Method and Apparatus for Creating a Phase Step in Mirrors Used in Spatial Light Modulator Arrays

a spatial light modulator and phase step technology, applied in the field of light patterning device processing, can solve problems such as mirror failur

Inactive Publication Date: 2008-02-14
ASML HLDG NV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This approach allows for efficient and precise formation of phase steps on SLM mirrors without the risks associated with photoresist processing, enhancing resolution and reducing throughput losses.

Problems solved by technology

This lack of a photoresist step removes the risk of leaving residual photoresist in between mirrors or below mirrors where it can cause mirror failure.

Method used

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  • Method and Apparatus for Creating a Phase Step in Mirrors Used in Spatial Light Modulator Arrays
  • Method and Apparatus for Creating a Phase Step in Mirrors Used in Spatial Light Modulator Arrays
  • Method and Apparatus for Creating a Phase Step in Mirrors Used in Spatial Light Modulator Arrays

Examples

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Embodiment Construction

[0032] While specific configurations and arrangements are discussed, it should be understood that this is done for illustrative purposes only. A person skilled in the pertinent art will recognize that other configurations and arrangements can be used without departing from the spirit and scope of the present invention. It will be apparent to a person skilled in the pertinent art that this invention can also be employed in a variety of other applications.

[0033] One or more embodiments of the present invention provide a method and apparatus for patterning an array of SLM mirrors with a phase step. Additional embodiments of the present invention provide a method for processing a substrate, wherein the processed substrate is used in the apparatus for patterning an array of SLM mirrors with a phase step.

Terminology

[0034] Throughout the description, the use of the terms “pattern generator” and “pattern generating device(s)” includes a reflective or transmissive reticle, a contrast dev...

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Abstract

An apparatus for patterning an array of SLM mirrors with a phase step is disclosed. The apparatus includes a spatial light modulator (SLM) mirror, and a mask. The mask includes a plurality of openings formed therein, wherein a material is passed through a first opening in the mask to cause the material to impinge upon a predetermined area of the SLM mirror that is aligned with the first opening, whereby a phase step is formed on the SLM mirror.

Description

CROSS REFERENCE TO RELATED APPLICATIONS [0001] This application is a divisional application of U.S. patent Ser. No. 11 / 020,138, filed Dec. 27, 2004 and currently allowed, the entirety of which is incorporated by reference herein.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention is related to the processing of light patterning devices. [0004] 2. Background Art [0005] A patterning device is used to pattern incoming light. A static patterning device can include reticles or masks. A dynamic patterning device can include an array of individually controllable elements (or, Spatial Light Modulators) that generate a pattern through receipt of analog or digital signals. Example environments for use of the patterning device can be, but are not limited to, a lithographic apparatus, a maskless lithographic apparatus, a projector, a projection display apparatus, or the like. [0006] Currently, arrays of Spatial Light Modulators (SLMs) can comprise various t...

Claims

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Application Information

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Patent Type & AuthorityApplications(United States)
IPC IPC(8): C23C16/04
CPCG02B26/0833
InventorROUX, STEVEN
OwnerASML HLDG NV