Device and method for obtaining high-current ion beam through magnetic compression plasma

Abstract

The invention discloses a device and method for obtaining a high-current ion beam through magnetic compression of plasma, and the method comprises the following steps: conveying a reaction gas source into a plasma chamber through a gas inlet pipe, and ionizing the reaction gas source through a radio frequency system to generate plasma; the strip-shaped magnets are respectively arranged on the bottom circumferential side and the top of the plasma chamber, and the magnetic field generated by the strip-shaped magnets on the bottom circumferential side is used for restraining the plasma, so that the ionization rate of the reaction gas source is increased; meanwhile, the plasma is compressed downwards by a magnetic field generated by the top strip-shaped magnet to generate high-density plasma near the plasma electrode; and a certain potential difference is applied between the plasma electrode and the extraction electrode, so that stable extraction of the high-current ion beam is obtained. The method is easy to operate, high-current ion beams can be obtained with low energy consumption, the requirement of the ICP ion source for high current in industrial application and experimental research is met, and a good technical basis is provided for wide application of the ICP source in the future.

Description

Technical Field

[0001] The present invention relates to the field of plasma application technology, and in particular to a device and method for obtaining a high-current ion beam by using magneto-compression plasma. Background Art

[0002] Inductively coupled plasma (ICP) has the advantages of low discharge pressure, high plasma density and simple device structure. It has become a hot spot in industrial applications and experimental research and is widely used in various industries. For example, ICP sources are used in plasma etching and thin film deposition in semiconductor manufacturing, ion thrusters in aerospace, and neutral beam injection technology in the field of nuclear fusion. With the advancement of science and technology, the demand for ICP sources in various industries continues to upgrade, especially in the semiconductor field, where ICP sources are often used for wafer etching and chamber cleaning. The development of semiconductor manufacturing technology is inseparable from the presence of inductively coupled plasma sources. In experimental research and industrial applications of ICP sources, strong currents are often required. Therefore, how to improve the intensity of the ICP source-extracted beam has become the most important factor in the application of ICP sources.

[0003] In the prior art, such as the patent "A deuterium-deuterium neutron source generating device based on inductive coupling" with publication number CN116614931A, a gas source is introduced into the ion source chamber of the application, ions are generated under the excitation of the coil, and are accelerated and extracted by a high-voltage electric field. However, the intensity of the extracted ion beam is relatively low. In industrial production applications, the demand for the intensity of the extracted ion beam is increased. Therefore, it is necessary to provide a new structure and a new method for obtaining a high-current ion beam, so as to generate a stronger extracted ion beam to meet the needs of future industrial applications and solve the problem of limited intensity of the current extracted ion beam. Summary of the invention

[0004] The object of the present invention is to provide a device and method for obtaining a high-current ion beam from a magnetocompression plasma, so as to solve the problem of limited intensity of the extracted ion beam in the prior art and meet the demand for high current of ICP source in experimental and industrial applications.

[0005] The purpose of the present invention can be achieved by the following technical solutions: A method for obtaining a high-current ion beam from a magnetocompression plasma comprises the following steps: S1, delivering a reaction gas source into a plasma chamber through an air inlet pipe, and using a radio frequency system to ionize the reaction gas source to generate plasma; S2. Bar magnets are installed on the bottom circumferential side and the top of the plasma chamber respectively. The magnetic field generated by the bar magnets on the bottom circumferential side constrains the plasma to increase the ionization rate of the reaction gas source. At the same time, the magnetic field generated by the bar magnets on the top compresses the plasma downward to generate high-density plasma near the plasma electrode. S3. A certain potential difference is applied between the plasma electrode and the extraction electrode to obtain stable extraction of a high-current ion beam.

[0006] As a further solution of the present invention: the method of using the radio frequency system to ionize the reaction gas source to generate plasma in step S1 is: a multi-turn coil is spirally wound on the bottom circumferential outer wall of the plasma chamber, the multi-turn coil is connected to the radio frequency system, and the gas inside the plasma chamber is excited under the action of a preset radio frequency power to ionize and generate plasma.

