Comprehensive filtering device and method for DPP type extreme ultraviolet light source chippings

Abstract

The invention belongs to the technical field of semiconductor manufacturing equipment, and discloses a DPP type extreme ultraviolet light source chip comprehensive filtering device and a method thereof. The DPP type extreme ultraviolet light source scrap comprehensive filtering device comprises a scrap introducing part, a vacuum difference part, a gas purging part, a foil trap filtering part, an atomic hydrogen part, a delayed field ion energy analyzer part, a quartz crystal microbalance part and a control and monitoring system. According to the device disclosed by the invention, various cleaning mechanisms (vacuum difference, gas purging, foil trap filtering and atomic hydrogen reaction) are combined, and a high-precision monitoring system (an ion energy analyzer and a quartz crystal microbalance) is introduced, so that the pollution of fragments of different types and different particle sizes can be effectively filtered and relieved. Meanwhile, the real-time online monitoring system can adjust the working state of each cleaning mechanism in time according to a monitoring result, so that efficient and accurate debris cleaning is realized, the service life of a photoetching system component is prolonged, and the photoetching efficiency is improved.

Description

Technical Field

[0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and in particular relates to a DPP type extreme ultraviolet light source debris comprehensive filtering device and a method thereof. Background Art

[0002] A device for filtering and mitigating debris generated by a DPP (Discharge Produced Plasma) type extreme ultraviolet light source. In extreme ultraviolet lithography technology, a DPP type extreme ultraviolet light source is a key component for generating extreme ultraviolet light. However, this type of light source often generates a large amount of debris in the process of generating extreme ultraviolet light. These debris may damage the optical collection system of the lithography machine, thereby affecting the accuracy and efficiency of lithography. A DPP type extreme ultraviolet light source generates a large amount of debris during operation. These debris may damage the optical components of the lithography system and reduce the working efficiency and accuracy of the lithography system. In the prior art, the debris removal mechanism is often targeted at a certain type of debris and has low efficiency. Traditional debris removal systems lack effective monitoring means and cannot evaluate the removal effect in real time. Equipment damage caused by debris accumulation is the main reason for frequent maintenance of lithography systems.

[0003] Through the above analysis, the problems and defects of the prior art are as follows:

[0004] (1) Debris contamination problem of DPP-type extreme ultraviolet light source: DPP-type extreme ultraviolet light source will generate a large amount of debris during operation. These debris will damage the optical components of the lithography system and reduce the working efficiency and accuracy of the lithography system.

[0005] (2) Problem of low debris removal efficiency: In the prior art, the debris removal mechanism is often targeted at a certain type of debris and has low efficiency.

[0006] (3) Insufficient monitoring of debris removal effects: Traditional debris removal systems lack effective monitoring methods and are unable to conduct real-time evaluation of the removal effects.

[0007] (4) Problem of frequent system maintenance: Equipment damage due to debris accumulation is the main reason for frequent maintenance of lithography systems. Summary of the invention

[0008] In view of the problems existing in the prior art, the present invention provides a DPP type extreme ultraviolet light source debris comprehensive filtering device and method thereof.

[0009] The present invention is implemented in this way: a DPP type extreme ultraviolet light source debris comprehensive filtering device comprises:

[0010] Debris introduction section, vacuum differential section, gas purge section, foil trap filter section, atomic hydrogen section, delayed field ion energy analyzer section, quartz crystal microbalance section, control and monitoring system;

[0011] The debris introduction part is connected to the control and monitoring system. The debris introduction part is the front-end module of the device, responsible for introducing the debris generated by the extreme ultraviolet light source and the accompanying gas debris into the system; this part can introduce pollutants through the flange interface or the leakage valve component;

[0012] The vacuum differential part is connected to the control and monitoring system and is used to form a multi-stage vacuum chamber through the cooperation of a dry pump and a molecular pump, and to separate small molecular particles by using a vacuum gradient;

[0013] A gas purge unit is connected to the control and monitoring system and is used to use a high-speed airflow to impact the debris particles, change the movement trajectory of the debris, and drive it away from the surface of the light source assembly;

[0014] The foil trap filter section, connected to the control and monitoring system, is used to consist of a foil trap of a specific shape, capture debris through physical adsorption and inertial collision, and effectively remove larger particles of pollutants;

[0015] an atomic hydrogen section, connected to the control and monitoring system, for generating highly reactive hydrogen atoms through an atomic hydrogen generator, which chemically react with reactive contaminants in the debris to convert them into easily purged gases;

[0016] A delayed field ion energy analyzer unit is connected to the control and monitoring system and is used to perform energy analysis on ionic debris in debris before and after removal to evaluate the debris removal effect;

[0017] The quartz crystal microbalance part is connected to the control and monitoring system and is used to monitor the amount of debris deposition in real time by monitoring the change of the resonance frequency of the quartz crystal, so as to evaluate the effect of debris removal;

[0018] The control and monitoring system is connected to the debris introduction section, vacuum differential section, gas purge section, foil trap filtration section, atomic hydrogen section, delayed field ion energy analyzer section, and quartz crystal microbalance section, and is used to monitor and adjust the operating status of each module through the central control system, and to realize closed-loop control by collecting data through sensors.

[0019] Further, the debris introduction part comprises:

[0020] Flange interface: Use high-sealing materials to ensure that pollutants do not leak into other environments; design high-temperature and corrosion-resistant flanges;

[0021] Leakage valve components: The inlet valve controls the amount and rate of debris introduction to prevent system overload.

[0022] Further, the vacuum differential portion comprises:

[0023] Coordinated control of dry pump and molecular pump: using intelligent control system to adjust the working frequency and pressure of both;

[0024] Multi-stage vacuum chamber structure: designed as a multi-stage vacuum differential structure, which gradually reduces the vacuum degree of the chamber from high vacuum to ultra-high vacuum.

