Dispersion system and coating equipment

Abstract

The utility model relates to the technical field of photovoltaics, in particular to a dispersion system and coating equipment, and solves the problem of poor supply uniformity of special gas in related technologies. The dispersion system comprises a plurality of flow equalizing plates and a pipeline assembly. Each flow equalizing assembly comprises a plurality of flow equalizing plates, the flow equalizing plates are of a symmetrical structure, air is supplied through the symmetrically-arranged branch pipe sections, the structures of the flow equalizing plates are simplified through the structures of the pipelines, the spraying uniformity of the pipelines is improved through the flow equalizing plates, the advantages of two spraying modes are combined, and the spraying efficiency is improved. The device has the advantages of simpler structure and better uniformity.

Description

Technical Field

[0001] The present disclosure relates to the field of photovoltaic technology, and in particular to a diffusion system and a coating device. Background Art

[0002] In the photovoltaic cell manufacturing industry, it is a common process to introduce special gases (special gases) for reaction. Traditional equipment uses the upper air intake method, and the gas enters the vacuum chamber through a spray pipe or a flow plate. However, the reaction effect will be affected by the uneven distribution of gas. Taking the silicon wafer coating process as an example, the coating is thicker near the air inlet and thinner away from the air inlet, which affects the performance of the product.

[0003] Therefore, improving the uniformity of gas diffusion in the specialty gas path has become an issue that needs to be urgently addressed. Utility Model Content

[0004] In view of this, the embodiments of the present disclosure provide a dispersion system and a coating device, which solve the problem of poor uniformity of special gas supply in the related art.

[0005] In the first aspect, an embodiment of the present disclosure provides a dispersion system, which is applied to a coating device, and the dispersion system includes: at least one flow uniformity component, and the flow uniformity component includes: a plurality of flow uniformity plates, which are laid on the same plane and arranged symmetrically with respect to a symmetry plane, and each of the flow uniformity plates has an air inlet and a plurality of air outlets; a pipeline component, including a main pipeline and a plurality of branch pipe sections, the plurality of branch pipe sections are arranged symmetrically with respect to the symmetry plane, and are arranged one-to-one with the plurality of flow uniformity plates, and the plurality of branch pipe sections are connected one-to-one with the air inlets of the plurality of flow uniformity plates, and the first end of the main pipeline is located on the symmetry plane and is connected with each of the branch pipe sections, and the second end of the main pipeline is used to connect to a gas source.

[0006] In some embodiments, in each of the flow-uniforming components, the plurality of branch pipe segments located on the same side of the symmetry plane are arranged along a first direction and connected in sequence, and the branch pipe segment close to the symmetry plane is connected to the first end of the main pipeline; wherein the first direction is perpendicular to the symmetry plane.

[0007] In some embodiments, in each of the flow equalizing components, a plurality of the flow equalizing plates are centrally symmetrically arranged, one end of each of the branch pipe segments is connected to the second end of the main pipeline, and the other end of each of the branch pipe segments is connected to the air inlet hole of the corresponding flow equalizing plate, wherein the length of each of the branch pipe segments is equal.

[0008] In some embodiments, the number of branch pipe segments in each of the flow-uniforming components is four, and the four branch pipe segments extend along the second direction, the third direction, the fourth direction and the fifth direction, respectively; wherein the second direction is opposite to the third direction, the fourth direction is opposite to the fifth direction, the fourth direction and the fifth direction intersect with the second direction and the third direction, and the angle between the second direction and the symmetry plane is equal to the angle between the fourth direction and the symmetry plane.

[0009] In some embodiments, the diffusion system also includes: a converging pipe; there are multiple flow equalizing components, the flow equalizing plates of the multiple flow equalizing components are laid on the same plane, and the main pipes of the multiple flow equalizing components are respectively connected to the converging pipe and connected to the gas source through the converging pipe.

[0010] In some embodiments, it also includes: a plurality of control valves, which are disposed in the main pipeline of the plurality of flow-uniform components, and the control valves are configured to control the flow of the corresponding main pipeline.

