A micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment and processing method

Abstract

The present invention discloses a micro-nano bubble assisted multi-energy field coupled complex curved surface chemical mechanical polishing equipment, including a bed, a spindle system, a drum system and a numerical control system; the spindle system includes a fixture for clamping a workpiece to be polished and a spindle for adjusting the spatial position of the fixture, and polishing liquid is added to the drum of the drum system; it also includes a micro-nano bubble system and an ultrasonic system; the micro-nano bubble system is used to introduce micro-nano bubbles into the drum; the ultrasonic system is used to make the drum of the drum system perform ultrasonic vibration; the numerical control system connects and controls the spindle system, the drum system, the micro-nano bubble system and the ultrasonic system. The present invention sets a micro-nano bubble system and an ultrasonic system, uses micro-nano bubbles to increase the action area of ​​abrasive particles in the polishing liquid and the workpiece to be polished, and uses the micro-nano bubble system and the ultrasonic system to improve the mechanical efficiency and chemical efficiency of abrasive particles in the polishing liquid, promotes the synergistic effect of mechanical removal and chemical corrosion during the polishing process, and realizes improved polishing efficiency.

Description

Technical Field

[0001] The present invention relates to the technical field of mechanical processing equipment, and in particular to a micro-nano bubble assisted multi-energy field coupled complex curved surface chemical mechanical polishing equipment. Background Art

[0002] Chemical mechanical polishing is widely used in flat surface polishing, but it is difficult to achieve chemical mechanical polishing for parts with complex curved surfaces. The main reason is that it is difficult to apply uniform mechanical force on the complex curved surface and it is difficult to remove the softened film on the surface of the complex curved workpiece by uniform mechanical force.

[0003] The Chinese patent with the authorization announcement number CN114055330B discloses a multi-degree-of-freedom eddy current complex curved surface chemical mechanical polishing equipment, including a bed and a spindle system, a drum system, a spray system and a numerical control system installed in the bed. The spindle system includes a spindle and a fixture connected thereto. The spindle is used to adjust the spatial posture of the fixture so that the workpiece to be polished enters the preset position in the drum of the drum system. The spray system is used to spray the polishing liquid on the workpiece to be polished, and the polishing liquid can enter the drum. The drum system also includes a mechanical device for controlling the movement state of the drum. The numerical control system is used to adjust the movement state of the drum so that the polishing liquid in the drum has kinetic energy, and the polishing of the workpiece is completed by combining the movement state of the spindle and the action of the spray system. However, since the spray system required by the equipment acts on a small area of ​​the curved workpiece surface, the equipment has the problem of low polishing efficiency. Summary of the invention

[0004] The present invention provides a micro-nano bubble assisted multi-energy field coupled complex curved surface chemical mechanical polishing equipment to solve the technical problem of low polishing efficiency in existing equipment.

[0005] In order to achieve the above object, the technical solution of the present invention is:

[0006] A micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment comprises: a bed, a spindle system installed in the bed, a drum system and a numerical control system; the spindle system comprises a movable spindle and a fixture connected thereto, the fixture is used to clamp a workpiece to be polished, the spindle is used to adjust the spatial posture of the fixture, so that the workpiece to be polished enters a preset position in a drum of the drum system, and polishing liquid is added to the drum of the drum system; it also comprises: a micro-nano bubble system and an ultrasonic system installed in the bed; the micro-nano bubble system is used to introduce micro-nano bubbles into the drum of the drum system; the ultrasonic system is used to make the drum of the drum system perform ultrasonic vibration; the numerical control system connects and controls the spindle system, the drum system, the micro-nano bubble system and the ultrasonic system.

[0007] Furthermore, the micro-nano bubble system includes: a micro-nano bubble generating device, a pressure gauge, a flow sensor, a first pipeline and a first control valve; the two ends of the first pipeline are respectively connected to the micro-nano bubble generating device and the drum of the drum system, the first control valve is arranged on the first pipeline, and the pressure gauge and the flow sensor are installed on the micro-nano bubble generating device; the numerical control system is connected to the micro-nano bubble generating device, the pressure gauge, the flow sensor and the first control valve, and the numerical control system controls the micro-nano bubble generating device and the first control valve.

[0008] Furthermore, the ultrasonic system is arranged below the drum of the drum system; the ultrasonic system comprises: an ultrasonic generator, an amplitude rod and a transducer, the ultrasonic generator is electrically connected to the transducer, the transducer is connected to the amplitude rod, and the amplitude rod is connected to the drum of the drum system.