[0007] As a further solution of the present invention: in step S2, a bar magnet is installed on the top of the plasma chamber. The bar magnets are symmetrically arranged on both sides of the top of the plasma chamber, and the core magnetization intensity is 1.3T. The bar magnet is used to make the central magnetic field intensity generated at the top of the plasma chamber reach 500GS.

[0008] As a further solution of the present invention: in step S2, a plurality of bar magnets are evenly distributed on the circumferential side of the bottom of the plasma chamber, and the core magnetization intensity is 1.3T. The bar magnets are used to make the central magnetic field intensity generated at the bottom of the plasma chamber reach 20GS.

[0009] As a further solution of the present invention: the method for obtaining stable extraction of a high-current ion beam in step S3 is: the potential difference between the plasma electrode and the extraction electrode forms an electric field, and under the action of the electric field, the high-density plasma moves in a directional path, so that the high-density plasma is accelerated and extracted to form a high-current ion beam.

[0010] A device for obtaining a high-current ion beam by magnetocompression plasma, comprising: A plasma chamber of cylindrical structure, wherein the top end of the plasma chamber is sealed and connected to the upper cover plate of the plasma chamber, the bottom end is welded to the upper cover plate of the chamber by laser, and an air inlet pipe is inserted and connected on the upper cover plate of the plasma chamber, and the air inlet pipe is used to transport the reaction gas source into the interior of the plasma chamber; A multi-turn coil, spirally wound and arranged on the bottom circumferential outer wall of the plasma chamber, the multi-turn coil is used to access the radio frequency system; Bar magnets, the bar magnets are respectively installed on the bottom circumference side and the top of the plasma chamber, and the bar magnets are used to generate a set magnetic field strength in the plasma chamber; A vacuum chamber with a cylindrical structure, wherein the top end of the vacuum chamber is sealed and connected to the bottom end of the plasma chamber through an upper cover plate of the chamber, a plasma electrode with an integral structure is provided at the center of the upper cover plate of the chamber, and an extraction electrode with a cylindrical structure is provided inside the vacuum chamber; Wherein, the axis lines of the air inlet pipe, the plasma chamber, the plasma electrode, the extraction electrode and the vacuum chamber are arranged to coincide with each other.

[0011] As a further solution of the present invention: when the bar magnet is installed at the top of the plasma chamber, the bar magnet is symmetrically arranged on both sides of the top of the plasma chamber, and the bar magnet on the top of the plasma chamber is positioned on the upper cover plate of the plasma chamber through a first magnet bracket.

[0012] As a further solution of the present invention: when the bar magnet is installed on the bottom circumferential side of the plasma chamber, multiple bar magnets are evenly installed on the bottom circumferential side of the plasma chamber, and the multiple bar magnets on the bottom circumferential side of the plasma chamber are positioned on the upper cover plate of the chamber through a second magnet bracket.

[0013] As a further solution of the present invention: the vacuum chamber comprises a first isolation cover, an isolation ring and a second isolation cover, the top end of the first isolation cover is sealed to the chamber upper cover plate, the bottom end is sealed to the top end of the isolation ring, the bottom end of the isolation ring is sealed to the top end of the second isolation cover, and the bottom end of the second isolation cover is sealed to the flange; The isolation ring is fixedly connected to the extraction electrode, and a circular through hole for extracting the ion beam is provided at the center of the isolation ring.

[0014] As a further solution of the present invention: the inner cavity diameters of the first isolation cover and the second isolation cover are set to be consistent, and the first isolation cover and the second isolation cover are respectively made of ceramics.

[0015] As a further solution of the present invention: the isolation ring is made of conductive metal material, and a plurality of exhaust holes are provided on the isolation ring.

[0016] As a further solution of the present invention: the flange is fixedly connected to the chamber upper cover plate via a plurality of second support columns, and the flange is made of metal material.

