Cleaning device system and cleaning method for porous ceramic vacuum chuck

Abstract

The invention provides a cleaning device system and a cleaning method for a porous ceramic vacuum chuck, the device system comprises a reservoir, a booster pump, an ultrasonic cleaning device and a filter which are connected through a pipeline to form a circulation loop; the ultrasonic cleaning device comprises an ultrasonic pool and a cleaning device arranged in the ultrasonic pool. The cleaning device system for the porous ceramic vacuum suction cup is simple in structure, polishing scraps and chemical residues in pores can be efficiently removed, the cleaning solution is recycled, waste of resources is avoided, and the cleaning cost is reduced.

Description

Technical Field

[0001] The invention belongs to the technical field of ceramics, and relates to a cleaning device system for a porous ceramic vacuum chuck, and in particular to a cleaning device system and a cleaning method for a porous ceramic vacuum chuck. Background Art

[0002] Porous ceramic vacuum chuck is a kind of bearing platform that fixes the workpiece by the principle of vacuum adsorption. It is widely used in the manufacturing process of semiconductor wafers, such as thinning, cutting, grinding, cleaning and processing.

[0003] The porous ceramic vacuum suction cup is made of porous ceramic material and has the following characteristics: (1) High strength and wear resistance: It has the hard characteristics of ceramic, is resistant to wear and tear, and is not easily scratched or damaged; (2) Long life: The surface shape is well retained, the dressing cycle is long, and the dressing amount is small; (3) High insulation: The material has high insulation and can eliminate static electricity; (4) Reusable: It is easy to dress, and there will be no cracking, fragmentation, or granulation during dressing; (5) Not easy to decompose and generate dust: The ceramic structure is strong and stable, and does not generate dust; (6) Lightweight: The internal structure is uniformly porous and light in weight; (7) Good chemical stability: Through material selection and process control, it is suitable for various corrosive environments.

[0004] However, during the polishing process of the suction cup adsorption surface, polishing dust composed of the suction cup material will be generated, and chemical substances such as polishing liquid will remain in the internal pores, and the semiconductor wafer may be contaminated by the residues or the surface of the wafer may be damaged. Therefore, a cleaning device for a porous ceramic vacuum suction cup is provided to remove polishing debris that has entered the pores, which is of great significance for wafer thinning, etching, cutting, cleaning and other processes.

[0005] CN 116197179A discloses a method for cleaning porous ceramics. The porous ceramics are first cleaned with an ionic solution, and then the porous ceramics are secondly cleaned with a surfactant soaking treatment and an ultrasonic treatment, which can effectively remove tiny particles on the surface of the porous ceramics. Although the method can effectively clean the porous ceramics, chemical residues are left after the cleaning process.

[0006] Currently, the commonly used cleaning method requires the use of a large amount of water (10 to 20 L / min), pure water, etc. to wash away the residue, but the liquid after washing is difficult to reuse because it contains fine residues. Therefore, cleaning the ceramic porous suction cup consumes a large amount of water, which is a problem from both economic and environmental perspectives. In addition, in order to prevent contamination from being detected on the back of the suction cup, the porous ceramic suction cup needs to be cleaned repeatedly.

[0007] Therefore, it is necessary to provide a porous vacuum suction cup cleaning device and a cleaning method that have a simple structure and can efficiently remove polishing debris and chemical residues in pores. Summary of the invention

[0008] The object of the present invention is to provide a cleaning device system and a cleaning method for a porous ceramic vacuum chuck. The device system has a simple structure and can efficiently remove polishing debris and chemical residues in the pores.

[0009] In order to achieve the purpose of the invention, the present invention adopts the following technical solutions:

[0010] In a first aspect, the present invention provides a cleaning device system for a porous ceramic vacuum chuck, the device system comprising a water reservoir, a booster pump, an ultrasonic cleaning device and a filter, and connected by pipelines to form a circulation loop;

[0011] The ultrasonic cleaning device comprises an ultrasonic pool and a cleaning device arranged inside the ultrasonic pool.

[0012] The present invention solves the problem that a large amount of water, pure water, etc. are needed to clean the porous ceramic vacuum chuck in the prior art by forming a closed loop with a water reservoir, a booster pump, an ultrasonic cleaning device and a filter;

[0013] In addition, the present invention increases the water flow by using a booster pump and combines ultrasonic vibration assistance to achieve efficient cleaning of the porous ceramic vacuum suction cup, avoids the use of chemical reagents, and reduces cleaning costs.

[0014] As a preferred technical solution of the present invention, the cleaning device includes a box body and a box cover that are correspondingly arranged;

[0015] Preferably, the box body and the box cover are assembled by a first buckle seal.

