PVD (Physical Vapor Deposition) equipment gas supply device and PVD equipment

Abstract

The PVD equipment gas supply device comprises a water vapor system, a process gas system, a mixing chamber and a heating and heat preservation structure, the water vapor system comprises a water vapor generator, the water vapor generator is provided with a water vapor conveying pipe and used for generating water vapor, the process gas system comprises a gas storage tank, the gas storage tank is provided with a process gas conveying pipe, and the process gas conveying pipe is used for conveying process gas to the mixing chamber. The gas storage tank is used for storing process gas, the water vapor conveying pipe and the process gas conveying pipe are both connected with the mixing chamber, the mixing chamber is provided with an exhaust pipe used for being connected with the PVD cavity, and the heating and heat preservation structure is arranged on the water vapor generator, the water vapor conveying pipe, the mixing chamber and the exhaust pipe. According to the PVD equipment gas supply device and the PVD equipment, the mixing proportion of water vapor is higher, condensation of the water vapor is reduced, the content of the water vapor is higher, the temperature of the water vapor can be controlled, the content of the water vapor is stable and controllable, and the water vapor and process gas are mixed more uniformly, so that the production quality can be improved.

Description

Technical Field

[0001] The utility model relates to the technical field of PVD equipment, in particular to a PVD equipment gas supply device and PVD equipment. Background Art

[0002] PVD (Physical Vapor Deposition) technology refers to the process of transferring atoms or molecules from source materials to the surface of the substrate using physical processes. Magnetron sputtering is one of the PVD processes and is widely used in various industries. The application scenarios of magnetron sputtering require the use of a mixture of multiple process gases. Some application scenarios even require a certain amount of water vapor to be introduced into the mixture.

[0003] In the prior art, when water vapor is used, it is generally directly mixed into the process gas, and then the process gas mixed with water vapor is transported to the PVD chamber through a delivery pipe. However, since the saturated vapor pressure of water vapor is greatly affected by temperature, and the value of the saturated vapor pressure affects the proportion of water vapor that can be mixed, when the temperature is low, the proportion of water vapor that can be mixed is low, and the adsorption of water vapor becomes stronger, and it is easy to condense and adsorb on the inner wall of the delivery pipe, resulting in low water vapor content in the mixed gas and uncontrollable fluctuations, which seriously affects the production quality. Utility Model Content

[0004] The utility model aims to solve at least one of the technical problems existing in the prior art. To this end, the utility model proposes a gas supply device for PVD equipment, which can make the water vapor mixing ratio higher, reduce the condensation of water vapor, and thus make the water vapor content higher, and can also control the water vapor temperature, so that the water vapor content is stable and controllable, and also make the water vapor and process gas mix more evenly, so as to improve the production quality.

[0005] The utility model also provides a PVD equipment with the above-mentioned PVD equipment gas supply device.

[0006] According to the first aspect of the utility model, the PVD equipment gas supply device includes a water vapor system, a process gas system, a mixing chamber and a heating and heat preservation structure, the water vapor system includes a water vapor generator, the water vapor generator is provided with a water vapor delivery pipe, the water vapor generator is used to generate water vapor, the process gas system includes a gas storage tank, the gas storage tank is provided with a process gas delivery pipe, the gas storage tank is used to store process gas, the water vapor delivery pipe and the process gas delivery pipe are both connected to the mixing chamber, the mixing chamber is provided with an exhaust pipe, the exhaust pipe is used to connect to the PVD chamber, the heating and heat preservation structure is arranged on the water vapor generator, the water vapor delivery pipe, the mixing chamber and the exhaust pipe, so as to heat and insulate the water vapor.

[0007] The gas supply device for PVD equipment according to the embodiment of the utility model has at least the following beneficial effects:

[0008] The water vapor generator generates water vapor and transports it to the mixing chamber through the water vapor delivery pipe. At the same time, the process gas in the gas storage tank is transported to the mixing chamber through the process gas delivery pipe. The water vapor and the process gas are evenly mixed in the mixing chamber. When the PVD process is required, the process gas mixed with water vapor in the mixing chamber can be transported to the PVD chamber. The heating and heat preservation structure is arranged in the water vapor generator, the water vapor delivery pipe, the mixing chamber and the exhaust pipe. Therefore, in the process of water vapor transportation, the water vapor can be heated and insulated so that the water vapor can be stably maintained at a higher temperature, so that the proportion of water vapor that can be incorporated into the mixed gas can be higher, and the condensation of water vapor can be reduced, so that the water vapor content is higher. In addition, the water vapor temperature can be controlled by the heating and heat preservation structure, so that the water vapor content is stable and controllable, thereby improving the production quality.

