Treatment method of two gases and controller

Abstract

The invention is suitable for the technical field of gas treatment, and provides a treatment method for two gases and a controller. The method comprises the steps that a controller obtains a gas treatment instruction and analyzes the gas treatment instruction to obtain gas treatment requirements, the gas treatment requirements comprise the proportion and the volume of first gas and second gas, the first gas is stored in a first gas container, and the second gas is stored in a second gas container; the controller obtains the gas pressure in the comprehensive container, and the first gas and the second gas are input into the comprehensive container to be treated; and the controller sends a control instruction to the first control valve and the second control valve according to the gas treatment requirement and the gas pressure in the comprehensive container, so that the first control valve and the second control valve execute the control instruction, and the first gas and the second gas are input into the comprehensive container to be treated. The gas treatment process is simple, and the precision is high.

Description

Technical Field

[0001] The present application relates to the technical field of gas processing, and in particular to a method and a controller for processing two gases. Background Art

[0002] Sulfur hexafluoride (SF6) is considered to be the best insulating gas. Mixing SF6 with a certain proportion of buffer gas (N2 or CF4) can not only effectively prevent the pressurized SF6 gas from liquefying in a low-temperature environment to improve the insulation performance and breaking capacity of high-voltage power equipment, but also greatly reduce the use of SF6.

[0003] When mixed insulating gas is used in electrical equipment (such as gas insulated switchgear GIS), it is necessary to fill the electrical equipment with a mixed gas of a certain proportion and a certain pressure. In the gas filling method of the related art, a first gas of a certain partial pressure is first filled, and then a second gas of a certain partial pressure is filled, so that the two gases are filled into the electrical equipment and mixed. The process of this gas filling method is relatively complicated and has low precision. Summary of the invention

[0004] In view of this, the embodiments of the present application provide a method and a controller for processing two gases, which have a simple processing flow and high precision.

[0005] In order to achieve the above objectives, this application adopts the following technical solutions:

[0006] In a first aspect, an embodiment of the present application provides a method for processing two gases, comprising:

[0007] The controller obtains a gas processing instruction, and parses the gas processing instruction to obtain a gas processing requirement, wherein the gas processing requirement includes a ratio and a volume between a first gas and a second gas, wherein the first gas is stored in a first gas container, and the second gas is stored in a second gas container;

[0008] The controller obtains the gas pressure inside the integrated container, and the first gas and the second gas are input into the integrated container for processing;

[0009] The controller sends control instructions to the first control valve and the second control valve according to the gas processing requirements and the gas pressure inside the integrated container, so that the first control valve and the second control valve execute the control instructions to input the first gas and the second gas into the integrated container for processing; wherein, the first control valve is arranged between the first gas container and the pipeline of the integrated container, and the second control valve is arranged between the second gas container and the pipeline of the integrated container.

[0010] Based on the first aspect, in some embodiments, the method for processing the two gases further includes:

[0011] When the gas pressure inside the integrated container is less than the pressure threshold, the first control valve is controlled to fill the first gas into the integrated container at a first filling speed, and the second control valve is controlled to fill the second gas into the integrated container at a second filling speed.

[0012] Based on the first aspect, in some embodiments, the method for processing the two gases further includes:

[0013] When the gas pressure inside the integrated container is greater than or equal to the pressure threshold, the first control valve is controlled to charge the first gas into the integrated container at a third charging speed, and the second control valve is controlled to charge the second gas into the integrated container at a fourth charging speed;

[0014] The third charging speed is lower than the first charging speed, and the fourth charging speed is lower than the second charging speed.

[0015] Based on the first aspect, in some embodiments, the method for processing the two gases further includes:

[0016] Real-time detection of temperature and humidity inside the integrated container;

[0017] The pressure threshold is adjusted according to the temperature and humidity inside the integrated container; wherein, the higher the temperature and humidity inside the integrated container, the greater the pressure threshold; and the lower the temperature and humidity inside the integrated container, the smaller the pressure threshold.

