Double-sided reel-to-reel laser direct writing photoetching machine

Abstract

The invention discloses a double-sided reel-to-reel laser direct writing photoetching machine, and belongs to the field of photoetching machine equipment. A double-sided reel-to-reel laser direct writing photoetching machine comprises an exposure platform, a discharging platform and a receiving platform are arranged on the two sides of the exposure platform respectively, receiving and releasing assemblies are arranged on the discharging platform and the receiving platform respectively, and tensioning assemblies for tensioning and adjusting coiled materials are arranged on the discharging platform and the receiving platform respectively. The CCD alignment camera group and the laser reader-writer are symmetrically arranged; by arranging the CCD alignment camera group and the laser reader-writer which are symmetrically distributed, synchronous exposure read-write operation can be carried out on a material needing to be exposed, meanwhile, during exposure operation, automatic deviation correction and centering operation is carried out on the conveyed material through the deviation correction roller, so that the conveyed coiled material is corrected, the deviation phenomenon is avoided, and the production efficiency is improved. And the clamping plate is matched for multiple times of limiting, so that the double-sided exposure read-write accuracy is improved, and the working efficiency of the device is effectively improved.

Description

Technical Field

[0001] The present invention relates to the technical field of lithography equipment, and in particular to a double-sided roll-to-roll laser direct writing lithography machine. Background Art

[0002] In modern manufacturing, especially in the field of high-precision circuit board manufacturing, laser direct writing lithography technology has attracted widespread attention due to its contactless and maskless characteristics.

[0003] Currently, there is only LDI single-sided roll-to-roll scanning exposure machine on the market. For products that need to be exposed on both sides, they need to be flipped when double-sided exposure is performed. This not only increases the complexity of the exposure process, but may also affect the final exposure effect due to positioning accuracy issues. For this reason, we propose a double-sided roll-to-roll laser direct writing lithography machine to solve the above-mentioned problems. Summary of the invention

[0004] The purpose of the present invention is to solve the problem in the prior art that a flipping operation is required during double-sided exposure, which not only increases the complexity of the exposure process, but may also affect the final exposure effect due to positioning accuracy issues, and thus proposes a double-sided roll-to-roll laser direct writing lithography machine.

[0005] In order to achieve the above object, the present invention adopts the following technical solutions: A double-sided roll-to-roll laser direct writing lithography machine comprises an exposure platform, a discharging platform and a receiving platform are respectively arranged on both sides of the exposure platform, and the discharging platform and the receiving platform are both provided with a retracting and releasing assembly, and the discharging platform and the receiving platform are both provided with a tensioning assembly for adjusting the tension of the coil, a symmetrically arranged CCD alignment camera group and a laser reader are located in the exposure platform and distributed on the upper and lower sides of the through coil, and are used for exposure, reading and writing operations on the through coil; an adjustable deviation correction roller is arranged at one side end of the exposure platform, and is used for centering the coil position; a clamping plate is arranged between the CCD alignment camera group and the laser reader, and when the double-sided coil is exposed, read and written, the coil is clamped and limited by the clamping plate.

[0006] Preferably, the retractable assembly comprises a rotating disk mounted on the exposure platform, a side surface of the rotating disk is mounted with electric push rods distributed in a ring shape, and an arc-shaped support block is fixed to the output end of the electric push rod.

[0007] Preferably, the tensioning assembly includes a support frame installed on the exposure platform, the support frame is rotatably connected to an auxiliary roller via a bearing, the support frame is slidably connected to an adjustment block, one side of the adjustment block is rotatably connected to an adjustment roller via a bearing, the adjustment block is provided with an adjustment bolt, and a vacuum cleaner is installed on the top of one end of the support frame.

[0008] Preferably, a connecting plate is fixedly installed on the exposure platform, and a bidirectional lead screw is rotatably connected to the surface of the connecting plate through a bearing, and a movable plate is threadedly connected to the bidirectional lead screw, and a plurality of the deflection correction rollers are symmetrically installed on the movable plate, and the movable plate is slidably connected to the first guide rail, and the first guide rail is installed on the two side walls of the connecting plate, and a deflection correction sensor is installed on one side of one of the first guide rails, and one end of the bidirectional lead screw is fixed with a first driving part installed on the side wall of the fixed plate.

