Monocrystalline silicon solar cell monomer cleaning device

Abstract

The invention relates to a monocrystalline silicon solar cell monomer cleaning device which comprises a cleaning tank, a metal grating and an ultrasonic megasonic composite array are arranged in the cleaning tank, and the ultrasonic megasonic composite array comprises a plurality of ultrasonic megasonic composite units which are arranged at equal intervals in the length direction and the width direction of the cleaning tank; the ultrasonic megasonic composite unit comprises a metal coupling column, one end of the metal coupling column is provided with an ultrasonic vibrator, and the other end of the metal coupling column is provided with a megasonic vibrator. According to the single monocrystalline silicon solar cell cleaning device, the single monocrystalline silicon solar cell can be cleaned, and when megasonic and ultrasonic combined sound waves are used for auxiliary cleaning of small-particle attachments and micro-particle attachments on the surface of a cell piece, the cleaning rate is high; a large number of battery pieces can be cleaned at a time, cracks are not prone to being generated, the qualified rate after cleaning is high, and the cleaning effect is good.

Description

Technical Field

[0001] The invention relates to a single crystal silicon solar cell cleaning device, belonging to the technical field of solar cell manufacturing. Background Art

[0002] Monocrystalline silicon solar cells are solar cells made of high-purity single-crystal silicon rods. Monocrystalline silicon refers to silicon materials that are crystallized as a single crystal. It is a commonly used photovoltaic power generation material. Monocrystalline silicon solar cells are the most technologically mature among silicon-based solar cells. Compared with polycrystalline silicon and amorphous silicon solar cells, their photoelectric conversion efficiency is the highest.

[0003] During the production of single-crystal silicon solar cells, different processing procedures of the cells require different degrees of cleaning. At present, the industry commonly uses cleaning equipment such as ultrasonic cleaning tanks for batch cleaning and megasonic cleaning nozzles for spray cleaning; and it is well known in the industry that for large particles attached to the surface of the cell, ultrasonic cleaning tanks are generally used for cleaning, and the ultrasonic frequency is generally higher than 30kHz, because the lower the ultrasonic frequency, the easier it is to produce cavitation in the liquid. In large-scale cleaning, the ultrasonic power is generally very large. Too low ultrasonic frequency can easily lead to severe cavitation, causing different degrees of micro-cracks in the cell, resulting in the scrapping of the cell.

[0004] The use of a megasonic cleaning nozzle in conjunction with a rotating table for rotary spray cleaning may have a better cleaning effect on a single cell than an ultrasonic cleaning tank, but the megasonic cleaning nozzle only cleans one side of a single cell at a time, and the cleaning efficiency is very low. It is only suitable for cleaning a small number of cells with stubborn stains. If a megasonic vibrator is installed at the bottom of the cleaning tank like an ultrasonic cleaning tank, the megasonic waves generated by the megasonic vibrator will clean the cells in the cleaning tank, but the cleaning effect is not as good as that of an ultrasonic cleaning tank. This is because the cleaning of large quantities of cells mainly relies on cavitation to remove particle attachments on the surface of the cells, and the cavitation degree of megasonic waves is significantly weaker than that of ultrasonic waves.

[0005] Based on this, the present invention is proposed. Summary of the invention

[0006] In view of the shortcomings of the prior art, the present invention provides a single crystal silicon solar cell cleaning device, and the specific technical solution is as follows:

[0007] A single crystal silicon solar cell cleaning device comprises a cleaning tank, wherein a metal grid and an ultrasonic megasonic composite array are arranged inside the cleaning tank, the metal grid is fixedly connected to the cleaning tank, and the cleaning tank is divided by the metal grid into a cleaning area located above the metal grid and an ultrasonic megasonic composite array installation area located below the metal grid; the ultrasonic megasonic composite array is located in the ultrasonic megasonic composite array installation area, and the ultrasonic megasonic composite array comprises a plurality of ultrasonic megasonic composite units arranged at equal intervals along the length direction and the width direction of the cleaning tank; the ultrasonic megasonic composite unit comprises a metal coupling column, an ultrasonic vibrator is installed at one end of the metal coupling column, and a megasonic vibrator is installed at the other end of the metal coupling column.

