Pressure control system, control method and equipment for reaction container and medium
By designing a multi-stage condensation and exhaust system in the reaction vessel, the pressure in the reaction vessel is controlled, and the problems of energy consumption and material waste are solved, and the pressure is stable and safe operation is achieved.
Patent Information
- Application Number
- CN202411522770.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-29
- Publication Date
- 2025-01-03
AI Technical Summary
In the prior art, when pressure control is controlled in the reaction vessel, two condensation treatments are not required when the load is low, resulting in increased energy consumption. When the pressure rises, a large amount of propylene is discharged with the non-condensation gas, causing waste of materials.
Design a pressure control system, including first- and second-level condensation devices, non-condensation air flow control devices, high-selecting devices and torch main valves, and control the opening of the condensation valve and discharge valve through the pressure segment control device to ensure the reaction The pressure in the container is stable to avoid overpressure.
It reduces the energy consumption of the reaction vessel, avoids waste of materials, improves the anti-interference ability of the reaction vessel, ensures stable pressure, and avoids the risk of overpressure.
Smart Images
Figure CN119236828A_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the technical field of material production, in particular to the technical field of distillation systems, and specifically designs a pressure control system, a control method, a device and a medium for a reaction vessel. Background Art
[0002] In the material production process, reaction vessels are used to produce materials. Reaction vessels such as high-pressure propylene towers are used to distill propylene. However, since the composition of crude propylene sent from upstream production equipment often changes, the high-pressure propylene tower often has an increase in non-condensable gas content or a sudden increase in steam volume that exceeds the heat transfer capacity of the condenser. Therefore, in order to keep the pressure in the reaction vessel within a range that meets production standards, the reaction vessel needs to be pressure controlled.
[0003] At present, in the prior art, the commonly used pressure control method is to only utilize the heat transfer function of the continuous two condensations of the condensing device and the non-condensable gas discharge system HPVG to reduce the non-condensable gas concentration in the material gas in the reaction container, so as to achieve the purpose of controlling the pressure of the reaction container.
[0004] However, the inventors have found that the prior art has at least the following technical problems: when the load in the reaction container is low and two condensations are not required, it still undergoes two condensation processes, which increases energy consumption; and when the pressure increases, a large amount of propylene is discharged with the non-condensable gas, causing material waste. Summary of the invention
[0005] The present application provides a pressure control system, control method, equipment and medium for a reaction vessel, which can reduce energy consumption and avoid material waste while ensuring the pressure stability in the reaction vessel.
[0006] In a first aspect, the present application provides a pressure control system for a reaction vessel, wherein the reaction vessel is provided with a primary condensing device, a condensing vessel, and a secondary condensing device, wherein the primary condensing device is connected to the condensing vessel, the condensing vessel is connected to the secondary condensing device, the secondary condensing device is connected to a non-condensable gas discharge system, and the top of the reaction vessel is also directly connected to a flare main pipe; the control system comprises: a pressure range control device, a non-condensable gas flow control device, a high selection device, a valve position control device, a condensing valve, a discharge valve, and a flare main pipe valve;
[0007] The output end of the pressure range control device is respectively connected to the condensation valve, the high-pressure selection device and the valve position control device, the output end of the non-condensable gas flow control device is connected to the high-pressure selection device, the output end of the high-pressure selection device is connected to the discharge valve, and the valve position control device is connected to the flare main valve.
[0008] In a second aspect, the present application provides a pressure control method for a reaction vessel, using the pressure control system for the reaction vessel described in the first aspect, the method comprising:
[0009] Collect the pressure value in the reaction container in real time;
[0010] When it is detected that the pressure value is greater than the first pressure threshold, the pressure range control device is used to control the condensing valve opening to decrease, so that the material passes through the primary condensing device, the condensing container and the secondary condensing device in sequence until the condensing valve opening is completely closed;
[0011] When the condensation valve is completely closed, when it is detected that the pressure value continues to rise after exceeding the first pressure threshold, a signal is output to the high-speed selection device through the pressure range control device to control the opening of the high-speed selection control discharge valve of the high-speed selection device to increase, so that the uncondensed material gas and part of the non-condensable gas are discharged from the non-condensable gas discharge system;
[0012] When the opening of the discharge valve reaches the preset upper limit of the opening and it is detected that the pressure value continues to rise after exceeding the second pressure threshold, the valve position control device controls the opening of the flare main valve to allow uncondensed material gas to be discharged directly from the flare main.
[0013] In a possible implementation, the pressure range control device is used to control the condensation valve opening to decrease so that the material passes through a primary condensation device, a condensation container, and a secondary condensation device in sequence, including: the pressure range control device selects a first opening change curve from pre-stored output and valve opening corresponding information to control the condensation valve opening to decrease until the pressure range control device reaches a preset range point so that the material passes through a primary condensation device, a condensation container, and a secondary condensation device in sequence.
[0014] In one possible implementation, a signal is output to a high-selection device through a pressure range control device to control the opening of the high-selection control discharge valve of the high-selection device to increase, so that uncondensed material gas and part of the non-condensable gas are discharged from the non-condensable gas discharge system, including: outputting an opening signal to the high-selection device through a pressure range control device, so that the opening signal of the high-selection device after comparison processing and high-selection is output to the discharge valve, which is used to control the opening of the high-selection device to increase, so that uncondensed material gas and part of the non-condensable gas are discharged from the non-condensable gas discharge system, wherein the opening signal is obtained by the pressure range control device from the second opening change curve selected from the predicted output and the valve opening corresponding information.
