In-liquid posture conversion device and substrate processing apparatus including the same

Abstract

To provide an in-liquid posture conversion device that can be reduced in size and can reduce a load on a rotation mechanism, and a substrate processing apparatus including the same.SOLUTION: In a substrate processing apparatus, a posture conversion tank 33 of a batch type processing apparatus causes a lifting mechanism 61 to raise an inversion chuck 43 to a reception height, causes a drive mechanism 63 to receive a plurality of substrates W on the inversion chuck 43 having a first interval, causes the drive mechanism 63 to adjust the inversion chuck 43 to have a second interval, and causes the lifting mechanism 61 to lower the inversion chuck 43 to an immersion height, and causes a rotation mechanism 65 to drive the inversion chuck 43 around an axis AX1.EFFECT: Since postures of the plurality of substrates W can be converted in an immersion tank DB, and the plurality of substrates W are held not by an in-tank carrier but by the inversion chuck 43, the immersion tank DB can be reduced in size, and since the plurality of substrates W and the inversion chuck 43 are only rotated around the axis AX1, a load on the rotation mechanism 65 can be reduced.SELECTED DRAWING: Figure 8

Description

[Technical field]

[0001] The present invention relates to a submerged attitude changing device that changes the attitude of substrates such as semiconductor substrates, FPD (Flat Panel Display) substrates such as liquid crystal display and organic EL (Electroluminescence) display devices, glass substrates for photomasks, and substrates for optical disks, and a substrate processing apparatus equipped with the same. [Background technology]

[0002] Conventionally, this type of apparatus includes a batch module, a single-wafer module, and a posture conversion module (see, for example, Patent Document 1). The batch module processes multiple substrates at once. The single-wafer module processes substrates one by one. In general, the drying process using the single-wafer module has a smaller processing atmosphere space that affects the substrates and has higher particle performance than the drying process using the batch module. Therefore, the single-wafer module is easier to improve the drying performance than the batch module. Therefore, for example, after the etching process and rinsing process are performed in the batch module, the drying process is performed in the single-wafer module.

[0003] In the batch-type module, multiple substrates are processed in a vertical position. On the other hand, in the single-wafer-type module, substrates are processed in a horizontal position. Therefore, the substrates in a vertical position that have finished processing in the batch-type module are converted to a horizontal position by a position conversion module before being transferred to the single-wafer-type module.

[0004] In recent years, in the semiconductor field, the definition of three-dimensional patterns has been increasing. Therefore, there is a risk that the patterns on such substrates will collapse due to the influence of the gas-liquid interface when the substrate dries. Therefore, to prevent the substrate from drying after processing in the batch-type module, the substrate is kept wet before processing in the single-wafer-type module.

[0005] Specifically, multiple spray pipes are placed beside the attitude change module. The spray pipes spray pure water onto the substrates held in the attitude change module, thereby keeping the substrates wet until they are placed in the single-wafer module.

[0006] In an apparatus with such a configuration, there are times when the entire substrate is not sufficiently wetted due to the positional relationship between the substrate's position changed by the position changing module and the spray pipe. Also, even if pure water is sprayed from near the rotation mechanism, the presence of the rotation mechanism components causes a problem in that the entire substrate cannot be sufficiently wetted.

[0007] In view of this, a liquid attitude changing device has been proposed that includes an immersion tank that stores pure water, an in-tank carrier that can move up and down into and above the immersion tank and that stores multiple substrates, and a rotation mechanism that rotates the in-tank carrier. In this proposed device, multiple substrates in a vertical attitude are stored in the in-tank carrier, and the multiple substrates together with the in-tank carrier are immersed in the immersion tank. In this state, the in-tank carrier is vertically rotated by the rotation mechanism to change the attitude of the substrates in the pure water from a vertical attitude to a horizontal attitude. [Prior art documents] [Patent documents]

[0008] [Patent Document 1] Special Publication No. 2016-502275 Summary of the Invention [Problem to be solved by the invention]

[0009] However, the conventional example having such a configuration has the following problems. That is, in the conventional device, the size of the immersion tank is large, especially in the vertical direction, because the tank carrier is rotated vertically, and the load on the rotation mechanism is large because the tank carrier converts multiple substrates into a horizontal position.

[0010] The present invention has been made in consideration of the above circumstances, and an object of the present invention is to provide a posture changing device that can be made smaller and reduce the load on a rotation mechanism, and a substrate processing apparatus equipped with the same. [Means for solving the problem]

[0011] In order to achieve the above object, the present invention has the following configuration. That is, the invention described in claim 1 provides an in-liquid posture change device that changes the posture of a plurality of substrates, the device comprising: an immersion tank that stores a processing liquid; an inversion chuck that holds a plurality of substrates; an opening / closing drive mechanism that drives the inversion chuck to an open position for transferring the plurality of substrates between the inversion chuck and the inversion chuck and to a holding position for holding the plurality of substrates by the inversion chuck; a rotation drive mechanism that drives the inversion chuck about a horizontal axis to change the posture of the plurality of substrates; and a lift drive mechanism that raises and lowers the inversion chuck to a transfer position above the immersion tank and a conversion position within the immersion tank, wherein, with the inversion chuck raised to the transfer position by the lift drive mechanism, the inversion chuck, which has been set to the open position by the open / close drive mechanism, receives the plurality of substrates, and after the inversion chuck is set to the holding position by the open / close drive mechanism, the inversion chuck is lowered to the conversion position by the lift drive mechanism, and the inversion chuck is driven about the horizontal axis by the rotation drive mechanism.

[0012] [Action and Effect] According to the invention described in claim 1, the lifting drive mechanism lifts the inversion chuck to the transfer position. The opening and closing drive mechanism causes the inversion chuck to receive multiple substrates in the open position, and the opening and closing drive mechanism sets the inversion chuck to the holding position. The lifting drive mechanism lowers the inversion chuck to the conversion position. The rotation drive mechanism drives the inversion chuck around the horizontal axis. This allows the position of multiple substrates to be changed in the immersion tank. Since multiple substrates are held by the inversion chuck, not by an in-tank carrier, the immersion tank can be made smaller. Also, since the multiple substrates and the inversion chuck only need to be rotated around the horizontal axis, the load on the rotation mechanism can be reduced.

[0013] In addition, in the present invention, it is preferable that the rotation drive mechanism includes a rotation shaft having one end connected to the outside of the inversion chuck, a motor, and a transmission mechanism that transmits the rotational force of the motor to the rotation shaft, and further includes a bottomed container that houses the rotation shaft and the transmission mechanism, and that the transmission mechanism is raised and lowered together with the container by the lifting drive mechanism (Claim 2).

[0014] The transmission mechanism is housed in a bottomed container and is raised and lowered by a lifting drive mechanism. Therefore, the inversion chuck in the processing liquid of the immersion bath can be rotated around a horizontal axis. In addition, since the transmission mechanism is housed in a container, even if particles are generated in the transmission mechanism, the particles can be prevented from being mixed into the processing liquid of the immersion bath and contaminating the substrate.

[0015] In the present invention, it is preferable that the transmission mechanism includes a driven pulley provided on the other end side of the rotating shaft, a driving pulley attached to the motor, and a timing belt stretched between the driven pulley and the driving pulley (Claim 3).

[0016] The torque of the motor is transmitted to the reversing chuck by a timing belt that is stretched between the driving pulley and the driven pulley. This allows the weight of the transmission mechanism to be reduced, and as a result, the load on the lifting drive mechanism can be reduced.

[0017] In addition, in the present invention, it is preferable that the transmission mechanism includes a first bevel gear provided on the other end side of the rotating shaft, an extension shaft connected to the motor, and a second bevel gear provided on the lower end of the extension shaft and screwed into the first bevel gear (Claim 4).

[0018] The first bevel gear and the second bevel gear transmit the rotational force of the extension shaft connected to the motor to the reversing chuck. With a timing belt, there is a risk of transmission loss due to expansion and contraction. However, since the rotational force is transmitted by gears, the transmission loss of the rotational force can be reduced.

