Resonator wafer cleaning device

Abstract

The utility model discloses a resonator wafer cleaning device, which relates to the technical field of resonator wafers and comprises a workbench and further comprises a feeding structure arranged on the workbench and used for conveying a quartz wafer to a cleaning position; the cleaning device is arranged on one side of the workbench and used for cleaning the two faces of the quartz wafer; wherein the feeding structure comprises a servo motor, the servo motor is installed at the bottom of the workbench, a conveying device and an output device are arranged on the two sides of the workbench respectively, a rotating disc is installed on an output shaft of the servo motor, a plurality of sets of discharging grooves are formed in the top of the rotating disc, the discharging grooves are matched with quartz wafers in size, and the conveying device and the output device are installed on the rotating disc. A baffle ring is installed at the top of the workbench, the edge of the quartz wafer is limited through the extrusion piece, meanwhile, water flow is sprayed to the surface of the quartz wafer through the spray head, the two faces of the quartz wafer are cleaned through the scraper blade at the same time, and the cleaning efficiency is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to resonator wafer technical field, specifically a resonator wafer cleaning device. BACKGROUND

[0002] The crystal resonator refers to the quartz crystal resonator made of quartz material, and the quartz wafer in the resonator is a core element, can stably oscillate, and has extremely high accuracy and stability at different frequencies, and the principle is that when an external electric field is applied, the quartz crystal will deform mechanically, thereby exciting mechanical resonance in the crystal structure.

[0003] In the production of resonators, the quartz wafer needs to be plated with silver, and when the quartz wafer is plated with silver, the impurities on its surface need to be cleaned, and the existing technology for cleaning the quartz wafer usually needs to place the quartz wafer on a platform for cleaning operation, which can only clean one side of the quartz wafer at a time, and if both sides need to be cleaned, the quartz wafer needs to be turned over, thereby affecting the cleaning efficiency of the quartz wafer. UTILITY MODEL CONTENT

[0004] The utility model aims at making up for the shortage of prior art, and provides a resonator wafer cleaning device.

[0005] To achieve the above purpose, the utility model provides the following technical scheme: a resonator wafer cleaning device, comprising a workbench, further comprising:

[0006] A feeding structure is arranged on the workbench and used for conveying the quartz wafer to the cleaning position;

[0007] A cleaning device is arranged on one side of the workbench and used for cleaning both sides of the quartz wafer;

[0008] The feeding structure comprises a servo motor, the servo motor is installed at the bottom of the workbench, conveying devices and output devices are arranged on both sides of the workbench respectively, the output shaft of the servo motor is provided with a turntable, a plurality of groups of discharge grooves are formed in the top of the turntable, the size of the discharge grooves is matched with that of the quartz wafer, a retaining ring is installed on the top of the workbench, a fixed ring is installed in the middle of the workbench, a fixing piece is installed on the outer surface of the fixed ring, a fixed plate is installed at the bottom of the turntable, a movable rod is sleeved in the fixed plate, a protruding block and an extrusion piece are installed at both ends of the movable rod respectively, and a return spring is sleeved on the outer surface of the movable rod;

[0009] The cleaning device comprises a fixed frame installed on one side of a workbench, spray heads installed on the upper and lower sides of the inner wall of the fixed frame, a water delivery pipe laid in the fixed frame, a water pump installed on one side of the fixed frame, rotating shafts sleeved on the upper and lower sides of the inner wall of the fixed frame, scraper plates installed on the end portions of the rotating shafts, and a driving motor installed at the bottom of the fixed frame.

[0010] The protruding block is in extrusion contact with the fixing piece.

[0011] The stop ring is sleeved on the outer surface of the rotating disc, and the inner wall of the stop ring and the outer surface of the extrusion piece are bonded with rubber.

[0012] The reset spring is elastically supported between the fixed plate and the protruding block.

[0013] When the protruding block is extruded, the extrusion piece and the stop ring clamp the quartz wafer.

[0014] The scraper plates are made of silica gel, and the scraper plates are in contact with the surface of the quartz wafer.

