Method for rinsing a coating product application device, and associated device

Abstract

Method for rinsing a coating product application device and associated device. The present invention relates to a method for rinsing a coating product application device (12) comprising a metering device (10) and a coating product applicator (13). The metering device (10) comprises a metering pump (14) having an inlet (26) connected to a gas supply line (20) and a solvent supply line (22), and an outlet (28) connected to the applicator (13). Each of the supply lines is provided with a respective valve (40, 42). The process includes at least one step of aspiration by the metering pump (14) of a volume during at least one aspiration phase of the metering pump (14), the valves (40, 42) being alternately in the open configuration during at least one aspiration phase, so that the volume aspirated during at least one aspiration phase comprises alternately gas and solvent.The invention further relates to an associated application device. Figure for the abstract: Fig 1.

Description

Title of the invention: Method for rinsing a coating product application device, and associated device

[0001] The present invention relates to a method for rinsing a coating product application device comprising a dosing device, and an associated device.

[0002] To rinse a coating product application device, solvent is, for example, injected into the application device.

[0003] However, such a method uses a lot of solvent.

[0004] The aim of the invention is therefore to propose a more ecological method for rinsing a coating product application device.

[0005] For this purpose, the subject of the invention is a method for rinsing a coating product application device comprising a metering device and a coating product applicator, the metering device comprising a metering pump having an inlet and an outlet, the inlet being connected to a gas supply line and a solvent supply line, the outlet being connected to the coating product applicator, the gas supply line being provided with a gas valve, the solvent supply line being provided with a solvent valve, each of the gas and solvent valves having at least one closed configuration, in which the valve prevents the passage of gas or solvent respectively towards the inlet, and at least one open configuration, in which the valve allows the passage of gas or solvent respectively towards the inlet,the method comprising at least one step of suction by the metering pump of a volume during at least one suction phase of the metering pump, the gas valve and the solvent valve being alternately in the open configuration during the at least one suction phase, so that the volume sucked during the at least one suction phase alternately comprises gas and solvent.

[0006] Thus, gas is injected into the solvent. This creates an emulsion which is used to rinse the application device. This reduces the amount of solvent used for rinsing.

[0007] According to other advantageous aspects of the invention, the rinsing method comprises one or more of the following characteristics, taken individually or in all technically possible combinations:

[0008] - the at least one suction phase comprises, in this order, the following steps: opening a first valve among the gas valve and the solvent valve, suction of gas or solvent by the metering pump for a first volume, closing the first valve, opening a second valve among the gas valve and the solvent valve, the second valve being different from the first valve, suction of gas or solvent by the metering pump for a second volume, and closing of the second valve, said previous steps being repeated throughout the at least one suction phase;

[0009] - the suction comprises a suction cycle comprising a suction of gas and a suction of solvent by the metering pump, said suction cycle being repeated throughout the suction phase;

[0010] - the dosing method comprises detecting the volume aspirated during aspiration by the dosing pump, more particularly by a suction volume sensor or a dosing pump displacement sensor;

[0011] - the dosing device further comprises at least two supply channels in respective component product;

[0012] - the metering pump is a piston pump;

[0013] - the gas supply path is provided with a compressor, the compressor being adapted to compress the gas to the inlet of the metering pump upstream of the gas valve, the solvent supply path being provided with a secondary solvent pump, the secondary solvent pump being adapted to pump the solvent to the inlet of the metering pump, the secondary solvent pump being arranged upstream of the solvent valve; and / or

[0014] - the dosing device comprises a mixer downstream of the pump outlet dosing pump, more particularly arranged adjacent to the outlet of the dosing pump.

[0015] The invention also relates to a coating product application device comprising a metering device and a coating product applicator, the metering device comprising a metering pump, a gas supply path and a solvent supply path, and a control module, the metering pump having an inlet and an outlet, the inlet being connected to the gas supply path and the solvent supply path, the outlet being connected to the coating product applicator, the gas supply path being provided with a gas valve, the solvent supply path being provided with a solvent valve, each of the gas and solvent valves having at least one closed configuration, in which the valve prevents the passage of gas or solvent respectively to the inlet, and at least one open configuration, in which the valve allows the passage of gas or solvent respectively to the inlet,the control module being capable of controlling the gas valve and the solvent valve, the control module being configured to implement suction according to the at least one suction step of the method described previously.

