Vertical conveying device for silicon wafer fragmentation

Abstract

The utility model discloses a silicon wafer fragmentation vertical conveying device which is characterized in that silicon wafers are contained in a material frame, a plurality of silicon wafers are divided into a plurality of silicon wafer groups, the fragmentation vertical conveying device comprises a water spraying part and a vertical conveying part, the water spraying part is used for spraying water to the silicon wafers in the material frame by taking the silicon wafer groups as units, the plurality of silicon wafers in the silicon wafer groups are fragmented, and the vertical conveying part is used for conveying the silicon wafers to the material frame. The vertical conveying part comprises an adsorption part and a vertical conveying belt, the adsorption part is used for adsorbing the silicon wafers subjected to wafer separation onto the vertical conveying belt one by one, and the vertical conveying belt drives the silicon wafers to move upwards in a vertical posture. According to the device, automatic operation of silicon wafer slicing and vertical conveying and feeding is achieved, manual intervention is not needed, and the reliability and efficiency of silicon wafer slicing and feeding are improved.

Description

Technical Field

[0001] The utility model relates to the technical field of photovoltaics, in particular to a vertical conveying device for separating silicon slices. Background Art

[0002] In the production process of silicon wafers, the silicon rod is first cut into silicon wafers by a wire cutting machine. At this time, the silicon wafers are glued to the crystal tray with a resin plate, and then the crystal tray and the cut silicon wafers are put into the material frame together. The material frame transports the crystal tray and the silicon wafers to the degumming station together, and uses a degumming machine to degummed and separate the crystal tray and the silicon wafers. Then the silicon wafers are transported to the subsequent insertion, cleaning, drying and other stations in sequence.

[0003] In the prior art, the material frame clamps and limits the silicon wafers as a whole. When the silicon wafers in the material frame are loaded separately before inserting the wafers, the material frame releases the clamping of all the silicon wafers, and then the silicon wafers placed vertically in the material frame are manually taken out, and then the silicon wafers are manually turned 90° and placed horizontally in the small material tray before the subsequent loading operation. Since all silicon wafers are released from the limit during loading, the silicon wafers that have not been loaded are prone to tilting and squeezing in the material frame, resulting in the silicon wafers being broken or cracked, seriously damaging the quality of the silicon wafers. In addition, during the entire silicon wafer circulation process, it is necessary to manually take out, split, flip, and transfer the silicon wafers between different workstations, which has low reliability and low efficiency.

[0004] The above information disclosed in the background technology is only used to increase the understanding of the background technology of the present application, and therefore, it may include information that does not constitute the prior art known to ordinary technicians in the field. Summary of the invention

[0005] In view of the problems pointed out in the background technology, the utility model proposes a vertical conveying device for silicon wafer slicing, which realizes the automated operation of silicon wafer slicing and vertical conveying and loading without manual intervention, thereby improving the reliability and efficiency of silicon wafer slicing and loading.

[0006] In order to achieve the above-mentioned utility model purpose, the utility model adopts the following technical solutions:

[0007] The utility model provides a vertical conveying device for silicon wafer separation. The silicon wafers are contained in a material frame, and a plurality of silicon wafers are divided into a plurality of silicon wafer groups. The vertical conveying device for silicon wafer separation comprises:

[0008] A water spraying unit, which is used to spray water on the silicon wafers in the material frame with the silicon wafer group as a unit, so as to separate the multiple silicon wafers in the silicon wafer group into slices;

[0009] The vertical conveying part includes an adsorption part and a vertical conveyor belt. The adsorption part is used to adsorb the silicon wafers after slicing onto the vertical conveyor belt one by one, and the vertical conveyor belt drives the silicon wafers to move upward in a vertical posture.

[0010] In some embodiments, the adsorption portion includes an adsorption area and an auxiliary conveying area, wherein the auxiliary conveying area is arranged above and below the adsorption area, the adsorption area is used to provide adsorption force to the silicon wafer so as to adsorb the silicon wafer onto the vertical conveyor belt, and the auxiliary conveying area is in rolling contact with the silicon wafer to assist the silicon wafer to move upward in a vertical posture.

[0011] In some embodiments, the adsorption area is a water absorption plate, and a plurality of spaced-apart water absorption holes are provided on the water absorption plate. The water absorption plate is connected to a water absorption waterway. The liquid on the silicon wafer is sucked into the water absorption waterway through the water absorption holes under the suction force of the water absorption waterway, and the silicon wafer is adsorbed onto the vertical conveyor belt.

[0012] In some embodiments, the auxiliary conveying area includes a plurality of follower rollers, and the follower rollers are in rolling contact with the silicon wafer.

[0013] In some embodiments, the vertical conveyor belt is disposed opposite to the adsorption area.

[0014] In some embodiments, the vertical conveying section further includes a mounting frame, and the adsorption area and the auxiliary conveying area are disposed on the mounting frame.

[0015] In some embodiments, the water spraying part is disposed on the mounting frame, and the water spraying part is located on opposite sides of the vertical conveying part.

[0016] In some embodiments, two water spraying parts are arranged in an upper and lower spaced relationship on each side of the vertical conveying part.

[0017] In some embodiments, the vertical conveyor belt is driven by a driving mechanism, which includes a motor, a synchronous belt, and a rotating shaft. The synchronous belt is connected between the power output end of the motor and the rotating shaft, and the rotating shaft is connected to the vertical conveyor belt to drive the vertical conveyor belt to rotate.

[0018] In some embodiments, there are multiple vertical conveyor belts, and the multiple vertical conveyor belts are arranged at intervals along the width direction of the adsorption portion, and the multiple vertical conveyor belts are driven by the same rotating shaft.

[0019] Compared with the prior art, the advantages and positive effects of the utility model are:

[0020] The silicon wafer slicing vertical conveying device disclosed in the present application includes a water spraying part and a vertical conveying part. The water spraying part is used to spray water on the silicon wafers in the material frame in units of silicon wafer groups to slice multiple silicon wafers in the silicon wafer group. The vertical conveying part is used to convey the silicon wafers after slicing one by one in a vertical posture upward. The vertical conveying part includes an adsorption part and a vertical conveyor belt. The adsorption part is used to adsorb the silicon wafers after slicing onto the vertical conveyor belt, and the vertical conveyor belt drives the silicon wafers to move upward in a vertical posture. This device can realize the automated operation of silicon wafer slicing and vertical conveying and loading without manual intervention, thereby improving the reliability and efficiency of silicon wafer slicing and loading.

