Plasma regulation and control device based on radio frequency inductive coupling technology

Abstract

The invention discloses a plasma regulation and control device based on a radio frequency inductive coupling technology, and relates to the technical field of plasma parameter regulation and control. In order to solve the technical problems in the prior art that although traditional gradient generation equipment can generate a high-density electrode, the time is short, and an experimental environment electrode and a continuous controllable electrode are difficult to generate plasmas with enough large area while ensuring the discharge uniformity, the invention provides a gradient generation device. According to the technical scheme provided by the invention, the plasma regulation and control device based on the radio frequency inductive coupling technology comprises a discharge chamber; the annular antenna main body sleeves the outer wall of the discharge chamber and is used for generating plasma in the discharge chamber; the binding post is arranged on the loop antenna and is used for connecting the input end and the output end of the radio frequency power supply; the rake type probe array is used for measuring the electron density and temperature of the plasma; and the servo system is used for driving the rake type probe array to move. The method is suitable for being applied to plasma parameter regulation and control work.

Description

Technical Field

[0001] The invention relates to the technical field of plasma parameter regulation, and in particular to plasma regulation based on radio frequency inductive coupling technology. Background Art

[0002] When an aircraft flies at high speed at a high Mach number in the atmosphere, the intense friction between its surface and the air will cause the oxygen and nitrogen components in the air to ionize and react, and the strong compression effect produced by the shock wave will produce a plasma layer of a certain thickness on the surface of the aircraft, which is called a plasma sheath. When the aircraft communicates with the ground, the electromagnetic waves will be reflected and refracted when passing through the plasma sheath, which will weaken their energy and produce a phenomenon similar to metal shielding, causing the communication signal to attenuate or even interrupt, which is called the communication blackout problem. Early research on the blackout problem was limited, and the blackout time was short (tens of seconds) under the flight conditions at that time. Methods to avoid blackouts were usually used, such as using a memory to record signals and performing slow recording and fast sending of signals. In recent years, with the rapid development of near-space aircraft, based on their high flight speed, long flight time and other flight characteristics, as well as increasingly complex appearance designs, the existence time of the plasma sheath has increased, the flow field distribution on the aircraft surface has become more complex, and the frequency and parameter range of dynamic changes have become larger. Traditional methods have become ineffective or difficult to implement. The communication blackout problem restricts the development of near-space high-speed aircraft and is a major scientific issue that needs to be solved urgently.

[0003] In order to study the communication blackout problem caused by plasma sheath, it is a prerequisite to figure out the generation mechanism and distribution characteristics of plasma sheath. At present, the mainstream research methods at home and abroad can be divided into three categories: 1. Flight experiment research 2. Numerical simulation research 3. Ground experiment research. Among them, the advantage of flight experiment is that it can fully reproduce the morphology of plasma sheath under actual flight conditions, but its experimental cost is high, the risk is high, the repeatability is poor, and the mutual influence and difficulty in distinguishing between variables under complex flight conditions are also obvious. With the continuous improvement of computer performance in recent years, numerical simulation methods have been gradually applied to various scientific fields. For example, by using the WKB method to simulate slowly varying inhomogeneous media, the plasma sheath can be treated as a small multi-segment uniform medium, and then the characteristics and laws of the plasma sheath on electromagnetic waves can be analyzed. The advantage of numerical simulation is that it can simulate the working conditions that cannot be set by adjusting the parameter variables, and provide guidance for subsequent research. However, the results obtained by numerical simulation are still somewhat different from the actual flight data, and there may be a large difference from the actual situation. At present, the most important research method is to conduct ground experimental research. An experimental device that can produce similar plasma sheath characteristics is built on the ground. This can not only ensure the repeatability of the experiment, but also ensure a high degree of similarity with actual flight conditions. At the same time, some other issues of the interaction between electromagnetic waves and plasma can be studied.

