Surfactant, developer and its application and preparation method, semiconductor device

Abstract

The present application relates to a surfactant, a developer, and an application and preparation method thereof, wherein the surfactant comprises: 10 to 500 parts of polyoxyethylene oil ether and 1 to 100 parts of secondary alcohol polyoxyethylene ether. The beneficial effect of the present application is to provide a surfactant, a developer, and an application and preparation method thereof that can improve the wetting performance of the developer and effectively inhibit the generation of bubbles.

Description

Technical Field

[0001] The present application relates to the field of photolithography technology, and in particular to a surfactant, a developer, an application and a preparation method thereof, and a semiconductor device. Background Art

[0002] In the photolithography process of semiconductor integrated circuits, after the photoresist is exposed, a developer is used to wash away the photoresist in the exposed area.

[0003] The composition of the developer determines the solubility of the photoresist in the exposed area, and thus determines the quality of the developed pattern.

[0004] In the related art, in addition to the main components of the developer, a surfactant is also added to improve the wetting properties of the developer and further improve the dissolution ability of the developer. However, despite the increase in surfactants, some surfactants are prone to generate foam during the development process and affect the development effect, and some surfactants increase the solubility of the photoresist in the non-exposed area and affect the development effect.

[0005] Therefore, how to give full play to the improvement of the developer by the surfactant while avoiding the influence brought by the surfactant is an urgent problem to be solved in this field. Summary of the invention

[0006] The embodiments of the present application provide a surfactant, a developer, and an application and preparation method thereof, so as to at least partially solve the above-mentioned technical problems.

[0007] In order to achieve the above object, according to the first aspect of the present application, a surfactant is provided, and the surfactant comprises, in parts by mass:

[0008] 10 to 500 parts of polyoxyethylene oleyl ether;

[0009] 1 to 100 parts of secondary alcohol polyoxyethylene ether.

[0010] Optionally, in some embodiments of the present application, the ratio of the mass fraction of the polyoxyethylene oil ether to the mass fraction of the secondary alcohol polyoxyethylene ether ranges from 1 to 500.

[0011] Optionally, in some embodiments of the present application, the polyoxyethylene oleyl ether has a straight-chain structure; the secondary alcohol polyoxyethylene ether has a branched structure.

[0012] Optionally, in some embodiments of the present application, the molecular formula of the polyoxyethylene oil ether is:

[0013] C 18 H 35 (OCH2CH2) x OH;

[0014] The value of x ranges from 5 to 20.

[0015] Optionally, in some embodiments of the present application, the value range of x is 8 to 20.

[0016] Optionally, in some embodiments of the present application, the value of x is 20.

[0017] Optionally, in some embodiments of the present application, the molecular formula of the secondary alcohol polyoxyethylene ether is:

[0018] [CH3(CH2CHR1) m ]CH[CH3(CH2CHR2) n ]O(CH2CH2O) y H;

[0019] Wherein, R1 is selected from H or alkyl; R2 is selected from H or alkyl; m and n are not 0, and the value range of m+n is 8 to 20; the value range of y is 15 to 60.

[0020] Optionally, in some embodiments of the present application, R1 and R2 are both H, and the value range of m+n is 10 to 16; the value range of y is 20 to 40.

[0021] Optionally, in some embodiments of the present application, the value of m+n is 15, and the value of y is 40.

[0022] Optionally, in some embodiments of the present application, the ratio of the mass fractions of the polyoxyethylene oil ether to the secondary alcohol polyoxyethylene ether ranges from 1 to 10.

[0023] According to a second aspect of the present application, a developer is provided, the developer comprising: the aforementioned surfactant.

[0024] Optionally, in some embodiments of the present application, the developer comprises, in parts by mass:

[0025] 1500 to 3000 parts of tetramethylammonium hydroxide;

[0026] 10 to 500 parts of polyoxyethylene oleyl ether;

[0027] 1 to 100 parts of secondary alcohol polyoxyethylene ether;

[0028] Ultrapure water 95,000 to 98,000 parts.

[0029] Optionally, in some embodiments of the present application, the developer comprises, by mass percentage:

[0030] Tetramethylammonium hydroxide 1.5% to 3%;

[0031] Polyoxyethylene oleyl ether 0.01% to 0.5%;

[0032] Secondary alcohol polyoxyethylene ether 0.001% to 0.1%;

[0033] Ultrapure water 97% to 97.689%.

