Method for determining lens errors in a particle-optical device

A particle optics and lens technology, applied in the field of determining lens errors in particle optics equipment, can solve problems such as difficult to determine lens errors, solder balls without clear images, etc.

Inactive Publication Date: 2013-01-02
FEI CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

So there is no clear image of the solder ball in any direction, which makes it difficult to determine the lens error

Method used

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  • Method for determining lens errors in a particle-optical device
  • Method for determining lens errors in a particle-optical device

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Experimental program
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Embodiment Construction

[0049] figure 1 The cross-sections of the beam at different distances from the (paraxial) focal plane calculated by computer simulation are schematically shown.

[0050] In this simulation, the beams experienced the same degree of spherical aberration in all cases. Rows show cross-sections at different degrees of defocus, while columns show cross-sections at different values ​​of tertiary astigmatism.

[0051] The focal plane is shown at "Defocus=0" in the third row. The second row shows the cross-section of the beam in a plane that is placed at some distance behind the focal plane as seen from the objective, while the first row shows the same distance behind the focal plane The cross-section of the bundle in the plane at . Similarly, the fourth and fifth rows show the cross-section of the beam in the plane lying between the paraxial focal plane and the objective lens.

[0052] Far to the left of the first column, there is no tertiary astigmatism and the beam is only subj...

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Abstract

The present invention relates to a method for determining lens errors in a scanning electron microscope, and more particularly to a sample enabling such lens errors to be determined. The present invention describes the use of, for example, cubic magnesium oxide crystals, which can be easily produced on silicon wafers as so-called "self-assembled" crystals. Such crystals have almost perfect corners and sides. Even in the presence of lens errors, this gives a clear impression as if there were no lens errors. This allows good reconstruction of the beam cross-section at different under- and over-focus planes. On the basis of this reconstruction lens errors can be determined and they can then be corrected using a corrector.

Description

technical field [0001] The invention relates to a method for determining lens errors in a particle optics device designed to scan a sample with a focused particle beam, comprising: [0002] Provide samples containing parts of known shape, [0003] generating one or more images of the sample by scanning the sample with the particle beam, and [0004] The cross-section of the beam is determined based on the generated images. Background technique [0005] Such a method is disclosed in the catalog "Scanning Electron Microscopy Supplies" on page 29 ("Low Voltag Resolution Tinon Carbon") of Canemco, (821B McCaffrey St., St. Laurent, (Montreal) Quebec, Canada H4T 1N3). For example, this can be obtained from the Internet on August 25, 2005 ( http: / / www.canemco.com / catalog / sem / Canemco Scanning.pdf ) to get it. [0006] The method is used in conjunction with particle optics equipment such as SEM (scanning electron microscope), STEM (scanning transmission electron microscope) and...

Claims

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Application Information

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Patent Type & AuthorityPatents(China)
IPC IPC(8): G01N13/10H01J37/26G01B15/00
CPCH01J37/153H01J37/28H01J2237/282
InventorD·J·马斯S·A·M·门廷克J·J·L·霍里克希B·H·弗雷塔格
OwnerFEI CO