[0009] Furthermore, the ultrasonic system also includes: an ultrasonic vibration plate, an ultrasonic vibration motor and multiple vibration nets; the ultrasonic vibration plate is abutted against the bottom of the drum of the drum system, the amplitude transformer passes through the ultrasonic vibration plate and is connected to the bottom of the drum of the drum system, the ultrasonic vibration plate is provided with multiple openings arranged around the amplitude transformer, the number of the multiple openings corresponds to the number of the multiple vibration nets, and the vibration nets are installed in the openings; the ultrasonic vibration motor is installed on the ultrasonic vibration plate.

[0010] Furthermore, it also includes a light source system installed in the bed, the light source system generates light to illuminate the drum of the drum system for photocatalysis, and the numerical control system is connected to and controls the light source system.

[0011] Furthermore, the light source system generates light with a wavelength of 200 nm to 1000 nm.

[0012] Furthermore, it also includes a temperature control system installed in the bed, the temperature control system is used to control the temperature of the polishing liquid in the drum of the drum system, and the numerical control system is connected to and controls the temperature control system.

[0013] Furthermore, the temperature control system includes: a heater, a refrigerator, a circulating water storage tank, a second pipeline, a second control valve, a second water pump, a third pipeline, a third control valve, a third water pump, a fourth pipeline and a temperature sensor; the second pipeline and the third pipeline are respectively connected to the circulating water storage tank, the second pipeline and the third pipeline merge and connect to one end of the fourth pipeline, and the other end of the fourth pipeline is connected to the circulating water storage tank; the heater, the second control valve and the second water pump are installed on the second pipeline, and the refrigerator, the third control valve and the third water pump are installed on the third pipeline; the fourth pipeline is wrapped around the outside of the drum of the drum system, and the temperature sensor is installed in the drum of the drum system; the numerical control system connects and controls the heater, the second control valve, the second water pump, the refrigerator, the third control valve and the third water pump, and the numerical control system is connected to the temperature sensor.

[0014] Furthermore, a first one-way valve is provided on the second pipeline, and a second one-way valve is provided on the third pipeline.

[0015] A processing method of chemical mechanical polishing equipment for complex curved surfaces using micro-nano bubbles assisted by multi-energy field coupling comprises the following steps:

[0016] S1. Fix the workpiece to be polished on the fixture, add appropriate polishing liquid into the drum, start the CNC system, and the CNC system controls the spatial position of the spindle so that the spindle drives the fixture down into the drum until the workpiece is completely immersed in the polishing liquid;

[0017] S2, the numerical control system controls the micro-nano bubble generating device of the micro-nano bubble system to start, and the numerical control system controls the micro-nano bubble flow rate and passes the micro-nano bubbles into the polishing liquid in the drum;

[0018] S3, the numerical control system controls the transducer and the ultrasonic vibration motor of the ultrasonic system to start, and the numerical control system controls the ultrasonic frequency and amplitude of the transducer and the ultrasonic vibration motor;

[0019] S4, the numerical control system controls the light source system to start, and the light source system generates a light source with a wavelength of 200 nm to 1000 nm to illuminate the liquid surface of the polishing liquid in the drum, and the numerical control system controls the light source system to adjust the intensity and irradiation range of the light source;

[0020] S5, the CNC system controls the spindle rotation and adjusts the spindle speed according to the actual polishing requirements. At the same time, the CNC system controls the temperature control system to open. The CNC system controls the temperature control system to monitor and adjust the temperature of the polishing liquid in the drum during the polishing process to maintain the optimal polishing temperature;

[0021] S6. After polishing is completed, the CNC system shuts down the spindle system, the micro-nano bubble system, the temperature control system, the light source system and the ultrasonic system, and takes out the polished workpiece.

[0022] Beneficial effects:

[0023] First, the present application discloses a micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment, which increases the interaction area between the abrasive particles in the polishing liquid and the workpiece to be polished by setting up a micro-nano bubble system and an ultrasonic system, and improves the mechanical and chemical efficiency of the abrasive particles in the polishing liquid by using the micro-nano bubble system and the ultrasonic system, thereby promoting the synergistic effect of mechanical removal and chemical corrosion in the polishing process and improving the polishing efficiency.