[0025] Further, the gas purge unit comprises:

[0026] Gas selection: Use inert gas to avoid reaction between gas and debris or light source components;

[0027] Gas flow rate control: Through multi-point purge design, combined with gas flow rate control module, ensure that debris at different positions can be effectively impacted by air flow; optimize the path of purge air flow through numerical simulation;

[0028] Gas distributor design: The multi-hole design of the distributor ensures that the airflow evenly covers the target area.

[0029] Further, the foil trap filter unit comprises:

[0030] Foil trap shape design: Designed as a multi-layer structure to increase the area for debris capture, and the geometry of the foil trap is optimized by simulating the airflow and the movement trajectory of debris;

[0031] Material selection: The foil trap is made of metal materials with high heat resistance and low reactivity;

[0032] Automatic cleaning mechanism: The foil trap is designed with an automatic cleaning function to remove adsorbed debris through periodic gas backflushing or vibration.

[0033] Further, the atomic hydrogen portion comprises:

[0034] Atomic hydrogen generator: Select an efficient ion generator to produce high-density hydrogen atoms;

[0035] Reaction chamber design: The area where atomic hydrogen fully contacts the debris is designed as a multi-reaction chamber structure;

[0036] Safety protection: Add a monitoring module to detect the concentration of atomic hydrogen and reaction products in real time;

[0037] The delayed field ion energy analyzer section includes:

[0038] High-precision energy analyzer: Uses a highly sensitive ion energy analyzer to ensure that tiny energy changes can be accurately detected;

[0039] Data feedback system: Linked with the control system, it adjusts the working status of the cleaning components in real time according to the energy analysis results;

[0040] The quartz crystal microbalance section includes:

[0041] High-precision sensor: uses a highly sensitive quartz crystal microbalance sensor that can detect extremely small amounts of debris deposits;

[0042] Automatic calibration system: add automatic calibration mechanism to the sensor;

[0043] Multi-point monitoring layout: multiple microbalance sensors are arranged at different locations inside the device;

[0044] The control and monitoring system includes:

[0045] Intelligent control algorithm: Design an adaptive control algorithm to automatically adjust the working mode of the debris removal device based on debris monitoring data, airflow conditions and vacuum differential conditions;

[0046] Real-time data display: Provides a real-time data visualization interface, and operators can view the debris removal effect, equipment operating status and monitoring results through the display screen.

[0047] Another object of the present invention is to provide a DPP type extreme ultraviolet light source debris comprehensive filtering method comprising:

[0048] Step 1, introduce the debris generated by the extreme ultraviolet light source and the accompanying gas debris into the system through the debris introduction part; this part can introduce pollutants through the flange interface or the leakage valve component; through the vacuum differential part, a dry pump and a molecular pump are used to form a multi-stage vacuum chamber, and a vacuum gradient is used to separate small molecular particles;

[0049] Step 2: The gas purge unit uses a high-speed airflow to impact the debris particles, change the movement trajectory of the debris, and drive it away from the surface of the light source assembly; the foil trap filter unit is composed of a foil trap of a specific shape, captures the debris through physical adsorption and inertial collision, and effectively removes larger particles of pollutants;

[0050] Step 3, using an atomic hydrogen generator to generate highly active hydrogen atoms through the atomic hydrogen section, and these hydrogen atoms chemically react with reactive pollutants in the debris to convert them into easily purged gases;

[0051] Step 4, performing energy analysis on the ionic debris in the debris before and after removal by a delayed field ion energy analyzer to evaluate the debris removal effect;

[0052] Step 5, monitoring the resonant frequency change of the quartz crystal by using a quartz crystal microbalance to monitor the amount of debris deposition in real time, so as to evaluate the effect of debris removal;

[0053] Step 6: Use the central control system to monitor and adjust the operating status of each module through the control and monitoring system, and collect data through sensors to achieve closed-loop control and optimize the debris removal effect.

[0054] Another object of the present invention is to provide a computer device, comprising a memory and a processor, wherein the memory stores a computer program, and when the computer program is executed by the processor, the processor executes the steps of the DPP type extreme ultraviolet light source debris comprehensive filtering method.

[0055] Another object of the present invention is to provide a computer-readable storage medium storing a computer program, which, when executed by a processor, enables the processor to perform the steps of the DPP-type extreme ultraviolet light source debris comprehensive filtering method.

[0056] Another object of the present invention is to provide an information data processing terminal, which is used to implement the DPP type extreme ultraviolet light source debris comprehensive filtering device.

[0057] In combination with the above technical solutions and the technical problems solved, the advantages and positive effects of the technical solutions to be protected by the present invention are as follows:

[0058] First, the present invention provides a device capable of filtering and mitigating debris generated by a DPP-type extreme ultraviolet light source, aiming to reduce the damage of debris pollution attached to the DPP-type extreme ultraviolet light source to the components of the lithography system and the impact on the lithography efficiency. It includes: a debris introduction part, the debris introduction part introduces debris contaminants, including extreme ultraviolet light source debris and gas debris, through a flange interface or a leakage valve component; a vacuum differential part, the vacuum differential part uses the vacuum cavity structure and the synergistic effect of a dry pump and a molecular pump to achieve vacuum differential, which is used to separate small molecular particles; a gas purge part, the gas purge part uses gas molecules to impact the debris and change its motion trajectory to remove the debris; a foil trap filter part, the foil trap filter part uses a foil trap of a specific shape to absorb the debris for debris removal. Atomic hydrogen section, which uses highly active hydrogen atoms generated by an atomic hydrogen generator to react chemically with reactive pollutants and is pumped away by a vacuum pump for debris removal; delayed field ion energy analyzer section, which is used to characterize ionic debris before and after debris removal, and then evaluate the removal effect of ionic debris. Quartz crystal microbalance section, which monitors the amount of debris deposition by monitoring the change in the resonant frequency of the quartz crystal, is used to evaluate the debris removal effect. The present invention adopts multiple removal mechanisms and multiple monitoring mechanisms, which can effectively filter and alleviate different types and degrees of debris pollution, while performing real-time online monitoring of the debris removal effect.

