Cleaning base station and cleaning system
By designing a combined structure of support and cleaning plate in the cleaning base station, combined with the reciprocating movement of the cleaning tank and the cleaning parts, the problem of poor cleaning of mops in the existing cleaning base station is solved, and the full cleaning and improvement of mops are achieved Efficient cleaning effect.
Patent Information
- Application Number
- CN202420040238.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-01-05
- Publication Date
- 2025-01-10
- Estimated Expiration
- 2034-01-05
AI Technical Summary
The existing cleaning base stations have poor cleaning effects on cleaning robot mops, making it difficult to achieve comprehensive cleaning.
A cleaning base station is designed, including a first cleaning module and a second cleaning module. The first cleaning module consists of a support and a cleaning disk. The first cleaning section and a second cleaning section are provided on the side of the cleaning disk facing away from the support. The second cleaning module includes a cleaning tank and a cleaning member, and the cleaning member reciprocates in the cleaning chamber to clean the mop.
Through this design, the cleaning robot mop is achieved in all aspects, which improves the cleaning effect of the cleaning base station, ensures the cleaning of the bottom, side and top surface of the mop, and enhances the cleaning ability.
Smart Images

Figure CN222323493U_ABST
Abstract
Description
Technical Field
[0001] The present disclosure relates to the technical field of cleaning equipment, and in particular to a cleaning base station and a cleaning system. Background Art
[0002] With the development and progress of technology, cleaning equipment such as sweeping robots are increasingly widely used. As a supporting device of the sweeping robot, the cleaning base station is used to automatically clean the mop of the sweeping robot, which can improve the automation of the sweeping robot. In the related art, the cleaning effect of the cleaning base station on the mop of the cleaning robot is poor.
[0003] It should be noted that the information disclosed in the above background technology section is only used to enhance the understanding of the background of the present disclosure, and therefore may include information that does not constitute the prior art known to ordinary technicians in the field. Summary of the invention
[0004] The purpose of the present disclosure is to provide a cleaning base station and a cleaning system, thereby improving the cleaning effect of the cleaning base station on the mop at least to a certain extent.
[0005] According to one aspect of the present disclosure, a cleaning base station is provided, the cleaning base station is used to clean a cleaning host and to charge the cleaning host, the cleaning host has a first cleaning member, and the cleaning base station comprises:
[0006] A first cleaning module, the first cleaning module includes a support and a cleaning tray, the cleaning tray is accommodated in the support, a first cleaning portion and a second cleaning portion are arranged on a surface of the cleaning tray facing away from the support, the first cleaning portion is used for cleaning the bottom surface of the first cleaning component, and the second cleaning portion is used for cleaning the side surface of the first cleaning component.
[0007] According to an embodiment of the present disclosure, a cleaning space is formed on a side of the cleaning tray away from the support, the cleaning space is used to accommodate the first cleaning member, the first cleaning portion is disposed in the cleaning space, and the second cleaning portion is disposed at an edge of the cleaning space.
[0008] According to one embodiment of the present disclosure, the second cleaning unit includes:
[0009] A cleaning section, one end of which is connected to the cleaning disk and is located at the edge of the cleaning space;
[0010] A pressing edge is provided at an end of the cleaning section away from the support, and the pressing edge is used to press the top surface of the first cleaning component.
[0011] According to one embodiment of the present disclosure, the second cleaning portion is disposed at the edge of the cleaning disk, and an arc-shaped cleaning surface is formed on the second cleaning portion. The arc-shaped cleaning surface can be attached to the side of the first cleaning component to achieve cleaning of the side of the first cleaning component.
[0012] According to one embodiment of the present disclosure, a plurality of second cleaning parts are provided on the cleaning disk, and the plurality of second cleaning parts include:
[0013] A main cleaning portion, the main cleaning portion being arranged at the inner edge of the cleaning space;
[0014] An auxiliary cleaning portion, the auxiliary cleaning portion being arranged at a side edge of the cleaning space;
[0015] The cleaning host enters the cleaning space from the outer edge of the cleaning space, the inner edge of the cleaning space is the side of the cleaning space away from the outer edge, and the side edge of the cleaning space is the edge between the inner edge and the outer edge of the cleaning space.
[0016] According to an embodiment of the present disclosure, the height of the auxiliary cleaning part is lower than the height of the main cleaning part.
[0017] According to one embodiment of the present disclosure, a drying hole is provided on the cleaning plate;
[0018] A hot air component is arranged in the cleaning base station, and the hot air component is connected with the support through a drying air duct to transmit hot air to the support.
[0019] According to an embodiment of the present disclosure, a drainage channel is provided in the cleaning base station, and the drying hole is connected to the drainage channel.
[0020] According to an embodiment of the present disclosure, a protrusion is further provided on the cleaning plate, and the protrusion and the drying holes are arranged alternately.
[0021] According to one embodiment of the present disclosure, a plurality of drying hole columns and a plurality of protrusion columns are provided on the cleaning tray, and the drying hole columns and the protrusion columns are alternately arranged, the drying hole columns include a plurality of sequentially arranged drying holes, and the protrusion columns include a plurality of sequentially arranged protrusions.
[0022] According to one embodiment of the present disclosure, the cleaning tray and the support are detachably connected.
[0023] According to an embodiment of the present disclosure, a first clamping portion is provided on the cleaning disc, a second clamping portion is provided in the support, and the first clamping portion and the second clamping portion are clamped.
[0024] According to an embodiment of the present disclosure, the first clamping portion is a clamping column, the second clamping portion is a clamping hole, and the clamping hole passes through the bottom surface of the support.
[0025] According to one embodiment of the present disclosure, a support portion extending toward the support is provided on the cleaning tray, and in response to the cleaning tray being installed on the support, the support portion abuts against the support to form a gap between the cleaning tray and the support.
[0026] According to an embodiment of the present disclosure, a limiting protrusion is provided on the support, a limiting through hole is provided on the cleaning disc, and the limiting protrusion is connected to the limiting through hole.
[0027] According to an embodiment of the present disclosure, the limiting protrusion is a hollow structure, so that the cleaning water flowing through the cleaning tray can pass through the limiting protrusion and the limiting through hole.
[0028] According to an embodiment of the present disclosure, a limiting through hole is provided on the support, a limiting protrusion is provided on the cleaning disc, and the limiting protrusion is connected to the limiting through hole.
[0029] According to one embodiment of the present disclosure, the cleaning base station further includes:
[0030] The second cleaning module is used to clean the second cleaning component of the cleaning host. The cleaning base station is provided with a receiving cavity for receiving the cleaning host, and the receiving cavity has an opening. The second cleaning module is arranged in the receiving cavity, or the second cleaning module is at least partially arranged outside the receiving cavity.
[0031] According to one embodiment of the present disclosure, the second cleaning module includes:
[0032] cleaning tank;
[0033] A cleaning member can reciprocate in the cleaning tank during operation to clean the second cleaning member. The cleaning disk is fixed relative to the support, and the first cleaning member rotates relative to the cleaning disk.
[0034] According to an embodiment of the present disclosure, the support is in fluid communication with the cleaning tank, and the bottom of the support is inclined toward the cleaning tank so that water can flow from the support to the cleaning tank.
[0035] According to a second aspect of the present disclosure, a cleaning base station is provided, which is used to clean a cleaning host and to charge the cleaning host, wherein the cleaning host comprises a first cleaning member and a second cleaning member, and the cleaning base station comprises:
[0036] a first cleaning module, the first cleaning module comprising a cleaning tray, the cleaning tray being used to clean the first cleaning member;
[0037] A second cleaning module, the second cleaning module comprising a cleaning tank and a cleaning member, wherein the cleaning member can move in the cleaning tank;
[0038] Wherein, when cleaning the first cleaning member, the cleaning disk is fixed, the first cleaning member rotates relative to the cleaning disk, and the cleaning piece reciprocates in the cleaning tank to clean the second cleaning member.
