean.
[0037] The flower basket is transported to the drying area, and the blower 10 exhausts the drying area through the upper exhaust box 8, and the temperature is quickly increased through the PTC heater 13. The PTC heater 13 has a built-in temperature measuring needle to monitor the temperature in real time. The heated wind is transmitted to the high-efficiency filter to filter the hot air and remove impurities, and then the hot air pipe enters from both sides of the lower blowing box respectively. The lower blowing box is equipped with a wind speed regulating valve to control the wind speed. The air intake is controlled and adjusted through the lower blowing box and the lower blowing pipe to achieve the effect of oblique blowing of the wind flow. According to experiments, it can be known that the angle can be controlled at 30°-60°. The wind from the lower blowing pipe blows toward the flower basket and silicon wafer, and then is promptly extracted by the upper exhaust box. This reciprocating hot air cycle is formed. The hot air blown out of the lower blowing box will take away the water attached to the flower basket and silicon wafer, indirectly increasing the humidity content in the circulating hot air, so an additional dehumidification function needs to be designed in the drying area. The circulating air continues to dry the flower basket and silicon wafer, and the drying is completed at the lower gate 17.
[0038] After the flower basket is dried, it is transported by a chain to the unloading table. The photoelectric counting device on the unloading table senses the position of the flower basket to detect whether the flower basket is in place. The lifting component of the material table lifts the flower basket and transports it to the weighing table for weighing, and then places it for unloading to be automatically grabbed and docked.
[0039] The present invention adopts a tunnel structure instead of a drying trough structure to dry the flower basket and the silicon wafers loaded in the flower basket. The flower basket can be blown evenly up and down as the chain moves on the chain. There is no dead corner for hot air blowing the silicon wafers, the drying time is reduced to 500S, no water droplets remain, and the production capacity is improved.
[0040] The present invention realizes that the wind blowing direction is from bottom to top in the tunnel structure, and the angle can be controlled within 30°-60°, so the bottom rod of the flower basket can be blown dry first, and the next process can be carried out normally without rework or secondary processing.
[0041] The present invention adopts a tunnel structure to replace a drying tank structure, has a simple structural design, and greatly reduces material costs and manufacturing costs.
[0042] The present invention adopts a tunnel structure and achieves the effect of transportation through a chain, which can save a manipulator, reduce a lifting and lowering action, and reduce the risk of silicon wafer breakage. The tunnel space of the present invention is smaller than that of a traditional drying tank, so the heat loss is small and the drying energy consumption can be reduced.
[0043] Those skilled in the art will readily appreciate other embodiments of the present invention after considering the specification and practicing the present invention. This application is intended to cover any variations, uses, or adaptations of the present invention that follow the general principles of the present invention and include common knowledge or customary techniques in the art that are not present in the present invention. The specification and examples are intended to be exemplary only, and the true scope and spirit of the present invention are indicated by the appended claims.
[0044] It should be understood that the present invention is not limited to the precise structure described above and shown in the drawings, and various modifications and changes can be made without departing from its scope. The scope of the present invention is limited only by the appended claims.
Claims
1. A tunnel drying device for a tank-type equipment cleaning machine, which is installed in the tank-type equipment cleaning machine, and the tank-type equipment cleaning machine is equipped with a loading manipulator corresponding to the tunnel drying device and a unloading rack corresponding to the tunnel drying device; It is characterized in that The tunnel drying device comprises: Drying rack; A tunnel-type housing installed on the upper part of the drying machine frame; A conveying mechanism is arranged on the drying rack, the conveying mechanism comprises a conveying power unit installed on the drying bracket, and two rows of rollers are arranged in sequence on the drying rack; a conveying belt is wound around the conveying power unit and the two rows of rollers; a cleaning structure corresponding to the conveying belt mechanism is installed on the drying rack; A plurality of drying mechanisms are sequentially arranged on the drying rack and correspond to the conveyor belt; the drying mechanism comprises: A hot air mechanism installed on the drying rack; A hot air pipeline connected to the hot air mechanism; A lower drying unit is arranged on the drying machine frame below the conveyor belt, and an upper drying unit is arranged on the conveyor belt; the upper drying unit and the lower drying unit are connected to the hot air pipeline.
2. The tunnel drying device for a tank type equipment cleaning machine according to claim 1, It is characterized in that The hot air mechanism comprises: a drying rack mounted on the drying rack; A high efficiency filter is installed on the upper part of the drying rack; a PTC heater in communication with the high efficiency filter; A blower is connected to the PTC heater, and the blower is connected to the hot air pipeline.
3. The tunnel drying device for a tank type equipment cleaning machine according to claim 1, It is characterized in that The lower drying unit includes a lower blowing box installed on the drying bracket, and a plurality of lower blowing pipes with openings facing the bottom of the conveyor belt are installed in the lower blowing box; each of the lower blowing pipes is connected to a hot air pipeline; and a lower wind speed regulating valve is installed on the hot air pipeline.
4. The tunnel drying device for a tank type equipment cleaning machine according to claim 1, It is characterized in that The upper drying unit comprises an upper exhaust box installed on the drying bracket, an upper exhaust duct is installed in the upper exhaust box; the upper exhaust duct is connected to a high efficiency filter.
5. The tunnel drying device for a tank type equipment cleaning machine according to claim 1, It is characterized in that The conveying power unit adopts a conveying motor, and the conveying belt adopts a chain; sprockets are provided on both sides of the roller shaft; The number of the chains is two, which are respectively engaged with two rows of sprockets; the conveying motor is transmission-connected to one of the roller shafts.
6. The tunnel drying device for a tank type equipment cleaning machine according to claim 1, It is characterized in that The tunnel-type shell is provided with an upper gate and a lower gate respectively according to the moving direction of the conveyor belt.
7. The tunnel drying device for a tank type equipment cleaning machine according to claim 1, It is characterized in that The cleaning structure is a plurality of brushes installed at the lower part of the drying support and located below the tunnel-type housing, and the brushes clean the outer surface of the conveyor belt.
8. The tunnel drying device for a tank type equipment cleaning machine according to claim 1, It is characterized in that A long strip water receiving tray is installed at the lower part of the drying bracket and between the annular conveyor belts.