Magnetron sputtering device for pipe with large length-diameter ratio

Abstract

The utility model provides a magnetron sputtering device for a pipe with a large length-diameter ratio. The magnetron sputtering device for the pipe with the large length-diameter ratio comprises the pipe, an electric sliding rail, a key button, an air inlet pipeline, an annular target system, a sliding rail transmission device and a vacuum system, wherein the pipe is provided with a cavity; the electric sliding rail is located in the cavity and provided with a plurality of through holes. The key buttons are filled in the through holes; the air inlet pipeline communicates with the interior of the electric sliding rail. The annular target system is in sliding connection with the electric sliding rail; the sliding rail transmission device is in transmission connection with the electric sliding rail at one end of the pipe; the vacuum system is located at the other end of the pipe. According to the embodiment of the invention, the key button filling through hole is formed in the electric sliding rail, the annular target system presses the key button to instantly communicate and release gas, and other key buttons are kept sealed, so that the uniformity of gas concentration in different areas is improved, and the problems of insufficient coating uniformity and stability are solved; the equipment is simple in structure, the systems are mutually independent, and maintenance and debugging of the instrument are convenient.

Description

Technical Field

[0001] The present application relates to the technical field of coating equipment, and in particular to a magnetron sputtering device for large aspect ratio tubes. Background Art

[0002] In industrial piping systems in various industries such as chemical industry, smelting, nuclear power, shipbuilding, transportation, etc., slender pipe inner walls with large aspect ratios have been widely used. In actual application, the inside of the pipe will face many extremely complex environmental conditions such as corrosion, oxidation, friction, erosion, etc. Therefore, depositing or plating a protective film on the inner wall of the pipe is often an effective and common surface treatment modification method, which makes the inner wall of the pipe have certain anti-oxidation, corrosion resistance, and wear resistance, thereby significantly extending its service life, such as chemical pipelines, transportation pipelines, gun barrels, etc.

[0003] When coating the inner wall of a pipe using the traditional electroplating method, the chemical reagents required are highly toxic, and the waste liquid left after electroplating is difficult to handle. In addition, it is difficult to coat the inner wall of a pipe with multiple layers using the electroplating method, and it is difficult to make the film layer have a complex and fine structure. When coating the inner wall of a pipe using the chemical vapor deposition method, the required temperature is generally higher than the operating temperature of most metal materials, which exceeds the temperature tolerance range of the pipe and destroys the original performance of the pipe. The magnetron sputtering coating method has a fast speed and small temperature change, and has greater application advantages.

[0004] Chinese patents with application numbers CN202121842996 and CN202121843819 both disclose magnetron sputtering devices for large aspect ratio tubes for coating the inner walls of large aspect ratio metal tubes. The patents both utilize retractable support rods and transmission devices to control the movement of the target seat along the axial direction of the large aspect ratio tube, solving the problem in the prior art that the target system has excessive weight and the moving position deviates from the axis of the tube, resulting in unstable coating effect. However, during the coating process, the transmission wheel of the retractable support rod repeatedly rubs against the inner wall of the tube during movement, which will cause a certain degree of damage to the quality of the coated layer. A Chinese patent with application number CN202011506907 discloses a magnetron sputtering device for coating the inner wall of slender pipes for pipes with a large aspect ratio. Multiple annular targets are moved back and forth along the central axis in a perforated hollow pipe, which solves the problem that the inner wall coating of the pipe is only a single component film layer. However, due to the long gas transportation distance in the air intake pipe in the pipe with a large aspect ratio, the gas concentration cannot be kept uniform during the movement of the target system, resulting in poor coating consistency on different parts of the inner wall of the pipe.

[0005] In summary, the existing coating equipment has technical problems such as poor coating layer quality and poor coating consistency. Utility Model Content

[0006] In view of the shortcomings of the existing methods, the present application proposes a magnetron sputtering device for large aspect ratio tubes, which is used to solve the technical problems of poor coating layer quality and poor coating consistency in the prior art.

