Piezoresistor chip polishing and chamfering device

Abstract

The utility model relates to the field of resistor chip polishing and chamfering, and discloses a piezoresistor chip polishing and chamfering device which comprises a clamping structure, a chamfering structure and a polishing structure, the chamfering structure is located on one side of the clamping structure, and the polishing structure is located on the top of the clamping structure; and the clamping structure comprises a fixing disc, a groove is formed in the surface of the fixing disc, a telescopic spring is fixedly connected to the interior of the groove, a clamping rod is fixedly connected to the left end of the telescopic spring, and a clamping device is fixedly connected to the bottom of the clamping rod. According to the utility model, through the arrangement of the fixing disc, the clamping rod and the telescopic spring, the piezoresistor chip is placed on the upper surface of the fixing disc, and the clamping device is started to enable the clamping rod to carry out clamping motion on the piezoresistor chip through the telescopic spring, so that the piezoresistor chip is fixed. And polishing and chamfering are more convenient. The working efficiency is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of polishing and chamfering of resistor patches, in particular to a polishing and chamfering device for varistor patches. Background Art

[0002] Chip varistors refer to resistor devices with nonlinear volt-ampere characteristics. They are mainly used for voltage clamping when the circuit is subjected to overvoltage, absorbing excess current to protect sensitive devices. The resistance material of chip varistors is semiconductor, which is a variety of semiconductor resistors. The "zinc oxide" (ZnO) varistor, which is now widely used, is mainly composed of divalent element zinc (Zn) and hexavalent element oxygen (O). Therefore, from the perspective of materials, zinc oxide varistor is a "II-VI group oxide semiconductor". In Taiwan, China, chip varistors are called "surge absorbers" and also called "electrical shock (surge) suppressors (absorbers)". Chip varistors are voltage-limiting protection devices. Using the nonlinear characteristics of chip varistors, when overvoltage appears between the two poles of the chip varistor, the chip varistor can clamp the voltage at a relatively fixed voltage value to achieve protection of the subsequent circuit. The main parameters of chip varistors are: varistor voltage, current capacity, junction capacitance, response time, etc. The difference between varistors and ordinary resistors is that ordinary resistors must show a linear relationship according to Ohm's law, while the voltage and current of high-quality chip varistors show a very special nonlinear relationship. When the voltage applied to the two ends of a reliable chip varistor is lower than the nominal rated voltage, its resistance value can almost reach infinity. Once the resistance of the resistor is very large, the current flowing through it will be very small.

[0003] Most of the manufacturing processes of chip varistors are as follows: first stacking, then cutting, then debinding, then sintering, then chamfering, then coating, and terminal electrodes, and finally finishing by electroplating.

[0004] The existing varistor patch polishing and chamfering device cannot clamp and fix the varistor patch, resulting in low work efficiency. Therefore, the utility model provides a varistor patch polishing and chamfering device. Utility Model Content

[0005] In order to solve the above technical problems, the utility model provides a varistor patch polishing and chamfering device.

[0006] The utility model is implemented by the following technical scheme: a varistor patch polishing and chamfering device, comprising a clamping structure, a chamfering structure and a polishing structure, wherein the chamfering structure is located on one side of the clamping structure, and the polishing structure is located on the top of the clamping structure;

[0007] The clamping structure comprises a fixed plate, a surface of which is provided with a groove, the interior of the groove is fixedly connected with a telescopic spring, the left end of the telescopic spring is fixedly connected with a clamping rod, and the bottom of the clamping rod is fixedly connected with a clamping device.

[0008] As a further improvement of the above solution, the groove is arranged as a cross-shaped structure, and the number of the telescopic springs and the clamping rods is four and they are symmetrically distributed left to right and up to down.

[0009] Through the above technical solution, the varistor patch is placed on the upper surface of the fixed plate, and the clamping device is started so that the clamping rod clamps the varistor patch through the telescopic spring, thereby fixing the varistor patch. This makes polishing chamfers more convenient and improves work efficiency.

[0010] As a further improvement of the above scheme, the chamfering structure includes a support frame, a first groove is provided on the surface of the support frame, a guide rod is fixedly connected to the inside of the first groove, a sleeve is sleeved on the surface of the guide rod, an adjusting rod is fixedly connected to one side of the sleeve, a second groove is provided on one side of the first groove, a first cylinder is provided inside the second groove, a first telescopic rod is fixedly connected to the left end of the first cylinder, and a grinding disc is fixedly connected to the left end of the first telescopic rod.

[0011] As a further improvement of the above solution, two support frames are provided and are symmetrically arranged with the fixed disk as the axis, and the first groove and the second groove are arranged as a connected structure.

[0012] As a further improvement of the above solution, the first cylinder is arranged on the surface of the sleeve, and the guide rod, sleeve, adjustment rod, first cylinder, first telescopic rod and grinding disc are each provided with two and are arranged symmetrically on the left and right.