[0021] After reading the specific embodiments of the present invention in conjunction with the accompanying drawings, other features and advantages of the present invention will become more clear. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0023] Figure 1 is a simplified structural layout diagram of a silicon wafer loading device according to an embodiment;

[0024] Figure 2 is a schematic structural diagram of a rack and a material frame conveying module according to an embodiment;

[0025] Figure 3 is a structural schematic diagram of a material frame conveying module according to an embodiment;

[0026] Figure 4 Schematic diagram of the structure of a vertical conveying device for silicon wafer separation according to an embodiment;

[0027] Figure 5 is a schematic structural diagram of a flip auxiliary part according to an embodiment;

[0028] Figure 6 It is a schematic structural diagram of a vertical conveying device for silicon wafer separation and a flipping auxiliary part according to an embodiment;

[0029] Figure 7 It is a schematic structural diagram of a silicon wafer separation vertical conveying device, a flip conveying module, and a horizontal conveying module according to an embodiment;

[0030] Figure 8 is a schematic structural diagram of a silicon wafer detection module according to an embodiment;

[0031] Fig. 9is a schematic structural diagram of a material frame and a silicon wafer unit according to an embodiment;

[0032] Fig.10 is a schematic structural diagram of an upper frame according to an embodiment;

[0033] Fig.11 is a schematic structural diagram of a lower frame according to an embodiment;

[0034] Fig.12 is a schematic structural diagram of a clamping assembly and a lower frame according to an embodiment;

[0035] Fig.13 is a schematic structural diagram of a clamping assembly according to an embodiment;

[0036] Fig.14 for Fig.13 Middle AA section view;

[0037] Fig.15 for Fig.13 Middle BB section view;

[0038] Fig.16 is a schematic structural diagram of a clamping portion according to an embodiment;

[0039] Fig.17 for Fig. 9 Enlarged view of middle part B;

[0040] Fig.18 is a schematic structural diagram of an unlocking device according to an embodiment;

[0041] Fig.19 is a schematic structural diagram of a transfer vehicle according to an embodiment;

[0042] Fig. 20 is a schematic structural diagram of a silicon wafer unit according to an embodiment;

[0043] Reference numerals:

[0044] 1. Silicon wafer feeding and conveying device;

[0045] 10. Rack;

[0046] 20. Material frame conveying module; 21. Conveying track; 2101. Horizontal bearing part; 2102. Vertical limiting part; 2103. Roller; 22. Moving frame; 2201. Moving horizontal part; 2202. Moving vertical part; 2203. Protruding column; 23. Driving mechanism; 2301. Driving motor; 2302. First transmission belt; 2303. Transmission shaft; 2304. Second transmission belt;

[0047] 30. Vertical wafer conveying device; 31. Water spraying unit; 32. Vertical conveying unit; 3201. First mounting frame; 3202. Vertical conveyor belt; 3203. Adsorption area; 3204. Auxiliary conveying area; 3205. Water absorption plate; 3206. Water absorption hole; 3207. Follow-up roller; 3208. Motor; 3209. Synchronous belt; 3210. Rotating shaft;

[0048] 40. Turning conveying module; 41. Turning auxiliary part; 4101. Second mounting frame; 4102. Blowing part; 4103. Blowing plate; 4104. Blowing hole; 4105. Sub-frame; 4106. Pressing wheel; 42. Rubber-coated rolling wheel; 4201. Groove;

[0049] 50. Horizontal conveying module; 51. Horizontal conveyor belt group; 52. Baffle;

[0050] 60. Insert module;

[0051] 70. Wafer detection module; 71. Lifting frame; 72. Turning frame; 73. Rolling wheel; 74. Sensor; 75. Lifting drive unit;

[0052] 100, silicon wafer unit; 110, wafer support; 111, extension portion; 120, silicon wafer; 121, silicon wafer group;

[0053] 200, material frame;

[0054] 210, frame; 211, upper frame; 2111, first bracket of upper frame; 2112, second bracket of upper frame; 2113, opening; 2114, support frame; 2115, raised portion; 2116, upper limit block; 2117, upper grabbing portion; 212, lower frame; 2121, first bracket of lower frame; 2122, second bracket of lower frame; 2123, horizontal frame of lower frame; 2124, vertical frame of lower frame; 2125, horizontal frame; 2126, lower limit block; 2127, lower grabbing portion; 213, containing space; 214, discharge port; 215, support roller; 216, matching hole;

[0055] 220, clamping assembly; 221, movable plate; 222, clamping portion; 2221, second pin shaft; 2222, clamping block; 2223, unlocking block; 2224, second long through hole; 2225, horizontal portion; 2226, vertical portion; 2227, inclined surface; 2228, step portion; 2229, spring; 223, second limit axis;

[0056] 230, unlocking trigger part; 231, first pin shaft; 232, third roller; 233, first limit shaft; 234, first long through hole;

[0057] 240, anti-dumping assembly;

[0058] 300, unlocking device; 310, first mounting frame; 320, first roller;

[0059] 400, transfer trolley; 410, unlocking part; 420, limiting part; 430, liquid collecting tank; 440, liquid discharge port; 460, positioning part;

[0060] L, length direction of the material frame;

[0061] W: Width direction of the material frame. DETAILED DESCRIPTION

[0062] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0063] In the description of the present application, it should be understood that the terms "center", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0064] The terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of this application, unless otherwise specified, "plurality" means two or more.

[0065] In the description of this application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0066] In the present utility model, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may include that the first and second features are in direct contact, or may include that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, a first feature being "above", "above" and "above" a second feature includes that the first feature is directly above and obliquely above the second feature, or simply indicates that the first feature is higher in level than the second feature. A first feature being "below", "below" and "below" a second feature includes that the first feature is directly below and obliquely below the second feature, or simply indicates that the first feature is lower in level than the second feature.

[0067] The disclosure below provides many different embodiments or examples for realizing different structures of the utility model. In order to simplify the disclosure of the utility model, the components and settings of specific examples are described below. Of course, they are merely examples, and the purpose is not to limit the utility model. In addition, the utility model may repeat reference numbers and / or reference letters in different examples, and such repetition is for the purpose of simplification and clarity, and does not itself indicate the relationship between the various embodiments and / or settings discussed. In addition, the utility model provides various specific examples of processes and materials, but those of ordinary skill in the art may be aware of the application of other processes and / or the use of other materials.

[0068] The present embodiment discloses a silicon wafer slicing vertical conveying device, which is used to slice and vertically load silicon wafers placed in a material frame, so as to facilitate subsequent operations such as inserting the silicon wafers.

[0069] Fig. 20 The figure shows a silicon wafer unit 100 , which includes a wafer tray 110 and a plurality of silicon wafers 120 attached to the wafer tray 110 and to be separated. The plurality of silicon wafers 120 are divided into a plurality of silicon wafer groups 121 . Fig. 20 In the figure, two adjacent silicon wafer groups 121 are separated by a dotted line.

[0070] During the production and processing of silicon wafers, the silicon rod is first cut into silicon wafers 120 by a slicing device (such as a wire cutting machine). At this time, the silicon wafer 120 is adhered to the wafer tray 110 through a resin plate. After the cutting is completed, the wafer tray 110 and the silicon wafer 120 are loaded into a material frame. The silicon wafer unit 100 is transported to a degumming station by the material frame to separate the wafer tray 110 from the silicon wafer 120. The separated silicon wafer 120 is then subjected to subsequent slicing, loading and other processes. The silicon wafer 120 is loaded to the inserting station for inserting, and then the silicon wafer 120 is cleaned, dried and other operations are performed after inserting.