[0007] In an embodiment of the present application, a magnetron sputtering device for a large aspect ratio tube is provided, including a tube, an electric slide rail, a key button, an air intake pipe, an annular target system, a slide rail transmission device, and a vacuum system:

[0008] Tube, having a hollow cavity;

[0009] An electric slide rail is located in the cavity, and a plurality of through holes are formed on a side wall of the electric slide rail;

[0010] A plurality of key buttons are elastically connected to the electric slide rail, and each of the key buttons is filled in one of the through holes;

[0011] An air intake duct connected to the electric slide rail;

[0012] An annular target system is sleeved on the periphery of the electric slide rail, and the annular target system is slidably connected to the electric slide rail;

[0013] A slide rail transmission device is located at one end of the pipe, and the slide rail transmission device is drivingly connected to the electric slide rail;

[0014] The vacuum system is located at the other end of the tube and is connected to the tube to evacuate the interior of the tube.

[0015] In some embodiments of the present application, the electric slide rail extends along the axial direction of the tube, and the movement direction of the key button is parallel to the radial direction of the tube.

[0016] In some embodiments of the present application, the through holes are distributed in an array on the side wall of the electric slide rail, the distance between any two adjacent through holes is equal, and the key buttons correspond to the through holes one by one.

[0017] In some embodiments of the present application, the single key button includes a working state and a standby state. In the working state, the annular target system presses the key button, and the annular target is connected to the electric slide rail. In the standby state, the key button is separated from the annular target system, and the key button blocks the through hole.

[0018] In some embodiments of the present application, the vacuum system includes a vacuum pumping device and a vacuum adapter, the vacuum adapter is located between the vacuum pumping device and the pipe, one end of the vacuum adapter is connected to the vacuum pumping device, and the other end is connected to the pipe through a flange, and the vacuum system is in a sealed state.

[0019] In some embodiments of the present application, the number of the annular target systems is one or more, and each of the annular target systems includes a magnet, a backing plate, and an annular target material distributed sequentially from the inside to the outside.

[0020] In some embodiments of the present application, an air extraction device is further included, and the air extraction device is arranged at both ends of the tube.

[0021] In some embodiments of the present application, a heating system is further included. The heating system is sleeved on the periphery of the pipe. The heating system includes an induction coil. The induction coil is coaxially arranged with the annular target system. The induction coil moves synchronously with the annular target system.

[0022] In some embodiments of the present application, a cooling system is further included, and the cooling system is connected to the annular target system through a cooling medium pipeline.

[0023] The beneficial technical effects brought by the technical solution provided by the embodiment of the present application include: the embodiment of the present application drives the annular target system by designing a slide rail transmission device, the annular target system has a simple and light structure, and the electric slide rail has no interference with the side wall of the pipe, which can not only avoid the target system bending and deviating from the central axis direction due to the excessive weight of the target system, but also avoid setting a transmission wheel to damage the coated layer on the inner wall of the pipe and affect the quality of the coated layer. According to the different film layer quantity requirements of the pipe, one or more annular target systems are set to move back and forth along the electric slide rail, which has a flexible structure, strong compatibility and a wide range of applications. By arranging a button filling through hole on the electric slide rail, when the annular target system reciprocates, the annular target system presses the button to instantly connect the gas inside the electric slide rail and release the gas, and other buttons remain sealed, thereby improving the uniformity of gas concentration in different areas of the electric slide rail when bombarding the target material, and solving the problem that in the traditional magnetron sputtering device for large aspect ratio pipes, the air inlet pipe is connected to the target system, and during the movement of the target system, the gas concentration changes along the axis direction of the pipe, resulting in insufficient uniformity and stability of the coating; the equipment has a simple structure, and each system is independent of each other, and the instrument is easy to maintain and check for errors.

[0024] Additional aspects and advantages of the present application will be partially given in the following description, which will become apparent from the following description, or will be understood through the practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the following description of the embodiments in conjunction with the accompanying drawings, in which:

[0026] Figure 1 This is a front structural schematic diagram of a magnetron sputtering device for a tube with a large aspect ratio in an embodiment of the present application;

[0027] Figure 2 This is a schematic diagram of the side structure of a magnetron sputtering device for a tube with a large aspect ratio in an embodiment of the present application;

[0028] Figure 3 This is a cross-sectional SEM image of the CrN coating prepared in the examples of the present application.

[0029] Reference numerals:

[0030] 1- pipe, 2- vacuum adapter, 3- annular target system, 4- induction coil, 5- sealing end, 6- vacuum pumping device, 7- slide transmission device, 8- electric slide, 9- air inlet pipe, 10- exhaust device, 11- driven end, 12- magnetron power supply, 13- cooling system, 14- annular target, 15- back plate, 16- magnet, 17- cooling medium pipeline, 18- key button, 19- rubber ring, 20- magnetron power cord, 21- vacuum gauge, 22- electric wire. DETAILED DESCRIPTION

[0031] The embodiments of the present application are described below in conjunction with the drawings in the present application. It should be understood that the implementation methods described below in conjunction with the drawings are exemplary descriptions for explaining the technical solutions of the embodiments of the present application and do not constitute a limitation on the technical solutions of the embodiments of the present application.

[0032] Those skilled in the art will appreciate that, unless expressly stated otherwise, the singular forms "a", "an", "above", and "the" used herein may also include plural forms. It should be further understood that the term "comprising" used in the specification of the present application refers to the presence of the features, integers, steps, operations, elements, and / or components, but does not exclude the implementation of other features, information, data, steps, operations, elements, components, and / or combinations thereof supported by the technical field. It should be understood that when we refer to an element as being "connected" to another element, the element may be directly connected to the other element, or may refer to a connection relationship between the element and the other element established through an intermediate element. In addition, the "connection" used herein may include a wireless connection.

[0033] In order to make the purpose, technical solution and advantages of the present application clearer, the implementation methods of the present application will be further described in detail below in conjunction with the accompanying drawings. It should be noted that the following implementation methods can refer to, learn from or combine with each other, and the same terms, similar features and similar implementation steps in different implementation methods will not be described repeatedly.

[0034] In view of the shortcomings of the existing methods, the present application proposes a magnetron sputtering device for large aspect ratio tubes, which is used to solve the technical problems of poor coating layer quality and poor coating consistency in the prior art.

[0035] In the embodiment of the present application, a magnetron sputtering device for a tube with a large aspect ratio is provided, such as Figure 1 and Figure 2 As shown, Figure 1 This is a front structural schematic diagram of a magnetron sputtering device for a tube with a large aspect ratio in an embodiment of the present application; Figure 2 It is a schematic diagram of the side structure of a magnetron sputtering device for large aspect ratio tubes in an embodiment of the present application.

[0036] The magnetron sputtering device for a large aspect ratio tube comprises a tube 1, a ring target system 3, a slide rail transmission device 7, an electric slide rail 8, an air inlet pipe 9, a key 18 and a vacuum system:

[0037] The tube 1 has a hollow cavity;

[0038] An electric slide rail 8 is located in the cavity, and a plurality of through holes are formed on the side wall of the electric slide rail 8;

[0039] A plurality of key buttons 18 are elastically connected to the electric slide rail 8, and each of the key buttons 18 is filled in one of the through holes;

[0040] An air intake duct 9 is connected to the electric slide rail 8;

[0041] The annular target system 3 is sleeved on the outer periphery of the electric slide rail 8, and the annular target system 3 is slidably connected with the electric slide rail 8;

[0042] A slide rail transmission device 7 is located at one end of the pipe 1, and the slide rail transmission device 7 is in transmission connection with the electric slide rail 8;

[0043] The vacuum system is located at the other end of the tube 1 and is connected to the tube 1 to evacuate the interior of the tube 1 .

[0044] The embodiment of the present application drives the annular target system 3 by designing a slide rail transmission device 7. The annular target system 3 has a simple and light structure, and the electric slide rail 8 has no interference with the side wall of the pipe 1. This can prevent the target system from bending and deviating from the central axis direction due to excessive weight of the target system, and can also prevent the setting of a transmission wheel from damaging the coated layer on the inner wall of the pipe and affecting the quality of the coated layer. According to the different film layer quantity requirements of the pipe 1, one or more annular target systems 3 are set to move back and forth along the electric slide rail 8, which has a flexible structure, strong compatibility, and a wide range of applications. By arranging a key button 18 to fill the through hole on the electric slide rail 8, when the annular target system 3 reciprocates, the annular target system 3 presses the key button 18 to instantly connect the gas inside the electric slide rail 8 and release the gas, and the other key buttons 18 remain sealed, thereby improving the uniformity of gas concentration in different areas of the electric slide rail 8 when bombarding the target material 14, and solving the problem that in the traditional magnetron sputtering device for large aspect ratio pipes, the air inlet pipe 9 is connected to the target system, and during the movement of the target system, the gas concentration changes along the axial direction of the pipe 1, resulting in insufficient uniformity and stability of the coating; the equipment has a simple structure, and each system is independent of each other, and the instrument is easy to maintain and check for errors.

[0045] In this embodiment, the tube 1 is a slender tube 1 with a large aspect ratio as the substrate and deposition chamber of magnetron sputtering. The length of the tube 1 is not less than 50 cm and not more than 3000 cm, the inner diameter is not less than 20 cm and not more than 100 cm, and the tube 1 is made of a metal material without special magnetism.

[0046] In some embodiments of the present application, the electric slide rail 8 extends along the axial direction of the tube 1 , and the movement direction of the button 18 is parallel to the radial direction of the tube 1 .

[0047] In some embodiments of the present application, the through holes are distributed in an array on the side wall of the electric slide rail 8, the distance between any two adjacent through holes is equal, and the key buttons 18 correspond to the through holes one by one.

[0048] In this embodiment, the electric slide rail 8 is located at the central axis of the pipe 1, and the connecting buttons 18 are evenly distributed on the outside of the electric slide rail 8. An air intake pipe 9 is provided inside the electric slide rail 8 to continuously allow air flow to flow in and maintain a saturated state. Exhaust devices 10 are provided at both ends of the electric slide rail 8 to ensure that the air flow circulates inside the electric slide rail 8 under the action of the internal and external pressure difference.

[0049] In some embodiments of the present application, the single key button 18 includes a working state and a standby state. In the working state, the annular target system 3 presses the key button 18, and the annular target is connected to the electric slide rail 8. In the standby state, the key button 18 is separated from the annular target system 3, and the key button 18 blocks the through hole.

[0050] In this embodiment, an air inlet pipe 9 is provided inside the electric slide rail 8, through which airflow is continuously introduced and maintained in a saturated state, and the airflow rate is not less than 10 sccm and not more than 1000 sccm. An air extraction device 10 is provided inside the electric slide rail 8 to ensure that the airflow circulates inside the slide rail under the action of the internal and external pressure difference. Different types of gases can be introduced as needed during the coating process, and the purity of the gas is above 99.999%. The outside of the electric slide rail 8 located at the center of the pipe 1 is evenly distributed with connecting buttons 1818, and the spacing between the buttons 18 on the slide rail is the same, the adjacent spacing is 5 cm, and the diameter of the button 18 is 1 cm.

[0051] When the annular target system 3 moves on the electric slide rail 8 to a certain button 18 position, the corresponding button 18 is pressed by the deadweight of the annular target system 3, and a passage is formed inside and outside the electric slide rail 8 to timely connect the internal gas source of the electric slide rail 8, so that the internal gas can escape and contact the target system, so that the gas contacts the inside of the target system to bombard the target material 14 for sputtering coating. When the annular target system 3 leaves the previous button 18 position, the button 18 is no longer subjected to the pressure generated by the deadweight of the target system, the internal reset spring pops up in time, the button 18 is reset to the initial state, and the rubber ring 19 is reunited into a sealed state. Since the concentrations of the sputtering gas and the reaction gas at different positions in the cavity remain unchanged, the other coating conditions are also relatively stable, so that the film layer inside the tube 1 is uniform and the quality is stable.

[0052] In some embodiments of the present application, the vacuum system includes a vacuum pumping device 6 and a vacuum adapter 2, the vacuum adapter 2 is located between the vacuum pumping device 6 and the pipe 1, one end of the vacuum adapter 2 is connected to the vacuum pumping device 6, and the other end is connected to the pipe 1 through a flange, and the vacuum system is in a sealed state.

[0053] In this embodiment, the vacuum adapter 2 connected to the other end of the pipe 1 is a hollow structure, connected to the vacuum pump 6, and connected to the pipe 1 through a flange. The vacuum system as a whole is kept sealed by the sealing end 5, and the vacuum degree is checked by the vacuum gauge 21.