[0039] According to one embodiment of the present disclosure, the first cleaning module includes a support and a cleaning tray, the cleaning tray is accommodated in the support, and a first cleaning portion and a second cleaning portion are provided on a surface of the cleaning tray facing away from the support, the first cleaning portion is used to clean the bottom surface of the first cleaning component, and the second cleaning portion is used to clean the side surface of the first cleaning component.
[0040] According to an embodiment of the present disclosure, a cleaning space is formed on a side of the cleaning tray away from the support, the cleaning space is used to accommodate the first cleaning member, the first cleaning portion is disposed in the cleaning space, and the second cleaning portion is disposed at an edge of the cleaning space.
[0041] According to one embodiment of the present disclosure, the second cleaning unit includes:
[0042] A cleaning section, one end of which is connected to the cleaning disk and is located at the edge of the cleaning space;
[0043] A pressing edge is provided at an end of the cleaning section away from the support, and the pressing edge is used to press the top surface of the first cleaning component.
[0044] According to one embodiment of the present disclosure, the second cleaning portion is disposed at the edge of the cleaning disk, and an arc-shaped cleaning surface is formed on the second cleaning portion. The arc-shaped cleaning surface can be attached to the side of the first cleaning component to achieve cleaning of the side of the first cleaning component.
[0045] According to one embodiment of the present disclosure, a plurality of second cleaning parts are provided on the cleaning disk, and the plurality of second cleaning parts include:
[0046] A main cleaning portion, the main cleaning portion being arranged at the inner edge of the cleaning space;
[0047] An auxiliary cleaning portion, the auxiliary cleaning portion being arranged at a side edge of the cleaning space;
[0048] The cleaning host enters the cleaning space from the outer edge of the cleaning space, the inner edge of the cleaning space is the side of the cleaning space away from the outer edge, and the side edge of the cleaning space is the edge between the inner edge and the outer edge of the cleaning space.
[0049] According to an embodiment of the present disclosure, the height of the auxiliary cleaning part is lower than the height of the main cleaning part.
[0050] According to one embodiment of the present disclosure, a drying hole is provided on the cleaning plate;
[0051] A hot air component is arranged in the cleaning base station, and the hot air component is connected with the support through a drying air duct to transmit hot air to the support.
[0052] According to an embodiment of the present disclosure, a drainage channel is provided in the cleaning base station, and the drying hole is connected to the drainage channel.
[0053] According to an embodiment of the present disclosure, a protrusion is further provided on the cleaning plate, and the protrusion and the drying holes are arranged alternately.
[0054] According to one embodiment of the present disclosure, a plurality of drying hole columns and a plurality of protrusion columns are provided on the cleaning tray, and the drying hole columns and the protrusion columns are alternately arranged, the drying hole columns include a plurality of sequentially arranged drying holes, and the protrusion columns include a plurality of sequentially arranged protrusions.
[0055] According to one embodiment of the present disclosure, the cleaning tray and the support are detachably connected.
[0056] According to an embodiment of the present disclosure, a first clamping portion is provided on the cleaning disc, a second clamping portion is provided in the support, and the first clamping portion and the second clamping portion are clamped.
[0057] According to an embodiment of the present disclosure, the first clamping portion is a clamping column, the second clamping portion is a clamping hole, and the clamping hole passes through the bottom surface of the support.
[0058] According to one embodiment of the present disclosure, a support portion extending toward the support is provided on the cleaning tray, and in response to the cleaning tray being installed on the support, the support portion abuts against the support to form a gap between the cleaning tray and the support.
[0059] According to an embodiment of the present disclosure, a limiting protrusion is provided on the support, a limiting through hole is provided on the cleaning disc, and the limiting protrusion is connected to the limiting through hole.
[0060] According to an embodiment of the present disclosure, the limiting protrusion is a hollow structure, so that the cleaning water flowing through the cleaning tray can pass through the limiting protrusion and the limiting through hole.
[0061] According to an embodiment of the present disclosure, a limiting through hole is provided on the support, a limiting protrusion is provided on the cleaning disc, and the limiting protrusion is connected to the limiting through hole.
[0062] According to one embodiment of the present disclosure, the cleaning base station is provided with a accommodating cavity for accommodating the cleaning host, the accommodating cavity has an opening, the second cleaning module is arranged in the accommodating cavity, or the second cleaning module is at least partially arranged outside the accommodating cavity.
[0063] According to an embodiment of the present disclosure, the support is in fluid communication with the cleaning tank, and the bottom of the support is inclined toward the cleaning tank so that water can flow from the support to the cleaning tank.
[0064] According to a third aspect of the present disclosure, there is provided a cleaning system, the cleaning system comprising:
[0065] The above-mentioned cleaning base station;
[0066] The cleaning host comprises a first cleaning component, the first cleaning component is a side mop, and the first cleaning module is used for cleaning the side mop.
[0067] The cleaning base station provided by the embodiment of the present disclosure includes a first cleaning module, and the mopping cleaning module includes a support and a cleaning tray. The cleaning tray is arranged on the top of the support, and a first cleaning part and a second cleaning part are arranged on the side of the cleaning tray away from the support. The first cleaning part is used to clean the bottom surface of the first cleaning component, and the second cleaning part is used to clean the side surface of the second cleaning component. The first cleaning module realizes all-round cleaning of the first cleaning component, thereby improving the cleaning effect of the cleaning base station.
[0068] It is to be understood that the foregoing general description and the following detailed description are exemplary and explanatory only and are not restrictive of the present disclosure. BRIEF DESCRIPTION OF THE DRAWINGS
[0069] The accompanying drawings herein are incorporated into the specification and constitute a part of the specification, illustrate embodiments consistent with the present disclosure, and together with the specification are used to explain the principles of the present disclosure. Obviously, the accompanying drawings described below are only some embodiments of the present disclosure, and for ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without creative work.
[0070] Figure 1 A schematic structural diagram of a cleaning base station provided for an exemplary embodiment of the present disclosure;
[0071] Figure 2 A schematic structural diagram of a ramp plate provided for an exemplary embodiment of the present disclosure;
[0072] Figure 3 A schematic structural diagram of a mop cleaning module provided by an exemplary embodiment of the present disclosure;
[0073] Figure 4 An exploded view of a mop cleaning module provided by an exemplary embodiment of the present disclosure;
[0074] Figure 5 A schematic diagram of the structure of a cleaning host provided by an exemplary embodiment of the present disclosure;
[0075] Figure 6 A schematic structural diagram of a cleaning system provided by an exemplary embodiment of the present disclosure.
[0076] Description of reference numerals:
[0077] 100, cleaning base station; 10, base station body; 101, accommodating cavity; 102, blocking part, 20, ramp plate; 21, raised part; 211, lifting section; 212, descending section; 22, convex edge; 30, first cleaning module; 31, support; 311, second clamping part; 312, limiting protrusion; 32, cleaning plate; 321, first cleaning part; 322, second cleaning part; 3221, main cleaning part; 3222, auxiliary cleaning part; 323, first clamping part; 324, drying hole; 325, limiting through hole; 326, protrusion; 40, second cleaning module; 200, cleaning host; 210, first cleaning component. DETAILED DESCRIPTION
[0078] The following will be combined with the accompanying drawings in the exemplary embodiments of the present disclosure to clearly and completely describe the technical solutions in the exemplary embodiments of the present disclosure. The exemplary embodiments described herein are only for illustrative purposes and are not intended to limit the scope of protection of the present disclosure. Therefore, it should be understood that various modifications and changes can be made to the exemplary embodiments without departing from the scope of protection of the present disclosure.
[0079] In the description of the present disclosure, unless otherwise clearly specified and limited, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance; the term "plurality" refers to two or more; the term "and / or" includes any and all combinations of one or more associated listed items. In particular, reference to "the / the" object or "an" object is also intended to indicate one of a possible plurality of such objects.