[0009] According to some embodiments of the present utility model, the water vapor delivery pipe is provided with a first pressure reducing valve and a first flow meter.

[0010] According to some embodiments of the present utility model, the water vapor delivery pipe is provided with a first stop valve at one end thereof which is opposite to the first pressure reducing valve and the first flow meter.

[0011] According to some embodiments of the present invention, the process gas delivery pipe is provided with a second pressure reducing valve and a second flow meter.

[0012] According to some embodiments of the present invention, a second stop valve is provided at the end of the process gas delivery pipe that is opposite to the second pressure reducing valve and the second flow meter.

[0013] According to some embodiments of the present invention, the heating and heat-insulating structure extends to the outside of one end of the process gas delivery pipe close to the mixing chamber.

[0014] According to some embodiments of the present invention, the heating and heat preservation structure is configured as an electric heating wire, and the electric heating wire is wound around the outside of the water vapor generator, the outside of the water vapor delivery pipe, the outside of the mixing chamber, the outside of the exhaust pipe, and the outside of the process gas delivery pipe.

[0015] According to some embodiments of the utility model, the heating and heat-insulating structure is configured as a heat-insulating jacket, which covers the outside of the steam generator, the outside of the steam delivery pipe, the outside of the mixing chamber, the outside of the exhaust pipe and the outside of the process gas delivery pipe, and the heat-insulating jacket is used to load a heat transfer medium.

[0016] According to some embodiments of the present utility model, the water vapor generator is provided with an air release valve and a pressure limiting valve.

[0017] The PVD equipment according to the second aspect of the present invention comprises a PVD chamber and the PVD equipment gas supply device as described in the first aspect, and the exhaust pipe is connected to the PVD chamber.

[0018] The PVD device according to the embodiment of the utility model has at least the following beneficial effects:

[0019] By adopting the PVD equipment gas supply device of the first aspect of the utility model embodiment, the heating and insulation structure is arranged in the water vapor generator, the water vapor delivery pipe, the mixing chamber and the exhaust pipe, so that during the water vapor delivery process, the water vapor can be heated and insulated, so that the water vapor can be stably maintained at a higher temperature, so that the proportion of water vapor that can be incorporated into the mixed gas can be higher, and the condensation of water vapor can be reduced, so that the water vapor content is higher, and the water vapor temperature can be controlled by the heating and insulation structure, so that the water vapor content is stable and controllable. In addition, the water vapor and process gas will be evenly mixed in the mixing chamber, thereby improving the production quality.

[0020] Additional aspects and advantages of the present invention will be given in part in the following description, and in part will become apparent from the following description, or will be learned through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The present invention is further described below with reference to the accompanying drawings and embodiments, wherein:

[0022] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0023] Figure 2 is a schematic diagram of a mixing chamber;

[0024] Figure 3 Schematic diagram of the water vapor generator.

[0025] Figure Number:

[0026] Water vapor system 100; water vapor generator 101; water vapor delivery pipe 102; first pressure reducing valve 103; first flow meter 104; first stop valve 105; air release valve 106; pressure limiting valve 107;

[0027] Process gas system 200; gas storage tank 201; process gas delivery pipe 202; second pressure reducing valve 203; second flow meter 204; second stop valve 205;

[0028] Mixing chamber 300; exhaust pipe 301;

[0029] PVD chamber 400;

[0030] The heat preservation structure 500 is heated. DETAILED DESCRIPTION

[0031] The embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and cannot be understood as limiting the present invention.

[0032] In the description of the present invention, it should be understood that the descriptions involving orientation, such as the orientation or positional relationship indicated as up, down, etc., are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0033] In the description of the present utility model, "a plurality" refers to two or more than two. If there is a description of "first" or "second", it is only used for the purpose of distinguishing technical features, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features or implicitly indicating the order of the indicated technical features.

[0034] In the description of the present invention, unless otherwise clearly defined, terms such as setting, installing, connecting, etc. should be understood in a broad sense, and technicians in the relevant technical field can reasonably determine the specific meanings of the above terms in the present invention based on the specific content of the technical solution.

[0035] Reference below Figures 1 to 3 A gas supply device for a PVD device and a PVD device according to an embodiment of the utility model are described.