[0009] Preferably, a second driving part is installed at the bottom of the clamping plate, a bottom plate is installed at the bottom of the second driving part, and the second driving part and the bottom plate are both in a U-shape.

[0010] Preferably, a material pulling piece is provided on the top of the exposure platform, and the material pulling piece includes a second guide rail installed on the top of the exposure platform, a slide seat is slidably connected to the second guide rail, and the slide seat is installed on a movable frame, and two fixed plates are installed on the movable frame, one of which is fixed on the movable frame, and a third driving part is fixed on the top of the other fixed plate, and the third driving part is fixed on the movable frame.

[0011] Preferably, a support assembly is provided at the bottom of the exposure platform, and the support assembly includes an opening fixed on the top of the exposure platform, a mounting seat is provided on the surface of the opening, a slider is slidably connected to the inside of the mounting seat, one side of the slider is rotatably connected to a lifting roller through a bearing, and an adjustment part is provided on the other side of the slider.

[0012] Preferably, the adjusting member comprises a lifting block fixed to the other side of the sliding block, a one-way screw rod is threadedly connected to the surface of the lifting block, and an end of the one-way screw rod is rotatably connected to the mounting seat via a bearing.

[0013] Preferably, a bevel gear is fixed on the surface of the one-way screw rod, a mating gear is meshed on the surface of the bevel gear, a rotating handle is installed at the axis of the mating gear, and one end of the rotating handle extends to the outside of the mounting seat.

[0014] Preferably, a display is installed on the exposure platform, and an FFU high-efficiency filter is installed on the top of the exposure platform.

[0015] Compared with the prior art, the present invention provides a double-sided roll-to-roll laser direct writing lithography machine, which has the following beneficial effects: 1. This double-sided roll-to-roll laser direct writing lithography machine is symmetrically distributed on the upper and lower surfaces of the coiled material through the CCD alignment camera group and the laser reader. When exposure, reading and writing are required, exposure, reading and writing operations can be performed on both sides of the coiled material at the same time, eliminating the trouble of separate exposure operations on the front and back sides in the traditional way, and effectively improving the working efficiency of the device.

[0016] 2. This double-sided roll-to-roll laser direct writing lithography machine can automatically sense and correct the transmission position of the coil running through the exposure platform through the provided correction roller when in use, effectively preventing the conveyed coil from deviating and causing inaccurate subsequent exposure reading and writing, thereby improving the device's positioning effect on the coil.

[0017] 3. This double-sided roll-to-roll laser direct writing lithography machine can, through the set clamping plate, press and limit the surface of the coil in the exposure area under the double-sided exposure state to prevent shaking, deviation and wrinkles, and further improve the accuracy of the exposure reading and writing operations of the device.

[0018] The parts not involved in the device are the same as the prior art or can be implemented by the prior art. The present invention can perform synchronous exposure, reading and writing operations on the materials to be exposed by setting a symmetrically distributed CCD alignment camera group and a laser reader. At the same time, during the exposure operation, the transmitted material is automatically corrected and centered by the correction roller, so that the conveyed coil is corrected to avoid deviation. In addition, the clamping plate is used for multiple limiting to improve the accuracy of double-sided exposure reading and writing, thereby effectively improving the working efficiency of the device. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 This is a schematic diagram of the overall structure of a double-sided roll-to-roll laser direct writing lithography machine proposed by the present invention; Figure 2 This is a schematic diagram of the local structure of the discharge end proposed by the present invention; Figure 3 A schematic diagram of a partial internal three-dimensional structure of the exposure section proposed by the present invention; Figure 4 The present invention proposes Figure 3 A schematic diagram of the enlarged structure of the middle A area; Figure 5 A schematic diagram of a partial three-dimensional structure of a clamping plate in a double-sided roll-to-roll laser direct writing lithography machine proposed by the present invention; Figure 6 This is a schematic diagram of the structure of the symmetrical installation state of the CCD alignment camera group and the laser reader in a double-sided roll-to-roll laser direct writing lithography machine proposed by the present invention; Figure 7 This is a schematic diagram of a partial cross-sectional structure of a support assembly proposed by the present invention; Figure 8 This is a structural schematic diagram of the partial three-dimensional installation state of the deviation-correcting roller proposed by the present invention.