[0004] Existing plasma sheath ground simulation devices can be divided into two categories: one is to use high temperature and high-speed fluid to generate plasma, mainly including shock tubes, etc.; the other is to use gas discharge to generate plasma, mainly including arc plasma wind tunnels, low-temperature plasma devices, etc. Shock tubes use high-pressure gas to break the membrane to generate ultra-high sound speed shock waves with a speed of tens of Mach, which then compresses the working gas in the tube to generate plasma, and its electron density can be as high as 10 13 cm -3 However, the duration of the plasma generated by the shock tube is only in the microsecond range, which requires the experimental instrument to have a fast-response trigger function, and all experimental measurements must be completed in a very short time. The requirements for the measurement equipment are extremely high, and it is difficult to conduct experiments that require a long time, such as antenna performance measurement. Moreover, the parameters such as air pressure and temperature of each experiment will affect the electron density, and the repeatability of the experiment cannot be guaranteed. Figure 1 shown.

[0005] Plasma wind tunnels use high-power electrodes to generate arcs to heat the working gas, causing it to ionize. The plasma density can be controlled by adjusting the discharge power, allowing for long-term continuous discharge. However, the experimental environment of a plasma wind tunnel is relatively harsh. A high temperature environment of thousands of degrees can cause ablation of metal materials. On the one hand, impurities will be introduced into the plasma, affecting the discharge state and plasma parameters, and affecting the transmission characteristics of electromagnetic waves. On the other hand, it may cause irreversible damage to the experimental apparatus and measuring equipment. In addition, the plasma generated by a plasma wind tunnel has poor uniformity and cannot simulate the shape of the plasma sheath under actual flight conditions. For example Figure 2 shown.

[0006] Low-temperature plasma devices based on gas discharge are widely used in the fields of plasma purification and plasma etching. There are many forms of gas discharge, such as glow discharge, DC pulse discharge, radio frequency discharge (CCP / ICP / Helicon radio frequency discharge), microwave discharge, etc. Different discharge forms require different discharge conditions, plasma density ranges, and plasma discharge areas. Researchers at home and abroad have designed gas discharge devices to simulate the plasma sheath environment under flight conditions. Xidian University has developed a plasma device based on glow discharge, which can produce plasma with a thickness of up to 18 cm, a diameter of up to 30 cm, and a maximum electron density of up to 10 11 cm -3 , and has certain plasma dynamic characteristics. The device also has some shortcomings, such as the small variable range of plasma density and other parameters, the slow response of electron density to power changes, and the low controllability of dynamic simulation. Figure 3 shown.

[0007] From the perspective of the research needs of the black barrier problem of near-space hypersonic vehicles, it is necessary to further develop a plasma sheath environment with a long discharge time, a large enough discharge volume (capable of covering the surface of the vehicle), and a high enough electron number density. The plasma electron density generated by radio frequency inductively coupled discharge (RF-ICP) is high, and the electron density can be adjusted by adjusting the RF power supply power between 10 10 cm -3～ 10 13 cm -3The principle is to generate current by feeding RF power into the RF antenna, generate an alternating magnetic field around the antenna, and then induce an electric field. After the electric field accelerates the electrons, the energetic electrons collide with the working gas particles, ionize and generate and maintain plasma. It has the advantages of good discharge uniformity, simple device structure (plasma can be generated without the need for external magnetic field and other methods), low cost, and long-term steady-state discharge. It is an ideal solution for simulating the plasma sheath environment of hypersonic aircraft. However, the main problem with RF inductively coupled discharge is that it is difficult to generate a large enough area of ​​plasma while ensuring discharge uniformity. Summary of the invention

[0008] In order to solve the technical problems existing in the prior art, the conventional gradient generation equipment, such as shock tube or arc electrode wind tunnel, can generate high-density electrodes, but the time is short, the experimental environment electrodes and the continuous controllable electrodes are difficult to generate a sufficiently large area of ​​plasma while ensuring discharge uniformity. The technical solution provided by the present invention is:

[0009] A plasma control device based on radio frequency inductive coupling technology, the device comprising:

[0010] a discharge chamber;

[0011] A ring antenna body is sleeved on the outer wall of the discharge chamber and is used to generate plasma in the discharge chamber;

[0012] A binding post is provided on the loop antenna and is used to connect the input and output terminals of the radio frequency power supply;

[0013] a rake probe array for measuring the electron density and temperature of the plasma;

[0014] A servo system is used to drive the rake probe array to move.

[0015] Furthermore, a preferred embodiment is provided, wherein there are at least two annular antenna bodies, which are coaxially sleeved on the outer wall of the discharge chamber.

[0016] Furthermore, a preferred embodiment is provided, wherein the main body of the ring antenna is a circular ring structure, the circular ring has an opening, and the binding posts are two, respectively connected to two ends of the opening.