[0017] As a further solution of the present invention: a lead-out hole with a meniscus structure is provided on the plasma electrode, and the expanded end of the meniscus is arranged toward the lead-out electrode; a lead-out hole with a concave arc structure is provided on the top of the lead-out electrode, and the expanded end of the concave arc is arranged toward the plasma electrode; Among them, the aperture of the narrow end of the lead-out hole of the meniscus structure is smaller than the aperture of the narrow end of the lead-out hole of the concave arc structure.

[0018] As a further solution of the present invention: the chamber upper cover plate is made of a heat-conducting metal material, and a first cooling water channel for cooling the plasma electrode and the laser welding weld is provided on the chamber upper cover plate.

[0019] As a further solution of the present invention: the plasma chamber upper cover plate and the chamber upper cover plate are fixedly connected by a plurality of first support columns, the top ends of the first support columns are threadedly connected to nuts, and a second cooling water channel for cooling the first sealing ring is provided on the plasma chamber upper cover plate.

[0020] Beneficial effects of the present invention: (1) During the use of the method of the present application, bar magnets are installed on the bottom circumferential side and the top of the plasma chamber respectively. The magnetic field generated by the bar magnets on the bottom circumferential side is convenient for confining the plasma in the plasma chamber to increase the ionization rate of the reaction gas source. At the same time, the magnetic field generated by the bar magnets on the top compresses the plasma downward and generates high-density plasma near the plasma electrode. By applying a certain potential difference between the plasma electrode and the extraction electrode, the plasma beam intensity can be greatly improved. (2) The device of the present application is simple to install, and the method of the present application is easy to operate. It can ensure that a high-current ion beam is obtained with low energy consumption. When compared with the case where the plasma chamber lacks a magnetic field structure, the present application can achieve an increase in the extracted beam current by more than one-fold, which can meet the demand for high current in industrial applications and experimental research of ICP sources, and provide a good technical foundation for the widespread application of ICP sources in the future. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The present invention will be further described below in conjunction with the accompanying drawings.

[0022] Figure 1 It is a schematic flow chart of a method for obtaining a high-current ion beam from a magnetocompression plasma according to the present invention; Figure 2 It is a schematic diagram of the structure of the device for obtaining a high-current ion beam by magnetocompression plasma of the present invention; Figure 3 yes Figure 2 Schematic diagram of magnetic field lines generated by bar magnets in the circumferential direction of the plasma chamber.

[0023] In the figure: 1, air inlet pipe; 2, first magnet bracket; 3, bar magnet; 301, magnetic field line; 4, plasma chamber upper cover; 5, nut; 6, first sealing ring; 7, first support column; 8, second magnet bracket; 9, plasma chamber; 10, multi-turn coil; 11, plasma electrode; 12, chamber upper cover; 13, lead-out electrode; 14, bolt; 15, first isolation cover; 16, isolation ring; 17, second isolation cover; 18, second support column; 19, flange; 20, second sealing ring; 21, first cooling water channel; 22, second cooling water channel. DETAILED DESCRIPTION

[0024] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0025] In the description of the present invention, it should be understood that the terms indicating orientation or positional relationship are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention; in the description of the present invention, the meaning of "multiple" and "several" is at least two, for example two, three, etc., unless otherwise clearly and specifically defined.

[0026] See also Figure 1 As shown, combined with Figure 2 and Figure 3 The present invention is a method for obtaining a high-current ion beam from a magnetocompression plasma, comprising the following steps: S1. A reaction gas source is transported into a plasma chamber 9 through an air inlet pipe 1, and a radio frequency system is used to ionize the reaction gas source to generate plasma.

[0027] In this step, the method of using the radio frequency system to ionize the reaction gas source to generate plasma is: by spirally winding a multi-turn coil 10 on the bottom circumferential outer wall of the plasma chamber 9, the multi-turn coil 10 is connected to the radio frequency system, and under the action of a preset radio frequency power, the gas inside the plasma chamber 9 is excited to ionize and generate plasma.