[0080] Unless otherwise specified or explained, the terms "connection", "fixation", etc. should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, an integral connection, an electrical connection, or a signal connection; "connection" can be a direct connection or an indirect connection through an intermediate medium. For those skilled in the art, the specific meanings of the above terms in this disclosure can be understood according to specific circumstances.
[0081] Further, in the description of the present disclosure, it should be understood that the directional words such as "upper", "lower", "inner", "outer" and the like described in the exemplary embodiments of the present disclosure are described at the angles shown in the accompanying drawings and should not be understood as limitations on the exemplary embodiments of the present disclosure. It should also be understood that, in the context, when it is mentioned that an element or feature is connected to another element (one or more) "upper", "lower", or "inner", "outer", it can not only be directly connected to the other (one or more) elements "upper", "lower", "inner", "outer", but also can be indirectly connected to the other (one or more) elements "upper", "lower", "inner", "outer" through an intermediate element.
[0082] The exemplary embodiment of the present disclosure first provides a cleaning base station 100, such as Figure 1 and Figure 6 As shown, the cleaning base station 100 is used to clean the cleaning host 200 and to charge the cleaning host 200. The cleaning host 200 has a first cleaning component 210. The cleaning base station 100 includes a first cleaning module 30. The first cleaning module 30 includes a support 31 and a cleaning disk. The cleaning disk is accommodated in the support 31. A first cleaning portion 321 and a second cleaning portion 322 are provided on a side of the cleaning disk facing away from the support 31. The first cleaning portion 321 is used to clean the bottom surface of the first cleaning component 210, and the second cleaning portion 322 is used to clean the side surface of the first cleaning component 210.
[0083] The cleaning base station 100 provided by the embodiment of the present disclosure includes a first cleaning module 30, which includes a support 31 and a cleaning disk. The cleaning disk is accommodated in the support 31, and a first cleaning portion 321 and a second cleaning portion 322 are provided on a surface of the cleaning disk facing away from the support 31. The first cleaning portion 321 is used to clean the bottom surface of the first cleaning component 210, and the second cleaning portion 322 is used to clean the side surface of the first cleaning component 210. The first cleaning module 30 is used to achieve all-round cleaning of the first cleaning component 210, thereby improving the cleaning effect of the cleaning base station 100.
[0084] Furthermore, the cleaning base station 100 provided in the embodiment of the present disclosure may also include a base station body 10, a ramp plate 20 and a second cleaning module, the ramp plate 20 is connected to the base station body 10, and the first cleaning module 30 is arranged on the ramp plate 20. The second cleaning module is arranged on the base station body 10, and the second cleaning module is used to clean the main drag of the cleaning host 200.
[0085] The cleaning base station 100 provided in the embodiment of the present disclosure is described in detail below:
[0086] The cleaning base station 100 is used to clean the cleaning host 200, and the cleaning host 200 may be provided with a first cleaning component 210 and a second cleaning component. The first cleaning component 210 and the second cleaning component are respectively arranged at the bottom of the cleaning host 200. For example, the first cleaning component 210 may be a side mop, and the second cleaning component may be a main mop. When the main mop is working, the area to be cleaned is swept and mopped, and the first cleaning component 210 is located at the edge of the cleaning host 200, and the first cleaning component 210 at least partially extends from the edge of the cleaning host 200, and the first cleaning component 210 is used to clean areas such as corners.
[0087] The base station body 10 is provided with a receiving cavity 101 for receiving the cleaning host 200. The receiving cavity 101 has an opening. The ramp plate 20 is provided on one side of the base station body 10 where the opening is provided. A blocking portion 102 is provided at the bottom of the opening. The blocking portion 102 is higher than the ramp plate 20. The cleaning host 200 enters the base station body 10 from one side of the opening of the receiving cavity 101. The cleaning host 200 may be partially located in the receiving cavity 101 and partially located outside the receiving cavity 101. Of course, in actual applications, the cleaning host 200 may also be completely located in the receiving cavity 101, and the embodiments of the present disclosure are not limited thereto.
[0088] The blocking portion 102 is located at the bottom of the base station body 10. The blocking portion 102 separates the ramp plate 20 and the base station body 10. On the one hand, it blocks foreign objects such as garbage from entering the base station body 10, and on the other hand, it is also used to improve the strength of the base station body 10. The blocking portion 102 is higher than the ramp plate 20, so during the process of the cleaning host 200 being piled up, the blocking portion 102 may hinder the cleaning host 200 from being piled up. By raising the cleaning host 200 by the raised portion 21, it can also be prevented that the blocking portion 102 hinders the cleaning host 200 from being piled up.
[0089] A water supply module, a dust collection module and a drying module may also be provided in the base station body 10. The water supply module may include a water tank, a water supply pipeline and a water pump. The water tank is used to store cleaning water, and the cleaning water is transmitted to the second cleaning module 40 and the first cleaning module 30 through the water supply pipeline and the water pump. Of course, in practical applications, water may also be supplied to the first cleaning module 30 and the second cleaning module 40 through an external water source. The dust collection module is used to collect the garbage and dust collected by the cleaning host 200 to the cleaning base station 100. The drying module is used to provide hot air, and the first cleaning component 210 and the main mop are dried after the first cleaning component 210 and the main mop are cleaned.
[0090] The base station body 10 may include a protective shell, which is used to form the outline of the cleaning base station 100. The water supply module, the dust collection module and the drying module are arranged in the protective shell, and the protective shell protects the devices arranged inside it. For example, the protective shell can be a rectangular parallelepiped or a structure approximately rectangular parallelepiped, and the protective shell can include a top plate and a bottom plate arranged opposite to each other, and a plurality of side plates located between the top plate and the bottom plate, and the opening of the accommodating cavity 101 is arranged on a side plate. Of course, in actual applications, the protective shell can also be a cylindrical structure, etc., and the embodiments of the present disclosure are not limited to this.
[0091] The first cleaning module 30 and the second cleaning module 40 are arranged in the base station body 10, and the first cleaning module 30 is located at the edge of the opening of the base station body 10. The second cleaning module 40 can be arranged in the accommodating cavity 101 of the base station body 10, or the second cleaning module 40 is partially located in the accommodating cavity 101, or the second cleaning module 40 can also be arranged outside the accommodating cavity 101.
[0092] The ramp plate 20 is connected to the base station body 10, and the ramp plate 20 is arranged on one side of the base station body 10 where an opening is arranged. The bottom surface of the ramp plate 20 is flush with the bottom surface of the base station body 10, the top surface of the ramp plate 20 is an inclined surface, and the thickness of the ramp plate 20 increases in the direction close to the base station body 10. In practical applications, the ramp plate 20 and the bottom plate of the base station body 10 can be integrally formed, or the ramp plate 20 and the bottom plate of the base station body 10 are split-molded structures. When the ramp plate 20 and the base station body 10 are split-molded structures, the ramp plate 20 and the base station body 10 can be detachably connected, for example, by snap-on or bolt connection. Of course, in practical applications, the ramp plate 20 and the base station body 10 can be connected by bonding, riveting or welding, etc., and the embodiments of the present disclosure are not limited thereto.
[0093] The top surface of the ramp plate 20 is an inclined surface, that is, the ramp plate 20 plays a transition role when the cleaning host 200 is piled up (returned to the cleaning base station 100), so that the cleaning host 200 can be piled up smoothly, reducing the pile-up resistance and improving the pile-up success rate.
[0094] The ramp plate 20 has a host walking area, which is located on the side of the first cleaning module 30 away from the base station body 10. When the cleaning host 200 enters the cleaning base station 100 or leaves the cleaning base station 100 along the extension direction of the host walking area, the cleaning host 200 contacts the host walking area. The host walking area is provided with a protrusion 21, which is used to raise the height of the cleaning host 200 during the process of the cleaning host 200 entering the cleaning base station 100 so that at least part of the first cleaning component 210 passes over the first cleaning module 30. The cleaning host 200 is lifted by the protrusion 21, and the distance between the cleaning host 200 and the ramp plate 20 is increased, thereby avoiding the problem that the cleaning host 200 is easily interfered with the raised first cleaning module 30 when the cleaning host 200 is piled up.