[0015] In one possible implementation, when the valve position control device is used to control the opening of the flare main valve, the set value of the valve position control device is 80% to 90% of the opening of the discharge valve, wherein when the discharge valve is opened at more than 80%, it is deemed that the discharge valve has no adjustment ability at this stage, and when it is detected that the discharge valve opening reaches 80%, the valve position control device is used to control the flare main valve to open to a preset opening value, so that the valve opening of the discharge valve is maintained at 80%.
[0016] In a possible implementation, it also includes: when it is detected that the pressure value gradually decreases, the opening of the discharge valve is controlled to decrease through the pressure range device; when it is detected that the opening of the discharge valve is less than 80%, the valve position control device controls the flare main valve to be closed until the flare main valve is closed; when it is detected that the output value of the pressure range control device decreases to the preset range point, the opening change of the discharge valve is directly controlled by the non-condensable gas flow control device.
[0017] In a possible implementation, it also includes: after the opening of the discharge valve is reduced and the flare main valve is closed, if it is detected that the pressure value in the reaction container continues to decrease, the discharge valve is directly controlled by the non-condensable gas flow control device to restore the pressure value in the reaction container to a preset normal value.
[0018] In a possible implementation, it also includes: after the discharge valve is reduced to a preset lower limit of the opening, when it is detected that the pressure value in the reaction container is less than a first pressure threshold, the condensation valve is controlled by the pressure range control device to maintain the opening, and the discharge valve is controlled to open to the preset lower limit of the opening.
[0019] In a third aspect, the present application provides an electronic device, comprising: at least one processor and a memory;
[0020] The memory stores computer-executable instructions;
[0021] The at least one processor executes the computer-executable instructions stored in the memory, so that the at least one processor performs the pressure control method for a reaction container as described in the second aspect above.
[0022] In a fourth aspect, the present application provides a computer-readable storage medium, wherein the computer-readable storage medium stores a computer-executable instruction. When a processor executes the computer-executable instruction, the pressure control method for a reaction vessel as described in the second aspect above is implemented.
[0023] The present application provides a pressure control system, control method, equipment and medium for a reaction vessel, which can close the condensation valve under the condition that the heat transfer capacity of the secondary condensation device of the reaction vessel is limited, and use the primary condensation device and the secondary condensation device to reduce the concentration of non-condensable gas. Then, when the pressure cannot be reduced after the two-stage condensation treatment, the valve opening of the discharge valve is increased by high selection and overspeed to reduce the concentration of non-condensable gas, thereby achieving the purpose of pressure control. Then, when the discharge valve opening is close to full opening and the pressure is still further increased, the flare main valve is controlled to open by the valve position control device, and the non-condensable gas and material gas are quickly discharged to avoid the occurrence of overpressure in the reaction vessel triggering interlocking or causing further overpressure hidden dangers. And when the incoming materials are stable or the fluctuation is not large, its workload can be adjusted to perfectly match the limiting conditions under the current working conditions, improve the anti-interference ability of the distillation tower operation, and avoid the waste of raw materials and safety hazards caused by abnormal separation of the reaction vessel. BRIEF DESCRIPTION OF THE DRAWINGS
[0024] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, a brief introduction will be given below to the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative labor.
[0025] Figure 1 A schematic diagram of the connection structure of a pressure control system for a reaction vessel provided in an embodiment of the present application;
[0026] Figure 2 A schematic diagram of the corresponding relationship between the output and valve opening of the pressure split-range control device PC01 provided in an embodiment of the present application;
[0027] Figure 3 A schematic flow chart of a pressure control method for a reaction container provided in an embodiment of the present application;
[0028] Figure 4 A schematic diagram of the hardware structure of an electronic device provided in an embodiment of the present application. DETAILED DESCRIPTION
[0029] In order to make the purpose, technical solution and advantages of the embodiments of the present application clearer, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.
[0030] When the inventor used the existing reaction vessel pressure control system to control the pressure in the reaction vessel, he found that when the concentration of non-condensable gas increased, resulting in an increase in the pressure value in the reaction vessel, the problem of increasing the non-condensable gas content in the reaction vessel or the sudden increase in the amount of steam exceeding the system heat transfer caused by the change in the composition of the crude material transported by the upstream device was solved by controlling the flow rate of the material gas extracted from the reaction vessel to the condensing device and using the heat transfer capacity of the condenser. Therefore, when the pressure continues to rise, the heat transfer capacity of the condensing device is not enough to reduce the pressure, and a large amount of material is discharged with the non-condensable gas, which will cause the problem of material waste. When the pressure returns to a normal level or even lower, there is no need for multiple condensations through the condensing device, which also causes the problem of energy waste during the use of the reaction vessel.
