In-liquid attitude conversion device and substrate processing apparatus including same

Abstract

The invention provides an in-liquid attitude conversion device for converting the attitude of a plurality of substrates. The apparatus comprises: an immersion tank for storing a treatment liquid; an inversion chuck that holds a plurality of substrates; an opening / closing drive mechanism that drives the inversion chuck to a release position for transferring the plurality of substrates between the inversion chuck and the opening / closing drive mechanism, and a holding position for holding the plurality of substrates by the inversion chuck; a rotation driving mechanism for driving the inversion chuck around a horizontal axis in order to convert the posture of the plurality of substrates; and a lifting drive mechanism which lifts the reverse chuck to a transfer position above the dipping tank and a switching position in the dipping tank. In a state in which the inversion chuck is raised to the transfer position, the inversion chuck in the release position receives a plurality of substrates, and after the inversion chuck is in the holding position, the inversion chuck is driven around a horizontal axis in a state in which the inversion chuck is lowered to the conversion position.

Description

Technical Field

[0001] The present invention relates to an in-liquid posture conversion device for converting the posture of substrates such as semiconductor substrates, substrates for FPD (Flat Panel Display) such as liquid crystal display or organic EL (Electroluminescence) display devices, glass substrates for photomasks, and substrates for optical disks, and a substrate processing device equipped with the in-liquid posture conversion device. Background Art

[0002] In the past, such devices include batch modules, monolithic modules, and posture conversion modules. For example, refer to Japanese Gazette No. 2016-502275. The batch module processes multiple substrates at once. The monolithic module processes each substrate. Generally, compared with the drying process performed by the batch module, the drying process performed by the monolithic module has a smaller space for the processing atmosphere affected by the substrate and a higher particle performance. Therefore, it is easier to improve the drying performance of the monolithic module than the batch module. Therefore, for example, sometimes after the etching process and the rinsing process are performed by the batch module, the drying process is performed by the monolithic module.

[0003] In the batch module, a plurality of substrates are processed in a vertical posture. On the other hand, in the single-chip module, the substrates are processed in a horizontal posture. Therefore, the vertical posture substrates processed in the batch module are converted to a horizontal posture by the posture conversion module before being transported to the single-chip module.

[0004] However, in recent years, in the semiconductor field, the pattern of the three-dimensional structure has been increasingly refined. Therefore, in such a substrate, the pattern may collapse due to the influence of the gas-liquid interface when the substrate is dried. Therefore, after processing in the batch module, before processing in the single-chip module, the substrate is processed to be wet and not dry.

[0005] Specifically, a plurality of purge pipes are arranged beside the posture conversion module. The purge pipes purge pure water toward the substrate held in the posture conversion module, thereby making the substrate held in the posture conversion module wet until it is placed on the single-chip module.

[0006] In such a structured device, there is a time when the entire substrate is not fully wetted due to the positional relationship between the substrate posture brought by the posture conversion module and the purge pipe. In addition, even if pure water is purged from the vicinity of the rotating mechanism, the entire substrate cannot be fully wetted due to the presence of the rotating mechanism components.

[0007] Therefore, a device for converting an in-liquid posture is proposed, which includes: an immersion tank storing pure water; an in-tank carrier that can be raised and lowered inside and above the immersion tank to store a plurality of substrates; and a rotation mechanism that rotates the in-tank carrier. In the proposed device, a plurality of substrates in a vertical posture are stored in the in-tank carrier, and the plurality of substrates are immersed in the immersion tank for each in-tank carrier. In this state, the in-tank carrier is rotated longitudinally by the rotation mechanism, thereby converting the posture of the substrate from a vertical posture to a horizontal posture in pure water.

[0008] However, in the case of the conventional example having such a structure, there are the following problems.

[0009] That is, the conventional device rotates each tank carrier longitudinally, so there is a problem that the size of the immersion tank becomes larger, especially in the vertical direction. In addition, since multiple substrates are converted to a horizontal posture for each tank carrier, there is also a problem that the load of the rotation mechanism becomes larger. Summary of the invention

[0010] The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a posture conversion device and a substrate processing device including the posture conversion device, which can be miniaturized and can reduce the load on a rotation mechanism.

[0011] In order to achieve such an object, the present invention adopts the following structure.

[0012] That is, the present invention is an in-liquid posture conversion device for converting the postures of multiple substrates, the device includes the following elements, namely, it is equipped with: an immersion tank, which stores a processing liquid; an inversion chuck, which holds multiple substrates; an opening and closing driving mechanism, which drives the inversion chuck to a release position and a holding position, the release position is used to transfer the multiple substrates between the inversion chuck and the inversion chuck, and the holding position is used to hold the multiple substrates by the inversion chuck; a rotation driving mechanism, which drives the inversion chuck around a horizontal axis in order to convert the postures of the multiple substrates; and a lifting driving mechanism, which lifts the inversion chuck to the upper side of the immersion tank, that is, the transfer position and the conversion position in the immersion tank, in a state where the inversion chuck is raised to the transfer position by the lifting driving mechanism, the opening and closing driving mechanism is used to make the inversion chuck in the release position receive the multiple substrates, and after being in the holding position by the opening and closing driving mechanism, the inversion chuck is driven around the horizontal axis by the rotation driving mechanism in a state where the inversion chuck is lowered to the conversion position by the lifting driving mechanism.

[0013] According to the present invention, the reversal chuck is raised to the handover position by the lifting drive mechanism. The reversal chuck in the release position is made to receive a plurality of substrates by the opening and closing drive mechanism, and the reversal chuck is made to be in the holding position by the opening and closing drive mechanism. The reversal chuck is lowered to the switching position by the lifting drive mechanism. The reversal chuck is driven around the horizontal axis by the rotating drive mechanism. Thus, the postures of the plurality of substrates can be switched in the immersion tank. Since the plurality of substrates are held by the reversal chuck instead of the carrier in the tank, the miniaturization of the immersion tank can be achieved. In addition, since only the plurality of substrates and the reversal chuck are rotated around the horizontal axis, the load on the rotating mechanism can be reduced.

[0014] In addition, in the present invention, it is preferred that the rotation drive mechanism comprises: a rotating shaft, one end of which is connected to the outer side of the inversion chuck; a motor; and a transmission mechanism, which transmits the rotational force of the motor to the rotating shaft, and also comprises a storage container with a bottom, which stores the rotating shaft and the transmission mechanism, and the transmission mechanism is lifted and lowered together with the storage container through the lifting drive mechanism.

[0015] The transfer mechanism is stored in a bottomed storage container and is raised and lowered by a lifting drive mechanism. Therefore, the inverting chuck located in the processing liquid in the immersion tank can be rotated around a horizontal axis. In addition, since the transfer mechanism is stored in the storage container, even if particles are generated in the transfer mechanism, it is possible to prevent the particles from mixing into the processing liquid in the immersion tank and contaminating the substrate.

[0016] In the present invention, preferably, the transmission mechanism includes: a driven pulley provided on the other end side of the rotating shaft; a driving pulley attached to the motor; and a timing belt stretched between the driven pulley and the driving pulley.

[0017] The rotational force of the motor is transmitted to the reversing chuck by a synchronous belt mounted on the driving pulley and the driven pulley. Therefore, the transmission mechanism can be made lighter. As a result, the load of the lifting drive mechanism can be reduced.

[0018] In the present invention, preferably, the transmission mechanism includes: a first bevel gear provided at the other end side of the rotating shaft; an extension shaft connected to the motor; and a second bevel gear provided at the lower end of the extension shaft and screwed with the first bevel gear.

[0019] The rotational force of the extension shaft connected to the motor is transmitted to the reversing chuck through the first bevel gear and the second bevel gear. In the synchronous belt, transmission loss may occur due to expansion and contraction. However, since the rotational force is transmitted through the gears, the transmission loss of the rotational force can be reduced.