[0071] In this embodiment, after the silicon wafer 120 in the material frame is separated from the wafer tray 110, Figure 4 The silicon wafer slicing vertical conveying device 30 shown realizes slicing and vertical loading of silicon wafers.

[0072] Reference Figure 4 The silicon wafer slicing vertical conveying device 30 includes a water spraying part 31 and a vertical conveying part 32. The water spraying part 31 is used to spray water on the silicon wafers 120 in the material frame 200 in units of silicon wafer groups 121 to separate multiple silicon wafers in the silicon wafer group 121. The vertical conveying part 32 is used to convey the silicon wafers after slicing one by one in a vertical posture upward.

[0073] Specifically, the vertical conveying part 32 includes a first mounting frame 3201, on which an adsorption part and a vertical conveyor belt 3202 are provided. The adsorption part is used to adsorb the silicon wafers after slicing onto the vertical conveyor belt 3202, and the vertical conveyor belt 3202 drives the silicon wafers to move upward in a vertical posture.

[0074] The silicon wafers 120 after being sliced ​​in the material frame 200 are adsorbed by the adsorption part and placed on the vertical conveyor belt 3202. The vertical conveyor belt 3202 drives the silicon wafers 120 to move upward. The adsorption part cooperates with the vertical conveyor belt 3202 to transport the silicon wafers in the material frame 200 upward one by one.

[0075] Furthermore, the adsorption portion includes an adsorption area 3203 and an auxiliary conveying area 3204. The auxiliary conveying area 3204 is arranged above and below the adsorption area 3203. The adsorption area 3203 is used to provide adsorption force to the silicon wafer so as to adsorb the silicon wafer onto the vertical conveyor belt 3202. The auxiliary conveying area 3204 is in rolling contact with the silicon wafer to assist the silicon wafer to move upward in a vertical posture.

[0076] The adsorption area 3203 is directly opposite to the silicon wafer, so as to smoothly adsorb the silicon wafer in the material frame 200 onto the vertical conveyor belt 3202, and the auxiliary conveying areas 3204 arranged at intervals above and below are in rolling contact with the upper and lower parts of the silicon wafer, which assists the vertical upward movement of the silicon wafer.

[0077] Furthermore, the adsorption area 3203 is a water absorption plate 3205, on which a plurality of spaced-apart water absorption holes 3206 are provided. The water absorption plate 3205 is connected to a water absorption waterway (not shown). Under the suction force of the water absorption waterway, the liquid on the silicon wafer is sucked into the water absorption waterway through the water absorption holes 3206, and the silicon wafer is adsorbed onto the surface of the vertical conveyor belt 3202.

[0078] Furthermore, the vertical conveyor belt 3202 is arranged opposite to the adsorption area 3203 , so that the silicon wafer can be directly adsorbed onto the surface of the vertical conveyor belt 3202 under the action of the adsorption area 3203 .

[0079] Furthermore, the auxiliary conveying area 3204 includes a plurality of follower rollers 3207 , and the follower rollers 3207 are in rolling contact with the silicon wafers.

[0080] Furthermore, the vertical conveyor belt 3202 is driven by a driving mechanism 23, which includes a motor 3208, a synchronous belt 3209, and a rotating shaft 3210. The synchronous belt 3209 is connected between the power output end of the motor 3208 and the rotating shaft 3210. The rotating shaft 3210 is connected to the vertical conveyor belt 3202 to drive the vertical conveyor belt 3202 to rotate.

[0081] The motor 3208 and the synchronous belt 3209 are located beside the adsorption area 3203 and the auxiliary conveying area 3204 and do not interfere with the upward transportation of the silicon wafers.

[0082] Furthermore, there are multiple, for example two, vertical conveyor belts 3202, which are arranged at intervals along the width direction of the adsorption portion, and the multiple vertical conveyor belts 3202 are driven by the same rotating shaft 3210 to ensure the movement consistency of the multiple vertical conveyor belts 3202. The interval arrangement of the multiple vertical conveyor belts 3202 helps to improve the reliability of the upward transportation of the silicon wafers.

[0083] Furthermore, a water spraying part 31 is provided on the first mounting frame 3201. The water spraying part 31 is located on two opposite sides of the vertical conveying part 32, and water is sprayed from both sides of the silicon wafer at the same time, thereby improving the reliability of silicon wafer separation.

[0084] Furthermore, two water spraying parts 31 spaced apart from each other are provided on each side of the vertical conveying part 32 to spray water on both the upper and lower parts of the silicon wafers, thereby further improving the reliability of silicon wafer separation.

[0085] In this embodiment, the above-mentioned silicon wafer vertical conveying device 30 is specifically used in the following aspects: Figure 1 In the silicon wafer feeding and conveying device 1 shown, the silicon wafer feeding and conveying device 1 is used to automatically convey the cut silicon wafers to the inserting mechanism. The above-mentioned vertical wafer conveying device 30 is one of the functional modules in the silicon wafer feeding and conveying device 1. The silicon wafer feeding and conveying device 1 is an integrated structure. Figures 1 to 7 , and also includes a frame 10, a material frame conveying module 20, a flip conveying module 40, a horizontal conveying module 50, an inserting module 60 and the like.

[0086] The rack 10 constitutes the framework of the entire loading and conveying device and serves as a mounting carrier for other functional modules. The material frame conveying module 20, the silicon wafer vertical conveying device 30, the flip conveying module 40, the horizontal conveying module 50, and the wafer inserting module 60 are sequentially arranged along the length direction of the rack 10. The inline arrangement of the functional modules facilitates the transfer of silicon wafers between the modules.

[0087] A water tank with an open top is formed in the rack 10. The rack 10 also serves as a water container. On the one hand, it receives liquid dripping from the silicon wafer, and on the other hand, it provides a water source for functional modules that need water, such as the flipping and conveying module 40.

[0088] The material frame 200 is used to hold the cut silicon wafers. The structure of the material frame 200 is as follows: Fig. 9 As shown, the multiple silicon wafers in the material frame 200 are divided into a plurality of silicon wafer groups 121 , and one end of the material frame 200 is provided with an outlet 214 for discharging the silicon wafers 120 .

[0089] The structure of the material frame conveying module 20 is as follows Figure 2 and Figure 3 As shown, the material frame conveying module 20 is used to convey the material frame 200 to the silicon wafer slicing vertical conveying device 30. After the silicon rod is cut on the slicing device, as shown in FIG. Fig. 20 The silicon wafer 120 and the crystal tray 110 shown are placed together in the material frame 200, and the material frame 200 is transferred from the slicing station to the degumming station by a transfer device (such as a transfer cart), and the crystal tray and the silicon wafer are separated at the degumming station, and the silicon wafer remains in the material frame 200. The material frame 200 is then transported to the material frame conveying module 20 by auxiliary equipment such as a robot, and the material frame conveying module 20 automatically conveys the material frame 200 to the downstream silicon wafer slicing vertical conveying device 30 to slice and vertically load the silicon wafers in the material frame 200.

