Heating lamp and chemical vapor deposition equipment

Abstract

The utility model discloses a heating lamp and chemical vapor deposition equipment. The heating lamp comprises a middle section heating pipe, a first connecting pipe, a second connecting pipe, a lamp filament and a lamp filament supporting part, the first connecting pipe and the second connecting pipe are connected to two ends of the middle-section heating pipe; pipe bodies of the first connecting pipe and the second connecting pipe extend towards the same direction from the middle section heating pipe; the lamp filament is arranged in the middle section heating pipe and extends into the first connecting pipe and / or the second connecting pipe; the lamp filament supporting part is arranged in the first connecting pipe and the second connecting pipe and used for supporting the lamp filament so as to prevent the lamp filament from making contact with the pipe wall of the first connecting pipe or the pipe wall of the second connecting pipe. According to the heating lamp provided by the utility model, the filament extends into the first connecting pipe and / or the second connecting pipe from the middle heating section, so that a wafer corresponding to the position between two adjacent heating lamps can also be heated, and the temperature uniformity of each part after the surface of the wafer is heated is improved.

Description

Technical Field

[0001] The utility model relates to the field of semiconductor processing, in particular to a heating lamp and chemical vapor deposition equipment. Background Art

[0002] During the semiconductor processing, it is necessary to use a heating lamp to heat the wafer so that the wafer is at a suitable reaction temperature. In the semiconductor processing equipment, multiple heating lamps are arranged opposite to the wafer to heat the wafer. In the process of heating the wafer by the existing multiple heating lamps, uneven heating problem easily occurs on the surface of the wafer, which leads to inconsistent reaction rate on the surface of the wafer, affecting the processing of the wafer. Utility Model Content

[0003] The utility model aims to provide a heating lamp and chemical vapor deposition equipment, which have the advantage of high heating uniformity at various places on the surface of a wafer.

[0004] To achieve the above object, the utility model provides a heating lamp, which comprises:

[0005] Middle section heating tube;

[0006] A first connecting tube and a second connecting tube, wherein the bottom ends of the first connecting tube and the second connecting tube are respectively connected to the two ends of the middle heating tube, and the tube bodies of the first connecting tube and the second connecting tube extend from the middle heating tube toward the same direction;

[0007] a filament, the filament being disposed in the middle heating tube and extending into the first connecting tube and / or the second connecting tube;

[0008] A filament support portion is disposed in the first connecting tube and the second connecting tube, and is used to support the filament to prevent the filament from contacting the tube wall of the first connecting tube or the second connecting tube.

[0009] Optionally, the filament includes a middle heating section arranged in the middle heating tube, and the middle heating section coincides with or is parallel to the axis of the middle heating tube.

[0010] Optionally, the first connecting tube includes a first straight tube section and a first connecting section connected to each other, the second connecting tube includes a second straight tube section and a second connecting section connected to each other, the first connecting section and the second connecting section are respectively connected to two ends of the middle heating tube; the filament also includes a first extension section having at least an arc section, one end of the first extension section is connected to the middle heating section, the first extension section is located in the first connecting section, and coincides with or is parallel to the center line of the first connecting section.

[0011] Optionally, the filament further includes a second extension segment having at least an arc-shaped segment, one end of the second extension segment is connected to the middle heating segment, and the second extension segment is located in the second connecting segment and coincides with or is parallel to a center line of the second connecting segment.

[0012] Optionally, at least one filament supporting portion is disposed in the first connecting section, and at least one filament supporting portion is disposed in the second connecting section.

[0013] Optionally, a plurality of the filament support portions are arranged at intervals in the middle heating tube.

[0014] Optionally, a traction wire is provided on the filament support portion, and two ends of the traction wire are respectively connected to the filament and the filament support portion.

[0015] Optionally, the middle section heating tube is a straight tube, the diameter of the middle section heating tube is 2-20 mm, and the center distance between the first connecting tube and the second connecting tube is 4-10 times the diameter of the middle section heating tube.

[0016] Optionally, the heating lamp further includes a gas flushing port, and the gas flushing port is arranged on the first connecting tube or the second connecting tube.

[0017] Optionally, the heating lamp further comprises a gas flushing port, wherein the gas flushing port is arranged on the middle heating tube, and the gas flushing port is located on a side of the middle heating tube away from an object irradiated by the filament.