[0008] As a further improvement, the end of the metal coupling column is integrally connected with a plug, the vibration end of the ultrasonic vibrator and the vibration end of the megasonic vibrator are both fixedly connected with a joint, and the upper end of the joint is provided with a slot matching the plug.

[0009] A further improvement is that the metal coupling column includes at least three cylindrical metal columns, a buffer column coaxial with the metal column is arranged between two adjacent metal columns, and the buffer column is connected to the metal column as an integral whole; notches with arc-shaped cross-sections are respectively arranged on both sides of the buffer column, and the two notches are axially symmetrically arranged with a symmetry plane as the symmetry axis, and the symmetry plane is colinear with the axis of the buffer column; the circle where the outer periphery of the metal column is located is the base circle, the projections of any two symmetry planes on the base circle do not overlap, and the projections of all symmetry planes on the base circle are centrally symmetrically arranged.

[0010] As a further improvement, six metal columns are provided and five buffer columns are provided.

[0011] A further improvement is to arrange the metal columns in sequence from the head end of the metal coupling column to the tail end of the metal coupling column, and the third metal column and the fourth metal column are both provided with hollow cavities inside, and the hollow cavities are filled with granular media; screw holes are respectively provided on both sides of the hollow cavities, and the screw holes are connected to the hollow cavities; and hole plugs are provided at the screw holes.

[0012] As a further improvement, the ratio of the total volume of the granular medium to the volume of the hollow cavity is x, 2 / 3≤x≤3 / 4.

[0013] As a further improvement, the granular medium is made by mixing pomegranate sand and glassy carbon in a mass ratio of 12:1, the particle size of the pomegranate sand is 0.1-0.2 mm, and the particle size of the glassy carbon is 10-12 μm.

[0014] As a further improvement, the outer side walls of the third metal column and the fourth metal column are fixedly connected with washers matched with the hole plugs, and the washers and the hole plugs are coated with sealant for sealing.

[0015] As a further improvement, the ratio of the length of the metal column to the length of the buffer column is y, 1.1≤y≤1.3; the maximum depth of the notch is f, and the minimum thickness of the buffer column is g, 1.3≤g / f≤1.6.

[0016] As a further improvement, the ratio of the megasonic frequency of the megasonic vibrator to the ultrasonic frequency of the ultrasonic vibrator is 35.

[0017] Beneficial effects of the present invention:

[0018] The single crystal silicon solar cell cleaning device of the present invention can clean single crystal silicon solar cell monomers, and has a high removal rate when using megasonic and ultrasonic composite sound waves to assist in cleaning small particle attachments and micro particle attachments on the surface of the cell piece; it can not only clean a large number of cells at one time, but also is not easy to produce cracks, has a high pass rate after cleaning, and has a good cleaning effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 This is a schematic diagram of the structure of the single crystal silicon solar cell cleaning device of the present invention;

[0020] Figure 2 This is a schematic diagram of the structure of the ultrasonic megasonic composite unit of the present invention;

[0021] Figure 3 It is a schematic diagram of the structure of the metal coupling column of the present invention;

[0022] Figure 4 It is a schematic diagram of the projection of the symmetry plane of the present invention onto the base circle;

[0023] Figure 5 It is a schematic diagram of the structure of the hollow cavity of the present invention;

[0024] Figure 6 is a curve diagram showing the change of the ultrasonic frequency of the ultrasonic vibrator and the removal rate xk of small particle attachments;

[0025] Figure 7 This is a curve diagram of the change of the megasonic frequency of the megasonic oscillator and the removal rate wk of microparticle attachments. DETAILED DESCRIPTION

[0026] In order to make the purpose, technical solution and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0027] In the description of the present invention, it should be noted that, unless otherwise specified, "multiple" means two or more than two; the directions or positional relationships indicated by the terms "upper", "lower", "left", "right", "inner", "outer", "front end", "rear end", "head", "tail", etc. are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", "third", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0028] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0029] Example 1

[0030] like Figures 1 to 5 As shown, the monocrystalline silicon solar cell cleaning device comprises a cleaning tank 10, wherein a metal grid 11 and an ultrasonic megasonic composite array are arranged inside the cleaning tank 10, wherein the metal grid 11 is fixedly connected to the cleaning tank 10, and the cleaning tank 10 is divided by the metal grid 11 into a cleaning area 13 located above the metal grid 11 and an ultrasonic megasonic composite array installation area 12 located below the metal grid 11; the ultrasonic megasonic composite array is located in the ultrasonic megasonic composite array installation area 12, and the ultrasonic megasonic composite array comprises a plurality of ultrasonic megasonic composite units 20 arranged at equal intervals along the length direction and the width direction of the cleaning tank 10; the ultrasonic megasonic composite unit 20 comprises a metal coupling column 30, wherein an ultrasonic vibrator 21 is installed at one end of the metal coupling column 30, and a megasonic vibrator 22 is installed at the other end of the metal coupling column 30.