[0011] In some embodiments, it also includes: a flow meter component, which is arranged on the pipeline component, and the flow meter component is configured to collect flow information of the pipeline component.

[0012] In some embodiments, the flow meter assembly includes: a first flow meter, disposed in the confluence pipe, and the first flow meter is configured to collect flow information of the confluence pipe.

[0013] In some embodiments, the flow meter assembly includes: a plurality of second flow meters disposed in a plurality of the main pipelines, and the second flow meters are configured to collect flow information of the corresponding main pipelines.

[0014] In a second aspect, an embodiment of the present disclosure provides a coating device, comprising: a process chamber; a carrier plate located in the process chamber; a dispersion system as described in the first aspect, wherein a flow plate of the dispersion system is located in the process chamber and is arranged relative to the carrier plate.

[0015] The embodiments of the present disclosure provide a dispersion system and coating equipment, each flow equalizing component includes multiple flow equalizing plates, and the multiple flow equalizing plates adopt a symmetrical structure. Gas is supplied separately through symmetrically arranged branch pipe sections. The structure of the pipeline is used to simplify the structure of the flow equalizing plate, and the flow equalizing plate is used to improve the uniformity of pipeline spraying, thereby combining the advantages of two spraying methods, and having the advantages of simpler structure and better uniformity. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 Shown is a schematic structural diagram of a diffusion system provided by an embodiment of the present disclosure;

[0017] Figure 2 Shown is a structural schematic diagram of a dispersion system provided by another embodiment of the present disclosure;

[0018] Figure 3 Shown is a structural schematic diagram of a dispersion system provided by another embodiment of the present disclosure;

[0019] Figure 4 Shown is a structural schematic diagram of a dispersion system provided by another embodiment of the present disclosure;

[0020] Figure 5 Shown is a schematic diagram of the structure of a flow equalizing plate in a dispersion system provided in an embodiment of the present disclosure.

[0021] Reference numerals:

[0022] 100, flow equalizing plate; 101, air outlet; 102, air inlet; 103, air cavity; 200, confluence pipe; 300, main pipe; 301, branch pipe section; 400, control valve; 501, first flow meter; 502, second flow meter; 600, fixing part; A, flow equalizing assembly; L, symmetry plane; X, first direction; Y, second direction; Z, third direction; M, fourth direction; N, fifth direction. DETAILED DESCRIPTION

[0023] The following will be combined with the drawings in the embodiments of the present disclosure to clearly and completely describe the technical solutions in the embodiments of the present disclosure. Obviously, the described embodiments are only part of the embodiments of the present disclosure, not all of the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0024] Introducing special gases (special gases) for reaction is a common process in many processing and manufacturing industries. Different production processes have their own specific requirements for parameters such as the special gas intake route.

[0025] In the gas path design of existing equipment, special gases usually enter from the top, are transmitted through the special gas inlet pipe, and then enter the vacuum chamber through the spray pipe or the outlet in the flow equalizer, and are finally pumped out by the vacuum pump. However, since the silicon wafer carrier is an integral structure, most of the special gases will flow from the outside of the carrier along the back to the vacuum pump, resulting in a lower proportion of special gases flowing along the silicon wafer surface. This causes the silicon wafer coating thickness to be thicker on the silicon wafer close to the special gas pipe, and thinner on the silicon wafer away from the special gas pipe, resulting in significant differences in coating uniformity. At the same time, when the special gas is supplied from one end, the amount of special gas is less as it is transmitted along the spray pipe, which further exacerbates the difference in silicon wafer coating thickness.

[0026] The above two problems seriously affect the coating effect of silicon wafers, and thus affect the performance of silicon wafers. Studies have shown that improving the diffusion of gases in the special gas path can effectively alleviate or even solve these problems. However, how to achieve uniform diffusion of gases has become a key issue that needs to be solved at present.

