Coating support plate cleaning device and coating equipment

Abstract

The utility model provides a coating support plate cleaning device and coating equipment. The coating support plate cleaning device comprises a reaction cleaning mechanism and a flushing mechanism, the reaction cleaning mechanism comprises a reaction liquid pipe and a reaction liquid nozzle connected with the reaction liquid pipe, the flushing mechanism comprises a flushing liquid pipe and a flushing liquid nozzle connected with the flushing liquid pipe, and the reaction liquid nozzle and the flushing liquid nozzle are arranged on a moving path of a coating support plate. The reaction liquid nozzle is used for spraying reaction liquid towards the coating carrier plate, the flushing liquid nozzle is used for spraying flushing liquid towards the coating carrier plate, and the spraying station of the reaction liquid nozzle is located in front of the spraying station of the flushing liquid nozzle. According to the coating support plate cleaning device, the coating support plate can be temporarily cleaned, and the effect of controlling the adhesion amount of impurities on the surface of the coating support plate is achieved. In this way, the amount of impurities attached to the surface of the coating carrier plate between the two times of conveying and washing processes is small, and it is guaranteed that the quality of a coating layer is stable.

Description

Technical Field

[0001] The utility model relates to the technical field of film coating, in particular to a film coating carrier cleaning device and film coating equipment. Background Art

[0002] The transparent conductive film layer has light transmittance and electrical conductivity, and is widely used in many devices with high requirements for conductivity and light transmittance.

[0003] Transparent conductive film layers are usually prepared by vapor deposition. During the deposition process, transparent conductive materials are not only deposited on the device to be coated, but also on the coating carrier that carries the device. Transparent conductive materials are mostly conductive metal oxides, which have a strong adsorption effect on water vapor. As the number of coating times increases, the transparent conductive material deposited on the coating carrier gradually becomes thicker, and the adsorbed water vapor also gradually increases. The water vapor adsorbed on the coating carrier will affect the partial pressure of water vapor in the coating chamber, which will result in poor quality of the coated layer.

[0004] In traditional technology, after a coated substrate has been used for a specific length of time or has been coated a number of times, it needs to be transported to a special cleaning device to remove the materials attached to its surface. However, this process is relatively complicated as a whole, and in fact, the interval between two adjacent washes is relatively long. Between two adjacent washes, there is still a large difference between the coated substrate in the early stage and the coated substrate in the final stage. The transparent conductive material deposited on the coated substrate in the final stage is significantly thicker, and the resistance value of the plated transparent conductive film layer shows an upward trend compared to the initial stage, and the resistance value distribution of the transparent conductive film layer plated each time is also more dispersed, which leads to unstable device quality. For example, the fill factor and conversion efficiency of solar cells will fluctuate greatly due to this problem. Utility Model Content

[0005] Based on this, in order to control the amount of impurities attached to the surface of the coated carrier as much as possible, reduce the surface difference of the coated carrier between cleaning, and ensure the stability of the quality of the coated layer, it is necessary to provide a coated carrier cleaning device.

[0006] According to some embodiments of the utility model, a coating carrier cleaning device is provided, the coating carrier cleaning device comprises a reaction cleaning mechanism and a flushing mechanism, the reaction cleaning mechanism comprises a reaction liquid tube and a reaction liquid nozzle connected to the reaction liquid tube, the flushing mechanism comprises a flushing liquid tube and a flushing liquid nozzle connected to the flushing liquid tube, the reaction liquid nozzle and the flushing liquid nozzle are arranged on the moving path of the coating carrier, the reaction liquid nozzle is used for spraying reaction liquid toward the coating carrier, the flushing liquid nozzle is used for spraying flushing liquid toward the coating carrier, and the spraying station of the reaction liquid nozzle is located before the spraying station of the flushing liquid nozzle.

[0007] In some embodiments of the present invention, the reaction liquid nozzle is an atomizing nozzle; and / or,

[0008] The flushing liquid nozzle is a non-atomizing nozzle.

[0009] In some embodiments of the present invention, the coating carrier cleaning device further includes a booster connected to the reaction liquid tube and the rinse liquid tube, and the booster is used to increase the pressure in the reaction liquid tube and the rinse liquid tube.