[0016] The invention will appear more clearly on reading the description which follows, given solely by way of non-limiting example, and made with reference to the drawings in which:

[0017] [Fig.l] [Fig.l] is a schematic view of an example of an application device during rinsing according to a first embodiment of the invention,

[0018] [Fig.2] [Fig.2] is a schematic view of an example of an application device during rinsing according to a second embodiment of the invention, and

[0019] [Fig.3] [Fig.3] is an example of a metering pump for an application device according to the invention.

[0020] A first example of a device 12 for applying a coating product will now be described with reference to [Fig. 1].

[0021] The coating product is, for example, a multi-component product.

[0022] The coating product is, for example, a paint.

[0023] The coating product has, for example, a viscosity of between 100 Cps and 10 OOOCps.

[0024] The coating product application device 12 comprises a dosing device 10.

[0025] The application device 12 further comprises an applicator 13 for coating product.

[0026] The applicator 13 is, for example, one or more spray guns, or one or more rotating spray bowls, or one or more dispensing valves.

[0027] The dosing device 10 comprises a dosing pump 14.

[0028] The dosing device 10 here comprises a gas supply path 20 and a solvent feed line 22.

[0029] The dosing device 10 here further comprises a plurality of supply channels 16, 18 for the respective component product.

[0030] The dosing device 10 further comprises an electronic device 24.

[0031] The metering pump 14 has an inlet 26 and an outlet 28.

[0032] The metering pump is capable of pumping a given volume of fluid, liquid or gaseous.

[0033] The dosing pump has, for example, a cylinder capacity of between 10 cc and 500 cc.

[0034] The metering pump has at least one suction phase.

[0035] In one embodiment, the metering pump has a suction phase and a non-suction phase.

[0036] During the suction phase, a volume corresponding to the displacement of the metering pump enters the metering pump at the inlet. Additionally, during the suction phase, a volume corresponding to a first portion, here half, of the displacement of the pump leaves the pump at the outlet.

[0037] During the non-suction phase, no fluid enters the metering pump at the inlet. A volume corresponding to a second, complementary portion of the first portion, here half, of the pump displacement leaves the pump at the outlet.

[0038] In the example shown, the metering pump 14 is a piston pump.

[0039] The piston pump has an operation with a suction phase and a non-suction phase as described previously.

[0040] An example of a piston pump used as a metering pump 14 is, for example, shown in [Fig.3] during the suction phase.

[0041] The metering pump comprises, for example, a cylinder 70 and a piston head 72, the piston head 72 delimiting two chambers of variable volume in the cylinder, called upstream chamber 74 and downstream chamber 76.

[0042] The inlet 26 is arranged opposite the outlet 28.

[0043] The inlet 26 opens into the upstream chamber 74 opposite the downstream chamber 76, the outlet 28 opens into the downstream chamber 76 opposite the upstream chamber 74.

[0044] The piston head 72 is, here, provided with a discharge valve 78.

[0045] The piston head defines an opening 80 for the passage of fluid from the chamber upstream 74 to the downstream chamber 76, the discharge valve 78 preventing the passage of fluid from the downstream chamber 76 to the upstream chamber 74.

[0046] The discharge valve 78 comprises, for example, a seat 82 delimited by the head and surrounding the opening and a ball 84 capable of resting on the seat 82.

[0047] The piston pump is further provided with a suction valve 86 arranged at the inlet 26 of the metering pump.

[0048] The suction valve prevents fluid from escaping from the metering pump at the inlet 26.

[0049] The suction valve comprises, for example, a seat 88 surrounding the inlet 26 and a ball 90 capable of resting on the seat.

[0050] During the suction phase of the metering pump, the piston head 72 moves towards the outlet 28. The volume contained in the downstream chamber 76 is expelled through the outlet 28. In addition, a vacuum is created in the upstream chamber 74, and a fluid is sucked at the inlet 26, more particularly corresponding to the cylinder capacity of the pump.

