Material placing frame of graphite piece high-temperature silicon removal furnace

Abstract

The utility model discloses a material placing frame of a graphite piece high-temperature silicon removal furnace, and belongs to the technical field of vacuum heat treatment furnaces. Comprising a plurality of layers of receiving discs, and every two vertically adjacent receiving discs are connected in a supporting mode through a graphite supporting column. Graphite paper is laid on the receiving disc, a plurality of material lapping pieces are inserted into the receiving disc in parallel, guiding flowing grooves are formed in each material lapping piece at intervals, and the two ends of the bottom of a graphite material are placed on the guiding flowing grooves of every two adjacent material lapping pieces respectively. The plurality of placing racks are connected through the receiving discs at the bottommost layer for horizontal expansion, and every two adjacent receiving discs at the bottommost layer are connected through a carbon-carbon nut and a carbon-carbon screw rod; according to the utility model, impurity silicon in the graphite piece can be removed, no silicon material remains on the material placing rack can be effectively protected, the number of the connected silicon material receiving trays can be selected according to actual requirements for splicing, and the processing efficiency of the graphite piece is improved.

Description

Technical Field

[0001] The utility model belongs to the technical field of vacuum heat treatment furnaces, in particular to a material placing rack for a graphite part high-temperature desiliconizing furnace. Background Art

[0002] The working principle of graphite parts desiliconization is: using a vacuum system to exhaust the gas in the high-temperature furnace chamber, so that the pressure in the furnace is less than a standard atmospheric pressure, so as to realize the process flow under a certain vacuum state. Usually, the graphite parts to be processed are placed on a material placement rack, and then the material placement rack is placed in the furnace. However, the existing material placement rack has a single structure and can only place a small number of graphite parts at a time. Moreover, when the silicon material in the graphite parts is melted, it will remain on the material placement rack, resulting in the placement rack being attached with silicon material and cannot be reused. Utility Model Content

[0003] The utility model overcomes the shortcomings of the prior art and provides a material placement rack for a graphite high-temperature desiliconization furnace, solving the problems that the placement rack cannot be reused after silicon material is attached thereto and the placement rack has limited space for placing materials.

[0004] In order to achieve the above purpose, the utility model is implemented through the following technical solutions.

[0005] A material placement rack for a high-temperature desiliconization furnace for graphite parts comprises a multi-layer receiving plate, wherein two upper and lower adjacent receiving plates are supported and connected by graphite pillars; graphite paper is laid on the receiving plate, and a plurality of material straps are inserted in parallel on the receiving plate, each material strap is provided with guide flow grooves at intervals, and the two ends of the bottom of the graphite material are respectively placed on the guide flow grooves of two adjacent material straps; a plurality of placement racks are connected through the receiving plate at the bottom layer for horizontal expansion, and the two adjacent receiving plates at the bottom layer are connected by a carbon-carbon nut and a carbon-carbon screw.

[0006] Furthermore, graphite pillars are connected at the four corners between two adjacent layers of the connection plates.

[0007] Furthermore, the bottom of the graphite pillar is plugged into the next layer of the receiving plate, and the top of the graphite pillar is plugged into the previous layer of the receiving plate.

[0008] Furthermore, the four sides of the receiving plate are all connected with ribs.

[0009] Furthermore, the rib is connected to the receiving plate through a carbon-carbon nut and a carbon-carbon screw.

[0010] Furthermore, the receiving plate, the carbon-carbon screw and the carbon-carbon nut are made of carbon-carbon.

[0011] Furthermore, the ribs, material straps and graphite pillars are graphite parts.

[0012] The beneficial effects of the utility model compared with the prior art are:

[0013] The material placement rack described in the utility model can effectively ensure that the silicon material is accumulated on the graphite paper laid on the receiving plate after melting, which can not only remove the impurity silicon in the graphite parts, but also effectively protect the material placement rack from silicon material retention. Silicon material is prevented from remaining on the material rack by replacing the graphite paper. The graphite parts with attached silicon material can be reused to save production costs.

[0014] The utility model adopts silicon material receiving trays that can be assembled together, and the number of connected silicon material receiving trays can be selected for splicing according to actual needs, so as to improve the processing efficiency of graphite parts. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 This is a schematic diagram of the structure of the material placement rack after assembly according to the utility model.

[0016] Figure 2 for Figure 1 Isometric diagram.

[0017] Figure 3 for Figure 1 Enlarged view of center І.

[0018] Figure 4 for Figure 1 Top view of the .

[0019] Figure 5 This is a structural diagram of a single-layer material placement rack.

[0020] In the figure: 1 is a receiving plate, 2 is a retaining edge, 3 is a material strap, 4 is a guide flow groove, 6 is a carbon-carbon screw, 7 is a carbon-carbon nut, 8 is a graphite material, and 9 is a graphite pillar. DETAILED DESCRIPTION

[0021] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention more clearly understood, the present invention is further described in detail in combination with the embodiments and the accompanying drawings. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention. The technical solution of the present invention is described in detail below in combination with the embodiments and the accompanying drawings, but the scope of protection is not limited thereto.