[0016] Preferably, a sealing gasket is provided between the box body and the box cover.

[0017] Preferably, the box body and the box cover are made of stainless steel.

[0018] In the present invention, the sealing gasket and the first buckle cooperate with each other to seal the box body and the box cover, which prevents the liquid in the ultrasonic pool from flowing into the cleaning device and also prevents the clean water in the cleaning device from overflowing during the flushing process to cause pressure relief.

[0019] As a preferred technical solution of the present invention, the outer wall of the box body is symmetrically provided with a water inlet and a water outlet.

[0020] Preferably, the water inlet is connected to a booster pump.

[0021] Preferably, the water outlet is connected to a filter.

[0022] As a preferred technical solution of the present invention, a fixing tool is arranged inside the box.

[0023] Preferably, the fixing fixture is used for clamping a porous ceramic vacuum chuck.

[0024] Preferably, the fixing fixture comprises a first concave fixture and a second concave fixture.

[0025] Preferably, the first concave tooling and the second concave tooling are fixedly assembled by a second buckle.

[0026] Preferably, a silicone gasket is provided on the outer surface of the first concave tooling and the second concave tooling close to one end of the porous ceramic vacuum suction cup.

[0027] In the present invention, the second clip and the silicone gasket cooperate with each other, so that the porous ceramic vacuum suction cup to be cleaned can be tightly fixed in the fixed tooling, thereby preventing water from flowing through the gap between the fixed tooling and the porous ceramic vacuum suction cup to be cleaned during the clean water flushing process, causing partial pressure and thus causing incomplete cleaning.

[0028] As a preferred technical solution of the present invention, an observation window is provided on the outer wall of the box.

[0029] Preferably, the observation window is used to observe the cleaning condition of the porous ceramic vacuum chuck.

[0030] Preferably, the material of the observation window includes resin.

[0031] As a preferred technical solution of the present invention, a first pressure gauge is provided on the connecting pipeline between the booster pump and the ultrasonic cleaning device.

[0032] Preferably, a second pressure gauge is provided on the connecting pipeline between the ultrasonic cleaning device and the filter.

[0033] Preferably, the filter comprises a three-stage filter.

[0034] Preferably, the precision of the filter is 25 to 500 μm, for example, it can be 25 μm, 50 μm, 100 μm, 200 μm, 300 μm, 400 μm or 500 μm, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0035] In a second aspect, the present invention provides a method for cleaning a porous ceramic vacuum chuck, wherein the cleaning method is performed using the device system provided in the first aspect.

[0036] As a preferred technical solution of the present invention, the cleaning method comprises the following steps:

[0037] (1) The porous ceramic vacuum suction cup to be cleaned is fixedly installed in the cleaning device;

[0038] (2) Turn on the power supply, and use the clean water in the water reservoir to rinse the porous ceramic vacuum chuck to be cleaned and perform ultrasonic treatment;

[0039] (3) The treated clean water is filtered and then returned to the reservoir.

[0040] In the present invention, during the cleaning process of the porous ceramic vacuum chuck, the clean water in the water reservoir can be recycled after being filtered, thereby realizing the recycling of water resources and avoiding the waste of water resources.

[0041] As a preferred technical solution of the present invention, the water pressure of the clean water flushing in step (2) is 40 to 60 KPa, for example, it can be 40 KPa, 44 KPa, 48 KPa, 52 KPa, 56 KPa or 60 KPa, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0042] Preferably, the clean water flow rate of the clean water flushing in step (2) is 1 to 4 m / s, for example, it can be 1 m / s, 1.5 m / s, 2 m / s, 2.5 m / s, 3 m / s, 3.5 m / s or 4 m / s, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0043] As a preferred technical solution of the present invention, the frequency of the ultrasonic treatment in step (2) is 100-120 Hz, for example, it can be 100 Hz, 104 Hz, 108 Hz, 112 Hz, 116 Hz or 120 Hz, but is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0044] The numerical range described in the present invention not only includes the point values ​​listed above, but also includes any point values ​​between the above numerical ranges that are not listed. Due to space limitations and for the sake of simplicity, the present invention no longer exhaustively lists the specific point values ​​included in the range.