[0018] Optionally, the first connecting tube, the second connecting tube and the middle heating tube are made of quartz.

[0019] Optionally, the first connecting tube and the second connecting tube are respectively welded to two ends of the middle heating tube.

[0020] The utility model also provides a chemical vapor deposition device, the chemical vapor deposition device comprising:

[0021] Cavity;

[0022] A wafer base, the wafer base is arranged in the cavity, and the wafer base is used to carry a wafer;

[0023] A lamp holder assembly, the lamp holder assembly being arranged outside the cavity;

[0024] A plurality of heating lamps as described above are installed on the lamp holder assembly, and the heating lamps are used to heat the wafer on the wafer base.

[0025] In summary, compared with the prior art, the heating lamp and chemical vapor deposition equipment provided by the utility model have the following beneficial effects:

[0026] The heating lamp of the utility model arranges the filament to extend from the middle heating section to the first connecting tube and / or the second connecting tube, so that the wafer corresponding to the position between two adjacent heating lamps can also be heated, thereby improving the temperature uniformity of various locations on the wafer surface after heating. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 It is a structural schematic diagram of the heating lamp of the present utility model.

[0028] Figure 2 It is a schematic diagram showing that the gas filling port of the heating lamp of the utility model is arranged on the second connecting pipe.

[0029] Figure 3 It is a schematic diagram showing that the gas filling port of the heating lamp of the present invention is arranged on the middle heating tube.

[0030] Figure 4 The utility model is a schematic diagram of the installation position of the heating lamp on the lamp holder assembly of the chemical vapor deposition equipment.

[0031] Description of reference numerals:

[0032] Heating lamp 100

[0033] Middle heating tube 110

[0034] First connecting pipe 120

[0035] The first straight pipe section 121

[0036] The first connecting section 122

[0037] The second connecting pipe 130

[0038] The second straight pipe section 131

[0039] The second connecting section 132

[0040] Filament 140

[0041] Middle heating section 141

[0042] The first extension section 142

[0043] The second extension section 143

[0044] Filament support portion 150

[0045] Gas filling port 160

[0046] Power supply column 170

[0047] Mounting rod 180

[0048] Lamp holder assembly 200 DETAILED DESCRIPTION

[0049] The following will be combined with the appended examples in the present utility model Figure 1 ~Attached Figure 4 , the technical scheme, structural features, objectives achieved and effects in the embodiments of the utility model are described in detail.

[0050] It should be noted that the drawings are in a very simplified form and use non-precise proportions. They are only used to conveniently and clearly assist in explaining the implementation methods of the utility model, and are not used to limit the conditions for the implementation of the utility model. Therefore, they have no substantive technical significance. Any structural modification, change in proportional relationship or adjustment of size should still fall within the scope of the technical content disclosed by the utility model without affecting the efficacy and purpose that can be achieved by the utility model.

[0051] It should be noted that, in the present invention, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only the elements explicitly listed, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0052] like Figure 1-Figure 3 As shown, the utility model provides a heating lamp 100, which includes a middle heating tube 110, a first connecting tube 120, a second connecting tube 130, a filament 140 and a filament support 150. The middle heating tube 110 is provided with a filament 140 for heating an object. The bottom ends of the first connecting tube 120 and the second connecting tube 130 are respectively connected to the two ends of the middle heating tube 110, and the tube bodies of the first connecting tube 120 and the second connecting tube 130 extend from the middle heating tube 110 in the same direction, so that the overall cross-section of the heating lamp 100 forms a U-shaped shape.