[0036] According to the gas supply device of the PVD equipment of the first aspect of the utility model, Figures 1 to 3 As shown, it includes a water vapor system 100 , a process gas system 200 , a mixing chamber 300 and a heating and heat preservation structure 500 .

[0037] For example, the water vapor system 100 includes a water vapor generator 101, which is provided with a water vapor delivery pipe 102. The water vapor generator 101 may be a gas boiler, an electric steam generator or other suitable equipment capable of generating water vapor, that is, water vapor. One end of the water vapor delivery pipe 102 is connected to the water vapor generator 101 and communicated with the inner cavity of the water vapor generator 101. After the water vapor is generated by the water vapor generator 101, it is delivered through the water vapor delivery pipe 102.

[0038] The process gas system 200 includes a gas storage tank 201, and the gas storage tank 201 is provided with a process gas delivery pipe 202. The gas storage tank 201 is used to store process gas, and the process gas can be argon or other suitable gases. One end of the process gas delivery pipe 202 is connected to the gas storage tank 201 and communicates with the inner cavity of the gas storage tank 201. The process gas in the gas storage tank 201 is delivered through the process gas delivery pipe 202. The process gas system 200 can be provided with one or more according to actual needs. When multiple process gas systems 200 are provided, different gas storage tanks 201 of the process gas system 200 can be used to store different process gases, so that multiple process gases can be mixed with water vapor in the mixing chamber 300.

[0039] One end of the water vapor delivery pipe 102 away from the water vapor generator 101 is connected to the mixing chamber 300 and communicated with the inner cavity of the mixing chamber 300. One end of the process gas delivery pipe 202 away from the gas storage tank 201 is connected to the mixing chamber 300 and communicated with the inner cavity of the mixing chamber 300. The mixing chamber 300 is used to mix water vapor and process gas. In order to make the mixing more uniform, a stirring mechanism can be provided in the mixing chamber 300. The mixing chamber 300 is provided with an exhaust pipe 301, and the exhaust pipe 301 is communicated with the inner cavity of the PVD chamber 400. The exhaust pipe 301 transports the process gas mixed with water vapor to the inner cavity of the PVD chamber 400 to carry out the PVD process.

[0040] The heating and heat preservation structure 500 can be arranged outside the water vapor generator 101, outside the water vapor delivery pipe 102, outside the mixing chamber 300 and outside the exhaust pipe 301. The heating and heat preservation structure 500 can heat and keep the water vapor in the water vapor generator 101, the water vapor delivery pipe 102, the mixing chamber 300 and the exhaust pipe 301, and keep the water vapor warm after being heated to a desired temperature.

[0041] In this embodiment, the water vapor generator 101 generates water vapor and delivers it to the mixing chamber 300 through the water vapor delivery pipe 102. At the same time, the process gas in the gas storage tank 201 is delivered to the mixing chamber 300 through the process gas delivery pipe 202. The water vapor and the process gas are evenly mixed in the mixing chamber 300. When the PVD process is required, the process gas mixed with water vapor in the mixing chamber 300 can be directly delivered to the PVD chamber 400. The heating and heat preservation structure 500 is provided in the water vapor generator 101, the water vapor delivery pipe 102, the mixing chamber 300 and the exhaust pipe 301. In the process of water vapor delivery, the water vapor can be heated and insulated, so that the water vapor is stably maintained at a higher temperature, so that the proportion of water vapor that can be added to the mixed gas can be higher, and the condensation of water vapor can be reduced, so that the content of water vapor is higher. In addition, the water vapor temperature can be controlled by the heating and heat preservation structure, so that the water vapor content is stable and controllable, thereby improving the production quality.

[0042] It should be noted that the saturated vapor pressure of water vapor is greatly affected by temperature. When the temperature of water vapor changes, the value of its saturated vapor pressure will change, and the value of saturated vapor pressure affects the proportion of water vapor that can be mixed into the mixed gas. When the temperature is low, the value of saturated vapor pressure is low, and the proportion of water vapor that can be mixed into the mixed gas is low. When the temperature is high, the value of saturated vapor pressure is high, and the proportion of water vapor that can be mixed into the mixed gas is high. In the prior art, affected by the external temperature, the temperature of water vapor will gradually decrease during the transportation process, which will lead to a decrease in the proportion of water vapor that can be mixed. In addition, when the temperature decreases, water vapor will condense, resulting in a low water vapor content in the mixed gas and uncontrollable fluctuations. The utility model is provided with a heating and heat preservation structure 500, which can effectively solve the above problems.