[0045] Compared with the prior art, the present invention has the following beneficial effects:

[0046] (1) The cleaning device system of the porous ceramic vacuum chuck provided by the present invention has a simple structure and can efficiently remove impurities such as polishing debris and chemical residues in the pores of the porous ceramic vacuum chuck;

[0047] (2) The cleaning device system using the porous ceramic vacuum chuck provided by the present invention realizes the reuse of the cleaning solution, avoids the waste of resources, and reduces the cleaning cost;

[0048] (3) The cleaning device system of the porous ceramic vacuum chuck provided by the present invention avoids the use of chemical reagents during the cleaning process, thereby effectively preventing secondary damage to the surface of the porous ceramic vacuum chuck by chemical reagents or abrasive debris. BRIEF DESCRIPTION OF THE DRAWINGS

[0049] Figure 1 A schematic diagram of the structure of a cleaning device system for a porous ceramic vacuum chuck provided in Example 1 of the present invention;

[0050] Figure 2 A schematic diagram of the structure of a cleaning device provided in Example 1 of the present invention;

[0051] Figure 3 A schematic diagram of the structure of the fixing tool provided in Example 1 of the present invention;

[0052] Among them, 1 is a water reservoir, 2 is a booster pump, 3 is an ultrasonic tank, 4 is a cleaning device, 5 is a filter, 6 is a first pressure gauge, 7 is a second pressure gauge, 4-1 is a box body, 4-2 is a box cover, 4-3 is a first buckle, 4-4 is a sealing gasket, 4-5 is a water inlet, 4-6 is a water outlet, 4-7 is a fixed tooling, 4-8 is a first concave tooling, 4-9 is a second concave tooling, and 4-10 is a second buckle. DETAILED DESCRIPTION

[0053] The technical solution of the present invention is further described below by specific implementation methods. It should be understood by those skilled in the art that the embodiments are only to help understand the present invention and should not be regarded as specific limitations of the present invention.

[0054] Example 1

[0055] This embodiment provides a cleaning device system for a porous ceramic vacuum chuck, such as Figure 1 As shown, the cleaning device system includes: a water reservoir 1, a booster pump 2, an ultrasonic cleaning device and a filter 6, which are connected by pipelines to form a circulation loop;

[0056] The ultrasonic cleaning device comprises an ultrasonic pool 3 and a Figure 2 The cleaning device 4 is shown.

[0057] The cleaning device 4 includes a box body 4-1 and a box cover 4-2 which are arranged correspondingly; the box body 4-1 and the box cover 4-2 are sealed and assembled by a first buckle 4-3, a sealing gasket 4-4 is arranged between the box body 4-1 and the box cover 4-2, and the material of the box body 4-1 and the box cover 4-2 is 304 stainless steel;

[0058] The outer wall of the box body 4-1 is symmetrically provided with a water inlet 4-5 and a water outlet 4-6; the water inlet 4-5 is connected to the booster pump 2, and the water outlet 4-6 is connected to the filter 5;

[0059] The interior of the box 4-1 is provided with Figure 3 The fixing fixture 4-7 shown is used for clamping the porous ceramic vacuum suction cup. The fixing fixture 4-7 includes a first concave fixture 4-8 and a second concave fixture 4-9. The first concave fixture 4-8 and the second concave fixture 4-9 are fixedly assembled by a second buckle 4-10. The outer surfaces of the first concave fixture 4-8 and the second concave fixture 4-9 near one end of the porous ceramic vacuum suction cup are provided with a silicone gasket;

[0060] The outer wall of the box body 4-1 is provided with an observation window, the observation window is used to observe the cleaning condition of the porous ceramic vacuum chuck, and the material of the observation window includes resin;

[0061] A first pressure gauge 6 is provided on the connecting pipeline between the booster pump 3 and the ultrasonic cleaning device, and a second pressure gauge 7 is provided on the connecting pipeline between the ultrasonic cleaning device and the filter 5 .

[0062] Example 2

[0063] This embodiment provides a cleaning device system for a porous ceramic vacuum chuck. The cleaning device system is different from that of Embodiment 1 only in that:

[0064] In this embodiment, the silicone gasket disposed on the outer surface of the first concave tooling 4-8 and the second concave tooling 4-9 close to one end of the porous ceramic vacuum suction cup is omitted.

[0065] Example 3

[0066] This embodiment provides a cleaning device system for a porous ceramic vacuum chuck. The cleaning device system is different from that of Embodiment 1 only in that:

[0067] In this embodiment, the first pressure gauge 6 provided on the connecting pipeline between the booster pump 3 and the ultrasonic cleaning device is omitted.

[0068] Comparative Example 1

[0069] This comparative example provides a cleaning device system for a porous ceramic vacuum chuck, and the cleaning device system is different from Example 1 only in that:

[0070] In this comparative example, the ultrasonic pool 3 is omitted.