[0034] Optionally, in some embodiments of the present application, the resistivity of the ultrapure water ranges from 18 MΩ•cm to 18.3 MΩ•cm.

[0035] Optionally, in some embodiments of the present application, the resistivity of the ultrapure water ranges from 18.20 MΩ•cm to 18.25 MΩ•cm.

[0036] According to the third aspect of the present application, there is also provided a use of the aforementioned developer in photoresist development.

[0037] According to a fourth aspect of the present application, a method for preparing a developer is also provided, the method comprising: providing the aforementioned surfactant; mixing tetramethylammonium hydroxide, ultrapure water and the surfactant to obtain the developer.

[0038] The beneficial effects of the present application are: providing a surfactant, a developer, and an application and preparation method thereof that can improve the wetting performance of a developer and effectively inhibit the generation of bubbles.

[0039] More specifically, some embodiments of the present application may produce the following specific beneficial effects:

[0040] The use of polyoxyethylene oleyl ether and secondary alcohol polyoxyethylene ether as a surfactant can enable the polyoxyethylene oleyl ether to exert its ability to promote wetting and the secondary alcohol polyoxyethylene ether to inhibit the bubbles generated by the polyoxyethylene oleyl ether.

[0041] The use of polyoxyethylene oil ether can better adsorb and migrate with the photoresist, but its wetting is slow. The use of secondary alcohol polyoxyethylene ether has the advantages of faster wetting and fewer bubbles. However, the hydrophobic end of the secondary alcohol polyoxyethylene ether is larger in volume and the hydrophilic chain segment is longer, which is not conducive to its adsorption and migration on the photoresist surface; therefore, their compounding makes the polyoxyethylene oil ether and secondary alcohol polyoxyethylene ether complement each other in performance and improves the performance of the overall developer.

[0042] A more comprehensive improvement effect can be achieved by compounding polyoxyethylene oil ether and secondary alcohol polyoxyethylene ether in a certain proportion, balancing the wetting performance and bubble generation.

[0043] Other features and advantages of the present application will be described in detail in the subsequent detailed description. BRIEF DESCRIPTION OF THE DRAWINGS

[0044] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present application, and those skilled in the art can obtain other drawings based on these drawings without creative work.

[0045] In order to more completely understand the present application and its beneficial effects, the following description will be given in conjunction with the accompanying drawings, wherein the same figure numbers represent the same parts in the following description.

[0046] Figure 1 is a schematic diagram of the molecular structure of polyoxyethylene oleyl ether in the surfactant provided in an exemplary embodiment of the present application;

[0047] Figure 2 is a schematic diagram of the molecular structure of a secondary alcohol polyoxyethylene ether in a surfactant provided in an exemplary embodiment of the present application;

[0048] Figure 3 is a schematic diagram of the main steps of the method for preparing a developer provided in an exemplary embodiment of the present application;

[0049] Figure 4 It is a schematic diagram of a specific molecular structure of a secondary alcohol polyoxyethylene ether provided in an exemplary embodiment of the present application. DETAILED DESCRIPTION

[0050] The technical solutions in the embodiments of the present application will be described clearly and completely below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work are within the scope of protection of the present application.

[0051] As a first aspect of the present application, the surfactant of the present application includes, by weight: 10 to 500 parts of polyoxyethylene oleyl ether and 1 to 100 parts of secondary alcohol polyoxyethylene ether.

[0052] The use of polyoxyethylene oleyl ether and secondary alcohol polyoxyethylene ether as a surfactant can enable the polyoxyethylene oleyl ether to exert its ability to promote wetting and the secondary alcohol polyoxyethylene ether to inhibit the bubbles generated by the polyoxyethylene oleyl ether.

[0053] In some embodiments of the present application, the ratio of the mass fraction of polyoxyethylene oleyl ether to the mass fraction of secondary alcohol polyoxyethylene ether ranges from 1 to 500.

[0054] Specifically, the mass fraction of polyoxyethylene oil ether and secondary alcohol polyoxyethylene ether can be in the range of at least one of 1:1, 2:1, 3:1, 4:1, 5:1, 6:1, 7:1, 8:1, 9:1, 10:1, 12:1, 15:1, 18:1, 20:1, 25:1, 30:1, 40:1, 45:1, 50:1, 60:1, 65:1, 70:1, 75:1, 80:1, 85:1, 90:1, 95:1, and 100:1.

