Novel device for integrating aluminum etching, photoresist removing and cleaning

Abstract

The invention provides a novel device for integration of aluminum etching, photoresist removing and cleaning, which comprises an etching transfer cavity, a plurality of groups of etch etching process cavities, strip photoresist removing process cavities, a forevacuum device, an Aligner alignment device and a cooling area are respectively arranged on the side of the etching transfer cavity, the feeding area is arranged on the side of the etching conveying cavity and located on the left side of the Allegner alignment device, the cleaning conveying cavity is arranged on one side of the cooling area, and a gas purging device, a Wet Transfer cleaning conveying arm and a discharging area are arranged on the cleaning conveying cavity. The cleaning cavity is arranged on one side of the cleaning conveying cavity. According to the novel device for integrating aluminum etching, photoresist removing and cleaning, CL2 is adopted as Al etching reaction gas, the fixed morphology of AL is achieved in the etching cavity, then surface photoresist removing is completed in the photoresist removing cavity, and the vacuum state is kept all the time in the process.

Description

Technical Field

[0001] The invention relates to the field of semiconductor processing, and in particular to a novel device for integrating aluminum etching, degumming and cleaning. Background Art

[0002] In the field of modern electronic manufacturing, aluminum, as an important conductive material, is widely used in the manufacture of semiconductor devices and integrated circuits. With the continuous development of electronic technology, the process requirements for aluminum etching, degumming and cleaning are becoming increasingly higher.

[0003] Traditional aluminum etching, degumming and cleaning processes are usually carried out separately in different equipment. This approach has some obvious disadvantages. First, the use of multiple devices increases equipment costs and floor space. Second, transferring workpieces between different equipment increases process complexity and time costs, and may also introduce additional environmental pollution risks.

[0004] Therefore, it is necessary to provide a new integrated device for aluminum etching, degumming and cleaning to solve the above technical problems. Summary of the invention

[0005] The present invention provides a novel device for aluminum etching, degumming and cleaning, which solves the problem of increasing equipment cost and floor space by using multiple devices. Secondly, transferring workpieces between different devices will increase the complexity and time cost of the process, and may also introduce additional environmental pollution risks.

[0006] In order to solve the above technical problems, the present invention provides a novel device for integrated aluminum etching, degumming and cleaning, comprising:

[0007] An etching transfer chamber, wherein the sides of the etching transfer chamber are respectively provided with a plurality of groups of etch process chambers, strip degumming process chambers, pre-vacuum devices, aligner alignment devices and cooling zones;

[0008] A loading area, which is arranged at the side of the etching transfer chamber and is located on the left side of the Aligner alignment device;

[0009] A cleaning and conveying cavity, which is arranged on one side of the cooling zone, and is respectively provided with a gas purge device, a wet transfer cleaning and conveying arm and a material unloading zone;

[0010] A cleaning cavity is arranged at one side of the cleaning and conveying cavity.

[0011] Preferably, a lifting seat is provided inside the cleaning cavity, a nano nozzle is provided above the lifting seat, and a cleaning liquid filling port and a nitrogen filling port are respectively provided on the top and side of the nano nozzle.

[0012] Preferably, a vacuum suction cup is disposed on the surface of the lifting seat, and a plurality of adsorption holes and ejector pins are respectively disposed on the surface of the vacuum suction cup.

[0013] Preferably, a discharge box is provided above the loading area, and a storage box is provided on one side of the top of the discharge box.

[0014] Preferably, a discharge hole is provided between the storage box and the discharge box, and a discharge port is provided on the left side of the bottom of the discharge box.

[0015] Preferably, a pushing device is provided on one side of the inside of the discharge box, and the pushing device comprises a hydraulic telescopic rod, and one end of the hydraulic telescopic rod is connected to a pushing block.

[0016] Preferably, a fixing assembly is provided between the discharging box and the storage box, and the fixing assembly comprises a threaded rod, a limiting block is installed on the surface of the threaded rod, and a mounting sleeve is provided on the surface of the threaded rod and above the limiting block.

[0017] Preferably, one side of the installation sleeve is connected to a fixing ring via a connecting block, the fixing ring is connected to the storage box, and a threaded sleeve is threadedly connected to the surface of the threaded rod and located above the installation sleeve.