[0059] The device of the present invention combines multiple cleaning mechanisms (vacuum differential, gas purge, foil trap filtration, atomic hydrogen reaction) and introduces a high-precision monitoring system (ion energy analyzer, quartz crystal microbalance), which can effectively filter and alleviate debris pollution of different types and particle sizes. At the same time, the real-time online monitoring system can timely adjust the working state of each cleaning mechanism according to the monitoring results, realize efficient and accurate debris removal, extend the service life of the photolithography system components, and improve the photolithography efficiency.

[0060] 1. Efficient debris removal: The present invention uses multiple removal mechanisms, including vacuum differential, gas purge, foil trap filtration and atomic hydrogen chemical reaction, to effectively solve the problem of debris contamination of different types and sizes. Through the coordinated work of multiple mechanisms, the accumulation of debris in the optical system is greatly reduced, and the overall efficiency of the lithography system is improved.

[0061] 2. Real-time monitoring and feedback: The debris removal process is monitored in real time by a delayed field ion energy analyzer and a quartz crystal microbalance to ensure that the debris removal effect is always in the best state, and the removal process is automatically optimized through a feedback mechanism to improve the intelligence level of the system.

[0062] 3. Extending equipment life: By reducing the damage caused by debris to lithography system components (such as mirrors, lenses, etc.), the present invention effectively extends the service life of optical equipment and reduces maintenance frequency and cost.

[0063] 4. Maintaining a clean environment: By utilizing the combined design of gas purge and vacuum differential, this device can maintain a high degree of cleanliness within the optical system, ensuring that the beam quality will not be degraded due to debris contamination during the photolithography process, and guaranteeing the stable output of the extreme ultraviolet light source.

[0064] 5. Improve lithography accuracy and efficiency: After removing the debris contamination of the extreme ultraviolet light source, the lithography system can work more stably and efficiently, improving the accuracy and output of lithography and meeting the strict requirements of high-end chip manufacturing.

[0065] Technical issues solved:

[0066] The problem of debris contamination of DPP-type extreme ultraviolet light sources: DPP-type extreme ultraviolet light sources will generate a large amount of debris during operation, which will damage the optical components of the lithography system and reduce the working efficiency and accuracy of the lithography system. The present invention effectively solves the problem of debris contamination through a multi-level debris removal mechanism.

[0067] Problem of low debris removal efficiency: In the prior art, the debris removal mechanism is often targeted at a certain type of debris and has low efficiency. The present invention combines a variety of physical removal methods such as vacuum differential, gas purge, foil trap filtration, and atomic hydrogen chemical reaction to efficiently remove debris of various types and sizes, significantly improving the removal efficiency.

[0068] Insufficient monitoring of debris removal effect: Traditional debris removal systems lack effective monitoring means and cannot evaluate the removal effect in real time. The present invention introduces a delayed field ion energy analyzer and a quartz crystal microbalance to monitor the status before and after debris removal in real time, thus achieving online evaluation and feedback control of the removal effect.

[0069] Frequent system maintenance: Equipment damage due to debris accumulation is the main reason for frequent maintenance of the lithography system. The present invention significantly reduces debris accumulation by efficiently removing debris, thereby reducing the maintenance frequency of the lithography system and extending the service life of the equipment.

[0070] In summary, the present invention provides a device that can effectively solve the problem of debris contamination of DPP-type extreme ultraviolet light sources through the combination of multiple cleaning and monitoring mechanisms, improves the performance and stability of the lithography system, reduces equipment loss, and enhances the intelligence and automation level of the system.

[0071] Second, the technical solution of the present invention fills the technical gap in the industry at home and abroad:

[0072] The Advanced Microelectronics and Sensing Materials Project Group of Shanghai University is building the first and most advanced and practical EUV photoresist material and process testing platform in China. The experimental device is mainly composed of three parts: DPP type EUV light source, debris pollution removal system, and large-scale multi-layer film collection mirror optical path system. The debris comprehensive filtering device involved in the present invention is a part of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0073] Figure 1 It is a structural block diagram of a DPP-type extreme ultraviolet light source debris comprehensive filtering device provided in an embodiment of the present invention.

[0074] Figure 2 It is a flow chart of a comprehensive filtering method for debris of a DPP type extreme ultraviolet light source provided in an embodiment of the present invention.

[0075] Figure 3 This is a diagram of a DPP-type extreme ultraviolet light source debris comprehensive filtering device provided in an embodiment of the present invention.

[0076] Figure 4 It is a schematic diagram of a DPP-type extreme ultraviolet light source debris comprehensive filtering device provided in an embodiment of the present invention.

[0077] Figure 5 It is a structural diagram of a DPP-type extreme ultraviolet light source debris comprehensive filtering device provided in an embodiment of the present invention.

[0078] Figure 6 It is a stereoscopic diagram of a DPP-type extreme ultraviolet light source debris comprehensive filtering device provided in an embodiment of the present invention.