[0024] Second, the present application discloses a processing method using micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment to realize the polishing processing of complex curved surface workpieces by the collaboration of the CNC system controlling the spindle system, the barrel system, the micro-nano bubble system, the ultrasonic system, the light source system and the temperature control system. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0026] Figure 1 A schematic structural diagram of a micro-nano bubble-assisted multi-energy field coupled complex curved surface chemical mechanical polishing equipment disclosed in Example 1 of the present invention;

[0027] Figure 2 A half-section view of an assembly of a barrel system, a horn and an ultrasonic vibration plate of an ultrasonic system of a micro-nano bubble-assisted multi-energy field coupled complex curved surface chemical mechanical polishing equipment disclosed in the present invention;

[0028] Figure 3 A schematic diagram of the structure of an ultrasonic vibration plate and a vibration net of a micro-nano bubble-assisted multi-energy field coupled complex curved surface chemical mechanical polishing equipment disclosed in the present invention;

[0029] Figure 4 This is a schematic diagram of the principle of a temperature control system for micro-nano bubble-assisted multi-energy field coupled complex surface chemical mechanical polishing equipment disclosed in the present invention.

[0030] 1. Bed; 11. First mounting plate; 12. Second mounting plate;

[0031] 2. Spindle system; 21. Spindle; 22. Fixture;

[0032] 3. Drum system;

[0033] 4. CNC system; 41. Rotatable connecting rod;

[0034] 5. Micro-nano bubble system; 51. Micro-nano bubble generating device; 52. First pipeline; 53. Sealing device;

[0035] 61. horn; 62. ultrasonic vibration plate; 63. vibration net;

[0036] 7. Light source system;

[0037] 8. Temperature control system; 81. Heater; 82. Refrigerator; 83. Circulating water storage tank; 84. Second pipeline; 85. Second control valve; 86. Second water pump; 87. Third pipeline; 88. Third control valve; 89. Third water pump; 80. Fourth pipeline;

[0038] 91. A first one-way valve; 92. A second one-way valve. DETAILED DESCRIPTION

[0039] In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the technical solution in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0040] Example 1

[0041] A micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment, combined with Figure 1 , Figure 2 , Figure 3 and Figure 4As shown, it includes: a bed 1, a spindle system 2 installed in the bed 1, a drum system 3 and a numerical control system 4; the spindle system 2 includes a movable spindle 21 and a fixture 22 connected thereto, the fixture 22 is used to clamp the workpiece to be polished, and the spindle 21 is used to adjust the spatial posture of the fixture 22, so that the workpiece to be polished enters the preset position in the drum of the drum system 3, and the polishing liquid is added to the drum of the drum system 3; it also includes: a micro-nano bubble system 5 and an ultrasonic system installed in the bed 1; the micro-nano bubble system 5 is used to pass micro-nano bubbles into the drum of the drum system 3; the ultrasonic system is used to make the drum of the drum system 3 perform ultrasonic vibration; the numerical control system 4 connects and controls the spindle system 2, the drum system 3, the micro-nano bubble system 5 and the ultrasonic system. After entering the drum, the micro-nano bubbles interact with the abrasive particles, and the micro-nano bubbles transfer part of the kinetic energy to the abrasive particles and drive the abrasive particles to produce irregular motion, thereby enhancing the movement speed of the abrasive particles and improving the uniformity of the abrasive particle dispersion, thereby improving its action ability. The ultrasonic system makes the drum vibrate ultrasonically to prevent the abrasive particles from gathering at the bottom of the barrel, and the ultrasonic wave transfers energy to the abrasive particles, increasing the movement speed of the abrasive particles. The combined action of the micro-nano bubble system 5 and the ultrasonic system improves the mechanical efficiency of the abrasive particles. In addition, the surface of the micro-nano bubbles is negatively charged, and the absolute value of the high zeta potential increases the repulsive electrostatic force, improves the stability of the micro-nano bubbles, and has long-term stability in the polishing liquid for several months without external stimulation. The number of micro-nano bubbles is positively correlated with the oxidation capacity, which means that the injected micro-nano bubbles can fully react chemically when they stay in the polishing liquid for a long time, greatly improving the oxidation capacity of the polishing liquid. And because the micro-nano bubbles are relatively stable, the ultrasonic vibration of the ultrasonic system controls the collapse of the micro-nano bubbles, thereby producing a strong cavitation effect. When the micro-nano bubbles collapse, local high temperature and high pressure are released, and the released energy is converted into fluid shock waves, which increases the speed of the abrasive particles, stimulates cavitation shock, enhances the degree of turbulence, improves the ability of the abrasive particles to act on the processing surface, and further improves the mechanical efficiency of the abrasive particles; and when the micro-nano bubbles collapse, the local high temperature and high pressure released induces the formation of free radicals such as active oxygen, hydrogen ions and hydroxide ions in the polishing liquid, enhances the oxidation ability of the polishing liquid, and thus improves the chemical efficiency of the polishing liquid. In summary, the combined action of the micro-nano bubble system 5 and the ultrasonic system and the control of the collapse of the micro-nano bubbles by the ultrasonic system promote the synergistic effect of mechanical removal and chemical corrosion in the polishing process, and realizes high-efficiency, low-damage and low-cost polishing of curved surface parts with different structures and materials.