[0090] The structure of the overturning conveying module 40 is as follows: Figures 5 to 7 As shown, the flipping conveying module 40 is used to receive the vertical silicon wafers conveyed by the vertical conveying unit 32, and flip the silicon wafers from the vertical posture to the horizontal posture.

[0091] Reference Figure 7 The horizontal conveying module 50 is used to receive the horizontal silicon wafers conveyed by the flip conveying module 40 and convey the silicon wafers to the inserting module 60 in a horizontal posture.

[0092] The wafer inserting module 60 is used to insert the silicon wafers conveyed by the horizontal conveying module 50 .

[0093] In the silicon wafer loading and conveying device 1 of this embodiment, the material frame conveying module 20, the silicon wafer slicing vertical conveying device 30, the flipping conveying module 40, the horizontal conveying module 50, and the inserting module 60 are arranged in a straight line, which is convenient for the automatic transmission of silicon wafers between the modules. The loading and conveying device integrates the above functions into an integrated structure, which is novel and compact, realizes automatic slicing, flipping and inserting of silicon wafers, greatly improves work efficiency, and improves the quality reliability of silicon wafers during operation.

[0094] For the specific structure of the material frame conveying module 20, in some embodiments, refer to Figure 2 and Figure 3The material frame conveying module 20 includes a conveying track 21, a moving frame 22, and a driving mechanism 23. The conveying track 21 is arranged at the bottom of the water tank and extends along the length direction of the water tank. The driving mechanism 23 is used to drive the moving frame 22 to move along the length direction of the water tank. The moving frame 22 is connected to the material frame 200 to drive the material frame 200 to move synchronously.

[0095] The material frame 200 is located on the conveying track 21, and the driving mechanism 23 is started to drive the moving frame 22 to move along the length direction of the water tank, and the moving frame 22 drives the material frame to move synchronously with it.

[0096] Furthermore, there are two conveying tracks 21, which are arranged opposite to each other. The conveying tracks 21 include a transverse bearing portion 2101 and a vertical limiting portion 2102. The material frame 200 is located on the transverse bearing portion 2101. The material frame 200 moves along the transverse bearing portion 2101. The vertical limiting portion 2102 is located on the side of the material frame 200 to limit the material frame 200 and prevent the material frame 200 from falling off the transverse bearing portion 2101.

[0097] Furthermore, a roller 2103 is provided on the transverse bearing portion 2101 , and the roller 2103 is in rolling contact with the bottom of the material frame 200 , thereby reducing the moving friction of the material frame 200 .

[0098] Furthermore, the distance between the two vertical limiting portions 2102 can be adjusted to accommodate material frames 200 of different widths.

[0099] The adjustment structure between the two vertical limiting parts 2102 can be implemented by using common mechanical structures such as a lead screw and a bolt, and this embodiment does not impose any specific limitation.

[0100] Furthermore, the driving mechanism 23 includes a driving motor 2301 , which drives a transmission shaft 2303 to rotate via a first transmission belt 2302 , and the transmission shaft 2303 drives a second transmission belt 2304 to rotate. The second transmission belt 2304 extends along the length direction of the water tank, and the movable frame 22 is connected to the second transmission belt 2304 .

[0101] The driving motor 2301 is started, and the driving motor 2301 drives the first transmission belt 2302 to rotate, the first transmission belt 2302 drives the transmission shaft 2303 to rotate, the transmission shaft 2303 drives the second transmission belt 2304 to rotate, the second transmission belt 2304 drives the mobile frame 22 to move synchronously, and then the mobile frame 22 drives the material frame 200 to move synchronously.

[0102] Further, there are two second transmission belts 2304, each of which is arranged at the top of the corresponding side of the frame 10. The mobile frame 22 is a U-shaped frame structure, including a mobile horizontal portion 2201 and a mobile vertical portion 2202, and the two ends of the mobile horizontal portion 2201 are respectively provided with a mobile vertical portion 2202, and the top of the mobile vertical portion 2202 is fixedly connected to the second transmission belt 2304 on the corresponding side.

[0103] from Figure 2 It can be seen that the drive motor 2301, the first transmission belt 2302, the transmission shaft 2303, and the second transmission belt 2304 are located outside the frame 10, and will not occupy the internal space of the frame 10, and will not occupy the placement space of the material frame 200. The movable frame 22 is located inside the frame 10, which is convenient for connecting with the material frame 200 to drive the material frame to move synchronously.

[0104] Furthermore, a limiting structure for limiting the material frame 200 is provided on the movable transverse portion 2201. The detachable connection between the limiting structure and the material frame 200 facilitates the connection between the material frame 200 and the limiting structure so that the material frame 200 moves synchronously with the moving frame 22, and also facilitates the separation between the material frame 200 and the limiting structure.

[0105] In a specific embodiment, referring to Figure 3 The limiting structure is a raised column 2203 provided on the movable horizontal portion 2201. Fig. 9 A matching hole is provided on the outer side of one end of the material frame. The material frame is placed into the frame 10 from top to bottom, and the raised column 2203 is inserted into the matching hole 216 to achieve the connection and matching between the material frame 200 and the movable frame 22.

[0106] For the specific structure of the flipping conveying module 40, in some embodiments, refer to Figures 5 to 7 The flipping and conveying module 40 includes a flipping auxiliary part 41 and a rubber-coated rolling wheel 42 .

[0107] The flip auxiliary part 41 is as follows Figure 5 As shown, it includes a second mounting frame 4101, on which a blowing portion 4102 is provided, and combined with Figure 6 The blowing part 4102 is located above the vertical conveying part 32. The blowing part 4102 is used to blow air to the vertical silicon wafers conveyed upward by the vertical conveying part 32, so that the silicon wafers are dumped onto the glue-coating rolling wheel 42, and the glue-coating rolling wheel 42 drives the silicon wafers to move to a horizontal posture.

[0108] The cooperation between the blowing part 4102 and the glue-coating rolling wheel 42 allows the silicon wafers to be transported vertically upwards and then horizontally. The setting of the blowing part 4102 allows the silicon wafers to be tilted onto the glue-coating rolling wheel 42, and then the rotation of the glue-coating rolling wheel 42 drives the tilted silicon wafers to a horizontal position.

[0109] The rubber-coated rolling wheel 42 may be a metal wheel encapsulated in rubber, or may be a metal rolling wheel and a non-metal rolling wheel nested in a circular rubber sleeve.

