Supporting mechanism and plasma enhanced chemical vapor deposition equipment

Abstract

The utility model relates to a supporting mechanism and plasma enhanced chemical vapor deposition equipment. The supporting mechanism comprises a furnace mouth flange, a furnace tail flange and a supporting plate, the furnace mouth flange and the furnace tail flange are oppositely arranged, and a containing space is formed between the furnace mouth flange and the furnace tail flange; the supporting plate is connected with the furnace mouth flange, and the supporting plate is provided with at least one limiting groove used for containing an auxiliary heating lamp tube; the furnace tail flange is provided with a lamp tube fixing hole, the supporting mechanism fixes the end of the auxiliary heating lamp tube through the supporting plate and the lamp tube fixing hole, and shaking is avoided. Meanwhile, the auxiliary heating sleeve is additionally arranged on the upper portion of the containing space, the middle of the auxiliary heating lamp tube is fixedly supported through the auxiliary heating sleeve, then the risk that the auxiliary heating lamp tube shakes and breaks due to strong airflow generated by vacuumizing is reduced, and the stability and reliability of the auxiliary heating lamp tube are improved.

Description

Technical Field

[0001] The present application relates to the technical field of photovoltaic cell manufacturing equipment, and in particular to a support mechanism and plasma enhanced chemical vapor deposition equipment. Background Art

[0002] When implementing the substrate silicon wafer coating process in the reaction chamber of the traditional tubular PECVD (plasma enhanced chemical vapor deposition) equipment, it is necessary to maintain a high temperature environment in the reaction chamber of the equipment. In order to avoid heat loss in the reaction chamber during the silicon wafer transportation stage, an auxiliary heating lamp is added in the reaction chamber to heat the interior of the chamber by infrared radiation of the auxiliary heating lamp to reduce heat loss. At present, the auxiliary heating lamp is mostly made of quartz material and has a length of 3 meters or more. The auxiliary heating lamp is generally loaded above the graphite boat in the reaction chamber. When loading, the auxiliary heating lamp is introduced by the furnace tail flange, and the end of the auxiliary heating lamp extending into the reaction chamber is not fixed. In the process of implementing the substrate silicon wafer coating process in the tubular PECVD equipment, the reaction chamber loaded with the graphite boat needs to be vacuumed. However, during the vacuuming process, the end of the auxiliary heating lamp will shake, and even the shaking amplitude is too large to cause the auxiliary heating lamp to break. The fragments of the auxiliary heating lamp will fall onto the graphite boat, causing the silicon wafer on the graphite boat to be damaged or broken. The overall process is unstable and the risk of damage is high. Therefore, the auxiliary heating lamp tube needs to be fixed and protected to prevent the auxiliary heating lamp tube from shaking during vacuuming. Utility Model Content

[0003] In order to overcome the above-mentioned deficiencies of the prior art, the present application provides a support mechanism and a plasma enhanced chemical vapor deposition device, which solves the problem of high risk of auxiliary heating lamp breakage in the existing plasma enhanced chemical vapor deposition device, and specifically adopts the following technical solutions:

[0004] A supporting mechanism is used to support an auxiliary heating lamp tube in a plasma enhanced chemical vapor deposition device, the supporting mechanism comprising a furnace mouth flange, a furnace tail flange and a supporting plate;

[0005] The furnace mouth flange and the furnace tail flange are arranged opposite to each other, and a receiving space is formed between the furnace mouth flange and the furnace tail flange;

[0006] The support plate is located at the upper part of the accommodating space, and the support plate is connected to the furnace mouth flange. The support plate is provided with at least one limiting groove for accommodating the auxiliary heating lamp tube.

[0007] The end of the auxiliary heating lamp tube can be supported by a support plate located at the furnace mouth flange, and the limit groove of the support plate is used to limit the shaking of the end of the auxiliary heating lamp tube, thereby reducing the risk of the auxiliary heating lamp tube breaking.

[0008] Optionally, the furnace tail flange is provided with at least one lamp fixing hole, and the lamp fixing hole of the furnace tail flange is provided with an extension portion facing away from the accommodation space, and the extension portion is used to guide the auxiliary heating lamp into the accommodation space. The lamp fixing hole is convenient for the auxiliary heating lamp to extend into the accommodation space, and can also fix the end of the auxiliary heating lamp. The lamp fixing hole combined with the support plate can support both ends of the auxiliary heating lamp to prevent the end of the auxiliary heating lamp from shaking due to lack of support.