[0013] Through the above technical solution, the varistor patch is clamped firmly, and by adjusting the height of the adjusting rod, the sleeve moves up and down following the guide rod, thereby driving the first cylinder to move up and down, so that the grinding disc is flush with the varistor patch, and then the first telescopic rod is extended left and right to perform grinding and chamfering.

[0014] As a further improvement of the above solution, the polishing structure includes a workbench, a second cylinder is arranged on the top of the workbench, a second telescopic rod is fixedly connected to the bottom of the second cylinder, and a polishing disc is fixedly connected to the bottom of the second telescopic rod.

[0015] As a further improvement of the above solution, the fixing plate is fixedly connected to the upper surface of the workbench. The second cylinder is arranged on the top of the supporting frame.

[0016] Through the above technical solution, the second cylinder drives the second telescopic rod to make the polishing disc move up and down, so that the polishing work is performed.

[0017] Compared with the prior art, the beneficial effects of the present invention are:

[0018] The utility model arranges a fixing plate, a clamping rod and a telescopic spring, places the varistor patch on the upper surface of the fixing plate, and starts the clamping device to make the clamping rod clamp the varistor patch through the telescopic spring, thereby fixing the varistor patch. This makes polishing and chamfering more convenient and improves work efficiency.

[0019] The utility model clamps a stable varistor patch by setting an adjustment rod, a guide rod, a first cylinder and a second cylinder. By adjusting the height of the adjustment rod, the sleeve moves up and down following the guide rod, thereby driving the first cylinder to move up and down, so that the grinding disc is flush with the varistor patch, and then the first telescopic rod is extended left and right to grind and chamfer. The second cylinder drives the second telescopic rod to make the polishing disc move up and down, so that polishing work can be performed. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0021] Figure 2 This is a schematic diagram of the overall cross-sectional structure of the utility model;

[0022] Figure 3 For this utility model Figure 2 A schematic diagram of the enlarged structure of the middle part A;

[0023] Figure 4 It is a schematic diagram of the overall structure of the utility model;

[0024] Figure 5 For this utility model Figure 4 Schematic diagram of the enlarged structure of part B in the middle.

[0025] Description of main symbols:

[0026] 1. Clamping structure; 101. Fixed plate; 102. Groove; 103. Telescopic spring; 104. Clamping rod; 105. Clamping device; 2. Chamfering structure; 201. Support frame; 202. First groove; 203. Guide rod; 204. Sleeve; 205. Adjusting rod; 206. Second groove; 207. First cylinder; 208. First telescopic rod; 209. Grinding disc; 3. Polishing structure; 301. Workbench; 302. Second cylinder; 303. Second telescopic rod; 304. Polishing disc. DETAILED DESCRIPTION

[0027] The present invention is further described below in conjunction with the accompanying drawings and specific implementation methods. It should be noted that, under the premise of no conflict, the various embodiments or technical features described below can be arbitrarily combined to form a new embodiment.

[0028] Example:

[0029] Please combine Figure 1-5 A varistor patch polishing and chamfering device of this embodiment includes a clamping structure 1, a chamfering structure 2 and a polishing structure 3, wherein the chamfering structure 2 is located on one side of the clamping structure 1, and the polishing structure 3 is located on the top of the clamping structure 1;

[0030] The clamping structure 1 includes a fixed plate 101, a surface of which is provided with a groove 102, an interior of the groove 102 is fixedly connected with a telescopic spring 103, a left end of the telescopic spring 103 is fixedly connected with a clamping rod 104, and a bottom of the clamping rod 104 is fixedly connected with a clamping device 105.

[0031] The groove 102 is set to a cross-shaped structure, and the number of telescopic springs 103 and clamping rods 104 is set to four, and they are symmetrically distributed left and right and up and down. The varistor patch is placed on the upper surface of the fixed plate 101, and the clamping device 105 is started so that the clamping rod 104 clamps the varistor patch through the telescopic spring 103, thereby fixing the varistor patch. This makes polishing chamfers more convenient and improves work efficiency.

[0032] The chamfering structure 2 includes a support frame 201, a first groove 202 is provided on the surface of the support frame 201, a guide rod 203 is fixedly connected inside the first groove 202, a sleeve 204 is sleeved on the surface of the guide rod 203, an adjusting rod 205 is fixedly connected to one side of the sleeve 204, a second groove 206 is opened on one side of the first groove 202, a first cylinder 207 is provided inside the second groove 206, a first telescopic rod 208 is fixedly connected to the left end of the first cylinder 207, and a grinding disc 209 is fixedly connected to the left end of the first telescopic rod 208.

[0033] Two support frames 201 are provided and are symmetrically arranged with the fixing plate 101 as the axis. The first groove 202 and the second groove 206 are arranged as a connected structure.