[0010] In some embodiments of the present invention, the booster is a gas compressor, and the gas compressor increases the pressure in the reaction liquid pipe and the flushing liquid pipe by injecting compressed gas into the reaction liquid pipe and the flushing liquid pipe.

[0011] In some embodiments of the present invention, the coated carrier cleaning device also includes a controller and a water vapor detector, the controller signal is connected to the reaction cleaning mechanism and the flushing mechanism, and the controller is used to control the liquid output status of the reaction cleaning mechanism and the flushing mechanism, the water vapor detector signal is connected to the controller, and the water vapor detector is used to monitor the surface water vapor content of the coated carrier.

[0012] In some embodiments of the present invention, the coating carrier cleaning device further includes a recovery tank, which is disposed below the reaction liquid nozzle and the rinse liquid nozzle and is used to receive the reaction liquid and the rinse liquid.

[0013] In some embodiments of the present invention, the recovery tank includes a tank body and a tank cover, the tank cover is openably arranged on the tank body, the controller signal is connected to the tank cover, and the controller is used to control the opening and closing state of the tank cover.

[0014] In some embodiments of the present invention, the reaction cleaning mechanism includes a plurality of reaction liquid nozzles arranged side by side, and the flushing mechanism includes a plurality of flushing liquid nozzles arranged side by side, and the arrangement direction of the plurality of reaction liquid nozzles is the same as the arrangement direction of the plurality of flushing liquid nozzles.

[0015] Furthermore, the utility model also provides a coating device, which includes a return chamber, a carrier conveying mechanism and a coating carrier cleaning device as described in any of the above embodiments, wherein the reaction liquid nozzle, the rinsing liquid nozzle and the carrier conveying mechanism are arranged in the return chamber, the coating cleaning device is arranged on the conveying path of the carrier conveying mechanism, and the reaction liquid nozzle and the rinsing liquid nozzle are sequentially arranged on the conveying path.

[0016] In some embodiments of the present invention, a heating mechanism is further included. The heating mechanism is disposed in the return chamber, and the heating mechanism is located after the spraying station of the flushing liquid nozzle.

[0017] In the coating carrier cleaning device of the utility model, the reaction cleaning mechanism includes a reaction liquid pipe and a reaction liquid nozzle connected to the reaction liquid pipe, the flushing mechanism includes a flushing liquid pipe and a flushing liquid nozzle connected to the flushing liquid pipe, the reaction liquid nozzle and the flushing liquid nozzle are arranged on the moving path of the coating carrier, and the spraying station of the reaction liquid nozzle is located before the spraying station of the flushing liquid nozzle. The coating carrier can be used in the transfer process of the coating carrier, specifically, when the coating carrier is transferred, it first passes through the spraying station of the reaction liquid nozzle, the reaction liquid nozzle sprays the reaction liquid toward the coating carrier to remove the impurities attached to the surface of the coating carrier, and then the coating carrier is transferred to the spraying station of the flushing liquid nozzle, and the flushing liquid nozzle sprays the flushing liquid toward the coating carrier to remove the residual reaction liquid and reaction products. The coating carrier cleaning device can be used in the transportation process of the coating carrier to achieve temporary cleaning and removal of impurities attached to the surface of the coating carrier. The coating carrier cleaning device is easy to use, can realize temporary cleaning of the coating carrier, and plays a role in controlling the amount of impurities attached to the surface of the coating carrier. This can reduce the amount of impurities attached to the surface of the coating carrier between two cleaning processes and ensure the stability of the quality of the coating layer. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 It is a structural schematic diagram of a coating carrier cleaning device;

[0019] Figure 2 To include Figure 1 The cross-sectional structural schematic diagram of the coating equipment of the coating carrier cleaning device is shown.

[0020] The reference numerals and their meanings are as follows:

[0021] 101. Reaction liquid spraying station; 102. Rinsing liquid spraying station; 110. Reaction cleaning mechanism; 111. Reaction liquid nozzle; 112. Reaction liquid pipe; 113. Reaction liquid valve; 120. Rinsing mechanism; 121. Rinsing liquid nozzle; 122. Rinsing liquid pipe; 123. Rinsing liquid valve; 130. Pressurizing element; 140. Controller; 150. Recovery tank; 151. Tank body; 152. Tank cover; 200. Return chamber; 210. Carrier conveying mechanism; 220. Heating mechanism; 230. Coating carrier; 300. First transfer chamber; 400. Coating chamber; 500. Second transfer chamber. DETAILED DESCRIPTION

[0022] In order to facilitate the understanding of the present invention, the present invention will be described more comprehensively in combination with the embodiments and the effect diagrams. The embodiments provide preferred embodiments of the present invention. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the understanding of the disclosure of the present invention more thorough and comprehensive.

