Edge washing device

Abstract

The present invention discloses a side edge washing device, comprising a support shaft, a driving device, a rotating bracket, an L-shaped support rod, a nozzle device, a first fine-tuning mechanism and a second fine-tuning mechanism, wherein the driving device is mounted at one end of the support shaft, the rotating bracket is mounted at the other end of the support shaft, the L-shaped support rod comprises a vertical support rod and a horizontal support rod, the vertical support rod is rotatably mounted on the free end of the rotating bracket, the nozzle device is rotatably mounted on the horizontal support rod, the first fine-tuning mechanism is mounted on the rotating bracket, and is used to drive the L-shaped support rod to rotate, and the second fine-tuning mechanism is mounted on the L-shaped support rod, and is used to drive the nozzle device to rotate. The present invention flexibly adjusts the height and angle of the nozzle device by manually adjusting the first fine-tuning mechanism and the second fine-tuning mechanism, so that the nozzle reaches the optimal side edge washing position, accurately controls the side edge washing width and the width of the transition area, achieves the optimal side edge washing effect, and improves product quality.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor manufacturing technology, and more specifically, to an edge washing device capable of adjusting an edge washing width and a transition area width. Background Art

[0002] In the semiconductor manufacturing process, the edge washing process of the wafer is involved. For example, after the wafer is electrochemically copper-plated and before chemical mechanical polishing, the wafer needs to be edge washed to remove a layer of copper film on the edge of the wafer. For example, after the wafer is coated with glue, the wafer needs to be edge washed to remove the photoresist on the edge of the wafer. When washing the edge of the wafer, it is necessary not only to consider the width of the copper film or photoresist removed at the edge of the wafer, but also to ensure the width of the transition area. The edge removal width and the transition area width determine the quality of the edge washing, and the quality of the edge washing affects the quality of the product. The prior art usually uses a nozzle to perform wet edge washing on the wafer. During the edge washing process, it is necessary to ensure that the product edge washing is uniform, and the edge washing width and the transition area width must be ensured to prevent poor edge washing from causing a reduction in product yield or rework. The liquid outlet direction and height of the nozzle have a great influence on the edge washing effect and the width of the transition area. Inaccurate adjustment of the liquid outlet direction and height of the nozzle will lead to poor edge washing effect.

[0003] At present, the traditional nozzle device used for edge cleaning cannot flexibly adjust the liquid outlet direction, height and inclination angle of the liquid column relative to the wafer, which results in poor width of the wafer edge cleaning transition area or insufficient edge cleaning, which damages the product yield or requires rework, affecting production efficiency and causing losses in production costs. Summary of the invention

[0004] The object of the present invention is to provide a side washing device which can adjust the nozzle to the best side washing position, control both the side washing width and the transition area width, thereby improving the side washing effect and further improving product quality.

[0005] To achieve the above object, the present invention provides a cleaning device, comprising:

[0006] Support shaft;

[0007] A driving device mounted on one end of the support shaft;

[0008] A rotating bracket mounted on the other end of the support shaft;

[0009] The L-shaped support rod comprises a vertical support rod and a horizontal support rod connected to each other, the vertical support rod is rotatably mounted on the free end of the rotating bracket, and a nozzle device is rotatably mounted on the horizontal support rod;

[0010] A first fine-adjustment mechanism is installed on the rotating bracket and is used to drive the L-shaped support rod to rotate;

[0011] The second fine-adjusting mechanism is installed on the L-shaped support rod and is used to drive the nozzle device to rotate.

[0012] Further, the first fine-tuning mechanism includes:

[0013] A first fixing plate is mounted on the rotating bracket;

[0014] A first adjusting rod, limited in a first groove provided in the first fixing plate;

[0015] A first sliding block, threadedly connected to the first adjusting rod;

[0016] A first opening is formed on the vertical support rod, a first convex block is formed on the first sliding block, and the first convex block is slidably connected to the first opening;

[0017] When the first adjusting rod is rotated, the first sliding block moves along the first groove, and the first protrusion pushes the L-shaped supporting rod to rotate relative to the rotating bracket.

[0018] Furthermore, the first fine-tuning mechanism further includes:

[0019] A first pointer, fixedly mounted on a first fixing plate;

[0020] The first angle scale is marked on the vertical support rod, and the first pointer points to the first angle scale.