[0018] Based on the first aspect, in some embodiments, adjusting the pressure threshold according to the temperature and humidity inside the integrated container includes:

[0019] When the temperature is greater than a first temperature threshold and the humidity is greater than a first humidity threshold, adjusting the pressure threshold to a first pressure value;

[0020] When the temperature is greater than a second temperature threshold and the humidity is greater than a second humidity threshold, the pressure threshold is adjusted to a second pressure value; wherein the second temperature threshold is greater than the first temperature threshold, the second humidity threshold is greater than the first humidity threshold, and the second pressure value is 1.1 to 1.3 times the first pressure value;

[0021] When the temperature is less than or equal to the first temperature threshold, or the humidity is less than the first humidity threshold, the pressure threshold is not adjusted.

[0022] Based on the first aspect, in some embodiments, the method for processing the two gases further includes:

[0023] Get the ratio of the two gases in the integrated container;

[0024] Determine whether the gas in the integrated container meets the gas treatment requirements based on the ratio of the two gases;

[0025] If the gas in the integrated container does not meet the gas treatment requirements, the amount of the two gases that need to be filled in is determined based on the gas treatment requirements and the ratio of the two gases;

[0026] The two control valves are controlled according to the amount of the two gases that still need to be filled.

[0027] Based on the first aspect, in some embodiments, controlling the two control valves according to the amounts of the two gases that need to be charged includes:

[0028] If the amount of the two gases that need to be charged is greater than the amount of the second gas that needs to be charged, the opening of the first control valve is controlled to be greater than the opening of the second control valve;

[0029] If the amount of the two gases that need to be charged is less than the amount of the second gas that needs to be charged, the opening of the first control valve is controlled to be smaller than the opening of the second control valve;

[0030] If the amount of the two gases that need to be charged is equal to the amount of the second gas that needs to be charged, the opening of the first control valve is controlled to be equal to the opening of the second control valve.

[0031] Based on the first aspect, in some embodiments, controlling the two control valves according to the amounts of the two gases that need to be charged includes:

[0032] If the amount of the two gases that need to be charged is greater than the amount of the second gas that needs to be charged, the time for which the first control valve is opened is controlled to be greater than the time for which the second control valve is opened;

[0033] If the amount of the two gases that need to be charged is less than the amount of the second gas that needs to be charged, the time for which the first control valve is opened is controlled to be less than the time for which the second control valve is opened;

[0034] If the amount of the two gases that need to be charged is equal to the amount of the second gas that needs to be charged, the time for which the first control valve is opened is controlled to be equal to the time for which the second control valve is opened.

[0035] Based on the first aspect, in some embodiments, the method for processing the two gases further includes:

[0036] Determine a target gas having the largest component ratio of the first gas and the second gas according to the gas processing requirement;

[0037] evacuating the integrated container;

[0038] After the vacuuming is completed, the container corresponding to the target gas is controlled to fill the target gas into the integrated container;

[0039] evacuating the integrated container;

[0040] The first gas container and the second gas container are controlled to fill the integrated container with the first gas and the second gas.

[0041] In a third aspect, an embodiment of the present application provides a controller comprising a memory and a processor, wherein the memory stores a computer program that can be run on the processor, and when the processor executes the computer program, the two gas processing method as described in any one of the first aspects is implemented.