[0020] In the figure: 1. Exposure platform; 2. Discharging platform; 3. Receiving platform; 4. Retracting and releasing assembly; 40. Rotating plate; 41. Electric push rod; 42. Arc support block; 5. Tensioning assembly; 51. Support frame; 52. Adjusting block; 53. Adjusting roller; 54. Auxiliary roller; 55. Vacuum cleaner; 6. CCD alignment camera group; 61. Laser reader; 7. Correction roller; 71. Connecting plate; 72. Bidirectional screw rod; 73. Moving plate; 74. First guide rail; 75. Correction sensor device; 76, first drive unit; 8, clamping plate; 81, second drive unit; 82, bottom plate; 9, fixed plate; 91, third drive unit; 92, movable frame; 93, slide seat; 94, second guide rail; 10, lifting roller; 101, mounting seat; 102, slider; 103, opening; 104, lifting block; 105, one-way screw rod; 106, bevel gear; 107, matching gear; 108, turning handle; 11, display; 12, FFU high efficiency filter. DETAILED DESCRIPTION

[0021] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0022] In the description of the present invention, the term "multiple" refers to two or more. Unless otherwise clearly defined, the orientation or positional relationship indicated by the terms "upper", "lower", etc. is based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the present invention and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it cannot be understood as a limitation of the present invention. The terms "connection", "installation", "fixation", etc. should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to the specific circumstances. In addition, the terms "first", "second", etc. are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first", "second", etc. can explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, the meaning of "multiple" is two or more.

[0023] In the description of this specification, the description of the terms "one embodiment", "some implementations", "specific embodiments", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0024] Reference Figure 1-Figure 8 A double-sided roll-to-roll laser direct writing lithography machine comprises an exposure platform 1, a discharging platform 2 and a receiving platform 3 are respectively arranged on both sides of the exposure platform 1, a retracting assembly 4 is arranged on the discharging platform 2 and the receiving platform 3, a tensioning assembly 5 for adjusting the tension of the coil is arranged on the discharging platform 2 and the receiving platform 3, a symmetrically arranged CCD alignment camera group 6 and a laser reader 61 are located in the exposure platform 1 and distributed on the upper and lower sides of the through coil, and are used for exposure, reading and writing operations on the through coil; an adjustable deviation correction roller 7 is arranged at one side end of the exposure platform 1, and is used for centering the coil position; a clamping plate 8 is arranged between the CCD alignment camera group 6 and the laser reader 61, and when the double-sided coil is exposed, read and written, the clamping plate 8 is used to clamp and limit the coil around.

[0025] In the prior art, when performing exposure, reading and writing operations on a coil, it is generally necessary to perform exposure, reading and writing operations on one side and then turn it over to perform exposure, reading and writing operations again. This operation mode is slow and greatly affects the working efficiency of the device operation. Therefore, in this solution, a symmetrically distributed CCD alignment camera group 6 and a laser reader 61 are provided on the discharge platform 2. When the coil is processed, the CCD alignment camera group 6 and the laser reader 61 can synchronously perform exposure, reading and writing operations on the upper and lower sides of the coil. This operation effectively improves the working efficiency of the device. Compared with the traditional operation mode of flipping after single-sided exposure, it is more convenient and quick. During the operation of the device, the retracting component 4 can discharge and retract the coil with exposure and reading and writing. During the discharge and retracting process, the tensioning component 5 is provided. The conveyed coil can be wound around the tensioning component 5, which is convenient for tensioning the conveyed coil, avoiding the situation where the coil is loose and dragging on the ground, and improving the stability of the coil during transportation. After preparation, when the coil needs to be exposed, the CCD alignment camera group 6 and the laser reader 61 are started to mark the exposure position of the coil and calculate the exposure area position, and then the surface of the coil is read and written. In this process, the correction roller 7 arranged on the discharge platform 2 corrects the deviation of the coil passing through and limits the centering to avoid the deviation of the coil during transportation and ensure the accuracy of the coil exposure operation. At the same time, the clamping plate 8 is used to clamp and limit the coil. After the exposure, reading and writing of each section of the coil are completed, the restriction on the coil is released, and the coil is continued to be wound through the retracting component 4 on the receiving platform 3. The operation is convenient and quick.