[0018] Preferably, a movable component is provided at the bottom of the discharge box, and the movable component includes a fixed rod, a movable sleeve is provided on the surface of the fixed rod, a movable frame is connected to the surface of the movable sleeve, a fixing bolt is provided on the temporal part of the movable sleeve, and the fixed frame is connected to the side of the discharge box.

[0019] Preferably, both ends of the fixing rod are respectively connected with a mounting block and a stop block.

[0020] Compared with the related art, the novel device for integrated aluminum etching, degumming and cleaning provided by the present invention has the following beneficial effects:

[0021] The present invention provides a novel device for aluminum etching, degumming and cleaning. Cl2 is used as Al etching reaction gas to achieve a fixed morphology of Al in an etching chamber, and then the surface photoresist is removed in the degumming chamber. In this process, a vacuum state is maintained all the time, and then the surface polymer is cleaned by entering a wet cleaning chamber through a pre-vacuuming device in the etching chamber. Since Al and Cl ions react with H2O molecules to generate Al(OH)3, Al is corroded and the yield is affected. In order to prevent the Cl ions remaining on the Al surface from reacting with water molecules in the air after contacting the air to corrode Al, the Al is The etching, degumming and cleaning chambers are integrated in one device, which can realize parallel processing of multiple objects to be processed within one process cycle, avoiding multiple auxiliary steps such as multiple handling and switching programs, thereby improving the process efficiency of multiple objects to be processed. On the other hand, it also avoids the objects to be processed in a non-process state from being exposed to the atmosphere due to waiting for too long, reducing the corrosion damage to the process objects caused by large gases. Secondly, before entering the wet chamber, the transfer chamber is purged with N2 to keep the transfer and cleaning chambers dry, preventing the liquid in the cleaning chamber from diffusing into the etching chamber, further reducing the corrosion damage to the process objects caused by large gases. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 A schematic structural diagram of a first embodiment of a novel device for integrated aluminum etching, degumming and cleaning provided by the present invention;

[0023] Figure 2 for Figure 1 The schematic diagram of the structure inside the cleaning transfer cavity is shown;

[0024] Figure 3 for Figure 1 The schematic diagram of the structure inside the cleaning chamber is shown;

[0025] Figure 4 It is a schematic diagram of the structure of the vacuum suction cup;

[0026] Figure 5 A schematic structural diagram of a second embodiment of a novel device for integrated aluminum etching, degumming and cleaning provided by the present invention;

[0027] Figure 6 for Figure 5 The three-dimensional structure schematic diagram of the overall device from a first viewing angle is shown;

[0028] Figure 7 for Figure 6 An enlarged schematic diagram of part A is shown;

[0029] Figure 8This is a schematic structural diagram of a third embodiment of a novel device for integrated aluminum etching, degumming and cleaning provided by the present invention.

[0030] Numbers in the figure: 1. Etching transfer chamber; 2. Strip degumming process chamber; 3. Etch etching process chamber; 4. Pre-vacuum device; 5. Loading area; 6. Aligner alignment device; 7. Cooling area; 8. Cleaning transfer chamber; 9. Wet Transfer cleaning transfer arm; 10. Gas purge device; 11. Unloading area;

[0031] 12. Cleaning chamber; 121. Nano nozzle; 122. Cleaning liquid filling port; 123. Nitrogen filling port; 124. Lifting seat;

[0032] 13. Vacuum suction cup; 131. Adsorption hole; 132. Ejector pin;

[0033] 14. Discharging box; 15. Storage box; 16. Discharging hole; 17. Discharging port;

[0034] 18. Pushing device; 181. Hydraulic telescopic rod; 182. Pushing block;

[0035] 19. Fixing assembly; 191. Threaded rod; 192. Stop block; 193. Mounting sleeve; 194. Fixing ring; 195. Threaded sleeve;

[0036] 20. Moving assembly; 201. Fixed rod; 202. Moving sleeve; 203. Fixed frame; 204. Fixed bolt; 205. Mounting block; 206. Stop block. DETAILED DESCRIPTION

[0037] The present invention will be further described below in conjunction with the accompanying drawings and implementation modes.

