SHUTTER plate anti-pollution device for electron beam evaporation table
By designing a double-layer SHUTTER plate and transmission system on the electron beam evaporation table, the problems of protection and coverage area adjustment of the crucible upper end are solved, and effective pollution prevention and improvement of the metal source is achieved.
Patent Information
- Application Number
- CN202323101361.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2023-11-17
- Publication Date
- 2024-12-13
- Estimated Expiration
- 2033-11-17
AI Technical Summary
The existing electron beam evaporation table lacks protection devices on the upper end of the crucible, and the SHUTTER plate covers a single area and cannot be adjusted according to different metal sources, resulting in pollution and low working efficiency.
An anti-pollution device including a double-layer SHUTTER plate is designed to adjust the intermediate clearance area by rotating the upper and lower plates, and combining the hinge base and transmission gear system to achieve convenient adjustment and coverage area adjustment of the SHUTTER plate.
It effectively prevents splashing and contamination of metal sources inside the crucible, and improves the working efficiency of the evaporation table, adapts to the coverage needs of different metal sources.
Smart Images

Figure CN222160332U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of evaporation table equipment, in particular to a SHUTTER plate anti-pollution device for an electron beam evaporation table. Background Art
[0002] The electron beam evaporation table is a nuclear instrument used in the field of physics. It is a device used for vacuum coating and can be used for a variety of metals, alloys, and non-metallic evaporation coatings. It can support the installation of multifunctional evaporation tables for electron beam evaporation and thermal evaporation at the same time. It uses electron beams to directly heat the evaporated material under vacuum and transport it to the substrate to form a thin film. Because the melting point and boiling point of some metal sources inside the electron beam evaporation table are close, it is easy to cause contamination to the outside of the crucible, so a SHUTTER plate mechanism is needed to better prevent product contamination.
[0003] The prior art also has the following defects during use:
[0004] 1. The upper end of the crucible inside the evaporation table in the prior art lacks a conveniently adjustable SHUTTER plate anti-pollution device that can protect the crucible surface. If the upper end of the crucible is not protected, the melting of the metal source inside the crucible may occur simultaneously with boiling, and it is easy to splash outside the crucible to cause a certain degree of pollution to the equipment inside the evaporation table, which is not conducive to the protection of the equipment;
[0005] 2. The SHUTTER plates of the evaporation tables in the prior art are mostly single-layered with a relatively single coverage area, which cannot better adjust the coverage area on the upper end of the crucible, cannot better select different coverage areas according to different metal sources, and cannot quickly adjust the coverage area, which is not conducive to better promoting the operation of the electron beam evaporation table.
[0006] In view of this, we propose a SHUTTER plate anti-pollution device for electron beam evaporation table to solve the existing problems. Utility Model Content
[0007] The utility model aims to provide a SHUTTER plate anti-pollution device for an electron beam evaporation table to solve the problems raised in the above background technology.
[0008] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a SHUTTER plate anti-pollution device for an electron beam evaporation table, comprising an evaporation table, a vacuum chamber is arranged inside the evaporation table, a mounting base is installed at the lower end of the vacuum chamber, a heat sink is installed at the upper end of the mounting base, a crucible base is installed at the upper part of the heat sink, a crucible is installed on the crucible base, a refrigerator is installed on one side of the heat sink, a hinge seat is installed on one side of the vacuum chamber, a strike beam source is installed on the hinge seat, a mounting plate is installed on the top of the vacuum chamber, and a clamping table is installed on the mounting plate A target material is installed on the clamping table, a fixed base is installed on one side of the mounting base, a rotating column is installed on the upper end of the fixed base, a second transmission tooth is installed on the rotating column, a first transmission tooth is installed on one side of the second transmission tooth, the first transmission tooth is connected to a turntable, a handle is installed on the turntable, a mounting table is installed on the rotating column, a mounting table is connected to a mounting rod, a SHUTTER plate is installed at the lower end of the mounting rod, an upper plate is provided at the upper end of the SHUTTER plate, a lower plate is installed at the lower end of the upper plate, and both the upper plate and the lower plate are provided with array through holes.
[0009] Preferably, the surface of the rotating column is evenly provided with spiral patterns.
[0010] Preferably, a heat conducting pipe is installed on one side of the refrigerator, one end of the heat conducting pipe is connected to the refrigerator, and the other end of the heat conducting pipe is connected to the outside of the evaporation table, and an inner sealing ring is installed at the connection between the heat conducting pipe and the evaporation table.
[0011] Preferably, a vacuum interface is provided on one side of the upper end of the evaporation table, and an outer sealing ring is installed at the connection between the vacuum interface and the evaporation table.
[0012] Preferably, a frame is installed on the side of the vacuum chamber away from the hinge seat, and an acceleration module is installed on the frame.
[0013] Preferably, a protective baffle is installed on one side of the lower end of the mounting plate.