[0009] Optionally, the outer surface of the extension portion is provided with a threaded portion, the threaded portion is connected with a locking nut with a through hole, and the through hole is coaxial with the auxiliary heating lamp tube. After the auxiliary heating lamp tube enters the accommodation space through the extension portion, the auxiliary heating lamp tube and the lamp tube fixing hole can be fixed by the locking nut to prevent the auxiliary heating lamp tube from axial movement.

[0010] Optionally, a sealing ring is provided on the inner surface of the through hole of the locking nut, and the gap between the through hole and the auxiliary heating lamp is filled by the sealing ring. The sealing ring can ensure that the through hole and the auxiliary heating lamp are sealed, and the vacuum inside the cavity is ensured.

[0011] Optionally: at least one group of auxiliary heating sleeves is provided in the accommodation space, the auxiliary heating lamp tube is parallel to the central axis of the furnace mouth flange or the furnace tail flange, and the auxiliary heating lamp tube is located in the auxiliary heating sleeve. In order to prevent the auxiliary heating lamp tube from breaking and falling onto the graphite boat in the cavity, an auxiliary heating sleeve can be sleeved on the outside of the auxiliary heating lamp tube. Even if the auxiliary heating lamp tube breaks, the fragments of the auxiliary heating lamp tube are inside the auxiliary heating sleeve and will not fall onto the graphite boat below. At the same time, the auxiliary heating sleeve can also serve as a supporting structure for the auxiliary heating lamp tube to prevent the middle part of the auxiliary heating lamp tube from falling or shaking.

[0012] Optionally: the auxiliary heating sleeve is located at the upper part of the accommodation space. When the silicon wafer coating process is implemented, the auxiliary heating lamp tube located above the graphite boat is the most threatening to the graphite boat. Once the auxiliary heating lamp tube above the graphite boat is broken, its fragments will fall onto the graphite boat. Therefore, it is necessary to protect the space above the graphite boat, that is, to protect the auxiliary heating lamp tube located above the graphite boat.

[0013] Optionally, the number of the auxiliary heating sleeves is the same as that of the auxiliary heating lamps on the upper part of the accommodating space, and one end of each group of the auxiliary heating sleeves is connected to a limiting groove, and the other end of the auxiliary heating sleeves is coaxially connected to a group of lamp fixing holes. The auxiliary heating sleeves can respectively support the corresponding auxiliary heating lamps above the graphite boat, thereby protecting and supporting the auxiliary heating lamps.

[0014] Optional: The auxiliary heating sleeve is made of stainless steel. The auxiliary heating sleeve made of stainless steel has better rigidity and better heat conduction effect. The auxiliary heating sleeve made of stainless steel can provide a stronger protective support for the auxiliary heating lamp tube and can also achieve stable heating.

[0015] Optionally, the support plate has limit baffles on both sides of the limit groove, which can prevent the auxiliary heating lamp from shaking in the horizontal direction, and especially for multiple auxiliary heating lamps, the limit baffles can prevent adjacent auxiliary heating lamps from colliding.

[0016] In addition, the present application also discloses a plasma enhanced chemical vapor deposition device, in which the supporting mechanism as described above is provided.

[0017] Beneficial Effects

[0018] The technical solution of this application has the following beneficial effects:

[0019] In the support mechanism of the present application, a support plate with a limiting groove is added to the end of the auxiliary heating sleeve. The end of the auxiliary heating lamp tube can be fixed in the horizontal and vertical directions through the support plate and the lamp tube fixing hole to prevent shaking, so as to reduce the risk of breakage caused by shaking of the auxiliary heating lamp tube. At the same time, a layer of stainless steel auxiliary heating sleeve is sleeved on the outside of the auxiliary heating lamp tube in the support mechanism. The auxiliary heating sleeve can be used to support and protect the middle part of the auxiliary heating lamp tube, so as to prevent the fragments from falling on the graphite boat of the equipment after the auxiliary heating lamp tube breaks, causing damage to the graphite boat, thereby ensuring the stability and reliability of the process implementation. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a structural schematic diagram of the support mechanism in this application.

[0021] Figure 2 for Figure 1 Schematic diagram of the enlarged structure at position A in the middle.

[0022] Figure 3 for Figure 1 Schematic diagram of the enlarged structure at position B in the middle.

