Planar cathode assembly capable of adjusting magnetic field

Abstract

The utility model discloses a planar cathode assembly capable of adjusting a magnetic field, and the planar cathode assembly comprises a cathode chamber which comprises a back plate and a side plate connected with the back plate, the back plate and the side plate define a cavity with one side open, and the interior of the cavity is provided with a separator which divides the cavity into a vacuum area and an atmosphere area; a planar target disposed in the vacuum region and exposed to the open side of the chamber; the mounting plate is positioned in the atmosphere area and is parallel to the plane target material; the magnet is fixed on the mounting plate and faces the surface of the planar target material; and the shifting mechanism is used for driving the mounting plate so as to adjust the relative position of the magnet and the planar target material. According to the invention, the problems of non-uniform etching and low utilization rate of the planar cathode target material can be solved through the displacement mechanism under the condition of ensuring that the planar target material is in a vacuum state, so that the coating efficiency is effectively improved.

Description

Technical Field

[0001] The present application relates to the technical field of magnetron sputtering coating equipment, and in particular to a planar cathode assembly with adjustable magnetic field. Background Art

[0002] Magnetron sputtering coating technology mainly introduces a magnetic field on one side of the target material and uses the magnetic field to constrain charged particles to improve the sputtering effect on the target material. Therefore, the distribution of the sputtering magnetic field affects the utilization rate of the target material.

[0003] Some existing coating equipment includes a planar cathode assembly, which includes a planar target and a magnet. Usually, the relative positions of the magnet and the planar target are fixed, resulting in uneven etching of the planar target, low utilization rate, and the need to frequently replace the target, which affects the coating efficiency. Utility Model Content

[0004] In view of the problems in the prior art, the present application provides a planar cathode assembly with adjustable magnetic field to effectively improve the coating efficiency.

[0005] The planar cathode assembly with adjustable magnetic field in the present application comprises:

[0006] A cathode chamber, comprising a back plate and a side plate connected to the back plate, wherein the back plate and the side plate enclose a chamber with one side open, and a partition is provided inside the chamber to separate the chamber into a vacuum area and an atmosphere area;

[0007] a planar target disposed in the vacuum region and exposed to an open side of the chamber;

[0008] A mounting plate, located in the atmospheric region and arranged parallel to the planar target;

[0009] A magnet fixed on the mounting plate and facing the surface of the planar target;

[0010] The shifting mechanism is used to drive the mounting plate to adjust the relative position of the magnet and the planar target.

[0011] Several optional methods are also provided below, but they are not intended to be additional limitations on the above-mentioned overall solution, but are merely further supplements or preferences. Under the premise that there are no technical or logical contradictions, each optional method can be combined with the above-mentioned overall solution separately, and multiple optional methods can also be combined.

[0012] Optionally, the cathode chamber has a length direction, a width direction and a thickness direction, and the displacement mechanism comprises a first displacement mechanism and a second displacement mechanism for driving the mounting plate to move in the width direction and in the thickness direction respectively.

[0013] Optionally, the first displacement mechanism includes a fixing plate located outside the cathode chamber and movable in the width direction and connected to the mounting plate, and a first power device fixed to the back plate and driving the fixing plate.

[0014] Optionally, the second shifting mechanism includes a gear rack assembly and a second power device arranged on the fixed plate, the gear rack assembly includes a gear driven by the second power device and a rack meshing with the gear, and the rack is fixedly connected to the mounting plate.

[0015] Optionally, the second shifting mechanism includes a limiting wheel that cooperates with the gear to clamp the rack.

[0016] Optionally, a guide mechanism arranged along the thickness direction is provided between the fixing plate and the mounting plate.

[0017] Optionally, the fixing plate extends along the length direction, and two groups of the second shifting mechanisms are provided and are respectively arranged at two ends of the fixing plate along the length direction.

[0018] Optionally, a sliding mechanism is provided between the fixing plate and the back plate.

[0019] Optionally, the separator is a hollow box-shaped structure, the planar target material is fixed on the surface of the separator, and the mounting plate and the magnet are arranged inside the separator.

[0020] Optionally, the separator includes an upper seat and a lower seat that are sealed together, wherein the upper seat is used to fix the planar target material, and the lower seat is provided with an avoidance opening, and the edge of the lower seat is sealed together with the back plate.