[0028] S2. By installing bar magnets 3 on the bottom circumferential side and the top of the plasma chamber 9 respectively, the magnetic field generated by the bar magnets 3 on the bottom circumferential side confines the plasma to increase the ionization rate of the reaction gas source. At the same time, the magnetic field generated by the top bar magnets 3 compresses the plasma downward to generate high-density plasma near the plasma electrode 11.

[0029] In this step, a bar magnet 3 is installed on the top of the plasma chamber 9. The bar magnets 3 are symmetrically arranged on both sides of the top of the plasma chamber 9, and the core magnetization intensity is 1.3 T. The bar magnets 3 are used to make the central magnetic field intensity generated at the top of the plasma chamber 9 reach 500GS. In this step, multiple bar magnets 3 are evenly installed on the circumferential side of the bottom of the plasma chamber 9. The core magnetization intensity is 1.3 T. The bar magnets 3 are used to make the central magnetic field intensity generated at the bottom of the plasma chamber 9 reach 20GS.

[0030] S3. A certain potential difference is applied between the plasma electrode 11 and the extraction electrode 13, thereby obtaining stable extraction of a high-current ion beam.

[0031] The method for obtaining stable extraction of a high-current ion beam in this step is as follows: the potential difference between the plasma electrode 11 and the extraction electrode 13 forms an electric field, under the action of the electric field, the high-density plasma moves in a directional path, so that the high-density plasma is accelerated and extracted to form a high-current ion beam.

[0032] During the use of the method of the present application, when the preset RF power and the preset extraction voltage remain unchanged, the reaction gas source enters the plasma chamber 9 from the air inlet pipe 1, and the RF electric field generated by the RF system is used to excite the reaction gas source, thereby converting it into charged ions. During this conversion process, it is carried out under the influence of the magnetic field structure. By installing bar magnets 3 on the bottom circumferential side and the top of the plasma chamber 9 respectively, the magnetic field generated by the bar magnets 3 on the bottom circumferential side is convenient for confining the plasma in the plasma chamber 9 to increase the ionization rate of the reaction gas source. At the same time, the top bar magnet 3 compresses the plasma downward to obtain a high-density plasma, which is extracted by applying a certain potential difference between the plasma electrode 11 and the extraction electrode 13, thereby greatly improving the plasma beam intensity. When compared with the case where the plasma chamber 9 lacks a magnetic field structure, the present application can achieve an extraction beam increase of more than about one time, which can meet the demand for high current of ICP sources in industrial applications and experimental research, and provide a good technical foundation for the widespread application of ICP sources in the future.

[0033] like Figure 2As shown, the present invention also provides a device for obtaining a high-current ion beam from a magnetocompression plasma, comprising a plasma chamber 9 of a cylindrical structure, a multi-turn coil 10, a magnetic field structure and a vacuum chamber of a cylindrical structure, wherein the top end of the plasma chamber 9 is sealed and connected to the plasma chamber upper cover plate 4, the bottom end is welded to the chamber upper cover plate 12 by laser, and an air inlet pipe 1 is inserted and connected to the plasma chamber upper cover plate 4, the air inlet pipe 1 is used to transport a reaction gas source into the plasma chamber 9, the multi-turn coil 10 is spirally wound on the bottom circumferential outer wall of the plasma chamber 9, the multi-turn coil 10 is used to access a radio frequency system, the bar magnets 3 are respectively installed on the bottom circumferential side and the top of the plasma chamber 9, the bar magnets 3 are used to generate a set magnetic field strength in the plasma chamber 9, the top end of the vacuum chamber is sealed and connected to the bottom end of the plasma chamber 9 through the chamber upper cover plate 12, a plasma electrode 11 of an integrated structure is provided at the center position of the chamber upper cover plate 12, and an extraction electrode 13 of a cylindrical structure is provided inside the vacuum chamber.