[0017] Furthermore, a preferred embodiment is provided, wherein the device further comprises a pagoda head, which is arranged on the terminal post and is used for connecting a pipe of a water cooling system.

[0018] Furthermore, a preferred embodiment is provided, wherein the rake probe array comprises at least two probes arranged in parallel along a line.

[0019] Furthermore, a preferred embodiment is provided in which a servo system drives the rake probe array to perform reciprocating motion along the axial direction of the probe.

[0020] Based on the same inventive concept, the present invention also provides a plasma control method based on radio frequency inductive coupling technology, the method is implemented based on the device, and the method includes:

[0021] The step of generating plasma according to a preset radio frequency power;

[0022] Steps for sending drive instructions;

[0023] The step of adjusting the radio frequency power according to the collected electron density and temperature signals of the plasma.

[0024] Based on the same inventive concept, the present invention also provides a computer storage medium for storing a computer program, and when the computer reads the computer program, the computer executes the described method.

[0025] Based on the same inventive concept, the present invention also provides a computer, including a processor and a storage medium. When the processor reads a computer program stored in the storage medium, the computer executes the method described.

[0026] Based on the same inventive concept, the present invention also provides a computer program product, which is a computer program. When the computer program is executed, the method described above is implemented.

[0027] Compared with the prior art, the technical solution provided by the present invention is beneficial in that:

[0028] First, the dual-stage pump design of the vacuum system significantly improves experimental efficiency. The combination of the front-stage mechanical pump and the molecular pump ensures that the required vacuum degree is reached quickly and stably, allowing the experiment to be ready in a shorter time. Compared with the traditional single-stage pump system, this design can provide higher reliability under complex experimental conditions, thereby reducing experimental errors and improving data repeatability.

[0029] Secondly, the five large-aperture annular RF antennas in the RF system achieve uniform discharge over a large area, avoiding the problem of uneven electron density caused by the standing wave effect in traditional RF equipment. This design allows the plasma to reach a thickness of 50 cm and a diameter of 30 cm, significantly improving the repeatability and reliability of the experiment and better simulating the plasma characteristics in a real flight environment.

[0030] The introduction of a probe array combined with a microwave diagnostic system provides high temporal and spatial resolution monitoring of plasma parameters. The real-time acquisition of electron density and temperature distribution provides precise data support for plasma regulation, greatly improving the accuracy and effectiveness of experimental data compared to traditional single measurement methods. In addition, this combination allows experimenters to flexibly adjust discharge parameters according to the instantaneous state of the plasma to ensure that the plasma is within the expected range. This efficient feedback mechanism facilitates deeper research.

[0031] The real-time power regulation function of the RF power supply enables dynamic adjustment of energy input under high-power discharge conditions, simulating the variable working conditions of the aircraft during actual flight, thereby better understanding the impact of plasma on the propagation characteristics of electromagnetic waves.

[0032] Finally, the insulation design of the RF antenna enhances the safety and stability of the equipment, ensuring long-term operation without failure under high power conditions. This design reduces experimental interruptions caused by equipment damage and ensures the continuity of the experiment and the integrity of the data.

[0033] It is suitable for use in plasma parameter regulation. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] Figure 1 is a schematic diagram of the shock tube structure;

[0035] Figure 2 This is a schematic diagram of the plasma wind tunnel structure;

[0036] Figure 3 This is a structural diagram of a glow discharge plasma generating device;

[0037] Figure 4 is a schematic diagram of the radio frequency antenna structure;

[0038] Figure 5 Schematic diagram of antenna connection lines in different configurations, from a bird's-eye view;

[0039] Figure 6 This is a schematic diagram of the structure of the probe diagnosis system;

[0040] Figure 7 It is a schematic diagram of the overall structure of the device;

[0041] Figure 8 for Figure 7 Side view of.