[0027] There are some methods for solving the above problems in the related art. For example, by dividing the gas intake into different regions, different gas partitions are set on the main body of the equalizing plate, and an independent gas inlet is set for each partition, so as to achieve independent and uniform reaction of different gases. In addition, there are also three-dimensional partitions, plane partitions or a combination of the two to isolate different gas paths to meet the distribution requirements of various gases, so that the gas can be evenly and quickly diffused into the chamber and deposited on the substrate. In addition, there is also technology that forms a gas diffusion channel through the main air inlet pipe, the central pipe and the compensation air inlet pipe, and uses multiple air inlet pipes of different sizes, hole spacings and apertures to control the gas flow and flow rate, thereby forming a stable gas model in the reaction chamber and improving the quality of the coating.

[0028] However, although these related technologies have improved the uniformity and diffusion of gases to a certain extent and can meet the process requirements of the past, they are either complex in structure, inconvenient to install and maintain, or do not take into account the flow direction and diffusion performance of the gas itself. With the promotion of new photovoltaic processes and the increase in demand for large production capacity, these technologies can no longer meet the requirements for improving the uniformity of special gases.

[0029] In response to the above problems, the embodiments of the present disclosure provide a dispersion system and a coating equipment, each uniform flow component A includes multiple uniform flow plates, and the multiple uniform flow plates adopt a symmetrical structure. Gas is supplied separately through symmetrically arranged branch pipe sections. The structure of the pipeline is used to simplify the structure of the uniform flow plate, and the uniform flow plate is used to improve the uniformity of pipeline spraying, thereby combining the advantages of the two spraying methods, and having the advantages of simpler structure and better uniformity.

[0030] The diffusion system of the embodiment of the present disclosure is applied to a coating device, which includes a carrier plate for supporting products (such as silicon wafers). The diffusion system of the embodiment of the present disclosure can evenly supply gas to the products on the carrier plate, thereby improving product quality.

[0031] Combine the following Figures 1 to 4 A diffusion system according to an embodiment of the present disclosure is described.

[0032] In one embodiment, the dispersion system includes at least one flow equalizing component A, and the flow equalizing component A includes a plurality of flow equalizing plates 100 and a pipeline component. The plurality of flow equalizing plates 100 are laid on the same plane and are arranged symmetrically relative to a symmetry plane L, and each flow equalizing plate 100 has an air inlet 102 and a plurality of air outlets 101. In the same flow equalizing plate 100, the plurality of air outlets 101 are respectively connected to the air inlet 102. The pipeline component includes a main pipeline 300 and a plurality of branch pipe sections 301, the plurality of branch pipe sections 301 are arranged symmetrically relative to the symmetry plane L, and are arranged one-to-one with the plurality of flow equalizing plates 100, the plurality of branch pipe sections 301 are connected one-to-one with the air inlet holes 102 of the plurality of flow equalizing plates 100, the first end of the main pipeline 300 is located on the symmetry plane L, and is connected to each branch pipe section 301, and the second end of the main pipeline 300 is used to connect to the gas source.

[0033] In an alternative approach, Figure 1 and Figure 2 As shown in FIG, the location where the flow equalizing component A is located is divided into 6 areas of equal size. The 6 areas are arranged in sequence along the same direction, and a flow equalizing plate 100 is arranged in each area.

[0034] In another alternative, if Figure 3 and Figure 4 As shown in FIG. 1 , the location of the flow equalizing component A is divided into four areas of equal size. The four areas are arranged in a square shape, and one flow equalizing plate 100 is arranged in each area.

[0035] Optionally, to avoid uneven air supply at the joints between adjacent equalizing plates 100, adjacent equalizing plates 100 may be spliced ​​together. Further, to avoid uneven air supply due to different distances from multiple equalizing plates 100 to the carrier, in this embodiment, the distances from multiple equalizing plates 100 to the carrier are preferably equal, that is, multiple equalizing plates 100 are laid along a plane parallel to the carrier.