[0042] Specifically, the fixture 22 is installed on the spindle 21 through a quick connector. The fixture 22 can be quickly replaced according to the types of workpieces to be polished. The fixture 22 is treated with rust and corrosion prevention.

[0043] Preferably, the micro-nano bubble system 5 includes: a micro-nano bubble generating device 51, a pressure gauge, a flow sensor, a first pipeline 52 and a first control valve; the two ends of the first pipeline 52 are respectively connected to the micro-nano bubble generating device 51 and the drum of the drum system 3, the first control valve is arranged on the first pipeline 52, and the pressure gauge and the flow sensor are installed on the micro-nano bubble generating device 51; the numerical control system 4 is connected to the pressure gauge, the flow sensor and the first control valve of the micro-nano bubble generating device 51, and the numerical control system 4 controls the micro-nano bubble generating device 51 and the first control valve. The micro-nano bubble generating device 51 passes micro-nano bubbles into the polishing liquid in the drum through the first pipeline 52, monitors the micro-nano bubble pressure through the pressure gauge, detects the micro-nano bubble flow through the flow sensor, and controls the opening and closing of the first pipeline 52 through the first control valve. The micro-nano bubble system 5 accurately controls the micro-nano bubble flow to achieve the effect and efficiency of adjusting the polishing.

[0044] Specifically, the bottom of the drum is connected to a sealing device 53 , the flow sensor is installed in the sealing device 53 , and the first pipeline 52 leads into the sealing device 53 .

[0045] Specifically, the micro-nano bubble generating device 51 includes: a water circuit module, an air circuit module, a gas-liquid mixing module, a bubble release system and an electronic control system. The water circuit module is responsible for introducing the water source into the device, and the water source enters the gas-liquid mixing module after being pressurized by the first water pump. The gas circuit module provides gas, generally using air or oxygen, ozone, nitrogen, carbon dioxide, etc. The gas-liquid mixing system mixes gas and liquid through a nozzle or a diffuser to form micro-nano bubbles. In this embodiment, the pressurized water source makes the aeration stone inside the aeration head rotate at a high speed. Under the centrifugal action, a negative pressure zone is formed, and the air enters the negative pressure zone through the air inlet, and is divided into a peripheral liquid zone and a central gas zone inside the container. The air is evenly cut into micro-nano bubbles by the high-speed rotating aeration stone outlet. The bubble release system uses a maze structure to release the mixed micro-nano bubbles from the device. The electronic control system is responsible for controlling the operation of the equipment, including the power switch, the control of the air circuit and the liquid circuit, and the regulation of the bubble release pressure.

[0046] Specifically, a first mounting plate 11 is installed on the inner wall of the bed 1, and the first mounting plate 11 is detachably mounted on the bed 1 by a bolt assembly. The first mounting plate 11 is located above the side of the drum to avoid interference with the spindle 21 and the drum. The micro-nano bubble generating device 51 is detachably mounted on the first mounting plate 11 by a bolt assembly, which facilitates the maintenance and replacement of the micro-nano bubble generating device 51.