[0031] To solve the above technical problems, the embodiments of the present application provide the following technical concepts for solving the problems: First, the reaction vessel is a process of gradually increasing the amount of steam. When the non-condensable gas in the gas extracted from the reaction vessel increases, the non-condensable gas cannot be condensed into liquid by relying solely on the secondary condensing device. At this time, part of the non-condensable gas is condensed by the primary condensing device and the secondary condensing device to achieve the effect of reducing the concentration of non-condensable gas, thereby achieving pressure control, and introducing step control in this process. When all non-condensable gases cannot reduce the pressure in the reaction vessel after all the non-condensable gases have passed through the two-stage condensation, it is necessary to control the discharge valve to be discharged in time through the output signal of the high-selection control device to reduce the concentration of non-condensable gas. When the discharge valve is close to fully open, the pressure in the reaction vessel continues to rise. At this time, the flare main valve is controlled to open by the valve position controller to further discharge non-condensable gas and material gas, thereby achieving the purpose of controlling the pressure stability in the reaction vessel.
[0032] Figure 1 A schematic diagram of the connection structure of the pressure control system for a reaction vessel provided in an embodiment of the present application, such as Figure 1 As shown, the reaction vessel is provided with a primary condensing device E01, a condensing vessel D01 and a secondary condensing device E02, wherein the primary condensing device is connected to D01, D01 is connected to the secondary condensing device E02, the secondary condensing device E02 is connected to the non-condensable gas discharge system HPVG, and the top of the reaction vessel is also directly connected to the flare main pipe. The pressure control system for the reaction vessel includes: a pressure split range control device PC01, a non-condensable gas flow control device FC01, a high separation device FY01, a valve position control device VPC01, a condensing valve PV01.1, a discharge valve PV01.2 and a flare main pipe valve PV02.
[0033] Among them, the output end of the pressure range control device PC01 is respectively connected to the condensation valve PV01.1, the high-pressure selection device FY01 and the valve position control device VPC01, the output end of the non-condensable gas flow control device FC01 is connected to FY01, the output end of the high-pressure selection device FY01 is connected to the discharge valve PV01.2, and the valve position control device VPC01 is connected to the flare main valve PV02.
[0034] In this embodiment, the reaction container may be a container for processing materials delivered by an upstream device. For example, the reaction container may be a high-pressure propylene tower for distilling out the material propylene.
[0035] Figure 2 Schematic diagram of the corresponding relationship between the output and valve opening of the pressure split-range control device PC01 provided in an embodiment of the present application.
[0036] like Figure 2 As shown, in this embodiment, the pressure split-range control device PC01 can be a split-range controller, the control principle of which is to control the valve operation according to the split-range point x, wherein the split-range point is to find a certain point x in the output of the regulator from 0 to 100%, so that the condensing valve PV01.1 works in the output section 0-x% of the split-range controller, and the discharge valve PV01.2 works in the output section x-100% of the split-range controller. At the same time, the split-range point x needs to ensure that the controlled variable of the entire pipeline does not cause a sudden change when the condensing valve PV01.1 and the discharge valve PV01.2 are switched.
[0037] In this embodiment, the non-condensable gas flow control device FC01 can be a flow controller, and the high selection device FY01 can be an override high selection controller, which is used to select the highest signal from multiple input signals as an output, for example: selecting the valve opening of the discharge valve PV01.2 from the signal input from the pressure range control device PC01 and the signal input from the non-condensable gas flow control device FC01.
[0038] In this embodiment, the valve position control device VPC01 can be a valve position controller, which can be used to control the opening of the valve. For example, the valve position controller controls the flare main valve PV02 to open. At this time, the setting value of the valve position controller is 80% to 90% of the opening of the discharge valve PV01.2.
[0039] In this embodiment, the output end of the pressure range control device PC01 can be connected to the condensation valve PV01.1, the high-speed selection device and the valve position control device VPC01 by wired or wireless means to achieve the purpose of signal transmission. Similarly, the output end of the non-condensable gas flow control device FC01 is connected to the high-speed selection device FY01, the output end of the high-speed selection device FY01 is connected to the discharge valve PV01.2, and the valve position control device VPC01 is connected to the flare main valve PV02, which can be achieved by wired or wireless means.
[0040] The signals of the pressure range control device PC01 are output to the condensing valve PV01.1, the high-pressure selection device FY01 and the valve position control device VPC01 respectively, and the signal of the non-condensable gas flow control device FC01 is output to the high-pressure selection device FY01. After comparison by the high-pressure selection device FY01, the high-pressure selection valve opening signal is output to the discharge valve PV01.2. When the valve position value output to the valve position control device VPC01 reaches the pre-stored set value of the valve position controller VPC01, the valve position control device VPC01 outputs the corresponding valve opening signal to the flare main valve PV02.
[0041] like Figure 1 As shown, in this embodiment, the implementation principle of the pressure control system for the reaction container is as follows:
[0042] Assumptions Figure 1 The pressure split range control device PC01 is positive, the non-condensable gas flow control device FC01 is negative, and the valve position control device VPC01 is positive. Before the interference, when the reaction vessel is in a stable operating state or the load in the reaction vessel is low, the gas at the top of the reaction vessel mainly enters the condensation vessel D01 directly through the condensation valve PV01.1 for temporary storage and then enters the secondary condensation device E02. In order to ensure the stability of the interval pressure before the split range point (assuming that the split range point in this embodiment is 50%), give full play to the cooling capacity of the primary condensation device E01 and the secondary condensation device E02, but it is necessary to remove the non-condensable gas entrained in the gas at the top of the reaction vessel, at this time, the discharge valve PV01.2 is also opened to a certain small opening (for example, 5% opening, the corresponding non-condensable gas flow control device FC01 output setting value is 5%).