[0015] The spray heads are communicated with the water delivery pipe, the water outlet of the water pump is communicated with the water delivery pipe, and the water outlet of the water pump is connected with an external water pipe.

[0016] Compared with the prior art, the resonator wafer cleaning device has the following beneficial effects:

[0017] First, the rotation of the servo motor drives the rotating disc to rotate, so that the quartz wafer is rotated and moved by the feeding groove. When the quartz wafer moves to the position of the fixed frame, the cooperation between the protruding block and the fixing piece drives the movable rod to move along the inner side of the fixed plate when the protruding block extrudes the fixing piece. At this time, the extrusion piece extrudes and positions the quartz wafer. At the same time, the operation of the water pump draws water flow and inputs it into the water delivery pipe, so that the water flow is sprayed to the surface of the quartz wafer by the spray head. At this time, due to the operation of the driving motor, the scraper plates are driven to clean both sides of the quartz wafer through the cooperation between the driving belt and the rotating shaft, thereby improving the cleaning efficiency.

[0018] Second, the quartz wafer is conveyed into the feeding groove by the conveying device, and the quartz wafer is conveyed to the cleaning position by the operation of the rotating disc. After cleaning, the quartz wafer is conveyed above the output device and falls off, so as to be conveyed out by the output device, thereby continuous operation can be carried out.

[0019] Other advantages, objectives and features of this invention will be set forth in part in the description which follows, and in part will be apparent to those skilled in the art from the following examination or study, or may be taught from the practice of this invention. Attached Figure Description

[0020] Figure 1 This is a three-dimensional structural diagram of the present invention;

[0021] Figure 2 This is a cross-sectional view of the side of the present invention;

[0022] Figure 3 This is a schematic diagram of the disassembly structure of the turntable of this utility model;

[0023] Figure 4 This utility model Figure 4 Enlarged structural diagram at point A;

[0024] Figure 5 This is a cross-sectional structural diagram of the cleaning device of this utility model.

[0025] In the diagram: 1. Workbench; 2. Servo motor; 3. Turntable; 4. Feed chute; 5. Retaining ring; 6. Fixing ring; 7. Fixing component; 8. Fixing plate; 9. Movable rod; 10. Protrusion; 11. Extrusion component; 12. Return spring; 13. Conveying device; 14. Output device; 15. Fixing frame; 16. Nozzle; 17. Water supply pipe; 18. Water pump; 19. Drive motor; 20. Rotating shaft; 21. Scraper; 22. Transmission belt. Detailed Implementation

[0026] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0027] like Figures 1-5 As shown, this utility model provides a technical solution: a resonator wafer cleaning device, including a worktable 1, and further comprising:

[0028] The feeding structure, which is set on the worktable 1, is used to transport quartz wafers to the cleaning position;

[0029] A cleaning device, which is located on one side of the workbench 1, is used for double-sided cleaning of quartz wafers.

[0030] The feeding structure includes a servo motor 2, which is installed at the bottom of the workbench 1. A conveying device 13 and an output device 14 are respectively provided on both sides of the workbench 1. A turntable 3 is installed on the output shaft of the servo motor 2. Several sets of feeding slots 4 are opened on the top of the turntable 3. The feeding slots 4 are adapted to the size of the quartz wafers. A retaining ring 5 is installed on the top of the workbench 1. A fixing ring 6 is installed in the middle of the workbench 1. A fixing part 7 is installed on the outer surface of the fixing ring 6. A fixing plate 8 is installed at the bottom of the turntable 3. A movable rod 9 is sleeved inside the fixing plate 8. A protrusion 10 and an extrusion part 11 are respectively installed at both ends of the movable rod 9. A return spring 12 is sleeved on the outer surface of the movable rod 9.