[0021] Compared with the prior art, the present application can solve the problems of uneven etching and low utilization rate of planar cathode targets by means of a shifting mechanism while ensuring that one side of the planar target is in a vacuum state, thereby effectively improving the coating efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 This is a schematic structural diagram of a planar cathode assembly in one embodiment of the present application;

[0023] Figure 2 is a partial schematic diagram of a planar cathode assembly in one embodiment;

[0024] Figure 3 is another partial structural schematic diagram of a planar cathode assembly;

[0025] Figure 4 is another partial structural schematic diagram of a planar cathode assembly;

[0026] Figure 5 is another partial structural schematic diagram of a planar cathode assembly;

[0027] Figure 6 is a cross-sectional view of a planar cathode assembly;

[0028] Figure 7 for Figure 6 A partial enlarged view of

[0029] Figure 8 This is a schematic diagram of the partial structure of the magnetron sputtering coating equipment.

[0030] The reference numerals in the figures are described as follows:

[0031] 100, planar cathode assembly; 110, cathode chamber; 111, back plate; 1111, slide rail; 112, side plate; 113, partition; 1131, upper seat; 1132, lower seat; 1133, escape port; 114, vacuum zone; 115, atmospheric zone; 116, open side; 120, planar target; 130, mounting plate; 140, magnet; 141, first magnet; 142, second magnet; 150, shifting mechanism; 151, first shifting mechanism; 1511, fixing plate; 1512, first power device; 1513, ball screw; 1514, first fixed seat; 1515, second fixed seat; 1516, connecting sleeve; 1517, slider; 152, second shifting mechanism; 1521, gear; 1522, rack; 1523, second power device; 1524, limiting wheel; 1525, rotating shaft; 1526, third fixed seat; 160, guide mechanism; 161, guide shaft; 162, flange; 163, fastener; 170, sensor assembly;

[0032] 200, coating chamber; 210, chamber wall;

[0033] X, length direction; Y, width direction; Z, thickness direction. DETAILED DESCRIPTION

[0034] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0035] It should be noted that when a component is referred to as being "connected" to another component, it may be directly connected to the other component or there may be a central component. When a component is referred to as being "disposed on" another component, it may be directly disposed on the other component or there may be a central component at the same time.

[0036] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those generally understood by those skilled in the art to which this application belongs. The terms used herein in the specification of this application are only for the purpose of describing specific embodiments and are not intended to limit this application. The term "and / or" used herein includes any and all combinations of one or more of the related listed items.

[0037] See also Figures 1 to 7 An embodiment of the present application provides a planar cathode assembly 100 with an adjustable magnetic field, comprising a cathode chamber 110, a planar target 120, a mounting plate 130, a magnet 140 and a shifting mechanism 150; wherein the cathode chamber 110 comprises a back plate 111 and a side plate 112, the back plate 111 is connected to the side plate 112 and forms a chamber with one side open, and a partition 113 is arranged inside the chamber to separate the cathode chamber 110 into a vacuum area 114 and an atmospheric area 115; the planar target 120 is arranged in the vacuum area 114 and exposed to the open side 116 of the chamber; the mounting plate 130 is located in the atmospheric area 115 and is arranged parallel to the planar target 120; the magnet 140 is fixed on the mounting plate 130 and faces the surface of the planar target 120; the shifting mechanism 150 is used to drive the mounting plate 130 to adjust the relative position of the magnet 140 and the planar target 120.

[0038] See also Figure 1 , 2 In the illustrated embodiment, the cathode chamber 110 has a length direction X, a width direction Y, and a thickness direction Z, the mounting plate 130 is a substantially rectangular structure, the magnet 140 includes a first magnet 141 and a second magnet 142, wherein the first magnet 141 is arranged in at least three groups at intervals in the width direction, and each group extends in the length direction, and the second magnet 142 is arranged in two groups and located at both ends in the length direction, and each group is arranged in an arc; the first magnet 141 and the second magnet 142 intersect and surround. In terms of relative position, the mounting plate 130 and the magnet 140 are spaced apart from the planar target 120 in the thickness direction, and the magnet 140 covers a limited range in the thickness direction relative to the planar target 120, that is, the range of the magnetic field formed relative to the planar target 120 is limited, thereby affecting the utilization rate of the planar target 120.