[0053] The first connecting tube 120, the second connecting tube 130 and the middle section heating tube 110 are all hollow tubes, and the insides of the first connecting tube 120, the second connecting tube 130 and the middle section heating tube 110 are interconnected. In this embodiment, the filament 140 is disposed in the middle section heating tube 110 and extends into the first connecting tube 120 and / or the second connecting tube 130, and the filament 140 is used to emit heat radiation to heat the surface of the heated object. In a preferred embodiment of the present invention, the filament 140 extends from the middle heating tube 110 to the first connecting tube 120 and the second connecting tube 130, and the wafer corresponding to the area between two adjacent heating lamps 100 can be radiantly heated by the filament 140 extending into the first connecting tube 120 and the second connecting tube 130. Specifically, when heating the wafer, a plurality of heating lamps 100 are arranged to heat the wafer at the same time, and the plurality of heating lamps 100 are arranged in the same direction, that is, the second connecting tube 130 and the first connecting tube 120 of two adjacent heating lamps 100 are arranged close to each other, and the wafer corresponding to the area between the two adjacent heating lamps 100 is heated together by the filament 140 arranged in the second connecting tube 130 and the first connecting tube 120 of the two adjacent heating lamps 100, so that the uniformity of heat radiation at various locations on the wafer surface is improved, thereby improving the uniformity of temperature at various locations on the wafer surface. In other embodiments, the filament 140 may also extend from the middle heating tube 110 to only one side into the first connecting tube 120 or the second connecting tube 130. In the embodiment of the heating lamp 100 in which the filament 140 extends to only one side into the first connecting tube 120 or the second connecting tube 130, when heating the wafer, a plurality of heating lamps 100 are arranged to heat the wafer at the same time, and the plurality of heating lamps 100 are arranged in the same direction, that is, the second connecting tubes 130 and the first connecting tubes 120 of two adjacent heating lamps 100 are mutually connected. The filament 140 is arranged close to each other, and extends into the first connecting tube 120 or the second connecting tube 130, that is, the filament 140 is provided in the first connecting tube 120 or the second connecting tube 130 close to two adjacent heating lamps 100, and the wafer corresponding to the area between the two adjacent heating lamps 100 is heated by the filament 140 arranged in the second connecting tube 130 or the first connecting tube 120 of the two adjacent heating lamps 100, so that the uniformity of heat radiation at various locations on the surface of the wafer is improved, thereby improving the uniformity of temperature at various locations on the surface of the wafer.

[0054] After power is turned on, the temperature of the filament 140 increases. In order to prevent the high-temperature filament 140 from contacting the tube wall of the first connecting tube 120 or the second connecting tube 130 and causing a malfunction, a filament support portion 150 is provided in the first connecting tube 120 and the second connecting tube 130. In this embodiment, the filament support portion 150 is annular and is arranged around the inner wall of the first connecting tube 120 and the second connecting tube 130. The filament support portion 150 is used to support and pull the filament 140 in the first connecting tube 120 and the second connecting tube 130 to prevent the filament 140 from contacting the tube wall of the first connecting tube 120 or the second connecting tube 130. Each filament support portion 150 is provided with a pulling wire, and the two ends of the pulling wire are respectively connected to the filament 140 and the filament support portion 150, so as to fix the relative position between the filament 140 and the filament support portion 150, and prevent the heated filament 140 from moving in the first connecting tube 120 or the second connecting tube 130. The traction wire is made of the same material as the filament 140, such as tungsten, to prevent the traction wire from being heated by the filament 140 and failing due to overheating because the traction wire cannot withstand the high temperature of the filament 140. In other embodiments, the filament support portion 150 may also be a non-annular structure, such as a semicircular or arc-shaped structure.

[0055] The filament 140 includes a middle heating section 141 disposed in the middle heating tube 110. In the present embodiment, the middle heating section 141 is disposed to coincide with the axis of the middle heating tube 110. When the heating lamp 100 is mounted on the lamp holder assembly, a plurality of heating lamps 100 are mounted on a lamp holder assembly 200. Since the middle heating section 141 of the filament 140 is located at the axis of the middle heating tube 110, ensuring that the middle heating tubes 110 of each heating lamp 100 are horizontally installed at the same height can ensure that the filaments 140 in each heating lamp 100 are horizontally installed at the same height, thereby improving the uniformity of the amount of heat radiation received at various locations on the surface of the heated wafer, thereby improving the uniformity of the temperature at various locations on the surface of the heated wafer. In other embodiments, the middle heating section 141 can also be disposed parallel to the axis of the middle heating tube 110.