[0034] The first cylinder 207 is arranged on the surface of the sleeve 204, and the guide rod 203, the sleeve 204, the adjustment rod 205, the first cylinder 207, the first telescopic rod 208 and the grinding disc 209 are each provided with two and are arranged symmetrically. The varistor patch is clamped firmly, and the sleeve 204 moves up and down following the guide rod 203 by adjusting the height of the adjustment rod 205, thereby driving the first cylinder 207 to move up and down, so that the grinding disc 209 is flush with the varistor patch, and then the first telescopic rod 208 is extended left and right to grind and chamfer.

[0035] The polishing structure 3 comprises a workbench 301 , a second cylinder 302 is arranged on the top of the workbench 301 , a second telescopic rod 303 is fixedly connected to the bottom of the second cylinder 302 , and a polishing disc 304 is fixedly connected to the bottom of the second telescopic rod 303 .

[0036] The fixed plate 101 is fixedly connected to the upper surface of the workbench 301. The second cylinder 302 is arranged on the top of the support frame 201. The second cylinder 302 drives the second telescopic rod 303 to make the polishing plate 304 move up and down, so as to perform the polishing work.

[0037] The implementation principle of a varistor patch polishing and chamfering device in the embodiment of the present application is as follows: place the varistor patch on the upper surface of the fixed plate 101, start the clamping device 105 so that the clamping rod 104 clamps the varistor patch through the telescopic spring 103, thereby fixing the varistor patch. Makes polishing and chamfering more convenient. Improves work efficiency. Clamp the stable varistor patch, and by adjusting the height of the adjusting rod 205, the sleeve 204 moves up and down following the guide rod 203, thereby driving the first cylinder 207 to move up and down, so that the grinding disc 209 is flush with the varistor patch, and then the first telescopic rod 208 is extended left and right to perform grinding and chamfering. The second telescopic rod 303 is driven by the second cylinder 302, so that the polishing disc 304 moves up and down, so that polishing work is performed.

[0038] The above-mentioned implementation modes are only preferred implementation modes of the present invention, and cannot be used to limit the protection scope of the present invention. Any non-substantial changes and substitutions made by technicians in this field on the basis of the present invention shall fall within the scope of protection required by the present invention.

Claims

1. A varistor patch polishing and chamfering device, characterized in that: It comprises a clamping structure (1), a chamfering structure (2) and a polishing structure (3), wherein the chamfering structure (2) is located on one side of the clamping structure (1), and the polishing structure (3) is located on the top of the clamping structure (1); The clamping structure (1) comprises a fixed disk (101), a groove (102) is provided on the surface of the fixed disk (101), a telescopic spring (103) is fixedly connected inside the groove (102), a clamping rod (104) is fixedly connected to the left end of the telescopic spring (103), and a clamping device (105) is fixedly connected to the bottom of the clamping rod (104).

2. A varistor patch polishing and chamfering device as claimed in claim 1, characterized in that: The groove (102) is arranged in a cross-shaped structure, and the telescopic springs (103) and the clamping rods (104) are arranged in four in number and are symmetrically distributed leftwards and rightwards and upwards and downwards.

3. A varistor patch polishing and chamfering device as claimed in claim 1, characterized in that: The chamfering structure (2) comprises a support frame (201), a first groove (202) is provided on the surface of the support frame (201), a guide rod (203) is fixedly connected inside the first groove (202), a sleeve (204) is sleeved on the surface of the guide rod (203), an adjustment rod (205) is fixedly connected to one side of the sleeve (204), a second groove (206) is provided on one side of the first groove (202), a first cylinder (207) is provided inside the second groove (206), a first telescopic rod (208) is fixedly connected to the left end of the first cylinder (207), and a grinding disc (209) is fixedly connected to the left end of the first telescopic rod (208).

4. A varistor patch polishing and chamfering device as claimed in claim 3, characterized in that: Two support frames (201) are provided and are arranged symmetrically with the fixed plate (101) as the axis, and the first groove (202) and the second groove (206) are arranged as a connected structure.

5. A varistor patch polishing and chamfering device as claimed in claim 3, characterized in that: The first cylinder (207) is arranged on the surface of the sleeve (204), and the guide rod (203), the sleeve (204), the adjustment rod (205), the first cylinder (207), the first telescopic rod (208) and the grinding disc (209) are each provided with two and are arranged symmetrically on the left and right.

6. A varistor patch polishing and chamfering device as claimed in claim 1, characterized in that: The polishing structure (3) comprises a workbench (301), a second cylinder (302) is arranged on the top of the workbench (301), a second telescopic rod (303) is fixedly connected to the bottom of the second cylinder (302), and a polishing disc (304) is fixedly connected to the bottom of the second telescopic rod (303).

7. A varistor patch polishing and chamfering device as claimed in claim 6, characterized in that: The fixed plate (101) is fixedly connected to the upper surface of the workbench (301), and the second cylinder (302) is arranged on the top of the support frame (201).

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