Cleaning frame for cleaning polycrystalline silicon ring

Abstract

The utility model relates to the technical field of polycrystalline silicon cleaning, in particular to a cleaning frame for cleaning a polycrystalline silicon ring, which comprises two vertically arranged side support plates, two ends of the lower portions of the two side support plates are respectively and fixedly connected through a transversely arranged cross arm, a plurality of tool substrates are transversely arranged above the cross arm, and the tool substrates are fixedly connected with the side support plates. The multiple tool base plates are arranged at equal intervals and are fixedly connected with the side supporting plates correspondingly, circular grooves penetrating through the tool base plates are formed in the middles of the tool base plates, multiple supporting blocks fixedly installed on the upper end faces of the tool base plates are arranged at the edges of the circular grooves, and the multiple supporting blocks are arranged at equal interval angles; according to the utility model, impurities on the surface of the polycrystalline silicon ring can be efficiently removed, the product quality and performance are improved, and the production cost is reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of polysilicon cleaning, in particular to a cleaning frame for cleaning a polysilicon ring. Background Art

[0002] During the whole process of polysilicon ring processing, dewaxing is required. Since dewaxing cannot completely remove the sticky wax on the surface of the workpiece, a high-temperature degreasing and cleaning step is added. A tooling is needed to fix the product when cleaning the product. At the same time, it prevents the workpiece from being damaged when it collides with the cleaning tank during the cleaning process, and plays a role in fixing and protecting the product. Polysilicon is an important material in semiconductor manufacturing, and its surface cleanliness has an important influence on the performance of the product. Traditional cleaning methods often make it difficult to completely remove impurities on the surface of polysilicon, resulting in a decrease in product performance. This makes the development of an efficient and reliable cleaning frame an urgent need in the current semiconductor manufacturing field. To this end, we propose a cleaning frame for cleaning polysilicon rings. Utility Model Content

[0003] The utility model provides a cleaning frame for cleaning a polysilicon ring, which solves the above-mentioned technical problems.

[0004] The utility model solves the above-mentioned technical problems with the following solution: a cleaning frame for cleaning a polysilicon ring, comprising two vertically arranged side support plates, the lower ends of the two side support plates are respectively fixedly connected by horizontally arranged cross braces, a plurality of tooling substrates are horizontally arranged above the cross braces, the plurality of tooling substrates are arranged at equal intervals, and the plurality of tooling substrates are respectively fixedly connected to the side support plates, a circular groove penetrating the tooling substrate is opened in the middle of the tooling substrate, a plurality of support blocks fixedly installed on the upper end face of the tooling substrate are arranged at the edge of the circular groove, the plurality of support blocks are arranged at equal intervals, a plurality of vertically arranged fixing bolts are threaded through the upper end face of the tooling substrate, and the plurality of fixing bolts are arranged at equal intervals and distributed around the circular groove.

[0005] Preferably, the upper end surface of the support block is inclined.

[0006] Preferably, the lower end surface of the upper portion of the fixing bolt is inclined.

[0007] Preferably, the outer side wall of the side support plate is provided with a plurality of hollow portions.

[0008] The beneficial effects of the utility model are:

[0009] The cleaning frame of the utility model is reasonably designed and easy to use. It is suitable for cleaning various types of polysilicon rings. Through special materials and structural design, the cleaning efficiency and cleaning effect are improved, and the production cost and environmental pollution are significantly reduced. In addition, the cleaning frame of the utility model has a simple structure, is easy to maintain, has a long service life, and has broad application prospects and market prospects.

[0010] The above description is only an overview of the technical solution of the utility model. In order to more clearly understand the technical means of the utility model and implement it according to the contents of the specification, the following is a detailed description of the preferred embodiment of the utility model with the accompanying drawings. The specific implementation method of the utility model is given in detail by the following embodiments and their drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] The drawings described herein are used to provide a further understanding of the present invention and constitute a part of the present application. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation on the present invention. In the drawings:

[0012] Figure 1 The utility model provides a structural schematic diagram of a cleaning frame for cleaning a polysilicon ring;

[0013] Figure 2 The utility model provides a schematic diagram of a tooling substrate structure of a cleaning frame for cleaning a polysilicon ring;

[0014] Figure 3 The utility model proposes a cleaning frame for cleaning polysilicon rings. Figure 2 Enlarged view of point A in the middle.

