Ion beam polishing machine capable of achieving large-angle multi-workpiece machining

Abstract

The invention relates to the field of ion beam polishing machines, the ion beam polishing machine can achieve large-angle multi-workpiece high-precision machining, the ion beam polishing machine comprises a main vacuum chamber and an auxiliary vacuum chamber, a workpiece clamping device, an ion source, a five-axis movement mechanism and a three-coordinate measuring head are arranged in the main vacuum chamber, a feeding mechanism is arranged in the auxiliary vacuum chamber, and the feeding mechanism comprises a workpiece feeding rotary disc and a feeding shaft. Five motion shafts are decomposed to two groups of independent motion modules, so that the coupling error caused by multi-shaft stacking is reduced, and the rigidity of the motion system is improved. The ion source is installed on one swing shaft, compared with a structural layout of installing the ion source on two swing shafts, the influence of angle coupling errors is reduced, and the pointing precision is improved. The A shaft and the B shaft can rotate within the range of plus or minus 90 degrees, the swing amplitude is large, and the large-angle machining requirement is met. The workpiece feeding rotary disc in the auxiliary vacuum chamber can store a plurality of workpieces, multi-workpiece transposition machining can be achieved, and automatic and efficient production is facilitated.

Description

Technical Field

[0001] The invention relates to the field of ion beam polishers, in particular to an ion beam polisher capable of realizing large-angle multi-workpiece processing. Background Art

[0002] Ion beam polishing is to focus inert gas ions (such as argon ions) with a certain amount of energy into a beam through an electron lens under vacuum conditions, and bombard the workpiece placed in a vacuum chamber under computer control, removing excess material on the workpiece surface through the physical sputtering effect. The resolution of material removal is at the atomic (or molecular) level, and this method can be used for sub-nanometer ultra-high precision processing. Ion beam polishing is a non-contact, stress-free processing method that effectively avoids surface or sub-surface damage caused by pressure in traditional polishing processes; and the vacuum environment is very clean, and impurities will not be introduced to contaminate the workpiece surface during the polishing process, and ultra-smooth surfaces can be effectively produced.

[0003] The traditional five-axis ion beam polishing machine has a complex and difficult workpiece transportation and clamping process. In addition, the ion source is located on two swing axes, and the cables and cooling water pipes are at risk of damage and breakage due to twisting, making it impossible to perform large-angle and multi-workpiece processing.

[0004] In view of this, we propose an ion beam polishing machine that can achieve large-angle multi-workpiece processing in order to solve the problems existing in the existing devices. Summary of the invention

[0005] The purpose of the present invention is to provide an ion beam polishing machine for realizing large-angle multi-workpiece processing, so as to solve the problems raised in the above-mentioned background technology. To achieve the above-mentioned purpose, the present invention provides the following technical solutions: an ion beam polishing machine for realizing large-angle multi-workpiece processing, comprising a main vacuum chamber and a secondary vacuum chamber, wherein a workpiece holder, an ion source, a five-axis motion mechanism and a three-coordinate probe are arranged in the main vacuum chamber, and a loading mechanism is arranged in the secondary vacuum chamber, including a workpiece loading turntable and a feeding shaft. A Y-axis is arranged on the rear wall of the main vacuum chamber, a Z-axis that can move in a vertical direction is arranged on the Y-axis, and an A-axis is arranged on the Z-axis. Through the three-axis linkage, the workpiece holder can be conveniently moved in different spatial orientations to realize the clamping, fixing and motion positioning of the workpiece. An X-axis is arranged on the bottom plate of the main vacuum chamber, a B-axis is arranged on the X-axis, and the ion source is installed on the B-axis. By decomposing the five motion axes into two groups of independent motion modules, the coupling error caused by multi-axis stacking is reduced, and the rigidity of the motion system is improved. The ion source is installed on one swing axis, which reduces the influence of angle coupling error and improves pointing accuracy compared to the structure layout installed on two swing axes. The A-axis and B-axis can achieve a rotation range of plus or minus 90°, with a large swing amplitude, meeting the requirements of large-angle processing. The workpiece loading turntable in the auxiliary vacuum chamber can store multiple workpieces, which can realize multi-workpiece transposition processing, which is conducive to automated and efficient production.

[0006] Preferably, the loading mechanism includes a workpiece loading turntable and a feeding shaft to facilitate loading.

[0007] Preferably, a Y-axis is fixed on the rear wall of the main vacuum chamber, a Z-axis that can move in a vertical direction is arranged on the Y-axis, an A-axis that can rotate by plus or minus 90° is arranged on the Z-axis, and the workpiece holder is installed at the bottom of the A-axis, and the workpiece is clamped and fixed by the workpiece holder.

