Reduction furnace electrode, reduction furnace and reduction furnace system

Abstract

The utility model discloses a reduction furnace electrode, a reduction furnace and a reduction furnace system, which can fix a silicon core by using an electrode body and a bipyramid graphite chuck without using a graphite seat, reduce the use amount of graphite and ensure the verticality of the silicon core without manual adjustment. The reduction furnace electrode comprises an electrode body (2) and a bipyramid graphite chuck (1). The electrode body (2) is vertically fixed on a chassis of the reduction furnace and is insulated from the chassis of the reduction furnace; and the top end of the electrode body (2) is provided with an electrode concave groove (5). The double-cone graphite chuck (1) is clamped in the electrode concave groove (5); a mounting hole is formed in the top end of the double-cone graphite chuck (1), is vertical to a chassis of the reduction furnace and is used for mounting a silicon core.

Description

Technical Field

[0001] The utility model specifically relates to a reduction furnace electrode, a reduction furnace and a reduction furnace system. Background Art

[0002] In the field of polysilicon production, the modified Siemens method is usually used to produce polysilicon products. The reduction furnace is an important equipment for producing polysilicon. In the reduction furnace, high-purity trichlorosilane and hydrogen react chemically to generate polysilicon, which is deposited on the silicon core to form silicon rods. The reduction furnace is mainly composed of chassis, furnace body, electrode, sight glass, raw gas inlet pipe, tail gas outlet pipe, furnace body cooling water inlet pipe, outlet pipe, chassis cooling water inlet pipe, outlet pipe and other components. Among them, the electrode is an important component that provides current to heat the silicon core, which is crucial for the smooth reaction in the reduction furnace.

[0003] At present, the electrodes used in the reduction furnace are mainly copper cone models. The top of the cone is 100mm-150mm higher than the bottom plate. The upper surface of the cone is a circular horizontal surface with a diameter of 65mm-75mm. The maximum outer diameter of the electrode is 80±5mm. A graphite kit is placed on the electrode. The graphite kit includes a graphite flap, a graphite cap, and a graphite seat. The graphite seat is lined with graphite paper and is set on the electrode. The graphite cap is connected to the graphite seat by threads. A circular hole is opened in the middle of the graphite cap for placing the graphite flap and the silicon core. The main function of the graphite kit is to fix the silicon core, support the silicon rod, and contact the silicon core to conduct current.

[0004] There are multiple electrodes installed on the reduction furnace chassis, and each electrode needs to be installed with a graphite kit. However, after the silicon rod production is completed, only about 50% of the graphite caps and graphite seats in these graphite kits can be reused, resulting in a large waste of resources. In addition, when the silicon core is fixed by the graphite seat, the position between the graphite seat and the electrode is unstable, so the silicon core needs to be manually adjusted to ensure that the silicon core is vertical, which has high requirements for personnel operation and is prone to manual errors during the adjustment process. Utility Model Content

[0005] The technical problem to be solved by the utility model is to provide a reduction furnace electrode, a reduction furnace and a reduction furnace system in view of the above-mentioned deficiencies in the prior art, which can use an electrode body and a double-conical graphite chuck to fix a silicon core without using a graphite seat, thereby reducing the amount of graphite used and ensuring that the silicon core is vertical without manual adjustment.

[0006] In the first aspect, the embodiment of the utility model provides a reduction furnace electrode, which includes an electrode body and a double-cone graphite chuck. The electrode body is vertically fixed on the chassis of the reduction furnace and is insulated from the chassis of the reduction furnace; the top of the electrode body is provided with an electrode concave groove. The double-cone graphite chuck is clamped in the electrode concave groove; the top of the double-cone graphite chuck is provided with a mounting hole, which is perpendicular to the chassis of the reduction furnace and is used to mount a silicon core.

[0007] In some embodiments, a vent hole is formed at the bottom end of the double-cone graphite chuck, and the vent hole is connected to the mounting hole.

[0008] In some embodiments, a first graphite paper is disposed between the double-cone graphite chuck and the electrode concave groove of the electrode body.