[0055] A more comprehensive improvement effect can be achieved by compounding polyoxyethylene oil ether and secondary alcohol polyoxyethylene ether in a certain proportion, balancing the wetting performance and bubble generation.

[0056] In some embodiments of the present application, reference Figure 1 and Figure 2 As shown, polyoxyethylene oleyl ether has a straight chain structure; secondary alcohol polyoxyethylene ether has a branched structure.

[0057] Reference Figure 1 As shown, the value of k in the molecular formula of the linear polyoxyethylene oil ether ranges from 5 to 100.

[0058] Reference Figure 2 As shown, the value of l in the molecular formula of the secondary alcohol polyoxyethylene ether with a branched structure ranges from 10 to 100.

[0059] In some embodiments of the present application, the molecular formula of polyoxyethylene oleyl ether is:

[0060] C 18 H 35 (OCH2CH2) x OH;

[0061] The value of x ranges from 5 to 20.

[0062] In some embodiments of the present application, the value of x ranges from 8 to 20. In some embodiments of the present application, the value of x ranges from 8 to 20.

[0063] In some embodiments of the present application, the molecular formula of the secondary alcohol polyoxyethylene ether is:

[0064] [CH3(CH2CHR1) m ]CH[CH3(CH2CHR2) n ]O(CH2CH2O) y H;

[0065] Wherein, R1 is selected from H or alkyl; R2 is selected from H or alkyl; m and n are not 0, and the value range of m+n is 8 to 20; the value range of y is 15 to 60.

[0066] As a specific solution, the value range of m is 2 to 10; the value range of n is 5 to 18; and m is less than or equal to n.

[0067] In some embodiments of the present application, R1 and R2 are both H, and the value range of m+n is 10 to 16; the value range of y is 20 to 40.

[0068] The polyoxyethylene oil ether with a straight-chain structure can better adsorb and migrate with the photoresist, but its wetting is slow. The highly branched secondary alcohol polyoxyethylene ether has the advantages of faster wetting and fewer bubbles. However, the hydrophobic end of the secondary alcohol polyoxyethylene ether is larger in volume and the hydrophilic chain segment is longer, which is not conducive to its adsorption and migration on the photoresist surface. Therefore, their compounding makes the polyoxyethylene oil ether and the secondary alcohol polyoxyethylene ether complement each other in performance and improves the performance of the overall developer.

[0069] In some embodiments of the present application, the value of m+n is 15, the value of m is 7, the value of n is 8, and the value of y is 40.

[0070] In some embodiments of the present application, the ratio of the mass fractions of polyoxyethylene oil ether to secondary alcohol polyoxyethylene ether ranges from 1 to 10.

[0071] According to a second aspect of the present application, a developer is provided, the developer comprising: the aforementioned surfactant.

[0072] In some embodiments of the present application, the developer includes, by weight:

[0073] 1500 to 3000 parts of tetramethylammonium hydroxide, 10 to 500 parts of polyoxyethylene oleyl ether, 1 to 100 parts of secondary alcohol polyoxyethylene ether, and 95000 to 98000 parts of ultrapure water.

[0074] As a more specific solution, in some embodiments of the present application, the developer includes, by mass percentage:

[0075] 1.5% to 3% tetramethylammonium hydroxide, 0.01% to 0.5% polyoxyethylene oleyl ether, 0.001% to 0.1% secondary alcohol polyoxyethylene ether; 97% to 97.689% ultrapure water.

[0076] In some embodiments of the present application, tetramethylammonium hydroxide is electronic grade tetramethylammonium hydroxide.

[0077] In some embodiments of the present application, the resistivity of ultrapure water ranges from 18 MΩ•cm to 18.3 MΩ•cm.

[0078] The resistivity of ultrapure water ranges from 18.20 MΩ•cm to 18.25 MΩ•cm.

[0079] As an optional solution, the tetramethylammonium hydroxide in the developer can be replaced by a combination of tetramethylammonium hydroxide and tetraethylammonium hydroxide. Specifically, the mass fraction ratio of tetramethylammonium hydroxide to tetraethylammonium hydroxide ranges from 10 to 20.