[0019] In addition, in the present invention, it is preferable that the lifting mechanism is equipped with a lifting frame that carries the rotation drive mechanism and extends outside the immersion tank and the container, and that the opening and closing drive mechanism is mounted on the lifting frame (Claim 5).

[0020] When the lifting mechanism lifts or lowers the lifting frame, the opening / closing drive mechanism and the rotation drive mechanism can also be lifted or lowered at the same time, thus simplifying the configuration.

[0021] In the present invention, it is preferable that the inside of the container is pressurized with gas (claim 6).

[0022] Since the container is pressurized, the processing liquid in the immersion tank can be prevented from entering the container, thereby preventing breakdowns caused by the processing liquid entering the container.

[0023] The invention described in claim 7 provides a substrate processing apparatus for processing substrates, the apparatus comprising: a batch processing section for processing a plurality of substrates collectively in a vertical position; a single wafer processing section for processing a single substrate in a horizontal position; a submerged position changing section for changing the position of the plurality of substrates after processing in the batch processing section from a vertical position to a horizontal position in a processing liquid; a first transport section for transporting the plurality of substrates after processing in the batch processing section to the submerged position changing section; and a second transport section for transporting the plurality of substrates that have been horizontally positioned in the submerged position changing section to the single wafer processing section, the submerged position changing section comprising an immersion tank for storing a processing liquid, an inversion chuck for holding the plurality of substrates, an opening position for transferring the plurality of substrates between the inversion chuck and the submerged position changing section, and a holding position for holding the plurality of substrates by the inversion chuck. and a lifting drive mechanism for raising and lowering the inversion chuck between a transfer position above the immersion tank and a conversion position within the immersion tank, wherein, with the inversion chuck raised to the transfer position by the lifting drive mechanism, the inversion chuck is caused to receive the multiple substrates into the inversion chuck set to the open position by the opening and closing drive mechanism, and after the inversion chuck is set to the holding position by the opening and closing drive mechanism, the inversion chuck is lowered to the conversion position by the lifting drive mechanism, and then the inversion chuck is driven about the horizontal axis by the lifting drive mechanism to convert the multiple substrates from the vertical position to the horizontal position.

[0024] [Function and Effect] According to the invention described in claim 7, the inversion chuck is raised to the delivery position by the lifting drive mechanism of the submerged position conversion unit. The inversion chuck, which is in the open position by the opening / closing drive mechanism, receives the substrates, and the inversion chuck is set to the holding position by the opening / closing drive mechanism. The inversion chuck is lowered to the conversion position by the lifting drive mechanism. The inversion chuck is driven around the horizontal axis by the rotation drive mechanism. This allows the substrates processed in the batch processing unit to be transported to the submerged position conversion unit by the first transport unit and converted from a vertical position to a horizontal position in the immersion tank. The substrates can then be transported to the single-wafer processing unit by the second transport unit. The submerged position conversion unit holds the substrates with the inversion chuck, not with a carrier in the tank, and the immersion tank can be made smaller. In addition, the load on the rotation mechanism can be reduced because the substrates and the inversion chuck are only rotated around the horizontal axis.

[0025] This specification also discloses an invention relating to a submerged attitude change device as follows.

[0026] In batch processing, a processing solution is stored in an immersion tank, and multiple substrates are immersed in the processing solution in a vertical position for processing. At this time, the processing solution is supplied upward from the bottom of the immersion tank in an upflow manner, and the processing solution is discharged over the upper edge of the immersion tank. By maintaining this state for a predetermined period of time, multiple substrates are processed at the same time.

[0027] However, when multiple substrates are placed in a vertical position, the degree of processing may differ between the upper and lower portions. In other words, there is a problem in that it is difficult to perform processing uniformly within the surface of the substrate. In other words, it is difficult to improve the uniformity within the surface.

[0028] Another object of the present invention has been made in view of the above circumstances, and is to provide an in-liquid posture changing device that can improve in-plane uniformity by turning a substrate upside down during processing.

[0029] (1) A liquid attitude change device for changing the attitude of a plurality of substrates, an immersion tank for storing a processing liquid; An inversion chuck for holding a plurality of substrates; an opening / closing drive mechanism that drives the inversion chuck to an opening position for transferring the plurality of substrates between the inversion chuck and the opening / closing drive mechanism and to a holding position for holding the plurality of substrates by the inversion chuck; a rotation drive mechanism that drives the inversion chuck around a horizontal axis to change the postures of the plurality of substrates; a lifting drive mechanism for lifting and lowering the inversion chuck between a transfer position above the immersion tank and a conversion position within the immersion tank; Equipped with a liquid posture change device for changing the substrate position in a liquid, the liquid being processed by the processing liquid, and the substrates being processed by the processing liquid when the substrates are transferred to the processing liquid from the processing liquid when the substrates are transferred to ...

[0030] According to the present invention, a plurality of substrates are treated with a treatment liquid in an immersion tank, and an inversion chuck is driven around a horizontal axis by a rotation drive mechanism to invert the plurality of substrates upside down. Thus, the upper and lower parts of the substrates can be swapped. Therefore, even if the degree of treatment progress differs between the upper and lower parts of the substrates, the degree of treatment progress can be averaged by swapping them. As a result, the in-plane uniformity can be improved.

[0031] (2) In the submerged posture changing device in (1), the upside-down inversion is performed after a predetermined period of processing with the processing liquid, and further processing is performed in the upside-down state for the same period of time as the previous processing with the processing liquid.

[0032] After the substrate is turned upside down, the processing is performed with the processing liquid for the same period of time as that performed before the substrate is turned upside down. Therefore, the upper and lower portions of the substrate can be processed uniformly. As a result, the in-plane processing uniformity can be improved. Effect of the Invention

[0033] According to the in-liquid posture change device of the present invention, the inversion chuck is raised to a transfer position by the lifting drive mechanism. The inversion chuck, which has been placed in an open position by the opening / closing drive mechanism, is caused to receive multiple substrates, and the inversion chuck is placed in a holding position by the opening / closing drive mechanism. The inversion chuck is lowered to the conversion position by the lifting drive mechanism. The inversion chuck is driven around a horizontal axis by the rotation drive mechanism. This makes it possible to change the posture of multiple substrates in the immersion tank. Since multiple substrates are held by the inversion chuck, rather than by an in-tank carrier, the immersion tank can be made smaller. Furthermore, since the multiple substrates and the inversion chuck only need to be rotated around the horizontal axis, the load on the rotation mechanism can be reduced. [Brief description of the drawings]

[0034] [Figure 1] 1 is a plan view showing an overall configuration of a substrate processing apparatus according to an embodiment; [Diagram 2] 2 is a cross-sectional view taken along the line AA in FIG. 1. [Diagram 3] FIG. 2 is a plan view showing the configuration of a 25-plate chuck and a reversing chuck. [Figure 4] FIG. 13 is a front view showing a state in which the reversal chuck is in an open position. [Diagram 5] FIG. 13 is a front view showing a state in which the reversal chuck is in a holding position. [Figure 6] FIG. 2 is a front view showing the configuration of the attitude changing tank, illustrating a state in which a substrate is held in a vertical attitude. [Figure 7] FIG. 2 is a front view showing the configuration of the attitude changing tank, illustrating a state in which a substrate is held in a horizontal attitude. [Figure 8] FIG. 4 is a partially cutaway front view showing the detailed structure of the posture changing tank. [Figure 9]FIG. 11 is a partially cutaway front view showing a detailed structure of another embodiment of the attitude changing tank. [Figure 10] 13 is a front view illustrating another example of the operation of the posture changing tank. FIG. [Figure 11] 13 is a front view illustrating another example of the operation of the posture changing tank. FIG. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0035] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0036] Fig. 1 is a plan view showing an overall configuration of a substrate processing apparatus according to an embodiment of the present invention, and Fig. 2 is a cross-sectional view taken along line AA in Fig. 1.

