Rotating cylinder, base assembly and vapor deposition equipment
By providing a positioning structure on the top of the rotating cylinder and opening through holes on the side wall, the problem of rotation between the substrate tray and the rotating cylinder is solved, and the film deposition quality is improved and the risk of flying out is reduced.
CN222313298UActive Publication Date: 2025-01-07ADVANCED MICRO-FABRICATION EQUIPMENT INC LINGANG +1
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Patent Information
- Application Number
- CN202323262311.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2023-11-30
- Publication Date
- 2025-01-07
- Estimated Expiration
- 2033-11-30
Smart Images
Figure CN222313298U_ABST
Abstract
The utility model provides a rotating cylinder, a base assembly and vapor deposition equipment. The rotating cylinder comprises a step-shaped annular top, the annular top comprises a first annular area and a second annular area located on the outer side of the first annular area, the first annular area is lower than the second annular area, and the first annular area is used for supporting a substrate tray; and a first positioning structure for preventing the substrate tray from rotating relative to the rotating cylinder is arranged in the first annular area. According to the utility model, relative rotation between the substrate tray and the rotating cylinder can be avoided, and the film deposition quality is improved.
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