[0080] According to the third aspect of the present application, there is also provided a use of the aforementioned developer in photoresist development.

[0081] According to a fourth aspect of the present application, a method for preparing a developer is also provided, comprising the following steps:

[0082] S101: Provide a surfactant. The surfactant here can be the surfactant in the above scheme.

[0083] S102: Tetramethylammonium hydroxide, ultrapure water and a surfactant are mixed to obtain a developer.

[0084] The present application is further described below in conjunction with specific embodiments.

[0085] The implementation and detection of the embodiments and comparative examples of the present application mainly include the following three parts:

[0086] 1. Preparation of developer

[0087] Preparation conditions: The cleaning conditions must meet Class 6, Class 5 or Class 4 in ISO 14644 and the preparation must be carried out under nitrogen atmosphere protection and room temperature.

[0088] Preparation of raw materials: Weigh tetramethylammonium hydroxide, polyoxyethylene oleyl ether, secondary alcohol polyoxyethylene ether and ultrapure water according to proportion.

[0089] Wherein, the molecular formula of the polyoxyethylene oleyl ether used in Examples 1 to 4 and the comparative example is:

[0090] C 18 H 35 (OCH2CH2) x OH; wherein the value of x is 20. The value of x in Example 5 is 10.

[0091] Wherein, the molecular formula of the secondary alcohol polyoxyethylene ether used in Examples 1 to 4 and the comparative example is:

[0092] [CH3(CH2CHR1) m ]CH[CH3(CH2CHR2) n ]O(CH2CH2O) yH; wherein the value of m+n is 15, the value of m is 7, the value of n is 8, and the value of y is 40. The value of y in Example 5 is 20. The specific molecular structures of the secondary alcohol polyoxyethylene ethers used in Examples 1 to 4 and the comparative examples are as follows: Figure 4 shown.

[0093] Mixing method: Tetramethylammonium hydroxide, polyoxyethylene oil ether, secondary alcohol polyoxyethylene ether and ultrapure water are mixed evenly in a 316L stainless steel bottle lined with polytetrafluoroethylene.

[0094] The difference between Examples 1 to 4 and the comparative example is that the ratios of polyoxyethylene oleyl ether and secondary alcohol polyoxyethylene ether are different.

[0095] 2. Photolithography and Development

[0096] Spin coating: The positive UV photoresist KMP C6111A1 was coated on a 6-inch silicon wafer by spin coating.

[0097] Baking: Bake the photoresist at 110° C. for 60 seconds to obtain a photoresist with a thickness of 4 μm to 5 μm.

[0098] Exposure: Use a mask with a line width of 20 μm and 200 mJ / cm 2 The photoresist is exposed to ultraviolet light.

[0099] Development: Spray 10 mL of developer at a temperature of 25°C, let stand for 30 seconds, then rinse with ultrapure water and dry.

[0100] Inspection: After drying, use a 200x optical microscope to check the line width, edge straightness, contrast, and whether there is residue on the pattern. Use a scanning electron microscope to check the surface flatness of the developed pattern.

[0101] 3. Detection methods

[0102] Performance characterization of developer:

[0103] Dynamic surface tension test: According to GB / T 27842-2011 Determination of dynamic surface tension of chemicals - Rapid bubble method, surface tension tests were performed on the samples of the embodiments and comparative examples.

[0104] Contact angle test: According to DB44 / T 1232-2013 Test method for determination of surface tension of solid coatings, substrates and pigments - contact angle method, contact angle tests were performed on samples of the embodiments and comparative examples.

[0105] Each embodiment and comparative example of the present application adopts the above two-part process, and the difference is only in the ratio of each component:

[0106] Example 1: Based on the weight percentage of 100%, 0.05% polyoxyethylene oleyl ether, 0.05% secondary alcohol polyoxyethylene ether, 2.38% tetramethylammonium hydroxide, and 97.52% ultrapure water.

[0107] Example 2: Based on the weight percentage being 100%, weigh 0.05% of polyoxyethylene oleyl ether, 0.02% of secondary alcohol polyoxyethylene ether, 2.38% of tetramethylammonium hydroxide, and 97.55% of ultrapure water.