[0071] Comparative Example 2

[0072] This comparative example provides a cleaning device system for a porous ceramic vacuum chuck, and the cleaning device system is different from Example 1 only in that:

[0073] In this comparative example, the booster pump 3 is omitted.

[0074] Comparative Example 3

[0075] This comparative example provides a cleaning device system for a porous ceramic vacuum chuck, and the cleaning device system is different from Example 1 only in that:

[0076] The filter is omitted in this comparative example.

[0077] Application Example 1

[0078] This application example provides a method for cleaning a porous ceramic vacuum chuck using the device system provided in Example 1, and the cleaning method comprises the following steps:

[0079] (1) The porous ceramic vacuum suction cup to be cleaned is fixedly installed in the cleaning device 4 by means of the fixing tool 4-7;

[0080] (2) Turn on the power supply, and use the clean water in the water reservoir 1 to rinse the porous ceramic vacuum suction cup to be cleaned and perform ultrasonic treatment;

[0081] The water pressure of the clean water flushing is 60KPa; the clean water flow rate is 2.0m / s; the frequency of the ultrasonic treatment is 110HZ;

[0082] (3) The clean water after the clean water treatment is filtered through the filter 6 and then returned to the water reservoir 1.

[0083] Application Example 2

[0084] This application example provides a method for cleaning a porous ceramic vacuum chuck using the device system provided in Example 1, and the cleaning method comprises the following steps:

[0085] (1) The porous ceramic vacuum suction cup to be cleaned is fixedly installed in the cleaning device 4 by means of the fixing tool 4-7;

[0086] (2) Turn on the power supply, and use the clean water in the water reservoir 1 to rinse the porous ceramic vacuum suction cup to be cleaned and perform ultrasonic treatment;

[0087] The water pressure of the clean water flushing is 50KPa; the clean water flow rate is 3.0m / s; the frequency of the ultrasonic treatment is 100HZ;

[0088] (3) The clean water after the clean water treatment is filtered through the filter 6 and then returned to the water reservoir 1.

[0089] Application Example 3

[0090] This application example provides a method for cleaning a porous ceramic vacuum chuck using the device system provided in Example 1, and the cleaning method comprises the following steps:

[0091] (1) The porous ceramic vacuum suction cup to be cleaned is fixedly installed in the cleaning device 4 by means of the fixing tool 4-7;

[0092] (2) Turn on the power supply, and use the clean water in the water reservoir 1 to rinse the porous ceramic vacuum suction cup to be cleaned and perform ultrasonic treatment;

[0093] The water pressure of the clean water flushing is 40KPa; the clean water flow rate is 4.0m / s; the frequency of the ultrasonic treatment is 120HZ;

[0094] (3) The clean water after the clean water treatment is filtered through the filter 6 and then returned to the water reservoir 1.

[0095] Application Example 4

[0096] This application example provides a method for cleaning a porous ceramic vacuum chuck using the device system provided in Example 2. The cleaning method is the same as that in Application Example 1.

[0097] Application Example 5

[0098] This application example provides a method for cleaning a porous ceramic vacuum chuck using the device system provided in Example 3. The cleaning method is the same as that in Application Example 1.

[0099] Comparative application example 1

[0100] This comparative application example provides a method for cleaning a porous ceramic vacuum chuck using the device system provided in Comparative Example 1. The cleaning method is the same as that in Application Example 1.

[0101] Comparative Application Example 2

[0102] This comparative application example provides a method for cleaning a porous ceramic vacuum chuck using the device system provided in Comparative Example 2, and the cleaning method is the same as that in Application Example 1.

[0103] Comparative Application Example 3

[0104] This comparative application example provides a method for cleaning a porous ceramic vacuum chuck using the device system provided in Comparative Example 3, and the cleaning method is the same as that in Application Example 1.

[0105] The cleaning rate of the porous ceramic vacuum chuck provided in the above application examples and comparative application examples after cleaning was tested, and the results are shown in Table 1.

[0106] Table 1

[0107] Cleaning rate / % Application Example 1 100 Application Example 2 100 Application Example 3 100 Application Example 4 98 Application Example 5 96 Comparative application example 1 92 Comparative Application Example 2 95 Comparative Application Example 3 94

[0108] According to Table 1, we can know the following points:

[0109] (1) Comprehensive analysis of application examples 1-3 shows that the device system provided by the present invention can efficiently remove impurities in the pores of the porous ceramic vacuum chuck, making the cleaning rate as high as 100%;