[0023] It should be noted that when an element is referred to as being "fixed" to another element, it may be directly fixed to another original part or there may also be a central element. When an element is considered to be "connected" to another element, it may be directly connected to the other element or there may be a central element at the same time. In addition, in the description of the present utility model, unless otherwise clearly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense. For example, it may be a fixed connection, a detachable connection, or an integrated connection; it may be a mechanical connection or an electrical connection; it may be a direct connection, or an indirect connection through an intermediate medium, or it may be internal communication between two elements. It should be understood that it is possible for those skilled in the art to understand the specific meanings of the above terms according to the specific circumstances without causing ambiguity.

[0024] Unless otherwise specified, in the description of the present invention, terms indicating orientation or positional relationship, such as "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", and "outside", are based on the orientation or positional relationship shown in the drawings of the utility model. They are only for the convenience and simplification of the description of the content of the utility model and to help readers understand the description in conjunction with the drawings. They do not limit or imply a specific orientation that the device or element referred to must have, and therefore should not be understood as a limitation on the present invention.

[0025] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those generally understood by technicians in the technical field of the present invention. The terms used herein in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. The term "and / or" used herein includes any and all combinations of one or more related listed items. "Multiple" herein includes a combination of two or more than two items.

[0026] The utility model provides a coating carrier cleaning device, which comprises a reaction cleaning mechanism and a flushing mechanism. The reaction cleaning mechanism comprises a reaction liquid tube and a reaction liquid nozzle connected to the reaction liquid tube. The flushing mechanism comprises a flushing liquid tube and a flushing liquid nozzle connected to the flushing liquid tube. The reaction liquid nozzle and the flushing liquid nozzle are arranged on a moving path of the coating carrier. The reaction liquid nozzle is used for spraying reaction liquid toward the coating carrier. The flushing liquid nozzle is used for spraying flushing liquid toward the coating carrier. The spraying station of the reaction liquid nozzle is located before the spraying station of the flushing liquid nozzle.

[0027] In the coating carrier cleaning device of the utility model, the reaction cleaning mechanism includes a reaction liquid pipe and a reaction liquid nozzle connected to the reaction liquid pipe, the flushing mechanism includes a flushing liquid pipe and a flushing liquid nozzle connected to the flushing liquid pipe, the reaction liquid nozzle and the flushing liquid nozzle are arranged on the moving path of the coating carrier, and the spraying station of the reaction liquid nozzle is located before the spraying station of the flushing liquid nozzle. The coating carrier can be used in the transfer process of the coating carrier, specifically, when the coating carrier is transferred, it first passes through the spraying station of the reaction liquid nozzle, the reaction liquid nozzle sprays the reaction liquid toward the coating carrier to clean the impurities attached to the surface of the coating carrier, and then the coating carrier is transferred to the spraying station of the flushing liquid nozzle, and the flushing liquid nozzle sprays the flushing liquid toward the coating carrier to remove the residual reaction liquid and reaction products. The coating carrier cleaning device is easy to use, can realize temporary cleaning of the coating carrier, and plays a role in controlling the amount of impurities attached to the surface of the coating carrier. This can reduce the amount of impurities attached to the surface of the coating carrier between two washing processes and ensure the stability of the quality of the coating layer.