[0020] In the present invention, preferably, the lifting drive mechanism includes a lifting frame that carries the rotation drive mechanism and extends to the outside of the dipping tank and the storage container, and the opening and closing drive mechanism is carried on the lifting frame.

[0021] If the lifting drive mechanism raises and lowers the lifting frame, the opening and closing drive mechanism and the rotation drive mechanism can also be raised and lowered at the same time. Therefore, the structure can be simplified.

[0022] Furthermore, in the present invention, it is preferred that the interior of the container is pressurized by gas.

[0023] Since the storage container is pressurized, the processing liquid in the immersion tank can be prevented from entering the storage container, thereby preventing a malfunction caused by the processing liquid entering the storage container.

[0024] In addition, the present invention is a substrate processing device for processing substrates, the device includes the following elements, namely, it is equipped with: a batch processing unit, which processes multiple substrates at a time in a vertical posture; a single-chip processing unit, which processes a substrate in a horizontal posture; a liquid posture conversion unit, which converts the multiple substrates that have been processed in the batch processing unit into a horizontal posture in a processing liquid from a vertical posture; a first conveying unit, which conveys the multiple substrates that have been processed in the batch processing unit to the liquid posture conversion unit; and a second conveying unit, which conveys the multiple substrates that have become horizontal postures through the liquid posture conversion unit to the single-chip processing unit, the liquid posture conversion unit comprising: an immersion tank, which stores the processing liquid; a reversing chuck, which holds the multiple substrates; an opening and closing drive mechanism, which drives the reversing chuck to a release position and a holding position, the release position being used to move the reversing chuck in a horizontal position relative to the processing liquid. The multiple substrates are transferred between the inversion chucks, and the holding position is used to hold the multiple substrates by the inversion chuck; a rotation drive mechanism, which drives the inversion chuck around a horizontal axis in order to convert the postures of the multiple substrates into a vertical posture and a horizontal posture; and a lifting drive mechanism, which lifts the inversion chuck to the top of the immersion tank, that is, the transfer position and the conversion position in the immersion tank, and when the inversion chuck is raised to the transfer position by the lifting drive mechanism, the opening and closing drive mechanism is used to make the inversion chuck in the release position receive the multiple substrates, and after the opening and closing drive mechanism is in the holding position, when the inversion chuck is lowered to the conversion position by the lifting drive mechanism, the rotation drive mechanism is used to drive the inversion chuck around the horizontal axis to convert the multiple substrates from a vertical posture to a horizontal posture.

[0025] According to the present invention, the inverted chuck is raised to the handover position by the lifting drive mechanism of the in-liquid posture conversion unit. The inverted chuck in the release position is made to receive a plurality of substrates by the opening and closing drive mechanism, and the inverted chuck is made to be in the holding position by the opening and closing drive mechanism. The inverted chuck is lowered to the conversion position by the lifting drive mechanism. The inverted chuck is driven around the horizontal axis by the rotating drive mechanism. Thus, the plurality of substrates processed by the batch processing unit can be transported to the in-liquid posture conversion unit by the first conveying unit, and converted from the vertical posture to the horizontal posture in the immersion tank. After that, the substrate can be transported to the single-wafer processing unit by the second conveying unit. Since the in-liquid posture conversion unit holds the plurality of substrates by the inverted chuck instead of the carrier in the tank, the immersion tank can be miniaturized. In addition, since only the plurality of substrates and the inverted chuck are rotated around the horizontal axis, the load on the rotating mechanism can be reduced.

[0026] In addition, this specification also discloses the invention of the following in-liquid posture conversion device.

[0027] In batch processing, multiple substrates are immersed in a processing liquid in a vertical position in a dipping tank with the processing liquid stored therein for processing. At this time, the processing liquid is supplied upward from the bottom of the dipping tank in an upward flow manner, and the processing liquid is discharged over the upper edge of the dipping tank. By maintaining this state for a predetermined time, multiple substrates are processed at once.

[0028] However, the progress of processing at the bottom and top of the plurality of substrates set in a vertical posture is sometimes different. That is, there is a problem that it is difficult to process uniformly within the surface of the substrate. In other words, it is difficult to improve the uniformity within the surface.

[0029] Another object of the present invention is to provide an in-liquid posture conversion device which is completed in view of such a situation and can improve the in-plane uniformity by turning the substrate upside down during processing.

[0030] (1) An apparatus for converting the posture of a plurality of substrates in a liquid, the apparatus comprising the following elements, namely:

[0031] a dipping tank storing the treatment solution;

[0032] an inverting chuck that holds a plurality of substrates;

[0033] an opening and closing driving mechanism, which drives the reversing chuck to a releasing position and a holding position, wherein the releasing position is used to transfer the plurality of substrates between the reversing chuck and the reversing chuck, and the holding position is used to hold the plurality of substrates by the reversing chuck;

[0034] a rotation drive mechanism for driving the inversion chuck around a horizontal axis in order to change the postures of the plurality of substrates; and

[0035] A lifting drive mechanism is used to lift the inverted chuck to a handover position above the immersion tank and a switching position in the immersion tank.

[0036] When the inversion chuck is raised to the handover position by the lifting and lowering driving mechanism, the inversion chuck at the release position is caused to receive the multiple substrates by the opening and closing driving mechanism, and after being in the holding position by the opening and closing driving mechanism, the multiple substrates are processed by the processing liquid when the inversion chuck is lowered to the switching position by the lifting and lowering driving mechanism, and the inversion chuck is driven around the horizontal axis by the rotating driving mechanism to reverse the multiple substrates upside down.

[0037] According to the present invention, a plurality of substrates are processed by a processing liquid in an immersion tank, and a reversing chuck is driven around a horizontal axis by a rotation drive mechanism to reverse the plurality of substrates upside down. Therefore, the upper and lower parts of the substrates can be replaced. Therefore, even if the progress of the processing at the upper and lower parts of the substrates is different, the progress of the processing can be averaged by replacement. As a result, the in-plane uniformity can be improved.

[0038] (2) In (1), preferably, the upside-down inversion is performed after the treatment with the treatment liquid is performed for a predetermined time, and the treatment is further performed for the same time as the treatment with the treatment liquid previously performed in the upside-down state.

[0039] The treatment with the treatment liquid is performed after the upside-down inversion for the same time as the treatment with the treatment liquid before the upside-down inversion. Therefore, the upper and lower parts of the substrate can be treated uniformly. As a result, the in-plane uniformity of the treatment can be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] For the purpose of illustrating the invention, there are shown in the drawings several forms which are presently preferred, it being understood, however, that the invention is not limited to the precise arrangements and instrumentalities shown.

[0041] Figure 1 It is a plan view showing the overall structure of the substrate processing apparatus according to the embodiment.

[0042] Figure 2 yes Figure 1 AA section view in.

[0043] Figure 3 It is a top view showing the structure of the 25-piece chuck and the reverse chuck.

[0044] Figure 4 This is the front view of the reverse chuck in the released position.

[0045] Figure 5 This is a front view of the inverted chuck in the holding position.

[0046] Figure 6 It is a front view showing the structure of the posture conversion groove and showing a state where the substrate is held in a vertical posture.

[0047] Figure 7 It is a front view showing the structure of the posture conversion groove and showing a state where the substrate is held in a horizontal posture.

[0048] Figure 8 It is a partially cutaway front view showing the detailed structure of the posture conversion groove.

[0049] Fig. 9 This is another embodiment of the posture conversion groove, and is a partially cutaway front view showing the detailed structure.

[0050] Fig.10 This is a front view for explaining another working example of the posture conversion groove.

[0051] Fig.11 This is a front view for explaining another working example of the posture conversion groove. DETAILED DESCRIPTION

[0052] Hereinafter, preferred embodiments of the present invention will be described in detail based on the accompanying drawings.

[0053] Figure 1 It is a plan view showing the overall structure of the substrate processing apparatus according to the embodiment. Figure 2 yes Figure 1 AA section view in.