[0026] In a preferred embodiment, referring to Figure 2 The retracting assembly 4 includes a rotating disk 40 installed on the exposure platform 1, and an electric push rod 41 distributed in a ring is installed on one side of the rotating disk 40. An arc-shaped support block 42 is fixed to the output end of the electric push rod 41. The tensioning assembly 5 includes a support frame 51 installed on the exposure platform 1. An auxiliary roller 54 is rotatably connected to the support frame 51 through a bearing, and an adjusting block 52 is slidably connected to the support frame 51. An adjusting roller 53 is rotatably connected to one side of the adjusting block 52 through a bearing. An adjusting bolt is arranged on the adjusting block 52, and a dust collector 55 is installed on the top of one end of the support frame 51.

[0027] In the preparation stage, when the rolled coil is transported over, the electric push rod 41 is started to drive the arc-shaped support block 42 to move, and the inner wall of the rolled coil drum is internally supported and limited, so that the coil to be exposed can be quickly installed on the discharge platform 2, which is convenient for the subsequent exposure operation. This design is suitable for the installation of coil drums of different sizes and is easy to operate; During the conveying process of the coil, one end of the coil winds around one of the auxiliary rollers 54, then bypasses the surface of the adjusting roller 53, and finally bypasses the other auxiliary roller 54, and extends out from one end of the discharging platform 2 through the vacuum cleaner 55. The adjusting roller 53 is adjustable. When it is necessary to adjust the tension of the coil, the adjusting block 52 slides on the support frame 51, and the adjusting bolt is used to fasten and limit the adjusting block 52, so as to adjust the height position of the adjusting roller 53 and realize the tension adjustment of the coil. The vacuum cleaner 55 can adopt a commonly used model in the market.

[0028] In a preferred embodiment, referring to Figure 5 and Figure 8 , a connecting plate 71 is fixedly installed on the exposure platform 1. A bidirectional lead screw 72 is rotationally connected to the surface of the connecting plate 71 through a bearing. A moving plate 73 is threadedly connected to the bidirectional lead screw 72. A plurality of deviation rectifying rollers 7 are symmetrically installed on the moving plate 73. The moving plate 73 is slidably connected to the first guide rail 74. The first guide rail 74 is installed on both side walls of the connecting plate 71. A deviation rectifying sensor 75 is installed on one side surface of one of the first guide rails 74. One end of the bidirectional lead screw 72 is fixed with a first driving part 76 installed on the side wall of the connecting plate 71. A second driving part 81 is installed at the bottom of the clamping plate 8. A bottom plate 82 is installed at the bottom of the second driving part 81. Both the second driving part 81 and the bottom plate 82 are in a square shape. During the conveying process of the coil, the deviation rectifying sensor 75 monitors the position of the coil transmitted on the top surface in real time. When the coil deviates, the first driving part 76 is started to drive the bidirectional lead screw 72 to rotate, and then drive the two moving plates 73 to move in opposite or opposite directions, so as to adjust the distance between the two groups of distributed deviation rectifying rollers 7, thereby adjusting the center position of the coil during the conveying process, and continuously performing deviation rectifying and centering operations on the coil during the processing, making the device more accurate when exposing and reading and writing the coil. A driving roller is also provided on the connecting plate 71 to facilitate the support and transmission of the conveyed coil and reduce the friction force. The deviation rectifying sensor 75 is a laser displacement sensor and adopts a commonly used model in the market. The first driving part 76 is replaced by a servo motor for operation; Before the exposure operation, the second driving part 81 is started to drive the clamping plate 8 to move up and down. Both the second driving part 81 and the bottom plate 82 are in a square shape, and a square rubber pressing strip is provided on the top of the bottom plate 82 and is adapted to the clamping plate 8. During the downward movement of the clamping plate 8, it cooperates with the bottom plate 82 to clamp and limit the periphery of the exposed area of the penetrated coil, avoiding situations such as tilting, and improving the stability of the exposure operation of the device. The second driving part 81 is replaced by a driving source such as a cylinder for driving operation.

