Ultrafiltration filtering device and filtering method for recycling PCB (Printed Circuit Board) developing solution

Abstract

The invention discloses an ultrafiltration filtering device for recycling a PCB developing solution and a filtering method, and relates to the technical field of developing solution filtering, the ultrafiltration filtering device comprises a first-stage ultrafiltration cylinder, one side of the first-stage ultrafiltration cylinder is fixedly communicated with a liquid inlet pipe, the other side of the first-stage ultrafiltration cylinder is fixedly communicated with a pair of connecting pipes, the sides, away from the first-stage ultrafiltration cylinder, of the connecting pipes are fixedly communicated with a second-stage ultrafiltration cylinder, and the second-stage ultrafiltration cylinder is fixedly communicated with a liquid outlet pipe. Through the arrangement of the self-speed-changing impurity removal mechanism, impurities on the inner wall of a membrane are adsorbed in a reciprocating mode through a material suction head, the situation that the membrane is blocked reversely can be avoided, meanwhile, when ultrafiltration is conducted on developing solutions of different batches, the rotating speeds of fan blades are different, the reciprocating moving speed of the material suction head on the inner wall of the membrane can be changed accordingly, and therefore the membrane can be removed. No matter the speed of the ultrafiltration process, impurities on the surface of the membrane can be removed after being formed in each movement, and the suction head automatically changes the speed along with the flow speed of the developing solution, so that the stability of the ultrafiltration process of the developing solution is ensured, the service time of the membrane can be effectively prolonged, and the maintenance cost is reduced.

Description

Technical Field

[0001] The invention relates to the technical field of developer filtration, and in particular to an ultrafiltration device and a filtration method for recovering PCB developer. Background Art

[0002] Developer is a chemical solution used to remove unnecessary resin or photosensitive adhesive during the PCB manufacturing process. As the number of uses increases, the developer will gradually change color and become viscous, and it cannot be used anymore. Then, the useful components in the developer, such as hydroquinone or phenol, can be recovered through an ultrafiltration device to reduce the waste of chemical substances. At the same time, impurities and pollutants in the developer, such as macromolecules, bacteria, viruses, etc., can be removed through the purification process to improve the quality of the recovered liquid.

[0003] In the prior art, during ultrafiltration, as dirt gradually accumulates on the surface of the filter medium, the reduction of membrane flux is an inevitable phenomenon, and the speed and severity of the decline of membrane flux are uneven. Among them, the filter membrane closest to the feed pump is most affected by the fluid impact force and pollutant concentration, and its membrane flux declines fastest. It is also most likely to be damaged or need cleaning and maintenance. In actual operation, in order to ensure the continuity and efficiency of the filtration process, the ultrafiltration system needs to be regularly maintained and cleaned, which includes but is not limited to cleaning the membrane surface, replacing damaged membrane elements, adjusting operating parameters, etc. However, frequent shutdowns for maintenance not only increase maintenance costs, but may also cause production interruptions, thereby affecting the overall production efficiency and product quality.

[0004] In addition, different batches of developer have different concentrations of internal particles and viscous substances. These differences will directly affect the flow rate of the liquid when passing through the same inlet pump. When conveying the developer, the inlet pump needs to overcome the resistance of the liquid, and the magnitude of the resistance depends to a large extent on the viscosity of the liquid and the concentration of the particles. The developer with a higher concentration will increase the fluid resistance due to its higher viscosity and more particles, which will require the inlet pump to provide more power when conveying such developer to maintain the same flow rate. This additional power consumption not only increases the use of energy, but also may affect the service life of the pump. In the ultrafiltration process, the difference in liquid flow rate directly affects the filtration efficiency of the membrane. Too low a flow rate may cause excessive deposition of pollutants on the membrane surface, reduce the permeability of the membrane, and thus affect the filtration effect and efficiency. On the contrary, too high a flow rate may cause damage to the membrane because excessive fluid pressure and speed may cause physical damage to the membrane. Therefore, different batches of developer have different flow rates under the action of the same inlet pump, which will eventually affect the efficiency of the ultrafiltration process and the life of the membrane.

[0005] In view of this, the present invention proposes an ultrafiltration filtration device and a filtration method for PCB developer recovery to make up for and improve the deficiencies of the prior art. Summary of the invention

[0006] In order to solve the above technical problems, the present invention proposes an ultrafiltration filtration device and a filtration method for PCB developer recovery to solve the problems of increased maintenance costs and reduced efficiency of the ultrafiltration process and membrane life in the prior art.