[0054] <1. Overall structure>

[0055] The substrate processing device 1 processes the substrate W. For example, the substrate processing device 1 performs liquid treatment, cleaning treatment, drying treatment, etc. on the substrate W. The substrate processing device 1 adopts a processing method that has both a batch method and a single-wafer method (a so-called hybrid method). The batch method processes a plurality of substrates W at once in a vertical posture. The single-wafer method processes a single substrate W in a horizontal posture.

[0056] The substrate processing apparatus 1 includes a batch processing apparatus 3 and a single wafer processing apparatus 5. In this embodiment, the single wafer processing apparatus 5 is disposed adjacent to the batch processing apparatus 3. The batch processing apparatus 3 and the single wafer processing apparatus 5 are disposed separately. The batch processing apparatus 3 and the single wafer processing apparatus 5 are connected by a bridge 7.

[0057] <2. Batch processing device>

[0058] The batch processing apparatus 3 processes a plurality of substrates W at a time. The batch processing apparatus 3 includes a loading block 9 , a stocker block 11 , a transfer block 13 , a posture conversion block 15 , and a processing block 17 .

[0059] In this specification, for convenience, the direction in which the loading block 9, the accumulator block 11, the transfer block 13 and the processing block 17 are arranged is referred to as the "front-to-back direction X". The front-to-back direction X is horizontal. The direction from the accumulator block 11 toward the loading block 9 in the front-to-back direction X is referred to as the "front". The direction opposite to the front is referred to as the "rear". The horizontal direction orthogonal to the front-to-back direction X is referred to as the "width direction Y". One direction of the "width direction Y" is appropriately referred to as the "right". The direction opposite to the right is referred to as the "left". The direction perpendicular to the horizontal direction is referred to as the "vertical direction Z". In each figure, the front, back, right, left, top and bottom are appropriately shown for reference.

[0060] <3. Move in block>

[0061] The loading block 9 includes an input section 19. The input section 19 is disposed at the front X of the batch processing device 3. The carrier C stores a plurality of (for example, 25) substrates W in a stacked manner in a horizontal posture at a constant interval along the vertical direction Z. The carrier C separates the surfaces of the substrates W from each other, and forms a plurality of grooves (not shown) for storing the substrates W one by one. As the carrier C, there is, for example, a FOUP (FrontOpening Unify Pod). The FOUP is a closed container. The carrier C may also be an open container, regardless of the type. For example, the input section 19 includes two loading tables 21 for loading the carriers C. For example, the two loading tables 21 are arranged along the width direction Y. The input section 19 is also called a loading port.

[0062] <4. Stocker block>

[0063] The stocker block 11 is disposed adjacent to the rear X of the carrying-in block 9 . The stocker block 11 includes a conveyance storage section ACB. The conveyance storage section ACB includes a conveyance mechanism 23 and a shelf 25 .

[0064] The conveying mechanism 23 conveys the carrier C. The conveying and storing section ACB has a plurality of shelves 25. The shelves 25 include shelves for temporarily placing the carrier C only and shelves for placing the carrier C for transfer with the first conveying mechanism HTR. The conveying and storing section ACB takes in the carrier C containing the unprocessed substrate W from the input section 19 and places it on the shelf 25. The conveying and storing section ACB conveys the carrier C and places it on the shelf 25 for transfer according to a schedule that specifies the processing sequence. The conveying and storing section ACB conveys the empty carrier C placed on the shelf 25 for transfer and places it on the shelf 25. The conveying and storing section ACB moves the empty carrier C placed on the shelf 25 to the stage 21 according to the idle status of the stage 21. The empty carrier C is conveyed to the single-wafer processing section 5. In the empty carrier C transported to the single wafer processing section 5 , for example, a substrate W that was stored in the carrier C before processing and has been processed is stored in the single wafer processing section 5 .

[0065] <5. Transfer block>

[0066] The transfer block 13 is disposed adjacent to the rear X of the stocker block 11. The transfer block 13 includes a transfer mechanism CTC. The transfer mechanism CTC includes a first transport mechanism HTR, a conversion mechanism HVC, a push rod PH, and a second transport mechanism WTR.

[0067] The first conveying mechanism HTR is arranged at the right Y in the rear X of the conveying and storage section ACB. The first conveying mechanism HTR conveys a plurality of substrates W at a time. In other words, the first conveying mechanism HTR has a plurality of hands (not shown in the figure). One hand supports one substrate W. The first conveying mechanism HTR can also convey only one substrate W. The first conveying mechanism HTR takes out a plurality of substrates W (for example, 25 substrates) at a time from the carrier C of the delivery shelf 25 placed in the conveying and storage section ACB, and conveys them to the conversion mechanism HVC in a horizontal posture. At this time, the conversion mechanism HVC converts the posture of the substrate W from a horizontal posture to a vertical posture.

[0068] The conversion mechanism HVC and the push rod PH are sequentially arranged on the left side Y of the first conveying mechanism HTR. The conversion mechanism HVC delivers a plurality of substrates W to the push rod PH. After receiving the plurality of substrates W from the conversion mechanism HVC, the push rod PH moves toward the second conveying mechanism WTR in the width direction Y. At this time, the conversion mechanism HVC and the push rod PH assemble or release the batches. The push rod PH delivers a plurality of substrates W to the second conveying mechanism WTR.

[0069] For example, the transfer mechanism CTC combines a plurality of substrates W constituting a batch taken out from a certain carrier C and a plurality of substrates W constituting another batch taken out from another carrier C into a batch. This is the assembly of the batch. The batch is composed of twice the number of substrates W of a batch. The batch arranges the substrates W of another batch in a manner adjacent to the substrates W of a batch. That is, the substrates W of one batch are arranged at the odd number, and the substrates W of another batch are arranged at the even number. Usually, the interval between the plurality of substrates W taken out from the carrier C is the same as the interval between the carrier C. It is called the full pitch. In a batch, for example, the interval between the plurality of substrates W is half of the full pitch. It is called the half pitch. The batch combines one batch with another batch as described above, but there are two types of surface alignment (also called Face to Face) and surface back alignment (also called Back to Face) according to the combination method. The combination method of the batch is determined by the action of the push rod PH. In addition, the details of the action are omitted for easy understanding of the present invention. In the following description, a plurality of substrates W are referred to as a batch. However, when a description specific to a batch is required, a plurality of substrates W are referred to as a batch lot.

[0070] The second conveying mechanism WTR is arranged on the left side Y of the transfer mechanism CTC. The second conveying mechanism WTR is configured to be able to move throughout the transfer block 13 and the processing block 17. The second conveying mechanism WTR is configured to be able to move in the front-to-back direction X. The second conveying mechanism WTR includes a pair of hands 27 for conveying the batch. For example, the pair of hands 27 includes a rotation axis facing the width direction Y. The pair of hands 27 swings around the rotation axis. The pair of hands 27 clamps the side end surfaces of the plurality of substrates W constituting the batch in the front-to-back direction X. The second conveying mechanism WTR delivers the plurality of substrates W constituting the batch to the transfer mechanism CTC. The second conveying mechanism WTR delivers the plurality of unprocessed substrates W constituting the batch to the processing block 17. The second conveying mechanism WTR delivers the plurality of substrates W processed by the processing block 17 to the posture conversion block 15.

[0071] Here, the processing block 17 will be described before the posture conversion block 15 .

[0072] <6. Processing Block>

[0073] For example, the processing block 17 includes a batch processing unit BPU. For example, the batch processing unit BPU includes 6 processing units. Specifically, the batch processing unit BPU includes a first batch processing unit BPU1, a second batch processing unit BPU2, a third batch processing unit BPU3, a fourth batch processing unit BPU4, a fifth batch processing unit BPU5, and a sixth batch processing unit BPU6. In addition, the number of batch processing units BPU is not limited to 6. That is, the batch processing unit BPU may be less than 6 or may be 7 or more.