[0042] Among them, 1 is the main body of the ring antenna; 2 is the terminal; 3 is the pagoda head; 4 is the discharge chamber; 5 is the servo system; 6 is the probe support frame; 7 is the rake probe array; 8 is the device support frame; 11 is the antenna system. DETAILED DESCRIPTION

[0043] In order to make the advantages and benefits of the technical solution provided by the present invention more clearly reflected, the technical solution provided by the present invention is now further described in detail with reference to the accompanying drawings, specifically:

[0044] Embodiment 1: This embodiment provides a plasma control device based on radio frequency inductive coupling technology, the device comprising:

[0045] Discharge chamber 4;

[0046] The ring antenna body 1 is sleeved on the outer wall of the discharge chamber 4 and is used to generate plasma in the discharge chamber 4;

[0047] Binding post 2, arranged on the loop antenna, for connecting the input and output ends of the radio frequency power supply;

[0048] A rake probe array 7, for measuring the electron density and temperature of the plasma;

[0049] The servo system 5 is used to drive the rake probe array 7 to move.

[0050] The rake probe array 7 is fixed by the probe support frame 6 .

[0051] The plasma control device based on radio frequency inductive coupling technology is fixed by a device support frame 8 .

[0052] The loop antenna body 1 , the terminal post 2 and the pagoda head 3 constitute an antenna system 11 .

[0053] Specific:

[0054] The plasma control device based on radio frequency inductive coupling technology consists of three main systems: vacuum system, radio frequency system and diagnostic system. The following is a detailed summary of each system component and their connection and coordination relationship:

[0055] 1. Vacuum system

[0056] The vacuum system is used to create the low-pressure environment required for plasma generation and ensure the stability of discharge. It mainly consists of the following components:

[0057] Vacuum pump group: divided into two stages, the front stage is a mechanical pump, responsible for rough pumping, the ultimate vacuum degree can reach 10 -1 Pa; the second stage is the molecular pump. When the rough pumping reaches a certain vacuum degree, the molecular pump is started. The ultimate vacuum degree can reach 10 -4 Pa. The two-stage pump is used in combination to reach the required discharge gas pressure in a short time.

[0058] Vacuum chamber: The chamber is used to contain the generation of plasma, and its sealing and vacuum requirements are ensured by argon arc welding technology. The chamber is equipped with a uniformly distributed capillary structure, which is matched with a gas flow meter to ensure that the working gas is evenly distributed in the chamber, achieving uniform discharge over a large area.

[0059] Resistance gauge and ionization gauge: used to monitor the vacuum degree in the vacuum chamber, ranging from 10 -4 Pa to atmospheric pressure (10 5 Pa).

[0060] Gas flow meter: controls the flow of working gas to ensure uniform distribution of gas in the chamber and assist in achieving stable discharge.

[0061] 2. RF system

[0062] The RF system is the core of plasma generation, responsible for generating RF electric field to ionize the working gas. The system includes the following components:

[0063] RF antenna: The device is equipped with five sets of large-caliber annular RF antennas. The antennas are made of stainless steel, which has high strength and is not easy to deform, ensuring high coaxiality between multiple antennas. There is a certain distance between each set of antennas to facilitate the distribution and regulation of axial electron density. The surface of the antenna is sprayed with insulating material, and the internal water cooling design is used to reduce the temperature and prevent damage to the antenna material due to high temperature.

[0064] RF power supply: The power supply frequency is 13.56MHz, and the maximum RF power can reach 2500W. The RF power supply is connected to the antenna through a matcher to ensure that the RF power can be effectively coupled to prevent large-scale reflection. The matcher can adjust the RF power in real time, thereby realizing dynamic control of the plasma, and can monitor the reflected power in real time.

[0065] Matcher: used to adjust the impedance matching between the antenna and the power supply, minimize the reflected power, and improve the coupling efficiency of the RF power. At the same time, it can monitor and adjust the reflected power in real time to prevent the discharge effect from deteriorating due to poor coupling.

[0066] 3. Diagnostic system

[0067] The diagnostic system is used to monitor plasma parameters in real time, including electron density, temperature, etc., to ensure the accuracy and repeatability of experimental data. The main components are as follows:

[0068] Probe diagnostic system: The system is equipped with six probes, and the motion mechanism is controlled by the servo system 5 to drive the probe array to move axially and radially. The probe array is used to measure the plasma electron density and temperature. The measurement data is transmitted to the back-end acquisition circuit through the high-temperature coaxial line and collected by the data acquisition card. The sampling rate can reach up to 2M / s, ensuring high temporal and spatial resolution diagnosis.