[0037] <1. Overall composition>

[0038] The substrate processing apparatus 1 processes substrates W. For example, the substrate processing apparatus 1 performs chemical processing, cleaning processing, drying processing, etc. on the substrates W. The substrate processing apparatus 1 employs a processing method (a so-called hybrid method) that combines the batch type and single-wafer type. The batch type processes multiple substrates W collectively in a vertical position. The single-wafer type processes a single substrate W in a horizontal position.

[0039] The substrate processing apparatus 1 includes a batch processing apparatus 3 and a single wafer processing apparatus 5. In this embodiment, the single wafer processing apparatus 5 is disposed adjacent to the batch processing apparatus 3. The batch processing apparatus 3 and the single wafer processing apparatus 5 are disposed apart from each other. The batch processing apparatus 3 and the single wafer processing apparatus 5 are connected by a bridge section 7.

[0040] <2. Batch processing equipment>

[0041] The batch processing apparatus 3 collectively processes a plurality of substrates W. The batch processing apparatus 3 includes a carry-in block 9, a stocker block 11, a transfer block 13, a position changing block 15, and a processing block 17.

[0042] For convenience, in this specification, the direction in which the loading block 9, the stocker block 11, the transfer block 13, and the processing block 17 are lined up is referred to as the "front-rear direction X." The front-rear direction X is horizontal. Within the front-rear direction X, the direction from the stocker block 11 toward the loading block 9 is referred to as the "front." The direction opposite to the front is referred to as the "rear." The horizontal direction perpendicular to the front-rear direction X is referred to as the "width direction Y." One direction in the "width direction Y" is referred to as the "right" as appropriate. The direction opposite to the right is referred to as the "left." The direction perpendicular to the horizontal direction is referred to as the "vertical direction Z." In each figure, for reference, front, back, right, left, top, and bottom are indicated as appropriate.

[0043] <3. Carry-in block>

[0044] The carry-in block 9 includes a loading section 19. The loading section 19 is disposed in front X of the batch processing apparatus 3. The carrier C stores a plurality of (e.g., 25) substrates W in a horizontal position, stacked at regular intervals in the vertical direction Z. The carrier C has a plurality of grooves (not shown) formed therein, which separate the surfaces of the substrates W from each other and accommodate the substrates W one by one. An example of the carrier C is a front opening unify pod (FOUP). The FOUP is a sealed container. The carrier C may be an open container, and any type of carrier is acceptable. The loading section 19 includes, for example, two mounting tables 21 on which the carriers C are placed. The two mounting tables 21 are disposed, for example, along the width direction Y. The loading section 19 is also called a load port.

[0045] <4. Stocker block>

[0046] The stocker block 11 is disposed adjacent to the rear X of the carry-in block 9. The stocker block 11 includes a transport storage unit ACB. The transport storage unit ACB includes a transport mechanism 23 and a shelf 25.

[0047] The transport mechanism 23 transports the carrier C. The transport storage unit ACB includes a plurality of shelves 25. Some of the shelves 25 are simply temporarily placed on the carrier C, and others are placed on the carrier C for transfer to and from the first transport mechanism HTR. The transport storage unit ACB takes in the carrier C storing the unprocessed substrate W from the input unit 19 and places it on the shelf 25. The transport storage unit ACB transports and places the carrier C on the transfer shelf 25 according to a schedule that defines the order of processing. The transport storage unit ACB transports and places the emptied carrier C placed on the transfer shelf 25 on the shelf 25. The transport storage unit ACB unloads the empty carrier C placed on the shelf 25 to the placement table 21 according to the availability of the placement table 21. The empty carrier C is transported to the single-wafer processing unit 5. In the empty carrier C transported to the single-wafer processing section 5, for example, a substrate W that was stored in this carrier C before processing and has completed processing is stored in the single-wafer processing section 5.

[0048] <5. Transfer block>

[0049] The transfer block 13 is disposed adjacent to the rear X of the stocker block 11. The transfer block 13 includes a transfer mechanism CTC. The transfer mechanism CTC includes a first transport mechanism HTR, a conversion mechanism HVC, a pusher PH, and a second transport mechanism WTR.

[0050] A first transport mechanism HTR is disposed on the right side Y of the rear X of the transport storage unit ACB. The first transport mechanism HTR transports a plurality of substrates W in a batch. In other words, the first transport mechanism HTR is equipped with a plurality of hands (not shown). One hand supports one substrate W. The first transport mechanism HTR can also transport only one substrate W. The first transport mechanism HTR takes out a plurality of substrates W (e.g., 25 substrates) in a batch from a carrier C placed on a delivery shelf 25 in the transport storage unit ACB, and transports them in a horizontal position to the conversion mechanism HVC. At this time, the conversion mechanism HVC converts the position of the substrates W from a horizontal position to a vertical position.

[0051] A conversion mechanism HVC and a pusher PH are arranged in this order to the left Y of the first transport mechanism HTR. The conversion mechanism HVC delivers multiple substrates W to the pusher PH. After receiving the multiple substrates W from the conversion mechanism HVC, the pusher PH moves in the width direction Y to the second transport mechanism WTR. At that time, the conversion mechanism HVC and the pusher PH assemble or disassemble a batch lot. The pusher PH delivers the multiple substrates W to the second transport mechanism WTR.

[0052] The transfer mechanism CTC combines, for example, a plurality of substrates W constituting one lot taken out from one carrier C with a plurality of substrates W constituting another lot taken out from another carrier C into one batch lot. This is the assembly of the batch lot. A batch lot is composed of twice as many substrates W as one lot. In the batch lot, each substrate W of one lot is arranged so as to be adjacent to each substrate W of the other lot. In other words, each substrate W of one lot is arranged in an odd-numbered position, and each substrate W of the other lot is arranged in an even-numbered position. Usually, the interval between the substrates W taken out from the carrier C is the same as that of the carrier C. This is called a full pitch. In one batch lot, for example, the interval between the substrates W is half of the full pitch. This is called a half pitch. As described above, a batch lot is combined with another lot, but there are two types of combination methods: front surface matching (also called face to face) and front and back surface matching (also called back to face). The combination method of the lots is determined by the operation of the pusher PH. In addition, details of this operation will be omitted in order to facilitate understanding of the present invention. In the following description, a plurality of substrates W will be referred to as a lot, but when a description specific to a batch lot is required, a plurality of substrates W will be referred to as a batch lot.

[0053] The second transport mechanism WTR is disposed to the left Y of the transfer mechanism CTC. The second transport mechanism WTR is configured to be movable between the transfer block 13 and the processing block 17. The second transport mechanism WTR is configured to be movable in the front-rear direction X. The second transport mechanism WTR includes a pair of hands 27 that transport a lot. The pair of hands 27 includes, for example, a rotation shaft oriented in the width direction Y. The pair of hands 27 swings around this rotation shaft. The pair of hands 27 clamps the side end faces of the substrates W constituting the lot, which are located in the front-rear direction X. The second transport mechanism WTR transfers the substrates W constituting the lot between the transfer mechanism CTC. The second transport mechanism WTR transfers the unprocessed substrates W constituting the lot to the processing block 17. The second transport mechanism WTR transfers the substrates W processed in the processing block 17 between the posture conversion block 15.

[0054] Here, processing block 17 will be described prior to posture transformation block 15.

[0055] <6. Processing block>

[0056] The processing block 17 includes, for example, a batch processing unit BPU. For example, the batch processing unit BPU includes six processing units. Specifically, the batch processing unit BPU includes a first batch processing unit BPU1, a second batch processing unit BPU2, a third batch processing unit BPU3, a fourth batch processing unit BPU4, a fifth batch processing unit BPU5, and a sixth batch processing unit BPU6. The number of batch processing units BPU is not limited to six. That is, the number of batch processing units BPU may be less than six, or may be seven or more.