[0039] In order to improve the utilization rate of the planar target 120, it is necessary to effectively adjust the relative position of the magnet 140 and the planar target 120. In one embodiment, the shifting mechanism 150 includes a first shifting mechanism 151 and a second shifting mechanism 152; wherein the first shifting mechanism 151 is used to drive the mounting plate 130 to move in the width direction, thereby driving the magnet 140 to move to change the relative position of the magnet 140 and the planar target 120 in the width direction; the second shifting mechanism 152 is used to drive the mounting plate 130 to move in the thickness direction, thereby driving the magnet 140 to move to change the distance between the magnet 140 and the planar target 120 in the thickness direction.

[0040] See also Figure 3 In the illustrated embodiment, the first shifting mechanism 151 includes a fixed plate 1511 and a first power device 1512 , wherein the fixed plate 1511 is located outside the cathode chamber 110 and can move along the width direction and is connected to the mounting plate 130 , and the first power device 1512 is fixed on the back plate 111 to drive the fixed plate 1511 .

[0041] See also Figure 5 The movement of the fixed plate 1511 is sliding, which is achieved by providing a sliding mechanism between the fixed plate 1511 and the back plate 111. Specifically, the sliding mechanism includes a slider 1517 and a slide rail 1111 that cooperate with each other, wherein the slider 1517 is provided on one of the fixed plate 1511 and the back plate 111, and the slide rail 1111 is provided on the other of the fixed plate 1511 and the back plate 111. For example, in the figure, the slider 1517 is provided on the fixed plate 1511, and the slide rail 1111 is provided on the back plate 111.

[0042] In order to effectively drive the mounting plate 130 to move in the width direction, a guide mechanism 160 arranged in the thickness direction is provided between the fixing plate 1511 and the mounting plate 130. Specifically, the guide mechanism 160 includes a guide shaft 161, a flange 162 and a fastener 163, wherein the guide shaft 161 is fixedly connected between the fixing plate 1511 and the mounting plate 130 through the flange 162, and one end of the guide shaft 161 passing through the fixing plate 1511 is locked by the fastener 163 to prevent it from coming out; the fastener 163 is, for example, a fixing ring.

[0043] The first shifting mechanism 151 also includes a ball screw 1513, a connecting sleeve 1516 and a fixed seat, wherein there are two fixed seats (a first fixed seat 1514 and a second fixed seat 1515), which are arranged on the back plate 111 at intervals along the width direction, and the first power device 1512 is fixed to the first fixed seat 1514. The first power device 1512 is, for example, a motor with an output shaft, one end of the ball screw is connected to the output shaft, and the other end extends along the width direction and is fixed to the second fixed seat 1515; the connecting sleeve 1516 is sleeved on the ball screw and fixed to the fixed plate 1511, and is used to drive the fixed plate 1511.

[0044] See also Figure 5 The planar cathode assembly 100 further includes a sensor assembly 170 . The sensor assembly 170 is disposed on the fixed plate 1511 and is parallel to the slide rail 1111 . The sensor assembly 170 is used to detect the movement limit of the fixed plate 1511 .

[0045] See also Figure 5 The second shifting mechanism 152 includes a gear rack assembly and a second power device 1523, wherein the second power device 1523 is, for example, a motor, and the gear rack assembly includes a gear 1521 and a rack 1522 meshing with the gear 1521, the gear 1521 is driven by the second power device 1523, and the rack 1522 is fixedly connected to the mounting plate 130.

[0046] Furthermore, the second shifting mechanism 152 also includes a limiting wheel 1524, which cooperates with the gear 1521 to clamp the rack 1522 to keep the rack 1522 upright, that is, along the thickness direction. This structure is conducive to ensuring that the first shifting mechanism 151 drives the mounting plate 130 to move along the thickness direction to avoid offset.

[0047] See also Figure 1 , the fixing plate 1511 extends in the length direction, and the second shifting mechanism 152 is provided with two groups, and is respectively provided at the two ends of the fixing plate 1511 in the length direction. Specifically, the fixing plate 1511 has side walls located at the two ends in the length direction, and the second power device 1523 of each second shifting mechanism 152 is respectively fixed to the two side walls. The second power device 1523 is, for example, a motor. Each second shifting mechanism 152 also includes a rotating shaft 1525, one end of the rotating shaft 1525 is connected to the motor, and the other end extends to connect with the gear 1521. The fixing plate 1511 is also provided with a third fixing seat 1526 for the rotating shaft 1525 to pass through.