[0043] As the non-condensable gas concentration at the top of the reaction vessel increases, it gradually reaches the heat exchange limit of the secondary condensing device E02, and the pressure in the reaction vessel gradually increases. At this time, under the action of the pressure range control device PC01, the opening of the condensation valve PV01.1 is gradually controlled to be closed. At this time, the gas passing through the secondary condensing device E02 gradually increases, and the heat transfer capacity of the entire system is enhanced, thereby achieving the purpose of controlling the pressure of the reaction vessel to avoid overpressure and eliminate safety hazards. If the pressure of the reaction vessel is still rising after a period of time, the discharge valve PV01.2 is controlled to continue to open, and the uncondensed material gas and part of the non-condensable gas are discharged in time to maintain the stability of the tower pressure.
[0044] When the discharge valve PV01.2 is nearly fully open, if the pressure in the reaction vessel continues to increase, the flare main valve PV02 will be opened under the control of the pressure range control devices PC01 and VPC, so that the non-condensable gas is discharged from the flare main, reducing safety hazards.
[0045] In summary, the pressure control system for a reaction vessel provided in the embodiment of the present application can realize graded and segmented pressure control through the pressure range control device PC01, the non-condensable gas flow control device FC01, the high selection device FY01 and the valve position control device VPC01, and can automatically open the primary condensing device E01 under the condition that the heat transfer capacity of the secondary condensing device E02 at the top of the reaction vessel is limited, and the high selection overruns to open the large discharge valve when the pressure cannot be reduced after two condensations. When the pressure further increases, the flare main valve is controlled by the valve position control device VPC01 to discharge quickly, ensuring that the overpressure will not trigger the interlock or cause further overpressure safety hazards. When the incoming materials are stable or the fluctuations are not large, the workload can be adjusted to perfectly match the limiting conditions under the current working conditions, improve the anti-interference ability of the reaction vessel operation, and avoid the waste of raw materials and safety risks caused by the abnormal separation of the distillation tower. And when the pressure of the reaction vessel is low, it is not necessary to pass through the primary condensing device E01, which reduces energy consumption.
[0046] Figure 3 This is a flow chart of a pressure control method for a reaction container provided in an embodiment of the present application. The execution subject of this embodiment can be integrated with Figure 1 The servers or control chips and other devices of the pressure range control device PC01, the non-condensable gas flow control device FC01, the high selection device FY01, and the valve position control device VPC01 in the illustrated embodiment may also be other computer-related devices, and there is no particular limitation on this embodiment.
[0047] like Figure 3 As shown, the pressure control method for a reaction container comprises:
[0048] S301: Collect the pressure value in the reaction container in real time.
[0049] In this embodiment, the pressure value in the reaction vessel can be a pressure value collected in real time by a pressure gauge or other pressure detection equipment electrically connected to the pressure range control device PC01. The change in the pressure value in the reaction vessel over a period of time can directly reflect the relative high or low concentration value of the non-condensable gas. For example, after the valve opening of the discharge valve PV01..2 is fully opened, if the pressure value in the reaction vessel does not decrease but increases over a period of time, it means that the concentration of non-condensable gas in the reaction vessel is increasing, which also indirectly reflects that the heat transfer capacity range of the primary condenser E01 and the secondary condenser E02 has been exceeded at this time, and the proportion of non-condensable gas is gradually increasing. The concentration value of non-condensable gas is positively correlated with the pressure in the reaction vessel. The greater the pressure value in the reaction vessel, the higher the concentration value of non-condensable gas.
[0050] S302: When the pressure value detected is greater than the first pressure threshold, the opening of the condensation valve PV01.1 is controlled to decrease through the pressure range control device PC01, so that the material passes through the primary condensation device E01, the condensation container D01 and the secondary condensation device E02 in sequence until the opening of the condensation valve PV01.1 is completely closed.
[0051] In this embodiment, when the pressure value is greater than the first concentration threshold, it indicates that the pressure in the reaction container is rising. The heat transfer capacity of the secondary condensing device E02 alone cannot make part of the gas in the material gas reach the condensation point, and the concentration of non-condensable gas gradually increases, resulting in the inability to control the pressure in the reaction container. The first pressure threshold can be a value pre-set by the staff or automatically set according to historical data. At this time, the opening of PV01.1 is controlled to decrease through the pressure split range control device PC01, so that part of the material can flow from the primary condensing device E01 to D01, giving full play to the heat transfer capacity of the primary condensing device E01 and the secondary condensing device E02, so that part of the gas in the material gas is condensed, the concentration of non-condensable gas is reduced, and the pressure in the reaction container is reduced.
[0052] In an optional embodiment of the present application, step S302 includes: selecting the first opening change curve from the pre-stored output and valve opening corresponding information through the pressure range control device PC01 to control the condensation valve PV01.1 to reduce the opening until the pressure range control device PC01 reaches the preset range point, so that the material passes through the first-level condensation device E01, the condensation container D01 and the second-level condensation device E02 in sequence.
[0053] In this embodiment, the preset split range point can be obtained through field tests or pre-set based on experience. For example: x = 50%. The opening size of the condensing valve PV01.1 can be determined by the pressure split range control device PC01 according to the pressure value in the reaction container. Of course, it can also be manually controlled or controlled by a pre-stored opening value.