[0056] The first connecting pipe 120 includes a first straight pipe section 121 and a first connecting section 122 connected to each other. The second connecting pipe 130 includes a second straight pipe section 131 and a second connecting section 132 connected to each other. The first connecting section 122 and the second connecting section 132 are respectively connected to the two ends of the middle section heating pipe 110. The first connecting section 122 and the second connecting section 132 have the same structure. In this embodiment, the first connecting section 122 and the second connecting section 132 are both turning transition sections. The first connecting section 122 and the second connecting section 132 connect the first straight pipe section 121, the second straight pipe section 131 and the middle section heating pipe 110 in a turning manner. The first straight pipe section 121 is connected to the middle section heating pipe 110 through the first connecting section 122, and the second straight pipe section 131 is connected to the middle section heating pipe 110 through the second connecting section 132.

[0057] The filament 140 further includes a first extension section 142 having at least an arc section and a second extension section 143 having at least an arc section. The first extension section 142 and the second extension section 143 have the same structure. One end of the first extension section 142 is connected to the middle heating section 141. The first extension section 142 includes an arc section. The arc section of the first extension section 142 is located in the first connecting section 122 and coincides with the center line of the first connecting section 122 in this embodiment. In other embodiments, the right-angle turning section of the first extension section 142 may also be parallel to the center line of the first connecting section 122. One end of the second extension section 143 is connected to the middle heating section 141. The second extension section 143 includes an arc section. The arc section of the second extension section 143 is located in the second connecting section 132 and coincides with the center line of the second connecting section 132. In other embodiments, the arc section of the second extension section 143 may also be parallel to the center line of the second connecting section 132. In a preferred embodiment of the present utility model, the first connecting section 122 and the second connecting section 132 are both right-angle turn transition sections, and the corresponding first extension section 142 and the second extension section 143 arranged in the first connecting section 122 and the second connecting section 132 are right-angle turn sections, and the center angle of the right-angle turn section of the first extension section 142 and the second extension section 143 is 90°, and the right-angle turn section of the first extension section 142 and the second extension section 143 coincides with the center line of the first connecting section 122 and the second connecting section 132.

[0058] At least one filament support portion 150 is disposed in the first connection section 122, and at least one filament support portion 150 is disposed in the second connection section 132. The first extension section 142 and the second extension section 143 of the filament 140 are in two bending states in the first connection section 122 and the second connection section 132, so after the filament 140 is powered on, its first extension section 142 and the second extension section 143 are more likely to deviate from the original position. In order to ensure the support and positioning effect of the first extension section 142 and the second extension section 143 of the filament 140 in the first connection tube 120 and the second connection tube 130, the filament support portion 140 is disposed in the first connection section 122 and the second connection section 132 to ensure that the first extension section 142 and the second extension section 143 will not contact the tube wall of the first connection section 122 or the second connection section 132, thereby causing the heating lamp 100 to fail.

[0059] In the present embodiment, a plurality of filament support portions 150 are also arranged at intervals in the middle heating tube 110. The filament support portions 150 in the middle heating tube 110 are used to fix the filament 140 in the middle heating tube 110, thereby improving the positioning reliability of the filament 140 in the middle heating tube 110, avoiding the filament 140 from contacting the tube wall of the middle heating tube 110 and causing the heating lamp 100 to malfunction, thereby improving the operating reliability of the heating lamp 100.

[0060] The middle heating tube 110 is a straight tube with a diameter of 2-20 mm. The center distance between the first connecting tube 120 and the second connecting tube 130 is 4-10 times the diameter of the middle heating tube 110 to ensure the heating effect of the heating lamp 100 on the wafer so that the temperature of the wafer surface can reach the temperature required for the reaction.

[0061] The heating lamp 100 further includes a gas injection port 160, which is disposed on the first connecting tube 120 or the second connecting tube 130. Figure 2 As shown, the gas flushing port 160 is disposed on the second connecting tube 130. The gas flushing port 160 is used to extract the original gas from the tube cavities of the first connecting tube 120, the second connecting tube 130 and the middle heating tube 110 during the manufacturing process of the heating lamp 100, and then inject halogen gas thereinto. The gas flushing port 160 is disposed on the second connecting tube 130, which can avoid the gas flushing port 160 being disposed between the filament 140 and the heated wafer, thereby preventing the gas flushing port 160 from being disposed between the filament 140 and the heated wafer, thereby affecting the heating effect of the filament 140 on the wafer. In other embodiments, the gas flushing port 160 can also be disposed on the first connecting tube 120 or the middle heating tube 110. Figure 3As shown, the gas flushing port 160 is located on the middle heating tube 110, and the gas flushing port 160 is located on the side of the middle heating tube 110 away from the object irradiated by the filament 140, thereby avoiding the gas flushing port 160 being set between the filament 140 and the heated wafer to affect the heating effect of the filament 140 on the wafer.

[0062] The first connecting tube 120, the second connecting tube 130 and the middle section heating tube 110 are made of quartz, and the first connecting tube 120 and the second connecting tube 130 made of quartz can reduce the obstruction of the filament 140 from radiating heat outward, and improve the heating efficiency of the filament 140 on the wafer. The first connecting tube 120 and the second connecting tube 130 are respectively welded to the two ends of the middle section heating tube 110, and the first connecting tube 120, the second connecting tube 130 and the middle section heating tube 110 are all welded to improve the consistency of the quartz wall thickness of the first connecting tube 120 and the middle section heating tube 110, the second connecting tube 130 and the turning connection, and improve the service life of the heating lamp 100.

[0063] like Figure 2 and Figure 4 As shown, the ends of the first connecting tube 120 and the second connecting tube 130 away from the middle heating tube 110 are provided with a connecting assembly for connecting with the lamp holder assembly 200. The heating lamp 100 is installed on the lamp holder assembly 200 through the connecting assembly to heat the object. Specifically, the connecting assembly includes a power supply column 170 and a mounting rod 180; the first end of the power supply column 170 extends into the interior of the first connecting tube 120 or the second connecting tube 130, the power supply column 170 passes through the inner center of the mounting rod 180, and the second end thereof is exposed from the mounting rod 180. The mounting rod 180 is used to achieve mechanical connection between the first connecting tube 120 or the second connecting tube 130 and the lamp holder assembly 200, so as to fix the heating lamp 100 on the lamp holder assembly 200. When the mounting rod 180 is connected to the lamp holder assembly 200, the second end of the power supply column 170 is connected to the internal electrode of the lamp holder assembly 200 by inserting the lamp holder assembly 200, thereby achieving electrical connection between the heating lamp 100 and the lamp holder assembly 200, so as to power the heating lamp 100. The first end of the power supply post 170 located inside the first connecting tube 120 or the second connecting tube 130 is connected to the filament 140 in the heating lamp 100 through a wire to supply power to the filament 140, and the wire and the first end of the power supply post 170 are bonded and connected by a molybdenum sheet to reduce the resistance at the connection between the wire and the power supply post 170. In a preferred embodiment of the utility model, the first connecting tube 120 and the second connecting tube 130 are arranged parallel to each other, so that the heating lamp 100 can be installed on the lamp holder assembly 200, and when a plurality of heating lamps 100 are installed on the lamp holder assembly 200, the arrangement of the heating lamps 100 can be facilitated.

[0064] The filament 140 of the utility model includes a middle heating section 141, a first extension section 142 having at least an arc section, and a second extension section 143 having at least an arc section, forming a "U"-shaped filament. The first connecting tube 120, the second connecting tube 130 and the middle heating tube 110 form a "U"-shaped lamp tube. The "U"-shaped filament is arranged in the "U"-shaped lamp tube, which improves the heating efficiency of both ends of the "U"-shaped lamp. When the "U"-shaped lamp of the utility model is fixed on the lamp holder assembly 200, it can ensure that the temperature of the heating area between two adjacent heating lamps will not drop too much, thereby improving the temperature uniformity of the wafer.

[0065] This embodiment further provides a chemical vapor deposition device, including a chamber, a wafer base, a lamp holder assembly, and a plurality of heating lamps 100 as described above.

[0066] The wafer base is arranged in the cavity, and the wafer base is used to carry the wafer. The lamp holder assembly is arranged outside the cavity. Figure 4 As shown, a plurality of heating lamps 100 are mounted on a lamp holder assembly 200. Figure 4 The figure shows a situation where a plurality of heating lamps 100 are arranged on the lamp holder assembly 200. The plurality of heating lamps 100 are arranged along the circumference of the lamp holder assembly 200, and a plurality of circles of heating lamps 100 are arranged along the radial direction of the lamp holder assembly 200. The heating lamps 100 are used to heat the wafer on the wafer base. The heating lamps 100 in each circle are arranged in the same direction, that is, the second connecting tubes 130 and the first connecting tubes 120 of two adjacent heating lamps 100 in one circle are arranged close to each other, and the filaments 140 extend into the first connecting tubes 120 and / or the second connecting tubes 130. The wafer corresponding to the area between the two adjacent heating lamps 100 is heated by the filaments 140 arranged in the second connecting tubes 130 and / or the first connecting tubes 120 of the two adjacent heating lamps 100, so that the uniformity of heat radiation at various locations on the wafer surface is improved, and the uniformity of temperature at various locations on the wafer surface is improved.

