Substrate positioning device for nanoimprint

Abstract

The utility model relates to the field of nanoimprint, and particularly discloses a substrate positioning device for nanoimprint, which comprises an operation table, a positioning mechanism is arranged at the top of the operation table, the positioning mechanism comprises two same clamping rods, one end of each of the two same clamping rods is provided with a reference groove block, and the other end of each clamping rod is provided with a positioning groove block. The other ends of the two same clamping rods are connected with displacement blocks, the two same displacement blocks are jointly and movably connected with a traveling rail, one side of each of the two same displacement blocks is connected with a driving mechanism, and an adsorption disc is fixedly installed in the operation table. The two reference groove blocks are driven by the positioning mechanism and the clamping rod to move oppositely, the two reference groove blocks jointly clamp the wafer to the center position, accurate positioning of the substrate can be achieved on the nanoscale, the accuracy and consistency of the imprinting process can be guaranteed, operation is easy, and complex training or professional skills are not needed. This reduces the burden on the operator and reduces the possibility of error occurrence.

Description

Technical Field

[0001] The utility model relates to the field of nano-imprinting, and in particular to a substrate positioning device for nano-imprinting. Background Art

[0002] Imprinting is essentially a printing and replication technology, which is a technology for mass-replicating templates. Imprinting technology processing technology can be divided into nanoimprinting technology and mold pressing technology according to the size of the pattern. The first nanoimprinting technology proposed is hot imprinting nanoimprinting technology and room temperature nanoimprinting technology;

[0003] A nanoimprint device is a device used to perform imprint processing on materials at the nanoscale, and is usually used to prepare nanostructures, nanodevices, etc. Although nanoimprint technology has broad application prospects in the fields of nanoprocessing and nanomanufacturing, there are still some defects and challenges. Some substrate positioning systems may have poor stability problems and are easily affected by external environmental factors such as vibration, temperature changes, etc., resulting in inaccurate or unstable positioning, requiring professional operating skills or additional training. This increases the burden on operators and may increase the risk of errors. The substrate positioning system may only be suitable for substrates of a certain type or size, and may not be applicable to substrates of other types or sizes. This limits the scope of application and flexibility of nanoimprint technology. In large-scale production, improving positioning speed is crucial to improving production efficiency;

[0004] Therefore, there is an urgent need for a substrate positioning device for nanoimprinting to solve the above problems. Summary of the invention

[0005] The purpose of the present invention is to solve the shortcomings of the prior art and to propose a substrate positioning device for nanoimprinting.

[0006] In order to achieve the above purpose, this utility adopts the following technical solutions:

[0007] An operating table, wherein a positioning mechanism is arranged on the top of the operating table, wherein the positioning mechanism comprises two identical clamping rods, wherein one end of the two identical clamping rods is provided with a reference slot block, and the other end of the two identical clamping rods is connected with a displacement block, wherein the two identical displacement blocks are movably connected with a running rail, and one side of the two identical displacement blocks is connected with a driving mechanism, and an adsorption plate is fixedly installed inside the operating table;

[0008] A driving mechanism is connected to the positioning mechanism.

[0009] Preferably, the reference slot block is composed of a 4-inch reference plate, a 6-inch reference plate, and an 8-inch reference plate stacked in sequence, and the 4-inch reference plate, the 6-inch reference plate, and the 8-inch reference plate are stacked and fastened by bolts.

[0010] Preferably, a laser emitter for calibration is provided on the reference slot block.

[0011] Preferably, the adsorption plate fixes the wafer by adjusting the air pressure.

[0012] Preferably, an adjustment block for adjusting the horizontal height of the wafer is provided on the suction plate, and the adjustment block makes the specifications of the wafer correspond to the reference pieces of different sizes on the reference groove block.

[0013] Preferably, the driving mechanism comprises a servo motor, the output end of the servo motor is sleeved with a chain belt, the other end of the chain belt is connected to a rotating wheel, one side of the rotating wheel is fixedly connected to a screw rod, the other side of the screw rod is movably connected to a limiting block, and the side surface of the screw rod is movably connected to a travel block.

[0014] Preferably, the bottom walls of the two identical displacement blocks are both connected to the travel blocks.

[0015] Beneficial effects of this utility:

[0016] 1. Through the positioning mechanism, the clamping rod drives the two reference slot blocks to move towards each other. The two reference slot blocks clamp the wafer to the central position together, which can achieve accurate positioning of the substrate at the nanoscale, which helps to ensure the accuracy and consistency of the imprint process. It is easy to operate and does not require complex training or professional skills. This reduces the burden on operators and reduces the possibility of errors.

[0017] 2. The reference slot block is composed of a 4-inch reference plate, a 6-inch reference plate, and an 8-inch reference plate stacked in sequence, which can be applied to substrates of different types and sizes. This increases the flexibility and applicability of nanoimprint technology, allowing it to be applied to a wider range of fields. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 This is a schematic diagram of the overall structure of a substrate positioning device for nanoimprinting proposed in this utility model;

[0019] Figure 2 A schematic diagram of the positioning mechanism structure of a substrate positioning device for nanoimprinting proposed in this utility model;

[0020] Figure 3 This is a partial structural schematic diagram of a substrate positioning device for nanoimprinting proposed in this utility model.

[0021] In the figure: 1. operating table; 2. positioning mechanism; 21. clamping rod; 22. reference slot block; 23. displacement block; 24. rail; 3. adsorption plate; 4. driving mechanism; 41. servo motor; 42. travel block; 43. limit block; 44. screw rod. DETAILED DESCRIPTION

[0022] The technical scheme in the practical embodiment of the present invention will be clearly and completely described below in conjunction with the drawings in the practical embodiment of the present invention. Obviously, the described embodiment is only a part of the practical embodiment of the present invention, rather than all the embodiments.