[0047] Preferably, the ultrasonic system is arranged below the drum of the drum system 3; the ultrasonic system comprises: an ultrasonic generator, an horn 61 and a transducer, the ultrasonic generator is electrically connected to the transducer through a cable, the transducer converts the voltage signal transmitted by the ultrasonic generator into a mechanical vibration signal, the transducer is connected to the horn 61, the horn 61 is connected to the drum of the drum system 3, the horn 61 amplifies the vibration amplitude generated by the transducer, thereby driving the drum to ultrasonically vibrate. The numerical control system 4 controls the ultrasonic frequency and amplitude by controlling the on and off of the transducer and the output signal of the ultrasonic generator, and finally achieves the adjustment of ultrasonic vibration and the control of the collapse of micro-nano bubbles in the polishing liquid. Ultrasonic vibration produces a cavitation effect by causing the collapse of micro-nano bubbles in the polishing liquid. The rapid rupture of micro-nano bubbles will produce local high temperature and high pressure conditions. These extreme pressures and temperatures are conducive to the formation of H2O2 and hydroxyl radicals (•OH) in the polishing liquid, thereby enhancing the oxidation capacity of the polishing liquid.

[0048] Preferably, the ultrasonic system further comprises: an ultrasonic vibration plate 62, an ultrasonic vibration motor and a plurality of vibration nets 63; the ultrasonic vibration plate 62 abuts against the bottom of the drum of the drum system 3, the horn 61 passes through the ultrasonic vibration plate 62 and is connected to the bottom of the drum of the drum system 3, the ultrasonic vibration plate 62 is provided with a plurality of openings arranged around the horn 61, the number of the plurality of openings corresponds to the number of the plurality of vibration nets 63, and the vibration nets 63 are installed in the openings; the ultrasonic vibration motor is installed on the ultrasonic vibration plate 62. The ultrasonic vibration motor drives the ultrasonic vibration plate 62 and the vibration net 63 to vibrate synchronously, and the numerical control system 4 controls the magnitude and direction of the vibration force generated by the ultrasonic vibration motor by adjusting the voltage, current, frequency and other parameters of the ultrasonic vibration motor, thereby increasing the vibration amplitude and frequency of the vibration net 63, further improving the dispersion of the abrasive particles, and enhancing the uniformity of the surface of the polished workpiece. At the same time, the vibration net 63 and the horn 61 can be controlled to resonate, further improving the dispersion of the abrasive particles.

[0049] Specifically, the spindle system 2 also includes an ultrasonic generator and a transducer, and the transducer provides ultrasonic vibration in the axial direction for the spindle 21. The ultrasonic generator and transducer of the spindle system 2 and the ultrasonic generator and transducer of the ultrasonic system are controlled by the numerical control system 4 to set the frequency and time of ultrasonic vibration for the workpiece and the drum, respectively, so that the two cooperate to achieve polishing of the workpiece. The bottom wall thickness of the drum is 8mm, which is conducive to improving the ultrasonic effect of the ultrasonic system on the polishing liquid in the drum. The side wall thickness of the drum is greater than the bottom wall thickness, which can improve the rigidity of the drum.

[0050] Preferably, the polishing equipment also includes a light source system 7 installed in the bed 1, the light source system 7 generates a light source to irradiate the drum of the drum system 3 for photocatalysis, thereby increasing the chemical reaction rate during polishing, and the numerical control system 4 connects and controls the light source system 7. Under the irradiation of the light source, the photocatalyst in the polishing liquid plays a catalytic role, and the electrons and holes excited by the light can produce hydroxide ions. And under the irradiation of the light source, the micro-nano bubbles will produce exogenous active oxygen free radicals, further enhancing the oxidation effect of the polishing liquid. The oxidizing ability of the micro-nano bubbles, the free radicals generated when the micro-nano bubbles collapse, the active oxygen free radicals generated by the light source irradiating the micro-nano bubbles, and the hydroxide ions generated by photocatalysis work together to improve the chemical efficiency in polishing.

[0051] Specifically, a second mounting plate 12 is installed on the inner wall of the bed 1, and the second mounting plate 12 is detachably mounted on the bed 1 by a bolt assembly. The second mounting plate 12 is located above the side of the drum, and the second mounting plate 12 and the first mounting plate 11 are located on both sides of the spindle 21 to avoid interference with the spindle 21 and the drum. The light source system 7 is detachably mounted on the second mounting plate 12 by a bolt assembly, which is convenient for the maintenance and replacement of the light source system 7. The numerical control system 4 controls the light source system 7 to adjust the wavelength, intensity and irradiation range of the light source to optimize the catalyst effect in the polishing liquid.

[0052] Preferably, the wavelength of the light source generated by the light source system 7 is 200 nm to 1000 nm, so that the photocatalyst in the polishing liquid is catalyzed by light, and the water on the surface of the workpiece generates hydroxyl radicals, thereby increasing the oxidation effect of the polishing liquid.