[0057] The first batch processing unit BPU1 to the sixth batch processing unit BPU6 are arranged in a row in the front-rear direction X. Each of the first batch processing unit BPU1 to the sixth batch processing unit BPU6 includes a processing tank BB and a lifter LF. The processing tank BB stores a processing liquid. The processing liquid is pure water or a chemical liquid. The chemical liquid is, for example, an organic solvent or an etching liquid. The organic solvent is, for example, IPA (isopropyl alcohol). The etching liquid is, for example, a phosphoric acid solution.

[0058] The lifter LF moves up and down between a processing position inside the processing tank BB and a transfer position above the liquid level in the processing tank BB. The lifter LF transfers a plurality of substrates W between the second transport mechanism WTR and the transfer position. The first batch processing unit BPU1 to the sixth batch processing unit BPU6 are associated with each other, for example, in pairs. Specifically, the first batch processing unit BPU1 and the second batch processing unit BPU2 form one pair, the third batch processing unit BPU3 and the fourth batch processing unit BPU4 form one pair, and the fifth batch processing unit BPU5 and the second batch processing unit BPU6 form one pair. Each pair is assigned to perform, for example, a chemical liquid processing and a cleaning processing. The first batch processing unit BPU1 to the sixth batch processing unit BPU6 can process, for example, up to 50 substrates W at once. In other words, the first batch processing unit BPU1 to the sixth batch processing unit BPU6 can simultaneously process, for example, a maximum of one batch lot.

[0059] Each processing tank BB is supplied with processing liquid from below. The processing liquid is discharged over the upper edge of each processing tank BB. Each processing tank BB immerses multiple substrates W placed on a lifter LF in the processing liquid. Each lifter LF abuts and holds the lower edge of the substrate W. Each lifter LF transfers multiple substrates W between the second transport mechanism WTR and the processing tank BB.

[0060] <7. Posture change block>

[0061] 2, the posture changing block 15 includes a 25-chuck TFC, a standby tank 31, and a posture changing tank 33. In the drawings referring to the standby tank 31 and the posture changing tank 33, the liquid levels are omitted so that each component can be easily seen.

[0062] The standby tank 31 includes a processing tank BB0 and a lifter LF0. The processing tank BB0 has the same configuration as the processing tank BB included in the first batch processing unit BPU1 to the sixth batch processing unit BPU6 described above. The lifter LF0 moves up and down between a standby position inside the processing tank BB0 and a transfer position above the liquid level in the processing tank BB0. The standby tank BB0 stores a processing liquid. The processing liquid is, for example, pure water. At the standby position, the substrate W placed on the lifter LF0 is entirely submerged in the processing liquid.

[0063] Here, reference is made to Fig. 3. Fig. 3 is a plan view showing the configuration of the 25-blade chuck and the reversal chuck.

[0064] The 25-plate chuck TFC moves horizontally only in the width direction Y as a whole. The 25-plate chuck TFC does not move up and down in the vertical direction Z. The 25-plate chuck TFC does not move horizontally in the front-rear direction X. However, the 25-plate chuck TFC opens and closes the hand 35 between the holding position PC and the passing position PT. At the holding position PC, the 25-plate chuck TFC holds multiple substrates W. At the passing position PT, the 25-plate chuck TFC does not hold multiple substrates W. In other words, the passing position PT allows the lifter LF0 holding multiple substrates W to move between the transfer position and the standby position. The 25-plate chuck TFC moves, for example, in the width direction Y to three positions: a first transfer position P1, a second transfer position P2, and a third transfer position P3.

[0065] The 25-substrate chuck TFC includes a locking portion 37. The locking portion 37 is provided inside the hand 35. The locking portions 37 are formed in the width direction Y at intervals of the above-mentioned full pitch. The first transfer position P1 and the second transfer position P2 differ in position in the width direction Y by a distance corresponding to the half pitch. The third transfer position P3 is a position where a plurality of substrates W are transferred to the posture change tank 33. The 25-substrate chuck TFC receives only one lot from the lifter LF0 at the first transfer position P1. Specifically, of the two lots constituting the batch lot, it receives only the plurality of substrates W that are odd numbers constituting the first lot. The 25-substrate chuck TFC receives only the other lot from the lifter LF0 at the second transfer position P2. Specifically, of the two lots constituting the batch lot, it receives only the plurality of substrates W that are even numbers constituting the next lot.

[0066] Here, in addition to Fig. 2 and Fig. 3, Fig. 4 to Fig. 7 will be further referred to. Fig. 4 is a front view in a state where the inversion chuck is at a first interval. Fig. 5 is a front view in a state where the inversion chuck is at a second interval. Fig. 6 is a cross-sectional view in a state where the inversion chuck is at the first interval. Fig. 7 is a cross-sectional view in a state where the inversion chuck is at the second interval.

[0067] As shown in FIG. 2, the position changing tank 33 includes a dipping tank DB and a position changing section 41.

[0068] First, the main parts will be described. In the posture changing tank 33, the postures of a plurality of substrates W are changed collectively in the immersion tank DB by the inversion chuck 43. Specifically, the inversion chuck 43 changes the posture of the plurality of substrates W from a vertical posture to a horizontal posture. The inversion chuck 43 changes the posture of, for example, half of the substrates W constituting a batch lot. The inversion chuck 43 changes the posture of, for example, 25 substrates W. The inversion chucks 43 are disposed opposite each other in the radial direction of the substrates W and hold the peripheral portions of the substrates W. The immersion tank DB stores a processing liquid. The processing liquid is, for example, pure water.

[0069] 4 and 5, the inversion chuck 43 includes a pair of chuck members 45. The length of the chuck members 45 in the vertical direction Z when receiving or holding the vertically oriented substrate W is shorter than the radius of the substrate W. As shown in Figs. 3 and 7, the length of the chuck members 45 in the width direction Y when receiving or holding the vertically oriented substrate W is slightly longer than the length of the substrates W in the alignment direction in a lot.

[0070] 4 and 5, each chuck member 45 has a groove portion 47 on the opposing surface. The groove portion 47 has an arc shape when viewed from the width direction Y in a vertical position for receiving and holding the vertically oriented substrate W. The arc shape of the groove portion 47 follows the outer edge of the substrate W.

[0071] The pair of chuck members 45 move in the front-rear direction X over a first distance WD1 and a second distance WD2. The pair of chuck members 45 can change the distance between the opposing grooves 47. The first distance WD1 is a distance for transferring substrates between the 25-plate chuck TFC and the bridging portion 7. The second distance WD2 is narrower in the front-rear direction X than the first distance WD1 and is a distance for clamping multiple substrates W.

[0072] Reference is now made to Fig. 8, which is a partially cutaway front view showing the detailed structure of the attitude changing tank.

[0073] The immersion tank DB is equipped with a pair of supply pipes 50. Each supply pipe 50 is disposed at the bottom of the immersion tank DB. Each supply pipe 50 is disposed at a corner in the front-rear direction X of the immersion tank DB. Each supply pipe 50 extends in the width direction Y. Each supply pipe 50 sprays and supplies the treatment liquid toward above the center of the immersion tank DB in the front-rear direction X, that is, diagonally upward. In other words, each spray pipe 50 sprays the treatment liquid toward the vicinity of the center of the substrate W when the substrate W is immersed in the immersion tank DB.

[0074] Alternatively, each supply pipe 50 may be configured to spray and supply the processing liquid toward the center of the bottom surface of the immersion tank DB. This allows the processing liquid to hit the bottom surface of the immersion tank DB once and then rise toward the center of the substrate W. Therefore, a strong flow of the processing liquid does not directly hit the substrate W. As a result, processing unevenness caused by the flow of the processing liquid can be suppressed, and in-plane uniformity can be further improved.

[0075] The posture changing tank 33 includes a lifting mechanism 61 , a driving mechanism 63 , and a rotating mechanism 65 .

[0076] The lifting mechanism 61 lifts and lowers the inversion chuck 43. The driving mechanism 63 opens and closes the inversion chuck 43. The rotating mechanism 65 rotates the inversion chuck 43.