[0051] More particularly, the ball 90 of the suction valve 86 moves away from the seat 88 because of the depression generated in the upstream chamber 74, and the ball 84 of the discharge valve 78 rests on the seat 82 because of the overpressure in the downstream chamber.

[0052] During the non-suction phase of the metering pump, the piston head moves towards the inlet 26. No fluid enters through the inlet 26. The volume contained in the downstream chamber 76 is expelled through the outlet 28. A portion of the volume, here half of the volume, contained in the upstream chamber 74 moves into the downstream chamber 76.

[0053] More particularly, the ball 90 of the suction valve 86 rests on its seat 88 because of the overpressure generated in the upstream chamber 74, and the ball 84 of the suction valve discharge 78 moves away from its seat 82 and releases the opening 80 because of the depression in the downstream chamber 76.

[0054] Alternatively, during the suction phase, a volume corresponding to the displacement of the metering pump enters the metering pump at the inlet, and no fluid exits the pump at the outlet, and during the non-suction phase, a volume corresponding to the displacement of the metering pump exits the pump at the outlet, and no fluid enters the metering pump at the inlet.

[0055] Alternatively, the metering pump comprises a piston comprising a head having no opening and defining two non-communicating chambers, including a pumping chamber. The inlet and outlet of the metering pump are arranged in the same pumping chamber. The inlet and outlet open more particularly into the pumping chamber opposite the other chamber delimited by the head. The inlet and outlet are, for example, each equipped with a non-return valve. The metering pump then has a suction phase, in which the pump sucks in a volume of fluid, for example equivalent to the displacement of the pump, and does not expel any fluid, and a non-suction phase, in which the pump expels said volume of fluid.

[0056] Alternatively to the piston pump, the metering pump is a diaphragm pump or a ball pump.

[0057] The outlet 28 is adapted to be connected to the coating product applicator 13, so that the metering pump 14 supplies the coating product applicator.

[0058] The inlet is connected to the gas supply path 20 and / or the solvent supply path 22, and further to the plurality of respective component product supply paths 16, 18 if applicable.

[0059] In the example shown, a connector is arranged at the input 26.

[0060] The connector is, for example, a distribution block.

[0061] The connector is connected to each of the power supply channels.

[0062] Each component product supply line 16, 18 is capable of supplying the inlet of the metering pump 14 with the corresponding component product, for example from a respective reservoir 30, 32 specific to said supply line containing the corresponding component product.

[0063] The component product supply paths 16, 18 meet, for example, upstream of the inlet at a connection point, the connection point being connected to the inlet.

[0064] The connection point is, for example, adjacent to input 26.

[0065] Alternatively, each component product supply path 16, 18 is connected to the input 26 separately from each other.

[0066] Each component product supply line 16, 18 is provided with a respective valve 34, 36.

[0067] The respective valve 34, 36 is arranged upstream of the inlet 26, more particularly upstream of the connection point where appropriate.

[0068] The respective valve 34, 36 is here arranged downstream of the respective reservoir 30, 32.

[0069] Each valve 34, 36 has at least one closed configuration, in which the valve prevents the passage of the corresponding component product through said valve, i.e. here towards the inlet 26, and at least one open configuration, in which the valve allows the passage of the corresponding component product through said valve, i.e. here towards the inlet 26.

[0070] Each valve 34, 36 here has a closed configuration and a plurality of open configurations. The flow rates of the corresponding component product through said valve differ according to the open configurations.

[0071] Alternatively, each valve 34, 36 here has only one closed configuration and one open configuration.

[0072] The flow rate of the corresponding component product in the supply line is then, for example, adjustable at another location on the supply line, for example with a flow control valve, for example at the applicator 13 or on the outlet line 44.

[0073] The gas supply path 20 is capable of supplying the inlet 26 with gas, more particularly with air, for example with compressed air.

[0074] The solvent supply line 22 is capable of supplying the inlet 26 with solvent, for example from a solvent reservoir 38 containing solvent.

[0075] In one embodiment, the solvent feed route is also considered a component product feed route, as described above, the multi-component product comprising solvent.

[0076] The gas supply path 20 and the solvent supply path 22 meet, for example, upstream of the inlet at a connection point, the connection point being connected to the inlet. The connection point is, for example, the same as the connection point of the component product supply paths 16, 18, all of the supply paths meeting at said connection point.