[0110] Furthermore, a sub-frame 4105 is provided on the second mounting frame 4101, and a pressure wheel 4106 is provided on the sub-frame 4105. The pressure wheel 4106 is located in front of the vertical conveying part 32 and is used to press the silicon wafer against the vertical conveying part 32 to prevent the silicon wafer from tipping over in the opposite direction and ensure that the silicon wafer is tipped over reliably onto the glue-coated rolling wheel 42.

[0111] Furthermore, the sub-frame 4105 is rotatably connected to the mounting frame, and the pressure wheel 4106 is in the form of a floating wheel to prevent the pressure wheel 4106 from crushing the silicon wafer.

[0112] Furthermore, there are multiple pressing wheels 4106, which are arranged at intervals in the horizontal direction to apply uniform force to the silicon wafer.

[0113] Furthermore, the blowing part 4102 includes a blowing plate 4103 , on which a plurality of blowing holes 4104 arranged at intervals are provided, and the blowing plate 4103 is connected to a blowing air path (not shown).

[0114] For the specific structure of the horizontal conveying module 50, in some embodiments, refer to Figure 7 The horizontal conveying module 50 includes a horizontal conveyor belt group 51. The driving mechanism 23 of the horizontal conveyor belt group 51 is not shown in the figure. The horizontal silicon wafer conveyed by the rubber-coated rolling wheel 42 moves to the horizontal conveyor belt group 51, and the horizontal conveyor belt group 51 continues to transport the silicon wafer in a horizontal posture to the subsequent insertion station.

[0115] An annular groove 4201 is provided on the rubber-coated rolling wheel 42 along its circumference, and the horizontal conveyor belt group 51 partially extends into the groove 4201 to receive the horizontal silicon wafers conveyed by the rubber-coated rolling wheel 42, thereby achieving smooth transmission of the silicon wafers between the rubber-coated rolling wheel 42 and the horizontal conveyor belt group 51.

[0116] Further, continue to refer to Figure 7 The horizontal conveying module 50 also includes two baffles 52 arranged opposite to each other. The baffles 52 extend along the horizontal conveying direction of the silicon wafers. One end of the baffle 52 is located beside the rubber-coated rolling wheel 42, which plays a left and right limiting role in the horizontal conveying of the silicon wafers.

[0117] In some embodiments, the silicon wafer feeding and conveying device 1 further includes a silicon wafer detection module 70, such as Figure 8As shown, it includes a lifting frame 71, a turning frame 72, and a lifting drive unit 75. The lifting drive unit 75 drives the lifting frame 71 to move up and down. The turning frame 72 is rotatably connected to the lifting frame 71. A rolling wheel 73 is provided at the bottom of the turning frame 72. A sensor 74, such as a photoelectric sensor, is provided on the lifting frame 71.

[0118] The silicon wafer detection module 70 is arranged in front of the silicon wafer slicing vertical conveying device 30. The material frame conveying module 20 conveys the material frame 200 horizontally toward the direction close to the silicon wafer slicing vertical conveying device 30 until the silicon wafer in the material frame 200 touches the rolling wheel 73 on the silicon wafer detection module 70. As the material frame 200 continues to move forward, the flip frame 72 flips. At this time, the sensor 74 will detect the flipping action of the flip frame 72. The system knows that the silicon wafer is transported to the right place, then the lifting drive unit 75 drives the lifting frame 71 to rise, and the lifting frame 71 drives the flip frame 72 and the rolling wheel 73 to rise synchronously together to the top of the silicon wafer, so as not to affect the subsequent slicing and loading operations of the silicon wafer. The silicon wafer slicing vertical conveying device 30 is started, and the silicon wafer is sprayed with water and vertically conveyed.

[0119] For the specific structure of the material frame 200, in some embodiments, refer to Figures 9 to 12 The frame 210 of the material frame 200 includes an upper frame 211 and a lower frame 212 , and the upper frame 211 and the lower frame 212 are detachably connected. Fig.10 Shown is the upper frame 211, Fig.11 Shown is the lower frame 212, Fig.12 The structure shown is that the clamping assembly 220 and the anti-dumping assembly 240 are arranged on the lower frame 212.

[0120] A containing space 213 for containing the silicon wafers 120 is formed in the lower frame 212 . The top of the containing space 213 is open, and a discharge port 214 communicating with the containing space 213 is provided at one end of the lower frame 212 .

[0121] The upper frame 211 is detachably mounted on the top of the lower frame 212. The upper frame 211 is provided with an opening 2113 that is vertically opposite to and communicates with the containing space 213. The silicon wafer unit 100 is loaded into the containing space 213 below through the opening 2113. The upper frame 211 is provided with a limiting structure for limiting the wafer holder 110 to ensure the stability of the silicon wafer unit 100 in the material frame 200. The lower frame 212 is provided with a clamping assembly 220 for limiting the silicon wafer 120.

[0122] The upper frame 211 is moved away from the lower frame 212 to separate the crystal tray 110 from the silicon wafer 120, and the silicon wafer 120 remains in the lower frame 212. The material frame conveying module 20 conveys the lower frame 212 to the silicon wafer slicing vertical conveying device 30. Specifically, the material frame 200 is placed on the debonding station, and the upper frame 211 is moved away from the lower frame 212 by the debonding equipment. Since there is a limit connection relationship between the upper frame 211 and the crystal tray 110, and the silicon wafer 120 below is clamped by the clamping assembly 220, when the upper frame 211 is moved away from the lower frame 212, the upper frame 211 and the crystal tray 110 are separated from the silicon wafer 120 together, so that the crystal tray 110 and the silicon wafer 120 are debonded and separated.

[0123] In this embodiment, the material frame 200 has an upper and lower split structure, and the clamping assembly 220 in the lower frame 212 clamps the silicon wafer 120, and the upper frame 211 limits and fixes the crystal tray 110. By separating the upper frame 211 from the lower frame 212, the crystal tray 110 and the silicon wafer 120 can be separated.

[0124] Further, refer to Fig. 9 , Fig.10 as well as Fig. 20 The front and rear ends of the crystal tray 110 unit are respectively provided with extension parts 111, and the upper frame 211 is provided with two spaced protrusions 2115 on the corresponding sides. The extension part 111 is clamped between the two protrusions 2115 to achieve the limiting fixation of the crystal tray 110.

[0125] Further, the upper frame 211 includes two upper frame first brackets 2111 and two upper frame second brackets 2112, the upper frame first brackets 2111 extend along the length direction L of the material frame 200, and the upper frame second brackets 2112 extend along the width direction W of the material frame 200. Two spaced support frames 2114 are provided between the two upper frame first brackets 2111, and there is a certain distance between the support frame 2114 and the upper frame second bracket 2112 on the corresponding side. A protrusion 2115 is provided on the support frame 2114.