[0014] Compared with the prior art, the beneficial effects of the utility model are:
[0015] 1. The utility model provides a conveniently adjustable SHUTTER plate anti-pollution device on the upper end of the crucible inside the evaporation table to protect the surface of the crucible. Because the melting of the metal source inside the crucible may occur simultaneously with boiling, the protection device can effectively protect the splashing metal source, can well protect the internal device, and can prevent internal pollution to a certain extent.
[0016] 2. The utility model designs a double-layer structure on the SHUTTER plate at the upper end of the evaporation table, and through holes are provided on the upper plate and the lower plate. The gap area between the two plates is changed by rotating the upper plate, thereby changing the coverage area of the entire SHUTTER plate on the upper end of the crucible. It can be well adjusted according to different target materials and metal sources, thereby improving the overall work efficiency. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 It is a front view cross-sectional structural schematic diagram of the utility model;
[0018] Figure 2 It is a top view structural diagram of the SHUTTER board;
[0019] Figure 3 for Figure 1 Schematic diagram of part of the structure.
[0020] In the figure: 1. Evaporation table; 2. Hinge seat; 3. Strike beam source; 4. Clamping table; 5. Mounting plate; 6. Target; 7. Protective baffle; 8. Vacuum chamber; 9. Outer sealing ring; 10. Vacuum interface; 11. Acceleration module; 12. Frame; 13. Crucible base; 14. Mounting base; 15. Heat sink; 16. Crucible; 17. Refrigerator; 18. Heat transfer pipe; 19. Inner sealing ring; 20. Fixed base; 21. Second transmission tooth; 22. Spiral pattern; 23. SHUTTER plate; 24. Mounting rod; 25. Mounting table; 26. Rotating column; 27. Turntable; 28. First transmission tooth; 29. Handle; 30. Upper plate; 31. Through hole; 32. Lower plate. DETAILED DESCRIPTION
[0021] The technical solution of the utility model is further described below in conjunction with the accompanying drawings and specific embodiments.
[0022] Embodiment 1
[0023] like Figure 1 , Figure 2 , Figure 3As shown, the utility model proposes a SHUTTER plate anti-pollution device for an electron beam evaporation table, comprising an evaporation table 1, wherein a vacuum chamber 8 is arranged inside the evaporation table 1, and the vacuum chamber 8 is used to support the reaction inside. A mounting base 14 is installed at the lower end of the vacuum chamber 8, and the mounting base 14 is used to support the mounting lower end device. A heat sink 15 is installed at the upper end of the mounting base 14, and the heat sink 15 is used to dissipate heat from the bottom of a crucible 16. A crucible base 13 is installed on the upper section of the heat sink 15, and a crucible 16 is installed on the crucible base 13. The crucible 16 is used for the metal source to carry out A place for melting, a refrigerator 17 is installed on one side of the heat sink 15, a hinge seat 2 is installed on one side of the vacuum chamber 8, the hinge seat 2 is used to install a striking beam source 3, the striking beam source 3 is installed on the hinge seat 2, the striking beam source 3 is used to strike the target material 6 to generate a large number of electrons, a mounting plate 5 is installed on the top of the vacuum chamber 8, the mounting plate 5 is used to install various devices on the top, a clamping table 4 is installed on the mounting plate 5, the clamping table 4 is used to fix the target material 6, the clamping table 4 is installed with the target material 6, a fixed base 20 is installed on one side of the mounting base 14, the fixed base 20 is used to fix The SHUTTER plate 23 at the upper end is fixed, and a rotating column 26 is installed on the upper end of the fixed base 20. The rotating column 26 drives the SHUTTER plate 23 to rotate by rotating. The rotating column 26 is installed with a second transmission tooth 21, and a first transmission tooth 28 is installed on one side of the second transmission tooth 21. The first transmission tooth 28 and the second transmission tooth 21 are connected and matched to make the rotating column 26 rotate. The first transmission tooth 28 is connected to a turntable 27, and a handle 29 is installed on the turntable 27. Twisting the handle 29 on the turntable 27 allows the rotating column 26 to select the rotating column 26 through the transmission structure. 6 is installed with a mounting platform 25, and the rotating column 26 selectively drives the mounting platform 25 to rotate. The mounting platform 25 is connected to the mounting rod 24, and the rotation of the mounting platform 25 drives the mounting rod 24 to rotate. A SHUTTER plate 23 is installed at the lower end of the mounting rod 24, and an upper plate 30 is arranged at the upper end of the SHUTTER plate 23, and a lower plate 32 is arranged at the lower end of the upper plate 30. Both the upper plate 30 and the lower plate 32 are provided with arrays of through holes 31. Different areas of the through holes 31 are formed by rotating the upper plate 30 and the lower plate 32, so as to facilitate the change of the coverage area of the SHUTTER plate 23.
[0024] Furthermore, the surface of the rotating column 26 is evenly provided with spiral patterns 22 , and the second transmission teeth 21 rotate through the spiral patterns 22 to cause the rotating column 26 to start rotating.