[0007] To achieve the above purpose, the technical solution adopted by the present invention is: an ultrafiltration filtration device and a filtration method for PCB developer recovery, comprising a first-level ultrafiltration cartridge, one side of the first-level ultrafiltration cartridge is fixedly connected to a liquid inlet pipe, the other side of the first-level ultrafiltration cartridge is fixedly connected to a pair of connecting pipes, the side of the connecting pipe away from the first-level ultrafiltration cartridge is fixedly connected to a second-level ultrafiltration cartridge, the second-level ultrafiltration cartridge is provided with multiple groups, and two adjacent second-level ultrafiltration cartridges 3 are connected by connecting pipes 2, the middle of the second-level ultrafiltration cartridge is fixedly connected to a liquid outlet pipe, and also includes:

[0008] The self-variable impurity removal mechanism is used to automatically control the speed of impurity treatment in the first-stage ultrafiltration cartridge according to the liquid flow rate;

[0009] The adaptive grading mechanism is used to adopt appropriate filtration levels for different developers.

[0010] Preferably, the self-speed changing impurity removing mechanism includes a protective shell fixedly connected to the outer wall of the liquid inlet pipe, a rotating shaft is rotatably passed through the middle of the protective shell, a fan blade is fixedly connected to the middle of the rotating shaft, the fan blade is located as a whole inside the protective shell, a support frame is sleeved on the outer wall of the bottom of the rotating shaft, and the top of the support frame is fixedly connected to the bottom of the protective shell.

[0011] Preferably, the self-speed changing impurity removing mechanism also includes a main gear fixedly connected to the bottom of the rotating shaft, the outer wall of the main gear is meshingly connected to the eccentric gear, the top center of the eccentric gear is rotatably connected to the support frame, the eccentric part of the bottom of the eccentric gear is rotatably connected to a movable rod, the side of the movable rod away from the eccentric gear is rotatably connected to a connecting plate, a small pump is fixedly connected to the middle of the connecting plate, one side of the small pump is fixedly connected to a mud outlet pipe, the side of the mud outlet pipe away from the small pump is fixedly passed through the bottom of the connecting plate, the other side of the small pump is fixedly connected to a telescopic tube, the outer wall of the telescopic tube slides through the inner wall of the first-stage ultrafiltration cartridge, and the side of the telescopic tube away from the small pump is fixedly connected to a suction head.

[0012] Preferably, the self-speed-changing impurity removal mechanism further comprises a diaphragm fixedly connected to the inner wall of the first-stage ultrafiltration cartridge, the outer wall of the suction head slidably abuts against the inner wall of the diaphragm, and the outer wall of the suction head is provided with a plurality of suction holes.

[0013] Preferably, the adaptive grading mechanism includes a top plate fixedly connected to the top of the rotating shaft, a plurality of rotating rods are connected to the bottom of the top plate for equidistant rotation around the circumference, a plurality of rotating rods are rotatably connected to the middle parts of the plurality of rotating rods, a plurality of rotating rods are rotatably connected to a ring sleeve on one side away from the rotating rod, and the inner wall of the ring sleeve is slidably connected to the outer wall of the rotating shaft.

[0014] Preferably, the adaptive grading mechanism also includes an adjustment seat fixedly connected to the top of the first-stage ultrafiltration cartridge, a plurality of indicator lights fixedly connected to the top of the adjustment seat, a slide groove is provided on the side of the adjustment seat away from the indicator lights, a moving rod is slidably connected in the slide groove of the adjustment seat, a pointer is fixedly connected on the side of the moving rod close to the indicator light, the pointer is set in the direction of the indicator light, an arc-shaped push plate is fixedly connected on the side of the moving rod away from the adjustment seat, a return spring is fixedly connected to the bottom of the arc-shaped push plate, and one end of the return spring away from the arc-shaped push plate is fixedly connected to the adjustment seat.

[0015] Preferably, the number of the indicator lights is consistent with the number of groups of secondary ultrafiltration cartridges.

[0016] Preferably, the suction head is in the form of two elliptical ring tubes that cross and penetrate and communicate with each other in the middle.

