Thermal insulation device for single crystal etching additive

Abstract

The utility model discloses a heat preservation device of a single crystal etching additive, which comprises a first storage tank, the first storage tank comprises a first inner tank and a first outer tank, a first heat preservation cavity is formed between the first inner tank and the first outer tank, and a temperature adjusting mechanism is arranged in the first heat preservation cavity. A first feeding port is formed in the upper end of the first storage tank, a first discharging port is formed in the lower end of the first storage tank, a first driving motor is arranged at the upper end of the first storage tank, a first stirring shaft is arranged in the first storage tank, and the upper end of the first stirring shaft is connected with the first driving motor. A first stirring paddle is arranged in the middle of the first stirring shaft, and a second stirring paddle is arranged at the lower end of the first stirring shaft. The thermal insulation device for the single crystal etching additive provided by the utility model is simple and stable in structure, and the first thermal insulation cavity can be quickly heated or cooled, so that the storage effect of the single crystal etching additive in the first storage tank is ensured.

Description

Technical Field

[0001] The utility model belongs to the technical field of heat preservation structures, and in particular relates to a heat preservation device for single crystal etching additives. Background Art

[0002] At present, the conventional process flow of silicon solar cell production is surface pre-cleaning, texturing to remove the damaged layer and form a velvet structure for anti-reflection, chemical cleaning and drying; forming uniformly doped PN junctions at various points on the silicon wafer surface by liquid source diffusion; removing the peripheral PN junctions and surface phosphorus silicon glass formed during the diffusion process; depositing passivation and anti-reflection films on the surface; making the back electrode, back electric field and front electrode of the solar cell; sintering to form ohmic contact, thus completing the entire cell production process. Among them, the step of texturing to remove the damaged layer and form a velvet structure for anti-reflection is currently mostly achieved by chemical etching.

[0003] Therefore, single crystal etching additives are extremely important for the production of solar cells. However, the storage of single crystal etching additives is prone to quality changes when the temperature changes in winter and summer, such as crystallization due to cooling. Therefore, in order to ensure the stable performance of single crystal etching additives, it is necessary to ensure the thermal insulation effect of its storage environment. Summary of the invention

[0004] In order to solve the deficiencies in the prior art, the utility model provides a heat preservation device for a single crystal etching additive.

[0005] In order to achieve the above purpose, the utility model provides the following technical solutions:

[0006] A heat preservation device for single crystal etching additives includes a first storage tank, the first storage tank includes a first inner tank and a first outer tank, a first heat preservation chamber is formed between the first inner tank and the first outer tank, a temperature regulating mechanism is provided in the first heat preservation chamber, a first feed port is provided at the upper end of the first storage tank, a first discharge port is provided at the lower end of the first storage tank, a first drive motor is provided at the upper end of the first storage tank, a first stirring shaft is provided in the first storage tank, the upper end of the first stirring shaft is connected to the first drive motor, a first stirring paddle is provided in the middle of the first stirring shaft, and a second stirring paddle is provided at the lower end of the first stirring shaft.

[0007] Furthermore, the first stirring paddle is a paddle-type stirring paddle, the second stirring paddle is an anchor-type stirring paddle, a first scraper is provided at the lower end of the second stirring paddle, and the first scraper is a rubber plate.

[0008] Furthermore, the temperature adjustment mechanism includes a first thermometer and a second thermometer, the first thermometer is arranged at the upper end of the first storage tank, one end of the first thermometer passes through the storage tank and is arranged inside the first storage tank, the second thermometer is arranged at the lower end of the first storage tank, one end of the second thermometer passes through the first outer tank and is arranged in the first insulation cavity.

[0009] Furthermore, the temperature regulating mechanism comprises a first heating rod, the first heating rod is arranged in the first heat preservation cavity, and water is arranged in the first heat preservation cavity.

[0010] Furthermore, the temperature regulating mechanism includes a circulation coil, which is arranged in the first insulation chamber, and a first inlet pipe is provided at one end of the circulation coil, and a terminal end of the first inlet pipe passes through the first storage tank and is arranged on the outside of the first storage tank, and a first outlet pipe is provided at the other end of the circulation coil, and a terminal end of the first outlet pipe passes through the first storage tank and is arranged on the outside of the first storage tank.