[0043] In some embodiments of the present invention, Figure 1 As shown, the water vapor delivery pipe 102 is provided with a first pressure reducing valve 103 and a first flow meter 104. For example, the first pressure reducing valve 103 and the first flow meter 104 can be arranged along the length direction of the water vapor delivery pipe 102. The first pressure reducing valve 103 is used to open when the air pressure in the water vapor delivery pipe 102 is higher than a preset value, thereby reducing the air pressure in the water vapor delivery pipe 102, so that the air pressure in the water vapor delivery pipe 102 is maintained within a suitable range, for example, it can be maintained between 0.1MPa and 0.3MPa, to avoid the air pressure in the water vapor delivery pipe 102 being too high and damaging the water vapor delivery pipe 102 and its components. The first flow meter 104 can timely measure the flow rate of the water vapor transported in the water vapor delivery pipe 102, so that the staff can timely understand the amount of water vapor introduced into the mixing chamber 300. When the amount of water vapor introduced is too high or too low, the staff can timely adjust the amount of water vapor introduced so that the amount of water vapor introduced is controlled within a precise range, thereby improving the production quality of the PVD process.

[0044] It should be noted that the first pressure reducing valve 103 and the first flow meter 104 are common components in the gas circuit system, and their structures and working principles are not described in detail here.

[0045] In some embodiments of the present invention, Figure 1 As shown, the water vapor delivery pipe 102 is provided with a first stop valve 105 at one end opposite to the first pressure reducing valve 103 and the first flow meter 104. When water vapor needs to be introduced, the two first stop valves 105 can be opened. After the water vapor delivery is completed, the first stop valve 105 close to the water vapor generator 101 is closed, which can prevent the water vapor in the water vapor generator 101 from continuing to enter the water vapor delivery pipe 102. At the same time, the first stop valve 105 close to the mixing chamber 300 can be closed, which can prevent the water vapor in the water vapor delivery pipe 102 from continuing to enter the mixing chamber 300. The structure is simple and the operation is convenient.

[0046] In some embodiments of the present invention, Figure 1As shown, the process gas delivery pipe 202 is provided with a second pressure reducing valve 203 and a second flow meter 204. For example, the second pressure reducing valve 203 and the second flow meter 204 can be arranged along the length direction of the process gas delivery pipe 202. The second pressure reducing valve 203 is used to open when the air pressure in the process gas delivery pipe 202 is higher than a preset value, thereby reducing the air pressure in the process gas delivery pipe 202, so that the air pressure in the process gas delivery pipe 202 is maintained within a suitable range, for example, it can be maintained within 0.1MPa to 0.3MPa, to avoid the air pressure in the process gas delivery pipe 202 being too high and damaging the process gas delivery pipe 202 and its components. The second flow meter 204 can timely measure the flow rate of the process gas delivered in the process gas delivery pipe 202, so that the staff can timely understand the amount of process gas introduced into the mixing chamber 300. When the amount of process gas introduced is too high or too low, the staff can timely adjust the amount of process gas introduced so that the amount of process gas introduced is controlled within a precise range, thereby improving the production quality of the PVD process.

[0047] In some embodiments of the present invention, Figure 1 As shown, the process gas delivery pipe 202 is provided with a second stop valve 205 at one end opposite to the second pressure reducing valve 203 and the second flow meter 204. When the process gas needs to be introduced, the two second stop valves 205 can be opened. After the process gas delivery is completed, the second stop valve 205 near the gas storage tank 201 is closed, which can prevent the process gas in the gas storage tank 201 from continuing to enter the process gas delivery pipe 202. At the same time, the second stop valve 205 near the mixing chamber 300 is closed, which can prevent the process gas in the process gas delivery pipe 202 from continuing to enter the mixing chamber 300. The structure is simple and the operation is convenient.

[0048] In some embodiments of the present invention, Figure 1 and Figure 2 As shown, the heating and heat preservation structure 500 extends to the outer side of the end of the process gas delivery pipe 202 close to the mixing chamber 300. That is, the outer side of the end of the process gas delivery pipe 202 close to the mixing chamber 300 is also provided with a heating and heat preservation structure 500, so that the end of the process gas delivery pipe 202 close to the mixing chamber 300 can be heated and insulated, so as to prevent the end of the process gas delivery pipe 202 close to the mixing chamber 300 from being overcooled and absorbing the heat in the mixing chamber 300, thereby achieving a better heating and heat preservation effect of the water vapor in the mixing chamber 300.