[0069] Microwave diagnostic system: Quartz wave-transmitting windows are provided at both axial ends of the discharge chamber 4, where transmitting and receiving antennas are placed respectively. In conjunction with a vector network analyzer, the phase change of microwaves passing through the plasma is measured, thereby inferring the parameters of the plasma. This non-contact measurement method helps to obtain more accurate plasma information. Connection and coordination relationship between components Coordination between vacuum system and radio frequency system: The vacuum system is responsible for providing a low-pressure environment for the radio frequency system. A discharge area is provided in the vacuum chamber. The radio frequency antenna is located in the discharge chamber 4. The antenna is powered by a radio frequency power supply to form an alternating magnetic field in the chamber, thereby generating plasma.

[0070] Cooperation between the vacuum system and the radio frequency system: The vacuum system is responsible for providing a low-pressure environment for the radio frequency system. A discharge area is provided in the vacuum chamber. The radio frequency antenna is located in the discharge chamber 4. The antenna is powered by a radio frequency power supply to form an alternating magnetic field in the chamber, thereby generating plasma. The close cooperation between the vacuum system and the radio frequency system ensures the stability of the low-pressure environment and the effective discharge of the radio frequency antenna, thereby significantly improving the uniformity of the plasma. Compared with the shortcomings of other existing systems in terms of vacuum environment control, such as large fluctuations in vacuum degree and unstable discharge caused by uneven gas distribution, this solution effectively solves the problem of uneven plasma through precise vacuum control and the coordinated work of the radio frequency system, ensuring the consistency and repeatability of the experiment.

[0071] Connections within the RF system: The RF power supply is connected to the RF antenna through a matcher to ensure efficient coupling of the RF power. The RF antenna is located inside the vacuum chamber, which enables the antenna to better generate uniform plasma, and the temperature of the antenna is kept stable through a water cooling system.

[0072] Diagnostic system and other systems: The diagnostic system is directly integrated into the discharge chamber 4 to monitor the generation and characteristics of the plasma. The position of the probe array in the chamber is carefully designed to ensure the accuracy of the measurement data. The microwave diagnostic system interacts with the plasma through a wave-transmitting window and does not interfere with the generation of the plasma.

[0073] Embodiment 2: This embodiment further limits the plasma control device based on radio frequency inductive coupling technology provided in Embodiment 1. There are at least two ring antenna bodies 1 which are coaxially sleeved on the outer wall of the discharge chamber 4.

[0074] Embodiment 3. This embodiment further limits the plasma control device based on radio frequency inductive coupling technology provided in embodiment 1. The ring antenna body 1 is a circular ring structure with an opening. There are two terminal posts 2, which are respectively connected to the two ends of the opening.

[0075] Embodiment 4: This embodiment further limits the plasma control device based on radio frequency inductive coupling technology provided in embodiment 1. The device also includes a pagoda head 3, which is arranged on the terminal 2 and is used to connect the pipe of the water cooling system.

[0076] Embodiment 5: This embodiment further limits the plasma control device based on radio frequency inductive coupling technology provided in Embodiment 1. The rake probe array 7 includes at least two probes arranged in parallel along a line.

[0077] Embodiment 6: This embodiment further limits the plasma control device based on radio frequency inductive coupling technology provided in Embodiment 5. The servo system 5 drives the rake probe array 7 to reciprocate along the axial direction of the probe.

[0078] Embodiment 7: This embodiment provides a plasma control method based on radio frequency inductive coupling technology. The method is implemented based on the device provided in embodiment 1, and the method includes:

[0079] The step of generating plasma according to a preset radio frequency power;

[0080] Steps for sending drive instructions;

[0081] The step of adjusting the radio frequency power according to the collected electron density and temperature signals of the plasma.

[0082] Embodiment 8: This embodiment provides a computer storage medium for storing a computer program. When the computer reads the computer program, the computer executes the method provided in embodiment 7.

[0083] Embodiment 9: This embodiment provides a computer, including a processor and a storage medium. When the processor reads a computer program stored in the storage medium, the computer executes the method provided in embodiment 7.

[0084] Embodiment 10: This embodiment provides a computer program product, which is a computer program. When the computer program is executed, the method provided in embodiment 7 is implemented.

[0085] Implementation Method XI: Combination Figure 4-8This embodiment is described in detail by using specific examples to further describe the technical solution provided above. Specifically:

[0086] Step 1: Vacuum environment preparation

[0087] The gas pressure in the discharge chamber 4 is reduced to a low pressure environment suitable for plasma discharge through a vacuum system.