[0036] In one embodiment, if Figure 5 As shown, the flow equalizing plate 100 has an air cavity 103 and an air inlet 102 and a plurality of air outlets 101 respectively connected to the air cavity 103. After the gas enters the air cavity 103 of the flow equalizing plate 100 through the air inlet 102, it can be dispersed to the positions of the plurality of air outlets 101 and discharged through the plurality of air outlets 101. The plurality of air outlets 101 are arranged at equal intervals to achieve uniform air supply. It is worth noting that Figure 5 The dashed lines represent internal lines. Figure 5The form in which the middle air inlet 102 is located on the upper side of the equalizing plate 100 and the plurality of air outlets 101 are located on the lower side of the equalizing plate 100 does not specifically mean that the air inlet 102 is upward and the air outlet 101 is downward, but is just convenient for showing that the air inlet 102 and the air outlet 101 are located on different side walls of the equalizing plate 100, and the orientation of the air inlet 102 and the air outlet 101 can be flexibly selected according to the use requirements. Optionally, the air inlet 102 is located at the center line of the equalizing plate 100.

[0037] In another embodiment, in the same flow equalizing plate 100 , a plurality of air outlet holes 101 are connected to the air inlet holes 102 through a plurality of flow channels.

[0038] In one embodiment, first, compared with the spraying form of bearing through a single large equalizing plate 100 in the related art, the spraying range of each equalizing plate 100 in the multiple equalizing plates 100 of this embodiment is smaller, so the outlet flow of different outlet holes 101 on the equalizing plate 100 is relatively less affected by the difference in distance from the air inlet hole 102, which can improve the uniformity of spraying. In addition, there is no need to set a complex partition structure for the equalizing plate 100, which can reduce the complexity of the structure and facilitate local repair or replacement when a fault occurs in a part of the area.

[0039] Secondly, since the gas in the main pipeline 300 is divided by multiple branch pipe sections 301 before entering the flow equalizing plate 100, the dispersion system of this embodiment also has the flow equalizing effect of the jet pipe in the related art, and the multiple branch pipe sections 301 are symmetrically arranged, which is conducive to improving the uniformity of gas supply to the flow equalizing plate 100 on both sides of the symmetry plane L. The dual flow equalizing effect of the branch pipe sections 301 and the multiple flow equalizing plates 100 can further improve the uniformity.

[0040] In some embodiments, the diffusion system also includes a confluence pipe 200; there are multiple flow equalizer components A, and the flow equalizing plates 100 of the multiple flow equalizer components A are laid on the same plane. The main pipes 300 of the multiple flow equalizer components A are respectively connected to the confluence pipe 200 and connected to the gas source through the confluence pipe 200.

[0041] Two optional forms of the branch pipe segment 301 are described below as examples.

[0042] Combination Figure 1 and Figure 2 In an optional form, in each uniform flow component A, multiple branch pipe segments 301 located on the same side of the symmetry plane L are arranged along a first direction X and connected in sequence, and the branch pipe segment 301 close to the symmetry plane L is connected to the first end of the main pipeline 300; wherein the first direction X is perpendicular to the symmetry plane L.

[0043] Specifically, multiple equalizing plates 100 in the same equalizing flow component A are arranged in sequence along the first direction X. Each equalizing flow plate 100 is correspondingly provided with a branch pipe segment 301 extending along the first direction X. The branch pipe segment 301 is provided with an air supply port at the position of the air inlet hole 102 of the corresponding equalizing flow plate 100, and is connected to the adjacent branch pipe segment 301, and the branch pipe segment 301 close to the symmetry plane L is connected to the main pipeline 300. For example, each column has 6 equalizing flow plates 100 that are symmetrical about the symmetry plane L and arranged in sequence along the first direction X, and each equalizing flow component A is provided with 6 branch pipe segments 301 that are symmetrical about the symmetry plane L and extend along the first direction X, and the air inlet holes 102 of the 6 equalizing flow plates 100 are respectively connected to the 6 branch pipe segments 301 one by one.

[0044] Optionally, the main pipeline 300 is an L-shaped structure, one of the two mutually perpendicular sections of the main pipeline 300 is arranged along the first direction X, and the other section is arranged along the perpendicular direction of the first direction X, and the two mutually perpendicular sections of the branch pipe section 301 are both arranged along the seams of adjacent flow equalizing plates 100.

[0045] Optionally, the current equalizing plates 100 are arranged in 6 columns, and 6 current equalizing components A are correspondingly arranged, and the 6 current equalizing components A are arranged in a direction perpendicular to the first direction X.

