Impedance matcher and plasma processing equipment
A technology of impedance matching device and impedance value, which is applied in the field of plasma, can solve the problems affecting the stability and uniformity of etching processing technology, and achieve the effect of effective utilization of output power, elimination of reflected power, and improvement of stability and uniformity
Active Publication Date: 2011-03-23
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Problems solved by technology
This problem will further seriously affect the stability and u
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[0026] In order to enable those skilled in the art to better understand the technical solution of the present invention, the impedance matching device and plasma processing equipment provided by the present invention will be described in detail below with reference to the accompanying drawings.
[0027] see image 3 , the impedance matching device provided by the present invention is arranged between the radio frequency generator and the inductively coupled coil, and is used for impedance matching and current regulation in the radio frequency transmission line of the plasma processing equipment, which includes an electrically connected input terminal, an impedance detection unit, a current detection unit, a control unit, a regulation unit and at least two output terminals. Here, the adjustment unit includes an adjustable impedance element 11 connected in series with the output end 10, an actuator 12 for controlling the adjustable impedance element 11; an adjustable impedance e...
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The invention provides an impedance matcher, which is arranged between a radio frequency generator and an inductive coupling coil and comprises an input end, an impedance detection unit, a current detection unit, a control unit, an adjusting unit and at least tow output ends, wherein the adjusting unit comprises a variable impedance element and a corresponding actuating mechanism, and the control unit indicates the actuating mechanism to adjust the impedance value of the variable impedance element according to data detected by the impedance detection unit and the current detection unit, can adjust the current corresponding to each output end and realize the matching between the output impedance of the radio frequency generator and the input impedance of the impedance matcher. In addition, the invention further provides plasma processing equipment applying the impedance matcher. The impedance matcher and the plasma processing equipment, provided by the invention, can be used for adjusting the radio frequency current flowing through the inductive coupling coil at the same time of effectively carrying out impedance matching so as to improve the distribution uniformity of plasma density in a process chamber.
Description
technical field [0001] The present invention relates to the field of plasma technology, in particular to an impedance matcher and plasma processing equipment using the impedance matcher. Background technique [0002] With the advancement of science and technology, large-scale integrated circuits are used in various fields of production and life. In recent years, the chip size has increased from the original 200mm to 300mm. At the same time, users have higher and higher requirements for the integration of integrated circuits. Therefore, relevant production enterprises must continuously improve their own production equipment in order to adapt to new market demands. [0003] At present, plasma processing equipment is mostly used for processing semiconductor devices. When processing large substrates and highly integrated devices, whether plasma processing equipment can provide high-density plasma and whether it can process wafers uniformly is one of the key technical indicator...
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Login to View More IPC IPC(8): H01J37/02H05H1/46H01J37/32
Inventor 武晔王一帆
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD