Polishing solution supply equipment

Abstract

The utility model discloses polishing solution supply equipment, which relates to the technical field of polishing solution production, and comprises an equipment box, a solution supply assembly and a solution supplement assembly, a cleaning barrel is arranged in the equipment box, the solution supply assembly for automatic solution supply of the equipment is arranged on the right side of the cleaning barrel, and the solution supplement assembly is arranged on the right side of the cleaning barrel. The liquid supply assembly comprises a liquid medicine supply barrel, a pressure sensor and a stirring rod, the pressure sensor is arranged at the bottom of the liquid medicine supply barrel, the stirring rod is installed in the liquid medicine supply barrel through a motor, and the liquid supplementing assembly for automatic liquid supplementing of the equipment is arranged on the right side of the liquid medicine supply barrel. According to the polishing solution supply equipment, a cleaning agent and pure water are proportioned in the cleaning barrel to prepare a cleaning solution for equipment cleaning, the chemical solution supply barrel is used for storing the proportioned polishing solution, and the stirring rod stirs to prevent the polishing solution from precipitating, so that the equipment has the functions of automatic solution supplementing, cleaning, PH value adjusting and the like, deposition can be reduced, and the cleaning efficiency is improved. Liquid is supplied to the polishing machine in the semiconductor industry, and manual intervention is effectively reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of polishing liquid production, in particular to a polishing liquid supply device. Background Art

[0002] Semiconductors refer to materials with electrical conductivity between conductors and insulators at room temperature. Semiconductors are used in integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting, high-power power conversion and other fields. For example, diodes are devices made of semiconductors. When producing polishing liquid, liquid supply equipment is required to prepare and supply the polishing liquid.

[0003] However, the existing polishing liquid supply equipment has relatively simple functions, requires manual intervention many times during use, and has a low degree of automation.

[0004] Therefore, in view of this, the existing structure and defects are studied and improved, and a polishing liquid supply device is provided. Utility Model Content

[0005] The purpose of the utility model is to provide a polishing liquid supply device to solve the problems raised in the above background technology.

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a polishing liquid supply device, comprising an equipment box, a liquid supply component and a liquid replenishing component, a cleaning bucket is arranged inside the equipment box, the liquid supply component for automatic liquid supply of the equipment is arranged on the right side of the cleaning bucket, and the liquid supply component comprises a medicine liquid supply barrel, a pressure sensor and a stirring rod, a pressure sensor is arranged at the bottom of the medicine liquid supply barrel, and a stirring rod is installed inside the medicine liquid supply barrel through a motor, and the liquid replenishing component for automatic liquid replenishment of the equipment is arranged on the right side of the medicine liquid supply barrel.

[0007] Furthermore, the shape of the medicine liquid supply barrel is a cylindrical shape, and the center point of the medicine liquid supply barrel and the pressure sensor are located on the same vertical line.

[0008] Furthermore, the liquid replenishing component includes a raw liquid barrel and a weighing module, and the weighing module is arranged at the lower end of the raw liquid barrel.

[0009] Furthermore, the number of the raw liquid barrels is set to two groups, and the positions and numbers of the weighing modules and the raw liquid barrels are consistent.

[0010] Furthermore, a partition is installed on the front side of the interior of the equipment box, and a control panel is arranged on the front side of the partition.

[0011] Furthermore, front and rear partitions are installed transversely inside the equipment box, and the partitions and the front and rear partitions are distributed vertically.

[0012] Furthermore, a liquid supply filter pipeline is installed on the left side of the rear end of the front and rear partitions through a pipeline, and a recovery filter pipeline is installed on the right side of the rear end of the front and rear partitions through a pipeline.

[0013] Furthermore, a maintenance and inspection port is provided at the rear side of the equipment box, and a reinforcement rod is vertically installed in the middle of the maintenance and inspection port.

[0014] The utility model provides a polishing liquid supply device, which has the following beneficial effects:

[0015] 1. The utility model prepares a cleaning liquid by mixing detergent and pure water in a cleaning barrel for cleaning equipment. The liquid supply barrel is used to store the polishing liquid after mixing. The stirring rod is driven by a motor to stir to prevent the polishing liquid from settling. The pressure sensor facilitates the mixing of the liquid. The weighing module at the bottom of the stock liquid barrel can accurately and automatically mix the liquid, so that the equipment has the functions of automatic liquid replenishment, cleaning, pH value adjustment, etc., and can also reduce deposition, meet the semiconductor industry's liquid supply to the polishing machine, and effectively reduce manual intervention.