[0046] Combination Figure 3 and Figure 4 In another optional form, in each flow equalizing component A, multiple flow equalizing plates 100 are arranged symmetrically in the center, one end of each branch pipe segment 301 is connected to the second end of the main pipeline 300, and the other end of each branch pipe segment 301 is connected to the air inlet 102 of the corresponding flow equalizing plate 100, wherein the length of each branch pipe segment 301 is equal.

[0047] Therefore, the distances from the second end of the main pipeline 300 to the air inlet holes 102 of each flow equalizing plate 100 are equal, so that air can be supplied to each flow equalizing plate 100 more evenly.

[0048] Optionally, the number of branch pipe segments 301 in each uniform flow component A is four, one end of each of the four branch pipe segments 301 is connected to the second end of the main pipeline 300, and the four branch pipe segments 301 extend along the second direction Y, the third direction Z, the fourth direction M and the fifth direction N, respectively; wherein, the second direction Y is opposite to the third direction Z, the fourth direction M is opposite to the fifth direction N, the fourth direction M and the fifth direction N intersect with the second direction Y and the third direction Z, the angle between the second direction Y and the symmetry plane L is equal to the angle between the fourth direction M and the symmetry plane L, and the angle between the third direction Z and the symmetry plane L is equal to the angle between the fifth direction N and the symmetry plane L.

[0049] The portions where the four branch pipe sections 301 are connected to the second end of the main pipeline 300 are located on the symmetrical center lines of the four adjacent equalizing plates 100, the second direction Y, the third direction Z, the fourth direction M and the fifth direction N are respectively the diagonal directions of the four adjacent equalizing plates 100, and the four branch pipe sections 301 are arranged along the diagonal lines of the corresponding equalizing plates 100. The lengths of the four branch pipe sections 301 are equal, so that the gas received by the four adjacent equalizing plates 100 is more uniform.

[0050] Optionally, the main pipeline 300 may include two structures, a straight pipe and an L-shaped pipe, wherein the main pipeline 300 corresponding to the two rows of flow equalizing plates 100 close to the converging pipe 200 is a straight pipe structure, and the straight pipe structure is arranged along the joint between two adjacent columns of flow equalizing plates 100, and the main pipeline 300 corresponding to the remaining flow equalizing plates 100 is an L-shaped pipe structure, and the two perpendicular sections of the L-shaped pipe structure are respectively parallel to the transverse joint and the longitudinal joint between the flow equalizing plates 100.

[0051] For example Figure 3 and Figure 4 As shown in the figure, the number of flow equalizing plates 100 is 36, and each 4 flow equalizing plates 100 form a group, which are divided into 9 groups arranged in 3 rows and 3 columns. Each group of flow equalizing plates 100 is connected to a corresponding flow equalizing component A. Among them, the main pipeline 300 corresponding to the 3 groups of flow equalizing plates 100 close to the converging pipe 200 adopts a straight pipe structure, and the main pipeline 300 corresponding to the remaining 6 groups of main pipelines 300 is an L-shaped pipe structure.

[0052] In this embodiment, the cross-arrangement of the multiple branch pipe sections 301 of the second branch pipe 302 can make the gas supply of each main pipeline 300 uniform, and is beneficial to shorten the overall length of the pipeline and reduce the energy loss of the gas flow in the pipeline.

[0053] The branch pipe section 301 and the corresponding flow equalizing plate 100 can be directly connected by welding the edge of the air inlet hole 102 of the flow equalizing plate 100 and the outlet edge of the branch pipe section 301, or a connecting pipe can be added to indirectly connect the air inlet hole 102 and the branch pipe section 301 through the connecting pipe.

[0054] In some embodiments of the present disclosure, the dispersion system further includes a plurality of control valves 400, which are disposed in a plurality of main pipelines 300, and each main pipeline 300 is provided with at least one control valve 400. For example, when the number of main pipelines 300 is 9, 9 control valves 400 are correspondingly provided, and the 9 control valves 400 are respectively disposed on the corresponding main pipelines 300. The control valve 400 is configured to control the flow of the corresponding main pipeline 300. The control valve 400 may be a solenoid valve or a pneumatic valve, etc. Preferably, the control valve 400 is a pneumatic valve.