[0021] Furthermore, the vertical support rod is provided with a second opening, which is in an arc shape, and the center of the second opening coincides with the rotation center of the L-shaped support rod; the L-shaped support rod and the rotating bracket are connected by fasteners passing through the second opening.

[0022] Further, the second fine-tuning mechanism comprises:

[0023] A second fixing plate is mounted on the L-shaped support rod;

[0024] A second adjusting rod, limited in a second groove provided in the second fixing plate;

[0025] A second sliding block, threadedly connected to the second adjusting rod;

[0026] The nozzle device has a housing, a second slider is provided with a second convex block, and the second convex block is connected to the housing;

[0027] When the second adjusting rod is rotated, the second sliding block moves along the second groove, and the second protrusion pushes the housing to make the spray head device rotate relative to the horizontal support rod.

[0028] Furthermore, the second fine-tuning mechanism further includes:

[0029] A second pointer is fixedly mounted on the housing;

[0030] The second angle scale is marked on the horizontal support rod, and the second pointer points to the second angle scale.

[0031] Furthermore, the horizontal support rod is provided with a circular hole and at least one circular arc groove evenly distributed around the circular hole, the circular arc groove is arranged concentrically with the circular hole, the nozzle device is rotatably installed in the circular hole, and the nozzle device and the horizontal support rod are connected by a fixing member passing through the circular arc groove.

[0032] The invention flexibly adjusts the height and angle of the nozzle by manually adjusting the first fine-tuning mechanism and the second fine-tuning mechanism, so that the nozzle reaches the optimal edge washing position, accurately controls the edge washing width and the width of the transition area, achieves the best edge washing effect, and improves product quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] Figure 1 A schematic diagram of a cross section of a portion of a silicon wafer is disclosed.

[0034] Figure 2 A three-dimensional view of an edge washing device according to an embodiment of the present invention is disclosed.

[0035] Figure 3 A 45° right view of the manual adjustment part of the edge washing device of the present invention is disclosed.

[0036] Figure 4 A 45° left view of the manual adjustment part of the edge washing device of the present invention is disclosed.

[0037] Figure 5 The bottom view of the manual adjustment part in the edge washing device of the present invention is disclosed.

[0038] Figure 6 A three-dimensional view of an L-shaped support rod in the edge washing device of the present invention is disclosed.

[0039] Figure 7 The invention discloses a structural diagram of a vertical direction micro-adjustment structure in the edge washing device of the present invention.

[0040] Figure 8 A cross-sectional view of a vertical direction fine adjustment structure in the edge washing device of the present invention is disclosed.

[0041] Fig. 9 A stereoscopic diagram of a slider in a vertical direction fine adjustment structure in an edge washing device of the present invention is disclosed.

[0042] Fig.10 A schematic diagram of adjusting the position of a nozzle in the edge washing device of the present invention is disclosed.

[0043] Fig.11 The present invention discloses a three-dimensional view of the bottom of the horizontal direction micro-adjustment structure in the edge washing device of the present invention.

[0044] Fig.12 The structural diagram of the horizontal direction fine adjustment structure in the edge washing device of the present invention is disclosed.

[0045] Fig.13 A stereoscopic diagram of a slider in a horizontal direction fine adjustment structure in an edge washing device of the present invention is disclosed. DETAILED DESCRIPTION

[0046] In order to explain the technical content, structural features, objectives and effects of the present invention in detail, embodiments and drawings are provided below for detailed description.

[0047] refer to Figure 1 , a schematic diagram of a cross section of a portion of a silicon wafer 100 used in an embodiment of the present invention is disclosed. Region 101 is an edge removal region, region 102 is an edge transition region, and region 103 is a region to be retained. During the wet edge cleaning process, while considering the width of the edge removal region 101, the width of the edge transition region 102 should also be taken into account to avoid affecting the retained region 103, thereby affecting the quality of the silicon wafer 100.

