2results about How to "Improve post-processing effect" patented technology

This utility model discloses a high-concentration wastewater treatment system, belonging to the field of wastewater treatment. It includes a storage tank, an A-tank, an O-tank, and an anaerobic tower. The A-tank and O-tank are connected by a pipeline. The storage tank has a wastewater inlet, and its wastewater outlet is connected to the A-tank and the anaerobic tower respectively through separately controlled valves. The A-tank and O-tank are connected by an AO return pipeline, which is equipped with a return pump. The wastewater treatment end of the anaerobic tower is connected to the wastewater treatment front end of the anaerobic tower through an anaerobic return pipeline, which is also equipped with a return pump. This utility model, combined with conventional wastewater treatment equipment in existing production processes and supplemented by minor structural improvements, can directly achieve automatic wastewater treatment, reducing unnecessary treatment steps and lowering treatment costs.

The application relates to the technical field of chemical mechanical polishing post-processing, and discloses a wafer post-processing system and method. The system comprises a cleaning tank used for containing cleaning liquid for cleaning wafers; and a wafer lifting device used for lifting a wafer immersed in the cleaning liquid from the cleaning liquid. The wafer lifting device comprises a first moving mechanism used for lifting a lower side position of the wafer in the cleaning liquid; and a second moving mechanism used for, when the wafer is lifted to a preset position by the first moving mechanism, continuously lifting an upper side position of the wafer above the liquid surface of the cleaning liquid until the wafer is separated from the cleaning liquid.