[0055] In this embodiment, the flow control of the corresponding main pipeline 300 is achieved respectively through multiple control valves 400, which is convenient for ensuring the uniformity of the air flow and avoiding the waste of air source. In addition, the air intake of each independent part can be adjusted according to the process results to meet the process requirements.

[0056] In some embodiments of the present disclosure, the dispersion system further includes a flow meter assembly, which is disposed on the pipeline assembly and configured to collect flow information of the pipeline assembly. The flow meter assembly collects flow information of the pipeline assembly, which can provide data support for flow control of the pipeline assembly, thereby achieving precise regulation.

[0057] Alternatively, if Figure 1 and Figure 3 As shown, the flow meter assembly includes a first flow meter 501, which is disposed in the confluence pipe 200 and is configured to collect flow information of the confluence pipe 200. The total flow can be monitored by the first flow meter 501, so as to realize overall control.

[0058] Alternatively, if Figure 2 and Figure 4 As shown, the flow meter assembly includes multiple second flow meters 502, which are disposed in multiple main pipelines 300, and the second flow meters 502 are configured to collect flow information of the corresponding main pipelines 300. The flow information of the corresponding main pipelines 300 can be monitored by the first flow meter 501, so as to facilitate flow control of each main pipeline 300.

[0059] In this embodiment, the flow meter assembly may include any one of the first flow meter 501 and the second flow meter 502 or a combination of the two.

[0060] In some embodiments, the diffusion system further comprises a control device, which is respectively connected to the flow meter assembly and the control valve 400 by signal, and is configured to control the opening of the control valve 400 according to the detection signal of the flow meter assembly. Thus, automatic control of the air supply flow rate can be achieved, and the flow regulation accuracy can be improved.

[0061] In some embodiments, the dispersion system further includes a fixing member 600, which is fixedly connected to the confluence pipe 200, the plurality of control valves 400, and the flow meter assembly, respectively. The fixing member 600 may be a plate-shaped or box-shaped structure, and the fixing member 600 is fixedly connected to the confluence pipe 200, the plurality of control valves 400, and the flow meter assembly, for example, by means of a clamping connection. The confluence pipe 200, the control valve 400, and the flow meter assembly can be integrated together by the fixing member 600, so that the overall structure is simple and convenient for installation, operation, and maintenance.

[0062] The embodiment of the present disclosure also provides a coating device, including a process chamber, a carrier plate and the above-mentioned dispersion system. The carrier plate is located in the process chamber, and the flow equalizing plate 100 of the dispersion system is located in the process chamber and is arranged relative to the carrier plate. Through the pipeline and the flow equalizing plate 100, the required gas can be uniformly provided to the product on the carrier plate in the process chamber.

[0063] Optionally, the pipeline of the diffusion system is connected and matched with the peripheral wall of the process chamber. The pipeline and the process chamber can be connected and matched by the converging pipeline 200 in the pipeline and the peripheral wall of the process chamber, or by the branch pipe section 301 in the pipeline and the peripheral wall of the process chamber, which is not specifically limited here.

[0064] The phrases "one embodiment", "an embodiment", etc. mentioned in the specification indicate that the embodiment described may include a specific feature, structure or characteristic, but not every embodiment may include the specific feature, structure or characteristic. In addition, such phrases do not necessarily refer to the same embodiment. In addition, when a specific feature, structure or characteristic is described in conjunction with an embodiment, it is within the knowledge of those skilled in the art to implement such feature, structure or characteristic in conjunction with other embodiments, whether explicitly or not explicitly described.

[0065] It should be understood that “on,” “above,” and “over” in this disclosure should be interpreted in the broadest manner, so that “on” not only means “directly on something,” but also includes the meaning of “on something” with intervening features or layers therebetween, and “above” or “over” not only includes the meaning of “above” or “over,” but also may include the meaning of “above” or “over something” with no intervening features or layers therebetween (i.e., directly on something).