[0034] During use of the device of the present application, a reaction gas source is conveniently transported into the plasma chamber 9 through the air inlet pipe 1, and the multi-turn coil 10 wound at the bottom of the plasma chamber 9 can be connected to the radio frequency system so as to excite the reaction gas source with the radio frequency electric field generated at a preset radio frequency frequency, thereby converting it into charged ions. During the process of exciting the reaction gas source with the radio frequency electric field, bar magnets 3 are respectively installed on the circumferential side and the top of the bottom of the plasma chamber 9. The magnetic field generated by the bar magnets 3 on the circumferential side of the bottom is convenient for confining the plasma in the plasma chamber 9 to increase the ionization rate of the reaction gas source. At the same time, the top magnet compresses the plasma downward quickly, and a certain potential difference is applied between the meniscus-shaped plasma electrode 11 and the arc-shaped extraction electrode 13 to obtain a stable extraction of a high-current ion beam, thereby greatly improving the plasma beam intensity.

[0035] During use of the device of the present application, the axis lines of the air inlet pipe 1, the plasma chamber 9, the plasma electrode 11, the extraction electrode 13 and the vacuum chamber are arranged to coincide with each other, which can improve the purity and uniformity of the ion beam; the plasma ionization process is carried out in a vacuum sealed environment, which can eliminate or reduce the scattering and interference of gas molecules on the ion beam. In a vacuum environment, the number of gas molecules is greatly reduced, thereby reducing the probability of the ion beam colliding with gas molecules during transmission, thereby ensuring the stability and accuracy of the ion beam.

[0036] In this specific embodiment, when the bar magnet 3 is installed on the bottom circumferential side of the plasma chamber 9, multiple bar magnets 3 are evenly distributed on the bottom circumferential side of the plasma chamber 9, and the multiple bar magnets 3 on the bottom circumferential side of the plasma chamber 9 are positioned on the chamber upper cover 12 through the second magnet bracket 8; so that the bar magnet 3 on the top of the plasma chamber 9 is easy to install. The bar magnet 3 can be made of neodymium iron boron or samarium cobalt, and the core magnetization intensity is 1.3 T. The bar magnet 3 is used to make the central magnetic field intensity generated on the bottom circumferential side of the plasma chamber 9 reach 20GS. The magnetic field lines 301 generated when the bar magnet 3 is installed are as shown in FIG. Figure 3 As shown, when the reaction gas source enters the plasma chamber 9 for ionization, the magnetic field generated by the bottom circumferential side magnets constrains the plasma to increase the ionization rate of the reaction gas source, thereby generating high-density plasma.

[0037] In this specific embodiment, when the bar magnet 3 is installed at the top of the plasma chamber 9, the bar magnet 3 is symmetrically arranged on both sides of the top of the plasma chamber 9, and the bar magnet 3 on the top of the plasma chamber 9 is positioned on the plasma chamber upper cover 4 through the first magnet bracket 2; so that the bar magnet 3 on the top of the plasma chamber 9 is easy to install, the bar magnet 3 can be made of neodymium iron boron or samarium cobalt, and the core magnetization strength is 1.3 T. The bar magnet 3 is used to make the central magnetic field strength generated at the top of the plasma chamber 9 reach 500GS, so that the plasma is compressed downward to produce a higher density plasma.

[0038] It should be understood that the number and magnetization strength of the bar magnets 3 included in the magnetic field structure in the present application can be adjusted according to actual needs; the first magnet bracket 2 and the second magnet bracket 8 are made of ABS material respectively, and the shape and size of the bracket are changed according to the installation position; the plasma chamber 9 can be made of non-metallic materials, such as quartz glass, boron nitride, etc.

[0039] In this specific embodiment, the vacuum chamber includes a first isolation cover 15, an isolation ring 16 and a second isolation cover 17. The top end of the first isolation cover 15 is sealed and connected to the chamber upper cover 12, and the bottom end is sealed and connected to the top end surface of the isolation ring 16. The bottom end surface of the isolation ring 16 is sealed and connected to the top end of the second isolation cover 17, and the bottom end of the second isolation cover 17 is sealed and connected to the flange 19; wherein, the isolation ring 16 is fixedly connected to the extraction electrode 13 by bolts 14, and a circular through hole for extracting the ion beam is provided at the center position of the isolation ring 16; so that the vacuum chamber can be easily sealed and installed, the device of the present application can be installed as a whole at the application position through the flange 19.