[0038] First embodiment

[0039] Please refer to Figure 1 , Figure 2 , Figure 3 and Figure 4 ,in, Figure 1 A schematic structural diagram of a first embodiment of a novel device for integrated aluminum etching, degumming and cleaning provided by the present invention; Figure 2 for Figure 1 The schematic diagram of the structure inside the cleaning transfer cavity is shown; Figure 3 for Figure 1 The schematic diagram of the structure inside the cleaning chamber is shown; Figure 4 A novel device for integrated aluminum etching, degumming and cleaning comprises:

[0040] An etching transfer chamber 1, wherein the sides of the etching transfer chamber 1 are respectively provided with a plurality of etch process chambers 3, a strip degumming process chamber 2, a pre-vacuum device 4, an Aligner alignment device 6 and a cooling zone 7;

[0041] A loading area 5, the loading area 5 is arranged at the side of the etching transfer chamber 1 and is located on the left side of the Aligner alignment device 6;

[0042] A cleaning and conveying chamber 8, wherein the cleaning and conveying chamber 8 is disposed on one side of the cooling zone 7, and a gas purge device 10, a wet transfer cleaning and conveying arm 9 and a material unloading zone 11 are respectively disposed on the cleaning and conveying chamber 8;

[0043] The cleaning chamber 12 is disposed at one side of the cleaning and conveying chamber 8 .

[0044] A lifting seat 124 is disposed inside the cleaning chamber 12 , a nano nozzle 121 is disposed above the lifting seat 124 , and a cleaning liquid filling port 122 and a nitrogen filling port 123 are disposed on the top and side of the nano nozzle 121 , respectively.

[0045] A vacuum suction cup 13 is disposed on the surface of the lifting seat 124 , and a plurality of suction holes 131 and ejector pins 132 are disposed on the surface of the vacuum suction cup 13 .

[0046] process:

[0047] Place the raw material Pod on the standard mechanical interface SMIF;

[0048] The SMIF rises, the Pod will be opened, and the robotic arm in the etching conveyor will grab the cassette in the raw material Pod and put it into the pre-vacuum device ELL;

[0049] ELL vacuuming is completed and the cassette will enter a vacuum environment;

[0050] The robotic arm in the etching conveyor device delivers the object to be processed in the cassette into the alignment device;

[0051] After the alignment is completed, the robotic arm in the etching conveyor device delivers the object to be processed into the etching chamber;

[0052] Waiting for the process object to be etched in the etching chamber;

[0053] The robot arm in the etching conveyor device delivers the object to be processed into the debonding chamber;

[0054] The surface photoresist of the process object is removed in the etching chamber;

[0055] The robot arm in the etching conveyor device delivers the object to be processed into the pre-vacuum device XLL;

[0056] XLL vacuum release is completed, and the process object will enter the large air environment;

[0057] The robot in the cleaning conveyor device delivers the object to be processed into the cleaning chamber;

[0058] After the surface polymer of the process object is cleaned in the cleaning chamber;

[0059] The robot in the cleaning conveyor sends the object to be processed into the reserved empty Pod on the standard mechanical interface (exit);

[0060] After all the objects to be processed in the cassette in the ELL have been processed, the cassette will be put back into the original material Pod.

[0061] After all the process objects are completed, they are placed in the reserved empty Pod to complete the etching, degumming and cleaning processes. The composition of AL is: Al-Si (0-1.0%), Al-Si (0-1.0%) -Cu (0-2.0%), Al-Cu

[0062] (0-2.0%).

[0063] Currently, mainstream aluminum etching equipment only integrates etching process and degumming process. After the etching and degumming process are completed, the cleaning equipment needs to be replaced. The present invention integrates etching, degumming and cleaning into one device, thereby improving the process efficiency of multiple objects to be processed. Secondly, N2 is added to purge the transfer chamber to maintain the dryness of the transfer and cleaning chamber.

[0064] The dry etching technology and wet cleaning process are integrated into the same equipment, aiming to improve production efficiency, optimize the process flow and reduce the space occupied by the equipment. This patent application aims to protect the core technical solution of this integrated design. Through precise mechanical structure design, efficient energy transmission and control system and intelligent operation process, the seamless connection between metal surface etching and subsequent cleaning steps is achieved, thereby greatly improving the consistency and yield rate of product processing. The synthetic machine is not only suitable for the fine processing of various metal materials, but also has high flexibility and scalability. It can be customized according to different customer needs to meet the increasingly complex and changing processing needs. In terms of detailed technical implementation, the metal etching and cleaning synthetic machine adopts advanced dry etching technology, such as reactive ion etching (RIE), inductively coupled plasma etching (ICP), etc. These technologies can perform high-precision graphic processing on the metal surface under vacuum environment, with the advantages of fast etching rate, high resolution and small damage. By accurately controlling parameters such as gas flow, RF power, and etching time, the fine regulation of the metal surface microstructure can be achieved.