[0048] See also Figure 6 , 7 In the illustrated embodiment, the separator 113 is a hollow box-shaped structure, the planar target 120 is fixed on the surface of the separator 113, the mounting plate 130 and the magnet 140 are arranged inside the separator 113, so that the planar target 120 is located in the vacuum zone 114, and the mounting plate and the magnet 140 are located in the atmosphere zone 115. When the shifting mechanism 150 arranged outside the cathode chamber 110 drives the magnet 140, no vacuum leakage will be caused.

[0049] Specifically, the separator 113 includes an upper seat 1131 and a lower seat 1132 that are sealed together, wherein the upper seat 1131 is used to fix the planar target 120, and the lower seat 1132 is provided with an escape port for avoiding the movement of the guide mechanism 160 and the rack 1522, and the edge of the lower seat 1132 is sealed together with the back plate 111. The lower seat 1132 is generally a U-shaped structure, with its opening facing the planar target 120, and the edge is sealed together with the side plate 112 of the cathode chamber 110. The upper seat 1131 is generally a flat plate structure, and is abutted against the open side of the lower seat 1132 to enclose a box-shaped structure. The sealing fit can be achieved by providing a sealing ring.

[0050] See also Figure 8 The present application also provides a magnetron sputtering coating device, including a coating chamber 200 and a planar cathode assembly 100. The relative position of the magnet 140 and the planar target 120 can be adjusted by a shift mechanism 150 to adjust the magnetic field during the coating process, thereby improving the utilization rate of the planar target 120. The planar cathode assembly 100 can be arranged at the bottom of the coating chamber 200 and fixed to the chamber wall 210 of the coating chamber 200 through a back plate 111.

[0051] While ensuring that the planar target 120 is in a vacuum state, the present application can solve the problems of uneven etching and low utilization rate of the planar cathode target through the shift mechanism 150, thereby effectively improving the coating efficiency.

[0052] The technical features of the above-mentioned embodiments can be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above-mentioned embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification. When the technical features in different embodiments are embodied in the same figure, it can be regarded that the figure also discloses the combination examples of the various embodiments involved.

[0053] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the present application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the present application shall be subject to the attached claims.

Claims

1. A planar cathode assembly with adjustable magnetic field, characterized in that: include: A cathode chamber, comprising a back plate and a side plate connected to the back plate, wherein the back plate and the side plate enclose a chamber with one side open, and a partition is provided inside the chamber to separate the chamber into a vacuum area and an atmosphere area; a planar target disposed in the vacuum region and exposed to an open side of the chamber; A mounting plate, located in the atmospheric region and arranged parallel to the planar target; A magnet fixed on the mounting plate and facing the surface of the planar target; The shifting mechanism is used to drive the mounting plate to adjust the relative position of the magnet and the planar target.

2. The planar cathode assembly according to claim 1, characterized in that The cathode chamber has a length direction, a width direction and a thickness direction, and the displacement mechanism comprises a first displacement mechanism and a second displacement mechanism for driving the mounting plate to move in the width direction and in the thickness direction respectively.

3. The planar cathode assembly according to claim 2, characterized in that The first displacement mechanism includes a fixing plate located outside the cathode chamber and movable in the width direction and connected to the mounting plate, and a first power device fixed on the back plate and driving the fixing plate.

4. The planar cathode assembly according to claim 3, characterized in that The second shifting mechanism includes a gear rack assembly and a second power device arranged on the fixed plate, the gear rack assembly includes a gear driven by the second power device and a rack meshing with the gear, and the rack is fixedly connected to the mounting plate.

5. The planar cathode assembly according to claim 4, characterized in that The second shifting mechanism includes a limiting wheel that cooperates with the gear to clamp the rack.

6. The planar cathode assembly according to claim 4, characterized in that A guide mechanism arranged along the thickness direction is provided between the fixing plate and the mounting plate.

7. The planar cathode assembly according to claim 4, characterized in that The fixing plate extends along the length direction, and two groups of the second displacement mechanisms are provided and are respectively arranged at two ends of the fixing plate along the length direction.

8. The planar cathode assembly according to claim 3, characterized in that A sliding mechanism is arranged between the fixing plate and the back plate.

9. The planar cathode assembly according to claim 1, characterized in that: The separator is a hollow box-shaped structure, the planar target is fixed on the surface of the separator, and the mounting plate and the magnet are arranged inside the separator.

10. The planar cathode assembly according to claim 9, characterized in that The separator comprises an upper seat and a lower seat which are sealed together, wherein the upper seat is used to fix the planar target material, and the lower seat is provided with an escape opening, and the edge of the lower seat is sealed together with the back plate.

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