[0040] In this specific embodiment, the inner cavity diameters of the first isolation cover 15 and the second isolation cover 17 are set to be consistent, and the first isolation cover 15 and the second isolation cover 17 are respectively made of ceramics, and the circumferential inner walls of both are respectively set to be smooth without irregular protrusions, and the circumferential outer walls present an annular protrusion shape of an insulator, which can avoid arc creep problems.

[0041] In this specific embodiment, the isolation ring 16 is made of conductive metal material, and a plurality of exhaust holes are provided on the isolation ring 16. The exhaust holes can be chamfered to facilitate rapid vacuuming of the extraction chamber and reduce weight.

[0042] In this specific embodiment, the first isolation cover 15 and the chamber upper cover 12 are sealed and connected by extruding the second sealing ring 20, and the first isolation cover 15 and the second isolation cover 17 are also sealed and connected to the isolation ring 16 by extruding the second sealing ring 20, so the sealing installation is convenient; the second sealing ring 20 can be made of fluororubber.

[0043] In this specific implementation, the flange 19 is fixedly connected to the chamber upper cover plate 12 via a plurality of second support columns 18 , and the flange 19 is made of metal material and can be installed on a corresponding device according to different requirements.

[0044] In this specific embodiment, a lead-out hole with a meniscus structure is provided on the plasma electrode 11, and the flared end of the meniscus surface is arranged toward the lead-out electrode 13; a lead-out hole with a concave arc structure is provided on the top of the lead-out electrode 13, and the concave arc flared end is arranged toward the plasma electrode 11; wherein, the aperture of the narrow end of the meniscus structure lead-out hole is smaller than the aperture of the narrow end of the concave arc structure lead-out hole; by designing the lead-out holes of the plasma electrode 11 and the lead-out holes of the lead-out electrode 13, the stable lead-out of the plasma beam is facilitated, thereby ensuring the stability and accuracy of the ion beam.

[0045] It should be understood that the extraction electrode 13 can be made of a material with good machining performance and good electrical conductivity. The whole is a thin-walled cylinder, and the bottom is fixed to the isolation ring 16 by bolts 14. The extraction hole of the plasma electrode 11 and the extraction hole of the extraction electrode 13 cooperate with each other to extract the ion beam. When one of them changes, the other one must also change accordingly for a better extraction effect.

[0046] In this specific embodiment, the chamber upper cover plate 12 is made of heat-conductive metal material, and a first cooling water channel 21 is provided on the chamber upper cover plate 12 for cooling the plasma electrode 11 and the laser welding weld to avoid ablation and degassing problems due to excessive temperature.

[0047] In this specific embodiment, the plasma chamber upper cover plate 4 and the chamber upper cover plate 12 are fixedly connected by a plurality of first support columns 7, and the top ends of the first support columns 7 are threadedly connected to the nuts 5, so as to keep the plasma chamber upper cover plate 4 and the chamber upper cover plate 12 fixedly installed. A second cooling water channel 22 is provided on the plasma chamber upper cover plate 4, and a vacuum seal is formed between the plasma chamber upper cover plate 4 and the plasma chamber 9 by squeezing the first sealing ring 6. The second cooling water channel 22 is used to cool the first sealing ring 6 to avoid problems such as ablation and degassing. The first sealing ring 6 can be made of fluororubber.

[0048] In this specific embodiment, the air inlet pipe 1 can be a SUS316 seamless pipe, and its two ends are respectively connected to the plasma chamber upper cover plate 4 and the mass flow meter to control the flow rate of the reaction gas source entering the plasma chamber 9.