[0110] (2) Comprehensive analysis of Application Example 1 and Application Example 4 shows that when the silicone gasket is omitted, part of the water flows through the gap between the fixed tooling and the vacuum suction cup to be cleaned during the clean water flushing process in step (2), causing partial pressure on the water flow, affecting the cleaning of impurities in the pores of the vacuum suction cup, and reducing the cleaning rate;

[0111] (3) Comprehensive analysis of Application Example 1, Application Example 5 and Comparative Application Example 2 shows that the water pressure during the clean water flushing process has a great influence on the cleaning effect;

[0112] When the first pressure gauge is omitted, the water pressure cannot be accurately controlled during the clean water flushing process, which may cause the water pressure to be too low, making it difficult to clean the pore area; it may also cause the water pressure to be too high, damaging the vacuum suction cup;

[0113] When the booster pump is omitted, the water pressure is low and efficient cleaning of the pore area cannot be achieved, resulting in a lower cleaning rate;

[0114] (4) Comprehensive analysis of Application Example 1 and Comparative Application Example 1 shows that when the ultrasonic pool is omitted, ultrasonic treatment cannot be performed during the water rinsing process, resulting in a reduced cleaning rate;

[0115] (5) Comprehensive analysis of Application Example 1 and Comparative Application Example 3 shows that when the filter is omitted, a large amount of impurities exist in the clean water after cleaning, and it cannot be returned to the reservoir for recycling, resulting in a waste of water resources, which is not in line with the concept of green environmental protection. The impurity particles may even scratch the ceramic vacuum chuck during the secondary reflux process.

[0116] In summary, the cleaning device system for the porous ceramic vacuum suction cup provided by the present invention has a simple structure, can efficiently remove polishing debris and chemical residues in the pores, and realizes the reuse of the cleaning solution, thereby avoiding the waste of resources and reducing the cleaning cost.

[0117] The applicant declares that the above is only a specific implementation mode of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention shall fall within the protection scope and disclosure scope of the present invention.

Claims

1. A cleaning device system for a porous ceramic vacuum chuck, characterized in that: The device system includes a water reservoir, a booster pump, an ultrasonic cleaning device and a filter, and is connected through pipelines to form a circulation loop; The ultrasonic cleaning device comprises an ultrasonic pool and a cleaning device arranged inside the ultrasonic pool.

2. The cleaning device system according to claim 1, characterized in that: The cleaning device comprises a box body and a box cover which are arranged accordingly; Preferably, the box body and the box cover are assembled and sealed by a first buckle; Preferably, a sealing gasket is provided between the box body and the box cover; Preferably, the box body and the box cover are made of stainless steel.

3. The cleaning device system according to claim 2, characterized in that: The outer wall of the box body is symmetrically provided with a water inlet and a water outlet; Preferably, the water inlet is connected to a booster pump; Preferably, the water outlet is connected to a filter.

4. The cleaning device system according to claim 2, characterized in that: A fixed tool is arranged inside the box; Preferably, the fixing fixture is used to clamp the porous ceramic vacuum chuck; Preferably, the fixing fixture comprises a first concave fixture and a second concave fixture; Preferably, the first concave tooling and the second concave tooling are fixedly assembled by a second buckle; Preferably, a silicone gasket is provided on the outer surface of the first concave tooling and the second concave tooling close to one end of the porous ceramic vacuum suction cup.

5. The cleaning device system according to claim 2, characterized in that: The outer wall of the box body is provided with an observation window; Preferably, the observation window is used to observe the cleaning condition of the porous ceramic vacuum chuck; Preferably, the material of the observation window includes resin.

6. The cleaning device system according to claim 1, characterized in that: A first pressure gauge is provided on the connecting pipeline between the booster pump and the ultrasonic cleaning device; Preferably, a second pressure gauge is provided on the connecting pipeline between the ultrasonic cleaning device and the filter.

7. A method for cleaning a porous ceramic vacuum chuck, characterized in that: The cleaning method is carried out using the device system described in any one of claims 1-6.

8. The cleaning method according to claim 7, characterized in that: The cleaning method comprises the following steps: (1) The porous ceramic vacuum suction cup to be cleaned is fixedly installed in the cleaning device; (2) Turn on the power supply, and use the clean water in the water reservoir to rinse the porous ceramic vacuum chuck to be cleaned and perform ultrasonic treatment; (3) The treated clean water is filtered and then returned to the reservoir.

9. The cleaning method according to claim 8, characterized in that: The water pressure of the clean water flushing in step (2) is 40-60 KPa; Preferably, the clean water flow rate of the clean water flushing in step (2) is 1 to 4 m / s.

10. The cleaning method according to claim 8, characterized in that: The frequency of the ultrasonic treatment in step (2) is 100 to 120 Hz.

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