[0048] refer to Figure 2 As shown, according to one embodiment of the present invention, the edge washing device includes a support shaft 200, a driving device 201, a rotating bracket 202, an L-shaped support rod 203, a first fine-tuning mechanism 300, a second fine-tuning mechanism 400 and a nozzle device 500. The driving device 201 is installed at one end of the support shaft 200, and is generally a rotary motor and a lifting motor, which is used to control the lifting and rotation of the edge washing device as a whole. The rotating bracket 202 is connected to the other end of the support shaft 200. Figure 2 and Figure 3 The L-shaped support rod 203 includes a vertical support rod 2031 and a horizontal support rod 2032. The vertical support rod 2031 is rotatably mounted on the free end of the rotating bracket 202. That is, at this time, the L-shaped support rod 203 as a whole is used as a rotating member, and the rotating bracket 202 is used as a fixed member. Under the drive of the first fine-tuning mechanism 300, the L-shaped support rod 203 can be freely rotated relative to the rotating bracket 202. The nozzle device 500 is rotatably mounted on the horizontal support rod 2032. That is, at this time, the nozzle device 500 is a rotating member, and the horizontal support rod 2032 is a fixed member. Under the drive of the second fine-tuning mechanism 400, the nozzle device 500 can be freely rotated relative to the horizontal support rod 2032.

[0049] like Figure 3 The spray head device 500 includes a liquid inlet 501, a housing 502, a nozzle 503 and a liquid inlet channel 504. One end of the liquid inlet channel 504 is connected to the liquid inlet 501, and the other end is connected to the nozzle 503. The housing 502 is fixed to the liquid inlet channel 504. Figure 6A circular hole 2037 is provided on the horizontal support rod 2032, and a plurality of arc grooves 2038 which are concentric with the circular hole 2037 are provided on the outer side of the circular hole 2037. The nozzle device 500 passes through the circular hole 2037, and the shell 502 is fixed to the horizontal support rod 2032 after passing through the arc groove 2038 with a fixing part, so that the nozzle device 500 can be rotatably fixed on the horizontal support rod 2032.

[0050] refer to Figure 6 As shown, the vertical support rod 2031 of the L-shaped support rod 203 includes a first opening 2034 and a second opening 2035. The second opening 2035 is an arc-shaped opening, and a positioning pin 2033 is provided at the center of the circle corresponding to the arc of the second opening 2035. The rotating bracket 202 is provided with a mounting hole matching the positioning pin 2033, and the positioning pin 2033 is inserted into the mounting hole on the rotating bracket 202, so that the L-shaped support rod 203 and the rotating bracket 202 can be rotatably fixed with the positioning pin 2033 as the rotation center. Figure 7 The L-shaped support rod 203 and the rotating bracket 202 are connected by fasteners passing through the second opening 2035, so that the L-shaped support rod 203 can rotate in a vertical plane with the positioning pin 2033 as the center. The size of the second opening 2035 limits the rotation range of the L-shaped support rod 203, that is, the adjustable range of the nozzle device 500.

[0051] refer to Figures 7 to 9As shown, according to one embodiment of the present invention, the first fine-tuning mechanism 300 includes a first slider 302, a first adjusting rod 305 and a first fixing plate 306. The first adjusting rod 305 is provided with an external thread on its main body, a through hole 3021 is provided at the center of the first slider 302, the first adjusting rod 305 is placed in the through hole 3021, and an internal thread matching the first adjusting rod 305 is provided in the through hole 3021. A first knob 301 is provided at one end of the first adjusting rod 305, and a convex ring is provided near the first knob 301 on the main body of the first adjusting rod 305. The first fixing plate 306 is fixed to the rotating bracket 202, a vertical groove is provided on the first fixing plate 306, the first slider 302 is placed in the vertical groove of the first fixing plate 306, and the first slider 302 can move along the vertical groove. The first fixing plate 306 is also provided with a transverse groove, the convex ring of the first adjusting rod 305 is placed in the transverse groove of the first fixing plate 306, and the transverse groove is used to fix the first adjusting rod 305 in the vertical direction. The vertical groove and the transverse groove on the first fixed plate 306 together constitute the first groove. When the first knob 301 is turned, the first adjusting rod 305 cannot move in the vertical groove of the first fixed plate 306 because the convex ring of the first adjusting rod 305 is restricted by the transverse groove, so that the first slider 302 moves up and down in the vertical groove. The first slider 302 is also provided with a first protrusion 3022, and the first protrusion 3022 is slidably installed in the first opening 2034 of the vertical support rod 2031, and the first opening 2034 is a long strip opening. Therefore, when the first slider 302 moves in the vertical groove, the first protrusion 3022 thereon drives the L-shaped support rod 203 to rotate in the vertical plane with the positioning pin 2033 as the center of the circle, thereby driving the nozzle 503 to move in the vertical plane.