[0053] Preferably, the polishing equipment also includes a temperature control system 8 installed in the bed 1, and the temperature control system 8 is used to control the temperature of the polishing liquid in the drum of the drum system 3. The numerical control system 4 is connected to and controls the temperature control system 8. Due to the influence of ultrasonic vibration, friction between abrasive particles and workpieces, collapse of micro-nano bubbles, and photocatalysis during the polishing process, the temperature of the polishing liquid will rise. The temperature of the polishing liquid in the drum is monitored and controlled by the temperature control system 8, so that the temperature of the polishing liquid is always kept in the optimal state. By adopting the coupling of micro-nano bubble-polishing liquid-abrasive three-phase flow and ultrasound-photocatalysis-temperature composite energy field, the mechanical and chemical efficiencies in the polishing process are improved, the polishing effect is enhanced, and the material removal rate is improved, so as to meet the requirements of efficient, high-quality, low-damage, and universal chemical mechanical polishing of complex curved surface workpieces.

[0054] Preferably, the temperature control system 8 includes: a heater 81, a refrigerator 82, a circulating water storage tank 83, a second pipeline 84, a second control valve 85, a second water pump 86, a third pipeline 87, a third control valve 88, a third water pump 89, a fourth pipeline 80 and a temperature sensor; the second pipeline 84 and the third pipeline 87 are respectively connected to the circulating water storage tank 83, the second pipeline 84 and the third pipeline 87 merge and connect to one end of the fourth pipeline 80, and the other end of the fourth pipeline 80 is connected to the circulating water storage tank 83; the heater 81, the second control valve 85 The second water pump 86 is installed on the second pipeline 84, the refrigerator 82, the third control valve 88 and the third water pump 89 are installed on the third pipeline 87; the fourth pipeline 80 is wound outside the drum of the drum system 3, and the temperature sensor is installed inside the drum of the drum system 3; the numerical control system 4 is connected to and controls the heater 81, the second control valve 85, the second water pump 86, the refrigerator 82, the third control valve 88 and the third water pump 89, and the numerical control system 4 is connected to the temperature sensor, which monitors the temperature of the polishing liquid and transmits the data back to the numerical control system 4. When the temperature of the polishing liquid rises, the numerical control system 4 controls the second water pump 86 to pump the medium in the circulating water storage tank 83 into the second pipeline 84; the numerical control system 4 controls the second control valve 85 to open, and the medium enters the refrigerator 82 for cooling, and the cooled medium enters the fourth pipeline 80 through the second pipeline 84; the medium cools the drum along the fourth pipeline 80 and then flows back to the circulating water storage tank 83. When the ambient temperature is low, the numerical control system 4 controls the third water pump 89 to pump the medium in the circulating water storage tank 83 into the third pipeline 87; the numerical control system 4 controls the third control valve 88 to open, and the medium enters the heater 81 for heating, and the heated medium enters the fourth pipeline 80 through the third pipeline 87; the medium heats the drum along the fourth pipeline 80 and then flows back to the circulating water storage tank 83.

[0055] In addition, by controlling the temperature control system 8 to set different temperatures through the numerical control system 4 and comparing the polishing results of the workpiece at different temperatures, the optimal polishing temperature under the current working conditions can be recorded, which can be used for process tests before batch polishing production.

[0056] Preferably, a first one-way valve 91 is further provided on the second pipeline 84 , and a second one-way valve 92 is further provided on the third pipeline 87 to prevent the medium from flowing back in the second pipeline 84 and the third pipeline 87 .

[0057] Specifically, the numerical control system 4 is used to receive information from various systems in the equipment and make feedback. The numerical control system 4 is connected to the outside of the bed 1 through a rotatable connecting rod 41, and the rotatable connecting rod 41 facilitates the rotation of the numerical control system 4 and is convenient for the operator to operate.

[0058] Specifically, the bed 1 is also equipped with a protective door, which is closed during operation; the surfaces of the bed 1 and the internal mechanism that can be splashed by the polishing liquid in the drum are coated with hydrophobic, oleophobic, and anti-corrosion coatings or have masks.