[0031] During cleaning, a large number of cells to be cleaned are placed on the metal grid 11 and cleaned in the cleaning area 13; a cleaning agent (such as deionized water) is delivered into the cleaning tank 10 until all the cells to be cleaned are completely submerged.

[0032] The metal coupling column 30 includes at least three cylindrical metal columns 31, and a buffer column 32 coaxial with the metal column 31 is arranged between two adjacent metal columns 31, and the buffer column 32 is connected to the metal column 31 as a whole; notches with arc-shaped cross-sections are respectively arranged on both sides of the buffer column 32, and the two notches are axially symmetrically arranged with a symmetry plane 33 as the symmetry axis, and the symmetry plane 33 is colinear with the axis of the buffer column 32; the circle where the outer periphery of the metal column 31 is located is the base circle, and the projections of any two symmetry planes 33 on the base circle do not overlap, and the projections of all symmetry planes 33 on the base circle are centrally symmetrical.

[0033] In this embodiment, six metal pillars 31 are provided, and five buffer pillars 32 are provided.

[0034] The metal columns 31 are arranged in sequence from the head end of the metal coupling column 30 to the tail end of the metal coupling column 30. The third metal column 31 and the fourth metal column 31 are both provided with a hollow cavity 311 inside, and the hollow cavity 311 is filled with a granular medium; screw holes 312 are respectively provided on both sides of the hollow cavity 311, and the screw holes 312 are connected to the hollow cavity 311; and a hole plug 34 is provided at the screw hole 312.

[0035] The ratio of the total volume of the granular medium to the volume of the hollow cavity 311 is x, 2 / 3≤x≤3 / 4; x is preferably 0.71.

[0036] The granular medium is prepared by mixing pomegranate sand and glassy carbon in a mass ratio of 12:1. The particle size of the pomegranate sand is 0.1-0.2 mm, and the particle size of the glassy carbon is 10-12 μm.

[0037] The ratio of the length of the metal column 31 to the length of the buffer column 32 is y, 1.1≤y≤1.3, and y is preferably 1.2; the maximum depth of the notch is f, and the minimum thickness of the buffer column 32 is g, 1.3≤g / f≤1.6, and g / f is preferably 1.4.

[0038] The ratio of the megasonic frequency of the megasonic vibrator 22 to the ultrasonic frequency of the ultrasonic vibrator 21 is 35.

[0039] The megasonic frequency of the megasonic vibrator 22 is 0.91 MHz, and the ultrasonic frequency of the ultrasonic vibrator 21 is 26 kHz.

[0040] Reference Example 1

[0041] An ultrasonic cleaning tank is used for cleaning, and the ultrasonic frequency of all ultrasonic vibrators in the ultrasonic cleaning tank is 26kHz.

[0042] Reference Example 2

[0043] A megasonic cleaning tank is used for cleaning, and the megasonic frequency of all megasonic oscillators in the megasonic cleaning tank is 0.91 MHz.

[0044] Comparative Example A1

[0045] In this example, the only difference from the first embodiment is that the ultrasonic vibrators 21 in this example are all replaced by megasonic vibrators 22, and the rest are the same.

[0046] Comparative Example A2

[0047] In this example, the only difference from the first embodiment is that all the megasonic vibrators 22 in this example are replaced by ultrasonic vibrators 21, and the rest are the same.

[0048] Comparative Example A3

[0049] In this example, the only difference from Example 1 is that in this example, the metal coupling column 30 is only provided with a metal column 31, and no buffer column 32 is provided; that is, the metal coupling column 30 is composed of a whole metal column 31, and the metal column 31 is a solid column; the rest are the same.