[0015] Legend:

[0016] 1. Side support plate; 2. Cross brace; 3. Tooling base plate; 4. Support block; 5. Fixing bolts. DETAILED DESCRIPTION

[0017] The following is combined with Figure 1-3 The principles and features of the present invention are described, and the examples given are only used to explain the present invention, and are not used to limit the scope of the present invention. The present invention is described in more detail in the following paragraphs by way of example with reference to the accompanying drawings. The advantages and features of the present invention will become clearer according to the following description and claims. It should be noted that the drawings are all in a very simplified form and are not in precise proportions, and are only used to conveniently and clearly assist in explaining the purpose of the embodiments of the present invention.

[0018] like Figure 1-3As shown, the utility model is a cleaning frame for cleaning polysilicon rings, comprising two vertically arranged side support plates 1, the two lower ends of the two side support plates 1 are fixedly connected by horizontally arranged cross braces 2, the support plates 1, the cross braces 2 and the tooling substrate 3 are made of corrosion-resistant and high-temperature resistant materials, and have good rigidity and stability. A plurality of tooling substrates 3 are horizontally arranged above the cross braces 2, and there are two tooling substrates 3 in the figure, but the number of tooling substrates 3 is not limited to two, and the plurality of tooling substrates 3 are arranged at equal intervals, and the plurality of tooling substrates 3 are respectively fixedly connected to the side support plates 1, a circular groove penetrating the tooling substrate 3 is opened in the middle of the tooling substrate 3, and a plurality of support blocks 4 fixedly installed on the upper end surface of the tooling substrate 3 are arranged at equal intervals on the edge of the circular groove, and the plurality of support blocks 4 are arranged at equal intervals. The upper end surface of the tooling substrate 3 is threaded with a plurality of vertically arranged fixing bolts 5, and the plurality of fixing bolts 5 are arranged at equal intervals and distributed around the circular groove. The device adopts special materials and structural design, can effectively remove impurities on the surface of polysilicon products, improve product quality and performance, and reduce production costs.

[0019] Specifically, the upper end surface of the support block 4 is tilted, and the upper lower end surface of the fixing bolt 5 is tilted, so as to reduce the contact area between the support block 4, the fixing bolt 5 and the polysilicon ring, so as to make the cleaning more thorough.

[0020] More specifically, the outer side wall of the side support plate 1 is provided with a plurality of hollow portions, and providing a plurality of hollow portions can reduce the use of materials and reduce material costs, while making the device lighter and more convenient to carry.

[0021] Working principle:

[0022] When in use, place the polysilicon ring product on the supporting block 4 of the tooling substrate 3, and then use the fixing bolts 5 to fix the product on the tooling substrate 3. The tooling substrate 3 and the fixing bolts 5 are designed with inclined surfaces to reduce the contact area between the product and the workpiece, so that the product can be cleaned more thoroughly. Two products can be placed at a time. During cleaning, the surface of the polysilicon ring is cleaned by ultrasonic, bubbling, water circulation, etc. to remove impurities on the surface.

[0023] The above are only preferred embodiments of the present invention and are not intended to limit the present invention in any form. Any ordinary technician in the industry can smoothly implement the present invention as shown in the drawings and described above. However, any equivalent changes, modifications and evolutions made by technicians familiar with the profession without departing from the scope of the technical solution of the present invention using the technical content disclosed above are all equivalent embodiments of the present invention. At the same time, any equivalent changes, modifications and evolutions made to the above embodiments based on the essential technology of the present invention are still within the protection scope of the technical solution of the present invention.

Claims

1. A cleaning frame for cleaning a polysilicon ring, comprising two vertically arranged side support plates (1), characterized in that: The two ends of the lower parts of the two side support plates (1) are respectively fixedly connected by transversely arranged cross braces (2); a plurality of tooling base plates (3) are transversely arranged above the cross braces (2); the plurality of tooling base plates (3) are arranged at equal intervals; the plurality of tooling base plates (3) are respectively fixedly connected to the side support plates (1); a circular groove penetrating the tooling base plate (3) is provided in the middle of the tooling base plate (3); a plurality of support blocks (4) fixedly mounted on the upper end surface of the tooling base plate (3) are arranged at equal intervals on the edge of the circular groove; the plurality of support blocks (4) are arranged at equal angles; a plurality of vertically arranged fixing bolts (5) are threadedly penetrated through the upper end surface of the tooling base plate (3); the plurality of fixing bolts (5) are arranged at equal intervals and distributed around the circular groove.

2. A cleaning frame for cleaning a polysilicon ring according to claim 1, characterized in that: The upper end surface of the support block (4) is arranged inclined.

3. A cleaning frame for cleaning a polysilicon ring according to claim 1, characterized in that: The lower end surface of the upper part of the fixing bolt (5) is arranged inclined.

4. A cleaning frame for cleaning a polysilicon ring according to claim 1, characterized in that: The outer side wall of the side support plate (1) is provided with a plurality of hollow portions.

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