[0009] In some embodiments, the reduction furnace electrode further includes a graphite ring; the graphite ring is sleeved on the outer wall surface of the middle portion of the double-cone graphite chuck, and the lower surface of the graphite ring contacts the upper surface of the electrode body.

[0010] In some embodiments, in the vertical direction, the orthographic projection of the portion of the electrode body located above the bottom plate of the reduction furnace is within the orthographic projection range of the outer ring of the graphite ring.

[0011] In some embodiments, a second graphite paper is disposed between the double-cone graphite chuck and the graphite ring.

[0012] In some embodiments, in a direction from top to bottom, the outer diameter of the upper portion of the double-tapered graphite chuck gradually increases, and / or the outer diameter of the lower portion of the double-tapered graphite chuck gradually decreases.

[0013] In some embodiments, an electrode water flow channel is opened at the bottom of the electrode body.

[0014] Therefore, the reduction furnace electrode provided by the embodiment of the utility model can make the electrode body and the double cone graphite chuck fixed to the chassis of the reduction furnace by vertically fixing the electrode body on the chassis of the reduction furnace and clamping the double cone graphite chuck into the electrode concave groove of the electrode body. By opening a mounting hole for installing the silicon core at the top of the double cone graphite chuck, the silicon core can be fixed by the electrode body and the double cone graphite chuck, and there is no need to fix the silicon core through the graphite seat, thereby reducing the amount of graphite required for fixing the silicon core. Furthermore, by making the mounting hole at the top of the double cone graphite chuck perpendicular to the chassis, the silicon core installed inside it can be kept perpendicular to the chassis, so that after the silicon core is installed in the mounting hole, the verticality of the silicon core can be ensured without manual adjustment, thereby avoiding manual errors introduced when manually adjusting the silicon core.

[0015] In a second aspect, the embodiment of the utility model further provides a reduction furnace, comprising a reduction furnace body, an insulating ring, the reduction furnace electrode in the first aspect, and a silicon core. The reduction furnace body comprises a chassis, the chassis is located at the bottom of the reduction furnace body, and a through hole is provided on the chassis. The insulating ring is clamped in the through hole. The electrode body of the reduction furnace electrode is vertically fixed in the inner ring of the insulating ring. The silicon core is fixed in the mounting hole of the double cone graphite chuck.

[0016] In a third aspect, the embodiment of the utility model further provides a reduction furnace system, the reduction furnace system comprising the reduction furnace, a trichlorosilane delivery pipeline and a hydrogen delivery pipeline in the second aspect. The trichlorosilane delivery pipeline is connected to the reduction furnace for delivering trichlorosilane to the reduction furnace. The hydrogen delivery pipeline is connected to the reduction furnace for delivering hydrogen to the reduction furnace.

[0017] The reduction furnace and reduction furnace system provided by the embodiments of the utility model have the same beneficial effects as the above-mentioned reduction furnace electrode, which will not be described in detail here. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 : A schematic diagram of a reduction furnace electrode provided by an embodiment of the utility model;

[0019] Figure 2 : A schematic diagram of a reduction furnace electrode and an insulating ring provided in an embodiment of the utility model. DETAILED DESCRIPTION

[0020] In order to enable those skilled in the art to better understand the technical solution of the present invention, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments.

[0021] Embodiment 1:

[0022] like Figure 1 and Figure 2 As shown, the embodiment of the utility model provides a reduction furnace electrode, which is used in a reduction furnace for polysilicon production. Figure 1 As shown, the reduction furnace electrode includes an electrode body 2 and a double-cone graphite chuck 1. The electrode body 2 is vertically fixed on the bottom plate of the reduction furnace and is insulated from the bottom plate of the reduction furnace; an electrode concave groove 5 is provided at the top of the electrode body 2. The double-cone graphite chuck 1 is clamped in the electrode concave groove 5; a mounting hole 1A is provided at the top of the double-cone graphite chuck 1, and the mounting hole 1A is perpendicular to the bottom plate of the reduction furnace and is used to mount the silicon core.