[0011] The utility model discloses a heat preservation device for single crystal etching additives. Compared with the prior art, its beneficial effect lies in that its structure is simple and stable, and the first heat preservation chamber can be quickly heated or cooled, thereby ensuring the storage effect of the single crystal etching additive in the first storage tank. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is a structural schematic diagram of a preferred embodiment provided by the utility model.

[0013] Figure 2 It is a structural schematic diagram of the second stirring paddle of the preferred embodiment provided by the utility model.

[0014] Figure 3 It is a structural schematic diagram of a part A of a preferred embodiment provided by the utility model.

[0015] Figure 4 It is a principle block diagram of the temperature regulating mechanism of the preferred embodiment provided by the utility model.

[0016] The reference numerals include: 110, first inner tank; 120, first outer tank; 130, first insulation chamber; 140, first discharge port; 150, first feed port; 200, first drive motor; 210, first stirring shaft; 220, first stirring paddle; 230, second stirring paddle; 240, first scraper; 310, first thermometer; 320, second thermometer; 330, first heating rod; 340, circulation coil; 341, first inlet; 342, first outlet. DETAILED DESCRIPTION

[0017] The utility model discloses a heat preservation device for a single crystal etching additive. The specific implementation manner of the utility model is further described below in conjunction with a preferred embodiment.

[0018] See attached figure Figure 1-4 , Figure 1 It is a structural schematic diagram of a preferred embodiment provided by the utility model. Figure 2 2 is a schematic structural diagram of the second stirring paddle 230 of the preferred embodiment provided by the utility model. Figure 3 It is a structural schematic diagram of a part A of a preferred embodiment provided by the utility model. Figure 4 It is a principle block diagram of the temperature regulating mechanism of the preferred embodiment provided by the utility model.

[0019] Preferred embodiments.

[0020] The present embodiment provides a heat preservation device for a single crystal etching additive, comprising a first storage tank, the first storage tank comprising a first inner tank 110 and a first outer tank 120, a first heat preservation chamber 130 formed between the first inner tank 110 and the first outer tank 120, a temperature regulating mechanism provided in the first heat preservation chamber 130, a first feed port 150 provided at the upper end of the first storage tank, a first discharge port 140 provided at the lower end of the first storage tank, a first drive motor 200 provided at the upper end of the first storage tank, a first stirring shaft 210 provided in the first storage tank, the upper end of the first stirring shaft 210 being connected to the first drive motor 200, a first stirring paddle 220 provided at the middle of the first stirring shaft 210, and a second stirring paddle 230 provided at the lower end of the first stirring shaft 210. The temperature regulating mechanism can be used to adjust the storage temperature of the single crystal etching additive in the first storage tank, to ensure that the single crystal etching additive will not cause a storage quality difference due to temperature changes in winter and summer. The first stirring paddle 220 and the second stirring paddle 230 can ensure that the temperature between the single crystal etching additives is more uniform without temperature difference, thereby ensuring the storage quality of the single crystal etching additives.

[0021] Furthermore, the first stirring paddle 220 is a paddle stirring paddle, the second stirring paddle 230 is an anchor stirring paddle, and the lower end of the second stirring paddle 230 is provided with a first scraper 240, and the first scraper 240 is a rubber plate. The first stirring paddle 220 as a paddle stirring paddle can ensure the stirring efficiency of the single crystal etching additive, and the anchor stirring paddle can strengthen the stirring of the bottom additive in the first storage tank. At the same time, when the temperature drops in winter, the first scraper 240 can scrape the crystallization caused by the temperature, and under the action of the temperature adjustment mechanism, the re-dissolution of the crystallization is accelerated.

[0022] Furthermore, the temperature adjustment mechanism includes a first thermometer 310 and a second thermometer 320, the first thermometer 310 is arranged at the upper end of the first storage tank, one end of the first thermometer 310 passes through the storage tank and is arranged inside the first storage tank, the second thermometer 320 is arranged at the lower end of the first storage tank, one end of the second thermometer 320 passes through the first outer tank 120 and is arranged in the first insulation chamber 130.