[0095] like Figure 2 As shown, the raised portion 21 includes a lifting section 211 and a descending section 212. The height of the lifting section 211 increases along the first direction, and the first direction is the walking direction of the cleaning host 200 entering the cleaning base station 100; the descending section 212 is located on the side of the lifting section 211 close to the base station body 10, and the height of the descending section 212 decreases along the first direction. When the running wheel moves forward in the lifting section 211, the height of the lifting section 211 increases, and the cleaning host 200 is gradually lifted. At this time, the first cleaning component 210 is at least partially located above the first cleaning module 30. After passing through the lifting section 211, the running wheel enters the descending section 212, and the height of the descending section 212 gradually decreases. At this time, the first cleaning component 210 approaches the first cleaning module 30, and finally the first cleaning component 210 contacts the first cleaning module 30.
[0096] Among them, the lifting section 211 may include multiple sub-lifting sections, and the curvatures of the multiple self-lifting sections 211 are different. For example, the lifting section 211 may include a first sub-lifting section, a second sub-lifting section, and a third sub-lifting section, and the first sub-lifting section, the second sub-lifting section, and the third sub-lifting section are arranged in sequence in the direction close to the base station body 10, and the curvature of the first sub-lifting section is greater than the curvature of the second sub-lifting section, and the curvature of the third sub-lifting section is greater than the curvature of the second sub-lifting section. The cleaning host 200 can be quickly lifted by the first sub-lifting section and the third sub-lifting section with large curvatures, and the cleaning host 200 can be buffered by the second sub-lifting section with small curvature, so as to avoid the problem of difficulty in pile mounting caused by the cleaning host 200 driving in a large curvature section for a long time.
[0097] It is understood that, in some embodiments, the raised portion 21 may further include a transition section, which is disposed between the lifting section 211 and the descending section 212, and the transition section respectively connects the lifting section 211 and the descending section 212. The transition section is a straight section, that is, the surface of the transition section is parallel to the bottom surface of the ramp plate 20.
[0098] The edge of the raised portion 21 is provided with a convex edge 22, and the convex edge protrudes in the direction in which the raised portion 21 is away from the ramp plate 20. For example, the convex edges 22 are provided on both sides of the raised portion 21 along the first direction, and the first direction is the direction when the cleaning host 200 is piled up (the direction close to the base station body 10). The convex edge 22 is used to support the main brush assembly of the cleaning host 200 to prevent the main brush assembly from contacting the raised portion 21 and affecting the pile-up of the cleaning host 200. The top surface of the convex edge 22 is higher than the top surface of the raised portion 21. For example, the height difference between the top surface of the convex edge 22 and the top surface of the raised portion 21 is 1mm, 1.5mm, 2mm or 3mm, etc.
[0099] The maximum height of the protrusion 21 is configured such that when the travel wheel is at the highest point of the protrusion 21, the cleaning mainframe 200 is higher than the height of the first cleaning module 30. That is, the bottom surface of the cleaning mainframe 200 is higher than the top surface of the first cleaning module 30, and the bottom surface of the first cleaning component 210 is higher than the top surface of the first cleaning module 30. This avoids the problem that the cleaning mainframe 200 is easily blocked by the first cleaning module 30 when the cleaning mainframe is piled.
[0100] The ramp plate 20 has a first host walking area and a second host walking area arranged at intervals, the first host walking area is provided with a first protrusion, the second walking area is provided with a second protrusion, the host walking area is provided with a first protrusion and a second protrusion, and there is a preset interval between the first protrusion and the second protrusion. The edge of the first protrusion facing the second protrusion is provided with a first convex edge, and the edge of the second protrusion facing the first protrusion is provided with a second convex edge.
[0101] The first protrusion and the second protrusion respectively correspond to the running wheels of the cleaning host 200. When the cleaning host 200 is piled, the first protrusion and the second protrusion respectively support the running wheels on one side of the cleaning host 200. That is, the first protrusion and the second protrusion are respectively arranged on the running track of the running wheels of the cleaning host 200.
[0102] There is a preset interval between the first protrusion and the second protrusion, and the width of the preset interval between the first protrusion and the second protrusion is greater than the length of the main brush assembly. The preset interval between the first protrusion and the second protrusion refers to the distance from the edge of the first protrusion close to the second protrusion to the edge of the second protrusion close to the first protrusion. On the one hand, there are no running wheels in the area between the two protrusions 21, so providing a spacing area between the two protrusions 21 can reduce materials and save costs. On the other hand, since the main brush assembly protrudes from the bottom surface of the cleaning host 200, the interval between the first cleaning portion 321 and the second cleaning portion 322 can allow the main brush assembly to pass through, thereby avoiding friction between the main brush assembly and the protrusion 21 and affecting the pile of the cleaning host 200.
[0103] It should be noted that the interval between the first protrusion and the second protrusion in the embodiment of the present disclosure realizes the avoidance of the main brush assembly, and the distance between the first protrusion and the second protrusion is greater than the length of the main brush assembly. However, in actual application, the trajectory of the cleaning host 200 when it is piled may have an error with the ideal trajectory. At this time, part of the main brush assembly may be placed on the protrusion 21, and the friction of the protrusion 21 is relatively large, which will affect the pile of the cleaning host 200. The convex edge 22 set on the edge of the protrusion 21 can avoid the main brush assembly and the protrusion 21 from contact, thereby facilitating the pile of the cleaning host 200.
[0104] In order to ensure that the cleaning host 200 can be piled in the embodiment of the present disclosure, an anti-skid structure can be provided on the surface of the raised portion 21. The anti-skid structure can be a texture structure on the surface of the raised portion 21, for example, the anti-skid structure can be a plurality of anti-skid ribs arranged in parallel on the surface of the raised portion 21, and the extension direction of the anti-skid ribs is perpendicular to the forward direction of the cleaning host 200. Alternatively, the anti-skid structure can also be a cross groove, a diamond groove, etc. on the surface of the raised portion 21.
[0105] When the surface of the raised portion 21 is provided with an anti-skid structure, the convex edge 22 on the raised portion 21 is higher than the anti-skid structure. For example, the anti-skid structure includes anti-skid convex ribs, and the projection of the anti-skid convex ribs on the side of the convex edge 22 is located inside the convex edge 22. This can prevent the anti-skid convex ribs from rubbing against the main brush assembly, thereby preventing the cleaning main unit from being difficult to get on and off.
[0106] The first cleaning module 30 is disposed on the main body of the base station, and the first cleaning module 30 protrudes from the top surface of the ramp plate 20. The first cleaning component 210 is disposed on the edge of the cleaning host 200. In order to align with the first cleaning component 210, the first cleaning module 30 is located at a position of the base station main body 10 close to the opening of the accommodating cavity 101. The first cleaning module 30 is at least partially located outside the main body of the base station 10 and embedded in the notch on the ramp plate 20. After the cleaning host 200 is piled up, the first cleaning component 210 is located outside the accommodating cavity 101, and the first cleaning component 210 and the first cleaning module 30 are aligned.
[0107] like Figure 3 and Figure 4 As shown, the first cleaning module 30 includes a support 31 and a cleaning tray 32. The cleaning tray 32 is arranged on the top of the support 31. The first cleaning portion 321 and the second cleaning portion 322 are arranged on the side of the cleaning tray 32 facing away from the support 31. The first cleaning portion 321 protrudes from the surface of the cleaning tray, and the second cleaning portion 322 protrudes from the surface of the cleaning tray 32. The first cleaning portion 321 is used to clean the bottom surface of the first cleaning component 210, and the second cleaning portion 322 is used to clean the side surface of the first cleaning component 210.