[0023] Exemplarily, an insulating material is disposed between the electrode body 2 and the chassis to insulate the electrode body 2 from the chassis.

[0024] The electrode body 2 is made of a conductive metal material such as copper or copper alloy. A portion of the electrode body 2 passes through the chassis and extends into the reduction furnace. The positions of the electrode body 2 and the chassis are relatively fixed.

[0025] Exemplarily, the electrode body 2 is arranged perpendicular to the chassis. Figure 1 As shown, the center line of the electrode concave groove 5 coincides with the center line of the electrode body 2 .

[0026] Exemplarily, the longitudinal section of the electrode concave groove 5 is in the shape of a rectangle, or the longitudinal section of the electrode concave groove 5 is in the shape of an inverted trapezoid that is larger at the top and smaller at the bottom.

[0027] It can be understood that the portion of the double-cone graphite chuck 1 that is clamped in the electrode concave groove 5 has the same shape as the electrode concave groove 5 .

[0028] For example, when the longitudinal section of the electrode concave groove 5 is rectangular, the longitudinal section of the portion of the double-tapered graphite chuck 1 engaged in the electrode concave groove 5 is also rectangular.

[0029] Alternatively, when the shape of the longitudinal section of the electrode concave groove 5 is an inverted trapezoid, the shape of the longitudinal section of the portion of the biconical graphite chuck 1 clamped in the electrode concave groove 5 is also an inverted trapezoid. In this case, the biconical graphite chuck 1 can be easily clamped in the electrode concave groove 5.

[0030] After the double-cone graphite chuck 1 is clamped in the electrode concave groove 5, the fixation and positioning between the double-cone graphite chuck 1 and the electrode body 2 can be achieved.

[0031] Exemplarily, the center line of the mounting hole 1A coincides with the center line of the double-tapered graphite chuck 1, that is, the center line of the electrode body 2, the center line of the double-tapered graphite chuck 1, and the center line of the mounting hole 1A all coincide and are perpendicular to the bottom plate of the reduction furnace.

[0032] Exemplarily, the mounting hole 1A may be a plain hole or a threaded hole, and the mounting hole 1A is adapted to the inserted silicon core.

[0033] Through the above arrangement, the electrode body 2 can be used as a silicon core load-bearing structure. Compared with the prior art that uses a graphite seat to bear the silicon core, the use of a graphite seat can be reduced, and therefore the use of graphite can be reduced. And because the electrode body 2 is fixed to the chassis of the reduction furnace, the double-cone graphite chuck 1 is fixed to the electrode body 2, so that the position of the mounting hole 1A at the top of the double-cone graphite chuck 1 and the position of the chassis can be relatively fixed. By making the mounting hole 1A perpendicular to the chassis, the silicon core can be inserted into the mounting hole 1A to ensure that the silicon core is vertical without manual adjustment.

[0034] Therefore, the reduction furnace electrode provided by the embodiment of the utility model can make the electrode body 2 and the biconical graphite chuck 1 fixed to the chassis of the reduction furnace by vertically fixing the electrode body 2 on the chassis of the reduction furnace, and clamping the biconical graphite chuck 1 into the electrode concave groove 5 of the electrode body 2, so that the electrode body 2 and the biconical graphite chuck 1 can be fixed to the chassis of the reduction furnace, and the silicon core can be fixed by the electrode body 2 and the biconical graphite chuck 1 by opening a mounting hole 1A for mounting the silicon core at the top of the biconical graphite chuck 1, and there is no need to fix the silicon core through the graphite seat, thereby reducing the amount of graphite required for fixing the silicon core. Furthermore, by making the mounting hole 1A at the top of the biconical graphite chuck 1 perpendicular to the chassis, the silicon core installed therein can be kept perpendicular to the chassis, so that after the silicon core is installed in the mounting hole 1A, the verticality of the silicon core can be ensured without manual adjustment, thereby avoiding manual errors introduced when manually adjusting the silicon core.