[0065] Following the dry etching step, the machine automatically switches to wet cleaning mode. The wet cleaning system integrates a variety of chemical reagent tanks. According to the type of metal and the nature of the residue after etching, the appropriate cleaning solution is selected for immersion, spraying or ultrasonic cleaning to effectively remove the by-products, organic pollutants and oxides generated during the etching process. During the cleaning process, by controlling parameters such as temperature, concentration, cleaning time and stirring method, the cleaning effect is ensured while corrosion or damage to the metal substrate is avoided.

[0066] In order to realize the automatic switching and integrated control of dry etching and wet cleaning, the synthesis machine is also equipped with an advanced intelligent control system, which integrates functional modules such as sensor monitoring, data processing, algorithm analysis and human-computer interaction interface. It can monitor the key parameters in the etching and cleaning process in real time, such as gas pressure, temperature, cleaning liquid concentration, etc., and automatically adjust the control parameters according to the preset process recipe to ensure the stability and consistency of the entire processing process. At the same time, the system also has fault diagnosis and early warning functions, which can promptly detect and handle abnormal situations, and improve the reliability and maintenance efficiency of equipment.

[0067] In addition, in order to further improve processing efficiency and flexibility, the metal etching and cleaning combined machine also adopts a modular design. Each functional module such as the dry etching chamber, wet cleaning tank, transmission system, etc. can be independently upgraded or replaced to adapt to the processing requirements of different materials and different processes. At the same time, the machine is also equipped with a flexible tooling and fixture system that can be compatible with metal workpieces of various specifications to meet the different needs of large-scale production or small-scale research and development.

[0068] In summary, the metal etching and cleaning synthesis machine protected by this patent application, with its efficient processing capabilities, flexible process configuration and intelligent control system, promotes the industry to develop in the direction of higher precision, higher efficiency and lower cost. In order to further enhance the competitiveness and market adaptability of the metal etching and cleaning synthesis machine

[0069] Automated material handling systems

[0070] Adding automatic loading and unloading and transmission systems allows metal workpieces to flow automatically between etching, cleaning and subsequent processes, reducing manual intervention and improving the degree of automation of the production line, which can not only reduce labor costs but also improve production efficiency and consistency.

[0071] Precise temperature and humidity control

[0072] During the etching and cleaning process, precise control of the temperature and humidity in the cavity and cleaning tank is crucial to ensuring processing quality. Therefore, the machine will be equipped with an advanced temperature and humidity control system to ensure that the processing environment is stable and reliable to meet the needs of high-precision processing.

[0073] Modular and standardized design

[0074] In order to better meet the diverse needs of the market, the machine will adopt a more modular and standardized design. The modular design allows users to choose different functional modules according to their own needs to achieve customized processing solutions, while the standardized design helps to reduce production costs, improve product quality and reliability, and promote the popularization and promotion of the machine among different industries and customers.

[0075] Compared with the related art, the novel device for integrated aluminum etching, degumming and cleaning provided by the present invention has the following beneficial effects:

[0076] The present invention provides a novel device for aluminum etching, degumming and cleaning. Cl2 is used as Al etching reaction gas to achieve a fixed morphology of Al in an etching chamber, and then the surface photoresist is removed in the degumming chamber. In this process, a vacuum state is maintained all the time, and then the surface polymer is cleaned by entering a wet cleaning chamber through a pre-vacuuming device in the etching chamber. Since Al and Cl ions react with H2O molecules to generate Al(OH)3, Al is corroded and the yield is affected. In order to prevent the Cl ions remaining on the Al surface from reacting with water molecules in the air after contacting the air to corrode Al, the Al is The etching, degumming and cleaning chambers are integrated in one device, which can realize parallel processing of multiple objects to be processed within one process cycle, avoiding multiple auxiliary steps such as multiple handling and switching programs, thereby improving the process efficiency of multiple objects to be processed. On the other hand, it also avoids the objects to be processed in a non-process state from being exposed to the atmosphere due to waiting for too long, reducing the corrosion damage to the process objects caused by large gases. Secondly, before entering the wet chamber, the transfer chamber is purged with N2 to keep the transfer and cleaning chambers dry, preventing the liquid in the cleaning chamber from diffusing into the etching chamber, further reducing the corrosion damage to the process objects caused by large gases.