[0028] Figure 1 This is a schematic diagram of the structure of a coating substrate cleaning device. Figure 1 As shown, in this embodiment, the coating carrier cleaning device includes a reaction cleaning mechanism 110 and a flushing mechanism 120. The reaction cleaning mechanism 110 includes a reaction liquid pipe 112 and a reaction liquid nozzle 111 connected to the reaction liquid pipe 112. The flushing mechanism 120 includes a flushing liquid pipe 122 and a flushing liquid nozzle 121 connected to the flushing liquid pipe 122. The reaction liquid nozzle 111 and the flushing liquid nozzle 121 are arranged on the moving path of the coating carrier. The reaction liquid nozzle 111 is used to spray the reaction liquid toward the coating carrier. The flushing liquid nozzle 121 is used to spray the flushing liquid toward the coating carrier. The spraying station of the reaction liquid nozzle 111 is located before the spraying station of the flushing liquid nozzle 121. Figure 1 As shown, the spraying station of the reaction liquid nozzle 111 is the reaction liquid spraying station 101 , the spraying station of the rinse liquid nozzle 121 is the rinse liquid spraying station 102 , and the reaction liquid spraying station 101 is located before the rinse liquid spraying station 102 .

[0029] It can be understood that the reaction liquid pipe 112 can be used to transport the reaction liquid to the reaction liquid nozzle 111, and the reaction liquid is used to react chemically with the impurities attached to the surface of the coating carrier, so that the impurities fall off the surface of the coating carrier. The rinse liquid pipe 122 can be used to transport the rinse liquid to the rinse liquid nozzle 121, and the rinse liquid is used to rinse the residual reaction liquid on the surface of the coating carrier and the product after the reaction between the reaction liquid and the impurities.

[0030] In some examples of this embodiment, the reaction liquid may be an acid solution. For example, the reaction liquid may include one or more of hydrochloric acid and sulfuric acid. Usually, the impurities attached to the coating carrier are conductive metal oxides such as indium tin oxide, and the acid solution can react with the conductive metal oxide to dissolve the impurities, thereby controlling the impurities on the surface of the coating carrier.

[0031] In some examples of this embodiment, the rinse liquid may include water. The hydrochloric acid in the above acid solution can react with the conductive metal oxide to generate chloride soluble in water, and the acid solution is also soluble in water. The use of water can effectively dissolve and rinse away the residual acid solution and the product after the reaction. In addition, the moisture remaining on the surface of the coating carrier after rinsing can also be removed relatively simply by drying or baking.

[0032] In some examples of this embodiment, the reaction liquid nozzle 111 may be an atomizing nozzle. It is understood that the atomizing nozzle is used to atomize the reaction liquid sprayed from the nozzle, so that the sprayed reaction liquid is in the form of water mist. The atomized reaction liquid can cover the coating carrier more comprehensively and evenly, and can more comprehensively and effectively remove impurities attached to the surface of the coating carrier, ensuring that the surface of the coating carrier after cleaning is cleaner.

[0033] In some examples of this embodiment, the rinse liquid nozzle 121 may be a non-atomizing nozzle. It is understood that the non-atomizing nozzle does not atomize the rinse liquid, and can keep the rinse liquid sprayed in the form of one jet or multiple jets, so that the rinse liquid has a strong impact force, and can quickly and effectively remove the residual reaction liquid and reaction products on the surface of the coating carrier, making the surface of the coating carrier cleaner.

[0034] Reference Figure 1 As shown, in some examples of this embodiment, the coating carrier cleaning device further includes a pressure booster 130. The pressure booster 130 is connected to the reaction liquid pipe 112. The pressure booster 130 is used to increase the pressure in the reaction liquid pipe 112. By setting the pressure booster 130 to pressurize the reaction liquid pipe 112, the pressure and flow rate of the reaction liquid can be increased, thereby increasing the dispersion degree and flushing strength of the reaction liquid on the impurities and reaction liquid remaining on the surface of the coating carrier.

[0035] Furthermore, in some examples of this embodiment, the pressure booster 130 is also connected to the rinsing liquid pipe 122. The pressure booster 130 is used to increase the pressure in the rinsing liquid pipe 122. By providing the pressure booster 130 to pressurize the rinsing liquid pipe 122, the pressure and flow rate of the rinsing liquid can be increased, thereby increasing the rinsing force of the rinsing liquid and further increasing the cleanliness of the surface of the coating carrier.

[0036] Reference Figure 1 As shown, the booster 130 is connected to the reaction liquid pipe 112 and the flushing liquid pipe 122 at the same time, so as to realize the above two functions at the same time, saving actual devices and space occupation.