[0042] Compared with the prior art, the embodiments of the present invention have the following beneficial effects:

[0043] In an embodiment of the present application, the controller obtains a gas processing instruction, parses the gas processing instruction to obtain a gas processing requirement, and obtains the gas pressure inside the integrated container. Afterwards, a control instruction is sent to the first control valve and the second control valve according to the gas processing requirement and the gas pressure inside the integrated container, so that the first control valve and the second control valve execute the control instruction and input the first gas and the second gas into the integrated container for processing. The application embodiment detects the gas pressure inside the integrated container, and then controls the two control valves according to the gas pressure and the gas processing requirement through the controller, and inputs the first gas and the second gas into the integrated container for processing. The process is simple and the accuracy is high. BRIEF DESCRIPTION OF THE DRAWINGS

[0044] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0045] Figure 1 It is a schematic flow chart of a method for treating two gases provided in an embodiment of the present application;

[0046] Figure 2 It is a schematic diagram of a controller provided in an embodiment of the present application. DETAILED DESCRIPTION

[0047] The present application is described more clearly below in conjunction with specific embodiments. The following embodiments will help those skilled in the art to further understand the effects of the present application, but are not intended to limit the present application in any form. It should be noted that, for those of ordinary skill in the art, several variations and improvements may be made without departing from the concept of the present application. These all fall within the scope of protection of the present application.

[0048] In order to make the purpose, technical solutions and advantages of the present application clearer, specific embodiments will be described below in conjunction with the accompanying drawings.

[0049] See also Figure 1 The two-gas processing method of the embodiment of the present application may include the following steps:

[0050] Step 101: The controller obtains a gas processing instruction and parses the gas processing instruction to obtain a gas processing requirement.

[0051] First, a system applicable to the above two gas processing methods is briefly described. The system may include a first gas container, a second gas container, an integrated container, a first control valve, a second control valve, and a controller. The first gas container and the second gas container are connected to the integrated container through a pipeline, a first control valve is arranged on the pipeline between the first gas container and the integrated container, a second control valve is arranged on the pipeline between the second gas container and the integrated container, a pressure detector is arranged inside the integrated container, and the controller is connected to the first control valve and the second control valve in communication.

[0052] The first gas container is used to store the first gas, the second gas container is used to store the second gas, and the integrated container is used to store the processed first gas and second gas. The pressure detector is used to detect the gas pressure inside the integrated container. The processing of the two gases includes but is not limited to mixing.

[0053] The first gas and the second gas may be sulfur hexafluoride and other insulating gases.

[0054] In step 102, the controller obtains the gas pressure inside the integrated container.

[0055] The first gas and the second gas are input into the integrated container for processing.

[0056] Specifically, the gas pressure inside the integrated container changes in real time as the gas is filled in, so the gas pressure inside the integrated container can be detected in real time by a pressure detector, or the gas pressure inside the integrated container can be detected at regular intervals.

[0057] Step 103, the controller sends control instructions to the first control valve and the second control valve according to the gas processing requirements and the gas pressure inside the integrated container, so that the first control valve and the second control valve execute the control instructions and input the first gas and the second gas into the integrated container for processing.

[0058] The first control valve is arranged between the first gas container and the pipeline of the integrated container, and the second control valve is arranged between the second gas container and the pipeline of the integrated container.

[0059] In some embodiments, when the gas pressure inside the integrated container is less than a pressure threshold, the first control valve is controlled to fill the first gas into the integrated container at a first filling rate, and the second control valve is controlled to fill the second gas into the integrated container at a second filling rate.

[0060] In some other embodiments, when the gas pressure inside the integrated container is greater than or equal to the pressure threshold, the first control valve is controlled to fill the integrated container with the first gas at a third filling speed, and the second control valve is controlled to fill the integrated container with the second gas at a fourth filling speed. The third filling speed is less than the first filling speed, and the fourth filling speed is less than the second filling speed.

[0061] Specifically, the above-mentioned pressure threshold can be determined through experimental data or based on experience. When the gas pressure inside the integrated container is relatively small (specifically, the gas pressure inside the integrated container is less than the pressure threshold), the first control valve and the second control valve are controlled to fill the first gas and the second gas into the integrated container at a relatively large filling speed. When the gas pressure inside the integrated container is relatively large (specifically, the gas pressure inside the integrated container is greater than or equal to the pressure threshold), the first control valve and the second control valve are controlled to fill the first gas and the second gas into the integrated container at a relatively small filling speed. Through the above-mentioned fast-first-slow-later filling method, the efficiency of gas filling can be improved, and the accuracy of gas processing can be improved.