[0088] Detailed description: First, use a mechanical pump to roughly pump the discharge chamber 4 so that the vacuum degree reaches 10 -1 On this basis, the molecular pump is turned on to further evacuate the vacuum to 10 -4 The ultimate vacuum degree of Pa. The coordinated use of two-stage vacuum pumps can ensure the realization of a low-pressure environment in a short time. The discharge chamber 4 is made of stainless steel material, and the argon arc welding technology is used to ensure its airtightness to avoid gas leakage. At the same time, a uniformly distributed capillary structure is provided to ensure the uniform diffusion of the discharge gas. The stability of the discharge gas pressure is monitored and adjusted by a resistance gauge and an ionization gauge to ensure a suitable vacuum environment.

[0089] Step 2: RF Antenna Installation and Power Supply Preparation

[0090] The radio frequency antenna is installed in the discharge chamber 4 and connected to a radio frequency power source.

[0091] Detailed description: Five groups of large-caliber annular RF antennas are arranged in the discharge chamber 4. The antennas are made of stainless steel with high strength and high coaxiality to ensure the uniformity of the discharge. An appropriate distance is maintained between each group of antennas to facilitate the distribution and regulation of the axial electron density. The RF power supply is a 13.56MHz frequency RF power supply with a maximum power of 2500W to ensure sufficient discharge power. The power supply is connected to the antenna through a matcher to optimize the coupling efficiency of the RF power and reduce power reflection, thereby achieving stable discharge. The surface of the antenna is treated with a double layer of insulating material to ensure safety and long-term stability during discharge. A water cooling design is used internally to reduce the antenna temperature and prevent damage caused by high temperature.

[0092] Step 3: Plasma generation and dynamic control

[0093] Plasma is generated in a vacuum environment through a radio frequency antenna, and its density is controlled.

[0094] Detailed description: The RF power supply supplies power to the antenna through the matcher, forming an alternating magnetic field around the RF antenna, which in turn induces an electric field. The electric field accelerates free electrons, and the electrons collide with the working gas particles, causing the gas to ionize and eventually form plasma. The built-in design of the RF antenna enables the plasma density to respond quickly to changes in RF power, achieving an electron density change from 10 10 cm-3 to 10 12 cm -3 At the same time, by starting and stopping different groups of RF antennas and adjusting the input of RF power, the positional regulation of different electron densities such as uniform, single peak, double peak, etc. can be achieved in the discharge chamber 4.

[0095] Step 4: Plasma parameter diagnosis

[0096] The plasma parameters such as density and temperature are measured through the diagnostic system.

[0097] Detailed description: The diagnostic system consists of two parts: probe diagnosis and microwave diagnosis. Probe diagnosis uses an array of six probes to measure the axial and radial profiles of plasma electron density and temperature. The data is transmitted to the back-end acquisition circuit through a high-temperature coaxial line and collected by a data acquisition card to ensure high temporal and spatial resolution. Microwave diagnosis places the transmitting and receiving antennas through the quartz wave-transmitting windows at both ends of the discharge chamber 4, and cooperates with a vector network analyzer to measure the phase change of microwave propagation in the plasma, thereby calculating the parameters of the plasma.

[0098] Measurements with high temporal and spatial resolution have greatly improved the accuracy and precision of experimental data, and can accurately capture the dynamic changes within the plasma, avoiding data errors caused by inaccurate measurements in traditional low-resolution diagnostic methods.

[0099] Compared with existing low-resolution diagnostic methods, this high-precision diagnostic method can provide more detailed information on plasma characteristics and provide more reliable data support for subsequent experiments and analysis.

[0100] Step 5: Data analysis and experimental results acquisition

[0101] Collect and analyze plasma experimental data to obtain the required experimental results.