[0054] The vacuum adapter 2 is 100 cm long, and has the same inner and outer diameters as the tube 1, and high-temperature resistant sealing rings are provided at both ends of the flange to maintain sealing. The outer ends of the vacuum adapter 2 are also connected to the equipment at both ends and the middle tube 1 to be coated through flanges, and space is reserved as a pre-sputtering area to facilitate pre-sputtering of the target system before formal coating, which can effectively clean impurities on the target surface and improve the coating quality. In addition, the adapter can play a role in adjusting the sputtering order of the target material 14. The vacuum pump 6 extracts the gas in the cavity through a vacuum pump to put the vacuum system in a vacuum state.

[0055] In some embodiments of the present application, the number of the annular target systems 3 is one or more, and each of the annular target systems 3 includes a magnet 16 , a backing plate 15 , and an annular target material 14 that are sequentially distributed from the inside to the outside.

[0056] In this embodiment, the slide rail transmission device 7 is connected to one end of the slender tube 1, and the slide rail transmission device 7 includes a driven end 11, a power supply for driving the annular target system 3 on the slide rail, an electric wire 22, a switch, a motor, a coupling, a converter and other control transmission components. The annular target system 3 on the electric slide rail 8 can reciprocate slowly and uniformly, and its movement direction is consistent with the direction of the central axis of the tube 1. The movement speed of the annular target system 3 along the slide rail is not less than 0.5 cm / min and not more than 5 cm / min.

[0057] The number of the annular target systems 3 is one or more, and the single or multiple annular target systems 3 are mounted on the slide rail and can move back and forth along the slide rail; the length of the target system is not less than 10 cm and not more than 20 cm, the inner diameter is not less than 3 cm and not more than 20 cm, and the outer diameter is not less than 5 cm and not more than 30 cm.

[0058] Each annular target system 3 has key layers from the inside to the outside, namely, a magnet 16, a copper backing plate 15, and an annular target material 14, wherein the thickness of the magnet 16 is not less than 0.5 cm and not more than 3 cm, the thickness of the copper backing plate 15 is not less than 0.5 cm and not more than 2 cm, the thickness of the target material 14 is not less than 1 cm and not more than 4 cm, and the distance between the outer target surface of the annular target system 3 and the inner wall of the pipe 1 is not less than 5 cm and not more than 20 cm. The copper backing plate 15 is provided with an interface of a magnetron power supply line 20 connected to the magnetron power supply 12 and a cooling water pipe, so as to facilitate connection with the magnetron power supply 12. During coating, the current flows through the copper backing plate 15 and acts on the target material 14. The annular target system 3 can move back and forth at a uniform speed along the slide rail under the action of the transmission device.

[0059] In the actual coating process, the diameter and thickness of each key layer can be adjusted to adjust the distance from the target surface to the inner wall of the slender tube 1. In the actual coating process, the number of annular target systems 3 and the type of target material 14 should be selected according to actual requirements such as coating composition and coating structure.

[0060] In some embodiments of the present application, an air extraction device 10 is further included, and the air extraction device 10 is arranged at both ends of the tube 1.

[0061] In some embodiments of the present application, a heating system is further included. The heating system is sleeved on the periphery of the pipe 1. The heating system includes an induction coil 4. The induction coil 4 is coaxially arranged with the annular target system 3. The induction coil 4 moves synchronously with the annular target system 3.

[0062] In this embodiment, the heating system includes a medium frequency induction heating coil installed outside the pipe 1, and the medium frequency heating coil is 40 cm long. During the coating process, the medium frequency induction heating coil moves back and forth with the annular target system 3, and the center positions of the two are always consistent. The system temperature reaches the required temperature for coating by heating, and the heating temperature range is not less than 20°C and not more than 500°C.

[0063] In some embodiments of the present application, a cooling system 13 is further included, and the cooling system 13 is connected to the annular target system 3 via a cooling medium pipeline 17 .

[0064] In this embodiment, the cooling water system connected to the annular target system 3 includes a cooling water pipe, which is connected to the copper back plate 15 in the annular target system 3. The excellent heat absorption capacity of water is utilized to circulate cooling water to remove excess heat of the target material 14 during the coating process, thereby cooling and dissipating the heat of the device.