[0023] Furthermore, the temperature regulating mechanism includes a first heating rod 330, which is disposed in the first heat preservation chamber 130, and water is disposed in the first heat preservation chamber 130. The first thermometer 310 is used to monitor the temperature of the single crystal etching additive in the first storage tank, and the second thermometer 320 is used to monitor the temperature of the water in the first heat preservation chamber 130, so as to facilitate the control of the temperature regulating mechanism for heating or cooling.

[0024] Furthermore, the temperature regulating mechanism includes a circulation coil 340, which is disposed in the first heat preservation chamber 130, and a first inlet pipe is disposed at one end of the circulation coil 340, and the end of the first inlet pipe passes through the first storage tank and is disposed outside the first storage tank, and a first outlet pipe is disposed at the other end of the circulation coil 340, and the end of the first outlet pipe passes through the first storage tank and is disposed outside the first storage tank. The first inlet pipe and the first outlet pipe can be used for the entry and exit of water vapor, that is, the circulation coil 340 can be heated by steam, and the heating speed of the first heat preservation chamber 130 can be increased; the first inlet pipe and the first outlet pipe can also be used for the entry and exit of cooling water, that is, the circulation coil 340 can be heated by cooling water, and the temperature in the first heat preservation chamber 130 can be reduced, that is, the temperature of the single crystal etching additive can be reduced.

[0025] It is worth mentioning that the technical features such as the circulation coil 340 involved in the utility model patent application should be regarded as the prior art. The specific structure, working principle and possible control method and spatial layout method of these technical features can be selected by conventional methods in the field, and should not be regarded as the utility model point of the utility model patent. This utility model patent will not be further elaborated.

[0026] For those skilled in the art, it is still possible to modify the technical solutions described in the aforementioned embodiments, or to make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present utility model should be included in the protection scope of the present utility model.

Claims

1. A heat preservation device for single crystal etching additives, characterized in that: The invention comprises a first storage tank, wherein the first storage tank comprises a first inner tank (110) and a first outer tank (120), a first heat preservation chamber (130) is formed between the first inner tank (110) and the first outer tank (120), a temperature regulating mechanism is arranged in the first heat preservation chamber (130), a first feed port (150) is arranged at the upper end of the first storage tank, a first discharge port (140) is arranged at the lower end of the first storage tank, a first drive motor (200) is arranged at the upper end of the first storage tank, a first stirring shaft (210) is arranged in the first storage tank, the upper end of the first stirring shaft (210) is connected to the first drive motor (200), a first stirring paddle (220) is arranged in the middle of the first stirring shaft (210), and a second stirring paddle (230) is arranged at the lower end of the first stirring shaft (210).

2. The heat preservation device of single crystal etching additive according to claim 1, characterized in that: The first stirring paddle (220) is a paddle-type stirring paddle, the second stirring paddle (230) is an anchor-type stirring paddle, a first scraper (240) is provided at the lower end of the second stirring paddle (230), and the first scraper (240) is a rubber plate.

3. The heat preservation device of single crystal etching additive according to claim 2, characterized in that: The temperature adjustment mechanism comprises a first thermometer (310) and a second thermometer (320), wherein the first thermometer (310) is arranged at the upper end of the first storage tank, one end of the first thermometer (310) passes through the storage tank and is arranged inside the first storage tank, and the second thermometer (320) is arranged at the lower end of the first storage tank, one end of the second thermometer (320) passes through the first outer tank (120) and is arranged in the first heat preservation cavity (130).

4. The heat preservation device of single crystal etching additive according to claim 3, characterized in that: The temperature adjustment mechanism comprises a first heating rod (330), wherein the first heating rod (330) is arranged in the first heat preservation cavity (130), and water is arranged in the first heat preservation cavity (130).

5. The heat preservation device of single crystal etching additive according to claim 4, characterized in that: The temperature regulating mechanism comprises a circulation coil (340), wherein the circulation coil (340) is arranged in the first heat preservation chamber (130), a first inlet pipe is arranged at one end of the circulation coil (340), a terminal end of the first inlet pipe passes through the first storage tank and is arranged outside the first storage tank, and a first outlet pipe is arranged at the other end of the circulation coil (340), a terminal end of the first outlet pipe passes through the first storage tank and is arranged outside the first storage tank.

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