[0077] The lifting mechanism 61 is disposed outside the immersion tank DB. In a plan view, the lifting mechanism 61 is disposed along the outer surfaces of two of the four side walls of the immersion tank DB that are provided in the front-rear direction X. As shown in FIG. 6, the lifting mechanism 61 raises and lowers the inversion chuck 43 to a receiving height HP1, a clamping height HP2, a locking height HP3, and an immersion height HP4. The receiving height HP1 is a height for receiving the substrate W in a vertical position in the inversion chuck 43. The clamping height HP2 is a height for clamping the substrate W in a vertical position by the inversion chuck 43. The locking height HP3 is a height for locking the substrate W in a vertical position clamped by the inversion chuck 43. The immersion height HP4 is a height for immersing the substrate W in a vertical position locked by the inversion chuck 43 in the processing liquid in the immersion tank DB.

[0078] The lifting mechanism 61 includes a base member 61a, a screw shaft 61b, a motor 61c, a lifting member 61d, and a lifting frame 61e.

[0079] The base member 61a is fixed to the bottom of the posture change tank 33. The screw shaft 61b is erected in the vertical direction Z from the base member 61a. The screw shaft 61b extends in the vertical direction Z. The screw shaft 61b is arranged along the outer side surface of the immersion tank DB. A motor 61c is attached to the upper part of the screw shaft 61b. The motor 61c has a rotation shaft facing downward. The motor 61c has a rotation shaft connected to the screw shaft 61b. The lifting member 61d is screwed into the screw shaft 61b. The lifting member 61d lifts and lowers in the vertical direction Z by the rotation of the screw shaft 61b. The lifting frame 61e is connected to the lifting member 61d. The lower part of the lifting frame 61e is connected to the lifting member 61d. The lifting frame 61e has an inverted L shape.

[0080] The driving mechanism 63 is mounted on the upper part of the lifting mechanism 61. The driving mechanism 63 includes an upper base member 63a, an air cylinder 63b, a moving piece 63c, a suspension arm 63d, and a linear guide 63e. The upper base member 61a is disposed on the upper part of the motor 61c and the lifting frame 61e. The air cylinder 63b is attached to the upper base member 63a. The air cylinder 63b has an operating axis oriented in the front-rear direction X. The suspension arm 63d has an inverted L shape. The horizontal part of the suspension arm 63d is attached to the upper part of the lifting frame 61e via the linear guide 63e. The suspension arm 63d is attached so as to be horizontally movable in the front-rear direction X by the linear guide 63e. The suspension arm 63d is movable in the horizontal direction relative to the lifting frame 61e. The driving mechanism 63 operates the air cylinder 63b to move the suspension arm 63d in the front-rear direction X. The driving mechanism 63 operates the air cylinder 63b to move the chuck member 45 between the first distance WD1 and the second distance WD2.

[0081] For example, the working shaft of the air cylinder 63b contracts when the air cylinder 63b is not in operation. For example, the working shaft of the air cylinder 63b extends when the air cylinder 63b is in operation. That is, when the air cylinder 63b is not in operation, the chuck 43 is at the first distance WD1. When the air cylinder 63b is in operation, the chuck 43 is at the second distance WD2.

[0082] The rotation mechanism 65 includes a rotation shaft 65 a , a motor 65 b , and a transmission mechanism 67 .

[0083] One end of the rotating shaft 65a is connected to the outer surface of the chuck member 45. The motor 65b is attached to the upper part of the moving piece 63c. The motor 65b is arranged horizontally. The other end of the rotating shaft 65a is stored in a container 69. The rotating shaft 65a is attached to the container 69 via a seal member 65c. The seal member 65c supports the rotating shaft 65a in a liquid-tight state. The rotating shaft 65a is attached to a suspension arm 63d via a bearing 65d. The bearing 65d supports the rotating shaft 65a so that it can rotate around the axis AX1. The other end of the rotating shaft 65a protrudes in the front-rear direction X from the outer surface of the suspension arm 63d.

[0084] The above-mentioned seal member 65c is preferably a mechanical seal or a VL seal. A mechanical seal is a seal that forms a liquid film on the sliding surface while acting as a lubricant with the liquid to be sealed. A VL seal is a seal that seals by tightening an L-shaped seal ring with an O-ring.

[0085] Container 69 has a bottom. Container 69 does not have a ceiling surface. In other words, the top surface of container 69 is connected to the surroundings. When inversion chuck 43 is located at immersion height HP4, the upper edge of container 69 is located above the upper edge of immersion tank DB. In other words, container 69 is not submerged in the processing liquid in immersion tank DB. Container 69 is raised and lowered in the vertical direction Z by lifting mechanism 61 together with suspension arm 63d.

[0086] The transmission mechanism 67 transmits the rotational force of the motor 65b to the rotation shaft 65a.

[0087] Specifically, the transmission mechanism 67 includes a driven pulley 67a, a driving pulley 67b, and a timing belt 67c. The driven pulley 67a is fixed to the other end of the rotating shaft 65a. The driving pulley 67b is attached to the motor 65a. The driving pulley 67b is rotated by the motor 65a. The timing belt 67c is stretched between the driven pulley 67a and the driving pulley 67b. When the motor 65b rotates, the rotating shaft 65a is rotated around the axis AX1 via the driving pulley 67b, the timing belt 67c, and the driven pulley 67d. As a result, the reversing chuck 43 is rotated around the axis AX1.

[0088] The drive mechanism 63 and the rotation mechanism 65 are mounted on the lifting mechanism 61. Therefore, the drive mechanism 63 and the rotation mechanism 65 are raised and lowered in the vertical direction Z by the lifting mechanism 61. The rotation mechanism 65 is mounted on the drive mechanism 63. Therefore, the rotation mechanism 65 is moved in the front-rear direction X by the drive mechanism 63.

[0089] The transmission mechanism 67 transmits the rotational force of the motor 65b to the reversing chuck 43 via a timing belt 67c wound around a driving pulley 67b and a driven pulley 67a. This makes it possible to reduce the weight of the transmission mechanism 67. As a result, the load on the lifting mechanism 61 can be reduced.

[0090] The container 69 is raised and lowered in the vertical direction Z by the lifting mechanism 61 together with the suspension arm 63d. Therefore, even if particles are generated in the rotation mechanism 65 or the transmission mechanism 67, the particles do not enter the processing liquid in the immersion tank DB. As a result, the substrate W can be prevented from being contaminated when the attitude is changed.

[0091] Now, returning to Figures 1 and 2.

[0092] <8. Bridging Section>

[0093] The bridge unit 7 connects the batch processing apparatus 3 and the single wafer processing apparatus 5. The bridge unit 7 is in communication only with the batch processing apparatus 3 and the single wafer processing apparatus 5. The bridge unit 7 includes a bridge robot BR. The bridge robot BR is configured to be movable only in the width direction Y. The bridge robot BR does not rise and fall in the vertical direction Z. The bridge robot BR includes a hand 71. The hand 71 is configured to be rotatable within a horizontal plane including the front-rear direction X and the width direction Y. The hand 71 is configured to be extendable and retractable in the horizontal direction. The bridge robot BR moves the hand 71 forward and backward to receive a single substrate in a horizontal position from the position changing block 15. The bridge robot BR delivers the single substrate in a horizontal position to the single wafer processing apparatus 5.

[0094] <9. Single-wafer processing equipment>

[0095] The single wafer processing apparatus 5 includes an unloading block 81, an indexer block 83, and a processing block 85.

[0096] <10. Carry-out block>

[0097] The unloading block 81 includes an unloading section 87. The unloading section 87 is disposed at the front X of the single wafer processing apparatus 5. The carrier C is placed on the unloading section 87. The unloading block 81 includes, for example, four unloading sections 87. The four unloading sections 87 are disposed along the width direction Y. The unloading sections 87 are also called load ports.