[0017] The method for recovering PCB developer solution by ultrafiltration comprises the following steps:

[0018] Step 1: Pretreatment of developer: First, the recovered developer is pretreated. The pretreatment includes physical filtration and chemical treatment, which are used to remove large particles of impurities and suspended matter to protect the ultrafiltration membrane from damage. When the pretreated liquid is pressurized and enters the liquid inlet pipe, the filtration level of the recovered liquid can be automatically determined by the adaptive grading mechanism, that is, after the liquid passes into the first-level ultrafiltration cartridge, the number of groups of connecting pipes corresponding to the preset level is selected for repeated filtration to ensure the adequacy of the filtration;

[0019] Step 2: Ultrafiltration and post-treatment process: The pre-treated developer passes through the ultrafiltration membrane. The ultrafiltration membrane can separate substances larger than the membrane pore size, while allowing water molecules and small molecules to pass through, thereby achieving the purpose of purification. The developer enters the inlet pipe from the feed pump and reaches the first-level ultrafiltration cartridge and the connecting pipe of the ultrafiltration membrane assembly. Under the action of pressure, the developer passes through the micropores of the ultrafiltration membrane, and the impurities therein are trapped on the inner surface of the ultrafiltration membrane. The filtered clear liquid flows out from the outlet pipe, enters the outlet pump, and is then transported to the next processing unit. As the filtration process proceeds, the dirt on the surface of the ultrafiltration membrane gradually accumulates, and the membrane flux will gradually decrease. Among them, the membrane flux of the filter membrane closest to the inlet pipe decreases the fastest. Therefore, during the liquid inlet process, the filter membrane in the first-level ultrafiltration cartridge is descaled in real time through the self-variable speed impurity removal mechanism to increase its membrane flux to maintain the service life of the membrane. Then, the ultrafiltered liquid needs further disinfection and pH adjustment to ensure the safety and effect of the liquid.

[0020] Step 3: Storage and Use: The treated liquid is stored in a sealed container that is resistant to chemical corrosion and used in subsequent development processes when needed. When storing, be sure to add preservatives to prevent bacterial growth.

[0021] Compared with the prior art, the present invention has the following beneficial effects:

[0022] 1. Through the setting of the self-speed-changing impurity removal mechanism, the suction head is used to reciprocate and absorb the impurities on the inner wall of the diaphragm, which can avoid the reverse blockage of the diaphragm. At the same time, when different batches of developer are ultrafiltered, the speed of the fan blades is different, which will cause the reciprocating movement rate of the suction head on the inner wall of the diaphragm to change accordingly. Regardless of the speed of the ultrafiltration process, each movement will wait for the impurities on the surface of the diaphragm to form before removing them. The suction head automatically changes speed according to the flow rate of the developer, which not only ensures the stability of the developer ultrafiltration process, but also effectively prolongs the service life of the diaphragm and reduces maintenance costs.

[0023] 2. The suction head is arranged in the form of two elliptical ring tubes that cross and penetrate and connect in the middle, which not only increases the adsorption range of the suction head, but also enables the telescopic tube to maintain a parallel state with the first-stage ultrafiltration cylinder, and does not hinder the developer from entering the membrane to complete the ultrafiltration process, thereby improving the impurity removal speed and increasing the stability of the device;

[0024] 3. Through the setting of the adaptive grading mechanism, the expansion degree of the rotating rod is different, and the arc-shaped push plate is pushed to different distances. Finally, the pointer points to the indicator lights of different levels. The level setting is automatically determined according to the liquid particles and viscosity to ensure that the minimum level is used to achieve the full filtration effect. The ultrafiltration speed of different batches of developer can be balanced, thereby improving the filtration efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1It is a schematic diagram of the overall structure of a preferred embodiment of the present invention;

[0026] Figure 2 It is a schematic diagram of a side-view stereoscopic structure of the present invention;

[0027] Figure 3 It is a bottom-up three-dimensional structural schematic diagram of the present invention;

[0028] Figure 4 It is a schematic diagram of a partial three-dimensional structure of the present invention;

[0029] Figure 5 A partial three-dimensional cross-sectional view of the present invention;

[0030] Figure 6 It is a structural schematic diagram of the connection of the suction head shown in the present invention;

[0031] Figure 7 The present invention shows Figure 6 The enlarged structural diagram at A in the middle;

[0032] Figure 8 It is a structural schematic diagram of the ring sleeve connection shown in the present invention.

[0033] The numbers in the figure are:

[0034] 1. First-stage ultrafiltration cartridge; 2. Connecting pipe; 3. Second-stage ultrafiltration cartridge; 4. Liquid outlet pipe; 5. Liquid inlet pipe;

[0035] 6. Self-speed changing impurity removal mechanism; 61. Protective shell; 62. Support frame; 63. Eccentric gear; 64. Small pump; 65. Connecting plate; 66. Movable rod; 67. Main gear; 68. Mud discharge pipe; 69. Telescopic pipe; 610. Diaphragm; 611. Suction head; 612. Fan blade; 613. Rotating shaft;

[0036] 7. Adaptive grading mechanism; 71. Top plate; 72. Rotating rod; 73. Arc-shaped push plate; 74. Indicator light; 75. Return spring; 76. Moving rod; 77. Adjusting seat; 78. Pointer; 79. Rotating rod; 710. Ring sleeve. DETAILED DESCRIPTION