[0074] The first batch processing unit BPU1 to the sixth batch processing unit BPU6 are arranged in a row in the front-to-back direction X. The first batch processing unit BPU1 to the sixth batch processing unit BPU6 are respectively equipped with a processing tank BB and a lift LF. The processing tank BB stores a processing liquid. The processing liquid is pure water or a chemical liquid. For example, the chemical liquid is an organic solvent or an etching liquid. For example, the organic solvent is IPA (isopropyl alcohol). For example, the etching liquid is a phosphoric acid solution.

[0075] The lift LF is raised and lowered between the processing position inside the processing tank BB and the handover position above the liquid level of the processing tank BB. The lift LF hands over multiple substrates W between the handover position and the second conveying mechanism WTR. The first batch processing unit BPU1 to the sixth batch processing unit BPU6, for example, correspond to each pair. Specifically, the first batch processing unit BPU1 and the second batch processing unit BPU2 form a pair, the third batch processing unit BPU3 and the fourth batch processing unit BPU4 form a pair, and the fifth batch processing unit BPU5 and the sixth batch processing unit BPU6 form a pair. For example, a pair shares the role in the liquid treatment and the cleaning treatment. The first batch processing unit BPU1 to the sixth batch processing unit BPU6, for example, can process up to 50 substrates W at a time. In other words, the first batch processing unit BPU1 to the sixth batch processing unit BPU6, for example, can process up to one batch at a time.

[0076] Each processing tank BB is supplied with processing liquid from below. The processing liquid of each processing tank BB is discharged over the upper edge. Each processing tank BB immerses a plurality of substrates W placed on the lift LF in the processing liquid. Each lift LF contacts and holds the lower edge of the substrate W. Each lift LF delivers a plurality of substrates W to the second transport mechanism WTR.

[0077] <7. Posture conversion block>

[0078] like Figure 2 As shown, the posture conversion block 15 includes 25 chucks TFC, a standby tank 31, and a posture conversion tank 33. In the drawings referred to in the standby tank 31 and the posture conversion tank 33, the liquid surface is not shown and omitted for easy viewing of each structure.

[0079] The standby tank 31 includes a processing tank BB0 and an elevator LF0. The processing tank BB0 has the same structure as the processing tank BB included in the first batch processing unit BPU1 to the sixth batch processing unit BPU6. The elevator LF0 moves up and down between the interior of the processing tank BB0, i.e., the standby position and the junction position above the liquid level of the processing tank BB0. The standby tank BB0 stores a processing liquid. For example, the processing liquid is pure water. At the standby position, the substrate W placed on the elevator LF0 is completely immersed in the processing liquid.

[0080] Here, refer to Figure 3 . Figure 3 It is a top view showing the structure of the 25-piece chuck and the reverse chuck.

[0081] The 25 chucks TFC as a whole only moves horizontally in the width direction Y. The 25 chucks TFC do not rise or fall in the vertical direction Z. The 25 chucks TFC do not move horizontally in the front-to-back direction X. However, the 25 chucks TFC opens and closes the hand 35 between the holding position PC and the passing position PT. At the holding position PC, the 25 chucks TFC hold a plurality of substrates W. At the passing position PT, the 25 chucks TFC do not hold a plurality of substrates W. In other words, at the passing position PT, the elevator LF0 holding a plurality of substrates W is allowed to move between the handover position and the standby position. For example, the 25 chucks TFC moves in the width direction Y at three locations: the first handover position P1, the second handover position P2, and the third handover position P3.

[0082] The 25 chucks TFC are provided with a locking portion 37. The locking portion 37 is provided on the inner side of the hand 35. The locking portion 37 is formed in the width direction Y at intervals of the full pitch described above. The positions of the first handover position P1 and the second handover position P2 in the width direction Y differ by a distance equivalent to half the pitch. The third handover position P3 is a position for handing over a plurality of substrates W to the posture conversion groove 33. The 25 chucks TFC receive only one batch from the elevator LF0 at the first handover position P1. Specifically, only a plurality of odd-numbered substrates W constituting the initial batch of the two batches constituting the batch are received. The 25 chucks TFC receive only another batch from the elevator LF0 at the second handover position P2. Specifically, only a plurality of even-numbered substrates W constituting the next batch of the two batches constituting the batch are received.

[0083] Among them, except Figure 2 as well as Figure 3 In addition, refer to Figures 4 to 7 . Figure 4 This is a front view of the state where the inverted chuck is in the first gap. Figure 5 This is a front view of the state where the inverted chuck is in the second interval. Figure 6 It is a cross-sectional view when the inverted chuck is in a state of the first interval. Figure 7It is a cross-sectional view when the inverted chuck is in the second interval state.

[0084] like Figure 2 As shown, the posture conversion tank 33 includes a dipping tank DB and a posture conversion portion 41 .

[0085] First, the main part is described. The posture conversion tank 33 converts the postures of multiple substrates W at a time in the immersion tank DB by the inverting chuck 43. Specifically, the inverting chuck 43 converts the multiple substrates W from a vertical posture to a horizontal posture. For example, the inverting chuck 43 converts the postures of half of the substrates W constituting a batch. For example, the inverting chuck 43 converts the postures of 25 substrates W. The inverting chuck 43 is arranged opposite to each other in the radial direction of the substrate W, clamping the peripheral edge of the substrate W. The immersion tank DB stores the processing liquid. For example, the processing liquid is pure water.

[0086] like Figure 4 as well as Figure 5 As shown in FIG. 1 , the inverting chuck 43 includes a pair of chuck members 45. The length of the chuck members 45 in the vertical direction Z when receiving or holding the substrate W in the vertical posture is shorter than the radius of the substrate W. Figure 3 as well as Figure 7 As shown, the length of the chuck member 45 in the width direction Y when receiving or holding the substrate W in the vertical posture is slightly longer than the length in the arrangement direction of the plurality of substrates W in the batch.

[0087] like Figure 4 as well as Figure 5 As shown, each chuck member 45 has a groove 47 on the facing surface. When viewed from the width direction Y in the vertical posture of receiving or holding the substrate W in the vertical posture, the groove 47 has an arc shape. The arc shape of the groove 47 is a shape along the outer edge of the substrate W.

[0088] The pair of chuck members 45 moves in the front-to-back direction X over the first interval WD1 and the second interval WD2. The pair of chuck members 45 can change the distance between the opposing grooves 47. The first interval WD1 is an interval for transferring substrates between the 25 chucks TFC and the bridge 7. The second interval WD2 is an interval that is narrower in the front-to-back direction X than the first interval WD1 and is used to clamp a plurality of substrates W.

[0089] Among them, further reference Figure 8 . Figure 8 It is a partially cutaway front view showing the detailed structure of the posture conversion groove.

[0090] The immersion tank DB is provided with a pair of supply pipes 50. Each supply pipe 50 is arranged at the bottom of the immersion tank DB. Each supply pipe 50 is arranged at a corner of the immersion tank DB in the front-rear direction X. Each supply pipe 50 extends in the width direction Y. Each supply pipe 50 sprays and supplies the processing liquid toward the upper center portion of the immersion tank DB in the front-rear direction X, that is, obliquely upward. In other words, each spray pipe 50 sprays the processing liquid toward the vicinity of the center portion of the substrate W while the substrate W is immersed in the immersion tank DB.

[0091] In addition, each supply pipe 50 may also spray and supply the processing liquid toward the center of the bottom surface of the immersion tank DB. As a result, once the processing liquid hits the bottom surface of the immersion tank DB, it rises toward the center of the substrate W. Therefore, the strong flow of the processing liquid does not directly hit the substrate W. As a result, the uneven processing caused by the flow of the processing liquid can be suppressed, and the in-plane uniformity can be further improved.

[0092] The posture conversion tank 33 includes a lifting mechanism 61 , a driving mechanism 63 , and a rotating mechanism 65 .