[0035] Furthermore, in the prior art, if the graphite seat is not cleaned before inserting the silicon core, there will be a gap between the graphite seat and the electrode head, which will easily cause arc discharge of the electrode, melting of the copper metal of the electrode head, and breakdown of the graphite seat, resulting in failure of starting the furnace. However, the reduction furnace electrode provided by the embodiment of the utility model does not need to use a graphite seat, so the above-mentioned phenomenon of arc discharge of the electrode, melting of the copper metal of the electrode head, and breakdown of the graphite seat can be avoided.

[0036] In some examples, such as Figure 2 As shown, the diameter L2 of the electrode concave groove 5 is 40±5 mm, and the depth L1 is 37.5±5 mm. The height of the double-cone graphite chuck 1 is 70 mm, and the shape of the middle part is cylindrical, and the diameter of the cylinder is 40 mm, which is adapted to the diameter of the electrode concave groove 5 .

[0037] In some embodiments, Figure 1 As shown, a vent hole is provided at the bottom end of the double-cone graphite chuck 1, and the vent hole is communicated with the mounting hole 1A.

[0038] It is understandable that, in the case where the mounting hole 1A is a blind hole, when the silicon core is installed in the mounting hole 1A, the air in the mounting hole 1A will be compressed, thereby increasing the difficulty of installing the silicon core in the mounting hole 1A.

[0039] By providing the exhaust hole, the air in the mounting hole 1A can be discharged, thereby reducing the difficulty of installing the silicon core in the mounting hole 1A.

[0040] Furthermore, when the double-conical graphite chuck 1 is installed in the electrode concave groove 5 , the exhaust hole and the installation hole 1A can also exhaust the air in the electrode concave groove 5 , thereby reducing the difficulty of installing the conical graphite chuck 1 in the electrode concave groove 5 .

[0041] In some embodiments, Figure 1As shown, a first graphite paper 7 is arranged between the double-conical graphite chuck 1 and the electrode concave groove of the electrode body 2 .

[0042] Exemplarily, as described above, the depth L1 of the electrode concave groove 5 is 37.5±5 mm, and the width of the first graphite paper 7 is 37.5±5 mm, and the first graphite paper 7 completely wraps the portion of the double-cone graphite chuck 1 located in the electrode concave groove 5 .

[0043] The first graphite paper 7 has good electrical conductivity, and the current on the electrode body 2 can be smoothly conducted to the double-cone graphite chuck 1 through the first graphite paper 7; and the first graphite paper 7 can seal the gap between the electrode body 2 and the double-cone graphite chuck 1, so as to prevent silicon atoms in the reduction furnace from adhering to the electrode concave groove 5 and make the electrode body 2 and the double-cone graphite chuck 1 more firmly fixed; at the same time, the first graphite paper 7 also has a lubricating effect, which can facilitate the separation of the double-cone graphite chuck 1 from the electrode body 2 when disassembling the silicon rod.

[0044] In some embodiments, Figure 1 As shown, the reduction furnace electrode further includes a graphite ring 6. The graphite ring 6 is sleeved on the outer wall surface of the middle part of the double-cone graphite chuck 1, and the lower surface of the graphite ring 6 is in contact with the upper surface of the electrode body 2.

[0045] Exemplarily, the middle portion of the double-cone graphite chuck 1 is cylindrical in shape, and the inner ring of the graphite ring 6 fits the middle portion of the double-cone graphite chuck 1 .

[0046] For example, as described above, the diameter L2 of the middle portion of the double-cone graphite chuck 1 is 40 mm, and the thickness of the graphite ring 6 is 10 mm, the inner diameter is 40±5 mm, and the outer diameter is 75±5 mm.

[0047] Through the above arrangement, the current on the electrode body 2 can also be conducted to the double-cone graphite chuck 1 through the graphite ring 6. The graphite ring 6 can shield the silicon powder formed above to prevent the silicon powder from being deposited on the upper surface of the electrode body 2 to form silicon junctions.