[0054] In this embodiment, the prediction output and the valve opening corresponding information can be Figure 2 The coordinates of the points in the first opening change curve can be Figure 2 The controller shown outputs a line segment consisting of all coordinates between 0% and 50%.
[0055] S303: When the condensing valve is fully closed and it is detected that the pressure value continues to rise after being greater than the first pressure threshold, a signal is output to the high selection device FY01 through the pressure range control device PC01 to control the opening of the high selection control discharge valve PV01.2 of the high selection device FY01 to increase the opening, so that the uncondensed material gas and part of the non-condensable gas are discharged from the non-condensable gas discharge system HPVG.
[0056] In this embodiment, it is detected that the pressure value continues to rise after being greater than the first pressure threshold, indicating that the pressure in the reaction vessel is further increasing and the heat transfer capacity of the first-level condensing device E01 and the second-level condensing device E02 is insufficient to fully condense the material gas, and the concentration of non-condensable gas gradually increases, making it difficult to maintain the pressure stability in the reaction vessel. At this time, it is necessary to open the large discharge valve PV01.2 through the pressure range control device PC01, so as to discharge the uncondensed material gas and part of the non-condensable gas in time to maintain the pressure stability in the reaction vessel. Among them, the second concentration threshold can be a numerical value pre-set manually based on experience or a numerical value automatically set based on historical data.
[0057] In an optional embodiment of the present application, step S303 includes: outputting an opening signal to the high selection device FY01 through the pressure range control device PC01, so that the opening signal of the high selection device FY01 after comparison processing is output to the discharge valve PV01.2, which is used to control the opening of the discharge valve PV01.2 to increase, so that uncondensed material gas and part of the non-condensable gas are discharged from the non-condensable gas discharge system HPVG, wherein the opening signal is obtained by the pressure range control device PC01 from the second opening change curve selected from the predicted output and the valve opening corresponding information.
[0058] In this embodiment, the second opening variation curve can be Figure 2 The controller shown outputs a line segment consisting of all coordinates between x% and 100%.
[0059] In an optional embodiment of the present application, it is also included that after the opening of the condensation valve PV01.1 is reduced, if it is detected that the pressure value in the reaction container continues to increase but does not reach the second pressure threshold, it is also necessary to follow the following steps: Figure 2 The output and valve opening correspondence shown in the figure continues to control the opening of the condensing valve PV01.1 to decrease until the pressure value in the reaction container collected in real time remains unchanged or decreases. At this time, the corresponding one-stage condensing valve PV01.1 is automatically put into normal pressure control.
[0060] S304: When the opening of the discharge valve PV01.2 reaches the preset upper limit of the opening and it is detected that the pressure value exceeds the second pressure threshold and continues to rise, the valve position control device VPC01 controls the opening of the flare main valve PV02 to allow the uncondensed material gas to be discharged directly from the flare main.
[0061] In this embodiment, the opening of the flare main valve PV02 is controlled by the valve position control device VPC01, so that the uncondensed material gas is directly discharged from the flare main to maintain the opening of the discharge valve PV01.2 not exceeding the preset opening upper limit. The preset opening upper limit can be the opening value of the discharge valve PV01.2 close to the full opening, for example: the preset opening upper limit is 99% or 99.8%. The third concentration threshold can be a pre-set value. When the pressure value in the reaction vessel exceeds the second pressure threshold, it means that the heat transfer capacity of the primary condensing device E01 and the secondary condensing device E02 and the discharge of non-condensable gas and material gas from the discharge valve PV01.2 cannot reduce the concentration of non-condensable gas in the reaction vessel, thereby reducing or maintaining the pressure unchanged. At this time, it is necessary to control the flare main valve PV02 to open to the preset opening value through the valve position control device VPC01, so as to achieve the purpose of quickly reducing the concentration of non-condensable gas in the reaction vessel and control the pressure in the reaction vessel to be stable. The preset opening value may be a preset opening value of the flare main valve PV02, for example: 50%, 80%.
[0062] In an optional embodiment of the present application, when the opening of the flare main valve PV02 is controlled by the valve position control device VPC01, the set value of the valve position control device VPC01 is 80% to 90% of the opening of the discharge valve PV01.2, wherein when the opening of the discharge valve PV01.2 exceeds 80%, it is deemed that the discharge valve PV01.2 has no adjustment ability at this stage, and when it is detected that the opening of the discharge valve PV01.2 reaches 80%, the valve position control device VPC01 controls the flare main valve PV02 to open to a preset opening value, so that the valve opening of the discharge valve PV01.2 is maintained at 80%.
[0063] In this embodiment, it is assumed that the opening value of the discharge valve PV01.2 is 99%, and the preset opening value is 79.2% to 89.1%. In this embodiment, considering that most valves have poor adjustment performance when the opening exceeds 80%, it can be regarded that the discharge valve PV01.2 has no adjustment ability at this stage. When the opening of the discharge valve PV01.2 reaches 80%, VPC01 controls PV02 to open to a suitable opening so that the valve opening of PV01.2 is maintained at 80%. Based on the above embodiment, the pressure control method for a reaction vessel provided in an optional embodiment of the present application also includes:
[0064] Step A: When it is detected that the pressure value gradually decreases, the opening of the discharge valve PV01.2 is controlled to decrease through the pressure range device PC01. When it is detected that the opening of the discharge valve PV01.2 is less than 80%, the valve position control device VPC01 controls the flare main valve PV02 to be closed until the flare main valve PV02 is closed.