[0050] Comparative Example A4

[0051] In this example, the only difference from Example 1 is that in this example, the metal coupling column 30 is only provided with a metal column 31, and no buffer column 32 is provided; that is, the metal coupling column 30 is composed of a whole metal column 31, and the metal column 31 is a hollow column with a hollow cavity 311; the rest are the same.

[0052] Comparative Example A5

[0053] In this example, the only difference from the first embodiment is that the metal coupling column 30 is not provided in this example, and the ultrasonic vibrator 21 and the megasonic vibrator 22 are only installed on the wall of the cleaning tank 10; the rest are the same.

[0054] Comparative Example B1

[0055] In this example, the only difference from the first embodiment is that in this example, five metal pillars 31 are provided and four buffer pillars 32 are provided, and the rest are the same.

[0056] Comparative Example B2

[0057] In this example, the only difference from the first embodiment is that in this example, 7 metal pillars 31 are provided and 6 buffer pillars 32 are provided, and the rest are the same.

[0058] Comparative Example B3

[0059] In this example, the only difference from the first embodiment is that in this example, two adjacent symmetry planes 33 are vertically arranged, and the rest are the same.

[0060] Comparative Example B4

[0061] In this example, the only difference from the first embodiment is that all the symmetry planes 33 in this example are coplanarly arranged, and the rest are the same.

[0062] Comparative Example C1

[0063] In this example, the only difference from Example 1 is that graphite particles are used to replace glassy carbon, and the rest is the same.

[0064] Comparative Example C2

[0065] In this example, the only difference from Example 1 is that activated carbon particles are used to replace glassy carbon, and the rest is the same.

[0066] Comparative Example C3

[0067] In this example, the only difference from Example 1 is that the granular medium in this example is all pomegranate sand, and the rest is the same.

[0068] Comparative Example C4

[0069] In this example, the only difference from Example 1 is that the granular media in this example are all glassy carbon, and the rest are the same.

[0070] Comparative Example C5

[0071] In this example, the only difference from the first embodiment is that x=1 in this example, and the rest are the same.

[0072] Cleaning Characterization Test

[0073] 1. Press a layer of hot melt adhesive film on the surface of the battery cell (temperature of 120-125°C, pressure of 1 bar), and then soak the battery cell with the hot melt adhesive film on the surface in 75% alcohol for 10 minutes. Alcohol can harden the hot melt adhesive film, which is convenient for subsequent tearing off of the hot melt adhesive film; then, take out the battery cell with the hot melt adhesive film, wipe it dry, and tear off the hot melt adhesive film on the surface of the battery cell. At this time, there are a large number of particle attachments attached to the surface of the battery cell. Then, put it into an ultrasonic cleaning tank. The cleaning agent in the ultrasonic cleaning tank is 75% alcohol. The ultrasonic frequency during ultrasonic cleaning is 35kHz. Clean until the distribution density of small particle attachments on the surface of the battery cell is 100-120 / cm 2 The particle size of small particles is 30-200 μm; the distribution density of microparticles is 300-350 / cm 2 The particle size of the micro-particle attachments is less than 30μm; the large particle attachments with a particle size greater than 200μm have been completely washed away; in this way, the battery cell sample is obtained.

[0074] 2. Use an electron microscope to randomly measure 20 locations on the battery cell sample, measure the distribution density of small particle attachments and the distribution density of micro particle attachments respectively, take the average, and record them as the initial distribution density of small particle attachments and the initial distribution density of micro particle attachments respectively.

[0075] 3. Place the cell samples in a cleaning tank 10 for cleaning. The cleaning agent is deionized water. Place 10 cells in each cleaning tank 10 and mark them. Clean for 30 minutes. After cleaning, take out the cell samples, blow dry them, and use an electron microscope to randomly measure 20 locations of the cleaned cell samples. Measure the distribution density of small particle attachments and the distribution density of micro particle attachments, respectively, and take the average values, which are recorded as the distribution density of small particle attachments after cleaning and the distribution density of micro particle attachments after cleaning, respectively.

[0076] The removal rate of small particle attachments xk = (initial distribution density of small particle attachments - distribution density of small particle attachments after cleaning) / initial distribution density of small particle attachments;

[0077] The removal rate of microparticle attachment wk = (initial distribution density of microparticle attachment - distribution density of microparticle attachment after cleaning) / initial distribution density of microparticle attachment.