[0023] Figure 4 It is a schematic diagram of the assembly structure of the auxiliary heating lamp tube and the auxiliary heating sleeve in this application.

[0024] The specific meanings of the reference numerals in the accompanying drawings:

[0025] 1-furnace mouth flange; 2-furnace tail flange; 201-extension part; 202-locking nut; 203-sealing ring; 3-auxiliary heating sleeve; 4-support plate; 401-limit baffle; 5-auxiliary heating lamp tube; 501-quartz sleeve; 502-infrared auxiliary heating wick. DETAILED DESCRIPTION

[0026] The present application is further described below in conjunction with the accompanying drawings. The following embodiments are only used to more clearly illustrate the technical solution of the present application, and cannot be used to limit the scope of protection of the present application. It should be noted that the following detailed descriptions are all exemplary and are intended to provide further explanation of the present application.

[0027] Unless otherwise specified, all technical and scientific terms used herein have the same meanings as those generally understood by those of ordinary skill in the art to which this application belongs. It should be noted that the terms used herein are only for the purpose of describing specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprising" and / or "including" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.

[0028] Tubular PECVD equipment is a device that uses the principle of plasma enhanced chemical vapor deposition (PECVD) to achieve silicon wafer coating. The thin film deposited by PECVD has excellent electrical properties, good substrate adhesion and excellent step coverage. Due to the above advantages, it is widely used in the fields of ultra-large-scale integrated circuits, optoelectronic devices, MEMS, etc. When the traditional tubular PECVD equipment is used for coating, the substrate silicon wafer is sent into the reaction chamber. At this time, the environment in the chamber is a high-temperature environment. Opening the chamber door will cause heat loss in the chamber. When the process is implemented again, it takes a certain amount of time to heat to the required temperature, which increases the process time and reduces production capacity. Therefore, in order to avoid heat loss in the chamber, auxiliary heating lamps are added in the reaction chamber to use infrared heating. When the reaction chamber door is opened, auxiliary heating lamps are used for auxiliary heating to reduce heat loss, shorten process time and increase production capacity. However, the vacuum environment inside the reaction chamber must be maintained during the coating process, so the reaction chamber needs to be evacuated before coating. However, once the suction force is increased during the vacuuming process, the auxiliary heating lamp tube will easily shake, and even the auxiliary heating lamp tube will break and fall onto the graphite boat, causing damage to the graphite boat. However, if the suction force is too small during the vacuuming process, the process implementation time will be extended and the production capacity will decrease.

[0029] After analysis, it was found that during the vacuuming process, the reaction chamber generates a strong airflow due to the rapid change in air pressure; at the same time, in the traditional tubular PECVD equipment, after the auxiliary heating lamp tube is extended from the furnace tail flange, one end located in the reaction chamber is not fixed, and the entire auxiliary heating lamp tube actually forms a cantilever beam structure. Once the strong airflow blows the auxiliary heating lamp tube, the unfixed end will shake. Once the auxiliary heating lamp tube is shaken too much, its own bearing stress will be exceeded. This will cause the auxiliary heating lamp tube to break, be damaged or have other mechanical problems, thus affecting its normal operation. In order to ensure the stability and reliability of the auxiliary heating lamp tube, a series of measures should be taken to reduce the shaking amplitude. In this embodiment, the supporting structure of the auxiliary heating lamp tube is improved, and the traditional cantilever beam mounting structure is changed to a simply supported beam mounting structure. The auxiliary heating lamp tube is fixed at both ends to prevent shaking.

[0030] Combined with Figure 1-4As shown, this embodiment specifically discloses a supporting mechanism, which can be used to support the auxiliary heating lamp tube 5 in the plasma enhanced chemical vapor deposition equipment to protect the auxiliary heating lamp tube 5. The supporting mechanism includes a furnace mouth flange 1, a furnace tail flange 2 and a supporting plate 4.

[0031] Specifically, Figure 1 As shown, in this embodiment, the furnace mouth flange 1 and the furnace tail flange 2 are arranged opposite to each other, and a receiving space is formed between the furnace mouth flange 1 and the furnace tail flange 2, and the auxiliary heating lamp 5 is located in the receiving space; the support plate 1 is located at the upper part of the receiving space, and the support plate 1 is connected to the furnace mouth flange 1, and the support plate 1 is provided with at least one limiting groove for accommodating the auxiliary heating lamp 5, such as Figure 2 As shown; in this embodiment, the support plate located at the furnace mouth flange can support the end of the auxiliary heating lamp tube, and the limiting groove of the support plate is used to limit the shaking of the end of the auxiliary heating lamp tube in the up and down and left and right directions, thereby reducing the risk of the auxiliary heating lamp tube breaking.