[0102] Detailed description: The raw data obtained from the probe and microwave diagnostic system are processed through post-processing, including data denoising, fitting and graphical processing, to obtain the axial and radial distribution diagrams of plasma density and temperature. At the same time, the precise value of plasma electron density is calculated through microwave phase changes to verify the repeatability and stability of the experiment, providing an experimental basis for the study of the communication blackout problem of hypersonic aircraft. Specific embodiments

[0104] Example 1: Plasma Experimental Device for Simulating Aircraft Blackout Environment This example uses the device to generate a large area of ​​uniform plasma in a vacuum chamber to simulate the plasma sheath environment around a hypersonic aircraft. First, the air pressure in the chamber is reduced to 10 -4Pa; then, the built-in RF antenna is powered by RF power to form plasma around the antenna. By adjusting the RF power, the electron density was successfully adjusted from 10 10 cm -3 to 10 12 cm -3 The diagnostic system monitors the plasma parameters in real time through the probe array and microwave measurement. Possible future improvements include further increasing the RF power to increase the upper limit of the plasma electron density and meet more demanding aircraft environment simulation requirements.

[0105] Example 2: Basic Experimental Study of Plasma Physics This example aims to use the device to study the effect of changes in plasma parameters on the propagation of electromagnetic waves. In the experiment, the effect of plasma density on the phase change of electromagnetic wave propagation was studied by adjusting the RF power in stages. The propagation characteristics of electromagnetic waves in plasma were measured under different power and vacuum conditions using a microwave diagnostic system. The experimental results provide support for theoretical research on the interaction between high-frequency electromagnetic waves and plasma. Future improvements may include adding multi-frequency antennas to the RF antenna design to simultaneously study the propagation characteristics of multi-frequency electromagnetic waves.

[0106] Example 3: Material durability test in a high-temperature plasma environment This example uses the device to test the durability of new materials in a high-temperature plasma environment. In a vacuum chamber, a high-density plasma is excited by a radio frequency power supply to form an environment with a temperature of thousands of degrees Celsius. In this environment, a new high-temperature resistant material is placed in the plasma, and the temperature and charge distribution changes on the surface of the material are measured using probes and temperature sensors to evaluate its high-temperature resistance and plasma erosion resistance. Future optimization directions include designing a more efficient cooling system to increase the types and quantities of test materials and expand the application range of the device.

[0107] The technical solution provided by the present invention is further described in detail above through several specific implementation modes in order to highlight the advantages and benefits of the technical solution provided by the present invention. However, the several specific implementation modes described above are not intended to be used as limitations on the present invention. Any reasonable modification and improvement of the present invention, combination of implementation modes and equivalent substitution within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A plasma control device based on radio frequency inductive coupling technology, characterized in that: The device includes: a discharge chamber; A ring antenna body is sleeved on the outer wall of the discharge chamber and is used to generate plasma in the discharge chamber; A binding post is provided on the loop antenna and is used to connect the input and output terminals of the radio frequency power supply; a rake probe array for measuring the electron density and temperature of the plasma; A servo system is used to drive the rake probe array to move.

2. The plasma control device based on radio frequency inductive coupling technology according to claim 1, characterized in that: There are at least two ring antenna bodies, which are coaxially sleeved on the outer wall of the discharge chamber.

3. The plasma control device based on radio frequency inductive coupling technology according to claim 1, characterized in that: The main body of the ring antenna is a circular ring structure, the circular ring has an opening, and the two connecting posts are respectively connected to the two ends of the opening.

4. The plasma control device based on radio frequency inductive coupling technology according to claim 1, characterized in that: The device also includes a pagoda head, which is arranged on the terminal post and is used for connecting the pipeline of the water cooling system.

5. The plasma control device based on radio frequency inductive coupling technology according to claim 1, characterized in that: The rake probe array includes at least two probes arranged in parallel along a line.

6. The plasma control device based on radio frequency inductive coupling technology according to claim 5, characterized in that: The servo system drives the rake probe array to perform reciprocating motion along the axial direction of the probe.

7. A plasma control method based on radio frequency inductive coupling technology, characterized in that: The method is implemented based on the device according to claim 1, and the method includes: The step of generating plasma according to a preset radio frequency power; Steps for sending drive instructions; The step of adjusting the radio frequency power according to the collected electron density and temperature signals of the plasma.

8. A computer storage medium for storing a computing program, characterized in that: When the computer reads the computer program, the computer executes the method of claim 7.

9. A computer, comprising a processor and a storage medium, characterized in that: When the processor reads the computer program stored in the storage medium, the computer executes the method of claim 7 .

10. A computer program product, being a computer program, characterized in that When the computer program is executed, the method of claim 7 is implemented.

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