[0126] Further, the lower frame 212 includes two relatively arranged lower frame first brackets 2121 and two relatively arranged lower frame second brackets 2122, the lower frame second bracket 2122 includes a lower frame transverse frame 2123, and lower frame vertical frames 2124 are respectively provided at opposite ends of the lower frame transverse frame 2123, the lower frame first bracket 2121 extends along the length direction K of the material frame 200, the lower frame transverse frame 2123 extends along the width direction W of the material frame 200, and the lower frame vertical frame 2124 extends along the height direction of the material frame 200.

[0127] The bottom of the upper frame 211 is detachably connected to the top of the lower frame vertical frame 2124 to achieve a detachable connection between the upper frame 211 and the lower frame 212 .

[0128] Further, refer to Figures 10 to 12 The upper frame 211 is provided with an upper limit block 2116 at the bottom, and the lower frame vertical frame 2124 is provided with a lower limit block 2126 at the top. The upper limit block 2116 and the lower limit block 2126 are adapted through a concave-convex structure to achieve the cooperation between the upper frame 211 and the lower frame 212. For example, the upper limit block 2116 is provided with a concave shape, and the lower limit block 2126 is provided with a convex shape, and the concave shape is adapted to the convex shape.

[0129] Further, refer to Fig.10 An upper grabbing portion 2117 is provided on the outer side of the upper frame 211 , and the upper grabbing portion 2117 is used for grabbing by external force to separate the upper frame 211 from the lower frame 212 .

[0130] Reference Fig.11 A lower grabbing portion 2127 is provided on the outer side of the lower frame 212 , and the lower grabbing portion 2127 is used for grabbing by external force to transfer the material frame 200 .

[0131] Furthermore, support rollers 215 are provided at the bottom of the lower frame 212. The support rollers 215 are arranged at intervals along the width direction W of the material frame 200, and the support rollers 215 are in contact with the bottom of the silicon wafer 120. The gap between two adjacent support rollers 215 facilitates water on the silicon wafer 120 to drip downward.

[0132] In some embodiments, reference Fig. 9 , Fig.12 and Fig.13 The clamping assembly 220 is used to clamp the silicon wafer unit 100. On the one hand, the clamping assembly 220 can clamp the entire silicon wafer unit 100 at the same time; on the other hand, the clamping assembly 220 can independently unlock each silicon wafer group 121.

[0133] There are two clamping assemblies 220 located at opposite sides of the containing space 213 to clamp opposite sides of the silicon wafer unit 100 .

[0134] The clamping assembly 220 includes a plurality of clamping parts 222 arranged in sequence along the length direction of the containing space 213 (i.e., the length direction L of the material frame 200), and the plurality of clamping parts 222 correspond to the plurality of silicon wafer groups 121 one by one to clamp the corresponding silicon wafer groups 121. Each clamping part 222 moves in a direction away from the silicon wafer 120 to release the clamping of the corresponding silicon wafer group 121.

[0135] That is to say, each silicon wafer group 121 is clamped by the corresponding clamping part 222. When all the clamping parts 222 clamp the corresponding silicon wafer group 121, the entire silicon wafer unit 100 is clamped. When it is necessary to load the silicon wafer unit 100 in pieces by silicon wafer group 121, the clamping part 222 releases the clamping of the corresponding silicon wafer group 121. When the unlocked silicon wafer group 121 is loaded in pieces, the remaining silicon wafer groups 121 are still clamped by the corresponding clamping parts 222. In this way, the placement stability of the remaining silicon wafer groups 121 that have not been loaded in the material frame 200 can be ensured, and the silicon wafers 120 are prevented from tipping over or squeezing each other, and the silicon wafers 120 are avoided from being damaged, thereby ensuring the quality of the silicon wafers 120.

[0136] The unlocking of the silicon wafer group 121 by the clamping part 222 is achieved through the action between the unlocking device 300 and the clamping part 222. Specifically, the unlocking device 300 is arranged on the inner side wall of the frame 10, and the unlocking device 300 is arranged close to the silicon wafer slicing vertical conveying device 30. When the material frame conveying module 20 conveys the lower frame 212 in the horizontal direction toward the unlocking device 300, the multiple clamping parts 222 contact the unlocking device 300 in sequence with the relative movement between the material frame 200 and the unlocking device 300. The unlocking device 300 is used to apply external force to the clamping part 222 to make the clamping part 222 away from the corresponding silicon wafer group 121, that is, to release the clamping of the silicon wafer group 121.

[0137] The material frame 200 in this embodiment simultaneously clamps the corresponding silicon wafer group 121 through the multiple clamping parts 222 on the clamping assembly 220 to achieve the clamping of all silicon wafers. On the one hand, the placement reliability of the silicon wafer 120 in the material frame 200 is ensured, and on the other hand, it is also convenient for the subsequent smooth debonding and separation of the wafer tray 110 and the silicon wafer 120; at the same time, each clamping part 222 unlocks the silicon wafer group 121 independently, and the unlocking device 300 is used to unlock each clamping part 222 in turn, that is, each silicon wafer group 121 is unlocked. 1 are unlocked independently of each other. Thus, when the silicon wafer unit 100 needs to be loaded in slices by the silicon wafer group 121, the clamping part 222 releases the clamping of the corresponding silicon wafer group 121. When the unlocked silicon wafer group 121 is loaded in slices, the remaining silicon wafer groups 121 are still clamped by the corresponding clamping parts 222. In this way, the placement stability of the remaining silicon wafer groups 121 that have not been loaded in the material frame 200 can be ensured, the silicon wafers 120 can be prevented from tipping over or squeezing each other, the silicon wafers 120 can be avoided from being damaged, and the quality of the silicon wafers 120 can be ensured.

[0138] In some embodiments, reference Fig.15The clamping portion 222 includes a second pin shaft 2221, the second pin shaft 2221 passes through the frame 210, and the second pin shaft 2221 can move along the direction of passing through the frame 210. An unlocking block 2223 is provided on the first end of the second pin shaft 2221, and a clamping block 2222 is provided on the second end of the second pin shaft 2221. A spring 2229 is sleeved on the second pin shaft 2221, and the spring 2229 is located between the clamping block 2222 and the frame 210.

[0139] Under the action of the unlocking device 300 , each unlocking block 2223 moves in a direction away from the silicon wafer unit 100 , driving the corresponding clamping block 2222 away from the corresponding silicon wafer group 121 , so as to unlock the corresponding silicon wafer group 121 .

[0140] The clamping block 2222 moves toward the direction approaching the silicon wafer unit 100 under the restoring force of the spring 2229 to clamp the corresponding silicon wafer group 121 .

[0141] In some embodiments, the cooperation structure between the unlocking device 300 and the clamping portion 222 is as follows, Figures 16 to 18 :

[0142] The unlocking block 2223 includes a transverse portion 2225 and a vertical portion 2226 of an integrated structure, wherein the transverse portion 2225 is used to abut against the movable plate 221, and the vertical portion 2226 is used to act with the unlocking device 300. Specifically, one end of the transverse portion 2225 is connected to the second pin shaft 2221, a step portion 2228 is formed between the transverse portion 2225 and the second pin shaft 2221, and the other end of the transverse portion 2225 is connected to the vertical portion 2226.