[0077] Alternatively, each supply channel 16, 18, 20, 22 is connected to the input 26 separately from each other.

[0078] The gas supply line 20 is provided with a gas valve 40.

[0079] More particularly, in the example shown, the gas valve 40 is arranged at the upstream end of the gas supply line 20.

[0080] The gas valve 40 is, for example, capable of taking gas, more particularly air, from the atmosphere surrounding the metering device 10.

[0081] The gas valve 40 is arranged upstream of the inlet 26, more particularly upstream of the connection point where applicable.

[0082] The gas valve 40 has at least one closed configuration, in which the valve prevents the passage of gas through the valve 40 to the inlet 26, and at least one open configuration, in which the valve allows the passage of gas through the valve 40 to the inlet 26.

[0083] As described previously with respect to the valves 34, 36, the gas valve 40 has, for example, a closed configuration and a plurality of open configurations, or alternatively only a closed configuration and an open configuration.

[0084] The solvent supply line 22 is provided with a solvent valve 42.

[0085] The solvent valve 42 is arranged upstream of the inlet 26, more particularly in upstream of the connection point where applicable.

[0086] The solvent valve 42 is here arranged downstream of the solvent reservoir 38.

[0087] The solvent valve 42 has at least one closed configuration, in which the valve prevents the passage of solvent through the valve 42 to the inlet, and at least one open configuration, in which the valve allows the passage of solvent through the valve 42 to the inlet 26.

[0088] As described previously with respect to the valves 34, 36, the solvent valve 42 has, for example, a closed configuration and a plurality of open configurations, or alternatively only a closed configuration and an open configuration.

[0089] The application device 12 further comprises an output line 44.

[0090] The output line 44 here extends between an upstream end and a downstream end.

[0091] The output line 44, more particularly the upstream end, is connected to the output 28 of the dosing pump 14.

[0092] The downstream end is connected to the applicator 13.

[0093] More particularly, the metering pump 14 expels the product contained in the metering pump into the outlet line 44.

[0094] The dosing device 10 further comprises a mixer 45, here a mechanical mixer, more particularly a static mixer, downstream of the outlet 28 of the dosing pump, more particularly arranged adjacent to the outlet 28 of the dosing pump.

[0095] The mixer 45 is here arranged in the outlet line 44, more particularly at the upstream end of the outlet line 44.

[0096] The dosing device 10 is, in addition, here provided with a sensor 46 of the volume entering the dosing pump 14 or a displacement sensor of the dosing pump 14.

[0097] In the example shown, the sensor 46 is capable of and arranged to measure the de- placement of the dosing pump piston 14.

[0098] Alternatively, the sensor 46 is capable of detecting a parameter relating to the metering pump, said parameter depending directly on the volume entering the metering pump 14.

[0099] For example, in the case of a pump having a notched gear, the sensor is, for example, capable of detecting the notch of the engaged gear.

[0100] Additionally or alternatively, the sensor 46 is arranged at the inlet 26 and measures the volume of fluid entering the metering pump 14 through the inlet 26.

[0101] The sensor 46 provides, for example, an analog signal, for example the incoming volume or the displacement of the piston.

[0102] Alternatively, the sensor 46 provides a digital signal, for example, a notch of a gear or corresponding to a threshold of displacement of the piston or of incoming volume.

[0103] The electronic device 24 comprises an information processing unit formed for example of a memory and a processor associated with the memory.

[0104] The electronic device 24 comprises a control module 48.

[0105] The control module 48 is capable of controlling the respective valves 34, 36 of the supply channels, more particularly as described below.

[0106] The control module 48 is, for example, connected to the valves 34, 36, for example by wire or by a remote connection.

[0107] The control module 48 is further capable of controlling the gas valve 40 and the solvent valve 42, if applicable.

[0108] The control module 48 is, for example, connected to the valves 40, 42, for example by wire or by a remote connection.

[0109] The response time for each of the valves 34, 36, 40, 42 from the command of the control module 48 is between 100 and 250 milliseconds.

[0110] The control module 48 is configured to implement the suction as described in the dosing method described subsequently.