[0079] Figure 1 In: 1. Debris introduction part; 2. Vacuum differential part; 3. Gas purge part; 4. Foil trap filter part; 5. Atomic hydrogen part; 6. Delayed field ion energy analyzer part; 7. Quartz crystal microbalance part; 8. Control and monitoring system; 9. Light source cavity; 10. Test cavity connecting flange; 11. Molecular pump inlet cavity; 12. Molecular pump; 13. Solenoid angle valve; 14. Fore stage pump; 15. Molecular pump controller; 16. Vacuum gauge; 17. MFC; 18. Fixing flange; 19. Diffusion cavity; 20. Collection hole; 21. Power supply. DETAILED DESCRIPTION

[0080] In order to make the purpose, technical solution and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with the embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0081] like Figure 1 As shown, a DPP type extreme ultraviolet light source debris comprehensive filtering device provided by an embodiment of the present invention comprises:

[0082] Debris introduction section 1, vacuum differential section 2, gas purge section 3, foil trap filter section 4, atomic hydrogen section 5, delayed field ion energy analyzer section 6, quartz crystal microbalance section 7, control and monitoring system 8;

[0083] The debris introduction part 1 is connected to the control and monitoring system 8. The debris introduction part is the front-end module of the device, which is responsible for introducing the debris generated by the extreme ultraviolet light source and the accompanying gas debris into the system; this part can introduce pollutants through the flange interface or the leakage valve component;

[0084] The vacuum differential part 2 is connected to the control and monitoring system 8 and is used to form a multi-stage vacuum chamber by cooperating with the dry pump and the molecular pump 12, and to separate small molecular particles by using the vacuum gradient;

[0085] The gas purge unit 3 is connected to the control and monitoring system 8 and is used to use high-speed airflow to impact the debris particles, change the movement trajectory of the debris, and drive it away from the surface of the light source assembly;

[0086] The foil trap filter section 4 is connected to the control and monitoring system 8 and is used to consist of a foil trap of a specific shape, capture debris by physical adsorption and inertial collision, and effectively remove larger particles of pollutants;

[0087] an atomic hydrogen section 5 , connected to a control and monitoring system 8 , for generating highly reactive hydrogen atoms through an atomic hydrogen generator, which react chemically with reactive contaminants in the debris to convert them into easily purged gases;

[0088] A delayed field ion energy analyzer section 6, connected to the control and monitoring system 8, for performing energy analysis on ionic debris in the debris before and after removal, so as to evaluate the debris removal effect;

[0089] The quartz crystal microbalance part 7 is connected to the control and monitoring system 8 and is used to monitor the amount of debris deposition in real time by monitoring the change of the resonance frequency of the quartz crystal, so as to evaluate the effect of debris removal;

[0090] The control and monitoring system 8 is connected to the debris introduction part 1, the vacuum differential part 2, the gas purge part 3, the foil trap filter part 4, the atomic hydrogen part 5, the delayed field ion energy analyzer part 6, and the quartz crystal microbalance part 7, and is used to monitor and adjust the operating status of each module through the central control system, and to realize closed-loop control by collecting data through sensors.

[0091] The debris introduction part provided by the embodiment of the present invention comprises:

[0092] Flange interface: Use high-sealing materials to ensure that pollutants do not leak into other environments; design high-temperature and corrosion-resistant flanges;

[0093] Leakage valve components: The inlet valve controls the amount and rate of debris introduction to prevent system overload.

[0094] The vacuum differential portion provided by the embodiment of the present invention includes:

[0095] Coordinated control of the dry pump and the molecular pump 12: using an intelligent control system to adjust the operating frequency and pressure of both;

[0096] Multi-stage vacuum chamber structure: designed as a multi-stage vacuum differential structure, which gradually reduces the vacuum degree of the chamber from high vacuum to ultra-high vacuum.

[0097] The gas purge unit provided in the embodiment of the present invention comprises:

[0098] Gas selection: Use inert gas to avoid gas reaction with debris or light source components;

[0099] Gas flow rate control: Through multi-point purge design, combined with gas flow rate control module, ensure that debris at different positions can be effectively impacted by air flow; optimize the path of purge air flow through numerical simulation;

[0100] Gas distributor design: The multi-hole design of the distributor ensures that the airflow evenly covers the target area.

[0101] The foil trap filter provided by the embodiment of the present invention comprises:

[0102] Foil trap shape design: Designed as a multi-layer structure to increase the area for debris capture, and the geometry of the foil trap is optimized by simulating the airflow and the movement trajectory of debris;

[0103] Material selection: The foil trap is made of metal materials with high heat resistance and low reactivity;

[0104] Automatic cleaning mechanism: The foil trap is designed with an automatic cleaning function to remove adsorbed debris through periodic gas backflushing or vibration.

[0105] The atomic hydrogen part provided in the embodiment of the present invention includes:

[0106] Atomic hydrogen generator: Select an efficient ion generator to produce high-density hydrogen atoms;

[0107] Reaction chamber design: The area where atomic hydrogen fully contacts the debris is designed as a multi-reaction chamber structure;

[0108] Safety protection: Add a monitoring module to detect the concentration of atomic hydrogen and reaction products in real time;

[0109] The delayed field ion energy analyzer section includes:

[0110] High-precision energy analyzer: Uses a highly sensitive ion energy analyzer to ensure that tiny energy changes can be accurately detected;

[0111] Data feedback system: Linked with the control system, it adjusts the working status of the cleaning components in real time according to the energy analysis results;

[0112] The quartz crystal microbalance section includes:

[0113] High-precision sensor: uses a highly sensitive quartz crystal microbalance sensor that can detect extremely small amounts of debris deposits;

[0114] Automatic calibration system: add automatic calibration mechanism to the sensor;

[0115] Multi-point monitoring layout: multiple microbalance sensors are arranged at different locations inside the device;

[0116] The control and monitoring system includes:

[0117] Intelligent control algorithm: Design an adaptive control algorithm to automatically adjust the working mode of the debris removal device based on debris monitoring data, airflow conditions and vacuum differential conditions;

[0118] Real-time data display: Provides a real-time data visualization interface, and operators can view the debris removal effect, equipment operating status and monitoring results through the display screen.