[0037] In some examples of this embodiment, the pressurizing member 130 may be a gas compressor. Further, the gas compressor may be an air compressor. The gas compressor may increase the pressure in the reaction liquid pipe 112 and the flushing liquid pipe 122 by injecting compressed gas into the reaction liquid pipe 112 and the flushing liquid pipe 122. After the compressed gas is injected into the reaction liquid pipe 112, the compressed gas may be combined with the atomizing nozzle to further improve the atomization degree of the reaction liquid. After the compressed gas is injected into the flushing liquid pipe 122, the compressed gas may mix with the flushing liquid and increase the impact force of the flushing liquid.

[0038] In some examples of this embodiment, the spraying pressure of the reaction liquid may be 1 MPa to 20 MPa, and the spraying flow rate may be 5 L / min to 30 L / min.

[0039] Reference Figure 1 As shown, in some examples of this embodiment, the coating carrier cleaning device further includes a controller 140 and a water vapor detector (not shown in the figure). The controller 140 is connected to the reaction cleaning mechanism 110 and the flushing mechanism 120 by signal, and the controller 140 is used to control the liquid discharge state of the reaction cleaning mechanism 110 and the flushing mechanism 120. The water vapor detector is connected to the controller 140 by signal, and the water vapor detector is used to monitor the surface water vapor content of the coating carrier 230. The water vapor detector is set to monitor the surface water vapor content of the coating carrier, which can assist the controller 140 in controlling the timing of starting the reaction cleaning mechanism 110 and the flushing mechanism 120, so that the cleaning timing is more accurate, and the amount of impurities attached to the surface of the coating carrier is ensured to be as stable and small as possible.

[0040] It can be understood that in actual use, when the water vapor detector detects that the water vapor content on the surface of the coated carrier is higher than the preset value, it means that the amount of impurities attached to the surface of the coated carrier is relatively large, and the water vapor detector feeds back an opening signal to the controller 140. After receiving the opening signal, the controller 140 can control the reaction cleaning mechanism 110 and the flushing mechanism 120 to start operating and spray the corresponding liquid to clean the coated carrier.

[0041] Reference Figure 1As shown, in some examples of this embodiment, the reaction cleaning mechanism 110 may further include a reaction valve. The reaction valve may be disposed on the reaction liquid tube 112 and used to control the circulation of the reaction liquid in the reaction liquid tube 112. Further, the reaction valve may be connected to the controller 140 by signal, and the controller 140 may control the opening state of the reaction valve to control the operation state of the reaction cleaning mechanism 110.

[0042] Reference Figure 1 As shown, in some examples of this embodiment, the flushing mechanism 120 may further include a flushing valve. The flushing valve may be disposed on the flushing liquid pipe 122 and used to control the circulation of the flushing liquid in the flushing liquid pipe 122. Further, the flushing valve may be connected to the controller by a signal, and the controller may control the opening state of the flushing valve to control the operating state of the reaction cleaning mechanism 110.

[0043] Reference Figure 1 As shown, in some examples of this embodiment, the coating carrier cleaning device may further include a recovery tank 150. The recovery tank 150 is disposed under the reaction liquid nozzle 111 and the rinse liquid nozzle 121, and is used to receive the reaction liquid and the rinse liquid. It is understood that after the reaction liquid and the rinse liquid are sprayed onto the surface of the coating carrier, they can spontaneously flow into the recovery tank 150 under the action of gravity. The use of the recovery tank 150 to receive the reaction liquid and the rinse liquid can recycle the used reaction liquid and the rinse liquid to reduce the use cost.

[0044] Further, refer to Figure 1 As shown, in some examples of this embodiment, the recovery tank 150 may include a tank body 151 and a tank cover 152. The tank cover 152 can be opened and closed on the tank body 151. It can be understood that the reaction liquid has a certain volatility and may corrode other components of the cleaning space. When the reaction cleaning mechanism 110 and the flushing mechanism 120 are in operation, the tank cover 152 can be controlled to open to receive the sprayed reaction liquid and flushing liquid. When the reaction cleaning mechanism 110 and the flushing mechanism 120 stop operating, the tank cover 152 can be controlled to close to prevent the components in the reaction liquid from volatilizing.

[0045] In some examples of this embodiment, the controller 140 may be connected to the slot cover 152 via a signal, and the controller 140 is used to control the opening and closing status of the slot cover 152 .