[0059] Example 2

[0060] This embodiment provides a processing method of using micro-nano bubble assisted multi-energy field coupled complex curved surface chemical mechanical polishing equipment, comprising the following steps:

[0061] S1. Open the protective door and fix the workpiece to be polished on the fixture. According to the actual processing requirements of the workpiece, add appropriate polishing liquid into the drum; start the CNC system, which controls the spatial position of the spindle so that the spindle drives the fixture down into the drum until the workpiece is completely immersed in the polishing liquid.

[0062] S2. The CNC system controls the micro-nano bubble generating device of the micro-nano bubble system to start. The CNC system controls the micro-nano bubble flow rate and passes the micro-nano bubbles into the polishing liquid in the drum to ensure that the micro-nano bubbles and the polishing liquid are fully mixed; the micro-nano bubble flow rate is controlled to keep the pressure on the pressure gauge fluctuating within the specified range, so that the micro-nano bubble flow rate maintains a dynamic balance.

[0063] S3. The numerical control system controls the transducer and ultrasonic vibration motor of the ultrasonic system to start. The numerical control system controls the ultrasonic frequency and amplitude of the transducer and ultrasonic vibration motor to stimulate the activity of the abrasive particles in the polishing liquid after micro-nano bubble assistance and further improve the dispersion of the abrasive particles.

[0064] S4. The CNC system controls the light source system to start. The light source system generates a light source with a wavelength of 200 nm to 1000 nm to illuminate the liquid surface of the polishing liquid in the drum. The CNC system controls the light source system to adjust the intensity and irradiation range of the light source; the irradiation range of the light source is kept to cover the liquid surface of the polishing liquid. The photocatalyst in the polishing liquid is catalyzed by light, and the moisture on the surface of the workpiece generates hydroxyl radicals to increase the oxidation effect of the polishing liquid.

[0065] S5. Close the protective door, the CNC system controls the spindle rotation and adjusts the spindle speed according to the actual polishing requirements, and starts polishing; at the same time, the CNC system controls the temperature control system to open, and the CNC system controls the temperature control system to monitor and adjust the temperature of the polishing liquid in the drum during the polishing process to ensure that the polishing liquid and the workpiece are not affected by the processing environment and maintain the optimal polishing temperature.

[0066] S6. After polishing is completed, the CNC system shuts down the spindle system, micro-nano bubble system, temperature control system, light source system and ultrasonic system, and opens the protective door to take out the polished workpiece.

[0067] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein by equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment, comprising: A bed (1), a spindle system (2) installed in the bed (1), a drum system (3) and a numerical control system (4); the spindle system (2) comprises a movable spindle (21) and a fixture (22) connected thereto, the fixture (22) being used to clamp a workpiece to be polished, the spindle (21) being used to adjust the spatial posture of the fixture (22) so that the workpiece to be polished enters a preset position in a drum of the drum system (3), and polishing liquid is added to the drum of the drum system (3); the invention is characterized in that it also comprises: a micro-nano bubble system (5) and an ultrasonic system installed in the bed (1); The micro-nano bubble system (5) is used to introduce micro-nano bubbles into the drum of the drum system (3); The ultrasonic system is used to make the drum of the drum system (3) perform ultrasonic vibration, and the ultrasonic vibration of the ultrasonic system controls the collapse of micro-nano bubbles to release local high temperature and high pressure, and the released energy is converted into fluid shock waves to increase the speed of abrasive particles, and induce the generation of active oxygen, hydrogen ions and hydroxide ion free radicals in the polishing liquid to enhance the oxidation ability of the polishing liquid; The numerical control system (4) is connected to and controls the spindle system (2), the drum system (3), the micro-nano bubble system (5) and the ultrasonic system; The micro-nano bubble system (5) comprises: a micro-nano bubble generating device (51), a pressure gauge, a flow sensor, a first pipeline (52) and a first control valve; two ends of the first pipeline (52) are respectively connected to the micro-nano bubble generating device (51) and the drum of the drum system (3); the first control valve is arranged on the first pipeline (52); the pressure gauge and the flow sensor are installed on the micro-nano bubble generating device (51); the numerical control system (4) is connected to the micro-nano bubble generating device (51), the pressure gauge, the flow sensor and the first control valve; the numerical control system (4) controls the micro-nano bubble generating device (51) and the first control valve; It also includes a light source system (7) installed in the bed (1), the light source generated by the light source system (7) can illuminate the inside of the drum of the drum system (3) to perform photocatalysis, and the numerical control system (4) is connected to and controls the light source system (7).