[0049] In this specific embodiment, the diameter, number of turns and turn spacing of the multi-turn coil 10 can affect the electron density of the excited plasma, and need to be adjusted according to the required ion beam performance and the diameter of the plasma chamber 9; preferably, the coil should be made of a material with excellent thermal conductivity and high electrical conductivity, such as copper.

[0050] The above is a detailed description of an embodiment of the present invention, but the content is only a preferred embodiment of the present invention and cannot be considered to limit the scope of implementation of the present invention. All equivalent changes and improvements made within the scope of the present invention should still fall within the scope of the patent coverage of the present invention.

Claims

1. A method for obtaining a high-current ion beam from a magnetocompression plasma, characterized in that: The following steps are involved: S1, delivering a reaction gas source into a plasma chamber (9) through an air inlet pipe (1), and ionizing the reaction gas source using a radio frequency system to generate plasma; S2. Bar magnets (3) are installed on the bottom circumferential side and the top of the plasma chamber (9), respectively. The magnetic field generated by the bar magnets (3) on the bottom circumferential side confines the plasma to increase the ionization rate of the reaction gas source. At the same time, the magnetic field generated by the bar magnets (3) on the top compresses the plasma downward, thereby generating high-density plasma near the plasma electrode (11); S3. A certain potential difference is applied between the plasma electrode (11) and the extraction electrode (13), thereby obtaining stable extraction of a high-current ion beam.

2. The method for obtaining a high-current ion beam from a magnetocompression plasma according to claim 1, characterized in that: The method for ionizing the reaction gas source to generate plasma using the radio frequency system in step S1 is as follows: a multi-turn coil (10) is spirally wound on the outer wall of the bottom circumference of the plasma chamber (9), the multi-turn coil (10) is connected to the radio frequency system, and the gas inside the plasma chamber (9) is excited under the action of a preset radio frequency power to ionize and generate plasma.

3. The method for obtaining a high-current ion beam from a magnetocompression plasma according to claim 1, characterized in that: In step S2, a bar magnet (3) is installed on the top of the plasma chamber (9). The bar magnets (3) are symmetrically arranged on both sides of the top of the plasma chamber (9), and the core magnetization intensity is 1.3 T. The bar magnets (3) are used to make the central magnetic field intensity generated at the top of the plasma chamber (9) reach 500 GS.

4. The method for obtaining a high-current ion beam from a magnetocompression plasma according to claim 1, characterized in that: In step S2, a plurality of bar magnets (3) are evenly distributed on the circumferential side of the bottom of the plasma chamber (9), the core magnetization intensity is 1.3 T, and the bar magnets (3) are used to make the central magnetic field intensity generated at the bottom of the plasma chamber (9) reach 20GS.

5. The method for obtaining a high-current ion beam from a magnetocompression plasma according to claim 1, characterized in that: The method for obtaining stable extraction of a high-current ion beam in step S3 is as follows: the potential difference between the plasma electrode (11) and the extraction electrode (13) forms an electric field, and under the action of the electric field, the high-density plasma moves in a directional path, so that the high-density plasma is accelerated and extracted to form a high-current ion beam.

6. A device for obtaining a high-current ion beam from a magnetocompression plasma, characterized in that: include: A plasma chamber (9) of cylindrical structure, wherein the top end of the plasma chamber (9) is sealedly connected to a plasma chamber upper cover plate (4), and an air inlet pipe (1) is inserted and connected to the plasma chamber upper cover plate (4), and the air inlet pipe (1) is used to transport a reaction gas source into the interior of the plasma chamber (9); A multi-turn coil (10) is spirally wound and arranged on the bottom circumferential outer wall of the plasma chamber (9), and the multi-turn coil (10) is used to connect to a radio frequency system; A bar magnet (3), the bar magnet (3) being respectively installed on the bottom circumferential side and the top of the plasma chamber (9), and the bar magnet (3) being used to generate a set magnetic field strength in the plasma chamber (9); A vacuum chamber with a cylindrical structure, wherein the top end of the vacuum chamber is sealedly connected to the bottom end of the plasma chamber (9) via a chamber upper cover plate (12), a plasma electrode (11) with an integral structure is provided at the center of the chamber upper cover plate (12), and an extraction electrode (13) with a cylindrical structure is provided inside the vacuum chamber; The axis lines of the air inlet pipe (1), the plasma chamber (9), the plasma electrode (11), the extraction electrode (13) and the vacuum chamber are arranged to coincide with each other.