[0077] Second embodiment

[0078] Please refer to Figure 5 , Figure 6 and Figure 7 Based on the novel device for integrated aluminum etching, degumming and cleaning provided in the first embodiment of the present application, the second embodiment of the present application proposes another novel device for integrated aluminum etching, degumming and cleaning. The second embodiment is only a preferred method of the first embodiment, and the implementation of the second embodiment will not affect the independent implementation of the first embodiment.

[0079] Specifically, the second embodiment of the present application provides a new type of integrated device for aluminum etching, degumming and cleaning, which is different in that a discharge box 14 is arranged above the loading area 5, and a storage box 15 is arranged on one side of the top of the discharge box 14.

[0080] A discharge hole 16 is defined between the storage box 15 and the discharge box 14 , and a discharge port 17 is defined on the left side of the bottom of the discharge box 14 .

[0081] A pushing device 18 is disposed on one side of the discharge box 14 . The pushing device 18 includes a hydraulic telescopic rod 181 . One end of the hydraulic telescopic rod 181 is connected to a pushing block 182 .

[0082] A fixing assembly 19 is provided between the discharging box 14 and the storage box 15 , and the fixing assembly 19 includes a threaded rod 191 , a limiting block 192 is installed on the surface of the threaded rod 191 , and a mounting sleeve 193 is sleeved on the surface of the threaded rod 191 and located above the limiting block 192 .

[0083] The threaded rod 191 is installed on the surface of the discharge box 14 . The use of the threaded rod 191 , the mounting sleeve 193 and the threaded sleeve 195 facilitates the installation of the storage box 15 through the fixing ring 194 .

[0084] A fixing ring 194 is connected to one side of the installation sleeve 193 via a connecting block, and the fixing ring 194 is connected to the storage box 15 . A threaded sleeve 195 is threadedly connected to the surface of the threaded rod 191 and located above the installation sleeve 193 .

[0085] The working principle of a novel device for integrated aluminum etching, degumming and cleaning provided by the present invention is as follows:

[0086] When unloading semiconductors, the semiconductors in the storage box 15 are first dropped into the discharge box 14 through the discharge hole 16. After the semiconductor materials have dropped into the discharge box 14, the hydraulic telescopic rod 181 is started to drive the pushing block 182 to push the semiconductor materials through the discharge port 17 opened at the bottom of the discharge box 14 and drop onto the loading area 5.

[0087] Compared with the related art, the novel device for integrated aluminum etching, degumming and cleaning provided by the present invention has the following beneficial effects:

[0088] The present invention provides a novel device for integrated aluminum etching, degumming and cleaning. A discharge box 14 with a discharge hole 16 and a discharge port 17, a pushing device 18, a storage box 15 and a fixing component 19 are arranged above the loading area 5, and the cooperation between them can facilitate the uniform placement of semiconductor materials in the upper loading area 5 in sequence.

[0089] Third embodiment

[0090] Please refer to Figure 8 Based on the novel device for integrated aluminum etching, degumming and cleaning provided in the first embodiment of the present application, the third embodiment of the present application proposes another novel device for integrated aluminum etching, degumming and cleaning. The third embodiment is only a preferred embodiment of the first embodiment, and the implementation of the third embodiment will not affect the independent implementation of the first embodiment.

[0091] Specifically, the third embodiment of the present application provides a new type of integrated device for aluminum etching, degumming and cleaning. The difference is that, in a new type of integrated device for aluminum etching, degumming and cleaning, a movable component 20 is provided at the bottom of the discharge box 14, and the movable component 20 includes a fixed rod 201, and the surface of the fixed rod 201 is provided with a movable sleeve 202, and the surface of the movable sleeve 202 is connected to a movable frame 203, and the temporal part of the movable sleeve 202 is provided with a fixing bolt 204, and the fixed frame 203 is connected to the side of the discharge box 14.

[0092] The mounting block 205 can be mounted on the side of the loading area 5 by means of bolts, and the use of the stopper 206 can prevent the movable sleeve 202 from falling off the surface of the fixed rod 201.