2. The micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment according to claim 1, characterized in that: The ultrasonic system is arranged below the drum of the drum system (3); the ultrasonic system comprises: an ultrasonic generator, a horn (61) and a transducer, the ultrasonic generator is electrically connected to the transducer, the transducer is connected to the horn (61), and the horn (61) is connected to the drum of the drum system (3).

3. The micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment according to claim 2, characterized in that: The ultrasonic system further comprises: an ultrasonic vibration plate (62), an ultrasonic vibration motor and a plurality of vibration nets (63); the ultrasonic vibration plate (62) is in contact with the bottom of the drum of the drum system (3); the amplitude change rod (61) passes through the ultrasonic vibration plate (62) and is connected to the bottom of the drum of the drum system (3); the ultrasonic vibration plate (62) is provided with a plurality of openings arranged around the amplitude change rod (61); the number of the plurality of openings corresponds to the number of the plurality of vibration nets (63); the vibration nets (63) are installed in the openings; and the ultrasonic vibration motor is installed on the ultrasonic vibration plate (62).

4. The micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment according to claim 1, characterized in that: The light source system (7) generates light with a wavelength of 200 nm to 1000 nm.

5. The micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment according to claim 1, characterized in that: It also includes a temperature control system (8) installed in the bed (1), the temperature control system (8) is used to control the temperature of the polishing liquid in the drum of the drum system (3), and the numerical control system (4) is connected to and controls the temperature control system (8).

6. The micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment according to claim 5, characterized in that: The temperature control system (8) comprises: a heater (81), a refrigerator (82), a circulating water storage tank (83), a second pipeline (84), a second control valve (85), a second water pump (86), a third pipeline (87), a third control valve (88), a third water pump (89), a fourth pipeline (80) and a temperature sensor; The second pipeline (84) and the third pipeline (87) are respectively connected to the circulating water storage tank (83); the second pipeline (84) and the third pipeline (87) merge and are connected to one end of the fourth pipeline (80); the other end of the fourth pipeline (80) is connected to the circulating water storage tank (83); the heater (81), the second control valve (85) and the second water pump (86) are installed on the second pipeline (84); the refrigerator (82), the third control valve (88) and the third water pump (89) are installed on the third pipeline (87); The fourth pipeline (80) is wound around the outside of the drum of the drum system (3), and the temperature sensor is installed inside the drum of the drum system (3); The numerical control system (4) is connected to and controls the heater (81), the second control valve (85), the second water pump (86), the refrigerator (82), the third control valve (88) and the third water pump (89), and the numerical control system (4) is connected to the temperature sensor.

7. The micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment according to claim 6, characterized in that: The second pipeline (84) is also provided with a first one-way valve (91), and the third pipeline (87) is also provided with a second one-way valve (92).

8. A processing method using the micro-nano bubble assisted multi-energy field coupled complex surface chemical mechanical polishing equipment according to any one of claims 1 to 7, characterized in that: The following steps are involved: S1. Fix the workpiece to be polished on the fixture, add appropriate polishing liquid into the drum, start the CNC system, and the CNC system controls the spatial position of the spindle so that the spindle drives the fixture down into the drum until the workpiece is completely immersed in the polishing liquid; S2, the numerical control system controls the micro-nano bubble generating device of the micro-nano bubble system to start, and the numerical control system controls the micro-nano bubble flow rate and passes the micro-nano bubbles into the polishing liquid in the drum; S3, the numerical control system controls the transducer and the ultrasonic vibration motor of the ultrasonic system to start, and the numerical control system controls the ultrasonic frequency and amplitude of the transducer and the ultrasonic vibration motor; S4, the numerical control system controls the light source system to start, and the light source system generates a light source with a wavelength of 200nm to 1000nm to illuminate the liquid surface of the polishing liquid in the drum, and the numerical control system controls the light source system to adjust the intensity and irradiation range of the light source; S5, the CNC system controls the spindle rotation and adjusts the spindle speed according to the actual polishing requirements. At the same time, the CNC system controls the temperature control system to open. The CNC system controls the temperature control system to monitor and adjust the temperature of the polishing liquid in the drum during the polishing process to maintain the optimal polishing temperature; S6. After polishing is completed, the CNC system shuts down the spindle system, the micro-nano bubble system, the temperature control system, the light source system and the ultrasonic system, and takes out the polished workpiece.

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