[0037] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0038] Embodiment 1 of the present invention

[0039] Please refer to Figures 1 to 8 As shown:

[0040] In order to solve the problems mentioned in the technical solution, the embodiment of the present application provides an ultrafiltration device for recovering PCB developer solution, including a first-level ultrafiltration cartridge 1, one side of the first-level ultrafiltration cartridge 1 is fixedly connected with a liquid inlet pipe 5, the other side of the first-level ultrafiltration cartridge 1 is fixedly connected with a pair of connecting pipes 2, the side of the connecting pipe 2 away from the first-level ultrafiltration cartridge 1 is fixedly connected with a second-level ultrafiltration cartridge 3, multiple groups of second-level ultrafiltration cartridges 3 are provided, and two adjacent second-level ultrafiltration cartridges 3 are connected by connecting pipes 2, the middle of the second-level ultrafiltration cartridge 3 is fixedly connected with a liquid outlet pipe 4, and also includes:

[0041] A self-variable impurity removal mechanism 6, used to automatically control the speed of impurity treatment in the first-stage ultrafiltration cartridge 1 according to the liquid flow rate;

[0042] An adaptive grading mechanism 7, for adopting appropriate filtration levels for different developer solutions;

[0043] The self-speed-changing impurity-removing mechanism 6 includes a protective shell 61 fixedly connected to the outer wall of the liquid inlet pipe 5, a rotating shaft 613 is rotatably penetrated in the middle of the protective shell 61, a fan blade 612 is fixedly connected to the middle of the rotating shaft 613, and the fan blade 612 is located inside the protective shell 61 as a whole. A support frame 62 is sleeved on the outer wall of the bottom of the rotating shaft 613, and the top of the support frame 62 is fixedly connected to the bottom of the protective shell 61;

[0044] The self-speed changing impurity removing mechanism 6 also includes a main gear 67 fixedly connected to the bottom of the rotating shaft 613, the outer wall of the main gear 67 is meshedly connected with the eccentric gear 63, the top center of the eccentric gear 63 is rotatably connected to the support frame 62, the eccentric part of the bottom of the eccentric gear 63 is rotatably connected with a movable rod 66, the side of the movable rod 66 away from the eccentric gear 63 is rotatably connected with a connecting plate 65, the middle part of the connecting plate 65 is fixedly connected with a small pump 64, one side of the small pump 64 is fixedly connected with a mud outlet pipe 68, the side of the mud outlet pipe 68 away from the small pump 64 is fixedly penetrated through the bottom of the connecting plate 65, the other side of the small pump 64 is fixedly connected with a telescopic pipe 69, the outer wall of the telescopic pipe 69 slides and penetrates the inner wall of the first-stage ultrafiltration cartridge 1, and the side of the telescopic pipe 69 away from the small pump 64 is fixedly connected with a suction head 611;

[0045] The self-speed-changing impurity removal mechanism 6 also includes a diaphragm 610 fixedly connected to the inner wall of the primary ultrafiltration cartridge 1, the outer wall of the suction head 611 slides against the inner wall of the diaphragm 610, and the outer wall of the suction head 611 is provided with a plurality of suction holes;

[0046] The material suction head 611 is in the form of two elliptical ring tubes intersecting and penetrating and communicating with each other in the middle;

[0047] The number of the multiple groups of secondary ultrafiltration cartridges 3 gradually increases in the direction away from the primary ultrafiltration cartridge 1 , the edge of the support frame 62 extends into the liquid inlet pipe 5 , and the main gear 67 is smaller than the eccentric gear 63 .

[0048] The effects achieved by this embodiment are as follows: In the prior art, the ultrafiltration system needs to be regularly maintained and cleaned, which includes but is not limited to cleaning the membrane surface, replacing damaged membrane elements, adjusting operating parameters, etc. However, frequent shutdowns for maintenance not only increase maintenance costs, but may also lead to production interruptions, thereby affecting the overall production efficiency and product quality. Compared with the prior art, through the implementation of this embodiment, a self-variable impurity removal mechanism 6 is provided, which can use a suction head 611 to reciprocate and adsorb impurities on the inner wall of the diaphragm 610, thereby avoiding reverse blockage of the diaphragm 610. At the same time, when different batches of developer are ultrafiltered, the rotation speed of the fan blade 612 is different, which will cause the reciprocating movement rate of the suction head 611 on the inner wall of the diaphragm 610 to change accordingly. Regardless of the speed of the ultrafiltration process, each movement will wait for the impurities on the surface of the diaphragm 610 to form before removing them.