[0032] Further, such as Figure 3 As shown, the furnace tail flange 2 is provided with at least one lamp tube fixing hole, and the lamp tube fixing hole is provided with an extension portion 201 facing away from the accommodation space, and the extension portion 201 is used to guide the auxiliary heating lamp tube 5 into the accommodation space. The lamp tube fixing hole is convenient for the auxiliary heating lamp tube 5 to extend into the accommodation space, and can also fix the end of the auxiliary heating lamp tube 5. The lamp tube fixing hole combined with the support plate 4 can support both ends of the auxiliary heating lamp tube 5 to form a simply supported beam structure, thereby preventing the end of the auxiliary heating lamp tube from shaking due to lack of support.

[0033] In addition, the outer surface of the extension portion 201 is provided with a threaded portion, and the threaded portion is connected with a locking nut 202 with a through hole, and the through hole is coaxial with the auxiliary heating lamp tube 5. After the auxiliary heating lamp tube 5 enters the accommodating space through the extension portion 201, it needs to be fixed to prevent the auxiliary heating lamp tube 5 from axial movement during the process implementation stage. Therefore, the auxiliary heating lamp tube 5 can be fixed to the lamp tube fixing hole by the locking nut 202, so that the auxiliary heating lamp tube 5 is fixed in the axial direction. It should be noted that in this embodiment, a sealing ring 203 is provided on the inner surface of the through hole of the locking nut 202, and the gap between the through hole and the auxiliary heating lamp tube can be filled by the sealing ring 203, thereby preventing the cavity from being unable to ensure vacuum. At the same time, the sealing ring 203 can also be used to apply a certain pressing force to the auxiliary heating lamp tube to further ensure the fixation of the lamp tube.

[0034] Furthermore, in order to prevent the fragments of the auxiliary heating lamp tube from falling onto the graphite boat when the auxiliary heating lamp tube breaks, the present embodiment further provides an auxiliary heating sleeve 3 on the outer periphery of the auxiliary heating lamp tube 5, and the auxiliary heating lamp tube 5 is parallel to the central axis of the furnace mouth flange 1 or the furnace tail flange 2. By coaxially inserting the auxiliary heating lamp tube 5 into the auxiliary heating sleeve 3, even if the auxiliary heating lamp tube 5 breaks, the fragments of the auxiliary heating lamp tube 5 are inside the auxiliary heating sleeve 3 and will not fall onto the graphite boat below. At the same time, since there is no supporting mechanism in the middle of the auxiliary heating lamp tube 5, the auxiliary heating sleeve 3 can be used as the middle supporting structure of the auxiliary heating lamp tube 5 to prevent the middle of the auxiliary heating lamp tube 5 from falling or shaking, thereby further enhancing the stability of the auxiliary heating lamp tube.

[0035] Specifically, Figure 4 As shown, the conventional auxiliary heating lamp tube covers the auxiliary heating wick 502 through the quartz sleeve 501. Since the quartz sleeve 501 is brittle, it is very easy to break when it collides. After the auxiliary heating sleeve 3 is used to cover the auxiliary heating lamp tube 5, even if the auxiliary heating lamp tube 5 breaks, it will not directly hit the graphite boat below, thereby protecting the graphite boat. It should be noted that the auxiliary heating sleeve 3 described in this embodiment is arranged at the upper part of the accommodating space. The reason is that when the silicon wafer coating process is implemented, the auxiliary heating lamp tube 5 is generally arranged in the space above and below the graphite boat for auxiliary heating, but the auxiliary heating lamp tube 5 located above the graphite boat is the most threatening to the graphite boat. Once the auxiliary heating lamp tube 5 above the graphite boat breaks, its fragments will fall onto the graphite boat. Therefore, it is necessary to protect the space above the graphite boat, that is, to protect the space above the graphite boat.