[0031] The cleaning device includes a fixed frame 15, which is installed on one side of the workbench 1. Spray nozzles 16 are installed on both the upper and lower sides of the inner wall of the fixed frame 15. A water pipe 17 is laid inside the fixed frame 15. A water pump 18 is installed on one side of the fixed frame 15. A rotating shaft 20 is sleeved on both the upper and lower sides of the inner wall of the fixed frame 15. A scraper 21 is installed at the end of the rotating shaft 20. A drive motor 19 is installed at the bottom of the fixed frame 15. A transmission belt 22 is connected between the output shaft of the drive motor 19 and the rotating shaft 20.

[0032] The operation of servo motor 2 will cause turntable 3 to rotate, thereby driving the quartz wafer to rotate and move through feeding trough 4. When the quartz wafer moves to the position of fixed frame 15, through the cooperation between protrusion 10 and fixed member 7, when protrusion 10 squeezes fixed member 7, it will drive movable rod 9 to move along the inner side of fixed plate 8. At this time, extrusion member 11 will squeeze and limit the quartz wafer. At the same time, through the operation of water pump 18, water will be drawn and input into the water supply pipe 17, and then water can be sprayed onto the surface of quartz wafer through nozzle 16. At this time, due to the operation of drive motor 19, through the cooperation between transmission belt 22 and rotating shaft 20, scraper 21 will drive the quartz wafer to clean both sides at the same time.

[0033] like Figure 1 , 3 As shown, the fixing member 7 is positioned towards the fixing frame 15, and the protrusion 10 is in contact with the fixing member 7 by pressing.

[0034] With the design of the fastener 7, since the fastener 7 is oriented towards the fixture 15, when the quartz wafer is transported to the fixture 15, the corresponding protrusion 10 will press against the fastener 7, thereby positioning the edge of the quartz wafer at that location, thus achieving simultaneous cleaning of the upper and lower surfaces of the quartz wafer.

[0035] like Figure 1 , 4 As shown, the retaining ring 5 is sleeved on the outer surface of the turntable 3, and rubber is bonded to the inner wall of the retaining ring 5 and the outer surface of the extrusion part 11.

[0036] By designing the retaining ring 5, the retaining ring 5 will limit the periphery of the quartz wafer when it is being transported, so as to prevent the quartz wafer from detaching from the feeding trough 4.

[0037] like Figure 4 As shown, the reset spring 12 is elastically supported between the fixed plate 8 and the protrusion 10.

[0038] The design of the return spring 12 enables the bump 10 to have good elastic return performance. Since the return spring 12 is in a compressed state, it will apply an elastic force to the bump 10. When the bump 10 releases the pressure on the fixing member 7, it can drive the pressing member 11 to disengage from the edge of the quartz wafer, which is convenient for unloading the quartz wafer.

[0039] like Figure 3 , 4 As shown, when the protrusion 10 and the fixing member 7 are pressed together, the pressing member 11 and the retaining ring 5 will clamp the quartz wafer.

[0040] Through the cooperation between the protrusion 10 and the fixing member 7, the extrusion member 11 can be moved by the movable rod 9, so that the quartz wafer can be positioned by the extrusion member 11 and the retaining ring 5, thus avoiding the position displacement of the quartz wafer during cleaning.

[0041] like Figure 5 As shown, the scraper 21 is made of silicone and is in contact with the surface of the quartz wafer.

[0042] The scraper 21 is designed to remove impurities from the surface of the quartz wafer during rinsing. At the same time, since the scraper 21 is made of silicone, it can avoid causing wear to the quartz wafer.

[0043] like Figure 5 As shown, the nozzle 16 is connected to the water supply pipe 17, the drain outlet of the water pump 18 is connected to the water supply pipe 17, and the drain outlet of the water pump 18 is connected to the external water pipe.

[0044] Through the cooperation between the nozzle 16 and the water supply pipe 17, when the water pump 18 is running, water will be input into the inside of the water supply pipe 17, so that the water can be sprayed into the outer surface of the quartz wafer through the nozzle 16.