[0049] In some embodiments of the present invention, the heating and heat preservation structure 500 is configured as an electric heating wire, which is wound around the outside of the water vapor generator 101, the outside of the water vapor delivery pipe 102, the outside of the mixing chamber 300, the outside of the exhaust pipe 301, and the outside of the end of the process gas delivery pipe 202 close to the mixing chamber 300. The electric heating wire can generate heat when it is energized, thereby heating the water vapor delivery pipe 102, the mixing chamber 300, the exhaust pipe 301, and the end of the process gas delivery pipe 202 close to the mixing chamber 300, thereby heating and heat preservation of the water vapor in the water vapor generator 101, the water vapor delivery pipe 102, the mixing chamber 300, and the exhaust pipe 301. The structure is simple, the installation is convenient, and the effect of heating and heat preservation of water vapor is good.

[0050] It should be noted that the outer side of the heating wire may be covered with protective cotton, which has a heat insulating effect, not only making the heating effect of the heating wire better, but also improving safety.

[0051] In some embodiments of the utility model, the heating and insulation structure 500 is configured as an insulation jacket, which covers the outside of the steam generator 101, the outside of the steam delivery pipe 102, the outside of the mixing chamber 300, the outside of the exhaust pipe 301, and the outside of the end of the process gas delivery pipe 202 close to the mixing chamber 300, and the insulation jacket is used to load the heat transfer medium. The insulation jacket can be made of insulation material, so that the water vapor in the steam generator 101, the steam delivery pipe 102, the mixing chamber 300 and the exhaust pipe 301 can be insulated. In addition, a heat transfer medium such as hot oil or hot water can be introduced into the insulation jacket, so that the water vapor delivery pipe 102, the mixing chamber 300, the exhaust pipe 301 and the end of the process gas delivery pipe 202 close to the mixing chamber 300 can be heated, thereby heating the water vapor in the steam generator 101, the steam delivery pipe 102, the mixing chamber 300 and the exhaust pipe 301. The structure is simple, the installation is convenient, and the effect of heating and insulating the water vapor is better.

[0052] In some embodiments of the present invention, Figure 1 As shown, the steam generator 101 is provided with a vent valve 106 and a pressure limiting valve 107. The vent valve 106 is provided. When the steam generator 101 generates steam, the vent valve 106 is opened for a preset time, and after the impurities in the steam generator 101 are discharged, the vent valve 106 is closed, so that the generated steam can be cleaner, thereby improving the production quality of the PVD process. The pressure limiting valve 107 is provided, and can be opened when the air pressure in the steam generator 101 is higher than a preset value, so as to limit the air pressure in the steam generator 101, so that the air pressure in the steam generator 101 is maintained within a suitable range, for example, it can be maintained between 0.4MPa and 0.5MPa, so as to avoid the air pressure in the steam generator 101 being too high and damaging the steam generator 101 and its components.

[0053] According to the PVD device of the second embodiment of the utility model, Figure 1 As shown, it includes a PVD chamber 400 and a gas supply device for the PVD equipment according to the first embodiment, and the exhaust pipe 301 is connected to the PVD chamber 400 .

[0054] According to the PVD equipment of the embodiment of the utility model, by adopting the PVD equipment gas supply device of the embodiment of the first aspect of the utility model, the water vapor and the process gas are evenly mixed in the mixing chamber 300. When the PVD process is required, the process gas mixed with water vapor in the mixing chamber 300 can be directly transported to the PVD chamber 400. The heating and heat preservation structure 500 is arranged in the water vapor generator 101, the water vapor delivery pipe 102, the mixing chamber 300 and the exhaust pipe 301, and then in the process of water vapor delivery, the water vapor can be heated and insulated, so that the water vapor is stably maintained at a higher temperature, so that the proportion of water vapor that can be added to the mixed gas can be higher, and the condensation of water vapor can be reduced, so that the water vapor content is higher, and the water vapor temperature can be controlled by the heating and heat preservation structure, so that the water vapor content is stable and controllable, so as to improve the production quality.

[0055] It should be noted that since the PVD equipment can adopt all the technical solutions of the PVD equipment gas supply device of the above-mentioned first aspect embodiment, it at least has all the beneficial effects brought by the technical solutions of the above-mentioned first aspect embodiment. These additional beneficial effects will not be repeated here.