[0111] The control device 24 further comprises a tracking module 50.

[0112] The tracking module 50 is connected to the control module 48.

[0113] The tracking module 50 is further connected to the sensor 46, for example in a manner wired or via a remote connection.

[0114] More particularly, the tracking module 50 is adapted to receive information from the sensor 46, more particularly the signal provided by the sensor 46 comprising the measurements carried out by the sensor 46.

[0115] The monitoring module 50 is capable of determining the quantity of volume entering the metering pump 14 and the nature of the fluid entering the pump 14, depending on the configuration of each of the valves.

[0116] The monitoring module 50 is then able to determine the quantity of each fluid successively entering the metering pump 14.

[0117] The control module 48, and where appropriate, the tracking module 50 are each produced in the form of software, or a software brick, executable by the processor. The memory of the electronic device is then capable of storing control software and tracking software. The processor is then capable of executing each of the software among the control software and the tracking software.

[0118] In a variant not shown, the control module 48, and where appropriate, the tracking module 50 are each produced in the form of a programmable logic component, such as an FPGA (Field Programmable Gate Array), or an integrated circuit, such as an ASIC (Application Specific Integrated Circuit).

[0119] When the electronic device is produced in the form of one or more software programs, that is to say in the form of a computer program, also called a computer program product, it is also capable of being recorded on a medium, not shown, that is readable by a computer. The computer-readable medium is, for example, a medium capable of storing electronic instructions and of being coupled to a bus of a computer system. For example, the readable medium is an optical disk, a magneto-optical disk, a ROM memory, a RAM memory, any type of non-volatile memory (for example FLASH or NVRAM) or a magnetic card. A computer program comprising software instructions is then stored on the readable medium.

[0120] In the example of [Fig. 1], the fluid is sucked in by the metering pump 14, during the suction phase, by a so-called passive suction, that is to say that, during the suction phase, the metering pump 14 creates a depression at its inlet 26, which attracts a fluid, more particularly the fluid(s) coming from a channel whose corresponding valve is in the open configuration.

[0121] Such a device is particularly simple.

[0122] A second example of application 112 of a coating product for application according to a second embodiment of the invention will now be described with reference to [Fig.2].

[0123] Only the features by which this second embodiment differs from the first embodiment will be described here. With the exception of these features, the application device 112 is otherwise identical to the first example application device.

[0124] Identical or similar elements have the same numerical reference incremented by 100.

[0125] In the second embodiment, the gas supply path 120 is provided with a compressor 164, the compressor 164 being adapted to compress the gas to inlet 126 of the dosing pump 114.

[0126] The compressor 164 is arranged upstream of the gas valve 140.

[0127] The compressor 164 is, more particularly, capable of taking gas, more particu air, into the atmosphere surrounding it, and compressing said gas in the gas supply path 120 upstream of the gas valve. 140.

[0128] The solvent supply path 122 is provided with a secondary solvent pump 166, the secondary solvent pump 166 being adapted to pump the solvent to the inlet 126 of the metering pump 114.

[0129] The secondary solvent pump 166 is arranged upstream of the solvent valve 142.

[0130] The secondary solvent pump 166 is, for example, arranged downstream of a solvent reservoir (not shown).

[0131] Furthermore, each component product supply path 116, 118 comprises a respective secondary pump 160, 162, the respective secondary pump 160, 162 being adapted to pump the respective component product towards the inlet 126 of the metering pump 114.

[0132] Each respective secondary pump 160, 162 is arranged upstream of the respective valve 134, 136 of the supply path 116, 118.

[0133] Each respective secondary pump 160, 162 is, for example, arranged downstream of a respective reservoir (not shown).

[0134] In the example of [Fig.2], the fluid is sucked, during the suction phase, by the metering pump 114 by a so-called active suction, that is to say that the fluid is pushed towards the inlet 126 by the corresponding secondary pump or the compressor. During the suction phase, the metering pump 114 then sucks the pushed fluid, more particularly the fluid(s) coming from a channel whose corresponding valve is in the open configuration.

[0135] Such an application device 12; 112 is capable of coating a coating product metered by the metering device 10; 110, more particularly by expelling the coating product at the level of the applicator 13; 113.