[0093] The lifting mechanism 61 lifts and lowers the inversion chuck 43. The driving mechanism 63 opens and closes the inversion chuck 43. The rotating mechanism 65 rotates the inversion chuck 43.

[0094] The lifting mechanism 61 is arranged outside the dipping tank DB. The lifting mechanism 61 is arranged along the outer side surfaces of two side walls provided in the front-rear direction X among the four side walls of the dipping tank DB in a plan view. Figure 6 As shown, the lifting mechanism 61 raises and lowers the inverted chuck 43 to the receiving height HP1, the clamping height HP2, the locking height HP3, and the immersion height HP4. The receiving height HP1 is a height for receiving the substrate W in a vertical posture on the inverted chuck 43. The clamping height HP2 is a height for clamping the substrate W in a vertical posture by the inverted chuck 43. The locking height HP3 is a height for locking the substrate W in a vertical posture clamped by the inverted chuck 43. The immersion height HP4 is a height for immersing the substrate W in a vertical posture locked by the inverted chuck 43 in the processing liquid in the immersion tank DB.

[0095] The lifting mechanism 61 includes a base member 61 a , a threaded shaft 61 b ​​, a motor 61 c , a lifting member 61 d , and a lifting frame 61 e .

[0096] The base member 61a is fixed to the bottom of the posture conversion tank 33. The threaded shaft 61b is vertically arranged from the base member 61a along the vertical direction Z. The threaded shaft 61b extends along the vertical direction Z. The threaded shaft 61b is arranged along the outer side surface of the immersion tank DB. A motor 61c is installed on the upper part of the threaded shaft 61b. The rotating shaft of the motor 61c faces downward. The rotating shaft of the motor 61c is connected to the threaded shaft 61b. The lifting member 61d is screwed with the threaded shaft 61b. The lifting member 61d is lifted and lowered in the vertical direction Z by the rotation of the threaded shaft 61b. The lifting frame 61e is connected to the lifting member 61d. The lower part of the lifting frame 61e is connected to the lifting member 61d. The lifting frame 61e is in the shape of an inverted L.

[0097] The driving mechanism 63 is mounted on the upper part of the lifting mechanism 61. The driving mechanism 63 includes an upper base member 63a, a cylinder 63b, a moving piece 63c, a cantilever arm 63d and a linear guide 63e. The upper base member 63a is arranged on the upper part of the motor 61c and the lifting frame 61e. The cylinder 63b is mounted on the upper base member 63a. The working axis of the cylinder 63b is oriented in the front-to-back direction X. The cantilever arm 63d is in an inverted L shape. The horizontal portion of the cantilever arm 63d is mounted on the upper part of the lifting frame 61e via the linear guide 63e. The cantilever arm 63d is mounted in a manner that allows it to move horizontally in the front-to-back direction X through the linear guide 63e. The cantilever arm 63d can move in the horizontal direction relative to the lifting frame 61e. The driving mechanism 63 moves the cantilever arm 63d in the front-to-back direction X by operating the cylinder 63b. The driving mechanism 63 moves the chuck member 45 over the first distance WD1 and the second distance WD2 by operating the air cylinder 63 b.

[0098] For example, the working axis of the cylinder 63b is contracted when the cylinder 63b is not in operation. For example, the working axis of the cylinder 63b is extended when the cylinder 63b is in operation. That is, when the cylinder 63b is not in operation, the chuck 43 is set to the first distance WD1. When the cylinder 63b is in operation, the chuck 43 is set to the second distance WD2.

[0099] The rotating mechanism 65 includes a rotating shaft 65 a , a motor 65 b , and a transmission mechanism 67 .

[0100] One end of the rotating shaft 65a is connected to the outer side of the chuck member 45. The motor 65b is installed on the upper part of the moving piece 63c. The motor 65b is arranged horizontally. The other end of the rotating shaft 65a is stored in the storage container 69. The rotating shaft 65a is installed in the storage container 69 via the sealing member 65c. The sealing member 65c supports the rotating shaft 65a in a liquid-tight state. The rotating shaft 65a is installed on the cantilever arm 63d via the bearing 65d. The bearing 65d supports the rotating shaft 65a so that it can rotate around the axis AX1. The other end of the rotating shaft 65a protrudes from the outer side of the cantilever arm 63d to the front-back direction X.

[0101] The sealing member 65c is preferably a mechanical seal or a VL seal. A mechanical seal is a seal that forms a liquid film on the sliding surface while being lubricated by a liquid to be sealed. A VL seal is a seal that is sealed by fastening an L-shaped seal ring with an O-ring.

[0102] The storage container 69 has a bottom. The storage container 69 does not have a top surface. In other words, the upper surface of the storage container 69 is connected to the surroundings. When the inverted chuck 43 is located at the immersion height HP4, the upper edge of the storage container 69 is located above the upper edge of the immersion tank DB. In other words, the storage container 69 is not immersed in the processing liquid in the immersion tank DB. The storage container 69 is driven to be lifted and lowered in the vertical direction Z by the lifting mechanism 61 together with the suspension arm 63d.

[0103] The transmission mechanism 67 transmits the rotational force of the motor 65b to the rotating shaft 65a.

[0104] Specifically, the transmission mechanism 67 includes a driven pulley 67a, a driving pulley 67b and a timing belt 67c. The driven pulley 67a is fixed to the other end of the rotating shaft 65a. The driving pulley 67b is mounted on the motor 65a. The driving pulley 67b is driven to rotate by the motor 65a. The timing belt 67c is mounted on the driven pulley 67a and the driving pulley 67b. If the motor 65b rotates, the rotating shaft 65a is driven to rotate around the axis AX1 via the driving pulley 67b, the timing belt 67c and the driven pulley 67d. As a result, the reversing chuck 43 is driven to rotate around the axis AX1.

[0105] The driving mechanism 63 and the rotating mechanism 65 are mounted on the lifting mechanism 61. Therefore, the driving mechanism 63 and the rotating mechanism 65 are lifted and lowered in the vertical direction Z by the lifting mechanism 61. The rotating mechanism 65 is mounted on the driving mechanism 63. Therefore, the rotating mechanism 65 is moved in the front-rear direction X by the driving mechanism 63.

[0106] The transmission mechanism 67 transmits the rotational force of the motor 65b to the reversing chuck 43 via a timing belt 67c stretched between the driving pulley 67b and the driven pulley 67a. Therefore, the transmission mechanism 67 can be made lighter. As a result, the load on the lifting mechanism 61 can be reduced.

[0107] The storage container 69 is driven to be raised and lowered together with the suspension arm 63d by the lifting mechanism 61 in the vertical direction Z. Therefore, even if particles are generated in the rotating mechanism 65 and the transmission mechanism 67, the particles will not enter the processing liquid in the immersion tank DB. As a result, the substrate W can be prevented from being contaminated when the posture is changed.

[0108] Here, return Figure 1 as well as Figure 2 .

[0109] <8. Bridge>

[0110] The bridge portion 7 connects the batch processing device 3 and the single-wafer processing device 5. The bridge portion 7 is connected only to the batch processing device 3 and the single-wafer processing device 5. The bridge portion 7 includes a bridge robot BR. The bridge robot BR is configured to be movable only in the width direction Y. The bridge robot BR does not rise or fall in the vertical direction Z. The bridge robot BR includes a hand 71. The hand 71 is configured to be rotatable within a horizontal plane including the front-rear direction X and the width direction Y. The hand 71 is configured to be retractable in the horizontal direction. The bridge robot BR moves the hand 71 forward and backward to receive a substrate in a horizontal posture from the posture conversion block 15. The bridge robot BR delivers the substrate in a horizontal posture to the single-wafer processing device 5.

[0111] <9. Single-chip processing device>

[0112] The single wafer processing apparatus 5 includes a carry-out block 81 , a loading block 83 , and a processing block 85 .