[0056] It can be understood that other structures and operations of the PVD equipment according to the embodiment of the present invention are known to ordinary technicians in the field and will not be described in detail here.

[0057] The entire process is briefly described below. It should be understood that the following description is only for illustrative purposes and does not limit the solution of the present utility model.

[0058] The vent valve 106 is opened, and the steam generator 101 is started at the same time, so that the steam generated by the steam generator 101 discharges the impurities in the steam generator 101, and then the vent valve 106 is closed;

[0059] Start the steam generator 101, the steam delivery pipe 102, the mixing chamber 300, the exhaust pipe 301 and the heating and heat preservation structure 500 on the outer side of one end of the process gas delivery pipe 202 close to the mixing chamber 300 for heating and heat preservation;

[0060] Open the first stop valve 105, the first pressure reducing valve 103 and the first flow meter 104 to pass a set amount of water vapor into the mixing chamber 300;

[0061] The second stop valve 205, the second pressure reducing valve 203 and the second flow meter 204 are opened at the same time, and a set amount of process gas is introduced into the mixing chamber 300 to be mixed with the water vapor. It should be noted that one or more sets of the second stop valve 205, the second pressure reducing valve 203 and the second flow meter 204 on the process gas system 200 can be opened according to actual needs, and then one or more process gases can be introduced into the mixing chamber 300 to be mixed with the water vapor according to actual needs;

[0062] When a PVD process is required, the mixed gas in the mixing chamber 300 is transported to the PVD chamber 400 .

[0063] The embodiments of the present invention are described in detail above in conjunction with the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge scope of ordinary technicians in the relevant technical field without departing from the purpose of the present invention.

Claims

1. A gas supply device for PVD equipment, It is characterized in that include: A water vapor system, comprising a water vapor generator, wherein the water vapor generator is provided with a water vapor delivery pipe, and the water vapor generator is used to generate water vapor; A process gas system, comprising a gas storage tank, wherein the gas storage tank is provided with a process gas delivery pipe, and the gas storage tank is used to store the process gas; A mixing chamber, the water vapor delivery pipe and the process gas delivery pipe are both connected to the mixing chamber, the mixing chamber is provided with an exhaust pipe, and the exhaust pipe is used to connect to the PVD chamber; A heating and heat preservation structure is provided on the water vapor generator, the water vapor delivery pipe, the mixing chamber and the exhaust pipe, so as to heat and preserve the water vapor.

2. The gas supply device for PVD equipment according to claim 1, It is characterized in that The water vapor delivery pipe is provided with a first pressure reducing valve and a first flow meter.

3. The gas supply device for PVD equipment according to claim 2, It is characterized in that The water vapor delivery pipe is provided with a first stop valve at one end thereof which is opposite to the first pressure reducing valve and the first flow meter.

4. The gas supply device for a PVD device according to any one of claims 1 to 3, It is characterized in that The process gas delivery pipe is provided with a second pressure reducing valve and a second flow meter.

5. The gas supply device for PVD equipment according to claim 4, It is characterized in that The process gas delivery pipe is provided with a second stop valve at one end thereof which is opposite to the second pressure reducing valve and the second flow meter.

6. The gas supply device for a PVD device according to any one of claims 1 to 3, It is characterized in that The heating and heat-insulating structure extends to the outer side of one end of the process gas conveying pipe close to the mixing chamber.

7. The gas supply device for a PVD device according to any one of claims 1 to 3, It is characterized in that The heating and heat preservation structure is configured as an electric heating wire, and the electric heating wire is wound around the outside of the water vapor generator, the outside of the water vapor delivery pipe, the outside of the mixing chamber, the outside of the exhaust pipe, and the outside of the process gas delivery pipe.

8. The gas supply device for a PVD device according to any one of claims 1 to 3, It is characterized in that The heating and heat-insulating structure is configured as a heat-insulating jacket, which covers the outside of the steam generator, the outside of the steam delivery pipe, the outside of the mixing chamber, the outside of the exhaust pipe and the outside of the process gas delivery pipe, and the heat-transfer medium is loaded in the heat-insulating jacket.

9. The gas supply device for a PVD device according to any one of claims 1 to 3, It is characterized in that The water vapor generator is provided with an air release valve and a pressure limiting valve.

10. A PVD device, It is characterized in that include: PVD chamber; The gas supply device for the PVD equipment according to any one of claims 1 to 9, wherein the exhaust pipe is connected to the PVD chamber.

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