[0119] like Figure 2 As shown, the DPP type extreme ultraviolet light source debris comprehensive filtering method provided by the embodiment of the present invention includes:

[0120] S101, introducing debris generated by the extreme ultraviolet light source and accompanying gas debris into the system through a debris introduction part; this part can introduce pollutants through a flange interface or a leakage valve component; through a vacuum differential part, a dry pump and a molecular pump 12 are used to form a multi-stage vacuum chamber, and a vacuum gradient is used to separate small molecular particles;

[0121] S102, using a high-speed airflow to impact debris particles through a gas purge unit, changing the movement trajectory of the debris and driving it away from the surface of the light source assembly; using a foil trap filter unit composed of a foil trap of a specific shape to capture the debris through physical adsorption and inertial collision, and effectively remove larger particles of pollutants;

[0122] S103, using an atomic hydrogen generator to generate highly active hydrogen atoms through an atomic hydrogen section, and the hydrogen atoms chemically react with reactive contaminants in the debris to convert them into easily purgable gases;

[0123] S104, performing energy analysis on ionic debris in the debris before and after removal by a delayed field ion energy analyzer to evaluate the debris removal effect;

[0124] S105, monitoring the change of the resonance frequency of the quartz crystal by the quartz crystal microbalance part to monitor the amount of debris deposition in real time, so as to evaluate the effect of debris removal;

[0125] S106, using the central control system to monitor and adjust the operating status of each module through the control and monitoring system, and collect data through sensors to achieve closed-loop control and optimize the debris removal effect.

[0126] Another object of the present invention is to provide a computer device, comprising a memory and a processor, wherein the memory stores a computer program, and when the computer program is executed by the processor, the processor executes the steps of the DPP type extreme ultraviolet light source debris comprehensive filtering method.

[0127] Another object of the present invention is to provide a computer-readable storage medium storing a computer program, which, when executed by a processor, enables the processor to perform the steps of the DPP-type extreme ultraviolet light source debris comprehensive filtering method.

[0128] Another object of the present invention is to provide an information data processing terminal, which is used to implement the DPP type extreme ultraviolet light source debris comprehensive filtering device.

[0129] The present invention is specifically implemented:

[0130] like Figure 3 As shown, the present invention provides a device capable of filtering and mitigating debris generated by a DPP-type extreme ultraviolet light source, aiming to reduce the damage of debris pollution attached to the DPP-type extreme ultraviolet light source to the components of the lithography system and the impact on the lithography efficiency. It includes: a debris introduction part, the debris introduction part introduces debris contaminants, including extreme ultraviolet light source debris and gas debris, through a flange interface or a leakage valve component; a vacuum differential part, the vacuum differential part uses the vacuum cavity structure and the synergistic effect of the dry pump and the molecular pump 12 to achieve vacuum differential, which is used to separate small molecular particles; a gas purge part, the gas purge part uses gas molecules to impact the debris and change its motion trajectory to remove the debris; a foil trap filter part, the foil trap filter part uses a foil trap of a specific shape to absorb the debris, which is used to remove the debris. Atomic hydrogen section, which uses highly active hydrogen atoms generated by an atomic hydrogen generator to react chemically with reactive pollutants and is pumped away by a vacuum pump for debris removal; delayed field ion energy analyzer section, which is used to characterize ionic debris before and after debris removal, and then evaluate the removal effect of ionic debris. Quartz crystal microbalance section, which monitors the amount of debris deposition by monitoring the change in the resonant frequency of the quartz crystal, is used to evaluate the debris removal effect. The present invention adopts multiple removal mechanisms and multiple monitoring mechanisms, which can effectively filter and alleviate different types and degrees of debris pollution, while performing real-time online monitoring of the debris removal effect.

[0131] In order to further refine the technical solution of the present invention, the functions of each module are described in detail and optimized to ensure that the device can efficiently filter and alleviate the debris pollution generated by the DPP-type extreme ultraviolet light source. The solution is as follows:

[0132] 1. Debris introduction part

[0133] Functional description: The debris introduction part is the front-end module of the device, which is responsible for introducing the debris generated by the extreme ultraviolet light source and the accompanying gas debris into the system. This part can introduce contaminants through the flange interface or the leakage valve component.

[0134] Optimized design:

[0135] Flange interface: Highly sealed materials are used to ensure that pollutants do not leak into other environments. High temperature and corrosion resistant flanges are designed to ensure durability during long-term operation.

[0136] Leaky valve components: The introduction valve controls the amount and speed of debris introduction to prevent system overload. The valve material should be selected to avoid reaction with debris.

[0137] 2. Vacuum differential section

[0138] Functional description: Through the cooperation of the dry pump and the molecular pump 12, a multi-stage vacuum chamber is formed, and the vacuum gradient is used to separate small molecular particles. The role of vacuum differential is to separate most of the tiny debris from the system and reduce the diffusion of pollutants in the lithography system.

[0139] Optimized design:

[0140] Coordinated control of the dry pump and the molecular pump 12: The operating frequency and pressure of the two are adjusted by using an intelligent control system to ensure that debris of different particle sizes can be effectively separated.

[0141] Multi-stage vacuum chamber structure: Designed as a multi-stage vacuum differential structure, the vacuum degree of the chamber is gradually reduced from high vacuum to ultra-high vacuum, ensuring efficient removal of debris particles of different sizes.

[0142] 3. Gas purge unit

[0143] Functional description: This module uses high-speed airflow to impact debris particles, changing the trajectory of the debris and driving it away from the surface of the light source component.

[0144] Optimized design:

[0145] Gas selection: Use an inert gas (such as nitrogen or argon) to avoid reaction between the gas and debris or light source components.

[0146] Gas flow rate control: Through the multi-point purge design, combined with the gas flow rate control module, it is ensured that the debris at different positions can be effectively impacted by the air flow. The path of the purge air flow can be optimized through numerical simulation.