7. The device for obtaining a high-current ion beam from a magnetocompression plasma according to claim 6, characterized in that: When the bar magnet (3) is installed at the top of the plasma chamber (9), the bar magnet (3) is symmetrically arranged on both sides of the top of the plasma chamber (9), and the bar magnet (3) at the top of the plasma chamber (9) is positioned on the upper cover plate (4) of the plasma chamber through a first magnet bracket (2).

8. The device for obtaining a high-current ion beam from a magnetocompression plasma according to claim 6, characterized in that: When the bar magnet (3) is installed on the bottom circumferential side of the plasma chamber (9), a plurality of bar magnets (3) are evenly distributed on the bottom circumferential side of the plasma chamber (9), and the plurality of bar magnets (3) on the bottom circumferential side of the plasma chamber (9) are positioned on the chamber upper cover plate (12) via a second magnet bracket (8).

9. The device for obtaining a high-current ion beam from a magnetocompression plasma according to claim 6, characterized in that: The vacuum chamber comprises a first isolation cover (15), an isolation ring (16) and a second isolation cover (17); the top end of the first isolation cover (15) is sealed to the chamber upper cover plate (12), the bottom end is sealed to the top end surface of the isolation ring (16), the bottom end surface of the isolation ring (16) is sealed to the top end of the second isolation cover (17), and the bottom end of the second isolation cover (17) is sealed to the flange (19); The isolation ring (16) is fixedly connected to the extraction electrode (13), and a circular through hole for extracting the ion beam is provided at the center of the isolation ring (16).

10. The device for obtaining a high-current ion beam from a magnetocompression plasma according to claim 9, characterized in that: The inner cavity diameters of the first isolation cover (15) and the second isolation cover (17) are arranged to be consistent, and the first isolation cover (15) and the second isolation cover (17) are both made of ceramics.

11. The device for obtaining a high-current ion beam from a magnetocompression plasma according to claim 9, characterized in that: The isolation ring (16) is made of a conductive metal material, and a plurality of air extraction holes are provided on the isolation ring (16).

12. The device for obtaining a high-current ion beam from a magnetocompression plasma according to claim 9, characterized in that: The flange (19) is fixedly connected to the chamber upper cover plate (12) via a plurality of second support columns (18), and the flange (19) is made of metal material.

13. The device for obtaining a high-current ion beam from a magnetocompression plasma according to claim 6, characterized in that: The plasma electrode (11) is provided with a lead-out hole in the shape of a crescent-shaped structure, and the expanded end of the crescent-shaped surface is arranged toward the lead-out electrode (13); the top of the lead-out electrode (13) is provided with a lead-out hole in the shape of a concave arc structure, and the expanded end of the concave arc is arranged toward the plasma electrode (11); Among them, the aperture of the narrow end of the lead-out hole of the meniscus structure is smaller than the aperture of the narrow end of the lead-out hole of the concave arc structure.

14. The device for obtaining a high-current ion beam from a magnetocompression plasma according to claim 6, characterized in that: The chamber upper cover plate (12) is made of a heat-conducting metal material, and a first cooling water channel (21) for cooling the plasma electrode (11) and the laser welding weld is provided on the chamber upper cover plate (12).

15. The device for obtaining a high-current ion beam from a magnetocompression plasma according to claim 6, characterized in that: The plasma chamber upper cover plate (4) is fixedly connected to the chamber upper cover plate (12) via a plurality of first support columns (7), and a second cooling water channel (22) for cooling the first sealing ring (6) is provided on the plasma chamber upper cover plate (4).

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