[0098] <11. Indexer Block>

[0099] The indexer block 83 includes an indexer robot IR. The indexer robot IR includes, for example, an articulated arm 89 and a hand 91. The indexer robot IR does not move in the width direction Y and the front-rear direction X. The indexer robot IR bends the articulated arm 89 to move the hand 91. The indexer robot IR raises and lowers the hand 91 in the vertical direction Z. The indexer robot IR can access each cassette C placed on the four unloading units 87. The indexer robot IR transports one substrate W with the hand 91. The indexer robot IR transports one substrate W from the processing block 85 to the unloading unit 87.

[0100] <12. Processing block>

[0101] The processing block 85 includes four towers TW1 to TW4 and a center robot CR.

[0102] The tower TW1 is disposed behind the indexer block 83, at the X side. The tower TW1 is disposed adjacent to the indexer block 83. The tower TW1 includes processing chambers-MPCs stacked in the vertical direction Z. The tower TW1 includes, for example, three processing chambers-MPCs. The processing chambers-MPCs process the substrates W one by one. The processing chambers-PMCs in the vertical direction Z perform, for example, a drying process on the substrates W.

[0103] The tower TW2 is disposed behind the tower TW1 at the X side. The tower TW2 is disposed adjacent to the tower TW1. The tower TW2 has the same configuration as the tower TW1. That is, the tower TW2 includes three processing chambers-MPCs stacked in the vertical direction Z.

[0104] Tower TW3 is disposed to the left Y of tower TW2. Tower TW3 is disposed to the left Y of tower TW2, with the center robot CR in between. Tower TW3 has the same configuration as towers TW1 and TW2. That is, tower TW3 includes three processing chambers MPC stacked in the vertical direction Z.

[0105] Tower TW4 differs in part in configuration from towers TW1 to TW4. That is, tower TW4 is provided with processing chambers-MPC at the bottom and top in the vertical direction Z. Tower TW4 is provided with a transfer section 93 at the center in the vertical direction Z. A single substrate W is placed on the transfer section 93. The transfer section 93 is provided with lifting pins 93a. The lifting pins 93a are raised and lowered when receiving the substrate W from the bridge robot BR. A single substrate W is placed on the transfer section 93 from the bridge robot BR. The substrate W placed on the transfer section 93 is received by the center robot CR.

[0106] The center robot CR is configured to be movable in the forward / backward direction X. The center robot CR is equipped with a hand 95. The hand 95 moves up and down in the vertical direction Z. The hand 95 is configured to be rotatable within a plane including the forward / backward direction X and the width direction Y. The hand 95 is moved so as to be able to access the processing chambers-MPC and the delivery unit 93 of the towers TW1 to TW4. In other words, the center robot CR can freely move the hand 95 in the vertical direction Z, the forward / backward direction X, and the width direction Y. The center robot CR delivers the processed substrate W to the indexer robot 83.

[0107] <13. Operation Description>

[0108] An example of processing performed by the substrate processing apparatus 1 will be described with reference to FIGS.

[0109] First, a rough outline of the overall process flow will be described.

[0110] <14. Batch processing>

[0111] A carrier C containing a plurality of unprocessed substrates W is placed on the input section 19. The carrier C is carried into the stocker block 11 by the transport mechanism 23. Two sets of a plurality of substrates W are assembled into a batch lot by the first transport mechanism HTR and the transfer mechanism CTC. The plurality of substrates W constituting the batch lot are transported to the processing block 17 by the second transport mechanism WTR. In the processing block 17, for example, an etching process using phosphoric acid is performed in the second batch processing unit BPU2. Then, the plurality of substrates W constituting the batch lot are subjected to a pure water cleaning process in the first batch processing unit BPU1. Next, the plurality of substrates W constituting the batch lot are transported to the attitude changing block 15 by the second transport mechanism WTR. In the attitude changing block 15, only one of the batch lots is transported to the attitude changing tank 33. In the attitude changing tank 33, the plurality of substrates W in the vertical attitude in the liquid of only one of the batch lots are changed to a horizontal attitude. Thereafter, a plurality of substrates W constituting one of the batch lots are transported one by one in sequence to the single-wafer processing apparatus 5. Thereafter, the other lot of the batch lot is similarly subjected to posture change and then transported to the single-wafer processing apparatus 5.

[0112] <15. Single-wafer processing>

[0113] The single substrate W that has been converted to a horizontal position is transported to the single-wafer processing apparatus 5 by the bridge robot BR. Specifically, the single substrate W is placed on the transfer section 93. The single substrate W placed on the transfer section 93 is received by the center robot CR. The center robot CR carries the single substrate W, for example, into the processing chamber MPC of the tower TW1. In the processing chamber MPC, for example, a drying process is performed on the substrate W. Specifically, for example, pure water is supplied while rotating the substrate W. Then, IPA is supplied to the substrate W to replace the pure water in the substrate W with IPA. Then, the substrate W is rotated at high speed to dry it. Also, if necessary, it is preferable to perform a drying process using carbon dioxide, which is a supercritical fluid, in another processing chamber MPC. A finish drying process is performed on the substrate W by the drying process using the supercritical fluid. As a result, the substrate W is completely dried, but the collapse of the pattern formed on the substrate W is suppressed.

[0114] After the drying process is completed, the substrate W is transported to the unloading section 87 via the center robot CR and the indexer robot IR. The indexer robot IR stores the substrate W in a carrier C placed on the unloading section 87. Subsequent substrates W constituting the same lot to be processed are stored in the same carrier C.

[0115] <16. Posture conversion processing>

[0116] The above is a rough outline of the processing flow in the substrate processing apparatus 1. Next, the posture change will be described.

[0117] After the batch processing, the plurality of substrates W constituting the batch lot are transferred by the second transport mechanism WTR to the lifter LF0 in the standby tank 31. The lifter LF0 moves the plurality of substrates W constituting the batch lot to a standby position inside the standby tank 31. Since the plurality of substrates W constituting the batch lot wait in this state, drying can be prevented. In other words, the patterns formed on the substrates W after the batch processing can be prevented from collapsing.

[0118] The 25-substrate chuck TFC is positioned at the first transfer position P1. The 25-substrate chuck TFC releases the hand 35. That is, the 25-substrate chuck TFC has the hand 35 at the passing position PT (see FIG. 3). The lifter LF0 is raised to the transfer position above the liquid level in the standby tank BB0. At this time, since the hand 35 of the 25-substrate chuck TFC is at the passing position PT, the multiple substrates W can pass between the 25-substrate chuck TFC and rise. At the same time, the inverted chuck 43 is raised to the receiving height HP1 by the posture changing unit 41 in the posture changing tank 33.

[0119] The 25-substrate chuck TFC closes the hand 35. That is, the hand 35 of the 25-substrate chuck TFC is set to the holding position PC (see FIG. 3). In this state, the lifter LF0 is lowered to the waiting position. As a result, among the substrates W of the batch lot placed on the lifter LF0, only the substrates W of odd numbers constituting one lot are placed on the 25-substrate chuck TFC. Among the substrates W of the batch lot placed on the lifter LF0, the substrates W of even numbers constituting another lot are lowered together with the lifter LF0 into the waiting tank BB0. As a result, the hand 35 of the 25-substrate chuck TFC is set to the second transfer position PT2, and the even-numbered substrates W can be made to wait in a state prevented from drying until they are moved to the posture changing tank 33. Therefore, pattern collapse due to drying of the substrates W of the other lot can also be prevented.

[0120] The 25-substrate chuck TFC advances the hand 35 to the right Y up to the third transfer position P3. At this time, since the inversion chuck 43 is located at the receiving height HP1, no interference with the substrate W occurs.

[0121] The inverting chuck 43 is set to the first distance WD1 by deactivating the air cylinder 63b of the driving mechanism 61 (see FIG. 4). In this state, the inverting chuck 43 is lowered toward the multiple substrates W placed on the 25-substrate chuck TFC. Specifically, the inverting chuck 43 is lowered to a clamping height HP2. The multiple substrates W are accommodated in the inverting chuck 43.