[0147] Gas distributor design: The multi-hole distributor ensures that the airflow evenly covers the target area, avoiding the increase of local pressure or the decrease of cleaning efficiency caused by the concentration of airflow.

[0148] 4. Foil trap filter

[0149] Functional description: This component consists of a foil trap of a specific shape that can capture debris through physical adsorption and inertial collision and effectively remove larger particles of contaminants.

[0150] Optimized design:

[0151] Foil trap shape design: Designed as a multi-layer structure to increase the area for debris capture, and the geometry of the foil trap is optimized by simulating the airflow and the movement trajectory of debris.

[0152] Material selection: The foil trap is made of metal materials with high heat resistance and low reactivity (such as titanium and nickel alloy) to ensure stability and adsorption effect under high temperature environment of extreme ultraviolet light source.

[0153] Automatic cleaning mechanism: The foil trap is designed with an automatic cleaning function to remove adsorbed debris through periodic gas backflush or vibration, thus extending the service life of the foil trap.

[0154] 5. Atomic Hydrogen Department

[0155] Functional description: The atomic hydrogen unit generates highly active hydrogen atoms through an atomic hydrogen generator. These hydrogen atoms chemically react with reactive pollutants (such as organic matter and hydrocarbons) in the debris, converting them into easily removable gases.

[0156] Optimized design:

[0157] Atomic Hydrogen Generator: Select an efficient plasma generator to produce a high density of hydrogen atoms to increase the reaction rate for removing pollutants.

[0158] Reaction chamber design: The area where atomic hydrogen and debris are in full contact is designed as a multi-reaction chamber structure to extend the reaction time between hydrogen atoms and pollutants and improve the efficiency of chemical reactions.

[0159] Safety protection: Add a monitoring module to detect the concentration of atomic hydrogen and reaction products in real time to ensure the safety of the device.

[0160] 6. Delayed field ion energy analyzer

[0161] Functional description: Energy analysis of ionic debris in debris before and after removal to evaluate debris removal effect. This part can monitor the removal efficiency in real time and provide feedback for adjusting the removal mechanism.

[0162] Optimized design:

[0163] High-precision energy analyzer: The use of a highly sensitive ion energy analyzer ensures that tiny energy changes can be accurately detected and provides precise ion-type debris information.

[0164] Data feedback system: Linked with the control system, it adjusts the working status of the cleaning components in real time according to the energy analysis results to improve the cleaning efficiency.

[0165] 7.Quartz crystal microbalance

[0166] Functional description: By monitoring the changes in the resonance frequency of the quartz crystal, the amount of debris deposition is monitored in real time to evaluate the effect of debris removal.

[0167] Optimized design:

[0168] High-precision sensor: The highly sensitive quartz crystal microbalance sensor can detect extremely small amounts of debris deposits to ensure the accuracy of monitoring data.

[0169] Automatic calibration system: An automatic calibration mechanism is added to the sensor to ensure that the measurement accuracy in long-term operation is not affected by the external environment.

[0170] Multi-point monitoring layout: Multiple microbalance sensors are arranged at different locations inside the device to achieve all-round debris deposition monitoring.

[0171] 8. Control and monitoring system

[0172] Functional description: The operating status of each module is monitored and adjusted through the central control system, and closed-loop control is achieved through sensor data collection to optimize the debris removal effect.

[0173] Optimized design:

[0174] Intelligent control algorithm: Design an adaptive control algorithm to automatically adjust the working mode of the debris removal device according to the debris monitoring data, airflow conditions and vacuum differential conditions to improve the removal efficiency.

[0175] Real-time data display: Provides a real-time data visualization interface, through which operators can view the debris removal effect, equipment operating status and monitoring results, facilitating timely adjustments.

[0176] Comprehensive optimization:

[0177] The device of the present invention combines multiple cleaning mechanisms (vacuum differential, gas purge, foil trap filtration, atomic hydrogen reaction) and introduces a high-precision monitoring system (ion energy analyzer, quartz crystal microbalance), which can effectively filter and alleviate debris pollution of different types and particle sizes. At the same time, the real-time online monitoring system can timely adjust the working state of each cleaning mechanism according to the monitoring results, realize efficient and accurate debris removal, extend the service life of the photolithography system components, and improve the photolithography efficiency.

[0178] How it works in detail

[0179] The device provided by the present invention integrates multiple modules and adopts multiple cleaning mechanisms and monitoring technologies to effectively filter and mitigate the debris generated by DPP (discharge produced plasma) type extreme ultraviolet light source (EUV). Its detailed working principle is as follows:

[0180] 1. Debris introduction part

[0181] Working principle: The debris (including solid debris and gas debris) generated by the DPP type extreme ultraviolet light source is introduced into the system through the flange interface or the leakage valve component. The flange interface ensures that the pollutants do not leak through the sealing device, while the leakage valve component is responsible for controlling the amount of debris entering.

[0182] Technical effect: Through efficient introduction methods, it is ensured that pollutants can be introduced into subsequent cleaning and processing units, preventing debris from entering key areas of lithography equipment.

[0183] 2. Vacuum differential section

[0184] Working principle: This part forms a multi-level vacuum environment through a dry pump and a molecular pump 12, so that the debris is gradually separated in cavities with different vacuum degrees. Small molecular debris and gas particles are filtered or removed through pressure difference.

[0185] Technical effect: Through precise vacuum grading, extremely small particles can be effectively separated and removed, reducing the impact of debris contamination on the system and improving the accuracy of the lithography system.

[0186] 3. Gas purge unit

[0187] Working principle: Use gas (such as nitrogen or argon) to blow the debris generated by the extreme ultraviolet light source from multiple directions at high pressure. The airflow impacts the debris particles, changes their trajectory, and carries the debris away from the surface of key components of the lithography system.