[0108] The cleaning disc 32 may be a disc, the first cleaning portion 321 and the second cleaning portion 322 are arranged on the top surface of the disc, and the first cleaning portion 321 and the second cleaning portion 322 are connected to the cleaning disc 32. The first cleaning portion 321 and the cleaning disc 32 may be an integrally formed structure, or the first cleaning portion 321 and the cleaning disc 32 may be a split-formed structure. The second cleaning portion 322 and the cleaning disc 32 may be an integrally formed structure, or the second cleaning portion 322 and the cleaning disc 32 may be a split-formed structure. When the first cleaning portion 321 and the second cleaning portion 322 and the cleaning disc 32 are split-formed structures, the connection method of the first cleaning portion 321 and the cleaning disc 32 may be bonding, welding, bolting, clamping or riveting.
[0109] A cleaning space is formed on one side of the cleaning plate 32 away from the support 31 . The cleaning space is used to accommodate the first cleaning member 210 . The first cleaning portion 321 is disposed in the cleaning space, and the second cleaning portion 322 is disposed at the edge of the cleaning space.
[0110] The first cleaning portion 321 has the function of cleaning the bottom surface of the first cleaning member 210 and also has the function of scraping off the dirty water on the first cleaning member 210. The side of the first cleaning portion 321 facing away from the support 31 and the cleaning disk are arranged obliquely, so that the side of the first cleaning portion 321 facing away from the support 31 and the top surface of the first cleaning member 210 are not parallel. By obliquely arranging the top surface of the first cleaning portion 321, when cleaning the bottom surface of the first cleaning member 210, the dirty water scraped off the first cleaning member 210 can be directed to the support 31 through the inclined surface.
[0111] For example, when the first cleaning member 210 is a circular structure, after the first cleaning member 210 and the first cleaning module 30 are aligned, the projection of the first cleaning portion 321 on the first cleaning member 210 covers the center of the first cleaning member 210. Further, the edge of the top surface of the first cleaning portion 321 passes through the center of the first cleaning member 210, so that the bottom surface of the first cleaning member 210 can be cleaned without dead angles.
[0112] In actual application, the first cleaning member 210 can include a tray and a mop, and the mop covers the bottom surface, the side surface and the top surface of part of the tray. The bottom surface, the side surface and the top surface of the mop are all contaminated during mopping, so when cleaning, it is necessary to clean the bottom surface, the side surface and the top surface of the mop. In order to realize comprehensive cleaning of the mop, the second cleaning part 322 is arranged at the edge of the cleaning tray, and the second cleaning part 322 can include a cleaning section and a pressing edge, and the cleaning section is connected with the cleaning tray, and the cleaning section is located at the edge of the cleaning space, and the pressing edge is located at an end of the cleaning section away from the cleaning tray, and the pressing edge is used to compress the top surface of the first cleaning member 210. The cleaning section is used to clean the side of the first cleaning member 210, and the pressing edge extends inwardly from the cleaning section, and when the first cleaning member 210 is located on the first cleaning member 210 cleaning frame, the pressing edge contacts the top surface of the first cleaning member 210, and the cleaning and pressing of the top surface of the first cleaning member 210 are realized.
[0113] For example, the second cleaning portion 322 is disposed at the edge of the cleaning disk 32, and an arc-shaped cleaning surface is formed on the second cleaning portion 322, and the cleaning surface can be attached to the side of the first cleaning member 210 to achieve cleaning of the first cleaning member 210. The arc-shaped cleaning surface is disposed on the inner side of the second cleaning portion 322, and the inner side of the second cleaning portion 322 is a side of the second cleaning portion 322 close to the central axis of the cleaning disk. When a plurality of second cleaning portions 322 are disposed on the cleaning disk, the plurality of second cleaning portions 322 are distributed along the edge of the cleaning disk.
[0114] A plurality of second cleaning parts are arranged on the cleaning disk, and the plurality of second cleaning parts include a main cleaning part 3221 and an auxiliary cleaning part 3222. The main cleaning part 3221 is arranged at the inner edge of the cleaning space; the auxiliary cleaning part 3222 is arranged at the side edge of the cleaning space; wherein the cleaning host 200 enters the cleaning space from the outer edge of the cleaning space, the inner edge of the cleaning space is the side of the cleaning space away from the outer edge, and the side edge of the cleaning space is the edge between the inner edge and the outer edge of the cleaning space. For example, when the cleaning disk 32 is a circular disk, the two ends of the diameter of the cleaning disk 32 along the pile direction of the cleaning host 200 are the inner edge and the outer edge respectively.
[0115] When the cleaning host 200 is piled, the cleaning host 200 moves strictly according to the preset trajectory under ideal conditions. At this time, the first cleaning component 210 is in contact with the main cleaning part 3221, and the side of the first cleaning component 210 is cleaned by the main cleaning part 3221. However, in actual applications, due to positioning errors and other reasons, the cleaning host 200 may deviate from the ideal position. At this time, the first cleaning component 210 may not be able to contact the main cleaning part 3221. The auxiliary cleaning part 3222 set at the side edge can ensure the cleaning of the side of the first cleaning component 210 in this case. In addition, the auxiliary cleaning part 3222 can limit the first cleaning component 210 during the cleaning process to prevent the first cleaning component 210 from deviating from the cleaning space due to vibration or rotation during cleaning.
[0116] The height of the auxiliary cleaning section 3222 is lower than that of the main cleaning section 3221. The auxiliary cleaning section 3222 is located at the front side of the main cleaning section 3221. When the cleaning main unit 200 is mounted, the auxiliary cleaning section 3222 is prone to scratch the bottom surface of the cleaning main unit 100 (the bottom surface of the first cleaning component). Therefore, setting the height of the auxiliary cleaning section 3222 to be lower than that of the main cleaning section 3221 can prevent the auxiliary cleaning section 3222 from scratching the bottom of the cleaning main unit, which is beneficial for mounting the cleaning main unit 200.
[0117] A drying hole 324 may also be provided on the cleaning plate 32, and a hot air assembly is provided in the cleaning base station 100, and the hot air assembly is connected to the support through a drying air duct to transmit the hot air to the support. The drying hole 324 on the cleaning plate is used to allow hot air to pass through to dry the first cleaning member 210. A drainage channel is provided in the cleaning base station 100, and the drying hole 324 is connected to the drainage channel. That is, the drying hole also serves as a drainage channel, so that space on the cleaning plate 32 can be saved.
[0118] The cleaning plate 32 is also provided with protrusions 326 (eg, convex points or convex ribs), and the protrusions 326 and the drying holes 324 are arranged alternately. The protrusions 326 can improve the cleaning effect and quickly dehydrate the first cleaning member 210.
[0119] For example, a plurality of drying hole columns and a plurality of protrusion columns are provided on the cleaning plate 32, and the drying hole columns and the protrusion columns are alternately arranged. The drying hole columns include a plurality of sequentially arranged drying holes 324, and the protrusion columns include a plurality of sequentially arranged protrusions 326.
[0120] A limiting through hole 325 may also be provided on the cleaning disk. The limiting through hole 325 is used to limit the cleaning disk on one hand, and on the other hand, to allow cleaning water to flow through the cleaning disk to clean the first cleaning member 210 .
[0121] The support 31 is a hollow structure, for example, the support 31 can be a hollow cylindrical structure. A limit protrusion 312 can be set in the support 31, the limit protrusion 312 cooperates with the limit through hole 325 on the cleaning plate, and a cleaning pipeline is set in the limit protrusion 312, and the cleaning pipeline is used to provide the first cleaning component 210 with cleaning water.
[0122] A drying module is provided in the base station body 10, and the support 31 is connected to the base station body 10 to form a hot air channel to transmit the hot air to the drying hole 324. The support 31 is provided with an air hole, which is connected to the hot air channel of the base station body 10. The hot air generated by the drying module enters the cavity in the support 31 through the hot air channel, and dries the first cleaning member 210 through the drying hole 324 in the cleaning plate. The cleaning pipeline is connected to the water supply module in the base station body 10, and the cleaning water in the water supply module is transmitted to the cleaning plate through the cleaning pipeline.