[0029] In a preferred embodiment, referring to Figure 4 and Figure 7A material pulling member is provided on the top of the exposure platform 1, and the material pulling member includes a second guide rail 94 installed on the top of the exposure platform 1, and a slide 93 is slidably connected to the second guide rail 94, and the slide 93 is installed on the moving frame 92. Two fixed plates 9 are installed on the moving frame 92, one of the fixed plates 9 is fixed on the moving frame 92, and a third driving part 91 is fixed on the top of the other fixed plate 9, and the third driving part 91 is fixed on the moving frame 92. A supporting assembly is provided at the bottom of the exposure platform 1, and the supporting assembly includes an opening 103 fixed on the top of the exposure platform 1, and a mounting seat 101 is provided on the surface of the opening 103. A slider 102 is slidably connected to the inside of the mounting seat 101, and one side of the slider 102 A lifting roller 10 is rotatably connected to the surface through a bearing, and an adjusting part is arranged on the other side of the slider 102, and the adjusting part includes a lifting block 104 fixed to the other side of the slider 102, and a one-way screw rod 105 is threadedly connected to the surface of the lifting block 104, and the end of the one-way screw rod 105 is rotatably connected to the mounting seat 101 through a bearing, and a bevel gear 106 is fixed to the surface of the one-way screw rod 105, and a mating gear 107 is meshed on the surface of the bevel gear 106, and a rotating handle 108 is installed at the axis center of the mating gear 107, and one end of the rotating handle 108 extends to the outside of the mounting seat 101, a display 11 is installed on the exposure platform 1, and an FFU high-efficiency filter 12 is installed on the top of the exposure platform 1.

[0030] During the exposure operation, in order to increase the tension of the coil between the coil receiving end and the exposure area, the height of the lifting roller 10 is adjusted by manually turning the rotating handle 108, thereby supporting and adjusting the tension of the coil, and providing good support for the coil. During the exposure operation, one of the fixed plates 9 is driven downward by starting the third driving unit 91 to contact the other fixed plate 9, and the coil running through the two fixed plates 9 is clamped and fixed. The coil is pulled by moving the moving frame 92 to prevent wrinkles from occurring, and a pulling and limiting force is provided for the coil in the exposure area, so that the coil in the exposure area is flatter and more stable. The FFU high-efficiency filter 12 can remove dust, bacteria and other particles in the air at the exposure position of the discharge platform 2, thereby improving the quality of the product.

[0031] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A double-sided roll-to-roll laser direct writing lithography machine, comprising an exposure platform (1), wherein a discharging platform (2) and a receiving platform (3) are respectively arranged on both sides of the exposure platform (1), wherein both the discharging platform (2) and the receiving platform (3) are provided with a retracting and releasing component (4), and both the discharging platform (2) and the receiving platform (3) are provided with a tensioning component (5) for adjusting the tension of the coil, wherein: A symmetrically arranged CCD alignment camera group (6) and a laser reader (61) are located in the exposure platform (1) and distributed on the upper and lower sides of the through-coil, and are used for exposure, reading and writing operations on the through-coil; An adjustable deviation correction roller (7) is arranged at one side of the exposure platform (1) and is used for performing deviation correction processing on the center of the web position; The clamping plate (8) is arranged between the CCD alignment camera group (6) and the laser reader (61). When the double-sided coil is exposed, read and written, the clamping plate (8) is used to clamp and limit the periphery of the coil.

