Multi-rate monitoring device for multi-source co-evaporation process

Abstract

The utility model relates to the technical field of multi-source evaporation, in particular to a multi-rate monitoring device for a multi-source co-evaporation process, which comprises a lower baffle plate, an upper baffle plate arranged at the top of the lower baffle plate, an evaporation channel arranged at the center of the upper baffle plate, and at least two groups of nozzles annularly arranged at the top of the lower baffle plate. According to the utility model, the isolation conduits and the nozzles are arranged in an inclined manner, the flow track of part of high-speed gas sprayed by the nozzles is parallel to the axes of the corresponding isolation conduits, and the part of gas directly reaches the receiving surfaces of the corresponding rate sensors through the corresponding isolation conduits, so that the rate of the nozzles is detected; the umbrella-shaped high-speed airflow sprayed by the nozzle cannot be parallel to the axis of the adjacent isolation conduit, so that the umbrella-shaped high-speed airflow cannot directly reach the detection surface of the adjacent sensor, the measurement result of the adjacent sensor is prevented from being interfered, and the measurement accuracy is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of multi-source evaporation, in particular to a multi-rate monitoring device for a multi-source co-evaporation process. Background Art

[0002] In the field of photovoltaic cell chip manufacturing, evaporation is a technology for preparing photovoltaic thin films on substrates. Evaporation equipment usually uses rate probes to measure the evaporation amount of film materials during the evaporation process to monitor and control the efficiency and quality of the evaporation process.

[0003] Patent No. CN201420772666.4 discloses a multi-source evaporation device, including a first face, a second face and a third face, and the multi-source evaporation device includes a hollow cavity, an evaporation source mechanism and a shielding mechanism. The hollow cavity includes a storage space for accommodating the workpiece, the evaporation source mechanism includes a film material unit, the film material unit has a first film material that can be coated on the first face and the second face, and a second film material that can be coated on the second face and the third face, and the shielding mechanism includes a shielding member that can shield one of the first film material and the second film material from being coated on the second face.

[0004] When the above device is in use, it is not possible to measure and monitor the different evaporation rates of a variety of different membrane materials, and thus it is not possible to timely adjust the evaporation rates of different membrane materials according to different processes. Utility Model Content

[0005] In view of this, the purpose of the present invention is to provide a multi-rate monitoring device for a multi-source co-evaporation process, so as to solve the problem that the multi-source evaporation process cannot effectively detect the evaporation rates of multiple sources separately.

[0006] Based on the above purpose, the utility model provides a multi-rate monitoring device for a multi-source co-evaporation process, comprising a lower baffle, an upper baffle is arranged on the top of the lower baffle, and an evaporation channel is opened in the center of the upper baffle, and also includes:

[0007] At least two groups of nozzles are arranged in a ring shape on the top of the lower baffle;

[0008] The isolation conduits corresponding to the nozzles are arranged in a ring shape at the bottom of the lower baffle, and the isolation conduits are arranged obliquely at the top of the corresponding nozzles;

[0009] The top of the upper baffle is provided with a rate sensor corresponding to the isolation duct one by one, which is arranged in a ring shape on the top of the upper baffle, and the top of the isolation duct is connected to the detection end of the corresponding rate sensor;

[0010] An evaporation assembly for supplying air to the nozzle is provided at the bottom of the lower baffle;

[0011] The evaporated substrate assembly is arranged on the top of the upper top plate and is located above the evaporation channel.

[0012] In some optional embodiments, the evaporation component includes a mounting flange, and the bottom of the lower baffle is provided with a mounting flange. An evaporator corresponding to the nozzle is provided on the mounting flange and is arranged in a ring shape at the bottom of the lower baffle. The top of the evaporator is connected to the bottom of the corresponding nozzle.

[0013] In some optional embodiments, the evaporated substrate assembly includes a support plate, a substrate hanger is arranged on the top of the support plate, a placement hole for placing the substrate is arranged in the middle of the substrate hanger, and the placement hole is located above the evaporation channel.

[0014] In some optional embodiments, an obtuse angle formed between the central axis of the isolation conduit and the plate surface of the upper baffle is 104.5°.

[0015] In some optional embodiments, the central axis of the isolation conduit is aligned with the corresponding nozzle.