[0023] In the description of the present invention, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside", "outside", etc., indicating directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings and are only for the convenience of describing the present invention and simplifying the description. They do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore should not be understood as a limitation on the present invention.

[0024] Reference Figure 1-3 , a substrate positioning device for nanoimprinting, an operating table 1, a positioning mechanism 2 is arranged on the top of the operating table 1, the positioning mechanism 2 includes two identical clamping rods 21, one end of the two identical clamping rods 21 is installed with a reference groove block 22, the other end of the two identical clamping rods 21 is connected with a displacement block 23, the two identical displacement blocks 23 are movably connected with a rail 24, one side of the two identical displacement blocks 23 is connected with a driving mechanism 4, and an adsorption plate 3 is fixedly installed inside the operating table 1;

[0025] The driving mechanism 4 is connected to the positioning mechanism 2 to help ensure the accuracy and consistency of the imprinting process.

[0026] Specifically, the reference slot block 22 is composed of a 4-inch reference plate, a 6-inch reference plate, and an 8-inch reference plate stacked in sequence. The 4-inch reference plate, the 6-inch reference plate, and the 8-inch reference plate are stacked and fastened by bolts, which can be suitable for substrates of different types and sizes, increasing the flexibility and applicability of the nanoimprint technology and allowing it to be applied to a wider range of fields.

[0027] Specifically, a laser emitter for calibration is provided on the reference groove block 22, which can realize accurate positioning of the substrate on a nanometer scale.

[0028] Specifically, the adsorption plate 3 fixes the wafer by adjusting the air pressure, and has good stability.

[0029] Specifically, an adjustment block for adjusting the horizontal height of the wafer is provided on the adsorption plate 3. The adjustment block matches the specifications of the wafer to the different sizes of the reference pieces on the reference slot block 22, thereby increasing the flexibility and applicability of the nanoimprint technology and enabling it to be applied to a wider range of fields.

[0030] Specifically, the driving mechanism 4 includes a servo motor 41, the output end of the servo motor 41 is sleeved with a chain belt, the other end of the chain belt is connected to a rotating wheel, one side of the rotating wheel is fixedly connected to a screw rod 44, the other side of the screw rod 44 is movably connected to a limit block 43, and the side of the screw rod 44 is movably connected to a travel block 42. The design is simple and easy to operate, and does not require complicated training or professional skills.

[0031] Specifically, the bottom walls of the two identical displacement blocks 23 are both connected to the travel block 42 , which is simple in design and easy to operate without requiring complicated training or professional skills.

[0032] Working principle: When the present invention is used, the operator places the wafer on the suction plate 3. At this time, the height of the wafer is adjusted by the adjustment block on the suction plate 3 to correspond to the wafer reference piece of the corresponding size of the reference slot block 22. After the adjustment is completed, the servo motor 41 drives the rotating wheel to rotate through the chain belt, and drives the screw rod 44 to rotate through the rotating wheel, drives the travel block 42 to move laterally through the screw rod 44, and connects with the displacement block 23 through the travel block 42 and drives the clamping rod 21 to move laterally. At this time, the clamping rods 21 on both sides drive the two reference slot blocks 22 to move toward each other, and the two reference slot blocks 22 jointly clamp the wafer to the central position, and use the laser transmitter to emit laser to observe the position of the wafer. After the calibration is completed, the next step is carried out.

[0033] The above is only a preferred specific implementation method of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes within the technical scope disclosed in the present invention according to the technical solution and practical concept of the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A substrate positioning device for nanoimprinting, characterized in that: include: An operating table (1), wherein a positioning mechanism (2) is arranged on the top of the operating table (1), wherein the positioning mechanism (2) comprises two identical clamping rods (21), wherein one end of the two identical clamping rods (21) is provided with a reference groove block (22), the other end of the two identical clamping rods (21) is connected with a displacement block (23), the two identical displacement blocks (23) are movably connected to a running rail (24), one side of the two identical displacement blocks (23) is connected with a driving mechanism (4), and an adsorption plate (3) is fixedly installed inside the operating table (1); A driving mechanism (4), wherein the driving mechanism (4) is connected to the positioning mechanism (2).

2. A substrate positioning device for nanoimprinting according to claim 1, characterized in that: The reference slot block (22) is composed of a 4-inch reference plate, a 6-inch reference plate, and an 8-inch reference plate stacked in sequence, wherein the 4-inch reference plate, the 6-inch reference plate, and the 8-inch reference plate are stacked and fastened by bolts.

3. The substrate positioning device for nanoimprinting according to claim 1, characterized in that: The reference slot block (22) is provided with a laser transmitter for calibration.

4. The substrate positioning device for nanoimprinting according to claim 1, characterized in that: The adsorption plate (3) fixes the wafer by adjusting the air pressure.

5. The substrate positioning device for nanoimprinting according to claim 1, characterized in that: An adjustment block for adjusting the horizontal height of a wafer is provided on the suction plate (3), and the adjustment block matches the specifications of the wafer to the reference pieces of different sizes on the reference groove block (22).

6. The substrate positioning device for nanoimprinting according to claim 1, characterized in that: The driving mechanism (4) comprises a servo motor (41), the output end of the servo motor (41) is sleeved with a chain belt, the other end of the chain belt is connected to a rotating wheel, one side of the rotating wheel is fixedly connected to a screw rod (44), the other side of the screw rod (44) is movably connected to a limit block (43), and the side of the screw rod (44) is movably connected to a travel block (42).

7. A substrate positioning device for nanoimprinting according to claim 6, characterized in that: The bottom walls of the two identical displacement blocks (23) are both connected to the travel block (42).

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