Dust mask effect demonstration machine capable of realizing concentration regulation of different dust particles
A dust mask and concentration adjustment technology, applied in educational appliances, instruments, teaching models, etc., can solve the problems of low protective effect of masks, inability to achieve dust protection effect, etc., and achieve good and convenient dust particle concentration adjustment effect and good grip. Sealing effect, easy installation and pick-and-place effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0035] In order to enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be described in detail below in conjunction with the accompanying drawings. The description in this part is only exemplary and explanatory, and should not have any limiting effect on the protection scope of the present invention. .
[0036] Such as Figure 1-Figure 9As shown, the specific structure of the present invention is: a dustproof mask effect demonstration machine capable of adjusting different dust particle concentrations, including a demonstration cabinet 1 with an opening on the right side and a dust particle cabinet 2 that is sealed and matched with the left side panel of the demonstration cabinet 1 , the left side wall of the demonstration cabinet 2 is provided with a communication port that cooperates with the dust particle cabinet 2, and a dustproof mask 4 is fitted in the communication port, and is clamped by the ma...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com