[0067] Although the content of the utility model has been described in detail through the above preferred embodiments, it should be appreciated that the above description should not be considered as a limitation of the utility model. After reading the above content, various modifications and substitutions of the utility model will be obvious to those skilled in the art. Therefore, the protection scope of the utility model should be limited by the attached claims.

Claims

1. A heating lamp, characterized in that: The heating lamp comprises: Middle section heating tube; A first connecting tube and a second connecting tube, wherein the bottom ends of the first connecting tube and the second connecting tube are respectively connected to the two ends of the middle heating tube, and the tube bodies of the first connecting tube and the second connecting tube extend from the middle heating tube toward the same direction; a filament, the filament being disposed in the middle heating tube and extending into the first connecting tube and / or the second connecting tube; A filament support portion is disposed in the first connecting tube and the second connecting tube, and is used to support the filament to prevent the filament from contacting the tube wall of the first connecting tube or the second connecting tube.

2. The heating lamp according to claim 1, characterized in that The filament includes a middle heating section arranged in the middle heating tube, and the middle heating section coincides with or is parallel to the axis of the middle heating tube.

3. The heating lamp according to claim 2, characterized in that The first connecting tube includes a first straight tube section and a first connecting section connected to each other, the second connecting tube includes a second straight tube section and a second connecting section connected to each other, the first connecting section and the second connecting section are respectively connected to the two ends of the middle section heating tube; the filament also includes a first extension section having at least an arc section, one end of the first extension section is connected to the middle section heating section, the first extension section is located in the first connecting section, and coincides with or is parallel to the center line of the first connecting section.

4. The heating lamp according to claim 3, characterized in that The filament also includes a second extension section having at least an arc-shaped section, one end of the second extension section is connected to the middle heating section, and the second extension section is located in the second connecting section and coincides with or is parallel to the center line of the second connecting section.

5. The heating lamp according to claim 3 or 4, characterized in that: At least one filament supporting portion is disposed in the first connecting section, and at least one filament supporting portion is disposed in the second connecting section.

6. The heating lamp according to claim 5, characterized in that A plurality of the filament supporting parts are arranged at intervals in the middle heating tube.

7. The heating lamp according to claim 6, characterized in that The filament support portion is provided with a traction wire, and two ends of the traction wire are respectively connected to the filament and the filament support portion.

8. The heating lamp according to claim 1, characterized in that The middle section heating tube is a straight tube, the diameter of the middle section heating tube is 2-20 mm, and the center distance between the first connecting tube and the second connecting tube is 4-10 times the diameter of the middle section heating tube.

9. The heating lamp according to claim 1, characterized in that The heating lamp further comprises a gas flushing port, and the gas flushing port is arranged on the first connecting tube or the second connecting tube.

10. The heating lamp according to claim 1, characterized in that The heating lamp further comprises a gas flushing port, which is arranged on the middle heating tube and is located on a side of the middle heating tube away from an object irradiated by the filament.

11. The heating lamp according to claim 1, characterized in that The first connecting tube, the second connecting tube and the middle heating tube are made of quartz.

12. The heating lamp according to claim 11, characterized in that The first connecting tube and the second connecting tube are respectively welded to two ends of the middle heating tube.

13. A chemical vapor deposition device, characterized in that: The chemical vapor deposition equipment comprises: Cavity; A wafer base, which is disposed in the cavity and is used to carry a wafer; A lamp holder assembly, wherein the lamp holder assembly is disposed outside the cavity; A plurality of heating lamps as described in any one of claims 1-12, wherein the plurality of heating lamps are mounted on the lamp holder assembly, and the heating lamps are used to heat the wafer on the wafer base.

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