[0046] Reference Figure 1 As shown, in some examples of this embodiment, the reaction cleaning mechanism 110 includes a plurality of reaction liquid nozzles 111 arranged side by side. The flushing mechanism 120 includes a plurality of flushing liquid nozzles 121 arranged side by side. The arrangement direction of the plurality of reaction liquid nozzles 111 is the same as the arrangement direction of the plurality of flushing liquid nozzles 121. The plurality of reaction liquid nozzles 111 arranged side by side can make the sprayed reaction liquid more uniform.

[0047] Reference Figure 1 As shown, in some examples of this embodiment, the reaction cleaning mechanism 110 may include multiple rows of reaction liquid nozzles 111. Each row of reaction liquid nozzles 111 includes multiple reaction liquid nozzles 111 arranged side by side. In this embodiment, the reaction cleaning mechanism 110 may include two rows of reaction liquid nozzles 111. Two adjacent rows of reaction liquid nozzles 111 are arranged in parallel and at intervals.

[0048] Reference Figure 1 As shown, in some examples of this embodiment, the flushing mechanism 120 may include multiple rows of flushing liquid nozzles 121. Each row of flushing liquid nozzles 121 includes multiple flushing liquid nozzles 121 arranged side by side. In this embodiment, the reaction cleaning mechanism 110 may include three rows of flushing liquid nozzles 121. Two adjacent rows of flushing liquid nozzles 121 are arranged in parallel and at intervals.

[0049] In this embodiment, the arrangement direction of the reaction liquid nozzles 111 can be set according to the moving direction of the coating carrier, for example, the arrangement direction of the reaction liquid nozzles 111 can intersect with the moving direction of the coating carrier. Further, the arrangement direction of the reaction liquid nozzles 111 can be perpendicular to the moving direction of the coating carrier.

[0050] Understandably, Figure 1 The coating carrier cleaning device shown can be used during the transportation of the coating carrier to achieve temporary cleaning and removal of impurities attached to the surface of the coating carrier. The coating carrier cleaning device is easy to use, can achieve temporary cleaning of the coating carrier, and plays a role in controlling the amount of impurities attached to the surface of the coating carrier.

[0051] Furthermore, the coating carrier cleaning device can also be combined with existing coating equipment and its production process, saving actual space while not affecting the original production efficiency of the coating.

[0052] The utility model also provides a coating device. Figure 2 For a Figure 1 The cross-sectional structure diagram of the coating equipment of the coating carrier cleaning device shown in FIG. Figure 2 As shown, the coating equipment includes a return chamber 200, a carrier conveying mechanism 210, and a coating carrier cleaning device as in the above-mentioned embodiment. It can be understood that the carrier conveying mechanism 210 is used to transport the coating carrier 230 in the return chamber 200. The carrier conveying mechanism 210, the reaction liquid nozzle 111, and the rinse liquid nozzle 121 are arranged in the return chamber 200, and the reaction liquid nozzle 111 and the rinse liquid nozzle 121 are arranged on the conveying path of the carrier conveying mechanism 210.

[0053] It can be understood that in this embodiment, other components in the coating carrier cleaning device can be located in the return chamber 200 or outside the return chamber 200, which can be reasonably arranged according to actual needs.

[0054] In some examples of this embodiment, the coating device may include a return chamber 200, a first transfer chamber 300, a coating chamber 400, and a second transfer chamber 500. One end of the return chamber 200 may be connected to the coating chamber 400 through the first transfer chamber 300, and the other end of the return chamber 200 may be connected to the coating chamber 400 through the second transfer chamber 500. In the actual coating process, the carrier conveying mechanism 210 may transport the coating carrier 230 to the first transfer chamber 300, and the coating carrier 230 waits in the first transfer chamber 300 to be sent to the coating chamber 400 for the coating process. After completing the coating process, the coating carrier 230 passes through the second transfer chamber 500 and is sent back to the return chamber 200, completing a use cycle.

[0055] Reference Figure 2 As shown, in some examples of this embodiment, the coating device may further include a heating mechanism 220. The heating mechanism 220 may be disposed on a conveying path after the rinse liquid spraying station 102. The heating mechanism 220 may be used to heat the coating carrier 230 after being rinsed with the rinse liquid, so as to dry a small amount of rinse liquid attached to the surface of the coating carrier 230, thereby ensuring the cleanliness of the surface of the coating carrier 230.