[0113] <10. Move out the block>

[0114] The unloading block 81 includes an unloading portion 87. The unloading portion 87 is disposed in front of the single-wafer processing device 5 X. The unloading portion 87 places the carrier C. For example, the unloading block 81 includes four unloading portions 87. The four unloading portions 87 are disposed along the width direction Y. The unloading portion 87 is also called a loading port.

[0115] <11. Loading Block>

[0116] The loading block 83 includes a loading robot IR. For example, the loading robot IR includes a multi-joint arm 89 and a hand 91. The loading robot IR does not move in the width direction Y and the front-rear direction X. The loading robot IR bends the multi-joint arm 89 to move the hand 91. The loading robot IR raises and lowers the hand 91 in the vertical direction Z. The loading robot IR can enter each box C placed in the four unloading sections 87. The loading robot IR transports a substrate W through the hand 91. The loading robot IR transports a substrate W from the processing block 85 to the unloading section 87.

[0117] <12. Processing Block>

[0118] The processing block 85 includes four towers TW1 to TW4 and a central robot CR.

[0119] The tower TW1 is arranged in front of the loading block 83 X. The tower TW1 is arranged adjacent to the loading block 83. The tower TW1 includes processing chambers MPC stacked in the vertical direction Z. For example, the tower TW1 includes three processing chambers MPC. The processing chambers MPC process substrates W one by one. For example, the processing chambers PMC perform a drying process on the substrates W.

[0120] The tower TW2 is arranged at the rear X of the tower TW1. The tower TW2 is arranged adjacent to the tower TW1. The tower TW2 has the same structure as the tower TW1. That is, the tower TW2 includes three processing chambers MPC stacked in the vertical direction Z.

[0121] The tower TW3 is arranged on the left side Y of the tower TW2. The tower TW3 is arranged on the left side Y of the tower TW2 with the central robot CR interposed therebetween. The tower TW3 has the same structure as the towers TW1 and TW2. That is, the tower TW3 has three processing chambers MPC stacked in the vertical direction Z.

[0122] The structure of a part of the tower TW4 is different from that of the towers TW1 to TW4. That is, the tower TW4 has processing chambers MPC at the bottom and the top in the vertical direction Z. The tower TW4 has a delivery portion 93 in the center in the vertical direction Z. The delivery portion 93 carries a substrate W. The delivery portion 93 has lifting pins 93a. The lifting pins 93a are raised and lowered when receiving the substrate W from the bridge robot BR. The delivery portion 93 carries a substrate W from the bridge robot BR. The delivery portion 93 receives the carried substrate W through the central robot CR.

[0123] The central robot CR is configured to be movable in the front-rear direction X. The central robot CR includes a hand 95. The hand 95 is raised and lowered in the vertical direction Z. The hand 95 is configured to be able to rotate within a plane including the front-rear direction X and the width direction Y. The hand 95 moves so as to enter the processing chambers MPC of the towers TW1 to TW4 and the delivery portion 93. That is, the central robot CR can freely move the hand 95 in the vertical direction Z, the front-rear direction X, and the width direction Y. The central robot CR delivers the processed substrate W to the loading robot 83.

[0124] <13. Action Description>

[0125] Reference Figure 1 as well as Figure 2 , an example of processing performed by the substrate processing apparatus 1 is described.

[0126] First, the overall rough processing flow is described.

[0127] <14. Batch Processing>

[0128] A carrier C storing a plurality of unprocessed substrates W is placed in the input section 19. The carrier C is input into the stocker block 11 by the conveying mechanism 23. Two groups of a plurality of substrates W are assembled as a batch by the first conveying mechanism HTR and the transfer mechanism CTC. The plurality of substrates W constituting the batch are conveyed to the processing block 17 by the second conveying mechanism WTR. In the processing block 17, for example, an etching process using phosphoric acid is performed by the second batch processing unit BPU2. Thereafter, a pure water cleaning process is performed on the plurality of substrates W constituting the batch by the first batch processing unit BPU1. Next, the plurality of substrates W constituting the batch are conveyed to the posture conversion block 15 by the second conveying mechanism WTR. In the posture conversion block 15, only one batch of the batch is conveyed to the posture conversion tank 33. In the posture conversion tank 33, only one batch of the batch is in the liquid, and the plurality of substrates W in a vertical posture are converted into a horizontal posture. Thereafter, the plurality of substrates W constituting one batch of the batch are conveyed one by one to the single-wafer processing device 5 in sequence. After that, another batch in the batch is similarly converted in posture and then transported to the single-wafer processing device 5 .

[0129] <15. Single sheet processing>

[0130] A substrate W converted to a horizontal posture is transported to the single-wafer processing device 5 by the bridge robot BR. Specifically, a substrate W is placed on the delivery portion 93. A substrate W placed on the delivery portion 93 is received by the central robot CR. The central robot CR carries a substrate W into a processing chamber MPC such as the tower TW1. In the processing chamber MPC, for example, the substrate W is dried. Specifically, for example, pure water is supplied while the substrate W is rotated. Thereafter, IPA is supplied to the substrate W, and the pure water in the substrate W is replaced with IPA. Thereafter, the substrate W is rotated at a high speed and dried. In addition, as required, it is preferred that a drying process is performed in another processing chamber MPC using carbon dioxide as a supercritical fluid. The substrate W is finally dried by a drying process based on a supercritical fluid. As a result, the substrate W is completely dried, but the collapse of the pattern formed on the substrate W is suppressed.

[0131] The substrate W that has been dried is carried out to the carrying-out section 87 via the central robot CR and the loader robot IR. The loader robot IR stores the substrate W in the carrier C placed on the carrying-out section 87. Then, the processed substrates W constituting the same batch are stored in the same carrier C.

[0132] <16. Posture conversion processing>

[0133] The above is a rough flow of processing performed by the substrate processing apparatus 1 , and the posture transition will be described next.

[0134] The plurality of substrates W constituting the batch batch that have completed the batch processing are delivered to the lifter LF0 of the standby tank 31 by the second conveying mechanism WTR. The lifter LF0 moves the plurality of substrates W constituting the batch batch to the inside of the standby tank 31, that is, the standby position. In this state, the plurality of substrates W constituting the batch batch are on standby, so drying can be prevented. That is, the collapse of the pattern or the like formed on the substrate W after the batch processing can be prevented.

[0135] The 25-piece chuck TFC is located at the first delivery position P1. The 25-piece chuck TFC releases the hand 35. That is, the hand 35 of the 25-piece chuck TFC is at the passing position PT (refer to Figure 3 ). The lifter LF0 is raised to a transfer position above the liquid level of the standby tank BB0. At this time, the hand 35 of the 25 chucks TFC is in the passing position PT, so that a plurality of substrates W can pass between the 25 chucks TFC and rise. In addition, the posture conversion unit 41 in the posture conversion tank 33 causes the inverted chuck 43 to rise to the receiving height HP1.

[0136] The 25-piece chuck TFC closes the hand 35. That is, the hand 35 of the 25-piece chuck TFC is in the holding position PC (refer to Figure 3 ). In this state, the lift LF0 descends to the standby position. Thus, among the plurality of substrates W in the batch carried by the lift LF0, only the plurality of odd-numbered substrates W constituting one batch are placed on the 25 chucks TFC. Among the plurality of substrates W in the batch carried by the lift LF0, the plurality of even-numbered substrates W constituting another batch descends together with the lift LF0 to the inside of the standby slot BB0. Thus, the hand 35 of the 25 chucks TFC is in the second handover position PT2, and can stand by in a state of preventing drying until the even-numbered substrates W move to the posture conversion slot 33. Therefore, pattern collapse caused by drying of the plurality of substrates W constituting another batch can also be prevented.

[0137] The 25-sheet chuck TFC moves the hand 35 to the third transfer position P3 in the right direction Y. At this time, the inversion chuck 43 is located at the receiving height HP1, so that no interference with the substrate W occurs.