[0066] Additionally, spatially relative terms, such as "below," "below," "beneath," "above," "above," etc., may be used herein for ease of description to describe the relationship of one component or feature to other components or features as shown in the figures. The spatially relative terms are intended to encompass different orientations of the component in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations), and the spatially relative descriptors used herein may likewise be interpreted accordingly.

[0067] It should be noted that, in this article, the terms "include", "comprises" or any other variations thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, an element defined by the sentence "comprises a ..." does not exclude the existence of other identical elements in the process, method, article or device including the element.

[0068] The above description is only a preferred embodiment of the present disclosure and is not intended to limit the present disclosure. Any modifications, equivalent substitutions, etc. made within the spirit and principles of the present disclosure shall be included in the protection scope of the present disclosure.

Claims

1. A dispersion system, characterized in that: Applied to coating equipment, the dispersion system includes: At least one flow distribution component, the flow distribution component comprising: A plurality of flow equalizing plates are laid on the same plane and arranged symmetrically with respect to a symmetric plane, and each of the flow equalizing plates has an air inlet and a plurality of air outlets; A pipeline assembly includes a main pipeline and multiple branch pipe segments, wherein the multiple branch pipe segments are symmetrically arranged relative to the symmetry plane and are arranged one-to-one with the multiple flow equalizing plates, and the multiple branch pipe segments are connected to the air inlet holes of the multiple flow equalizing plates one-to-one. The first end of the main pipeline is located on the symmetry plane and is connected to each of the branch pipe segments, and the second end of the main pipeline is used to connect to the gas source.

2. The dispersion system according to claim 1, characterized in that: In each of the flow-uniform components, a plurality of branch pipe segments located on the same side of the symmetry plane are arranged along a first direction and connected in sequence, and the branch pipe segment close to the symmetry plane is connected to the first end of the main pipeline; Wherein, the first direction is perpendicular to the symmetry plane.

3. The dispersion system according to claim 1, characterized in that: In each of the flow equalizing components, a plurality of flow equalizing plates are centrally symmetrically arranged, one end of each branch pipe segment is connected to the second end of the main pipeline, and the other end of each branch pipe segment is connected to the air inlet hole of the corresponding flow equalizing plate, wherein the length of each branch pipe segment is equal.

4. The dispersion system according to claim 3, characterized in that: The number of the branch pipe segments in each of the flow-uniform components is four, and the four branch pipe segments extend along the second direction, the third direction, the fourth direction, and the fifth direction respectively; Among them, the second direction is opposite to the third direction, the fourth direction is opposite to the fifth direction, the fourth direction and the fifth direction intersect with the second direction and the third direction, and the angle between the second direction and the symmetry plane is equal to the angle between the fourth direction and the symmetry plane.

5. The dispersion system according to any one of claims 1 to 4, characterized in that: The dispersion system further comprises: Converging pipes; There are multiple flow equalizer components, the flow equalizer plates of the multiple flow equalizer components are laid on the same plane, the main pipelines of the multiple flow equalizer components are respectively connected to the confluence pipeline, and are connected to the gas source through the confluence pipeline.

6. The dispersion system according to claim 5, characterized in that: Also includes: A plurality of control valves are disposed in the main pipeline of the plurality of flow-uniform components, and the control valves are configured to control the flow of the corresponding main pipeline.

7. The dispersion system according to claim 5, characterized in that: Also includes: The flow meter component is arranged on the pipeline component, and the flow meter component is configured to collect flow information of the pipeline component.

8. The dispersion system according to claim 7, characterized in that: The flow meter assembly comprises: The first flow meter is disposed in the confluence pipe, and the first flow meter is configured to collect flow information of the confluence pipe.

9. The dispersion system according to claim 7, characterized in that: The flow meter assembly comprises: A plurality of second flow meters are disposed in a plurality of the main pipelines, and the second flow meters are configured to collect flow information of the corresponding main pipelines.

10. A coating device, characterized in that: include: Process cavity; A carrier plate, located in the process chamber; The dispersion system according to any one of claims 1 to 9, wherein the flow equalizing plate of the dispersion system is located in the process chamber and is spaced relative to the carrier plate.

Images