[0136] More particularly, the dosing device 12; 112 is capable of dosing the different component products to form a single or multi-component product, preferably multi-component, in particular here by selectively moving the valves 34, 36; 134, 136 in the open configuration during the suction phase of the dosing pump 14; 114 according to the component product to be sampled to form the multi-component product.

[0137] The dosage is, for example, implemented and controlled by the electronic device 24; 124.

[0138] The multi-component product is, for example, pre-mixed by the movement of the piston head, in the example of the pump described with reference to [Fig.3].

[0139] The multi-component product is, for example, mixed by the mixer 45; 145 on the output line 44; 144.

[0140] Then, the single or multi-component product, preferably multi-component, forming the coating product, is expelled by the applicator 13; 113, more particularly towards a surface to be coated.

[0141] Following the application step, multi-component product is therefore present in the application device 12; 112. The application device 12; 112 is then, for example, rinsed.

[0142] A method of rinsing a coating product application device as described above will now be described.

[0143] The rinsing method comprises a step of suction by the metering pump of a volume during a suction phase of the metering pump, the gas valve and the solvent valve being alternately, one after the other, in the open configuration during the suction, so that the volume sucked during said suction phase alternately comprises gas and solvent.

[0144] More particularly, the rinsing method comprises such a suction step during each of the suction phases of the metering pump 14, 114, throughout the duration of the rinsing.

[0145] The control module 48, 148 implements the suction step by successively controlling the valves, more particularly the gas valve and the solvent valve.

[0146] The minimum volume of solvent sucked in when a valve is opened is, for example, greater than or equal to 0.5 cubic centimeters, more particularly greater than or equal to 1 cubic centimeter, more particularly between 1 and 100 cubic centimeters.

[0147] The maximum volume of solvent sucked in when a valve is opened is, for example, less than or equal to 1000 cubic centimeters, more particularly between 300 and 1000 cubic centimeters.

[0148] The gas valve 40; 140 is, for example, moved to the open configuration for a duration of between 1 cycle and 100 pump cycles, more particularly between 4 and 10 cycles.

[0149] At any time, at most one valve of the feed or gas or solvent channels is open at a time.

[0150] More particularly, the suction comprises, in this order, the following steps:

[0151] - opening a first valve among the gas valve and the solvent valve,

[0152] - suction of a first volume of gas or solvent by the metering pump,

[0153] - closing of the first valve,

[0154] - opening a second valve among the gas valve and the solvent valve, the second valve being different from the first valve,

[0155] - suction of a second volume of gas or solvent, and

[0156] - closing of the second valve,

[0157] said previous steps being repeated throughout the suction phase of the metering pump 14; 114.

[0158] The first volume remains the same throughout the suction phase, more particularly during all the suction phases of the rinse.

[0159] The second volume remains the same throughout the suction phase, more particularly during all the suction phases of the rinse.

[0160] The suction presents, more particularly here, a suction cycle comprising a suction of gas and a suction of solvent by the metering pump, said suction cycle being repeated throughout the suction phase, more particularly during all the suction phases of the rinsing.

[0161] If at the end of a suction phase, a suction cycle is in progress, said suction cycle resumes where it was interrupted during the following suction phase.

[0162] For example, for a pump suction volume of 100cc, if the volume of solvent to be sucked is 32cc and air 55cc, then, during the first suction phase, it is, for example, sucked successively: 32 cc of solvent, 55 cc of air, then only 13 cc of solvent. Thus, the second suction phase begins with the suction of 19 cc of solvent, then 55 cc of air, then 26 cc of solvent, and so on for the following suction phases.

[0163] Here, the volume sucked up by the metering pump 14, 114 during each of its suction phases comprises an alternation of solvent and gas, which is repeated along the sucked up volume.

[0164] Alternatively, the volume of solvent and / or air to be sucked is greater than or equal to the suction volume of the pump. Where appropriate, the volume sucked by the metering pump 14, 114 during a suction phase may comprise only solvent or only gas. However, the volume sucked by the metering pump 14, 114 during all of its suction phases comprises an alternation of solvent and gas, which is repeated along the sucked volume.