[0025] Furthermore, a heat conducting pipe 18 is installed on one side of the refrigerator 17, one end of the heat conducting pipe 18 is connected to the refrigerator 17, and the other end of the heat conducting pipe 18 is connected to the outside of the evaporation table 1. The heat conducting pipe 18 is used to introduce excess heat into the external air. An inner sealing ring 19 is installed at the connection between the heat conducting pipe 18 and the evaporation table 1, and the inner sealing ring 19 is used to protect the vacuum chamber 8 inside the evaporation table 1.
[0026] Furthermore, a vacuum interface 10 is provided on one side of the upper end of the evaporation table 1 , an outer sealing ring 9 is installed at the connection between the vacuum interface 10 and the evaporation table 1 , and the vacuum interface 10 is connected to a vacuum device to realize the internal vacuum chamber 8 .
[0027] Furthermore, a frame 12 is installed on a side of the vacuum chamber 8 away from the hinge seat 2 , and an acceleration module 11 is installed on the frame 12 . The acceleration module 11 can guide and accelerate free electrons on the target material 6 .
[0028] Furthermore, a protective baffle 7 is installed on one side of the lower end of the installation plate 5, and the protective baffle 7 can prevent electrons from being impacted by the impact beam source 3 to other places.
[0029] The electron beam evaporation table and its SHUTTER plate anti-pollution device based on the first embodiment work as follows: an external vacuum machine is connected through the vacuum interface 10 to realize a vacuum chamber 8 inside the evaporation table 1, the target material 6 is clamped on the clamping table 4, and is impacted by the striking beam source 3. The dispersed particles are guided and accelerated to the crucible 16 through the acceleration module 11, and the metal source inside the crucible 16 is melted. Then, the handle 29 outside the device is twisted to cover the SHUTTER plate 23 on the upper end of the crucible 16 to avoid splashing of the metal source. A double-layer plate is provided on the SHUTTER plate 23, which can be adjusted to achieve different coverage areas. After the work is completed, the refrigerator 17 is turned on to quickly cool the crucible 16 to avoid contamination inside the crucible 16 at high temperature.
[0030] The above-mentioned specific embodiments are only several preferred embodiments of the present invention. Based on the technical solution of the present invention and the relevant inspiration of the above-mentioned embodiments, those skilled in the art can make various alternative improvements and combinations to the above-mentioned specific embodiments.
Claims
1. A SHUTTER plate anti-pollution device for an electron beam evaporation table, comprising an evaporation table (1), characterized in that: The evaporation table (1) is provided with a vacuum chamber (8) inside, a mounting base (14) is installed at the lower end of the vacuum chamber (8), a heat sink (15) is installed at the upper end of the mounting base (14), a crucible base (13) is installed on the upper section of the heat sink (15), a crucible (16) is installed on the crucible base (13), a refrigerator (17) is installed on one side of the heat sink (15), a hinge seat (2) is installed on one side of the vacuum chamber (8), a strike beam source (3) is installed on the hinge seat (2), a mounting plate (5) is installed on the top of the vacuum chamber (8), a clamping table (4) is installed on the mounting plate (5), a target material (6) is installed on the clamping table (4), a fixed base (20) is installed on one side of the mounting base (14), and A rotating column (26) is installed at the upper end of the fixed base (20), a second transmission tooth (21) is installed on the rotating column (26), a first transmission tooth (28) is installed on one side of the second transmission tooth (21), the first transmission tooth (28) is connected to a rotating disk (27), a handle (29) is installed on the rotating disk (27), a mounting platform (25) is installed on the rotating column (26), the mounting platform (25) is connected to a mounting rod (24), a SHUTTER plate (23) is installed at the lower end of the mounting rod (24), an upper plate (30) is arranged at the upper end of the SHUTTER plate (23), a lower plate (32) is arranged at the lower end of the upper plate (30), and both the upper plate (30) and the lower plate (32) are provided with arrays of through holes (31).
2. The SHUTTER plate anti-pollution device for an electron beam evaporation table according to claim 1, characterized in that: The surface of the rotating column (26) is evenly provided with spiral patterns (22).
3. The SHUTTER plate anti-pollution device for an electron beam evaporation table according to claim 1, characterized in that: A heat-conducting pipe (18) is installed on one side of the refrigerator (17), one end of the heat-conducting pipe (18) is connected to the refrigerator (17), and the other end of the heat-conducting pipe (18) is connected to the outside of the evaporation table (1), and an inner sealing ring (19) is installed at the connection between the heat-conducting pipe (18) and the evaporation table (1).
4. The SHUTTER plate anti-pollution device for an electron beam evaporation table according to claim 1, characterized in that: A vacuum interface (10) is provided on one side of the upper end of the evaporation table (1), and an outer sealing ring (9) is installed at the connection between the vacuum interface (10) and the evaporation table (1).
5. The SHUTTER plate anti-pollution device for an electron beam evaporation table according to claim 1, characterized in that: A frame (12) is installed on the side of the vacuum chamber (8) away from the hinge seat (2), and an acceleration module (11) is installed on the frame (12).
6. The SHUTTER plate anti-pollution device for an electron beam evaporation table according to claim 1, characterized in that: A protective baffle (7) is installed on one side of the lower end of the installation plate (5).