[0123] It is understandable that in some other embodiments, a limiting through hole is provided on the support 31, a limiting protrusion is provided on the cleaning plate 32, and the limiting protrusion is connected to the limiting through hole, which is not specifically limited in the embodiments of the present disclosure.
[0124] In a feasible embodiment, the cleaning disc and the support 31 are detachably connected. For example, the cleaning disc and the support 31 are clamped, a first clamping portion 323 is provided on the cleaning disc, a second clamping portion 311 is provided in the support 31, and the first clamping portion 323 and the second clamping portion 311 are clamped.
[0125] The first clamping part 323 is a clamping column, and the second clamping part 311 is a clamping hole provided on the support 31, and the clamping column extends into the clamping hole. A convex point is provided on the inner wall of the clamping hole, and an elastic clamping section is provided on the clamping column. When the first clamping part 323 and the second clamping part 311 are connected, the convex point in the clamping hole is at least partially embedded in the elastic clamping section, so as to realize the axial positioning of the washing plate and the support 31. Further, in order to avoid water accumulation in the clamping hole, the clamping hole can pass through the bottom surface of the support 31. And the clamping hole passing through the bottom surface of the support 31 can increase the drainage path, which is conducive to rapid drainage.
[0126] The limiting protrusion 312 on the support 31 is arranged in parallel with the clamping column. The limiting protrusion 312 is used to prevent mistakes, which facilitates installation and positioning, and realizes the circumferential positioning of the cleaning plate 32. The limiting protrusion 312 has a hollow structure inside, which forms a cleaning pipeline. The limiting protrusion 312 realizes the two functions of limiting and water supply, which effectively saves space and cost.
[0127] It is understandable that in practical applications, the cleaning tray 32 and the support 31 may also be fixedly connected, for example, the cleaning tray 32 and the support 31 are an integrally formed structure. Alternatively, the cleaning tray and the support 31 may be connected by bonding or welding, and the embodiments of the present disclosure are not limited thereto.
[0128] There may be a gap between the cleaning disc and the support 31 to facilitate the discharge of sewage. For example, the cleaning disc 32 is provided with a support portion extending toward the support, and in response to the cleaning disc 32 being mounted to the support 31, the support portion abuts against the support 31 to form a gap between the cleaning disc and the support 31.
[0129] In the embodiment of the present disclosure, when cleaning the first cleaning member 210, the first cleaning member 210 is located above the first cleaning module 30, the first cleaning member 210 rotates, the base station body 10 supplies water to the first cleaning module 30, and sprays water to the first cleaning member 210 through the limiting through hole 325. When the first cleaning member 210 rotates, the bottom surface of the first cleaning member 210 is cleaned through the first cleaning part 321, and the side surface of the first cleaning member 210 is cleaned through the second cleaning part 322. After cleaning, hot air is transmitted to the first cleaning member 210 through the drying hole 324 to dry the first cleaning member 210.
[0130] The second cleaning module 40 is disposed in the accommodating chamber 101, and the second cleaning module 40 is used to clean the second cleaning component (e.g., the main drag) of the cleaning host 200. The cleaning base station 100 is provided with an accommodating chamber 101 for accommodating the cleaning host 200, and the accommodating chamber 101 has an opening. The second cleaning module 40 is disposed in the accommodating chamber 101, or the second cleaning module 40 is at least partially disposed outside the accommodating chamber 101. By at least partially arranging the second cleaning module 40 in the accommodating chamber 101, the width of the cleaning base station can be reduced, which is conducive to the miniaturization of the cleaning base station.
[0131] In the cleaning host 200, the area of the main mop is larger than the area of the side mop. The main mop plays a major role in the cleaning process, and the side mop is used to clean corners that the main mop cannot clean.
[0132] The second cleaning module 40 includes a cleaning tank and a cleaning member. The cleaning member can reciprocate in the cleaning tank during operation to clean the second cleaning member. The cleaning disk is fixed relative to the support 31 , and the first cleaning member 210 rotates relative to the cleaning disk 32 .
[0133] The cleaning tank is provided with a guide groove along the second direction, the second direction being perpendicular to the first direction. The cleaning member is connected to the driving member, and the driving member drives the cleaning member to reciprocate along the guide groove, thereby cleaning the first cleaning component.
[0134] The support 31 is in fluid communication with the cleaning tank, and the bottom of the support 31 is inclined toward the cleaning tank, so that water can flow from the support to the cleaning tank. The first cleaning module 30 and the second cleaning module 40 share a drainage channel, saving space and cost.
[0135] It is worth noting that in the embodiment of the present disclosure, the cleaning base station 100 is used to clean the cleaning host 200, but the role of the cleaning base station 100 is not limited to cleaning the cleaning host 200. The cleaning base station 100 can also be used for dust collection and charging of the cleaning host 200.
[0136] The cleaning base station 100 provided by the embodiment of the present disclosure includes a first cleaning module 30, which includes a support 31 and a cleaning disk. The cleaning disk is arranged on the top of the support 31, and a first cleaning portion 321 and a second cleaning portion 322 are arranged on the side of the cleaning disk away from the support 31. The first cleaning portion 321 is used to clean the bottom surface of the first cleaning component 210, and the second cleaning portion 322 is used to clean the side surface of the first cleaning component 210. The first cleaning module 30 is used to achieve all-round cleaning of the first cleaning component 210, thereby improving the cleaning effect of the cleaning base station 100.
[0137] The exemplary embodiment of the present disclosure also provides another cleaning base station for cleaning a cleaning host and for charging the cleaning host 200, the cleaning host includes a first cleaning component 210 and a second cleaning component, the cleaning base station includes: a first cleaning module 30 and a second cleaning module 40, the first cleaning module 30 includes a cleaning disk 32, the cleaning disk is used to clean the first cleaning component 210; the second cleaning module 40 includes a cleaning tank and a cleaning member, the cleaning member can move in the cleaning tank; wherein, when cleaning the first cleaning member 210, the cleaning disk 32 is fixed, the first cleaning member 210 rotates relative to the cleaning disk 32, and the cleaning member reciprocates in the cleaning tank to clean the second cleaning member.
[0138] The cleaning base station provided by the embodiment of the present disclosure includes a first cleaning module 30 and a second cleaning module 40. The first cleaning module includes a cleaning disk 32, and the cleaning disk 32 is used to clean the first cleaning component 210. The second cleaning module 40 includes a cleaning tank and a cleaning piece. The cleaning piece and the cleaning tank are slidably connected. When the cleaning base station is working, the cleaning disk 32 is fixed, the first cleaning component 210 rotates relative to the cleaning disk 32, and the cleaning piece reciprocates in the cleaning tank to clean the second cleaning component. The combination of rotary cleaning and reciprocating cleaning improves the cleaning capacity and improves the integration capacity of the cleaning base station.
[0139] It should be noted that the specific structures of the first cleaning module 30 and the second cleaning module 40 in the embodiment of the present disclosure, and the base station body 10 cooperating therewith, have been described in detail in the above embodiments, and will not be repeated here.
[0140] The exemplary embodiment of the present disclosure also provides a cleaning system, which includes a cleaning base station 100 and a cleaning host 200, wherein the cleaning host 200 includes a first cleaning component 210, wherein the first cleaning component 210 is a side mop, and a first cleaning module 30 is used to clean the side mop. The first cleaning module 30 is used to clean the first cleaning component 210. The cleaning base station 100 includes a first cleaning module 30, wherein the first cleaning module 30 includes a support 31 and a cleaning tray, wherein the cleaning tray is disposed on the top of the support 31, and a first cleaning portion 321 and a second cleaning portion 322 are disposed on a side of the cleaning tray away from the support 31, wherein the first cleaning portion 321 is used to clean the bottom surface of the first cleaning component 210, and the second cleaning portion 322 is used to clean the side surface of the first cleaning component 210.
