Cleaning composition, preparation method thereof and cleaning method of etching residues

By using cleaning compositions containing alkaline compounds, fluorides, metal corrosion inhibitors and organic solvents in the preparation process of silicon-based OLEDs, the problem of difficult residue removal after dry etching is solved, and efficient cleaning and low corrosion are achieved , improves the luminous performance of silicon-based OLEDs.

CN119081798APending Publication Date: 2024-12-06SHANGHAI SHENGJIAN MICROELECTRONICS CO LTD
0 Cites 2 Cited by

Patent Information

Application Number
CN202411199906.0
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-08-29
Publication Date
2024-12-06

AI Technical Summary

Technical Problem

During the preparation of silicon-based OLEDs, the photoresist is difficult to clean after dry etching, and the residue is difficult to remove, which affects the luminescence efficiency. The by-products after dry etching form polymers with the photoresist, which increases the difficulty of cleaning.

Method used

It provides a cleaning composition containing alkaline compounds, fluorides, metal corrosion inhibitors, cleaning additives and organic solvents. By combining in a suitable proportion, the etch residue after dry etching can be effectively removed, and the aluminum is The etching rate of materials such as silver, titanium, silicon dioxide is small, and the operation window is large.

Benefits of technology

The substrate cleaning effect after dry etching is achieved, the residue is completely removed, and corrosion of silicon-based OLEDs is avoided, and the luminescence efficiency of silicon-based OLEDs is improved, making it suitable for large-scale production.

✦ Generated by Eureka AI based on patent content.
Patent Text Reader

Abstract

The invention discloses a cleaning composition, a preparation method thereof and a cleaning method of etching residues. The cleaning composition comprises the following components in percentage by mass: 1%-25% of an alkaline compound, 0.1%-15% of fluoride, 0.1%-25% of a metal corrosion inhibitor, 0.01%-25% of a cleaning aid and 10%-70% of an organic solvent. According to the cleaning composition disclosed by the invention, the alkaline compound, the fluoride, the metal corrosion inhibitor, the cleaning auxiliary agent and the organic solvent with proper contents are matched with one another, so that etching residues can be effectively removed; meanwhile, obvious corrosion to contacted metal and non-metal materials is avoided, the etching rate to aluminum, silver, titanium, silicon dioxide and the like is low, and an operation window is large; the cleaning composition disclosed by the invention can be used for cleaning etching residues, such as cleaning a silicon-based OLED (Organic Light Emitting Diode) after dry etching, and has an excellent cleaning effect.
Need to check novelty before this filing date? Find Prior Art