[0065] In an optional embodiment of the present application, step A can also be that when it is detected that the pressure value is gradually decreasing, the opening of the discharge valve PV01.2 is controlled to decrease through the pressure range device PC01 until the opening of the discharge valve PV01.2 is reduced to a preset value of the discharge opening, and the flare main valve PV02 is controlled to be closed through the valve position control device VPC01 until the opening of the flare main valve PV02 is reduced to the preset flare main valve lower limit value.
[0066] In this embodiment, the preset discharge opening value may be a value within the preset opening range of the discharge valve PV01.2, for example, the preset discharge opening value may be 80% of the discharge valve PV01.2. When the pressure value is detected to be gradually reduced, it indicates that the upstream process disturbance gradually stabilizes and returns to the normal load and is within the heat transfer capacity range of the first-level condensing device E01 and the second-level condensing device E02 at the top of the tower.
[0067] Step B: When the opening of the flare main valve PV02 decreases to the preset lower limit of the flare main valve, the opening of the discharge valve PV01.2 is controlled by the pressure range control device PC01 to remain unchanged or continue to decrease until the output value of the pressure range control device PC01 decreases to the preset range point.
[0068] In this embodiment, the preset lower limit value of the flare main valve can be a pre-set opening value that will not cause material waste and excess loss. For example, the preset lower limit value of the flare main valve can be 0% (corresponding to the valve being fully closed) or other smaller values close to 0%.
[0069] In this embodiment, the preset split point has been described in the above embodiment, so it will not be repeated here in this embodiment.
[0070] Step C: When it is detected that the output value of the pressure split-range control device PC01 decreases to the preset split-range point, the opening change of the discharge valve PV01.2 is directly controlled by the non-condensable gas flow control device FC01.
[0071] In an optional embodiment of the present application, step C may also be: when it is detected that the output value of the pressure split-range control device PC01 decreases to a preset split-range point, the opening change of the discharge valve PV01.2 is directly controlled by the non-condensable gas flow control device FC01.
[0072] In this embodiment, when it is detected that the output value of the pressure range control device PC01 decreases to the best range point, it means that the circuit of the high-selection device FY01 controlling the discharge valve PV01.2 fails. At this time, only the non-condensable gas flow control device FC01 directly controls the opening change of the discharge valve to discharge the non-condensable gas and material gas in time, so as to achieve pressure control of the reaction container.
[0073] On the basis of the above embodiment, a pressure control method for a reaction container provided as an optional embodiment of the present application further includes:
[0074] Step D: After the opening of the discharge valve PV01.2 is reduced and the flare main valve PV02 is closed, if it is detected that the pressure value in the reaction container continues to decrease, the discharge valve PV01.2 is directly controlled by the non-condensable gas flow control device FC01 to restore the pressure value in the reaction container to the preset normal value.
[0075] A pressure control method for a reaction container provided in an optional embodiment of the present application further includes:
[0076] Step E: After the discharge valve is reduced to the preset lower limit of the opening, when it is detected that the pressure value in the reaction container is less than the first pressure threshold, the pressure range control device PC01 controls the condensation valve PV01.1 to maintain the opening, and controls the discharge valve PV01.2 to open to the preset lower limit of the opening.
[0077] In this embodiment, the preset lower limit of the opening refers to the preset minimum opening value, which is greater than 0%. This is to ensure the stability of the pressure in the reaction vessel in the interval before the split point x, give full play to the cooling capacity of the secondary condensing device E02, but it is necessary to remove the non-condensable gas entrained in the top gas in the reaction vessel, thereby reducing energy consumption. For example, the preset lower limit of the opening is 5%.
[0078] In an optional embodiment of the present application, in view of the contents described in the above method embodiment, a three-stage pressure control strategy loop operation sequence for a reaction vessel is also provided, so that those skilled in the art can control the pressure in the reaction vessel. The specific operation sequence is as follows:
[0079] 1) The valve position control device VPC01 in the third-level overpressure protection circuit is automatically put into use to prevent overpressure of the tower equipment;
[0080] 2) The pressure split-range control device PC01 in the second-stage high-pressure override high-selection protection circuit is first turned on manually, and the output value is set to a suitable value between 0% and the split-range point x to avoid overriding control and causing large process fluctuations during start-up;
[0081] 3) The non-condensable gas flow control device FC01 in the first-stage high-pressure non-condensable gas discharge flow control loop is automatically put into use, and the non-condensable gas is discharged in time when the pressure rises due to the increase of non-condensable gas;
[0082] 4) The first stage split-range condensing valve PV01.1 is automatically put into operation for normal pressure control;
[0083] 5) Two-stage split-range discharge valve PV01.2 (high-pressure override high-selection circuit) according to the following Figure 2 It is controlled by the range curve shown in the figure. After manually selecting the appropriate valve position, it is put into automatic use.
[0084] In an optional embodiment of the present application, a pressure control method for a reaction vessel is provided, and the opening size of the discharge valve PV01.2 can be controlled by the non-condensable gas flow controller FC01 to adjust the discharge flow size from the non-condensable gas discharge system HPVG to adapt to the heat transfer capacity of the primary condensing device E01 and the secondary condensing device E02, thereby realizing pressure control in the reaction vessel to achieve the purpose of further reducing energy consumption.