[0122] The air cylinder 63b of the drive mechanism 61 is operated to set the inverting chuck 43 to the second width WD2 (see FIG. 5). As a result, the substrate W accommodated in the inverting chuck 43 is clamped. Furthermore, as shown in FIG. 6, the inverting chuck 43 is raised to a locking height HP3. As a result, the lower edge portion of the end face of the substrate W clamped by the inverting chuck 43, which is lower than the side, abuts and is locked. Note that, with the inverting chuck 43 temporarily raised to the receiving height HP1, the 25-sheet chuck TFC is moved to the second transfer position P2. As a result, the 25-sheet chuck TFC is ready to receive a plurality of substrates W constituting another lot placed on the lifter LF0.

[0123] By driving the motor 61c of the lifting mechanism 61, the inversion chuck 43 is lowered to an immersion height HP4. As a result, the multiple substrates W clamped by the inversion chuck 43 are immersed in the processing liquid in the immersion tank DB. The multiple substrates W are entirely submerged under the processing liquid in the immersion tank DB. In the attitude changing block 15, the multiple substrates W constituting one lot are exposed from the liquid only for a short period of time until they are raised from the standby tank BB0 and immersed in the immersion tank DB.

[0124] The motor 65b of the rotation mechanism 65 is operated to rotate the inversion chuck 43 by 90°. Specifically, in this example, it is rotated by 90° clockwise. The direction of rotation can be determined depending on the direction in which the processing surface (front surface) of the substrate W is located. In other words, the direction of rotation can be determined so that the processing surface of the substrate W faces upward. As a result, the multiple substrates W are converted into a horizontal posture.

[0125] The motor 61b of the lifting mechanism 61 is operated to raise the inverting chuck 43. Specifically, the inverting chuck 43 is raised so that only the substrate W clamped in the uppermost groove 47 of the inverting chuck 43 is exposed from the liquid in the immersion tank DB. The height of the inverting chuck 43 is set to a height that allows the hand 71 of the bridge robot BR to enter a position slightly below the underside of the substrate W exposed from the liquid.

[0126] The hand 71 of the bridge robot BR is advanced into the posture changing section 41. The hand 71 advances to a position slightly below and spaced apart from the lower surface of the substrate W.

[0127] The inversion chuck 43 is moved downward. By the movement of the inversion chuck 43, the substrate W is transferred to the hand 71.

[0128] The bridge robot BR moves the hand 71 to the right Y and removes the uppermost substrate W from the inversion chuck 43 .

[0129] The bridge robot BR rotates the hand 71 to position the substrate W to the right Y. Specifically, the hand 71 rotates to move the substrate W to the delivery section 93 side. Then, one substrate W is delivered to the delivery section 93.

[0130] By the operation of the posture changing block 15 described above, one substrate W is transported in a horizontal posture from the batch processing apparatus 3 to the single substrate processing apparatus 5.

[0131] The correspondence between the present invention and the above-mentioned embodiments is as follows.

[0132] The posture change tank 33 corresponds to the "submerged posture change device" and the "submerged posture change section" in this invention. The batch processing device 3 corresponds to the "batch processing section" in this invention. The single wafer processing device 5 corresponds to the "single wafer processing section" in this invention. The 25-piece chuck TFC corresponds to the "first transport section" in this invention. The bridge robot BR corresponds to the "second transport section" in this invention. The drive mechanism 63 corresponds to the "opening / closing drive mechanism" in this invention. The rotation mechanism 65 corresponds to the "rotation drive mechanism" in this invention. The lifting mechanism 61 corresponds to the "lifting drive mechanism" in this invention. The first distance WD1 corresponds to the "open position" in this invention. The second distance WD2 corresponds to the "holding position" in this invention. The receiving height HP1 corresponds to the "transfer position" in this invention. The immersion height HP4 corresponds to the "conversion position" in this invention.

[0133] According to this embodiment, the lifting mechanism 61 raises the inversion chuck 43 to the receiving height HP1. The drive mechanism 63 causes the inversion chuck 43, which has been set to the first distance WD1, to receive the substrates W, and the drive mechanism 63 sets the inversion chuck 43 to the second distance WD2. The lifting mechanism 61 lowers the inversion chuck 43 to the immersion height HP4. The rotation mechanism 65 drives the inversion chuck 43 around the axis AX1. This allows the orientation of the substrates W in the immersion tank DB to be changed. Since the substrates W are held by the inversion chuck 43, not by an in-tank carrier, the immersion tank DB can be made smaller. In addition, since the substrates W and the inversion chuck 43 are simply rotated around the axis AX1, the load on the rotation mechanism 65 can be reduced.

[0134] <17. Modified version of posture change tank>

[0135] Reference is now made to Fig. 9. Fig. 9 is a partially cutaway front view showing the detailed structure of another embodiment of the attitude changing tank.

[0136] This position change tank 33A differs from the position change tank 33 described above in the configuration of the position change unit 41A. Specifically, in the position change unit 41A, a rotation mechanism 65A, a transmission mechanism 67A, and a container 69A are different.

[0137] The rotation mechanism 65A includes a rotation shaft 65a, a motor 65Ab, a seal member 65c, and a coupling 65Ad.

[0138] The transmission mechanism 67A includes a first bevel gear 67Ad, an extension shaft 67Ae, and a second bevel gear 67Af. The first bevel gear 67Ad is attached to the other end of the rotation shaft 65a.

[0139] In the rotation mechanism 65A, the motor 65Ab is disposed vertically on the upper part of the drive mechanism 63. The motor 65Ab is connected to one end of the extension shaft 67Ae via a coupling 65Ad. Since the extension shaft 67Ae and the motor 65Ab are connected to each other via the coupling 65Ad, the motor 65Ab can be easily replaced. The other end of the extension shaft 67Ae is attached with a second bevel gear 67Af. The second bevel gear 67Af is screwed to the first bevel gear 67Ad. The axes of the rotation shaft 65a and the extension shaft 67Ae are substantially perpendicular to each other. The first bevel gear 67Ad and the second bevel gear 67Af transmit the rotational force of the motor 65Ab in a substantially perpendicular direction. According to this modification, the torque of the motor 65Ab is transmitted by the first bevel gear 67Ad and the second bevel gear 67Af, so that the transmission loss of the torque can be reduced compared to the above-mentioned method using the timing belt 67c.

[0140] The container 69A contains the transmission mechanism 67A in a sealed state. The container 69A is preferably pressurized. Specifically, one end of a supply pipe 99 is connected to a pressurized source 97. The other end of the supply pipe 99 is connected to the container 69A. The pressurized source 97 supplies gas to the supply pipe 99. The gas is, for example, nitrogen gas or air. The gas is supplied to maintain a constant pressure. This makes it possible to prevent the processing liquid in the immersion tank DB from entering the container 69A. As a result, it is possible to prevent the transmission mechanism 67A from breaking down due to the processing liquid entering the container 69A.

[0141] <18. Other examples of movements related to the posture conversion tank>

[0142] Another example of the operation of the above-mentioned posture change tank 33 will be described with reference to Figures 10 and 11. Figures 10 and 11 are front views illustrating another example of the operation of the posture change tank.

[0143] In the embodiment described above, the posture changing tank 33 is used only to change the posture of the multiple substrates W from a vertical posture to a horizontal posture. In other words, the posture changing tank 33 changes the posture of the multiple substrates W by 90 degrees. However, the posture changing tank 33 may also be used to operate as follows.

[0144] That is, the attitude changing tank 33 can also be used as a batch processing unit BPU for collectively processing a plurality of substrates W. That is, the attitude changing tank 33 is used as a processing tank BB of the batch processing unit BPU.