[0143] There is a certain distance between the vertical portion 2226 and the movable plate 221 . The vertical portion 2226 is provided with an inclined surface 2227 on the side facing the frame 210 . Along the discharge direction of the silicon wafer 120 , the distance between the inclined surface 2227 and the movable plate 221 first decreases and then increases.

[0144] The unlocking device 300 includes a first roller 320. When relative movement occurs between the material frame 200 and the unlocking device 300, the first roller 320 moves to between the inclined surface 2227 and the frame 210 and contacts the inclined surface 2227. Through the relative displacement between the first roller 320 and the inclined surface 2227, the second pin shaft 2221 moves in a direction away from the silicon wafer 120.

[0145] Specifically, the unlocking device 300 is fixed on the inner wall of the frame 10 , and two clamping assemblies 220 are provided on the corresponding material frame 200 , so two unlocking devices 300 are also provided, and each unlocking device 300 is used to interact with the clamping assembly 220 on the corresponding side. When it is necessary to slice the silicon wafers 120 in the material frame 200 into units of silicon wafer groups 121, the material frame 200 moves in a horizontal direction under the action of the material frame conveying module 20, and a relative movement occurs between the material frame 200 and the unlocking device 300. Along the movement direction of the material frame 200, each clamping part 222 contacts the unlocking device 300 one by one, and the first roller 320 moves to between the inclined surface 2227 and the frame 210 and contacts the inclined surface 2227. Through the relative displacement between the first roller 320 and the inclined surface 2227, the second pin shaft 2221 moves in a direction away from the silicon wafer 120, driving the clamping block 2222 away from the silicon wafer 120, that is, releasing the clamping of the corresponding silicon wafer group 121, thereby facilitating the subsequent devices on the unlocked silicon wafer group 121 to perform slicing operations.

[0146] In some embodiments, the clamping assembly 220 further includes a movable plate 221 , which extends along the length direction of the containing space 213 , and a plurality of clamping portions 222 are sequentially arranged along the length direction of the movable plate 221 .

[0147] When the movable plate 221 moves in a direction away from the containing space 213 under the action of external force, the movable plate 221 drives all the clamping parts 222 arranged thereon to move synchronously in a direction away from the containing space 213, thereby increasing the distance between the two relative clamping components 220, making it easier for the silicon wafer to be loaded into the containing space 213 from top to bottom.

[0148] Further, the movable plate 221 is located outside the frame 210. For details, refer to Figures 11 to 13 The lower frame 212 includes two oppositely arranged transverse frames 2125, the transverse frames 2125 extend along the length direction of the containing space 213, the movable plate 221 is located outside the transverse frames 2125, and the second pin shaft 2221 passes through the transverse frames 2125 and the movable plate 221. When the movable plate 221 moves in a direction away from the containing space 213 under the action of an external force, the movable plate 221 pushes all the unlocking blocks 2223 to move synchronously in a direction away from the containing space 213, so that all the clamping blocks 2222 are away from the containing space 213. Specifically, a step portion 2228 is formed between the unlocking block 2223 and the second pin shaft 2221. When the movable plate 221 moves in a direction away from the containing space 213, the movable plate 221 abuts against the step portion 2228 to push the unlocking block 2223 to move synchronously. The unlocking block 2223 drives the second pin shaft 2221 and the clamping block 2222 to move synchronously in a direction away from the containing space 213, and the spring 2229 is compressed.

[0149] After the external force acting on the movable plate 221 disappears, the clamping block 2222 moves toward the direction approaching the silicon wafer 120 under the action of the restoring force of the spring 2229 to clamp the corresponding silicon wafer group 121 .

[0150] Furthermore, a second limiting shaft 223 is provided on the transverse frame 2125 , a second elongated through hole 2224 is provided on the second pin shaft 2221 , and the second limiting shaft 223 penetrates into the second elongated through hole 2224 to prevent the second pin shaft 2221 from rotating.

[0151] In some embodiments, reference Fig.12 The material frame 200 further includes an anti-dumping assembly 240, which is used to support the silicon wafer 120. The anti-dumping assembly 240 is disposed at one end away from the material outlet 214. When the transfer trolley 400 pushes the material frame 200 to move forward, the silicon wafer 120 has a tendency to dump backward (i.e., in the direction opposite to the movement direction of the material frame 200). The anti-dumping assembly 240 abuts against the silicon wafer 120, thereby preventing the silicon wafer 120 from dumping.

[0152] The anti-dumping assembly 240 is provided with a mounting frame, and the mounting frame is provided with a second roller, which is arranged on the frame 210, and the second roller is used to abut against the silicon wafer 120. A plurality of second rollers are arranged at intervals in the vertical direction, for example, two, so as to have multiple contacts with the silicon wafer 120 in the vertical direction, thereby improving the reliability of the anti-dumping.

[0153] In some embodiments, the material frame 200 also includes an unlocking trigger part 230, which includes a first pin shaft 231. The first pin shaft 231 passes through the transverse frame 2125. The first end of the first pin shaft 231 is fixedly connected to the movable plate 221. The second end of the first pin shaft 231 is used to receive external force so that the first pin shaft 231 moves along its passing direction in the transverse frame 2125, so as to drive the movable plate 221 to move synchronously in a direction away from the containing space 213. The movable plate 221 then drives all the clamping parts 222 to move synchronously in a direction away from the containing space 213. In this way, the distance between the two relatively arranged clamping assemblies 220 is increased, which facilitates the silicon wafer unit 100 to be placed into the material frame 200 from top to bottom.

[0154] In some embodiments, the material frame 200 is transferred between the cutting station and the debonding station by a transfer cart 400. The material frame 200 is first placed on the transfer cart 400, and then the silicon wafer unit 100 after cutting is placed in the material frame 200, and the transfer cart 400 transfers the material frame 200 to the debonding station.

[0155] Structural reference of transfer trolley 400 Fig.19 The transfer trolley 400 has the functions of storage, limiting, and transportation for the material frame 200.

[0156] The transfer cart 400 is provided with an unlocking portion 410, which is used to interact with the unlocking triggering portion 230 on the material frame 200 to provide external force to the unlocking triggering portion 230. Specifically, after the material frame 200 is placed on the transfer cart 400, the unlocking portion 410 contacts the unlocking triggering portion 230, and the unlocking portion 410 triggers the unlocking triggering portion 230 to move, and the movable plate 221 moves in a direction away from the filling space 213 under the action of the unlocking triggering portion 230, and the movable plate 221 drives the multiple clamping portions 222 provided thereon to move synchronously in a direction away from the filling space 213.