[0052] See also Figure 4 The first fine-tuning mechanism 300 is also provided with a first pointer 303 . Specifically, the first pointer 303 is fixedly mounted on the first fixing plate 306 . The vertical support rod 2031 is also provided with a first angle scale 304 , and the first pointer 303 points to the first angle scale 304 .

[0053] refer to Fig.10As shown, according to one embodiment, a schematic diagram of the position adjustment of the nozzle 503 in the present invention is disclosed. By prior calculation, an angle range of 30°-60° is set on the first angle scale 304 (of course, it can be understood that in other embodiments, the angle adjustment range can also be changed by changing the size of the arc angle of the second opening, and the first angle scale 304 shows the corresponding angle range, such as 20°~50°, etc.). The initial position of the nozzle 503 is at a 45° angle to the silicon wafer 100. By turning the first knob 301, the first slider 302 is driven to move, thereby driving the L-shaped support rod 203 to rotate with the positioning pin 2033 as the center of the circle, and then driving the nozzle 503 to move. The specific movement angle is determined by the first pointer 303, thereby controlling the specific movement position of the nozzle 503.

[0054] refer to Figures 11 to 13As shown, according to one embodiment of the present invention, the second fine-tuning mechanism 400 includes a second slider 402, a second adjustment rod 403 and a second fixed plate 404. The second adjustment rod 403 is provided with an external thread on its main body, a through hole 4021 is provided at the center of the second slider 402, the second adjustment rod 403 is placed in the through hole 4021, and an internal thread matching the second adjustment rod 403 is provided in the through hole 4021. A second knob 401 is provided at one end of the second adjustment rod 403, and a convex ring is provided on the main body of the second adjustment rod 403 near the second knob 401. The second fixed plate 404 is fixed to the L-shaped support rod 203, a vertical groove is provided on the second fixed plate 404, the second slider 402 is placed in the vertical groove of the second fixed plate 404, and the second slider 402 can move along the vertical groove. The second fixed plate 404 is also provided with a transverse groove, the convex ring of the second adjustment rod 403 is placed in the transverse groove of the second fixed plate 404, and the transverse groove is used to limit the movement of the second adjustment rod 403. The vertical groove and the horizontal groove on the second fixed plate 404 together constitute the second groove. When the second knob 401 is turned, the second adjusting rod 403 cannot move in the vertical groove of the second fixed plate 404 because the convex ring of the second adjusting rod 403 is restricted by the horizontal groove, so that the second slider 402 moves up and down in the vertical groove. The second slider 402 is also provided with a second protrusion 4022, and the horizontal support rod 2032 of the L-shaped support rod 203 is also provided with a long strip opening 2036. The second protrusion 4022 passes through the long strip opening 2036 and is connected to the housing 502, so that the second fine-tuning mechanism 400 is connected to the nozzle device 500, which is convenient for the second fine-tuning mechanism 400 to adjust the position of the nozzle device 500. The working principle of the second fine-tuning mechanism 400 is basically the same as that of the first fine-tuning mechanism 300. When in use, the second knob 401 is turned, and the second slider 402 moves along the vertical groove. The connection between the second protrusion 4022 and the shell 502 drives the nozzle device 500 to rotate in the horizontal direction. More specifically, the second protrusion 4022 drives the nozzle device 500 to rotate with the circular hole 2037 as the center, and the rotation range is limited by the arc notch 2038 of the horizontal support rod 2032.

[0055] See also Fig.11 The housing 502 is also provided with a second pointer 505, and the horizontal support rod 2032 is also provided with a second angle scale 506, and the second pointer 505 points to the second angle scale 506. When the second fine-tuning mechanism 400 adjusts the rotation position of the nozzle device 500, it can be judged by observing the reading on the second angle scale 506 whether the nozzle angle is adjusted to a suitable position.