[0145] For example, a plurality of substrates W are processed while a processing liquid is supplied from the supply pipe 50. The processing liquid is, for example, a chemical liquid, specifically, a phosphoric acid solution. The rotation mechanism 65 holds the plurality of substrates W in a vertical posture on the inversion chuck 43. Furthermore, the lifting mechanism 61 lowers the inversion chuck 43 to an immersion height HP4. This state is shown in FIG. 10. At this time, the front surfaces (processing surfaces) of the plurality of substrates W are, for example, facing one side in the width direction Y. As a result, processing of the plurality of substrates W with the chemical liquid is started. Next, assuming that the processing time with the chemical liquid is T hours, for example, when it reaches T / 2 hours, the rotation mechanism 65 is operated. Then, the posture of the plurality of substrates W is changed by 180 degrees. That is, the plurality of substrates W are brought into a vertical posture with the top and bottom reversed. As a result, the back surfaces (non-processing surfaces) are directed to one side in the width direction Y. The plurality of substrates W are converted so that their upper portions are positioned at the lower portions and their lower portions are positioned at the upper portions. Then, for example, after the time T / 2 has elapsed, the substrate is moved to another processing tank BB for cleaning processing.

[0146] According to this operation example, a plurality of substrates W are treated with the treatment liquid in the immersion tank DB, and the inversion chuck 43 is driven around the axis AX1 by the rotation mechanism 65 to invert the plurality of substrates W upside down. Thus, the upper and lower parts of the substrates W can be swapped. Therefore, even if the degree of treatment progress differs between the upper and lower parts of the substrates W, the degree of treatment progress can be averaged by swapping them. As a result, the in-plane uniformity of the treatment on the substrates W can be improved.

[0147] In the above-mentioned operation example, the top and bottom are switched every T / 2 hours out of the processing time of T hours. However, this is not limited to this, and the time may be allocated according to the variation in the progress of the processing on the top and bottom. Also, the top and bottom may be turned over multiple times.

[0148] The present invention is not limited to the above-described embodiment, but can be modified as follows.

[0149] (1) In the above embodiment, the driving mechanism 63 is driven by the air cylinder 63b, but the present invention is not limited to this configuration. For example, an air-type rotary actuator or a linear motor may be used instead of the air cylinder 63b.

[0150] (2) In the above-described embodiment, the transmission mechanism 67, 67A is configured to use the drive pulley 67b and the first bevel gear 67Ad, but the present invention is not limited to such a configuration. In other words, as long as the driving force of the motors 65b, 65Ab can be transmitted to the reversing chuck 43, the present invention is not limited to such a configuration.

[0151] (3) In the above-described embodiment, the lifting mechanism 63 includes the motor 61c and the threaded shaft 61b. However, the present invention is not limited to this configuration. For example, instead of the motor 61c and the threaded shaft 61b, a plurality of air cylinders or a multi-stage air cylinder may be used.

[0152] (4) In the above embodiment, the substrate processing apparatus 1 is configured such that the batch processing apparatus 3 and the single wafer processing apparatus 5 are connected by the bridge 7. However, the present invention can also be applied to a single substrate processing apparatus 1 having the batch processing apparatus 3 and the single wafer processing apparatus 5 in the same housing. [Explanation of symbols]

[0153] 1 ... Substrate processing equipment W … Substrate 3 … Batch processing equipment 5 … Single wafer processing equipment 7 … Bridging Section 7 9 ... Loading block 11 ... Stocker block 13 ... Transfer block 15 ... Posture change block 17 ... Processing block 19 … Input section C...Career BPU: Batch processing unit BB: Treatment tank LF: Lifter TFC…25-piece zipper 31 … Standby tank 33 ... Posture change tank BB0: Treatment tank LF0 ... Lifter DB … Immersion tank 41 ... Posture conversion section 43 … Reversible chuck WD1: First interval WD2: Second interval 45 ... Chuck member 47 ... Groove 50 … Supply pipe 61 ... Lifting mechanism 61a … Base member 61b … Spiral shaft 61c … Motor 61d … Lifting member 61e … Lifting frame 63 ... Drive mechanism 63a … Upper base member 63b … Air cylinder 63c … Moving piece 63d … Hanging arm 63e … Linear guide 65 ... Rotation mechanism 65a … Rotating shaft 65b … Motor 65c ... Sealing material 67 ... Transmission mechanism 67a … Driven pulley 67b … Drive pulley 67c ... timing belt 69 … Container AX1 … Axis core HP1 … Acceptance height HP2 … Clamping height BR... Bridge robot 81 ... Exit block 83 ... Indexer block 85 ... Processing block 87 ... Unloading section IR... Indexer robot TW1~TW4 … Tower CR: Center robot 93 … Delivery department

Claims

1. In a liquid posture changing device for changing the posture of a plurality of substrates, an immersion tank for storing a processing liquid; An inversion chuck for holding a plurality of substrates; an opening / closing drive mechanism that drives the inversion chuck to an opening position for transferring the plurality of substrates between the inversion chuck and the opening / closing drive mechanism and to a holding position for holding the plurality of substrates by the inversion chuck; a rotation drive mechanism that drives the inversion chuck around a horizontal axis to change the postures of the plurality of substrates; a lifting drive mechanism for lifting and lowering the inversion chuck between a transfer position above the immersion tank and a conversion position within the immersion tank; Equipped with a rotation drive mechanism for driving the inversion chuck around a horizontal axis after the inversion chuck is lowered to the conversion position by the lifting drive mechanism after being moved to the holding position by the open / close drive mechanism, wherein the inversion chuck is moved to the holding position by the open / close drive mechanism with the inversion chuck raised to the transfer position by the lifting drive mechanism, and the rotation drive mechanism for driving the inversion chuck around a horizontal axis after the inversion chuck is moved to the holding position by the open / close drive mechanism with the inversion chuck being moved to the conversion position by the lifting drive mechanism.

2. 2. The submerged attitude change device according to claim 1, the rotation drive mechanism includes a rotation shaft having one end connected to the outer side of the reversing chuck, a motor, and a transmission mechanism that transmits a rotational force of the motor to the rotation shaft; The rotary shaft and the transmission mechanism are further provided in a bottomed container. The transmission mechanism is raised and lowered together with the container by the lifting drive mechanism.

3. The submerged attitude change device according to claim 2, The transmission mechanism comprises a driven pulley provided on the other end side of the rotating shaft, a driving pulley attached to the motor, and a timing belt stretched between the driven pulley and the driving pulley.

4. The submerged attitude change device according to claim 2, The transmission mechanism comprises a first bevel gear provided on the other end side of the rotating shaft, an extension shaft connected to the motor, and a second bevel gear provided on the lower end of the extension shaft and screwed into the first bevel gear.

5. The submerged attitude change device according to any one of claims 1 to 4, the lifting mechanism includes a lifting frame on which the rotation drive mechanism is mounted and which extends outside the immersion tank and the container; The in-liquid attitude change device is characterized in that the opening and closing drive mechanism is mounted on the lifting frame.

6. The submerged attitude change device according to claim 4, The container is internally pressurized with gas.

7. In a substrate processing apparatus for processing a substrate, a batch processing unit for processing a plurality of substrates in a vertical position at the same time; a single-wafer processing section for processing a single substrate in a horizontal position; a liquid posture changing unit that changes the posture of the plurality of substrates that have been processed in the batch processing unit from a vertical posture to a horizontal posture in the processing liquid; a first transfer unit that transfers the plurality of substrates that have been processed in the batch processing unit to the submerged posture changing unit; a second transfer unit that transfers the plurality of substrates that have been horizontally positioned by the submerged position conversion unit to the single-wafer processing unit; Equipped with The liquid attitude change unit is an immersion tank for storing a processing liquid; An inversion chuck for holding a plurality of substrates; an opening / closing drive mechanism that drives the inversion chuck to an opening position for transferring the plurality of substrates between the inversion chuck and the opening / closing drive mechanism and to a holding position for holding the plurality of substrates by the inversion chuck; a rotation drive mechanism that drives the inversion chuck around a horizontal axis to convert the orientations of the plurality of substrates between a vertical orientation and a horizontal orientation; a lifting drive mechanism for lifting and lowering the inversion chuck between a transfer position above the immersion tank and a conversion position within the immersion tank; Equipped with a rotation drive mechanism for driving the inversion chuck around a horizontal axis to convert the multiple substrates from a vertical position to a horizontal position, the ...

Images