[0048] At the same time, the graphite ring 6 can also provide a certain support to the double-cone graphite chuck 1 to prevent the double-cone graphite chuck 1 from shaking, which is beneficial to maintaining the stability of the position between the double-cone graphite chuck 1 and the electrode body 2, and further beneficial to maintaining the verticality of the silicon core.

[0049] In some embodiments, Figure 1 As shown, in the vertical direction, the orthographic projection of the portion of the electrode body 2 located above the bottom plate of the reduction furnace is within the orthographic projection range of the outer ring of the graphite ring 6 .

[0050] That is, in the vertical direction, the size of the outer ring of the graphite ring 6 is larger than the size of the outer ring of the electrode body 2 .

[0051] Through the above arrangement, the graphite ring 6 can better shield the silicon powder formed above, further preventing the silicon powder from being deposited on the entire outer wall surface of the electrode body 2 , thereby preventing leakage current from being generated on the outer wall surface of the electrode body 2 .

[0052] In some embodiments, in combination Figure 1 A second graphite paper is arranged between the double-conical graphite chuck 1 and the graphite ring 6 .

[0053] Similarly, through the above arrangement, the current on the electrode body 2 can be smoothly conducted to the double-cone graphite chuck 1 through the graphite ring 6 and the second graphite paper, thereby preventing the chemical reaction in the reduction furnace from occurring on the graphite ring 6 and causing silicon atoms to adhere to the surface of the graphite ring 6; and the second graphite paper can seal the gap between the graphite ring 6 and the double-cone graphite chuck 1, so that the graphite ring 6 and the double-cone graphite chuck 1 are fixed more firmly; at the same time, the second graphite paper also has a lubricating effect, which also facilitates the separation of the graphite ring 6 from the double-cone graphite chuck 1.

[0054] In some embodiments, Figure 1 As shown, from top to bottom, the outer diameter of the upper portion of the double-cone graphite chuck 1 gradually increases.

[0055] Exemplarily, the bevel angle α1 of the upper portion of the double-taper graphite chuck 1 satisfies 0°<α<10°. For example, the bevel angle α1 of the upper portion of the double-taper graphite chuck 1 is 2°, 5° or 8°.

[0056] In this way, the outer diameter of the top surface of the double-cone graphite chuck 1 can be reduced, and the connection between the double-cone graphite chuck 1 and the silicon rod formed on the silicon core can be reduced, thereby reducing the quality problems caused by the graphite on the double-cone graphite chuck 1 being introduced into the silicon rod, thereby ensuring the quality of the silicon rod.

[0057] In some embodiments, Figure 1 As shown, from top to bottom, the outer diameter of the lower part of the double-cone graphite chuck 1 gradually decreases.

[0058] Exemplarily, the bevel angle α2 of the lower portion of the double-taper graphite chuck 1 satisfies 0°<α<10°. For example, the bevel angle α2 of the lower portion of the double-taper graphite chuck 1 is 2°, 5° or 8°.

[0059] In this way, the size of the lower part of the double-tapered graphite chuck 1 can be reduced. When the shape of the electrode concave groove 5 is a cylindrical groove, the contact area between the lower part of the double-tapered graphite chuck 1 and the inner wall of the electrode concave groove 5 can be reduced, thereby reducing the friction between the double-tapered graphite chuck 1 and the inner wall of the electrode concave groove 5, making it easier to install the double-tapered graphite chuck 1 in the electrode concave groove 5 and remove the double-tapered graphite chuck 1 from the electrode concave groove 5.

[0060] In some embodiments, Figure 1 As shown, an electrode water flow channel 4 is provided at the bottom of the electrode body 2 .

[0061] Cooling water flows in the electrode water flow channel 4 to cool the electrode body 2 , thereby preventing chemical reactions in the reactor from occurring on the outer surface of the electrode body 2 and generating silicon powder on the outer surface of the electrode body 2 .