[0141] The cleaning system provided by the embodiment of the present disclosure includes a cleaning base station 100. In the cleaning base station 100, the first cleaning module 30 includes a support 31 and a cleaning disk. The cleaning disk is arranged on the top of the support 31. The first cleaning part 321 and the second cleaning part 322 are arranged on the side of the cleaning disk away from the support 31. The first cleaning part 321 is used to clean the bottom surface of the first cleaning component 210, and the second cleaning part 322 is used to clean the side surface of the first cleaning component 210. The first cleaning module 30 is used to achieve all-round cleaning of the first cleaning component 210, thereby improving the cleaning effect of the cleaning base station 100.
[0142] Furthermore, the cleaning host 200 may also include a main body and a main brush assembly, the walking wheels and the first cleaning component 210 are arranged at the bottom of the main body; the main brush assembly is arranged in the main body, and the main brush assembly at least partially protrudes from the bottom surface of the main body; wherein, a first protrusion and a second protrusion are arranged on the ramp plate 20, and a preset interval is provided between the first protrusion and the second protrusion, and in the process of the cleaning host 200 entering the cleaning base station 100, the main brush assembly is located between the first protrusion and the second protrusion.
[0143] For example, Figure 5 As shown, the cleaning host 200 may be a cleaning robot, and the cleaning robot may further include a housing, a collecting component, a walking component, a mopping component, and a control component, etc. The main brush component, the collecting component, the walking component, and the control component are installed on the housing, the collecting component is used to collect the cleaned objects, the walking component is used to drive the cleaning robot to move, the mopping component is used to mop the floor, and the control component is used to detect and control the operation of the cleaning robot.
[0144] The housing is used to form the outer contour of the cleaning host 200, for example, the housing is cylindrical. The mopping assembly includes a first cleaning component 210 and a second cleaning component. The first cleaning component 210 is arranged at the bottom of the housing, and the first cleaning component 210 partially exceeds the side of the housing, and the second cleaning component is installed on the bottom surface of the housing. The main brush assembly is arranged on the bottom surface of the housing, and the main brush assembly is used to sweep garbage and dust into the cleaning host 200, and the main brush assembly at least partially protrudes from the bottom surface of the housing.
[0145] The housing may include a top plate, a bottom plate and a side plate, the top plate and the bottom plate are arranged opposite to each other, the side plate connects the top plate and the bottom plate, and a receiving cavity 101 is formed between the top plate and the bottom plate. When the cleaning robot is working, the bottom plate faces the bottom surface, the walking component, the mopping component and the main brush component are arranged on the bottom plate, the collecting component can be arranged in the receiving cavity 101 in the housing, and the control component can be arranged on the top plate or the side plate.
[0146] The collection assembly may include a dust box and a dust suction unit. The dust box is disposed in the accommodating chamber 101. The dust box is used to collect the cleaned material. An opening may be provided on the bottom plate, which is connected to the dust box. The cleaned material enters the dust box through the opening on the bottom plate. The dust suction unit is connected to the dust box. The dust suction unit is used to suck the cleaned material into the dust box. A filter may be provided between the dust box and the dust suction unit. The filter is used to prevent foreign matter from entering the dust suction unit.
[0147] The walking assembly may include a steering wheel and a driven wheel, etc. The steering wheel is mounted on the bottom plate, and the steering wheel is used to drive the cleaning robot to move and control the movement direction of the cleaning robot. The driven wheel is mounted on the bottom plate, and the driven wheel is used to reduce the friction between the cleaning robot and the ground. Of course, in practical applications, the walking assembly may also be in other forms, for example, the walking assembly may be a crawler type, etc., and the embodiments of the present disclosure are not limited thereto.
[0148] The control component may include a control module and a detection module. The detection module may include a radar, a camera, a speed sensor, a photoelectric sensor, a gyroscope, and a contact sensor, etc. The detection module detects the environmental scene and the state of the cleaning robot. The control module and the detection module, the control module is used to control the cleaning robot according to the signal detected by the detection module.
[0149] Furthermore, the control component may further include a communication module, which is connected to the control module and is used to connect to a network device or a control terminal, etc. The communication module may include a WiFi module, a Bluetooth module, an infrared communication module, or a near field communication module, etc.
[0150] The cleaning system provided by the embodiment of the present disclosure includes a cleaning base station 100. In the cleaning base station 100, the first cleaning module 30 includes a support 31 and a cleaning disk. The cleaning disk is arranged on the top of the support 31. The first cleaning part 321 and the second cleaning part 322 are arranged on the side of the cleaning disk away from the support 31. The first cleaning part 321 is used to clean the bottom surface of the first cleaning component 210, and the second cleaning part 322 is used to clean the side surface of the first cleaning component 210. The first cleaning module 30 is used to achieve all-round cleaning of the first cleaning component 210, thereby improving the cleaning effect of the cleaning base station 100.
[0151] Those skilled in the art will readily appreciate other embodiments of the present disclosure after considering the specification and practicing the invention disclosed herein. This application is intended to cover any modification, use or adaptation of the present disclosure, which follows the general principles of the present disclosure and includes common knowledge or customary techniques in the art that are not disclosed in the present disclosure. The specification and examples are intended to be exemplary only, and the true scope and spirit of the present disclosure are indicated by the appended claims.
Claims
1. A cleaning base station, characterized in that: The cleaning base station is used to clean a cleaning host and to charge the cleaning host. The cleaning host has a first cleaning component. The cleaning base station includes: A first cleaning module, the first cleaning module includes a support and a cleaning tray, the cleaning tray is accommodated in the support, a first cleaning portion and a second cleaning portion are arranged on a surface of the cleaning tray facing away from the support, the first cleaning portion is used for cleaning the bottom surface of the first cleaning component, and the second cleaning portion is used for cleaning the side surface of the first cleaning component.
2. The cleaning base station according to claim 1, characterized in that: A cleaning space is formed on a side of the cleaning tray away from the support, and the cleaning space is used to accommodate the first cleaning member. The first cleaning portion is arranged in the cleaning space, and the second cleaning portion is arranged at an edge of the cleaning space.
3. The cleaning base station according to claim 2, characterized in that: The second cleaning unit comprises: A cleaning section, one end of which is connected to the cleaning disk, and the cleaning section is located at the edge of the cleaning space; A pressing edge is provided at an end of the cleaning section away from the support, and the pressing edge is used to press the top surface of the first cleaning component.
4. The cleaning base station according to claim 1, characterized in that: The second cleaning portion is arranged at the edge of the cleaning disk, and an arc-shaped cleaning surface is formed on the second cleaning portion. The arc-shaped cleaning surface can be attached to the side surface of the first cleaning component to achieve cleaning of the side surface of the first cleaning component.
5. The cleaning base station according to claim 2, characterized in that: The cleaning disk is provided with a plurality of second cleaning parts, and the plurality of second cleaning parts include: A main cleaning portion, the main cleaning portion being arranged at the inner edge of the cleaning space; An auxiliary cleaning portion, the auxiliary cleaning portion being arranged at a side edge of the cleaning space; The cleaning host enters the cleaning space from the outer edge of the cleaning space, the inner edge of the cleaning space is the side of the cleaning space away from the outer edge, and the side edge of the cleaning space is the edge between the inner edge and the outer edge of the cleaning space.
6. The cleaning base station according to claim 5, characterized in that: The height of the auxiliary cleaning part is lower than that of the main cleaning part.
7. The cleaning base station according to claim 1, characterized in that: The cleaning plate is provided with drying holes; A hot air component is arranged in the cleaning base station, and the hot air component is connected with the support through a drying air duct to transmit hot air to the support.
8. The cleaning base station according to claim 7, characterized in that: A drainage channel is provided in the cleaning base station, and the drying hole is communicated with the drainage channel.
9. The cleaning base station according to claim 8, characterized in that: The cleaning plate is also provided with protrusions, and the protrusions and the drying holes are arranged alternately.