[0056] Combination Figure 1 and Figure 2 As shown, in some examples of this embodiment, the heating mechanism 220 may include a heating plate. The heating plate may be disposed in the return chamber 200. Further, the heating plate may be disposed on the top wall of the return chamber 200.

[0057] Combination Figure 1 and Figure 2 As shown, in some examples of this embodiment, the reaction liquid spraying station 101 and the rinse liquid spraying station 102 are sequentially arranged on the conveying path of the carrier conveying mechanism 210 .

[0058] Combination Figure 1 and Figure 2 As shown, in some examples of this embodiment, the reaction liquid nozzle 111 and the rinse liquid nozzle 121 can be disposed above the conveying path of the carrier conveying mechanism 210 to spray the reaction liquid and the rinse liquid in a vertically downward manner.

[0059] Combination Figure 1 and Figure 2As shown, in some examples of this embodiment, the recovery tank 150 can be disposed below the conveying path of the carrier conveying mechanism 210 to receive the reaction liquid and the rinsing liquid after rinsing the coated carrier 230 .

[0060] Combination Figure 1 and Figure 2 As shown, in some examples of this embodiment, the carrier conveying mechanism 210 may include two parallel and spaced conveyor belts, the coating carrier 230 may be straddled on the two spaced conveyor belts, the reaction liquid nozzle 111 and the rinse liquid nozzle 121 may be disposed in the upper space between the two conveyor belts. Further, the recovery tank 150 may be disposed between the two conveyor belts.

[0061] like Figure 1 The coating carrier cleaning device shown and Figure 2 The coating equipment shown can be used in the following manner.

[0062] First, a water vapor detector can be used to detect the water vapor content on the surface of the coating substrate 230 entering the return chamber 200. When the water vapor content is higher than a preset value (e.g., 8×10 -12 When the temperature is above 0.5 Pa, a feedback signal is given to the controller 140, and the controller 140 controls the slot cover 152 of the recovery slot 150 to open.

[0063] The coated substrate 230 is first transported to the bottom of the reaction liquid nozzle 111, and the controller 140 controls the reaction cleaning mechanism 110 to start operation. The reaction liquid nozzle 111 sprays the reaction liquid containing hydrochloric acid and / or sulfuric acid toward the surface of the coated substrate 230. The reaction liquid is sprayed onto the surface of the coated substrate 230 in a mist form and reacts with the transparent conductive material attached to the surface of the coated substrate 230. Then the controller 140 controls the reaction cleaning mechanism 110 to stop operating, and the coated substrate 230 is transported to the bottom of the rinse liquid nozzle 121. The controller 140 controls the rinse mechanism 120 to start operation. The rinse liquid nozzle 121 sprays water as a rinse liquid toward the surface of the coated substrate 230. The rinse liquid is sprayed onto the surface of the coated substrate 230 in a multi-channel jet form to flush away the residual reaction liquid and reaction products on the surface of the coated substrate 230. In this process, the reaction liquid and the rinse liquid both flow from the surface of the coated substrate 230 into the tank body 151 of the recovery tank 150.

[0064] After rinsing is completed, the controller 140 controls the rinsing mechanism 120 to stop operating, and the coated carrier 230 is continued to be transported to the bottom of the heating mechanism 220. After the heating mechanism 220 heats the coated carrier 230 to dry the moisture on the surface of the coated carrier 230, the coated carrier 230 is moved out of the return chamber 200, and the coating carrier 230 is cleaned.

[0065] like Figure 2The coating equipment in the device utilizes the original return chamber 200 of the equipment and cleverly sets up a corresponding coating carrier cleaning device, which can temporarily clean and remove impurities attached to the surface of the coating carrier 230 during the transmission process of the coating carrier 230, so as to control the amount of impurities attached to the surface of the coating carrier 230, so that the amount of impurities attached to the surface of the coating carrier 230 is less between two washing processes, and the quality of the coated layer is guaranteed to be stable.

[0066] The technical features of the above embodiments may be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0067] The above embodiments only express several implementation methods of the utility model, and the descriptions are relatively specific and detailed, but they cannot be understood as limiting the scope of the utility model patent. It should be pointed out that for ordinary technicians in this field, several modifications and improvements can be made without departing from the concept of the utility model, which all belong to the protection scope of the utility model. Therefore, the protection scope of the utility model patent shall be based on the attached claims.