[0062] The inventors conducted a comparative verification on the effect of the reduction furnace electrode provided by the embodiment of the utility model, and set up an experimental group and two comparative groups for the comparative verification. The specific process is as follows:

[0063] The experimental group is a reduction furnace electrode provided by the embodiment of the utility model, that is, a reduction furnace electrode including a first graphite paper 7 and a graphite ring 6. The experimental results are the same as the beneficial effects recorded in the above embodiment: no silicon binding and leakage current phenomenon occurs on the electrode body 2.

[0064] The first comparison group is specifically as follows: the first graphite paper 7 between the biconical graphite chuck 1 and the electrode concave groove 5 of the electrode body 2 is removed. At this time, the biconical graphite chuck 1 can be normally clamped in the electrode concave groove 5 of the electrode body 2, and the graphite ring 6 is normally installed, and then the reaction is carried out normally in the reduction furnace. After the silicon rod is made, when the furnace is dismantled, compared with the reduction furnace electrode with the first graphite paper 7 normally set, the biconical graphite chuck 1 in the first comparison group is embedded in the electrode concave groove 5 of the electrode body 2, and it is not easy to take out. At the same time, there is a gap between some biconical graphite chucks 1 and biconical graphite chucks 1, and silicon is formed inside the electrode body 2.

[0065] The second comparison group is specifically as follows: the graphite ring 6 sleeved on the outer wall surface of the middle part of the double-cone graphite chuck 1 is removed. At this time, the double-cone graphite chuck 1 is firmly installed, the silicon core is vertical, and then the reaction is carried out normally in the reduction furnace. After the silicon rod is made, the double-cone graphite chuck 1 can be well taken out when the furnace is dismantled. Compared with the reduction furnace electrode with the normal graphite ring 6, the upper surface of the electrode body 2 in the second comparison group is seriously siliconized, and leakage current and arcing at the root of the silicon rod appear on the outer surface of the electrode body 2 during the reaction. In addition, the siliconized outer surface of the electrode body 2 is very easy to damage the surface of the silicon rod during the cleaning process, and it is difficult to protect the electrode body 2.

[0066] By comparison, the reduction furnace electrode provided by the embodiment of the utility model can well protect the electrode body 2 by providing the first graphite paper 7 and the graphite ring 6.

[0067] Embodiment 2:

[0068] The utility model embodiment also provides a reduction furnace, combined with Figure 1 and Figure 2The reduction furnace includes a reduction furnace body, an insulating ring 3, the reduction furnace electrode in Example 1 and a silicon core. The reduction furnace body includes a chassis, which is located at the bottom of the reduction furnace body and has a through hole. The insulating ring 3 is clamped in the through hole. The electrode body 2 of the reduction furnace electrode is vertically fixed in the inner ring of the insulating ring 3. The silicon core is fixed in the mounting hole 1A of the double cone graphite chuck 1.

[0069] The reduction furnace body is where chemical reactions occur during the production of polysilicon. The chassis is usually made of metal material, and the insulating ring 3 can achieve insulation between the reduction furnace electrode and the chassis to prevent the current on the electrode body 2 from being transferred to the chassis and causing leakage current.

[0070] Exemplarily, there are multiple through holes on the chassis, the number of insulating rings 3 and the number of reduction furnace electrodes is the same as the number of through holes, and the through holes, insulating rings 3 and reduction furnace electrodes are arranged in a one-to-one correspondence.

[0071] When the reactants required for the reaction are introduced into the reduction furnace body, the reactants can react on the silicon core to generate silicon atoms, and the silicon atoms are finally deposited on the silicon core to form silicon rods.

[0072] The reduction furnace provided by the embodiment of the utility model has an electrode that can fix the silicon core and keep the silicon core vertical without a graphite seat, which can reduce the use of graphite and eliminate the need for manual adjustment of the silicon core, thereby reducing production costs and improving the production efficiency of silicon rods.

[0073] Embodiment 3:

[0074] The embodiment of the utility model also provides a reduction furnace system, which includes the reduction furnace in embodiment 2, a trichlorosilane delivery pipeline and a hydrogen delivery pipeline. The trichlorosilane delivery pipeline is connected to the reduction furnace and is used to deliver trichlorosilane to the reduction furnace. The hydrogen delivery pipeline is connected to the reduction furnace and is used to deliver hydrogen to the reduction furnace.