[0049] For further examples, please refer to Figure 1 , Figures 5 to 8 As shown:

[0050] The adaptive grading mechanism 7 includes a top plate 71 fixedly connected to the top of the rotating shaft 613, a plurality of rotating rods 72 are connected to the bottom of the top plate 71 to rotate equidistantly around the circumference, a rotating rod 79 is connected to the middle of the plurality of rotating rods 72 to rotate, a ring sleeve 710 is connected to the side of the plurality of rotating rods 79 away from the rotating rods 72 to rotate together, and the inner wall of the ring sleeve 710 is connected to the outer wall of the rotating shaft 613 in a sliding manner;

[0051] The adaptive grading mechanism 7 also includes an adjustment seat 77 fixedly connected to the top of the first-stage ultrafiltration cartridge 1, a plurality of indicator lights 74 are fixedly connected to the top of the adjustment seat 77, a slide groove is provided on the side of the adjustment seat 77 away from the indicator light 74, a moving rod 76 is slidably connected in the slide groove of the adjustment seat 77, a pointer 78 is fixedly connected to the side of the moving rod 76 close to the indicator light 74, and the pointer 78 is set in the direction of the indicator light 74, an arc-shaped push plate 73 is fixedly connected to the side of the moving rod 76 away from the adjustment seat 77, a return spring 75 is fixedly connected to the bottom of the arc-shaped push plate 73, and one end of the return spring 75 away from the arc-shaped push plate 73 is fixedly connected to the adjustment seat 77;

[0052] The number of indicator lights 74 is consistent with the number of groups of secondary ultrafiltration cartridges 3;

[0053] Among them: the adjustment seat 77 is arranged close to one side of the rotating rod 72, the arc of the arc-shaped push plate 73 is arranged in the direction of the rotating rod 72, and a gravity ball is arranged at the bottom of the rotating rod 72 to increase the centrifugal force of the rotating rod 72. The first indicator light 74 close to the arc-shaped push plate 73 indicates the maximum level, and the indicator light 74 farther away from the arc-shaped push plate 73 indicates a smaller level, which is used to show how many membranes 610 the developer needs to be divided into for filtration processing.

[0054] The effects achieved by this embodiment are as follows: in the prior art, different batches of developer have different flow rates under the action of the same liquid inlet pump, which will eventually affect the efficiency of the ultrafiltration process and the life of the membrane. Compared with the prior art, through the implementation of this embodiment, the adaptive grading mechanism 7 can adopt different expansion degrees of the rotating rod 72 to push the arc-shaped push plate 73 at different distances, and finally make the pointer 78 point to the indicator light 74 of different levels, and automatically determine the level setting according to the liquid particles and viscosity, so as to ensure that the full filtration effect is achieved with the least number of levels.

[0055] Embodiment 2 of the present invention

[0056] The method for recovering PCB developer solution by ultrafiltration comprises the following steps:

[0057] Step 1: Pretreatment of developer: First, the recovered developer is pretreated. The pretreatment includes physical filtration and chemical treatment, which are used to remove large particles of impurities and suspended matter to protect the ultrafiltration membrane from damage. When the pretreated liquid is pressurized and enters the liquid inlet pipe 5, the filtration level of the recovered liquid can be automatically determined by the adaptive grading mechanism 7, that is, after the liquid passes into the first-level ultrafiltration cartridge 1, the number of groups of connecting pipes 2 corresponding to the preset level is selected for repeated filtration to ensure the adequacy of the filtration;

[0058] Step 2: Ultrafiltration and post-treatment process: The pre-treated developer passes through the ultrafiltration membrane. The ultrafiltration membrane can separate substances larger than the membrane pore size, while allowing water molecules and small molecules to pass through, thereby achieving the purpose of purification. The developer enters the inlet pipe 5 from the feed pump and reaches the first-level ultrafiltration cartridge 1 and the connecting pipe 2 of the ultrafiltration membrane assembly. Under the action of pressure, the developer passes through the micropores of the ultrafiltration membrane, and the impurities therein are trapped on the inner surface of the ultrafiltration membrane. The filtered clear liquid flows out from the outlet pipe 4, enters the discharge pump, and is then transported to the next processing unit. As the filtration process proceeds, the dirt on the surface of the ultrafiltration membrane gradually accumulates, and the membrane flux gradually decreases. Among them, the membrane flux of the filter membrane closest to the inlet pipe 5 decreases the fastest. Therefore, during the liquid inlet process, the filter membrane in the first-level ultrafiltration cartridge 1 is descaled in real time through the self-variable impurity removal mechanism 6 to increase its membrane flux to maintain the service life of the membrane. Then, the ultrafiltered liquid needs further disinfection and pH adjustment to ensure the safety and effect of the liquid.