[0078] Crack rate = number of battery cell samples with cracks / total number of battery cell samples.

[0079] The test results are shown in Table 1:

[0080] Table 1

[0081] xk(%) wk(%) Crack rate (%) Example 1 100 99.1 0 Reference Example 1 10.9 0.8 25 Reference Example 2 0.5 0 0 Comparative Example A1 0.3 0.1 0 Comparative Example A2 9.1 0.1 30 Comparative Example A3 100 8.8 10 Comparative Example A4 89.5 13.3 0 Comparative Example A5 55.2 36.1 5 Comparative Example B1 100 19.7 0 Comparative Example B2 100 50.5 0 Comparative Example B3 100 22.3 0 Comparative Example B4 100 33.7 5 Comparative Example C1 100 98.8 30 Comparative Example C2 100 97.9 50 Comparative Example C3 100 72.5 35 Comparative Example C4 100 99.2 45 Comparative Example C5 95.6 88.3 5

[0082] From Comparative Examples A1 to A5, it can be seen that the unique structure of the metal coupling column 30 can couple and compound ultrasonic waves and megasonic waves, and the generated composite sound waves have a very good effect on removing hot melt adhesive particles on the surface of the battery cell. In addition, the metal coupling column 30 can only couple and compound megasonic waves with ultrasonic waves, but cannot couple and compound megasonic waves with megasonic waves or ultrasonic waves with ultrasonic waves.

[0083] It can be seen from comparative examples B1 to B4 that the number of buffer columns 32 determines the angle between the projections of two adjacent symmetry planes 33 on the base circle. If the angle is too large or too small, the removal effect of the composite sound wave on micro-particle attachments will be affected.

[0084] From comparative examples C1 to C5, it can be seen that, firstly, the metal coupling column 30 cannot be a solid column; a granular medium with a certain gap is used to balance the influence of excessive ultrasound on the battery cell, thereby avoiding cracks in the battery cell. Different materials of granular media have different resonance effects under the action of composite sound waves, and different ultrasound energy suppression effects.

[0085] The granular media of different materials have different packing densities and different absorption of sound waves. If the x value is small, the final ultrasonic energy suppression effect is limited. In addition, if the x value is too large, it will be too densely packed, and the final ultrasonic energy suppression effect will decrease.

[0086] Parameters such as y and g / f will significantly affect the coupling and composite effects of the metal coupling column 30, especially the buffer column 32, on ultrasound and megasonics.

[0087] Experimental Example 1

[0088] When the megasonic frequency of the megasonic vibrator 22 is 0.91 MHz, the ultrasonic frequency of the ultrasonic vibrator 21 varies within the range of 20 to 50 kHz. It is found that the removal rate xk of small particle attachments is mainly affected. The variation curve of the removal rate xk of small particle attachments is shown in FIG. Figure 6 .

[0089] Depend on Figure 6 It can be seen that in the present invention, the ultrasonic frequency of the ultrasonic vibrator 21 is preferably 26 kHz.

[0090] Experimental Example 2

[0091] When the ultrasonic frequency of the ultrasonic vibrator 21 is 26 kHz, the megasonic frequency of the megasonic vibrator 22 varies within the range of 0.85 to 0.95 MHz. It is found that the removal rate wk of the microparticle attachments is mainly affected. The variation curve of the removal rate wk of the microparticle attachments is shown in FIG. Figure 7 .

[0092] Depend on Figure 7 It can be seen that in the present invention, the megasonic frequency of the megasonic vibrator 22 is 0.91 MHz.

[0093] Example 2

[0094] like Figure 2 As shown, the end of the metal coupling column 30 is integrally connected with a plug 23 , and the vibration ends of the ultrasonic vibrator 21 and the megasonic vibrator 22 are both fixedly connected with a connector 24 , and the upper end of the connector 24 is provided with a slot matching the plug 23 .

[0095] If they are fixedly connected or welded together, the end of the metal coupling column 30 and the vibration end of the ultrasonic vibrator 21 / the vibration end of the megasonic vibrator 22 are not convenient to disassemble and replace. Secondly, the welding point is subjected to continuous strong stimulation by the composite sound waves of ultrasound and megasonics, which will accelerate fatigue and easily generate a large number of cracks.