[0165] For example, with a pump suction volume of 25 cc, if the volume of solvent to be sucked is 78 cc and air 105 cc, then several suction phases follow one another to pump the correct volume of air on the one hand and solvent on the other.

[0166] The rinsing method advantageously comprises detection of the volume sucked during suction by the metering pump, more particularly by the sensor 46; 146.

[0167] In the first embodiment, the detection of the volume of gas, here air, sucked in, is directly implemented at the level of the metering pump.

[0168] In the second embodiment, the detection of the volume of gas, here air, compressed gas entering the metering pump is, for example, carried out at the compressor 164 by activating the compressor 164 for a given duration. Additionally or alternatively, the detection of the volume of gas, here air, compressed entering the metering pump is directly implemented at the metering pump.

[0169] During suction, when solvent is sucked by the metering pump 14, 114, when the quantity of the sucked solvent monitored by the tracking module 50, 150 reaches the desired quantity, then the control module 48, 148 sends an instruction to the solvent valve to switch to the closed configuration, then sends an instruction to the gas valve to switch to the open configuration.

[0170] Then, for example, when the quantity of aspirated gas monitored by the monitoring module 50, 150 reaches the desired quantity, in particular in the first embodiment, then the control module 48, 148 sends an instruction to the gas valve to switch to the closed configuration, then sends an instruction to the solvent valve to switch to the open configuration, and so on.

[0171] Alternatively, in the second embodiment, when the gas valve 140 and the compressor 164 have remained respectively open and activated for a given duration, then the control module 48, 148 sends an instruction to the gas valve to switch to the closed configuration, then sends an instruction to the solvent valve to switch to the open configuration, and so on.

[0172] In the example described, during suction, the metering pump 14, 114 further expels a portion, here half of the cylinder capacity of the metering pump, of fluid at the outlet 28.

[0173] Said fluid comprises solvent and gas, here air, for example compressed.

[0174] The fluid is, for example, pre-mixed by the movement of the piston head, in the pump example described with reference to [Fig.3].

[0175] The fluid is, for example, mixed by the mixer 45; 145 on the outlet line 44; 144.

[0176] An emulsion is created.

[0177] The emulsion flows along the outlet line 44; 144 to the applicator 13; 113.

[0178] The applicator 13; 113 is thus also rinsed by the emulsion.

[0179] When the metering pump comprises a suction phase and a suction-free phase aspiration, during the non-aspiration phase, all the valves are, for example, in closed configuration.

[0180] Alternatively, if during the suction phase, the volume to be sucked of the last fluid being sucked is not reached, then the corresponding valve remains in the open configuration during the non-suction phase, and will be closed during a next suction phase when the volume to be sucked is reached.

[0181] Thus, the rinsing method alternately comprises a suction step and a non-suction step.

[0182] During the step without suction, in the example described previously, the metering pump expels a complementary portion of the portion expelled during suction, here half of the displacement of the metering pump, of fluid at the outlet 28.

[0183] As previously, said fluid comprises solvent and gas, here air, for example compressed.

[0184] The fluid is, for example, pre-mixed by the movement of the piston head, in the pump example described with reference to [Fig.3].

[0185] The fluid is, for example, mixed by the mixer 45; 145 on the outlet line 44; 144.

[0186] An emulsion is created.

[0187] The emulsion flows along the outlet line 44; 144 to the applicator 13; 113.

[0188] The applicator 13; 113 is thus also rinsed by the emulsion.

[0189] This rinsing method is implemented directly by the electronic device 24; 124 of the application device 12; 112.

[0190] More particularly, the control module 48; 148 implements the suction step by successively controlling the gas valve 40; 140 and the solvent valve 42; 142.

[0191] Advantageously, the monitoring module 50; 150 allows monitoring of the quantity (in volume and / or in time) of solvent and gas sucked in by the metering pump 14; 114.

[0192] Rinsing can therefore be carried out without human intervention.

[0193] Furthermore, by alternating the solvent and gas in the inlet volume of the metering pump, this makes it possible to create an emulsion which is used to rinse the application device. This makes it possible to reduce the quantity of solvent used for rinsing.