[0157] When in use, before placing the silicon wafer unit 100 into the material frame 200, the material frame 200 is first placed on the transfer cart 400. At this time, the unlocking portion 410 is in contact with the unlocking trigger portion 230, and the effect achieved is that the movable plate 221 moves in a direction away from the containing space 213 under the action of the unlocking trigger portion 230, and the movable plate 221 drives the multiple clamping portions 222 arranged thereon to move synchronously in a direction away from the containing space 213, that is, the distance between the two relative clamping components 220 is increased, which makes it easier for the silicon wafer unit 100 to be loaded into the containing space 213 from top to bottom.

[0158] After the silicon wafer unit 100 is placed in the material frame 200, the material frame 200 is transported to the degumming station by the transfer cart 400. After arriving, the material frame 200 is taken off the transfer cart 400 by a manipulator or other equipment. At this time, the unlocking part 410 is separated from the unlocking trigger part 230, and the clamping assembly 220 automatically moves toward the direction close to the silicon wafer unit 100 under the reset force of the reset member to clamp the silicon wafer unit 100. After the silicon wafer unit 100 is clamped, it is convenient for the silicon wafer unit 100 to be degummed at the degumming station. At this time, the silicon wafer 120 is clamped by the clamping assembly 220, which facilitates the smooth separation of the wafer tray 110 and the silicon wafer 120.

[0159] After the silicon wafer unit 100 is debonded, it is transferred to the next work station by the material frame 200, and the silicon wafer 120 is sliced ​​into silicon wafer groups 121 as units. The sliced ​​silicon wafers 120 are convenient for subsequent transportation and insertion operations. When the silicon wafer 120 is sliced ​​into silicon wafer groups 121 as units, the clamping part 222 releases the clamping of the corresponding silicon wafer group 121. When the unlocked silicon wafer group 121 is sliced ​​and loaded, the remaining silicon wafer groups 121 are still clamped by the corresponding clamping part 222. In this process, the clamping part 222 unlocks the silicon wafer group 121 through the action between the unlocking device 300 and the clamping part 222.

[0160] In some embodiments, a roller (referred to as the third roller 232) is disposed at the second end of the first pin shaft 231. Fig.19The unlocking portion 410 is a column arranged on the transfer trolley 400. When the material frame 200 is placed on the transfer trolley 400 from top to bottom, the third roller 232 moves along the column from top to bottom to drive the first pin shaft 231 to move in a direction away from the containing space 213. Since the first pin shaft 231 is fixedly connected to the movable plate 221, the movable plate 221 is driven to move synchronously in a direction away from the containing space 213.

[0161] Furthermore, a first limiting shaft 233 is provided on the transverse frame 2125 , a first long through hole 234 is provided on the first pin shaft 231 , and the first limiting shaft 233 passes through the first long through hole 234 to prevent the first pin shaft 231 from rotating.

[0162] In some embodiments, reference Fig.19 A limiting portion 420 is provided on the body of the transfer trolley 400 . The limiting portion 420 is a limiting protrusion arranged on the side of the material frame 200 . The limiting portion 420 is used to limit the material frame 200 to ensure the stability of the material frame 200 placed on the transfer trolley 400 .

[0163] Furthermore, the transfer cart 400 is provided with a liquid collecting tank 430, which is located below the material frame 200 and is used to collect the liquid dripping from the silicon wafer 120. A liquid drain port 440 is provided at the lower position of the liquid collecting tank 430 to facilitate liquid drainage.

[0164] Furthermore, a positioning portion 460 is provided at the moving front end of the transfer cart 400, and the positioning portion 460 is used for positioning the transfer cart 400 when it moves to a designated position.

[0165] In the description of the above embodiments, specific features, structures, materials or characteristics may be combined in a suitable manner in any one or more embodiments or examples.

[0166] The above is only a specific implementation of the utility model, but the protection scope of the utility model is not limited to this. Any changes or substitutions that can be easily thought of by technicians familiar with the technical field within the technical scope disclosed by the utility model should be included in the protection scope of the utility model. Therefore, the protection scope of the utility model should be based on the protection scope of the claims.

Claims

1. A vertical conveying device for silicon wafer separation, wherein silicon wafers are contained in a material frame, and a plurality of silicon wafers are divided into a plurality of silicon wafer groups, characterized in that: The vertical conveying device for slicing includes: A water spraying unit, which is used to spray water on the silicon wafers in the material frame with the silicon wafer group as a unit, so as to separate the multiple silicon wafers in the silicon wafer group into slices; The vertical conveying part includes an adsorption part and a vertical conveyor belt. The adsorption part is used to adsorb the silicon wafers after slicing onto the vertical conveyor belt one by one, and the vertical conveyor belt drives the silicon wafers to move upward in a vertical posture.

2. The vertical conveying device for silicon wafer separation according to claim 1, characterized in that: The adsorption portion includes an adsorption area and an auxiliary conveying area. The auxiliary conveying area is arranged above and below the adsorption area. The adsorption area is used to provide adsorption force to the silicon wafer so as to adsorb the silicon wafer onto the vertical conveyor belt. The auxiliary conveying area is in rolling contact with the silicon wafer to assist the silicon wafer to move upward in a vertical posture.

3. The vertical conveying device for silicon wafer separation according to claim 2, characterized in that: The adsorption area is a water absorption plate, on which a plurality of spaced-apart water absorption holes are arranged, and the water absorption plate is connected to a water absorption waterway. The liquid on the silicon wafer is sucked into the water absorption waterway through the water absorption holes under the suction force of the water absorption waterway, and the silicon wafer is adsorbed onto the vertical conveyor belt.

4. The silicon wafer vertical conveying device according to claim 2, characterized in that: The auxiliary conveying area includes a plurality of follower rollers, and the follower rollers are in rolling contact with the silicon wafers.

5. The vertical conveying device for silicon wafer separation according to claim 2, characterized in that: The vertical conveyor belt is arranged opposite to the adsorption area.

6. The silicon wafer vertical conveying device according to any one of claims 2 to 5, characterized in that: The vertical conveying section further comprises a mounting frame, and the adsorption area and the auxiliary conveying area are arranged on the mounting frame.

7. The silicon wafer vertical conveying device according to claim 6, characterized in that: The water spraying part is arranged on the mounting frame, and the water spraying part is located at two opposite sides of the vertical conveying part.

8. The silicon wafer vertical conveying device according to claim 7, characterized in that: Two water spraying parts are arranged vertically and spaced apart on each side of the vertical conveying part.

9. The silicon wafer vertical conveying device according to claim 1, characterized in that: The vertical conveyor belt is driven by a driving mechanism, which includes a motor, a synchronous belt, and a rotating shaft. The synchronous belt is connected between the power output end of the motor and the rotating shaft, and the rotating shaft is connected to the vertical conveyor belt to drive the vertical conveyor belt to rotate.

10. The vertical silicon wafer conveying device according to claim 9, characterized in that: There are a plurality of the vertical conveyor belts, the plurality of the vertical conveyor belts are arranged at intervals along the width direction of the adsorption portion, and the plurality of the vertical conveyor belts are driven by the same rotating shaft.

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