[0065] In this embodiment, the two ends of a steel pipe 1 with a length of 10 meters and an inner diameter of 0.4 meters are respectively connected to a vacuum end adapter and a sealing end 5. One end of the slender pipe 1 is connected to the vacuum system through the vacuum end adapter, and the other end is provided with an air intake pipe 9. An induction heating coil 4 is provided on the outside of the pipe 1. During the coating process, the medium-frequency induction heating coil moves back and forth with the annular target system 3, and the center positions of the two are always consistent. A set of annular target systems 3 with Cr target 14 is placed in the pipe. From the inside to the outside, the key layers are magnet 16, copper back plate 15 and Cr target 14. The target system has a length of 10 cm, an outer diameter of 30 cm, an inner diameter of 10 cm, a magnet 16 thickness of 0.5 cm, a copper back plate 15 thickness of 1 cm, a target 14 thickness of 2 cm, and a distance of 10 cm between the target surface and the inner wall of the pipe 1. The annular target system 3 is placed at one end of the electric slide rail 8, connected to the power supply of the magnetron power supply 12 and the transmission device, and is also equipped with a cooling water pipe. Mechanical buttons 18 are evenly spaced on the electric slide rail 8. The button 18 is mainly pressed and popped up by the key component of the internal return spring (not shown in the figure). The inside of the slide rail is connected to the air intake pipe 9 and the air extraction device 10 to ensure that the gas concentration inside the entire slide rail is saturated and evenly distributed after the gas is introduced.

[0066] After the assembly is completed, the internal cavity of the tube 1 is in a sealed state, and the vacuum system is turned on to evacuate the cavity to 1×10-3 Pa;

[0067] Open the cooling water pipe;

[0068] Turn on the heating coil and heat the pipe 1 to 300°C;

[0069] Open the gas inlet pipe 9 and the gas extraction device 10, introduce argon gas and nitrogen gas, the gas flow rate is 100 sccm, the gas purity is above 99.999%, turn on the magnetron power supply 12, and pre-sputter the Cr target material 14 at the sealed end 5 for 10 minutes to clean the impurities on the target surface;

[0070] After the pre-sputtering is completed, the power supply of the slide rail is turned on, and the Cr target 14 moves from the sealing end 5 to the vacuum end adapter at a moving rate of 5 cm / min, and a CrN layer is deposited on the inner wall of the pipe;

[0071] Maintaining the original moving speed, after reaching one end of the vacuum end adapter, the Cr target 14 moves in the opposite direction from the vacuum end adapter to the sealing end 5, and moves back and forth three times;

[0072] After the deposition is finished, the power supply, the heating coil, the air intake pipe 9 and the air extraction device 10 are turned off, and the cooling water is turned off after the pipe 1 is cooled, and the CrN coating is deposited on the inner wall of the pipe 1;

[0073] like Figure 3 As shown, Figure 3 The cross-sectional SEM image of the CrN coating prepared in the embodiment of the present application shows that the coating is uniform and dense, and has good interface bonding with the substrate of the pipe 1.

[0074] Compared with the prior art, the application of the embodiment of the present application can at least achieve the following beneficial effects: the embodiment of the present application drives the annular target system 3 by designing the slide rail transmission device 7, the annular target system 3 has a simple and light structure, and the electric slide rail 8 has no interference with the side wall of the pipe 1, which can not only avoid the target system bending and deviating from the central axis direction due to the excessive weight of the target system, but also avoid setting the transmission wheel to damage the coated layer on the inner wall of the pipe and affect the quality of the coated layer. According to the different film layer quantity requirements of the pipe 1, one or more annular target systems 3 are set to move back and forth along the electric slide rail 8, which has a flexible structure, strong compatibility and a wide range of applications. By arranging a key button 18 to fill the through hole on the electric slide rail 8, when the annular target system 3 reciprocates, the annular target system 3 presses the key button 18 to instantly connect the gas inside the electric slide rail 8 and release the gas, and the other key buttons 18 remain sealed, thereby improving the uniformity of gas concentration in different areas of the electric slide rail 8 when bombarding the target material 14, and solving the problem that in the traditional magnetron sputtering device for large aspect ratio pipes, the air inlet pipe 9 is connected to the target system, and during the movement of the target system, the gas concentration changes along the axial direction of the pipe 1, resulting in insufficient uniformity and stability of the coating; the equipment has a simple structure, and each system is independent of each other, and the instrument is easy to maintain and check for errors.