[0036] In addition, three groups of auxiliary heating lamp tubes are provided on the upper part of the accommodating cavity in this embodiment, so the auxiliary heating sleeve 3 is also provided with three groups, and one end of each group of the auxiliary heating sleeve 3 is connected to one of the limit grooves, and the other end of the auxiliary heating sleeve 3 is coaxially connected to a group of the lamp tube fixing holes. The three groups of auxiliary heating sleeves can respectively support the corresponding auxiliary heating lamp tubes above the graphite boat, and protect and support the auxiliary heating lamp tubes. It should be noted that in this embodiment, the auxiliary heating sleeve 3 is preferably supported by stainless steel metal to improve the strength of the sleeve.

[0037] Preferably, Figure 2 As shown, the support plate 4 in this embodiment is made of bent metal sheet, and the limiting baffles 401 made of metal sheet are also used on both sides of the limiting groove of the support plate 4. The limiting baffles 401 can prevent adjacent auxiliary heating lamps 5 from shaking and colliding laterally, further reducing the risk of auxiliary heating lamps breaking.

[0038] Furthermore, in this embodiment, the three groups of auxiliary heating lamps 5 located at the upper part of the accommodating cavity are arranged side by side in parallel, so the support plate 4 in this embodiment is located at the upper part of the accommodating cavity, specifically, the support plate 4 is connected to the upper part of the inner circle of the furnace mouth flange 1, and the support plate 4 can be fixed to the inner circle surface of the furnace mouth flange 1. Correspondingly, the lamp fixing hole in this embodiment is also facing the upper part of the accommodating cavity, that is, the lamp fixing hole is arranged at the upper part of the furnace tail flange 2.

[0039] The above is only a preferred implementation of the present application. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the technical principles of the present application. These improvements and modifications should also be regarded as the scope of protection of the present application.

Claims

1. A support mechanism for supporting an auxiliary heating lamp tube (5) in a plasma enhanced chemical vapor deposition device, characterized in that: It comprises a furnace mouth flange (1), a furnace tail flange (2) and a support plate (4); The furnace mouth flange (1) and the furnace tail flange (2) are arranged opposite to each other, and a receiving space is formed between the furnace mouth flange (1) and the furnace tail flange (2); The support plate (4) is located at the upper part of the accommodating space, and the support plate (4) is connected to the furnace mouth flange (1), and the support plate (4) is provided with at least one limiting groove for accommodating the auxiliary heating lamp tube.

2. The support mechanism according to claim 1, characterized in that: The furnace tail flange (2) is provided with at least one lamp tube fixing hole, and the lamp tube fixing hole of the furnace tail flange (2) is provided with an extension portion (201) facing away from the accommodation space, and the extension portion (201) is used to guide the auxiliary heating lamp tube (5) into the accommodation space.

3. The support mechanism according to claim 2, characterized in that: The outer surface of the extension portion (201) is provided with a threaded portion, the threaded portion is connected to a locking nut (202) with a through hole, and the through hole is coaxial with the auxiliary heating lamp tube (5).

4. The support mechanism according to claim 3, characterized in that: A sealing ring (203) is provided on the inner surface of the through hole of the locking nut (202), and the gap between the through hole and the auxiliary heating lamp tube (5) is filled by the sealing ring (203).

5. The support mechanism according to claim 2, characterized in that: At least one group of auxiliary heating sleeves (3) is arranged in the accommodation space, the auxiliary heating lamp tube (5) is parallel to the central axis of the furnace mouth flange (1) or the furnace tail flange (2), and the auxiliary heating lamp tube (5) is located in the auxiliary heating sleeve (3).

6. The support mechanism according to claim 5, characterized in that: The auxiliary heating sleeve (3) is located at the upper part of the accommodating space.

7. The support mechanism according to claim 5, characterized in that: The number of the auxiliary heating sleeves (3) is consistent with the number of the auxiliary heating lamp tubes (5) located at the upper part of the accommodating space, and one end of each group of the auxiliary heating sleeves (3) is connected to one of the limiting grooves, and the other end of the auxiliary heating sleeves (3) is coaxially connected to a group of the lamp tube fixing holes.

8. The support mechanism according to claim 5, characterized in that: The auxiliary heating sleeve (3) is made of stainless steel.

9. The support mechanism according to claim 1, characterized in that: Limiting baffles (401) are used on both sides of the limiting groove of the support plate (4).

10. A plasma enhanced chemical vapor deposition device, characterized in that: The device is provided with a supporting mechanism as described in any one of claims 1-9.

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