[0008] Preferably, an X-axis is fixed on the bottom plate of the main vacuum chamber, a support movable along its axial direction is provided on the X-axis, a B-axis is mounted on the support, and the ion source is fixed on the B-axis.

[0009] Preferably, a three-coordinate probe is also provided on the X-axis support, and the three-coordinate probe is used to detect the position of the workpiece in situ.

[0010] Preferably, a feeding shaft is fixed on the bottom plate of the auxiliary vacuum chamber, and the workpiece loading turntable is installed on the feeding shaft.

[0011] Preferably, a Faraday cup is fixed on the side of the Z-axis, and the Faraday cup is used to accurately monitor the distribution of the ion beam.

[0012] Preferably, the feeding port of the main vacuum chamber faces the auxiliary vacuum chamber.

[0013] Preferably, the workpiece loading turntable can be positioned by rotation so that the workpiece mounted thereon faces the workpiece holder.

[0014] Preferably, the workpiece loading turntable is movable along the feeding axis.

[0015] Preferably, a vacuum pump group is arranged behind the main vacuum chamber and the auxiliary vacuum chamber, and the vacuum pump group is used to evacuate the main vacuum chamber and the auxiliary vacuum chamber to meet the working environment requirements of ion beam polishing.

[0016] Preferably, a water cooler is provided at the rear of the auxiliary vacuum chamber, and the water cooler is used to water-cool the drive motor of the motion axis, the vacuum pump group and the ion source to meet the working temperature requirements.

[0017] Compared with the prior art, the present invention has the following effects:

[0018] In the present invention, a feeding shaft is provided in the auxiliary vacuum chamber, and a workpiece loading turntable is provided on the feeding shaft, on which a plurality of workpieces can be stored, so that multi-workpiece transposition processing can be realized, which is conducive to automated and efficient production.

[0019] In the present invention, the A-axis and the B-axis can realize a rotation range of plus or minus 90°, with a large swing amplitude, meeting the requirements of large-angle processing.

[0020] In the present invention, the Y-axis, Z-axis and A-axis are linked to conveniently move the workpiece holder in different spatial orientations to achieve clamping, fixing and motion positioning of the workpiece.

[0021] In the present invention, by decomposing the five motion axes into two groups of independent motion modules, namely the workpiece and the ion source, the coupling error caused by multi-axis overlap is reduced and the rigidity of the motion system is improved. Moreover, the ion source is only installed on one swing axis, which reduces the influence of the angle coupling error and improves the positioning accuracy compared with the structural layout installed on two swing axes. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a three-dimensional appearance schematic diagram of the present invention;

[0023] Figure 2 It is a schematic diagram of the appearance of the present invention when viewed from the front;

[0024] Figure 3 This is a schematic diagram of the appearance of the present invention when viewed from the left;

[0025] Figure 4 It is a schematic diagram of the appearance of the present invention when viewed from above;

[0026] Figure 5 It is a schematic diagram of the internal structure of the present invention;

[0027] Figure 6 It is a schematic diagram of the internal structure of the present invention when viewed from the front.

[0028] In the figure: 1. Main vacuum chamber; 2. Auxiliary vacuum chamber; 3. Loading mechanism; 4. Y-axis; 5. Z-axis; 6. A-axis; 7. Workpiece holder; 8. X-axis; 9. Three-coordinate probe; 10. B-axis; 11. Ion source; 12. Feeding axis; 13. Workpiece loading turntable; 14. Faraday cup; 15. Workpiece; 16. Vacuum pump group; 17. Water cooler. DETAILED DESCRIPTION

[0029] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technical personnel in this field without creative work are within the scope of protection of the present invention.