[0059] Step 3: Storage and Use: The treated liquid is stored in a sealed container that is resistant to chemical corrosion and used in subsequent development processes when needed. When storing, be sure to add preservatives to prevent bacterial growth.

[0060] The complete usage steps and working principle of the above embodiment are as follows:

[0061] Working process:

[0062] When in use, the pressurized developer flows into the liquid inlet pipe 5 and first passes through the protective shell 61. Since the edge of the fan blade 612 extends into the liquid inlet pipe 5, the developer will drive the internal fan blade 612 to rotate when passing through the protective shell 61. Moreover, due to the different internal particles and viscosities of different batches of developer, different batches of developer are likely to change the rotation speed of the fan blade 612 under the action of the same liquid inlet pump. When the fan blade 612 rotates, it will synchronously drive the shaft 613 to rotate, and the main gear 67 located at the bottom of the shaft 613 will also rotate. Because the main gear 67 is set smaller than the eccentric gear 63, the rotation speed of the eccentric gear 63 will be reduced. It can be specifically set according to the flow rate of the developer, and then through the rotation of the eccentric gear 63 Drive one side of the bottom movable rod 66 to move in a circle, so that the other side of the movable rod 66 continuously pulls the connecting plate 65 back and forth, and then the telescopic tube 69 is synchronously telescopically reciprocated with the connecting plate 65, and finally the telescopic tube 69 drives the suction head 611 to slide back and forth on the inner wall of the diaphragm 610 synchronously. Because the suction head 611 is in the form of two elliptical ring tubes crossing and connecting through the middle, compared with the currently common adsorption scraper, the cross-inclined design of the annular elliptical tubes not only increases the adsorption range of the suction head 611 in one unit, but also the outer wall of the elliptical tube symmetrically contacts the inner wall of the diaphragm 610, so that the telescopic tube 69 can maintain a parallel state with the first-stage ultrafiltration cartridge 1, and does not hinder the developer from entering the diaphragm 610 normally to complete the ultrafiltration process, thereby improving the impurity removal speed and increasing The stability of the device is improved, and the small pump 64 continuously extracts the impurities in the telescopic tube 69, and the telescopic tube 69 is connected to the suction head 611, so that the suction head 611 can generate suction. During the movement, the suction hole of the suction head 611 continuously absorbs large particles of impurities and viscous substances adhering to the inner wall of the diaphragm 610 through suction. After the impurities pass through the telescopic tube 69, they are finally discharged from the mud outlet pipe 68, so as to collect the impurities on the inner wall of the diaphragm 610 and ensure the membrane flux of the diaphragm 610 in the first-stage ultrafiltration cartridge 1, thereby extending the filtration time and improving the filtration efficiency. At the same time, when different batches of developer are ultrafiltered, the rotation speed of the fan blade 612 is different, which will change the reciprocating movement speed of the suction head 611 on the inner wall of the diaphragm 610. When the developer has more particulate impurities, When the developer has less particulate matter and impurities, the free movement of liquid molecules will be accelerated, resulting in an increase in the viscosity of the liquid. Therefore, the liquid flow rate will decrease, and the speed at which water molecules or phenol required in the developer pass through the diaphragm 610 will be slower. The filtered impurities generated on the inner wall of the diaphragm 610 will also decrease. By reducing the speed of the eccentric gear 63, the reciprocating speed of the suction head 611 will also decrease at the same time, allowing time for impurities to accumulate, that is, each movement will wait for the impurities on the surface of the diaphragm 610 to form before removing them. Conversely, similarly to the above, when the developer has fewer particulate matter and impurities, the free movement of liquid molecules will be accelerated, resulting in an increase in the developer flow rate, a faster speed at which impurities accumulate on the inner wall of the diaphragm 610, and a relatively increased reciprocating speed of the suction head 611, which effectively adsorbs the impurities on the inner wall of the diaphragm 610.The suction head 611 automatically changes speed according to the flow rate of the developer, which not only ensures the stability of the developer ultrafiltration process, but also effectively prolongs the service life of the membrane 610 and reduces maintenance costs;

[0063] Please refer to the above working process Figures 1 to 6 .