Claims

1. A coating carrier cleaning device, characterized in that: The coating carrier cleaning device comprises a reaction cleaning mechanism (110) and a flushing mechanism (120); the reaction cleaning mechanism (110) comprises a reaction liquid pipe (112) and a reaction liquid nozzle (111) connected to the reaction liquid pipe (112); the flushing mechanism (120) comprises a flushing liquid pipe (122) and a flushing liquid nozzle (121) connected to the flushing liquid pipe (122); the reaction liquid nozzle (111) and the flushing liquid nozzle (121) are arranged on a moving path of the coating carrier (230); the reaction liquid nozzle (111) is used for spraying reaction liquid toward the coating carrier (230); the flushing liquid nozzle (121) is used for spraying flushing liquid toward the coating carrier (230); the spraying station of the reaction liquid nozzle (111) is located before the spraying station of the flushing liquid nozzle (121).

2. The coating carrier cleaning device according to claim 1, characterized in that: The reaction liquid nozzle (111) is an atomizing nozzle; and / or, The flushing liquid nozzle (121) is a non-atomizing nozzle.

3. The coating carrier cleaning device according to claim 2, characterized in that: The coating carrier cleaning device also includes a booster (130), which is connected to the reaction liquid pipe (112) and the flushing liquid pipe (122), and the booster (130) is used to increase the pressure in the reaction liquid pipe (112) and the flushing liquid pipe (122).

4. The coating carrier cleaning device according to claim 3, characterized in that: The pressurizing component (130) is a gas compressor, which increases the pressure in the reaction liquid pipe (112) and the flushing liquid pipe (122) by injecting compressed gas into the reaction liquid pipe (112) and the flushing liquid pipe (122).

5. The coating carrier cleaning device according to any one of claims 1 to 4, characterized in that: The coating carrier cleaning device also includes a controller (140) and a water vapor detector. The controller (140) is signal-connected to the reaction cleaning mechanism (110) and the flushing mechanism (120), and the controller (140) is used to control the liquid output status of the reaction cleaning mechanism (110) and the flushing mechanism (120). The water vapor detector is signal-connected to the controller (140), and the water vapor detector is used to monitor the surface water vapor content of the coating carrier (230).

6. The coating carrier cleaning device according to claim 5, characterized in that: The coating carrier cleaning device further comprises a recovery tank (150), wherein the recovery tank (150) is arranged below the reaction liquid nozzle (111) and the rinse liquid nozzle (121) and is used for receiving the reaction liquid and the rinse liquid.

7. The coating carrier cleaning device according to claim 6, characterized in that: The recovery tank (150) comprises a tank body (151) and a tank cover (152); the tank cover (152) is arranged on the tank body (151) in an openable and closable manner; the controller (140) is connected to the tank cover (152) by a signal; and the controller (140) is used to control the opening and closing state of the tank cover (152).

8. The coating carrier cleaning device according to any one of claims 1 to 4 and 6 to 7, characterized in that: The reaction cleaning mechanism (110) comprises a plurality of reaction liquid nozzles (111) arranged side by side, and the flushing mechanism (120) comprises a plurality of flushing liquid nozzles (121) arranged side by side. The arrangement direction of the plurality of reaction liquid nozzles (111) is the same as the arrangement direction of the plurality of flushing liquid nozzles (121).

9. A coating device, characterized in that: It comprises a return chamber (200), a carrier conveying mechanism (210) and a coating carrier cleaning device as described in any one of claims 1 to 8, wherein the reaction liquid nozzle (111), the rinsing liquid nozzle (121) and the carrier conveying mechanism (210) are arranged in the return chamber (200), the coating carrier cleaning device is arranged on a conveying path of the carrier conveying mechanism (210), and the reaction liquid nozzle (111) and the rinsing liquid nozzle (121) are arranged on the conveying path in sequence.

10. The coating device according to claim 9, characterized in that: It also includes a heating mechanism (220), which is arranged in the return chamber (200), and the heating mechanism (220) is located after the spraying station of the flushing liquid nozzle (121).

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