10. The cleaning base station according to claim 9, characterized in that: The cleaning plate is provided with a plurality of drying hole columns and a plurality of protrusion columns, the drying hole columns and the protrusion columns are arranged alternately, the drying hole columns include a plurality of sequentially arranged drying holes, and the protrusion columns include a plurality of sequentially arranged protrusions.
11. The cleaning base station according to claim 1, characterized in that: The cleaning tray and the support are detachably connected.
12. The cleaning base station according to claim 11, characterized in that: The cleaning disc is provided with a first clamping portion, the support is provided with a second clamping portion, and the first clamping portion is clamped with the second clamping portion.
13. The cleaning base station according to claim 12, characterized in that: The first clamping portion is a clamping column, the second clamping portion is a clamping hole, and the clamping hole passes through the bottom surface of the support.
14. The cleaning base station according to claim 11, characterized in that: The cleaning tray is provided with a support portion extending toward the support. In response to the cleaning tray being installed on the support, the support portion abuts against the support to form a gap between the cleaning tray and the support.
15. The cleaning base station according to claim 11, characterized in that: A limiting protrusion is arranged on the support, a limiting through hole is arranged on the cleaning disc, and the limiting protrusion is connected to the limiting through hole.
16. The cleaning base station according to claim 15, characterized in that: The limiting protrusion is a hollow structure, so that the cleaning water flowing through the cleaning plate can pass through the limiting protrusion and the limiting through hole.
17. The cleaning base station according to claim 11, characterized in that: The support is provided with a limiting through hole, the cleaning disc is provided with a limiting protrusion, and the limiting protrusion is connected to the limiting through hole.
18. The cleaning base station according to claim 1, characterized in that: The cleaning base station also includes: The second cleaning module is used to clean the second cleaning component of the cleaning host. The cleaning base station is provided with a receiving cavity for receiving the cleaning host, and the receiving cavity has an opening. The second cleaning module is arranged in the receiving cavity, or the second cleaning module is at least partially arranged outside the receiving cavity.
19. The cleaning base station according to claim 18, characterized in that: The second cleaning module comprises: cleaning tank; A cleaning member can reciprocate in the cleaning tank when in operation to clean the second cleaning member. The cleaning disc is fixed relative to the support, and the first cleaning member rotates relative to the cleaning disc.
20. The cleaning base station according to claim 19, characterized in that: The support is in fluid communication with the cleaning tank, and the bottom of the support is inclined toward the cleaning tank so that water can flow from the support to the cleaning tank.
21. A cleaning base station, characterized in that: Used for cleaning a cleaning host and charging the cleaning host, the cleaning host comprises a first cleaning component and a second cleaning component, and the cleaning base station comprises: a first cleaning module, the first cleaning module comprising a cleaning tray, the cleaning tray being used to clean the first cleaning member; A second cleaning module, the second cleaning module comprising a cleaning tank and a cleaning member, wherein the cleaning member can move in the cleaning tank; Wherein, when cleaning the first cleaning member, the cleaning disk is fixed, the first cleaning member rotates relative to the cleaning disk, and the cleaning piece reciprocates in the cleaning tank to clean the second cleaning member.
22. The cleaning base station according to claim 21, characterized in that: The first cleaning module includes a support and a cleaning tray, the cleaning tray is accommodated in the support, and a first cleaning portion and a second cleaning portion are provided on a surface of the cleaning tray facing away from the support, the first cleaning portion is used to clean the bottom surface of the first cleaning component, and the second cleaning portion is used to clean the side surface of the first cleaning component.
23. The cleaning base station according to claim 22, characterized in that: A cleaning space is formed on a side of the cleaning tray away from the support, and the cleaning space is used to accommodate the first cleaning member. The first cleaning portion is arranged in the cleaning space, and the second cleaning portion is arranged at an edge of the cleaning space.
24. The cleaning base station according to claim 23, characterized in that: The second cleaning unit comprises: A cleaning section, one end of which is connected to the cleaning disk and is located at the edge of the cleaning space; A pressing edge is provided at an end of the cleaning section away from the support, and the pressing edge is used to press the top surface of the first cleaning component.
25. The cleaning base station according to claim 23, characterized in that: The second cleaning portion is arranged at the edge of the cleaning disk, and an arc-shaped cleaning surface is formed on the second cleaning portion. The arc-shaped cleaning surface can be attached to the side surface of the first cleaning component to achieve cleaning of the side surface of the first cleaning component.
26. The cleaning base station according to claim 23, characterized in that: The cleaning disk is provided with a plurality of second cleaning parts, and the plurality of second cleaning parts include: A main cleaning portion, the main cleaning portion being arranged at the inner edge of the cleaning space; An auxiliary cleaning portion, the auxiliary cleaning portion being arranged at a side edge of the cleaning space; The cleaning host enters the cleaning space from the outer edge of the cleaning space, the inner edge of the cleaning space is the side of the cleaning space away from the outer edge, and the side edge of the cleaning space is the edge between the inner edge and the outer edge of the cleaning space.
27. The cleaning base station according to claim 26, characterized in that: The height of the auxiliary cleaning part is lower than that of the main cleaning part.
28. The cleaning base station according to claim 22, characterized in that: The cleaning plate is provided with drying holes; A hot air component is arranged in the cleaning base station, and the hot air component is connected with the support through a drying air duct to transmit hot air to the support.
29. The cleaning base station according to claim 28, characterized in that: The cleaning base station is provided with a drainage channel, and the drying hole is communicated with the drainage channel.
30. The cleaning base station according to claim 29, characterized in that: The cleaning plate is also provided with protrusions, and the protrusions and the drying holes are arranged alternately.
31. The cleaning base station according to claim 30, characterized in that: The cleaning plate is provided with a plurality of drying hole columns and a plurality of protrusion columns, the drying hole columns and the protrusion columns are arranged alternately, the drying hole columns include a plurality of sequentially arranged drying holes, and the protrusion columns include a plurality of sequentially arranged protrusions.
32. The cleaning base station according to claim 22, characterized in that: The cleaning tray and the support are detachably connected.
33. The cleaning base station according to claim 32, characterized in that: The cleaning disc is provided with a first clamping portion, the support is provided with a second clamping portion, and the first clamping portion is clamped with the second clamping portion.
34. The cleaning base station according to claim 33, characterized in that: The first clamping portion is a clamping column, the second clamping portion is a clamping hole, and the clamping hole passes through the bottom surface of the support.
35. The cleaning base station according to claim 33, characterized in that: The cleaning tray is provided with a support portion extending toward the support. In response to the cleaning tray being installed on the support, the support portion abuts against the support to form a gap between the cleaning tray and the support.
36. The cleaning base station according to claim 32, characterized in that: A limiting protrusion is arranged on the support, a limiting through hole is arranged on the cleaning disc, and the limiting protrusion is connected to the limiting through hole.
37. The cleaning base station according to claim 36, characterized in that: The limiting protrusion is a hollow structure, so that the cleaning water flowing through the cleaning plate can pass through the limiting protrusion and the limiting through hole.
38. The cleaning base station according to claim 32, characterized in that: The support is provided with a limiting through hole, the cleaning disc is provided with a limiting protrusion, and the limiting protrusion is connected to the limiting through hole.
39. The cleaning base station according to claim 22, characterized in that: The cleaning base station is provided with a receiving cavity for receiving the cleaning host, the receiving cavity has an opening, the second cleaning module is arranged in the receiving cavity, or the second cleaning module is at least partially arranged outside the receiving cavity.
40. The cleaning base station according to claim 39, characterized in that: The support is in fluid communication with the cleaning tank, and the bottom of the support is inclined toward the cleaning tank so that water can flow from the support to the cleaning tank.
41. A cleaning system, characterized in that: The cleaning system comprises: The cleaning base station according to any one of claims 1 to 40; The cleaning host comprises a first cleaning component, the first cleaning component is a side mop, and the first cleaning module is used for cleaning the side mop.