Chemical vapor deposition device for depositing carbon nanotubes on powder surface

Abstract

The chemical vapor deposition device is used for depositing a carbon nano tube on the surface of powder and comprises a horizontally arranged chemical vapor deposition tube, sealing flanges are arranged at the left end and the right end of the chemical vapor deposition tube respectively, and a material receiving boat is arranged at the lower right position in the chemical vapor deposition tube; the heating device is arranged around the chemical vapor deposition pipe; the gas inlet pipe and the gas outlet pipe respectively penetrate through the left end and the right end of the chemical vapor deposition pipe; and the purging device is arranged below the chemical vapor deposition pipe and consists of a plurality of purging pipes which are inserted into the lower side of the interior of the chemical vapor deposition pipe in parallel. The chemical vapor deposition device disclosed by the utility model can effectively realize the suspension of the metal-based powder in the CVD deposition tube, so that the sufficient contact between the powder and a carbon source is ensured, and the synthesized CNTs are uniformly distributed on the surface of the metal powder matrix and can form good interface bonding.

Description

Technical Field

[0001] The utility model relates to a chemical vapor deposition device. Background Art

[0002] Carbon nanotubes (CNTs) have become an ideal reinforcement phase for the preparation of high-performance metal-based composites due to their excellent electrical, mechanical and thermal conductivity. Their unique one-dimensional tubular nanostructure can share the load well, achieve a good reinforcement effect, and realize a synergistic improvement in comprehensive performance. Due to the existence of van der Waals forces between carbon nanotubes, strong van der Waals forces will cause carbon nanotubes with a large surface area to agglomerate and entangle, and during the composite processing, carbon nanotubes tend to agglomerate into clusters due to the reduction of their surface energy. Carbon nanotube-reinforced metal-based composites currently face the main problems of uniform dispersion of carbon nanotubes in the metal matrix and the formation of a good interface bonding between carbon nanotubes and the matrix metal.

[0003] Chemical vapor deposition (CVD) in-situ composite CNTs can achieve uniform dispersion and good interface bonding of CNTs. However, the traditional CVD method usually spreads metal-based powders in the CVD synthesis area, resulting in a reduced contact area between the lower layer of powder and the carbon source, which causes uneven distribution of CNTs and reduces the CNTs composite effect. Utility Model Content

[0004] The utility model aims to provide a chemical vapor deposition device, which can effectively improve the contact area between powder and carbon source, thereby improving the composite quality of CNTs on powder.

[0005] The utility model therefore provides a chemical vapor deposition device for depositing carbon nanotubes on the surface of powder, which comprises:

[0006] A chemical vapor deposition tube is arranged horizontally, with sealing flanges at both ends, wherein a receiving boat is arranged at the lower right position inside the chemical vapor deposition tube;

[0007] a heating device arranged around the chemical vapor deposition tube;

[0008] An air inlet pipe passing through a sealing flange at the left end of the chemical vapor deposition tube and entering the interior of the chemical vapor deposition tube;

[0009] An air outlet pipe passing through a sealing flange at the right end of the chemical vapor deposition tube and entering the interior of the chemical vapor deposition tube; and

[0010] The purge gas device arranged below the chemical vapor deposition tube is composed of a plurality of purge tubes which are inserted into the lower side of the chemical vapor deposition tube in parallel with each other.

[0011] According to the chemical vapor deposition device of the present invention, the gas outlet angles of the multiple purge tubes are preferably adjustable.

[0012] According to the chemical vapor deposition device of the utility model, the receiving boat is preferably a quartz boat.

[0013] According to the chemical vapor deposition device of the utility model, the chemical vapor deposition tube is preferably a quartz tube.

[0014] According to the chemical vapor deposition device of the present invention, the heating device is preferably an electric heating device.

[0015] The chemical vapor deposition device of the utility model can effectively realize the suspension of metal-based powder in the CVD deposition tube, thereby ensuring sufficient contact between the powder and the carbon source, so that the synthesized CNTs are evenly distributed on the surface of the metal powder matrix and can form a good interface bonding. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic structural diagram of a chemical vapor deposition device according to the utility model;

[0017] Figure 2 This is a morphology diagram of an alloy composite powder loaded with CNTs synthesized in situ using the chemical vapor deposition device of the utility model. DETAILED DESCRIPTION

[0018] The utility model is further described below in conjunction with the accompanying drawings.

[0019] Figure 1 The schematic diagram of the structure of the chemical vapor deposition device of the utility model is shown. Figure 1 As shown, the device generally includes a chemical vapor deposition tube 3, a heating device 4, an air inlet pipe 1, an air outlet pipe 5 and a purge gas device.