[0062] As an implementable embodiment, the method for processing the two gases also includes: real-time detection of the temperature and humidity inside the integrated container; adjusting the pressure threshold according to the temperature and humidity inside the integrated container; wherein, the higher the temperature and humidity inside the integrated container, the greater the pressure threshold; and the lower the temperature and humidity inside the integrated container, the smaller the pressure threshold.

[0063] Specifically, the temperature and humidity inside the integrated container can be obtained, and then the two control valves can be adjusted according to the pressure, temperature and humidity. Since the corresponding pressure thresholds are different under different temperature and humidity conditions, the temperature and humidity inside the integrated container can be considered, and the two control valves can be adjusted in combination with the pressure, temperature and humidity to improve the accuracy of gas filling.

[0064] For example, when the temperature is greater than the first temperature threshold and the humidity is greater than the first humidity threshold, the pressure threshold can be adjusted to the first pressure value. At this time, when the pressure threshold is adjusted to the first pressure value, that is, when the gas pressure inside the integrated container is greater than or equal to the higher first pressure value, the first control valve is controlled to fill the first gas into the integrated container at the third filling speed, and the second control valve is controlled to fill the second gas into the integrated container at the fourth filling speed.

[0065] When the temperature is greater than the second temperature threshold and the humidity is greater than the second humidity threshold, the pressure threshold can be adjusted to a second pressure value. Wherein, the second temperature threshold is greater than the first temperature threshold, the second humidity threshold is greater than the first humidity threshold, and the second pressure value can be 1.1 to 1.3 times the first pressure value. At this time, when the pressure threshold is adjusted to the second pressure value, that is, when the gas pressure inside the integrated container is greater than or equal to the higher second pressure value, the first control valve is controlled to fill the first gas into the integrated container at a third filling speed, and the second control valve is controlled to fill the second gas into the integrated container at a fourth filling speed.

[0066] When the temperature is less than or equal to the first temperature threshold, or the humidity is less than the first humidity threshold, there is no need to adjust the pressure threshold, that is, there is no need to adjust the charging speeds of the two control valves.

[0067] In addition, when the temperature is less than the third temperature threshold and the humidity is less than the third humidity threshold, the pressure threshold can be adjusted to a third pressure value. The third temperature threshold is less than the first temperature threshold, the third humidity threshold is less than the first humidity threshold, and the third pressure value can be 0.8 times the first pressure value.

[0068] At this time, the pressure threshold is adjusted to the third pressure value, that is, when the gas pressure inside the integrated container is greater than or equal to the lower second pressure value, the first control valve can be controlled to fill the first gas into the integrated container at the third filling speed, and the second control valve can be controlled to fill the second gas into the integrated container at the fourth filling speed.

[0069] In some embodiments, the method for processing the two gases may further include: obtaining the ratio of the two gases in the integrated container; determining whether the gas in the integrated container meets the gas processing requirements based on the ratio of the two gases; if the gas in the integrated container does not meet the gas processing requirements, determining the amount of the two gases that still need to be filled in based on the gas processing requirements and the ratio of the two gases; and controlling the two control valves based on the amount of the two gases that still need to be filled in.

[0070] For example, if the amount of the two gases that need to be charged is greater than the amount of the second gas that needs to be charged, the opening of the first control valve can be controlled to be greater than the opening of the second control valve. By controlling the opening of the first control valve to be greater than the opening of the second control valve, the amount of the first gas injected is greater than the amount of the second gas injected.

[0071] If the amount of the two gases that need to be charged is less than the amount of the second gas, the opening of the first control valve can be controlled to be smaller than the opening of the second control valve. By controlling the opening of the first control valve to be smaller than the opening of the second control valve, the amount of the first gas injected is smaller than the amount of the second gas injected.