[0108] Example 3: Based on the weight percentage of 100%, weigh 0.1% of polyoxyethylene oleyl ether, 0.02% of secondary alcohol polyoxyethylene ether, 2.38% of tetramethylammonium hydroxide, and 97.5% of ultrapure water.

[0109] Example 4: Based on the weight percentage being 100%, 0.2% of polyoxyethylene oleyl ether, 0.02% of secondary alcohol polyoxyethylene ether, 2.38% of tetramethylammonium hydroxide and 97.4% of ultrapure water were weighed.

[0110] Example 5: Based on the weight percentage of 100%, weigh 0.1% of polyoxyethylene oleyl ether, 0.01% of secondary alcohol polyoxyethylene ether, 2.38% of tetramethylammonium hydroxide, and 97.51% of ultrapure water.

[0111] Comparative Example 1: Based on the weight percentage being 100%, 0.8% of polyoxyethylene oleyl ether, 0.02% of secondary alcohol polyoxyethylene ether, 2.38% of tetramethylammonium hydroxide and 96.8% of ultrapure water were weighed.

[0112] Comparative Example 2: Based on the weight percentage being 100%, 0.05% of polyoxyethylene oleyl ether, 0.00005% of secondary alcohol polyoxyethylene ether, 2.38% of tetramethylammonium hydroxide, and 97.56995% of ultrapure water were weighed.

[0113] Comparative Example 3: Based on the weight percentage being 100%, 0.1% of polyoxyethylene oleyl ether, 0.0001% of secondary alcohol polyoxyethylene ether, 2.38% of tetramethylammonium hydroxide, and 97.5199% of ultrapure water were weighed.

[0114] Comparative Example 4: Based on the weight percentage being 100%, 0.2% of polyoxyethylene oleyl ether, 0.0002% of secondary alcohol polyoxyethylene ether, 2.38% of tetramethylammonium hydroxide, and 97.4198% of ultrapure water were weighed.

[0115] The specific component differences and test results are shown in Tables 1 and 2.

[0116] It can be seen from Table 1 and Table 2 that when the ratio of polyoxyethylene oleyl ether to secondary alcohol polyoxyethylene ether is controlled within a certain range, the wetting effect and the developing effect can be effectively obtained.

[0117] As shown in Table 1 and Table 2, the mass percentages of the linear polyoxyethylene oil ether and the branched secondary alcohol polyoxyethylene ether in Example 1 are both 0.05%; Example 1 can achieve that the surface tension of the developer is rapidly reduced to 56mN / m within 0.1s, and when the developer is finished, the surface tension of the developer is reduced to 44mN / m, reaching the solid surface energy level of the photoresist. When the mass percentages of the linear polyoxyethylene oil ether and the branched secondary alcohol polyoxyethylene ether in Comparative Example 1 are 0.8% and 0.02% respectively, the surface tension of the developer is rapidly reduced to 46mN / m after developing for 1s, indicating that the content of the branched secondary alcohol polyoxyethylene ether is too high and the surface activity is stronger, so that the surface tension of the developer drops too fast. Therefore, the proportion of the branched secondary alcohol polyoxyethylene ether in the two surfactants is preferably not more than 50%.

[0118] In Example 2, the mass percentages of the linear polyoxyethylene oil ether and the branched secondary alcohol polyoxyethylene ether are 0.05% and 0.02%, respectively. Compared with Example 1, the content of the branched secondary alcohol polyoxyethylene ether is reduced, so that the degree of surface tension reduction is not as good as that in Example 1.

[0119] In Example 3 and Example 4, the content of linear polyoxyethylene oil ether is further increased (Example 3: 0.1% linear polyoxyethylene oil ether, 0.02% branched secondary alcohol polyoxyethylene ether; Example 4: 0.2% linear polyoxyethylene oil ether, 0.02% branched secondary alcohol polyoxyethylene ether). Referring to Table 1, it can be seen that compared with Example 1, the content of linear polyoxyethylene oil ether is increased, so that the surface tension reduction rate of the developer is slowed down.

[0120] In Example 5, the straight-chain polyoxyethylene oil ether uses an x ​​value of 10, and the branched polyoxyethylene ether uses a y value of 20. Compared with the embodiment in which x=20 and y=40, the surface activity is slightly higher. By adjusting the ratio of the two, the reduction of the surface tension in the developer within 0.1s and 30s can also be achieved.