[0093] Two ends of the fixing rod 201 are respectively connected with a mounting block 205 and a stop block 206 .

[0094] The working principle of a novel device for integrated aluminum etching, degumming and cleaning provided by the present invention is as follows:

[0095] During use, when the position of the discharge box 14 with the storage box 15 is adjusted, the movable frame 203 is moved by pulling the discharge box 14, and when the movable frame 203 moves, it drives the movable sleeve 202 to move on the surface of the fixed rod 201. When the entire device is moved to a suitable position, the fixing bolt 204 is used to pass through the movable sleeve 202 and connect it to the fixed rod 201.

[0096] Compared with the related art, the novel device for integrated aluminum etching, degumming and cleaning provided by the present invention has the following beneficial effects:

[0097] The present invention provides a novel device for integrated aluminum etching, degumming and cleaning. A moving assembly 20 is arranged between a discharge box 14 and a loading area 5 to facilitate adjustment of the front and rear positions of the entire device according to the position of use after the entire device is installed.

[0098] The above descriptions are merely embodiments of the present invention and are not intended to limit the patent scope of the present invention. Any equivalent structure or equivalent process transformation made using the contents of the present invention specification and drawings, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present invention.

Claims

1. A novel device for integrated aluminum etching, degumming and cleaning, characterized in that: include: An etching transfer chamber, wherein the sides of the etching transfer chamber are respectively provided with a plurality of groups of etch process chambers, strip degumming process chambers, pre-vacuum devices, aligner alignment devices and cooling zones; A loading area, which is arranged at the side of the etching transfer chamber and is located on the left side of the Aligner alignment device; A cleaning and conveying cavity, which is arranged on one side of the cooling zone, and is respectively provided with a gas purge device, a wet transfer cleaning and conveying arm and a material unloading zone; A cleaning cavity is arranged at one side of the cleaning and conveying cavity.

2. The novel device for integrated aluminum etching, degumming and cleaning according to claim 1 is characterized in that: A lifting seat is arranged inside the cleaning cavity, a nano nozzle is arranged above the lifting seat, and a cleaning liquid filling port and a nitrogen filling port are respectively arranged on the top and side of the nano nozzle.

3. The novel device for integrated aluminum etching, degumming and cleaning according to claim 2 is characterized in that: The surface of the lifting seat is provided with a vacuum suction cup, and the surface of the vacuum suction cup is respectively provided with a plurality of adsorption holes and ejector pins.

4. The novel device for integrated aluminum etching, degumming and cleaning according to claim 1 is characterized in that: A discharge box is arranged above the feeding area, and a storage box is arranged on one side of the top of the discharge box.

5. The novel device for integrated aluminum etching, degumming and cleaning according to claim 4 is characterized in that: A discharge hole is provided between the storage box and the discharge box, and a discharge port is provided on the left side of the bottom of the discharge box.

6. The novel device for integrated aluminum etching, degumming and cleaning according to claim 4 is characterized in that: A pushing device is arranged on one side of the inside of the discharge box, and the pushing device comprises a hydraulic telescopic rod, and one end of the hydraulic telescopic rod is connected to a pushing block.

7. The novel device for integrated aluminum etching, degumming and cleaning according to claim 4 is characterized in that: A fixing assembly is arranged between the discharging box and the storage box. The fixing assembly comprises a threaded rod. A limiting block is installed on the surface of the threaded rod. A mounting sleeve is sleeved on the surface of the threaded rod and located above the limiting block.

8. The novel device for integrated aluminum etching, degumming and cleaning according to claim 7 is characterized in that: One side of the installation sleeve is connected with a fixing ring through a connecting block, the fixing ring is connected with the storage box, and a threaded sleeve is threadedly connected on the surface of the threaded rod and located above the installation sleeve.

9. The novel device for integrated aluminum etching, degumming and cleaning according to claim 1 is characterized in that: A moving assembly is provided at the bottom of the discharge box, and the moving assembly includes a fixed rod, a moving sleeve is provided on the surface of the fixed rod, a moving frame is connected to the surface of the moving sleeve, a fixing bolt is provided on the temporal part of the moving sleeve, and the fixing frame is connected to the side of the discharge box.

10. The novel device for integrated aluminum etching, degumming and cleaning according to claim 9 is characterized in that: The two ends of the fixing rod are respectively connected with a mounting block and a stop block.

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