2. A double-sided roll-to-roll laser direct writing lithography machine according to claim 1, characterized in that: The retractable assembly (4) comprises a rotating disk (40) mounted on the exposure platform (1), a side surface of the rotating disk (40) being provided with electric push rods (41) distributed in a ring shape, and an arc-shaped support block (42) being fixed to the output end of the electric push rods (41).

3. The double-sided roll-to-roll laser direct writing lithography machine according to claim 1, characterized in that: The tensioning assembly (5) comprises a support frame (51) mounted on the exposure platform (1), an auxiliary roller (54) being rotatably connected to the support frame (51) via a bearing, an adjustment block (52) being slidably connected to the support frame (51), an adjustment roller (53) being rotatably connected to one side of the adjustment block (52) via a bearing, an adjustment bolt being provided on the adjustment block (52), and a dust collector (55) being mounted on the top of one end of the support frame (51).

4. The double-sided roll-to-roll laser direct writing lithography machine according to claim 1, characterized in that: A connecting plate (71) is fixedly mounted on the exposure platform (1); a bidirectional lead screw (72) is rotatably connected to the surface of the connecting plate (71) via a bearing; a movable plate (73) is threadedly connected to the bidirectional lead screw (72); a plurality of deflection correction rollers (7) are symmetrically mounted on the movable plate (73); the movable plate (73) is slidably connected to a first guide rail (74); the first guide rail (74) is mounted on two side walls of the connecting plate (71); a deflection correction sensor (75) is mounted on one side of one of the first guide rails (74); and a first driving unit (76) mounted on the side wall of the connecting plate (71) is fixed to one end of the bidirectional lead screw (72).

5. The double-sided roll-to-roll laser direct writing lithography machine according to claim 1, characterized in that: A second driving part (81) is installed at the bottom of the clamping plate (8), and a bottom plate (82) is installed at the bottom of the second driving part (81); the second driving part (81) and the bottom plate (82) are both in a U-shaped shape.

6. The double-sided roll-to-roll laser direct writing lithography machine according to claim 1, characterized in that: A material pulling member is arranged on the top of the exposure platform (1), and the material pulling member comprises a second guide rail (94) mounted on the top of the exposure platform (1), a slide seat (93) is slidably connected to the second guide rail (94), and the slide seat (93) is mounted on a movable frame (92), and two fixed plates (9) are mounted on the movable frame (92), one of the fixed plates (9) is fixed on the movable frame (92), and a third driving unit (91) is fixed on the top of the other fixed plate (9), and the third driving unit (91) is fixed on the movable frame (92).

7. The double-sided roll-to-roll laser direct writing lithography machine according to claim 1, characterized in that: A support assembly is provided at the bottom of the exposure platform (1), the support assembly comprising an opening (103) fixed to the top of the exposure platform (1), a mounting seat (101) being provided on the surface of the opening (103), a slider (102) being slidably connected inside the mounting seat (101), a side surface of the slider (102) being rotatably connected to a lifting roller (10) via a bearing, and an adjusting member being provided on the other side surface of the slider (102).

8. The double-sided roll-to-roll laser direct writing lithography machine according to claim 7, characterized in that: The adjusting member comprises a lifting block (104) fixed to the other side of the sliding block (102); a one-way screw rod (105) is threadedly connected to the surface of the lifting block (104); and an end of the one-way screw rod (105) is rotatably connected to the mounting seat (101) via a bearing.

9. The double-sided roll-to-roll laser direct writing lithography machine according to claim 8, characterized in that: A bevel gear (106) is fixed on the surface of the one-way screw rod (105), a mating gear (107) is meshed on the surface of the bevel gear (106), a rotating handle (108) is mounted at the axis of the mating gear (107), and one end of the rotating handle (108) extends to the outside of the mounting seat (101).

10. The double-sided roll-to-roll laser direct writing lithography machine according to claim 1, characterized in that: A display (11) is installed on the exposure platform (1), and an FFU high-efficiency filter (12) is installed on the top of the exposure platform (1).

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