[0016] From the above description, it can be seen that the beneficial effects of the multi-rate monitoring device for multi-source co-evaporation process provided by the utility model are:

[0017] 1. Since the isolation duct and the nozzle are arranged at an angle, the flow trajectory of part of the high-speed gas ejected by the nozzle will be parallel to the axis of the corresponding isolation duct. This part of the gas will pass through the corresponding isolation duct directly to the receiving surface of the corresponding rate sensor, thereby detecting the rate of this nozzle. At the same time, the umbrella-shaped high-speed airflow ejected by this nozzle cannot be parallel to the axis of the adjacent isolation duct, so it cannot directly reach the adjacent sensor detection surface, avoiding interference with the measurement results of the adjacent sensors, thereby improving the measurement accuracy. Moreover, since the isolation duct and the nozzle are arranged at an angle, the isolation duct will not block the steam flow from the evaporation working surface of the steamed substrate assembly.

[0018] 2. The ring-shaped nozzles are provided with corresponding ring-shaped isolation conduits and rate sensors, so that one-to-one detection can be performed on multiple nozzles. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] In order to more clearly illustrate one or more embodiments of the present specification or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only one or more embodiments of the present specification. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0020] Figure 1This is a schematic diagram of the structure of the utility model from the first perspective;

[0021] Figure 2 This is a schematic diagram of the main plane structure of the utility model;

[0022] Figure 3 This is a schematic diagram of the structure of the utility model from a second viewing angle;

[0023] Figure 4 This is a schematic diagram of the split structure of the utility model;

[0024] Figure 5 It is a schematic diagram of the top structure of the upper baffle of the utility model.

[0025] The markings in the figure are:

[0026] 1. Lower baffle; 2. Upper baffle; 3. Mounting flange; 4. Evaporator; 5. Nozzle; 6. Isolation duct; 7. Rate sensor; 8. Evaporation channel; 9. Support plate; 10. Substrate rack. DETAILED DESCRIPTION

[0027] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0028] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the embodiments of the utility model should be the common meanings understood by people with ordinary skills in the field to which the disclosure belongs. The "first", "second" and similar words used in the present disclosure do not represent any order, quantity or importance, but are only used to distinguish different components. "Including" or "comprising" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0029] See also Figures 1 to 5 As an embodiment of the utility model, a multi-rate monitoring device for a multi-source co-evaporation process includes a lower baffle plate 1, an upper baffle plate 2 is arranged on the top of the lower baffle plate 1, and an evaporation channel 8 is opened in the center of the upper baffle plate 2, and also includes:

[0030] At least two groups of nozzles 5 are arranged in a ring shape on the top of the lower baffle 1;

[0031] The isolation conduits 6 corresponding to the nozzles 5 are arranged in a ring shape at the bottom of the lower baffle 1. The isolation conduits 6 are arranged obliquely on the top of the corresponding nozzles 5. The obtuse angle formed between the central axis of the isolation conduits 6 and the plate surface of the upper baffle 2 is 104.5°. The central axis of the isolation conduits 6 is aligned with the corresponding nozzles 5.

[0032] The top of the upper baffle plate 2 is provided with a rate sensor 7 corresponding to the isolation conduit 6 one by one, which is arranged in a ring shape on the top of the upper baffle plate 2, and the top of the isolation conduit 6 is connected to the detection end of the corresponding rate sensor 7;

[0033] The bottom of the lower baffle 1 is provided with an evaporation assembly for supplying air to the nozzle 5;

[0034] The evaporated substrate assembly is arranged on the top of the upper top plate and is located above the evaporation channel 8;

[0035] In this embodiment, a corresponding annularly arranged isolation conduit 6 and a rate sensor 7 are provided for the annularly arranged nozzles 5, so that a one-to-one detection can be performed on the multiple nozzles 5. The evaporation component supplies different spraying vapors to the multiple groups of nozzles 5 respectively, and the multiple groups of nozzles 5 spray different spraying vapors upward in an umbrella shape at high speed, so as to perform a process of evaporating and coating the evaporated substrate component.