[0072] If the amount of the two gases that need to be charged is equal to the amount of the second gas that needs to be charged, the opening of the first control valve can be controlled to be equal to the opening of the second control valve. By controlling the opening of the first control valve to be equal to the opening of the second control valve, the amount of the first gas charged in is equal to the amount of the second gas charged.

[0073] For example, if the amount of the first gas that needs to be charged is greater than the amount of the second gas that needs to be charged, the time for the first control valve to be opened can be controlled to be greater than the time for the second control valve to be opened. By controlling the time for the first control valve to be opened to be greater than the time for the second control valve to be opened, the amount of the first gas charged is greater than the amount of the second gas charged.

[0074] If the amount of the first gas that needs to be charged is less than the amount of the second gas that needs to be charged, the time for opening the first control valve can be controlled to be less than the time for opening the second control valve. By controlling the time for opening the first control valve to be less than the time for opening the second control valve, the amount of the first gas charged is less than the amount of the second gas charged.

[0075] If the amount of the first gas that needs to be charged is equal to the amount of the second gas that needs to be charged, the time when the first control valve is opened can be controlled to be equal to the time when the second control valve is opened. By controlling the time when the first control valve is opened to be equal to the time when the second control valve is opened, the amount of the first gas charged is equal to the amount of the second gas charged.

[0076] In addition, the opening degree and opening time of the control valve can be controlled at the same time to achieve the amount of the two gases charged in to meet the requirements. For example, if the amount of the two gases that need to be charged is greater than the amount of the second gas that needs to be charged, the opening degree and opening time of the first control valve can be controlled to be greater than the opening degree and opening time of the second control valve. By controlling the opening degree and opening time of the first control valve to be greater than the opening degree and opening time of the second control valve, the amount of the first gas charged in is greater than the amount of the second gas charged.

[0077] If the amount of the two gases that need to be charged is less than the amount of the second gas, the opening degree and opening time of the first control valve can be controlled to be less than the opening degree and opening time of the second control valve. By controlling the opening degree and opening time of the first control valve to be less than the opening degree and opening time of the second control valve, the amount of the first gas charged is less than the amount of the second gas charged.

[0078] If the amount of the first gas that needs to be charged is equal to the amount of the second gas that needs to be charged, the opening degree and opening time of the first control valve can be controlled to be equal to the opening degree and opening time of the second control valve. By controlling the opening degree and opening time of the first control valve to be equal to the opening degree and opening time of the second control valve, the amount of the first gas charged is equal to the amount of the second gas charged.

[0079] In some embodiments, the two-gas processing method may further include: determining the target gas with the largest proportion of the first gas and the second gas according to the gas processing requirements; evacuating the integrated container; after the evacuation is completed, controlling the container corresponding to the target gas to fill the target gas into the integrated container; evacuating the integrated container; controlling the first gas container and the second gas container to fill the first gas and the second gas into the integrated container. Specifically, this can be achieved by a vacuum pump, and the vacuum pump and the integrated container are connected by a pipeline.

[0080] The controller determines the larger target gas among the two gas components according to the gas processing requirements; evacuates the integrated container, and after the evacuation is completed, the container corresponding to the target gas is filled with the target gas into the integrated container for gas washing; after the gas washing is completed, the integrated container is evacuated again, and then the first gas container and the second gas container are filled with gas into the integrated container.

[0081] For example, according to the gas processing requirements, the target gas with the largest component proportion is determined to be the first gas; the integrated container is vacuumed, and then the first gas container fills the integrated container with the first gas for washing, and then the integrated container is vacuumed again, and then the first gas container 11 and the second gas container fill the integrated container with gas for processing.