[0016] 2. The utility model supplies the polishing liquid in the stock liquid barrel to the polishing machine through the liquid supply filter pipeline through the pump body. If the temperature of the liquid in the liquid barrel is not enough in the self-circulation system, the liquid will be heated up through the heat exchanger to supply the liquid to the liquid wave barrel. When the temperature reaches the liquid supply requirement, the liquid supply starts to ensure the liquid supply temperature. The recovery filter pipeline cools the recovered polishing liquid through the heat exchanger. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 This is a schematic diagram of the overall internal structure of a polishing liquid supply device of the utility model;

[0018] Figure 2 This is a front structural schematic diagram of a polishing liquid supply device of the utility model;

[0019] Figure 3 This is a rear structural schematic diagram of a polishing liquid supply device of the utility model;

[0020] Figure 4 This is a schematic diagram of the overall pipeline structure of a polishing liquid supply device of the utility model;

[0021] Figure 5 The utility model is a schematic diagram of the cleaning pipeline structure of a polishing liquid supply device.

[0022] In the figure: 1. Equipment box; 2. Cleaning barrel; 3. Liquid supply assembly; 301. Liquid supply barrel; 302. Pressure sensor; 303. Stirring rod; 4. Liquid replenishment assembly; 401. Original liquid barrel; 402. Weighing module; 5. Partition; 6. Control panel; 7. Front and rear partitions; 8. Liquid supply filter pipeline; 9. Recovery filter pipeline; 10. Maintenance and inspection port; 11. Reinforcement rod. DETAILED DESCRIPTION

[0023] The following is a further detailed description of the implementation of the present invention in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but cannot be used to limit the scope of the present invention.

[0024] like Figure 1 and Figure 2 As shown, a polishing liquid supply device includes an equipment box 1, a liquid supply component 3 and a liquid replenishing component 4. A cleaning barrel 2 is arranged inside the equipment box 1. Cleaning liquid is prepared by mixing detergent and pure water in the cleaning barrel 2 for cleaning the equipment. The liquid supply component 3 for automatic liquid supply of the equipment is arranged on the right side of the cleaning barrel 2, and the liquid supply component 3 includes a liquid supply barrel 301, a pressure sensor 302 and a stirring rod 303. The bottom of the liquid supply barrel 301 is provided with a pressure sensor 302. The liquid supply barrel 301 is used for storing the polishing liquid after mixing. The liquid supply barrel 301 is provided with a stirring rod 303 through a motor. The stirring rod 303 is driven by the motor to stir to prevent the polishing liquid from settling. The pressure sensor 302 facilitates the mixing of the liquid. The liquid replenishing component 4 for automatic liquid replenishment of the equipment It is arranged on the right side of the liquid supply barrel 301, the liquid supply barrel 301 is in the shape of a cylinder, and the center points of the liquid supply barrel 301 and the pressure sensor 302 are located on the same vertical line, the liquid replenishing component 4 includes a raw liquid barrel 401 and a weighing module 402, and the weighing module 402 is arranged at the lower end of the raw liquid barrel 401, and the number of raw liquid barrels 401 is arranged in two groups, and the weighing module 402 at the bottom of the raw liquid barrel 401 can accurately and automatically dispense liquid in a line of sight, so that the equipment has the functions of automatic liquid replenishment, cleaning, pH value adjustment, etc., and can also reduce deposition, meet the semiconductor industry to supply liquid to the polishing machine, effectively reduce manual intervention, and the position and quantity of the weighing module 402 and the raw liquid barrel 401 are consistent, and a partition 5 is installed on the front side of the interior of the equipment box 1, and a control screen 6 is arranged on the front side of the partition 5.

[0025] like Figure 3 As shown, the interior of the equipment box 1 is laterally installed with front and rear partitions 7, and the partitions 5 and the front and rear partitions 7 are distributed vertically. A liquid supply filter pipeline 8 is installed on the left side of the rear end of the front and rear partitions 7 through a pipeline. The liquid supply filter pipeline 8 supplies the polishing liquid in the raw liquid barrel 401 to the polishing machine through the pump body. Among them, if the temperature of the liquid in the liquid barrel is not enough in the self-circulation system, the liquid will be heated up through a heat exchanger to supply the liquid to the liquid wave barrel. When the temperature reaches the liquid supply requirement, the liquid supply starts to ensure the liquid supply temperature, and a recovery filter pipeline 9 is installed on the right side of the rear end of the front and rear partitions 7 through a pipeline. The recovery filter pipeline 9 cools down the recovered polishing liquid through the heat exchanger. A maintenance port 10 is opened on the rear side of the equipment box 1, and a reinforcement rod 11 is vertically installed in the middle of the maintenance port 10.

[0026] like Figure 4 and Figure 5As shown, in the liquid supply part, the liquid in the liquid supply barrel 301 is filtered and pumped to the equipment that needs liquid supply through a pump. If the temperature of the liquid in the equipment does not meet the requirements, it can be circulated internally through the heat exchanger to heat up or cool down. The liquid replenishment part is placed in the original liquid barrel 401 inside the machine. The weighing module 402 is designed at the bottom to accurately control the liquid ratio. The external heat exchanger in the external heat exchanger module can effectively reduce the deposition of polishing liquid abrasives in the barrel. The recovery and filtration module recovers the circulated polishing liquid through cooling and filtration. The recovery module pumps the recovered liquid to the heat exchanger and filters it back to the liquid barrel through the heat exchanger. The liquid supply cleaning water circuit, the pure water supply pipeline provides pipeline cleaning, filter cleaning, heat exchanger cleaning and liquid barrel cleaning, wherein pure water is directly supplied, and the cleaning liquid is manually added in the cleaning liquid module, and circulated through the branch circuit to ensure that the liquid in the barrel is evenly mixed. The bottom of the barrel is equipped with a pressure sensor 302 to control the ratio of cleaning liquid and water.