[0064] When the top plate 71 rotates rapidly, the rotating rod 72 connected to the bottom thereof will rotate outward as a whole under the action of inertia and centrifugal force, and under the limiting action of the rotating rod 79 and the ring sleeve 710, the plurality of rotating rods 72 will rotate at the same distance. The expanded rotating rod 72 will squeeze the arc push plate 73 when rotating. After the arc push plate 73 is pushed, the moving rod 76 and the return spring 75 are squeezed synchronously. The moving rod 76 drives the pointer 78 to move in the direction of the suction head 611. The pointer 78 indicates which indicator light 74 it is at. The indicator light 74 lights up and opens the valve of the connecting pipe 2 through the external control system, so that the first-stage ultrafiltration cartridge 1 and the corresponding number of second-stage ultrafiltration cartridges 3 are all connected. The specific filtration is divided into several levels, which can be carried out according to the filtration difficulty of the developer itself. Generally speaking, the faster the flow rate of the developer, the less impurities it contains, and the faster the free movement between liquid molecules, resulting in the developer. The flow rate of the image liquid is accelerated. Therefore, under the same volume, the developer with less impurities passes through the membrane 610 faster than the developer with more impurities. The required membrane 610 is relatively less, and there is no need to shunt and speed up. When the developer flow rate is faster, the rotation speed of the top plate 71 is accelerated, and the amplitude of the outward rotation of the rotating rod 72 increases. Since the first indicator light 74 close to the arc push plate 73 indicates the largest level, and the indicator light 74 farther away from the arc push plate 73 indicates a smaller level, the rotating rod 72 that extends outward more pushes the arc push plate 73 to increase the distance, so that the indicator light 74 pointed to by the pointer 78 shows a smaller level. In this case, the developer may only need to shunt two membranes 610 to complete the ultrafiltration, that is, after passing through the first-level ultrafiltration cartridge 1, it is then shunted by a group of second-level ultrafiltration cartridges 3 to ensure that the ultrafiltration speed reaches the standard. Otherwise, it needs to pass through multiple groups of second-level ultrafiltration cartridges 3 and be ultrafiltered by multiple membranes 610 to balance the ultrafiltration speed of different batches of developer to improve the filtration efficiency.

[0065] Please refer to the above working process Figure 1 , Figures 5 to 8 .

[0066] The circuits and controls involved in the present invention are all prior art and will not be described in detail here.

[0067] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. An ultrafiltration device for recovering PCB developer solution, comprising a first-stage ultrafiltration cartridge (1), characterized in that: One side of the first-level ultrafiltration cartridge (1) is fixedly connected to a liquid inlet pipe (5), the other side of the first-level ultrafiltration cartridge (1) is fixedly connected to a pair of connecting pipes (2), the side of the connecting pipe (2) away from the first-level ultrafiltration cartridge (1) is fixedly connected to a second-level ultrafiltration cartridge (3), a plurality of groups of the second-level ultrafiltration cartridges (3) are provided, and two adjacent second-level ultrafiltration cartridges (3) are connected via the connecting pipe (2), the middle of the second-level ultrafiltration cartridge (3) is fixedly connected to a liquid outlet pipe (4), and further comprises: A self-variable impurity removal mechanism (6) for automatically controlling the speed of impurity treatment in the first-stage ultrafiltration cartridge (1) according to the liquid flow rate; The adaptive grading mechanism (7) is used to adopt appropriate filtration levels for different developer solutions.

2. The ultrafiltration device for recovering PCB developer according to claim 1, characterized in that: The self-speed-changing impurity-removing mechanism (6) comprises a protective shell (61) fixedly connected to the outer wall of the liquid inlet pipe (5); a rotating shaft (613) rotatably penetrates the middle of the protective shell (61); a fan blade (612) is fixedly connected to the middle of the rotating shaft (613); the fan blade (612) is entirely located inside the protective shell (61); a support frame (62) is sleeved on the outer wall of the bottom of the rotating shaft (613); and the top of the support frame (62) is fixedly connected to the bottom of the protective shell (61).

3. The ultrafiltration device for recovering PCB developer according to claim 2, characterized in that: The self-speed changing debris removing mechanism (6) further comprises a main gear (67) fixedly connected to the bottom of the rotating shaft (613); the outer wall of the main gear (67) is meshingly connected to an eccentric gear (63); the top center of the eccentric gear (63) is rotatably connected to a support frame (62); the bottom eccentric part of the eccentric gear (63) is rotatably connected to a movable rod (66); the side of the movable rod (66) away from the eccentric gear (63) is rotatably connected to a connecting plate (65); the connecting plate (65) A small pump (64) is fixedly connected to the middle part, and one side of the small pump (64) is fixedly connected to a mud outlet pipe (68), and the side of the mud outlet pipe (68) away from the small pump (64) is fixedly passed through the bottom of the connecting plate (65), and the other side of the small pump (64) is fixedly connected to a telescopic tube (69), and the outer wall of the telescopic tube (69) slides through the inner wall of the first-stage ultrafiltration cartridge (1), and the side of the telescopic tube (69) away from the small pump (64) is fixedly connected to a suction head (611).