[0075] The silicon core can be heated by passing electric current through the reduction furnace electrodes of the reduction furnace. After trichlorosilane and hydrogen are transported into the reduction furnace, trichlorosilane and hydrogen will react on the outer surface of the silicon core to produce silicon atoms, and finally form silicon rods on the silicon core.

[0076] Exemplarily, the reduction furnace system also includes a tail gas recovery device to recover the tail gas after the reaction to save costs.

[0077] Therefore, the reduction furnace system provided by the embodiment of the utility model can reduce the use of graphite when producing silicon rods, and does not require manual adjustment of the silicon core, which can reduce the production cost of the silicon rods and improve the production efficiency of the silicon rods.

[0078] It is understood that the above embodiments are merely exemplary embodiments used to illustrate the principles of the present invention, but the present invention is not limited thereto. For those skilled in the art, various modifications and improvements can be made without departing from the spirit and essence of the present invention, and these modifications and improvements are also considered to be within the scope of protection of the present invention.

Claims

1. A reduction furnace electrode, characterized in that: include: The electrode body (2) is vertically fixed on the bottom plate of the reduction furnace and is insulated from the bottom plate of the reduction furnace; the top of the electrode body (2) is provided with an electrode concave groove (5); and, A double-cone graphite chuck (1) is clamped in the electrode concave groove (5); a mounting hole is provided at the top of the double-cone graphite chuck (1), the mounting hole being perpendicular to the bottom plate of the reduction furnace and being used for mounting the silicon core.

2. The reduction furnace electrode according to claim 1, characterized in that: The bottom end of the double-cone graphite chuck (1) is provided with an exhaust hole, and the exhaust hole is connected to the mounting hole.

3. The reduction furnace electrode according to claim 1, characterized in that: A first graphite paper (7) is arranged between the double-cone graphite chuck (1) and the electrode concave groove of the electrode body (2).

4. The reduction furnace electrode according to claim 1, characterized in that: Also includes a graphite ring (6); The graphite ring (6) is sleeved on the outer wall surface of the middle part of the double-cone graphite chuck (1), and the lower surface of the graphite ring (6) is in contact with the upper surface of the electrode body (2).

5. The reduction furnace electrode according to claim 4, characterized in that: In the vertical direction, the orthographic projection of the portion of the electrode body (2) located above the bottom plate of the reduction furnace is within the orthographic projection range of the outer ring of the graphite ring (6).

6. The reduction furnace electrode according to claim 4, characterized in that: A second graphite paper is arranged between the double-cone graphite chuck (1) and the graphite ring (6).

7. The reduction furnace electrode according to claim 1, characterized in that: In a direction from top to bottom, the outer diameter of the upper portion of the double-tapered graphite chuck (1) gradually increases, and / or the outer diameter of the lower portion of the double-tapered graphite chuck (1) gradually decreases.

8. The reduction furnace electrode according to claim 1, characterized in that: An electrode water flow channel (4) is provided at the bottom of the electrode body (2).

9. A reduction furnace, characterized in that: include: The reduction furnace body comprises a bottom plate, the bottom plate is located at the bottom of the reduction furnace body, and a through hole is opened on the bottom plate; An insulating ring (3) is clamped in the through hole; The reduction furnace electrode according to any one of claims 1 to 8, wherein the electrode body (2) of the reduction furnace electrode is vertically fixed in the inner ring of the insulating ring (3); and, The silicon core is fixed in the mounting hole of the double-cone graphite chuck (1).

10. A reduction furnace system, characterized in that: include: The reduction furnace according to claim 9; A trichlorosilane delivery pipeline is connected to the reduction furnace and is used to deliver trichlorosilane to the reduction furnace; and, A hydrogen delivery pipeline is communicated with the reduction furnace and is used for delivering hydrogen to the reduction furnace.

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