[0020] The chemical vapor deposition tube 3 is a horizontally arranged quartz tube, and the left and right ends of the tube are respectively provided with sealing flanges 2. A receiving boat 6 is arranged at the lower right position inside the chemical vapor deposition tube 3. The receiving boat 6 is a horizontally arranged quartz boat.

[0021] The heating device 4 is arranged around the chemical vapor deposition tube 3 and is an electric heating device.

[0022] The air inlet pipe 1 passes through the sealing flange 2 at the left end of the chemical vapor deposition tube 3 to enter the interior of the chemical vapor deposition tube 3 ; the air outlet pipe 5 passes through the sealing flange at the right end of the chemical vapor deposition tube 3 to enter the interior of the chemical vapor deposition tube 3 .

[0023] The purge gas device is arranged below the chemical vapor deposition tube 3, and is composed of a plurality of purge tubes 7 which are inserted parallel to each other into the lower position of the chemical vapor deposition tube 3. The outlet angle of each purge tube 7 can be adjusted uniformly, for example, it can be adjusted from a vertical angle to a rightward tilt of 45°.

[0024] The working principle of the chemical vapor deposition device of the present invention is briefly described below.

[0025] First, a large flow of Ar gas is used to blow the alloy powder into the chemical vapor deposition tube 3 from the air inlet pipe 1, and at the same time, the purge pipe 7 of the purge device is adjusted to blow N2 vertically upward to keep the alloy powder in a suspended and dispersed state.

[0026] Next, the CVD in-situ synthesis of CNTs is carried out: 950ml / min of Ar and 50ml / min of H2 are continuously introduced from the air inlet 1 to ensure that the powder is in a reducing atmosphere, and the inside of the chemical vapor deposition tube 3 is heated to 850°C by the heating device 4; then the Ar is turned off, and 2000ml / min of H2 and 80ml / min of C2H4 are introduced from the air inlet 1, and the CVD process is performed for 30 minutes to realize the alloy powder of CNTs synthesized in situ; then the introduction of C2H4 from the air inlet 1 is stopped, and 2000ml / min of Ar and 50ml / min of H2 are continued until the furnace cools to room temperature. Finally, the outlet angle of the purge pipe 7 of the purge device is adjusted (tilted to the right, for example, 45°), and the suspended powder is transported to the top of the receiving boat 6. After the powder is completely deposited on the receiving boat 6, the right end sealing flange is opened to take out the alloy powder of CNTs synthesized in situ. All tail gas or exhaust gas in the process is discharged from the outlet pipe 5 and discharged into the atmosphere after appropriate treatment.

[0027] The CNTs on the CNTs-loaded alloy powder prepared by the utility model are evenly distributed and have good interface bonding with the matrix, such as Figure 2 As shown, the prepared CNTs are multi-walled CNTs with a hollow tubular structure; the diameter of the CNTs is uniform, about 20 nm; the structure of the CNTs is complete and has no defects overall.

[0028] In summary, the utility model blows powder into the air inlet pipe and combines the purge device to make the powder deposit CNTs in a suspended state by CVD. In addition, by adjusting the air outlet angle of the purge pipe of the purge device, the powder is kept at a desired suspension height and position, thereby meeting the in-situ synthesis of CNTs.

Claims

1. A chemical vapor deposition device for depositing carbon nanotubes on a powder surface, characterized in that: include: A chemical vapor deposition tube is arranged horizontally, with sealing flanges at both ends, wherein a receiving boat is arranged at the lower right position inside the chemical vapor deposition tube; a heating device arranged around the chemical vapor deposition tube; An air inlet pipe passing through a sealing flange at the left end of the chemical vapor deposition tube and entering the interior of the chemical vapor deposition tube; An air outlet pipe passing through a sealing flange at the right end of the chemical vapor deposition tube and entering the interior of the chemical vapor deposition tube; and The purge gas device arranged below the chemical vapor deposition tube is composed of a plurality of purge tubes which are inserted into the lower side of the chemical vapor deposition tube in parallel with each other.

2. The chemical vapor deposition device according to claim 1, characterized in that: The gas outlet angles of the multiple purge pipes are adjustable.

3. The chemical vapor deposition device according to claim 1, characterized in that: The receiving boat is a quartz boat.

4. The chemical vapor deposition device according to claim 1, characterized in that: The chemical vapor deposition tube is a quartz tube.

5. The chemical vapor deposition device according to claim 1, characterized in that: The heating device is an electric heating device.

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