[0138] The reverse chuck 43 is set to the first distance WD1 (see Figure 4 In this state, the inversion chuck 43 is lowered toward the plurality of substrates W mounted on the 25-sheet chuck TFC. Specifically, the inversion chuck 43 is lowered to the clamping height HP2. The plurality of substrates W are accommodated in the inversion chuck 43.

[0139] By operating the cylinder 63b of the driving mechanism 63, the reverse chuck 43 is set to the second width WD2 (see Figure 5). Thus, the substrate W accommodated in the inversion chuck 43 is clamped. Figure 6 As shown in FIG. 1 , the reversal chuck 43 is raised to the locking height HP3. As a result, the lower edge of the end surface of the substrate W clamped by the reversal chuck 43, which is located lower than the side, is abutted and locked. In addition, while the reversal chuck 43 is temporarily raised to the receiving height HP1, the 25 chucks TFC are moved to the second delivery position P2. As a result, the 25 chucks TFC can be ready to receive a plurality of substrates W constituting another batch placed on the lift LF0.

[0140] The inversion chuck 43 is lowered to the immersion height HP4 by driving the motor 61c of the lifting mechanism 61. As a result, the plurality of substrates W clamped by the inversion chuck 43 are immersed in the processing liquid in the immersion tank DB. The plurality of substrates W are completely immersed in the processing liquid in the immersion tank DB. In the posture conversion block 15, the plurality of substrates W constituting one batch are in a state of being exposed from the liquid in a short time from the rise of the standby tank BB0 to the immersion in the immersion tank DB.

[0141] By operating the motor 65b of the rotating mechanism 65, the reversing chuck 43 is rotated 90°. Specifically, in this example, the reversing chuck 43 is rotated 90° clockwise. The direction of rotation can be determined according to the direction in which the processing surface (surface) of the substrate W is located. That is, the direction of rotation can be determined in such a way that the processing surface of the substrate W faces upward. Thus, the plurality of substrates W are converted into a horizontal posture.

[0142] The inversion chuck 43 is raised by operating the motor 61c of the lifting mechanism 61. Specifically, the inversion chuck 43 is raised so that only the substrate W clamped by the uppermost groove portion 47 of the inversion chuck 43 is exposed from the liquid in the immersion tank DB. The height of the inversion chuck 43 is such that the hand 71 of the bridge robot BR can enter a position slightly away from the lower surface of the substrate W exposed from the liquid.

[0143] The hand 71 of the bridge robot BR is caused to enter the posture conversion unit 41. The hand 71 enters a position slightly away from the lower surface of the substrate W downward.

[0144] The inversion chuck 43 is moved downward. The substrate W is transferred to the hand 71 by the movement of the inversion chuck 43 .

[0145] The bridge robot BR moves the hand 71 to the right direction Y to remove the uppermost substrate W from the inversion chuck 43 .

[0146] The bridge robot BR rotates the hand 71 to position the substrate W in the right direction Y. Specifically, the bridge robot BR rotates the hand 71 to move the substrate W to the delivery portion 93 . Then, one substrate W is delivered to the delivery portion 93 .

[0147] By the operation of the above-mentioned posture conversion block 15 , one substrate W is transported from the batch processing apparatus 3 to the single-wafer processing apparatus 5 in a horizontal posture.

[0148] In addition, the corresponding relationship between the present invention and the above-mentioned embodiments is as follows.

[0149] The posture conversion tank 33 is equivalent to the "in-liquid posture conversion device" and the "in-liquid posture conversion unit" in the present invention. The batch processing device 3 is equivalent to the "batch processing unit" in the present invention. The single-wafer processing device 5 is equivalent to the "single-wafer processing unit" in the present invention. The 25-piece chuck TFC is equivalent to the "first conveying unit" in the present invention. The bridge robot BR is equivalent to the "second conveying unit" in the present invention. The driving mechanism 63 is equivalent to the "opening and closing driving mechanism" in the present invention. The rotating mechanism 65 is equivalent to the "rotation driving mechanism" in the present invention. The lifting mechanism 61 is equivalent to the "lifting and lowering driving mechanism" in the present invention. The first interval WD1 is equivalent to the "release position" in the present invention. The second interval WD2 is equivalent to the "holding position" in the present invention. The receiving height HP1 is equivalent to the "handover position" in the present invention. The immersion height HP4 is equivalent to the "conversion position" in the present invention.

[0150] According to the present embodiment, the inversion chuck 43 is raised to the receiving height HP1 by the lifting mechanism 61. The inversion chuck 43 at the first interval WD1 receives the plurality of substrates W by the driving mechanism 63, and the inversion chuck 43 is at the second interval WD2 by the driving mechanism 63. The inversion chuck 43 is lowered to the immersion height HP4 by the lifting mechanism 61. The inversion chuck 43 is driven around the axis AX1 by the rotating mechanism 65. Thus, the postures of the plurality of substrates W can be changed in the immersion tank DB. Since the plurality of substrates W are held by the inversion chuck 43 instead of the carrier in the tank, the immersion tank DB can be miniaturized. In addition, since only the plurality of substrates W and the inversion chuck 43 are rotated around the axis AX1, the load on the rotating mechanism 65 can be reduced.

[0151] <17. Modification of the posture conversion groove>

[0152] Here, refer to Fig. 9 . Fig. 9 This is another embodiment of the posture conversion groove, and is a partially cutaway front view showing the detailed structure.

[0153] The difference between this posture conversion groove 33A and the above-mentioned posture conversion groove 33 lies in the structure of the posture conversion part 41A. Specifically, the rotation mechanism 65A, the transmission mechanism 67A, and the storage container 69A in the posture conversion part 41A are different.

[0154] The rotating mechanism 65A includes a rotating shaft 65a, a motor 65Ab, a sealing member 65c, and a coupling 65Ad.

[0155] The transmission mechanism 67A includes a first bevel gear 67Ad, an extension shaft 67Ae, and a second bevel gear 67Af. The first bevel gear 67Ad is attached to the other end of the rotating shaft 65a.

[0156] The motor 65Ab of the rotating mechanism 65A is longitudinally arranged at the upper part of the driving mechanism 63. The motor 65Ab is connected to one end of the extension shaft 67Ae via a coupling 65Ad. Since the extension shaft 67Ae is connected to the motor 65Ab via the coupling 65Ad, the motor 65Ab can be easily replaced. The second bevel gear 67Af is installed on the other end of the extension shaft 67Ae. The second bevel gear 67Af is screwed with the first bevel gear 67Ad. The axes of the rotating shaft 65a and the extension shaft 67Ae are approximately orthogonal to each other. The first bevel gear 67Ad and the second bevel gear 67Af transmit the rotational force of the motor 65Ab in an approximately orthogonal direction. According to this modified example, the rotational force of the motor 65Ab is transmitted by the first bevel gear 67Ad and the second bevel gear 67Af, so compared with the above-mentioned method of the synchronous belt 67c, the transmission loss of the rotational force can be reduced.

[0157] The receiver 69A is sealed and receives the transfer mechanism 67A. Preferably, the receiver 69A is pressurized. Specifically, one end of the supply pipe 99 is connected to the pressurization source 97. The other end of the supply pipe 99 is connected to the receiver 69A. The pressurization source 97 supplies gas to the supply pipe 99. For example, the gas is nitrogen or air. The gas is supplied to have a constant pressure. Therefore, the treatment liquid in the immersion tank DB can be prevented from entering the receiver 69A. As a result, it is possible to prevent the transfer mechanism 67A from malfunctioning due to the treatment liquid entering the receiver 69A.

[0158] <18. Other working examples of posture conversion slot>

[0159] Reference Fig.10 as well as Fig.11 , other working examples of the above-mentioned posture conversion groove 33 are explained. Fig.10 as well as Fig.11 This is a front view for explaining another working example of the posture conversion groove.

[0160] In the above-mentioned embodiment, the posture conversion groove 33 is used only to convert the posture of the plurality of substrates W from the vertical posture to the horizontal posture. That is, the posture conversion groove 33 changes the posture of the plurality of substrates W by 90 degrees. However, the posture conversion groove 33 can also be used to operate as follows.