[0085] In summary, the pressure control method for the reaction vessel provided in the embodiment of the present application, through the pressure control strategies and steps of different stages and levels described in the above method embodiments, can close the condensation valve PV01.1 under the working condition where the heat transfer capacity of the secondary condensation device E02 of the reaction vessel is limited, and use the primary condensation device and the secondary condensation device to reduce the concentration of non-condensable gas. Then, when the pressure cannot be reduced after the two-stage condensation treatment, the valve opening of the discharge valve PV01.2 is increased by high selection and overspeed to reduce the concentration of non-condensable gas, thereby achieving the purpose of pressure control. Then, when the opening of the discharge valve PV01.2 is close to full opening and the pressure is still further increased, the flare main valve PV02 is controlled by the valve position controller VPC01 to open, and the non-condensable gas and material gas are quickly discharged to ensure that the reaction vessel overpressure triggers the interlock or causes further overpressure hazards. And when the incoming materials are stable or the fluctuation is not large, its workload can be adjusted to perfectly match the limiting conditions under the current working conditions, improve the anti-interference ability of the distillation tower operation, and avoid the waste of raw materials and safety hazards caused by abnormal separation of the reaction vessel.
[0086] Figure 4 A schematic diagram of the hardware structure of an electronic device provided in an embodiment of the present application is shown in FIG. Figure 4 As shown, the device includes: at least one processor 401 and a memory 402 .
[0087] The memory 402 is used to store computer-executable instructions.
[0088] The processor 401 is used to execute the computer-executable instructions stored in the memory 402 to implement the various steps involved in the above method embodiment. For details, please refer to the relevant description in the above method embodiment.
[0089] Optionally, the memory 402 may be independent or integrated with the processor 401 .
[0090] When the memory 402 is independently provided, the device further includes a bus 403 for connecting the memory 402 and the processor 401 .
[0091] An embodiment of the present application also provides a computer-readable storage medium, in which computer-executable instructions are stored. When a processor executes the computer-executable instructions, the above-mentioned pressure control method for a reaction container is implemented.
[0092] An embodiment of the present application also provides a computer program product, including a computer program, which implements the above pressure control method for a reaction container when executed by a processor.
[0093] In the several embodiments provided in the present application, it should be understood that the disclosed devices and methods can be implemented in other ways. For example, the device embodiments described above are only schematic. For example, the division of the above modules is only a logical function division. There may be other division methods in actual implementation, such as multiple modules can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the mutual coupling or direct coupling or communication connection shown or discussed can be through some interfaces, indirect coupling or communication connection of devices or modules, which can be electrical, mechanical or other forms.
[0094] The modules described above as separate components may or may not be physically separated, and the components shown as modules may or may not be physical units, that is, they may be located in one place or distributed on multiple network units. Some or all of the modules may be selected according to actual needs to implement the solution of this embodiment.
[0095] In addition, each functional module in each embodiment of the present invention may be integrated into one processing unit, each module may exist physically separately, or two or more modules may be integrated into one unit. The unit composed of the above modules may be implemented in the form of hardware or in the form of hardware plus software functional units.
[0096] The above-mentioned integrated module implemented in the form of a software function module can be stored in a computer-readable storage medium. The above-mentioned software function module is stored in a storage medium, including a number of instructions for causing a computer device (which can be a personal computer, a server, or a network device, etc.) or a processor to perform some steps of the method of each embodiment of the present application.
[0097] It should be understood that the processor may be a central processing unit (CPU), or other general-purpose processors, digital signal processors (DSP), application-specific integrated circuits (ASIC), etc. A general-purpose processor may be a microprocessor or any conventional processor. The steps of the method disclosed in the invention may be directly implemented as being executed by a hardware processor, or may be implemented by a combination of hardware and software modules in the processor.
[0098] The memory may include a high-speed RAM memory, and may also include a non-volatile storage NVM, such as at least one disk memory, and may also be a USB flash drive, a mobile hard disk, a read-only memory, a magnetic disk or an optical disk, etc.
[0099] The bus may be an Industry Standard Architecture (ISA) bus, a Peripheral Component Interconnect (PCI) bus, or an Extended Industry Standard Architecture (EISA) bus, etc. The bus may be divided into an address bus, a data bus, a control bus, etc. For ease of representation, the bus in the drawings of the present application is not limited to only one bus or one type of bus.
[0100] The above storage medium can be implemented by any type of volatile or non-volatile storage device or a combination thereof, such as static random access memory (SRAM), electrically erasable programmable read-only memory (EEPROM), erasable programmable read-only memory (EPROM), programmable read-only memory (PROM), read-only memory (ROM), magnetic memory, flash memory, magnetic disk or optical disk. The storage medium can be any available medium that can be accessed by a general or special purpose computer.
[0101] An exemplary storage medium is coupled to a processor so that the processor can read information from the storage medium and write information to the storage medium. Of course, the storage medium can also be a component of the processor. The processor and the storage medium can be located in an application specific integrated circuit (ASIC). Of course, the processor and the storage medium can also exist as discrete components in an electronic device or a main control device.
[0102] Those skilled in the art can understand that all or part of the steps of implementing the above-mentioned method embodiments can be completed by hardware related to program instructions. The aforementioned program can be stored in a computer-readable storage medium. When the program is executed, the steps of the above-mentioned method embodiments are executed; and the aforementioned storage medium includes: ROM, RAM, disk or optical disk and other media that can store program codes.