[0082] In the method for processing the above two gases, the controller obtains the gas processing instruction, parses the gas processing instruction to obtain the gas processing requirement, and obtains the gas pressure inside the integrated container. Afterwards, a control instruction is sent to the first control valve and the second control valve according to the gas processing requirement and the gas pressure inside the integrated container, so that the first control valve and the second control valve execute the control instruction, and input the first gas and the second gas into the integrated container for processing. The application embodiment detects the gas pressure inside the integrated container, and then controls the two control valves according to the gas pressure and the gas processing requirement through the controller, and inputs the first gas and the second gas into the integrated container for processing. The process is simple and the accuracy is high.

[0083] Figure 2 FIG. 1 is a schematic diagram of a controller provided by an embodiment of the present invention. Figure 2 As shown, the controller 200 of this embodiment includes a processor 210 and a memory 220. The memory 220 stores a computer program that can be run on the processor 210, such as a two-gas processing program. When the processor 210 executes the computer program, the steps in the above-mentioned two-gas processing method embodiment are implemented, such as Figure 1 Steps 101 to 103 are shown.

[0084] Exemplarily, the computer program may be divided into one or more modules / units, which are stored in the memory 220 and executed by the processor 210 to implement the present invention. The one or more modules / units may be a series of computer program instruction segments capable of implementing specific functions, which are used to describe the execution process of the computer program in the controller 200.

[0085] The controller 200 may be a computing device such as a desktop computer, a notebook, a PDA, or a cloud server. The controller may include, but is not limited to, a processor 210 and a memory 220. Those skilled in the art will appreciate that Figure 2 It is only an example of the controller 200 and does not constitute a limitation of the controller 200. It may include more or fewer components than shown in the figure, or a combination of certain components, or different components. For example, the controller may also include input and output devices, network access devices, buses, etc.

[0086] The processor 220 may be a central processing unit (CPU), or other general-purpose processors, digital signal processors (DSP), application-specific integrated circuits (ASIC), field-programmable gate arrays (FPGA), or other programmable logic devices, discrete gate or transistor logic devices, discrete hardware components, etc. A general-purpose processor may be a microprocessor or any conventional processor, etc.

[0087] The memory 220 may be an internal storage unit of the controller 200, such as a hard disk or memory of the controller 200. The memory 220 may also be an external storage device of the controller 200, such as a plug-in hard disk, a smart media card (SMC), a secure digital (SD) card, a flash card, etc. equipped on the controller 200. Further, the memory 220 may also include both an internal storage unit of the controller 200 and an external storage device. The memory 220 is used to store the computer program and other programs and data required by the controller. The memory 220 may also be used to temporarily store data that has been output or is to be output.

[0088] The embodiments described above are only used to illustrate the technical solutions of the present invention, rather than to limit the same. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some of the technical features may be replaced by equivalents. Such modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention, and should all be included in the protection scope of the present invention.

Claims

1. A method for treating two gases, characterized in that: include: The controller obtains a gas processing instruction, and parses the gas processing instruction to obtain a gas processing requirement, wherein the gas processing requirement includes a ratio and a volume between a first gas and a second gas, wherein the first gas is stored in a first gas container, and the second gas is stored in a second gas container; The controller obtains the gas pressure inside the integrated container, and the first gas and the second gas are input into the integrated container for processing; The controller sends control instructions to the first control valve and the second control valve according to the gas processing requirements and the gas pressure inside the integrated container, so that the first control valve and the second control valve execute the control instructions to input the first gas and the second gas into the integrated container for processing; wherein, the first control valve is arranged between the first gas container and the pipeline of the integrated container, and the second control valve is arranged between the second gas container and the pipeline of the integrated container.

2. The method for treating two gases according to claim 1, characterized in that: The two gas treatment methods also include: When the gas pressure inside the integrated container is less than the pressure threshold, the first control valve is controlled to fill the first gas into the integrated container at a first filling speed, and the second control valve is controlled to fill the second gas into the integrated container at a second filling speed.