[0188] Technical effect: Through directional gas purge, the accumulation of debris is effectively reduced and the debris is prevented from blocking the optical components, thereby improving the efficiency and quality of lithography.

[0189] 4. Foil trap filter

[0190] Working principle: A foil trap of a specific shape is used to capture and remove larger debris particles by using mechanisms such as inertial collision and physical adsorption. Through the multi-layer structure and shape optimization of the foil trap, the debris is adsorbed on the foil trap to prevent it from entering the optical system.

[0191] Technical effect: It has a good filtering effect on large particle debris, significantly reduces the entry of pollutants into the optical system, extends the service life of optical equipment, and maintains the cleanliness of optical components.

[0192] 5. Atomic Hydrogen Department

[0193] Working Principle: The atomic hydrogen generator generates highly active hydrogen atoms, which react chemically with reactive substances (such as hydrocarbons) in the debris, decomposing them into volatile gases, and then the reaction products are pumped out of the system through a vacuum pump.

[0194] Technical effect: Efficiently remove organic pollutants and chemical debris that are difficult to remove physically, reduce the accumulation of debris inside the system, and ensure the stability and efficiency of the lithography system during long-term operation.

[0195] 6. Delayed field ion energy analyzer

[0196] Working principle: The delayed field ion energy analyzer is used to characterize the ionic debris in the debris before and after cleaning and analyze its energy distribution. The cleaning effect is evaluated based on the detected debris energy changes, and the cleaning process is optimized through feedback data.

[0197] Technical effect: Real-time feedback on debris removal effect ensures that ionic debris can be effectively removed, ensuring the cleanliness and operational reliability of the system.

[0198] 7.Quartz crystal microbalance

[0199] Working principle: The amount of debris deposition is monitored by the change in the resonant frequency of the quartz crystal. The change in the frequency of the quartz crystal reflects the quality of the debris deposition, thus providing a real-time assessment of the debris removal effect.

[0200] Technical effect: It can accurately monitor the deposition of debris, realize dynamic adjustment of the debris removal process, and improve the controllability of the removal effect.

[0201] 8. Control and monitoring system

[0202] Working principle: The central control system integrates multiple cleaning components and monitoring sensors to automatically adjust the working status of each component to achieve closed-loop control of the cleaning process. Based on real-time monitoring data, the control system dynamically optimizes operating parameters such as vacuum differential and gas purge.

[0203] Technical effect: Through intelligent control, it can flexibly respond to different types and quantities of debris pollution, ensuring that the system always maintains the best removal effect.

[0204] Specific application fields or related products of the present invention:

[0205] Discharge plasma (DPP) extreme ultraviolet photoresist detection device / DPP type extreme ultraviolet lithography system

[0206] It should be noted that the embodiments of the present invention can be implemented by hardware, software, or a combination of software and hardware. The hardware part can be implemented using dedicated logic; the software part can be stored in a memory and executed by an appropriate instruction execution system, such as a microprocessor or dedicated design hardware. It can be understood by a person of ordinary skill in the art that the above-mentioned devices and methods can be implemented using computer executable instructions and / or contained in a processor control code, such as a carrier medium such as a disk, CD or DVD-ROM, a programmable memory such as a read-only memory (firmware), or a data carrier such as an optical or electronic signal carrier. Such code is provided on the carrier medium. The device and its modules of the present invention can be implemented by hardware circuits such as very large-scale integrated circuits or gate arrays, semiconductors such as logic chips, transistors, etc., or programmable hardware devices such as field programmable gate arrays, programmable logic devices, etc., can also be implemented by software executed by various types of processors, and can also be implemented by a combination of the above-mentioned hardware circuits and software, such as firmware.

[0207] The above description is only a specific implementation mode of the present invention, but the protection scope of the present invention is not limited thereto. Any modifications, equivalent substitutions and improvements made by any technician familiar with the technical field within the technical scope disclosed by the present invention and within the spirit and principle of the present invention should be covered by the protection scope of the present invention.

Claims

1. A DPP type extreme ultraviolet light source debris comprehensive filtering device, characterized in that: The DPP type extreme ultraviolet light source debris comprehensive filtering device comprises: Debris introduction section, vacuum differential section, gas purge section, foil trap filter section, atomic hydrogen section, delayed field ion energy analyzer section, quartz crystal microbalance section, control and monitoring system; The debris introduction part is connected to the control and monitoring system. The debris introduction part is the front-end module of the device, responsible for introducing the debris generated by the extreme ultraviolet light source and the accompanying gas debris into the system; this part can introduce pollutants through the flange interface or the leakage valve component; The vacuum differential part is connected to the control and monitoring system and is used to form a multi-stage vacuum chamber through the cooperation of a dry pump and a molecular pump, and to separate small molecular particles by using a vacuum gradient; A gas purge unit is connected to the control and monitoring system and is used to use a high-speed airflow to impact the debris particles, change the movement trajectory of the debris, and drive it away from the surface of the light source assembly; The foil trap filter section, connected to the control and monitoring system, is used to consist of a foil trap of a specific shape, capture debris through physical adsorption and inertial collision, and effectively remove larger particles of pollutants; an atomic hydrogen section, connected to the control and monitoring system, for generating highly reactive hydrogen atoms through an atomic hydrogen generator, which chemically react with reactive contaminants in the debris to convert them into easily purged gases; A delayed field ion energy analyzer unit is connected to the control and monitoring system and is used to perform energy analysis on ionic debris in debris before and after removal to evaluate the debris removal effect; The quartz crystal microbalance part is connected to the control and monitoring system and is used to monitor the amount of debris deposition in real time by monitoring the change of the resonance frequency of the quartz crystal, so as to evaluate the effect of debris removal; The control and monitoring system is connected to the debris introduction section, vacuum differential section, gas purge section, foil trap filtration section, atomic hydrogen section, delayed field ion energy analyzer section, and quartz crystal microbalance section, and is used to monitor and adjust the operating status of each module through the central control system, and to realize closed-loop control by collecting data through sensors.