[0027] In summary, the polishing liquid supply device is firstly based on Figure 1-Figure 5 The structure shown in, when the equipment is working, the pump body extracts the prepared liquid in the stock liquid barrel 401 for preparation, the weighing module 402 at the bottom of the stock liquid barrel 401 can accurately prepare the liquid automatically, and the prepared polishing liquid is stored in the liquid supply barrel 301, and the electric drive stirring rod 303 rotates continuously to prevent the polishing liquid from precipitating. The pressure sensor 302 is convenient for the proportion of the liquid. When in use, the liquid supply filter pipeline 8 supplies the polishing liquid in the stock liquid barrel 401 to the polishing machine through the pump body. If the temperature of the liquid in the liquid barrel is not enough in the self-circulating system, the liquid will be heated up through the heat exchanger to supply the liquid to the liquid wave barrel. When the temperature reaches the liquid supply requirement, the liquid supply starts to ensure the liquid supply temperature. The external heat exchanger module can have an external heat exchanger. The polishing liquid abrasive is effectively reduced to deposit in the barrel. The recovery and filtration module recovers the recyclable polishing liquid through cooling and filtration. The recovery module in the equipment pumps the recovered liquid to the heat exchanger and filters it back to the liquid barrel through the heat exchanger. The recovery and filtration pipeline 9 cools the recovered polishing liquid through the heat exchanger. When the equipment is cleaned, the cleaning liquid is manually added to the cleaning liquid module and circulated through the branch circuit to ensure that the liquid in the barrel is evenly mixed. A pressure sensor 302 is provided at the bottom of the barrel to control the ratio of cleaning liquid and water. The equipment integrates the functions of liquid supply, recovery, cleaning, temperature control, pH value adjustment, and automatic liquid distribution for the polishing machine to meet the various requirements of the polishing machine and effectively reduce manual intervention.

[0028] The embodiments of the present invention are provided for the purpose of illustration and description, and are not intended to be exhaustive or to limit the present invention to the disclosed forms. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiments are selected and described to better illustrate the principles and practical applications of the present invention, and to enable those of ordinary skill in the art to understand the present invention and thereby design various embodiments with various modifications suitable for specific uses.

Claims

1. A polishing liquid supply device, comprising a device box (1), a liquid supply component (3) and a liquid replenishing component (4), characterized in that: A cleaning barrel (2) is arranged inside the equipment box (1); the liquid supply assembly (3) for automatic liquid supply of the equipment is arranged on the right side of the cleaning barrel (2); the liquid supply assembly (3) comprises a liquid medicine supply barrel (301), a pressure sensor (302) and a stirring rod (303); the bottom of the liquid medicine supply barrel (301) is provided with a pressure sensor (302); the inside of the liquid medicine supply barrel (301) is equipped with a stirring rod (303) via a motor; and the liquid replenishment assembly (4) for automatic liquid replenishment of the equipment is arranged on the right side of the liquid medicine supply barrel (301).

2. A polishing liquid supply device according to claim 1, characterized in that: The shape of the liquid medicine supply barrel (301) is a round barrel, and the center points of the liquid medicine supply barrel (301) and the pressure sensor (302) are located on the same vertical line.

3. A polishing liquid supply device according to claim 1, characterized in that: The liquid replenishing component (4) comprises a stock liquid barrel (401) and a weighing module (402), and the weighing module (402) is arranged at the lower end of the stock liquid barrel (401).

4. A polishing liquid supply device according to claim 3, characterized in that: The number of the raw liquid barrels (401) is arranged in two groups, and the positions and numbers of the weighing modules (402) and the raw liquid barrels (401) are consistent.

5. The polishing liquid supply device according to claim 1, characterized in that: A partition (5) is installed on the front side of the interior of the equipment box (1), and a control panel (6) is arranged on the front side of the partition (5).

6. The polishing liquid supply device according to claim 1, characterized in that: Front and rear partitions (7) are installed transversely inside the equipment box (1), and the partitions (5) and the front and rear partitions (7) are distributed vertically.

7. A polishing liquid supply device according to claim 6, characterized in that: A liquid supply filter pipeline (8) is installed on the left side of the rear end of the front and rear partitions (7) through a pipeline, and a recovery filter pipeline (9) is installed on the right side of the rear end of the front and rear partitions (7) through a pipeline.

8. The polishing liquid supply device according to claim 1, characterized in that: The rear side of the equipment box (1) is provided with a maintenance opening (10), and a reinforcement rod (11) is vertically installed in the middle of the maintenance opening (10).

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