Claims

Claims

1. Method for rinsing a coating product application device (12; 112) comprising a metering device (10; 110) and a coating product applicator (13; 113), the metering device (10; 110) comprising a metering pump (14; 114) having an inlet (26; 126) and an outlet (28; 128), the inlet (26; 126) being connected to a gas supply path (20; 120) and a solvent supply path (22; 122), the outlet (28; 128) being connected to the coating product applicator (13; 113), the gas supply path (20; 120) being provided with a gas valve (40; 140), the solvent supply path (22; 122) being provided with a solvent valve (42; 142), each of the gas and solvent valves (40, 42; 140, 142) having at least one closed configuration, wherein the valve (40, 42;140, 142) prevents the passage of gas or solvent respectively towards the inlet, and at least one open configuration, in which the valve (40, 42; 140, 142) allows the passage of gas or solvent respectively towards the inlet, the method comprising at least one step of suction by the metering pump (14; 114) of a volume during at least one suction phase of the metering pump (14; 114), the gas valve (40; 140) and the solvent valve (42; 142) being alternately in the open configuration during the at least one suction phase, so that the volume sucked during the at least one suction phase alternately comprises gas and solvent.;

2. A rinsing method according to claim 1, wherein the at least one suction phase comprises, in this order, the following steps: opening a first valve among the gas valve (40; 140) and the solvent valve (42; 142), suction of gas or solvent by the metering pump (14; 114) for a first volume, closing the first valve, opening a second valve among the gas valve (40; 140) and the solvent valve (42; 142), the second valve being different from the first valve, suction of gas or solvent by the metering pump (14; 114) for a second volume, and closing the second valve, said preceding steps being repeated throughout the at least one suction phase.

3. A rinsing method according to claim 1 or 2, wherein the suction comprises a suction cycle comprising a suction of gas and a suction of solvent by the metering pump (14; 114), said suction cycle being repeated throughout the suction phase.

4. A rinsing method according to any one of claims 1 to 3, comprising detecting the volume sucked during suction by the metering pump (14; 114), more particularly by a sensor (46; 146) of sucked volume or a sensor of movement of the metering pump (14; 114).

5. A rinsing method according to any one of claims 1 to 4, wherein the dosing device further comprises at least two supply lines (16, 18; 116, 118) for the respective component product.

6. A rinsing method according to any one of claims 1 to 5, wherein the metering pump (14; 114) is a piston pump.

7. A flushing method according to any one of claims 1 to 6, wherein the gas supply path (120) is provided with a compressor (164), the compressor (164) being adapted to compress the gas to the inlet (126) of the metering pump (114) upstream of the gas valve (140), the solvent supply path (122) being provided with a secondary solvent pump (166), the secondary solvent pump (166) being adapted to pump the solvent to the inlet (126) of the metering pump (114), the secondary solvent pump (166) being arranged upstream of the solvent valve (142).

8. A rinsing method according to any one of claims 1 to 7, wherein the dosing device (12; 112) comprises a mixer (45; 145) downstream of the outlet (28; 128) of the dosing pump (14; 114), more particularly arranged adjacent to the outlet of the dosing pump (14; 114).

9. A coating product application device (10; 110) comprising a metering device (10; 110) and a coating product applicator (13; 113), the metering device (10; 110) comprising a metering pump (14; 114), a gas supply path (20; 120) and a solvent supply path (22; 122), and a control module (48; 148), the metering pump (14; 114) having an inlet (26; 126) and an outlet (28; 128), the inlet (26; 126) being connected to the gas supply path (20; 120) and the solvent supply path (22; 122), the outlet (28; 128) being connected to the applicator (13; 113) of coating product, the gas supply path (20; 120) being provided with a gas valve (40; 140), the solvent supply path (22; 122) being provided with a solvent valve (42; 142), each of the gas and solvent valves (40, 42; 140, 142) having at least one closed configuration, in which the valve (40, 42; 140, 142) prevents the passage of gas or solvent respectively towards the inlet, and at least one open configuration, in which the valve (40, 42; 140, 142) allows the passage of gas or solvent respectively towards the inlet, the control module (48; 148) being able to control the gas valve (40; 140) and the solvent valve (42; 142), the control module (48; 148) being configured to implement suction according to the at least one suction step of the method according to any one of claims 1 to 8.

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