[0022] like Figure 1-5As shown, this embodiment provides a material placement rack for a graphite parts high-temperature desiliconization furnace, including a multi-layer receiving tray 1, graphite pillars 9 are connected at the four corners between two adjacent receiving trays 1, the bottom of the graphite pillars 9 is plugged into the receiving tray 1 of the next layer, and the top of the graphite pillars 9 is plugged into the receiving tray 1 of the previous layer; graphite paper is laid on the receiving tray 1, and the four sides of the receiving tray 1 are connected with ribs 2, which are connected to the receiving tray 1 through carbon-carbon nuts and carbon-carbon screws. Six material straps 3 are plugged in parallel on the receiving tray 1, and each material strap 3 is provided with guide flow grooves 4 at intervals. The two ends of the bottom of the graphite material 8 are respectively placed on the guide flow grooves 4 of the two adjacent material straps 3, and the guide flow grooves 4 can guide the molten silicon material remaining on the material strap 3 to flow to the graphite paper of the receiving tray 1.

[0023] The multi-layer receiving plate 1 can also be expanded in the horizontal direction by connecting the carbon-carbon nut 7 and the carbon-carbon screw 6.

[0024] The receiving plate 1, carbon-carbon screw 6, and carbon-carbon nut 7 are made of carbon-carbon, which has a lower density than graphite parts, a higher strength than graphite parts at room temperature, and a lighter weight. The retaining edge 2, material strap 3, and graphite support 9 are graphite parts, all of which are resistant to high temperatures.

[0025] The working principle of the utility model is:

[0026] The vacuum system is used to discharge the gas in the high-temperature furnace chamber, making the pressure in the furnace less than a standard atmospheric pressure, so as to realize the process flow under a certain vacuum state. The material placement rack can effectively ensure that the silicon material accumulates on the graphite paper laid on the receiving tray after melting, which can not only remove the impurity silicon in the graphite parts, but also effectively protect the material placement rack from silicon material retention.

[0027] The utility model has a simple structure and is easy to install. It adopts silicon material receiving trays that can be assembled together. The number of connected silicon material receiving trays can be selected according to actual needs for splicing. The graphite parts attached with silicon material can be reused to save production costs. Silicon material can be prevented from remaining on the material rack by replacing graphite paper.

[0028] The above content is a further detailed description of the utility model in combination with a specific preferred implementation method. It cannot be determined that the specific implementation methods of the utility model are limited to this. For ordinary technicians in the technical field to which the utility model belongs, they can make several simple deductions or substitutions without departing from the utility model, which should be regarded as belonging to the utility model and the scope of patent protection determined by the submitted claims.

Claims

1. A material placement rack for a high-temperature graphite desiliconization furnace, characterized in that: The invention comprises a multi-layer receiving plate (1), wherein two upper and lower adjacent receiving plates (1) are supported and connected by graphite pillars (9); graphite paper is laid on the receiving plate (1), a plurality of material straps (3) are inserted in parallel on the receiving plate (1), each material strap (3) is provided with guide flow grooves (4) at intervals, and the bottom ends of the graphite material (8) are respectively placed on the guide flow grooves (4) of two adjacent material straps (3); a plurality of placement racks are connected through the receiving plate (1) at the bottom layer to be horizontally extended, and the two adjacent receiving plates (1) at the bottom layer are connected through a carbon-carbon nut (7) and a carbon-carbon screw (6).

2. A material placement rack for a graphite parts high temperature desiliconization furnace according to claim 1, characterized in that: Graphite pillars (9) are connected at the four corners between two adjacent layers of receiving plates (1).

3. A material placement rack for a graphite parts high temperature desiliconization furnace according to claim 2, characterized in that: The bottom of the graphite support (9) is plugged into the lower layer of the receiving plate (1), and the top of the graphite support (9) is plugged into the upper layer of the receiving plate (1).

4. A material placement rack for a graphite parts high temperature desiliconization furnace according to claim 1, characterized in that: The four sides of the receiving plate (1) are all connected with retaining edges (2).

5. A material placement rack for a graphite parts high temperature desiliconization furnace according to claim 4, characterized in that: The retaining edge (2) is connected to the receiving plate (1) via a carbon-carbon nut and a carbon-carbon screw.

6. A material placement rack for a graphite parts high temperature desiliconization furnace according to claim 1, characterized in that: The receiving plate (1), the carbon-carbon screw (6) and the carbon-carbon nut (7) are made of carbon-carbon.

7. A material placement rack for a graphite parts high temperature desiliconization furnace according to claim 4, characterized in that: The retaining edge (2), the material strap (3) and the graphite support (9) are graphite parts.

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