[0121] Combining the test results of Example 2, Comparative Example 2 and Example 3, Comparative Example 3 and Table 1, it can be seen that when the content of secondary alcohol polyoxyethylene ether with a branched structure is significantly reduced, it is impossible to quickly reduce the surface tension in the developer, especially in the initial stage of development.

[0122] Combining the test results of Example 4, Comparative Example 4 and Table 1, it can be seen that when the content of the linear polyoxyethylene oil ether is further increased and the content of the branched secondary alcohol polyoxyethylene ether is significantly reduced, it is impossible to quickly reduce the surface tension in the developer, whether in the early stage of development or in the late stage of development.

[0123] Table 1 Performance characteristics of developer

[0124]

[0125] Table 2 Development effect of developer

[0126]

[0127] The above are only preferred embodiments of the present application and do not constitute any form of limitation to the present application. However, any simple modifications, equivalent changes and modifications made to the above embodiments based on the technical essence of the present application without departing from the content of the technical solution of the present application are still within the scope of the technical solution of the present application.

Claims

1. A developer, characterized in that: The developer solution includes a surfactant; The surfactant includes, by weight: 10 to 500 parts of polyoxyethylene oleyl ether; 1 to 100 parts of secondary alcohol polyoxyethylene ether; The polyoxyethylene oleyl ether has a straight chain structure; the secondary alcohol polyoxyethylene ether has a branched chain structure; The molecular formula of the polyoxyethylene oil ether is: C 18 H 35 (OCH2CH2) x OH; Among them, the value range of x is 5 to 20; The molecular formula of the secondary alcohol polyoxyethylene ether is: [CH3(CH2CHR1) m ]CH[CH3(CH2CHR2) n ]O(CH2CH2O) y H; Wherein, R1 is selected from H or alkyl; R2 is selected from H or alkyl; m and n are not 0, and the value range of m+n is 8 to 20; the value range of y is 15 to 60.

2. The developer according to claim 1, characterized in that The ratio of the mass fraction of the polyoxyethylene oil ether to the mass fraction of the secondary alcohol polyoxyethylene ether ranges from 1 to 500.

3. The developer according to claim 1, characterized in that in, The value range of x is 8 to 20.

4. The developer according to claim 3, characterized in that: in, The value of x is 20.

5. The developer according to claim 1, characterized in that: in, R1 and R2 are both H, and the value range of m+n is 10 to 16; the value range of y is 20 to 40.

6. The developer according to claim 1 or 5, characterized in that: in, The value of m+n is 15, and the value of y is 40.

7. The developer according to claim 1 or 2, characterized in that: The mass ratio of the polyoxyethylene oil ether to the secondary alcohol polyoxyethylene ether ranges from 1 to 10.

8. The developer according to claim 1, characterized in that: The developer comprises, in parts by mass: 1500 to 3000 parts of tetramethylammonium hydroxide; 10 to 500 parts of polyoxyethylene oleyl ether; 1 to 100 parts of secondary alcohol polyoxyethylene ether; Ultrapure water 95,000 to 98,000 parts.

9. The developer according to claim 1, characterized in that: The developer comprises, by mass percentage: Tetramethylammonium hydroxide 1.5% to 3%; Polyoxyethylene oleyl ether 0.01% to 0.5%; Secondary alcohol polyoxyethylene ether 0.001% to 0.1%; Ultrapure water 97% to 97.689%.

10. The developer according to claim 8 or 9, characterized in that: The resistivity of the ultrapure water ranges from 18 MΩ•cm to 18.3 MΩ•cm.

11. The developer according to claim 10, characterized in that The resistivity of the ultrapure water ranges from 18.20 MΩ•cm to 18.25 MΩ•cm.

12. Use of the developer according to any one of claims 1 to 11 in photoresist development.

13. A method for preparing a developer, characterized in that: The preparation method comprises: Tetramethylammonium hydroxide, ultrapure water, the polyoxyethylene oleyl ether and the secondary alcohol polyoxyethylene ether according to any one of claims 1 to 7 are mixed to obtain the developer.

14. A method for preparing a developer, characterized in that: The preparation method comprises: The tetramethylammonium hydroxide according to any one of claims 8 to 11, the ultrapure water, the polyoxyethylene oleyl ether and the secondary alcohol polyoxyethylene ether are mixed to obtain the developer.

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