[0045] Working principle:

[0046] The operation of servo motor 2 will cause turntable 3 to rotate, thereby driving the quartz wafer to rotate and move through feeding trough 4. When the quartz wafer moves to the position of fixed frame 15, through the cooperation between protrusion 10 and fixed member 7, when protrusion 10 squeezes fixed member 7, it will drive movable rod 9 to move along the inner side of fixed plate 8. At this time, extrusion member 11 will squeeze and limit the quartz wafer. At the same time, through the operation of water pump 18, water will be drawn and input into the water supply pipe 17, and then water can be sprayed onto the surface of quartz wafer through nozzle 16. At this time, due to the operation of drive motor 19, through the cooperation between transmission belt 22 and rotating shaft 20, scraper 21 will drive the quartz wafer to clean both sides at the same time.

[0047] It should be noted that in this document, the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used solely for the convenience of describing this utility model and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this utility model. The terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. Furthermore, unless otherwise explicitly specified and limited, the terms "fixed," "installed," "connected," and "linked" should be interpreted broadly. For example, "installed" can be a fixed connection, a detachable connection, or an integral connection; "connected" can be a mechanical connection or an electrical connection; "linked" can be a direct connection, an indirect connection through an intermediate medium, or a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this utility model based on the specific circumstances.

[0048] Although embodiments of the present invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the present invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A resonator wafer cleaning apparatus, comprising a worktable (1), characterized in that, Also includes: The feeding structure is set on the worktable (1) and is used to transport the quartz wafer to the cleaning position; A cleaning device is installed on one side of the workbench (1) for cleaning both sides of the quartz wafer. The feeding structure includes a servo motor (2), which is installed at the bottom of the workbench (1). The workbench (1) is provided with a conveying device (13) and an output device (14) on both sides. The output shaft of the servo motor (2) is equipped with a turntable (3). The top of the turntable (3) is provided with several sets of feeding slots (4). The feeding slots (4) are adapted to the size of the quartz wafer. The top of the workbench (1) is equipped with a retaining ring (5). The middle of the workbench (1) is equipped with a fixing ring (6). The outer surface of the fixing ring (6) is equipped with a fixing part (7). The bottom of the turntable (3) is equipped with a fixing plate (8). The inside of the fixing plate (8) is fitted with a movable rod (9). The two ends of the movable rod (9) are respectively equipped with a protrusion (10) and an extrusion part (11). The outer surface of the movable rod (9) is fitted with a return spring (12). The cleaning device includes a fixed frame (15), which is installed on one side of the workbench (1). Spray nozzles (16) are installed on both the upper and lower sides of the inner wall of the fixed frame (15). A water pipe (17) is laid inside the fixed frame (15). A water pump (18) is installed on one side of the fixed frame (15). A rotating shaft (20) is sleeved on both the upper and lower sides of the inner wall of the fixed frame (15). A scraper (21) is installed at the end of the rotating shaft (20). A drive motor (19) is installed at the bottom of the fixed frame (15). A transmission belt (22) is connected between the output shaft of the drive motor (19) and the rotating shaft (20).

2. The resonator wafer cleaning device according to claim 1, characterized in that: The fixing member (7) is positioned toward the fixing frame (15), and the protrusion (10) is in contact with the fixing member (7) by compression.

3. The resonator wafer cleaning device according to claim 1, characterized in that: The retaining ring (5) is sleeved on the outer surface of the turntable (3), and the inner wall of the retaining ring (5) and the outer surface of the extruder (11) are both bonded with rubber.

4. The resonator wafer cleaning device according to claim 1, characterized in that: The reset spring (12) is elastically supported between the fixed plate (8) and the protrusion (10).

5. A resonator wafer cleaning device according to claim 2, characterized in that: When the protrusion (10) and the fixing member (7) are pressed together, the pressing member (11) and the retaining ring (5) will clamp the quartz wafer.

6. The resonator wafer cleaning apparatus according to claim 1, characterized in that: The scraper (21) is made of silicone and is in contact with the surface of the quartz wafer.

7. The resonator wafer cleaning device according to claim 1, characterized in that: The nozzle (16) is connected to the water supply pipe (17), the drain outlet of the water pump (18) is connected to the water supply pipe (17), and the drain outlet of the water pump (18) is connected to an external water pipe.

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