2. The DPP type extreme ultraviolet light source debris comprehensive filtering device as claimed in claim 1, characterized in that: The debris introduction part comprises: Flange interface: Use highly sealing materials to ensure that pollutants do not leak into other environments; design flanges that are resistant to high temperatures and corrosion; Leakage valve components: The inlet valve controls the amount and rate of debris introduction to prevent system overload.

3. The DPP type extreme ultraviolet light source debris comprehensive filtering device as claimed in claim 1, characterized in that: The vacuum differential portion comprises: Coordinated control of dry pump and molecular pump: using intelligent control system to adjust the working frequency and pressure of both; Multi-stage vacuum chamber structure: designed as a multi-stage vacuum differential structure, which gradually reduces the vacuum degree of the chamber from high vacuum to ultra-high vacuum.

4. The DPP type extreme ultraviolet light source debris comprehensive filtering device as claimed in claim 1, characterized in that: The gas purge unit comprises: Gas selection: Use inert gas to avoid gas reaction with debris or light source components; Gas flow rate control: Through multi-point purge design, combined with gas flow rate control module, ensure that debris at different positions can be effectively impacted by air flow; optimize the path of purge air flow through numerical simulation; Gas distributor design: The multi-hole design of the distributor ensures that the airflow evenly covers the target area.

5. The DPP type extreme ultraviolet light source debris comprehensive filtering device as claimed in claim 1, characterized in that: The foil trap filter unit comprises: Foil trap shape design: Designed as a multi-layer structure to increase the area for debris capture, and the geometry of the foil trap is optimized by simulating the airflow and the movement trajectory of debris; Material selection: The foil trap is made of metal materials with high heat resistance and low reactivity; Automatic cleaning mechanism: The foil trap is designed with an automatic cleaning function to remove adsorbed debris through periodic gas backflushing or vibration.

6. The DPP type extreme ultraviolet light source debris comprehensive filtering device as claimed in claim 1, characterized in that: The atomic hydrogen portion comprises: Atomic hydrogen generator: Select an efficient ion generator to produce high-density hydrogen atoms; Reaction chamber design: The area where atomic hydrogen fully contacts the debris is designed as a multi-reaction chamber structure; Safety protection: Add a monitoring module to detect the concentration of atomic hydrogen and reaction products in real time; The delayed field ion energy analyzer section includes: High-precision energy analyzer: Uses a highly sensitive ion energy analyzer to ensure that tiny energy changes can be accurately detected; Data feedback system: Linked with the control system, it adjusts the working status of the cleaning components in real time according to the energy analysis results; The quartz crystal microbalance section includes: High-precision sensor: uses a highly sensitive quartz crystal microbalance sensor that can detect extremely small amounts of debris deposits; Automatic calibration system: add automatic calibration mechanism to the sensor; Multi-point monitoring layout: multiple microbalance sensors are arranged at different locations inside the device; The control and monitoring system includes: Intelligent control algorithm: Design an adaptive control algorithm to automatically adjust the working mode of the debris removal device based on debris monitoring data, airflow conditions and vacuum differential conditions; Real-time data display: Provides a real-time data visualization interface, and operators can view the debris removal effect, equipment operating status and monitoring results through the display screen.

7. A DPP type extreme ultraviolet light source debris comprehensive filtering method implementing the DPP type extreme ultraviolet light source debris comprehensive filtering device according to any one of claims 1 to 6, characterized in that: The DPP type extreme ultraviolet light source debris comprehensive filtering method comprises: Step 1, introduce the debris generated by the extreme ultraviolet light source and the accompanying gas debris into the system through the debris introduction part; this part can introduce pollutants through the flange interface or the leakage valve component; through the vacuum differential part, a dry pump and a molecular pump are used to form a multi-stage vacuum chamber, and a vacuum gradient is used to separate small molecular particles; Step 2: The gas purge unit uses a high-speed airflow to impact the debris particles, change the movement trajectory of the debris, and drive it away from the surface of the light source assembly; the foil trap filter unit is composed of a foil trap of a specific shape, captures the debris through physical adsorption and inertial collision, and effectively removes larger particles of pollutants; Step 3, using an atomic hydrogen generator to generate highly active hydrogen atoms through the atomic hydrogen section, and these hydrogen atoms chemically react with reactive pollutants in the debris to convert them into easily purged gases; Step 4, performing energy analysis on the ionic debris in the debris before and after removal by a delayed field ion energy analyzer to evaluate the debris removal effect; Step 5, monitoring the resonant frequency change of the quartz crystal by using a quartz crystal microbalance to monitor the amount of debris deposition in real time, so as to evaluate the effect of debris removal; Step 6: Use the central control system to monitor and adjust the operating status of each module through the control and monitoring system, and collect data through sensors to achieve closed-loop control and optimize the debris removal effect.

8. A computer device, characterized in that: The computer device includes a memory and a processor, wherein the memory stores a computer program, and when the computer program is executed by the processor, the processor executes the steps of the DPP-type extreme ultraviolet light source debris comprehensive filtering method as claimed in claim 7.

9. A computer-readable storage medium storing a computer program, wherein when the computer program is executed by a processor, the processor executes the steps of the DPP-type extreme ultraviolet light source debris comprehensive filtering method as claimed in claim 7.

10. An information data processing terminal, characterized in that: The information data processing terminal is used to implement the DPP type extreme ultraviolet light source debris comprehensive filtering device as described in any one of claims 1-6.

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