[0036] Since the isolation duct 6 and the nozzle 5 are arranged at an angle, when the nozzle 5 sprays the evaporation vapor upward at a high speed in an umbrella shape, the flow trajectory of part of the high-speed gas sprayed by the nozzle 5 will be parallel to the axis of the corresponding isolation duct 6. This part of the gas will pass through the corresponding isolation duct 6 directly to the receiving surface of the corresponding rate sensor 7, so as to detect the velocity of this nozzle 5. At the same time, the umbrella-shaped high-speed airflow sprayed by this nozzle 5 cannot be parallel to the axis of the adjacent isolation duct 6, and therefore cannot directly reach the adjacent sensor detection surface, thereby avoiding interference with the measurement results of the adjacent sensors and improving the measurement accuracy. Moreover, since the isolation duct 6 and the nozzle 5 are arranged at an angle, the isolation duct 6 will not block the steam flow from the evaporation working surface of the evaporated substrate assembly.

[0037] See also Figures 1 to 5 Optionally, the evaporation assembly includes a mounting flange 3, the bottom of the lower baffle 1 is provided with a mounting flange 3, the mounting flange 3 is provided with an evaporator 4 corresponding to the nozzle 5 one by one, and is annularly arranged at the bottom of the lower baffle 1, and the top of the evaporator 4 is connected to the bottom of the corresponding nozzle 5;

[0038] The bottom of the evaporator 4 is connected to an external gas supply source, and the gas supply source delivers the gas under high pressure into the evaporator 4 and then delivers the gas to the nozzle 5 through the evaporator 4 under high pressure.

[0039] See also Figures 1 to 5Optionally, the vaporized substrate assembly includes a support plate 9, a substrate rack 10 is provided on the top of the support plate 9, a placement hole for placing the substrate is provided in the middle of the substrate rack 10, and the placement hole is located above the vapor deposition channel 8;

[0040] The substrate is fixedly placed in the placement hole, and the evaporation gas sprayed from the nozzle 5 passes through the evaporation channel 8 to coat the bottom surface of the substrate.

[0041] Those skilled in the art should understand that the discussion of any of the above embodiments is merely illustrative and is not intended to imply that the scope of the present disclosure (including the claims) is limited to these examples. Under the concept of the present invention, the technical features in the above embodiments or different embodiments may be combined, the steps may be implemented in any order, and there are many other variations of the different aspects of the present invention as described above, which are not provided in detail for the sake of simplicity.

[0042] The embodiments of the present invention are intended to cover all such substitutions, modifications and variations that fall within the broad scope of the appended claims. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A multi-rate monitoring device for a multi-source co-evaporation process, comprising a lower baffle (1), an upper baffle (2) is arranged on the top of the lower baffle (1), and an evaporation channel (8) is opened in the center of the upper baffle (2), characterized in that: Also includes: At least two groups of nozzles (5) are arranged in a ring shape on the top of the lower baffle (1); An isolation conduit (6) corresponding to each of the nozzles (5) is arranged in a ring shape at the bottom of the lower baffle (1), and the isolation conduit (6) is arranged obliquely at the top of the corresponding nozzle (5); A rate sensor (7) corresponding to each of the isolation ducts (6) is arranged at the top of the upper baffle (2) in a ring shape, and the top of the isolation duct (6) is connected to a detection end of the corresponding rate sensor (7); An evaporation component for supplying air to the nozzle (5) is provided at the bottom of the lower baffle (1); The evaporated substrate assembly is arranged on the top of the upper top plate and is located above the evaporation channel (8).

2. The multi-rate monitoring device for a multi-source co-evaporation process according to claim 1, characterized in that: The evaporation component comprises a mounting flange (3), the bottom of the lower baffle (1) is provided with a mounting flange (3), an evaporator (4) corresponding to the nozzle (5) is arranged on the mounting flange (3), and is arranged in a ring shape at the bottom of the lower baffle (1), and the top of the evaporator (4) is connected to the bottom of the corresponding nozzle (5).

3. The multi-rate monitoring device for a multi-source co-evaporation process according to claim 1, characterized in that: The evaporated substrate assembly comprises a support plate (9), a substrate hanger (10) is arranged on the top of the support plate (9), a placement hole for placing the substrate is arranged in the middle of the substrate hanger (10), and the placement hole is located above the evaporation channel (8).

4. The multi-rate monitoring device for a multi-source co-evaporation process according to claim 1, characterized in that: The obtuse angle formed between the central axis of the isolation duct (6) and the plate surface of the upper baffle (2) is 104.5°.

5. The multi-rate monitoring device for a multi-source co-evaporation process according to claim 1, characterized in that: The central axis of the isolation conduit (6) is aligned with the corresponding nozzle (5).

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