3. The method for treating two gases according to claim 2, characterized in that: The two gas treatment methods also include: When the gas pressure inside the integrated container is greater than or equal to the pressure threshold, the first control valve is controlled to charge the first gas into the integrated container at a third charging speed, and the second control valve is controlled to charge the second gas into the integrated container at a fourth charging speed; The third charging speed is lower than the first charging speed, and the fourth charging speed is lower than the second charging speed.

4. The method for treating two gases according to claim 3, characterized in that: The two gas treatment methods also include: Real-time detection of temperature and humidity inside the integrated container; The pressure threshold is adjusted according to the temperature and humidity inside the integrated container; wherein, the higher the temperature and humidity inside the integrated container, the greater the pressure threshold; and the lower the temperature and humidity inside the integrated container, the smaller the pressure threshold.

5. The method for treating two gases according to claim 4, characterized in that: The step of adjusting the pressure threshold according to the temperature and humidity inside the integrated container comprises: When the temperature is greater than a first temperature threshold and the humidity is greater than a first humidity threshold, adjusting the pressure threshold to a first pressure value; When the temperature is greater than a second temperature threshold and the humidity is greater than a second humidity threshold, the pressure threshold is adjusted to a second pressure value; wherein the second temperature threshold is greater than the first temperature threshold, the second humidity threshold is greater than the first humidity threshold, and the second pressure value is 1.1 to 1.3 times the first pressure value; When the temperature is less than or equal to the first temperature threshold, or the humidity is less than the first humidity threshold, the pressure threshold is not adjusted.

6. The method for treating two gases according to claim 1, characterized in that: The two gas treatment methods also include: Get the ratio of the two gases in the integrated container; Determine whether the gas in the integrated container meets the gas treatment requirements based on the ratio of the two gases; If the gas in the integrated container does not meet the gas treatment requirements, the amount of the two gases that need to be filled in is determined based on the gas treatment requirements and the ratio of the two gases; The two control valves are controlled according to the amount of the two gases that still need to be filled.

7. The method for treating two gases according to claim 6, characterized in that: The two control valves are controlled according to the amount of two gases that need to be charged, including: If the amount of the two gases that need to be charged is greater than the amount of the second gas that needs to be charged, the opening of the first control valve is controlled to be greater than the opening of the second control valve; If the amount of the two gases that need to be charged is less than the amount of the second gas that needs to be charged, the opening of the first control valve is controlled to be smaller than the opening of the second control valve; If the amount of the two gases that need to be charged is equal to the amount of the second gas that needs to be charged, the opening of the first control valve is controlled to be equal to the opening of the second control valve.

8. The method for treating two gases according to claim 6, characterized in that: The two control valves are controlled according to the amount of two gases that need to be charged, including: If the amount of the two gases that need to be charged is greater than the amount of the second gas that needs to be charged, the time for which the first control valve is opened is controlled to be greater than the time for which the second control valve is opened; If the amount of the two gases that need to be charged is less than the amount of the second gas that needs to be charged, the time for which the first control valve is opened is controlled to be less than the time for which the second control valve is opened; If the amount of the two gases that need to be charged is equal to the amount of the second gas that needs to be charged, the time for which the first control valve is opened is controlled to be equal to the time for which the second control valve is opened.

9. The method for treating two gases according to claim 1, characterized in that: The two gas treatment methods also include: Determine a target gas having the largest component ratio of the first gas and the second gas according to the gas processing requirement; evacuating the integrated container; After the vacuuming is completed, the container corresponding to the target gas is controlled to fill the target gas into the integrated container; evacuating the integrated container; The first gas container and the second gas container are controlled to fill the integrated container with the first gas and the second gas.

10. A controller comprising a memory and a processor, wherein the memory stores a computer program that can be run on the processor, characterized in that: When the processor executes the computer program, the steps of the two-gas processing method as described in any one of claims 1 to 8 are implemented.

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