4. The ultrafiltration device for recovering PCB developer according to claim 3, characterized in that: The self-speed-changing impurity removal mechanism (6) further comprises a diaphragm (610) fixedly connected to the inner wall of the first-stage ultrafiltration cartridge (1); the outer wall of the suction head (611) is slidably abutted against the inner wall of the diaphragm (610); and the outer wall of the suction head (611) is provided with a plurality of suction holes.

5. The ultrafiltration device for recovering PCB developer according to claim 2, characterized in that: The adaptive grading mechanism (7) comprises a top plate (71) fixedly connected to the top of a rotating shaft (613); the bottom of the top plate (71) is connected to a plurality of rotating rods (72) equidistantly around a circle; the middle parts of the plurality of rotating rods (72) are all connected to a rotating rod (79) rotatably; the sides of the plurality of rotating rods (79) away from the rotating rods (72) are connected to a ring sleeve (710) rotatably; the inner wall of the ring sleeve (710) is slidably connected to the outer wall of the rotating shaft (613).

6. The ultrafiltration device for recovering PCB developer according to claim 1, characterized in that: The adaptive grading mechanism (7) also includes an adjustment seat (77) fixedly connected to the top of the first-stage ultrafiltration cartridge (1), a plurality of indicator lights (74) being fixedly connected to the top of the adjustment seat (77), a slide groove being provided on the side of the adjustment seat (77) away from the indicator lights (74), a moving rod (76) being slidably connected in the slide groove of the adjustment seat (77), a pointer (78) being fixedly connected to the side of the moving rod (76) close to the indicator lights (74), the pointer (78) being arranged in the direction of the indicator lights (74), an arc-shaped push plate (73) being fixedly connected to the side of the moving rod (76) away from the adjustment seat (77), a return spring (75) being fixedly connected to the bottom of the arc-shaped push plate (73), and one end of the return spring (75) away from the arc-shaped push plate (73) being fixedly connected to the adjustment seat (77).

7. The ultrafiltration device for recovering PCB developer according to claim 6, characterized in that: The number of the indicator lights (74) is consistent with the number of groups of the secondary ultrafiltration cartridges (3).

8. The ultrafiltration device for recovering PCB developer according to claim 1, characterized in that: The suction head (611) is in the form of two elliptical ring tubes that cross and penetrate and communicate with each other in the middle.

9. A method for ultrafiltration for recovering PCB developer solution, applied to the ultrafiltration device for recovering PCB developer solution as described in claims 1 to 8, comprising the following steps: Step 1: Pretreatment of developer: First, the recovered developer is pretreated. The pretreatment includes physical filtration and chemical treatment, which are used to remove large particles of impurities and suspended matter to protect the ultrafiltration membrane from damage. When the pretreated liquid is pressurized and enters the liquid inlet pipe (5), the filtration level of the recovered liquid can be automatically determined by the adaptive grading mechanism (7). That is, after the liquid passes into the first-stage ultrafiltration cartridge (1), the number of groups of connecting pipes (2) corresponding to the preset level is selected for repeated filtration to ensure the adequacy of the filtration. Step 2: Ultrafiltration and post-treatment process: The pre-treated developer is passed through an ultrafiltration membrane. The ultrafiltration membrane can separate substances larger than the membrane pore size, while allowing water molecules and small molecules to pass through, thereby achieving the purpose of purification. The developer enters the inlet pipe (5) from the feed pump and reaches the first-level ultrafiltration cartridge (1) and the connecting pipe (2) of the ultrafiltration membrane assembly. Under the action of pressure, the developer passes through the micropores of the ultrafiltration membrane, and the impurities therein are trapped on the inner surface of the ultrafiltration membrane. The filtered clear liquid flows out from the outlet pipe (4) and enters the outlet pump. Then it is transported to the next processing unit. As the filtration process proceeds, dirt on the surface of the ultrafiltration membrane gradually accumulates and the membrane flux gradually decreases. The membrane flux of the filter membrane closest to the liquid inlet pipe (5) decreases the fastest. Therefore, during the liquid inlet process, the filter membrane in the first-stage ultrafiltration cartridge (1) is descaled in real time through the self-variable speed impurity removal mechanism (6) to increase its membrane flux and maintain the service life of the membrane. Then, the ultrafiltration liquid needs to be further disinfected and the pH value adjusted to ensure the safety and effectiveness of the liquid. Step 3: Storage and Use: The treated liquid is stored in a sealed container that is resistant to chemical corrosion and used in subsequent development processes when needed. When storing, be sure to add preservatives to prevent bacterial growth.

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