[0161] That is, the posture conversion tank 33 can also be used as a batch processing unit BPU that processes a plurality of substrates W at a time. That is, the posture conversion tank 33 is used as a processing tank BB of the batch processing unit BPU.

[0162] For example, a plurality of substrates W are processed while a processing liquid is supplied from the supply pipe 50. For example, the processing liquid is a chemical solution, specifically a phosphoric acid solution. The plurality of substrates W are held in a vertical position on the inversion chuck 43 by the rotating mechanism 65. The inversion chuck 43 is lowered to the immersion height HP4 by the lifting mechanism 61. This state is as shown in FIG. Fig.10 As shown. At this time, the surfaces (processing surfaces) of the plurality of substrates W, for example, face one side in the width direction Y. Thus, the plurality of substrates W start to be processed by the chemical solution. Next, when the processing time by the chemical solution is set to T hours, for example, at the moment when it becomes T / 2 hours, the rotating mechanism 65 is operated. Then, the posture of the plurality of substrates W is changed by 180 degrees. That is, it is set to a vertical posture in which the upper and lower parts of the plurality of substrates W are reversed. Thus, the back side (non-processing surface) faces one side in the width direction Y. For the plurality of substrates W, the conversion is performed in such a manner that the upper part is located at the lower part and the lower part is located at the upper part. Then, for example, after T / 2 hours, it is moved to other processing tanks BB for cleaning treatment.

[0163] According to this working example, a plurality of substrates W are processed by the processing liquid in the immersion tank DB, and the reversing chuck 43 is driven around the axis AX1 by the rotating mechanism 65 to reverse the plurality of substrates W upside down. Therefore, the upper and lower parts of the substrates W can be replaced. Therefore, even if the progress of the processing on the upper and lower parts of the substrates W is different, the progress of the processing can be averaged by replacing them. As a result, the in-plane uniformity of the processing of the substrates W can be improved.

[0164] In the above working example, in the processing time of T hours, the upper and lower parts are switched by T / 2 hours each time. However, it is not limited to this, as long as the time is allocated according to the deviation of the progress of the upper and lower processing. In addition, the upper and lower inversions can also be performed multiple times.

[0165] The present invention is not limited to the above-described embodiment, and can be implemented in the following modified forms.

[0166] (1) In the above-mentioned embodiment, the driving mechanism 63 is driven by the air cylinder 63b, but the present invention is not limited to such a structure. For example, an air type rotary actuator, a linear motor, etc. may be used instead of the air cylinder 63b.

[0167] (2) In the above-mentioned embodiment, the transmission mechanism 67, 67A uses the driving pulley 67b and the first bevel gear 67Ad, but the present invention is not limited to such a structure. In other words, as long as the driving force of the motor 65b, 65Ab can be transmitted to the reverse chuck 43, it is not limited to such a structure.

[0168] (3) In the above-mentioned embodiment, the lifting mechanism 61 includes the motor 61c and the screw shaft 61b. However, the present invention is not limited to such a structure. For example, a plurality of cylinders or multi-stage cylinders may be used instead of the motor 61c and the screw shaft 61b.

[0169] (4) In the above-mentioned embodiment, the substrate processing apparatus 1 is described as an example of a structure in which the batch processing apparatus 3 and the single-wafer processing apparatus 5 are connected via the bridge portion 7. However, the present invention can also be applied to a single substrate processing apparatus 1 having the batch processing apparatus 3 and the single-wafer processing apparatus 5 in the same housing.

[0170] As the present invention may be embodied in other specific forms without departing from its spirit or essential attributes, reference should be made, therefore, to the appended claims, rather than to the foregoing specification, as indicating the scope of the invention.

Claims

1. A liquid posture conversion device, which converts the postures of multiple substrates, The device for converting posture in liquid is characterized in that: The device comprises the following elements, namely: a dipping tank storing the treatment solution; an inverting chuck that holds a plurality of substrates; an opening and closing driving mechanism, which drives the reversing chuck to a releasing position and a holding position, wherein the releasing position is used to transfer the plurality of substrates between the reversing chuck and the reversing chuck, and the holding position is used to hold the plurality of substrates by the reversing chuck; A rotation drive mechanism drives the inversion chuck around a horizontal axis in order to change the postures of the plurality of substrates; as well as A lifting drive mechanism is used to lift the inverted chuck to a handover position above the immersion tank and a switching position in the immersion tank. When the reversal chuck is raised to the handover position by the lifting and lowering driving mechanism, the reversal chuck in the release position is caused to receive the multiple substrates by the opening and closing driving mechanism, and after being in the holding position by the opening and closing driving mechanism, the reversal chuck is driven around the horizontal axis by the rotating driving mechanism when the lifting and lowering driving mechanism is used to lower the reversal chuck to the transfer position.

2. The in-liquid posture conversion device according to claim 1, It is characterized in that The rotation drive mechanism includes: a rotation shaft, one end of which is connected to the outer side of the inversion chuck; a motor; and a transmission mechanism that transmits the rotational force of the motor to the rotation shaft. A bottomed container is also provided, the container accommodating the rotating shaft and the transmission mechanism. The transfer mechanism is lifted and lowered together with the storage container through the lifting drive mechanism.

3. The in-liquid posture conversion device according to claim 2, It is characterized in that The transmission mechanism includes: a driven pulley provided on the other end side of the rotating shaft; a driving pulley attached to the motor; and a timing belt stretched between the driven pulley and the driving pulley.

4. The in-liquid posture conversion device according to claim 2, It is characterized in that The transmission mechanism includes: a first bevel gear provided on the other end side of the rotating shaft; an extension shaft connected to the motor; and a second bevel gear provided at a lower end portion of the extension shaft and threadedly engaged with the first bevel gear.

5. The in-liquid posture conversion device according to claim 2, It is characterized in that The lifting drive mechanism includes a lifting frame, the lifting frame carrying the rotation drive mechanism and extending to the outside of the dipping tank and the storage container. The opening and closing drive mechanism is mounted on the lifting frame.

6. The in-liquid posture conversion device according to claim 4, It is characterized in that The interior of the container is pressurized by gas.

7. A substrate processing device, which processes a substrate, The substrate processing device is characterized in that: The device comprises the following elements, namely: A batch processing section that processes a plurality of substrates at a time in a vertical position; A single-wafer processing unit processes a substrate in a horizontal posture; an in-liquid posture conversion unit for converting the plurality of substrates that have been processed in the batch processing unit from a vertical posture to a horizontal posture in the processing liquid; a first transport unit that transports the plurality of substrates processed in the batch processing unit to the in-liquid posture conversion unit; as well as a second conveying unit for conveying the plurality of substrates which have been brought into a horizontal posture by the in-liquid posture conversion unit to the single-wafer processing unit, The in-liquid posture conversion unit comprises: a dipping tank storing the treatment solution; an inverting chuck that holds a plurality of substrates; an opening and closing driving mechanism, which drives the reversing chuck to a releasing position and a holding position, wherein the releasing position is used to transfer the plurality of substrates between the reversing chuck and the reversing chuck, and the holding position is used to hold the plurality of substrates by the reversing chuck; a rotation drive mechanism for driving the inversion chuck around a horizontal axis in order to convert the postures of the plurality of substrates into a vertical posture and a horizontal posture; as well as A lifting drive mechanism is used to lift the inverted chuck to a handover position above the immersion tank and a switching position in the immersion tank. When the inversion chuck is raised to the handover position by the lifting drive mechanism, the opening and closing drive mechanism is used to make the inversion chuck in the release position receive the multiple substrates, and after the opening and closing drive mechanism is in the holding position, when the inversion chuck is lowered to the conversion position by the lifting drive mechanism, the rotation drive mechanism is used to drive the inversion chuck around the horizontal axis to convert the multiple substrates from a vertical posture to a horizontal posture.

Images