[0103] The present invention is intended to illustrate the technical solution of the present application rather than to limit it. Although the present application has been described in detail with reference to the aforementioned embodiments, a person skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some or all of the technical features may be replaced by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solution from the scope of the technical solutions of the embodiments of the present application.
Claims
1. A pressure control system for a reaction vessel, characterized in that: The reaction vessel is provided with a primary condensing device, a condensing container and a secondary condensing device, wherein the primary condensing device is connected to the condensing container, the condensing container is connected to the secondary condensing device, the secondary condensing device is connected to the non-condensable gas discharge system, and the top of the reaction vessel is also directly connected to the flare main pipe; the control system includes: a pressure range control device, a non-condensable gas flow control device, a high selection device, a valve position control device, a condensing valve, a discharge valve and a flare main pipe valve; The output end of the pressure range control device is respectively connected to the condensation valve, the high-pressure selection device and the valve position control device, the output end of the non-condensable gas flow control device is connected to the high-pressure selection device, the output end of the high-pressure selection device is connected to the discharge valve, and the valve position control device is connected to the flare main valve.
2. A pressure control method for a reaction container, using the pressure control system for a reaction container according to claim 1, characterized in that: The method comprises: Collect the pressure value in the reaction container in real time; When it is detected that the pressure value is greater than the first pressure threshold, the pressure range control device is used to control the condensing valve opening to decrease, so that the material passes through the primary condensing device, the condensing container and the secondary condensing device in sequence until the condensing valve opening is completely closed; When the condensation valve is completely closed, when it is detected that the pressure value continues to rise after exceeding the first pressure threshold, a signal is output to the high-speed selection device through the pressure range control device to control the opening of the high-speed selection control discharge valve of the high-speed selection device to increase, so that the uncondensed material gas and part of the non-condensable gas are discharged from the non-condensable gas discharge system; When the opening of the discharge valve reaches the preset upper limit of the opening and it is detected that the pressure value continues to rise after exceeding the second pressure threshold, the valve position control device controls the opening of the flare main valve to allow uncondensed material gas to be discharged directly from the flare main.
3. The method according to claim 2, characterized in that The step of controlling the condensation valve opening to decrease by the pressure range control device so that the material passes through the primary condensation device, the condensation container and the secondary condensation device in sequence until the condensation valve opening is completely closed includes: The pressure range control device selects the first opening change curve from the pre-stored output and valve opening corresponding information to control the condensing valve opening to decrease until the pressure range control device reaches the preset range point, so that the material passes through the primary condensing device, the condensing container D01 and the secondary condensing device in sequence until the condensing valve opening is completely closed.
4. The method according to claim 2, characterized in that: Outputting a signal to the high-speed separation device through the pressure range control device to control the opening of the high-speed separation control discharge valve of the high-speed separation device to increase, so that the uncondensed material gas and part of the non-condensable gas are discharged from the non-condensable gas discharge system, including: An opening signal is output to the high-selection device through the pressure range control device, so that the opening signal of the high-selection device after comparison processing is output to the discharge valve, which is used to control the opening of the high-selection device to increase, so that uncondensed material gas and part of the non-condensable gas are discharged from the non-condensable gas discharge system, wherein the opening signal is obtained by the pressure range control device from the second opening change curve selected from the predicted output and the valve opening corresponding information.
5. The method according to claim 2, characterized in that: When the opening of the flare main valve is controlled by the valve position control device, the set value of the valve position control device is 80% to 90% of the opening of the discharge valve, wherein when the opening of the discharge valve exceeds 80%, it is deemed that the discharge valve has no adjustment ability at this stage; when it is detected that the opening of the discharge valve reaches 80%, the valve position control device is used to control the opening of the flare main valve to a preset opening value, so that the valve opening of the discharge valve is maintained at 80%.
6. The method according to claim 3, characterized in that Also includes: When it is detected that the pressure value gradually decreases, the opening of the discharge valve is controlled to decrease through the pressure range device; when it is detected that the opening of the discharge valve is less than 80%, the valve position control device controls the flare main valve PV02 to be closed until the flare main valve is closed; When it is detected that the output value of the pressure split-range control device decreases to the preset split-range point, the opening change of the discharge valve is directly controlled by the non-condensable gas flow control device.
7. The method according to claim 6, characterized in that Also includes: If it is detected that the pressure value in the reaction container continues to decrease after the opening of the discharge valve decreases and the flare main valve is closed, the discharge valve is directly controlled by the non-condensable gas flow control device to restore the pressure value in the reaction container to a preset normal value.
8. The method according to any one of claims 2 to 7, characterized in that Also includes: After the discharge valve is reduced to the preset lower limit of the opening, when it is detected that the pressure value is less than the first pressure threshold, the pressure range control device controls the condensing valve to maintain the opening, and controls the discharge valve to open to the preset lower limit of the opening.
9. An electronic device, characterized in that: include: at least one processor and memory; The memory stores computer-executable instructions; The at least one processor executes the computer-executable instructions stored in the memory, so that the at least one processor performs the pressure control method for a reaction container according to any one of claims 2 to 8.
10. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores computer-executable instructions, and when the processor executes the computer-executable instructions, the pressure control method for a reaction container as described in any one of claims 2 to 8 is implemented.