[0096] Example 3

[0097] To facilitate installation of the hole plug 34 and ensure sealing, the outer side walls of the third metal column 31 and the fourth metal column 31 are fixedly connected with gaskets 35 adapted to the hole plug 34, and the gaskets 35 and the hole plug 34 are coated with sealant for sealing.

[0098] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A single crystal silicon solar cell cleaning device, comprising a cleaning tank (10), characterized in that: A metal grid (11) and an ultrasonic megasonic composite array are arranged inside the cleaning tank (10); the metal grid (11) is fixedly connected to the cleaning tank (10); the cleaning tank (10) is divided by the metal grid (11) into a cleaning area (13) located above the metal grid (11) and an ultrasonic megasonic composite array installation area (12) located below the metal grid (11); the ultrasonic megasonic composite array is located in the ultrasonic megasonic composite array installation area (12); the ultrasonic megasonic composite array comprises a plurality of ultrasonic megasonic composite units (20) arranged at equal intervals along the length direction and the width direction of the cleaning tank (10); the ultrasonic megasonic composite unit (20) comprises a metal coupling column (30); an ultrasonic vibrator (21) is installed at one end of the metal coupling column (30), and a megasonic vibrator (22) is installed at the other end of the metal coupling column (30).

2. A single crystal silicon solar cell cleaning device according to claim 1, characterized in that: The end of the metal coupling column (30) is integrally connected with a plug (23), the vibration end of the ultrasonic vibrator (21) and the vibration end of the megasonic vibrator (22) are both fixedly connected with a connector (24), and the upper end of the connector (24) is provided with a slot matching the plug (23).

3. A single crystal silicon solar cell cleaning device according to claim 1, characterized in that: The metal coupling column (30) comprises at least three cylindrical metal columns (31), a buffer column (32) coaxial with the metal column (31) is arranged between two adjacent metal columns (31), and the buffer column (32) and the metal column (31) are connected as a whole; notches with arc-shaped cross sections are respectively arranged on both sides of the buffer column (32), and the two notches are arranged axially symmetrically with a symmetry plane (33) as a symmetry axis, and the symmetry plane (33) and the axis of the buffer column (32) are colinear; the circle where the outer periphery of the metal column (31) is located is a base circle, the projections of any two symmetry planes (33) on the base circle do not overlap, and the projections of all symmetry planes (33) on the base circle are arranged in a central symmetry.

4. A single crystal silicon solar cell cleaning device according to claim 3, characterized in that: Six metal columns (31) are provided, and five buffer columns (32) are provided.

5. A single crystal silicon solar cell cleaning device according to claim 4, characterized in that: The metal columns (31) are arranged in sequence from the head end of the metal coupling column (30) to the tail end of the metal coupling column (30); a hollow cavity (311) is provided inside the third metal column (31) and the fourth metal column (31); the hollow cavity (311) is filled with a granular medium; screw holes (312) are provided on both sides of the hollow cavity (311); the screw holes (312) are communicated with the hollow cavity (311); and a hole plug (34) is provided at the screw hole (312).

6. A single crystal silicon solar cell cleaning device according to claim 5, characterized in that: The ratio of the total volume of the granular medium to the volume of the hollow cavity (311) is x, 2 / 3≤x≤3 / 4.

7. The single crystal silicon solar cell cleaning device according to claim 5, characterized in that: The granular medium is prepared by mixing pomegranate sand and glassy carbon in a mass ratio of 12:

1. The particle size of the pomegranate sand is 0.1-0.2 mm, and the particle size of the glassy carbon is 10-12 μm.

8. The single crystal silicon solar cell cleaning device according to claim 5, characterized in that: The outer side walls of the third metal column (31) and the fourth metal column (31) are fixedly connected with washers (35) matched with the hole plugs (34), and the washers (35) and the hole plugs (34) are both coated with sealant for sealing.

9. The single crystal silicon solar cell cleaning device according to claim 3, characterized in that: The ratio of the length of the metal column (31) to the length of the buffer column (32) is y, 1.1≤y≤1.3; the maximum depth of the notch is f, and the minimum thickness of the buffer column (32) is g, 1.3≤g / f≤1.

6.

10. The single crystal silicon solar cell cleaning device according to claim 1, characterized in that: The ratio of the megasonic frequency of the megasonic vibrator (22) to the ultrasonic frequency of the ultrasonic vibrator (21) is 35.

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