[0075] In the description of the present application, the directions or positional relationships indicated by words such as "center", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside" and "outside" are based on the exemplary directions or positional relationships shown in the accompanying drawings. They are for the convenience of describing or simplifying the description of the embodiments of the present application, and do not indicate or imply that the referred device or component must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they should not be understood as limitations on the present application.

[0076] The terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of this application, unless otherwise specified, "plurality" means two or more.

[0077] In the description of this application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0078] In the description of this specification, specific features, structures, materials or characteristics may be combined in an appropriate manner in any one or more embodiments or examples.

[0079] Those skilled in the art will appreciate that the various operations, methods, steps, measures, and schemes in the processes discussed in this application may be alternated, altered, combined, or deleted. Further, other steps, measures, and schemes in the various operations, methods, and processes discussed in this application may also be alternated, altered, rearranged, decomposed, combined, or deleted. Further, the steps, measures, and schemes in the prior art that are similar to those disclosed in this application may also be alternated, altered, rearranged, decomposed, combined, or deleted.

[0080] The above is only a partial implementation method of the present application. It should be pointed out that for ordinary technicians in this technical field, without departing from the technical concept of the scheme of the present application, other similar implementation methods based on the technical ideas of the present application are also within the protection scope of the embodiments of the present application.

Claims

1. A magnetron sputtering device for large aspect ratio tubes, characterized in that: include: Tube, having a hollow cavity; An electric slide rail is located in the cavity, and a plurality of through holes are formed on a side wall of the electric slide rail; A plurality of key buttons are elastically connected to the electric slide rail, and each of the key buttons is filled in one of the through holes; An air intake duct connected to the electric slide rail; An annular target system is sleeved on the periphery of the electric slide rail, and the annular target system is slidably connected to the electric slide rail; A slide rail transmission device is located at one end of the pipe, and the slide rail transmission device is drivingly connected to the electric slide rail; The vacuum system is located at the other end of the tube and is connected to the tube to evacuate the interior of the tube.

2. The magnetron sputtering device for large aspect ratio tubes according to claim 1, characterized in that: The electric slide rail extends along the axial direction of the tube, and the movement direction of the key button is parallel to the radial direction of the tube.

3. The magnetron sputtering device for large aspect ratio tubes according to claim 1, characterized in that: The through holes are distributed in an array on the side wall of the electric slide rail, the distance between any two adjacent through holes is equal, and the key buttons correspond to the through holes one by one.

4. The magnetron sputtering device for large aspect ratio tubes according to claim 3, characterized in that: The single key button includes a working state and a standby state. In the working state, the annular target system presses the key button, and the annular target is connected with the electric slide rail. In the standby state, the key button is separated from the annular target system, and the key button blocks the through hole.

5. The magnetron sputtering device for large aspect ratio tubes according to claim 1, characterized in that: The vacuum system includes a vacuum pumping device and a vacuum adapter, wherein the vacuum adapter is located between the vacuum pumping device and the pipe, one end of the vacuum adapter is connected to the vacuum pumping device, and the other end is connected to the pipe via a flange, and the vacuum system is in a sealed state.

6. The magnetron sputtering device for large aspect ratio tubes according to claim 1, characterized in that: The number of the annular target systems is one or more, and each of the annular target systems includes a magnet, a back plate and an annular target material which are sequentially distributed from the inside to the outside.

7. The magnetron sputtering device for large aspect ratio tubes according to claim 1, characterized in that: It also includes an air extraction device, which is arranged at both ends of the pipe.

8. The magnetron sputtering device for large aspect ratio tubes according to claim 1, characterized in that: It also includes a heating system, which is sleeved on the periphery of the pipe.

9. The magnetron sputtering device for large aspect ratio tubes according to claim 8, characterized in that: The heating system comprises an induction coil, which is coaxially arranged with the annular target system and moves synchronously with the annular target system.

10. The magnetron sputtering device for large aspect ratio tubes according to claim 1, characterized in that: It also includes a cooling system, which is connected to the annular target system through a cooling medium pipeline.

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