[0056] When the edge cleaning device of the present invention is used to clean the edge of a silicon wafer, first, the driving device 201 (generally a rotating motor and a lifting motor) is used to control the rotation and lifting movement of the entire device. The driving device 201 directly controls the movement of the support shaft 200, and at the same time drives the movement of the rotating bracket 202 and the L-shaped support rod 203, so that the nozzle 503 reaches the approximate edge cleaning position. Then, the position of the nozzle 503 in the vertical plane is specifically controlled by manually adjusting the first fine-tuning mechanism 300. The first knob 301 is turned so that the first slider 302 drives the L-shaped support rod 203 to rotate in the vertical plane with the positioning pin 2033 as the center of the circle, and at the same time drives the nozzle 503 to move in the vertical plane. The specific movement angle is determined by the first pointer 303 and the first angle scale 304, thereby controlling the specific movement position of the nozzle 503. Then, the position of the nozzle 503 in the horizontal plane is specifically controlled by manually adjusting the second fine-tuning mechanism 400. The second knob 401 is turned so that the second slider 402 drives the nozzle device 500 to rotate, thereby driving the movement of the nozzle 503 in the horizontal plane. The position of the nozzle 503 is precisely controlled by the second pointer 505 and the second angle scale 506, so that the nozzle 503 reaches the optimal edge washing position.

[0057] The edge washing device of the present invention utilizes a driving device to move the nozzle 503 to an approximate position, and then flexibly adjusts the height and angle of the nozzle 503 by manually adjusting the first fine-tuning mechanism and the second fine-tuning mechanism, so that the nozzle 503 reaches the optimal edge washing position, accurately controls the edge washing width and the width of the transition area, achieves the best edge washing effect, and improves product quality.

[0058] In summary, the present invention has specifically and fully disclosed the relevant technology through the above-mentioned implementation modes and related drawings, so that those skilled in the art can implement it accordingly. The above-mentioned embodiments are only used to illustrate the present invention, not to limit the present invention. The scope of rights of the present invention should be defined by the claims of the present invention. As for the change of the number of elements described herein or the replacement of equivalent elements, etc., they should still fall within the scope of rights of the present invention.

Claims

1. A washing device, characterized in that: include: Support shaft; A driving device mounted on one end of the support shaft; A rotating bracket mounted on the other end of the support shaft; The L-shaped support rod comprises a vertical support rod and a horizontal support rod connected to each other, the vertical support rod is rotatably mounted on the free end of the rotating bracket, and a nozzle device is rotatably mounted on the horizontal support rod; A first fine-adjustment mechanism is installed on the rotating bracket and is used to drive the L-shaped support rod to rotate; The second fine-adjustment mechanism is mounted on the L-shaped support rod and is used to drive the nozzle device to rotate; Wherein, the second fine-tuning mechanism comprises: A second fixing plate is mounted on the L-shaped support rod; A second adjusting rod, limited in a second groove provided in the second fixing plate; A second sliding block, threadedly connected to the second adjusting rod; The nozzle device has a housing, a second slider is provided with a second convex block, and the second convex block is connected to the housing; When the second adjusting rod is rotated, the second sliding block moves along the second groove, and the second protrusion pushes the housing to make the spray head device rotate relative to the horizontal support rod.

2. The edge washing device according to claim 1, characterized in that: The first fine-tuning mechanism comprises: A first fixing plate is mounted on the rotating bracket; A first adjusting rod, limited in a first groove provided in the first fixing plate; A first sliding block, threadedly connected to the first adjusting rod; A first opening is formed on the vertical support rod, a first convex block is formed on the first sliding block, and the first convex block is slidably connected to the first opening; When the first adjusting rod is rotated, the first sliding block moves along the first groove, and the first protrusion pushes the L-shaped supporting rod to rotate relative to the rotating bracket.

3. The edge washing device according to claim 2, characterized in that: The first fine-tuning mechanism also includes: A first pointer, fixedly mounted on a first fixing plate; The first angle scale is marked on the vertical support rod, and the first pointer points to the first angle scale.

4. The edge washing device according to claim 2, characterized in that: The vertical support rod is also provided with a second opening, which is in an arc shape, and the center of the second opening coincides with the rotation center of the L-shaped support rod; the L-shaped support rod and the rotating bracket are connected through the second opening by a fastener.

5. The edge washing device according to claim 1, characterized in that: The second fine-tuning mechanism also includes: A second pointer is fixedly mounted on the housing; The second angle scale is marked on the horizontal support rod, and the second pointer points to the second angle scale.

6. The edge washing device according to claim 1, characterized in that: The horizontal support rod is also provided with a circular hole and at least one circular arc slot evenly distributed around the circular hole, the circular arc slot is arranged concentrically with the circular hole, the nozzle device is rotatably installed in the circular hole, and the nozzle device and the horizontal support rod are connected by a fixing piece passing through the circular arc slot.

Images