[0030] See also Figures 1 to 6The present invention provides a technical solution: an ion beam polishing machine for realizing large-angle multi-workpiece processing, comprising a main vacuum chamber 1 and a secondary vacuum chamber 2, wherein a workpiece holder 7, an ion source 11, a five-axis motion mechanism and a three-coordinate probe 9 are arranged in the main vacuum chamber 1, a loading mechanism 3 is arranged in the secondary vacuum chamber 2, the loading mechanism 3 comprises a workpiece loading turntable 13 and a feeding shaft 12, a Y-axis 4 is arranged on the rear wall of the main vacuum chamber 1, a Z-axis 5 movable in a vertical direction is arranged on the Y-axis 4, an A-axis 6 is arranged on the Z-axis 5, and the workpiece holder 7 can be conveniently moved in different spatial orientations through three-axis linkage to realize clamping, fixing and motion positioning of the workpiece, and the main vacuum chamber 1 is provided with a workpiece holder 7, an ion source 11, a five-axis motion mechanism and a three-coordinate probe 9, and a loading mechanism 3 is arranged in the secondary vacuum chamber 2, and the loading mechanism 3 comprises a workpiece loading turntable 13 and a feeding shaft 12, a Y-axis 4 is arranged on the rear wall of the main vacuum chamber 1, a Z-axis 5 movable in a vertical direction is arranged on the Y-axis 4, and an A-axis 6 is arranged on the Z-axis 5. The workpiece holder 7 can be conveniently moved in different spatial orientations through three-axis linkage to realize clamping, fixing and motion positioning of the workpiece. An X-axis 8 is arranged on the bottom plate of the empty chamber 1, a B-axis 10 is arranged on the X-axis 8, and an ion source 11 is installed on the B-axis 10. By decomposing the five motion axes, the coupling error caused by multi-axis overlap is reduced, and the rigidity of the motion system is improved. The ion source 11 is installed on a swing axis. Compared with the structural layout installed on two swing axes, the influence of the angle coupling error is reduced and the pointing accuracy is improved. The A-axis 6 and the B-axis 10 can realize a rotation range of plus or minus 90°, with a large swing amplitude, which meets the requirements of large-angle processing. The workpiece loading turntable 13 in the auxiliary vacuum chamber 2 can store multiple workpieces, and can realize multi-workpiece transposition processing, which is conducive to automated and efficient production.

[0031] In this embodiment, the loading mechanism 3 includes a workpiece loading turntable 13 and a feeding shaft 12, which are used to feed the workpieces 15 to the workpiece loading turntable 13 and place them in sequence, thereby realizing storage and continuous feeding of the workpieces 15.

[0032] In this embodiment, a Y-axis 4 is fixed on the rear wall of the main vacuum chamber 1, a Z-axis 5 which can move in the vertical direction is arranged on the Y-axis 4, an A-axis 6 which can realize a rotation of positive and negative 90° is arranged on the Z-axis 5, and a workpiece holder 7 is installed at the bottom of the A-axis 6, so as to facilitate the movement of the workpiece holder 7 to different directions, so as to flexibly and accurately grasp the workpiece.

[0033] In this embodiment, an X-axis 8 is fixed on the bottom plate of the main vacuum chamber 1, and a support movable along its axial direction is provided on the X-axis 8. A B-axis 10 is installed on the support, and an ion source 11 is fixed on the B-axis 10, so as to realize multi-directional adjustment, have strong flexibility and improve processing accuracy.

[0034] In this embodiment, a three-coordinate probe 9 is further provided on the support of the X-axis 8 , and the three-coordinate probe 9 is used to detect the position of the workpiece 15 in situ.

[0035] In this embodiment, a feeding shaft 12 is fixed on the bottom plate of the auxiliary vacuum chamber 2, and a workpiece loading turntable 13 is installed on the feeding shaft 12 to realize feeding.

[0036] In this embodiment, a Faraday cup 14 is also fixed on the side of the Z-axis 5 , and the Faraday cup 14 is used to accurately monitor the distribution of the ion beam.

[0037] In this embodiment, the feeding port of the main vacuum chamber 1 is facing the auxiliary vacuum chamber 2, which is conducive to the feeding mechanism 3 to send the workpiece 15 to the clamping position. The workpiece clamper 7 is linked by the Y-axis 4, Z-axis 5, and A-axis 6 to clamp and fix the workpiece 15 and move it to position it, so as to achieve precise feeding.

[0038] In this embodiment, the workpiece feeding turntable 13 can be rotated and positioned so that the workpieces mounted thereon can enter the clamping position in sequence, thereby realizing automatic feeding.

[0039] In this embodiment, the workpiece loading turntable 13 can move along the feeding shaft 12 to meet the route requirements of the feeding movement.

[0040] In this embodiment, a vacuum pump group 16 is disposed behind the main vacuum chamber 1 and the auxiliary vacuum chamber 2. The vacuum pump group 16 is used to evacuate the main vacuum chamber 1 and the auxiliary vacuum chamber 2 to meet the working environment requirements of ion beam polishing.

[0041] In this embodiment, a water cooler 17 is disposed behind the auxiliary vacuum chamber 2 for water cooling the drive motor of the motion axis, the vacuum pump group 16 and the ion source 11 to meet the working temperature requirements.

[0042] The principle and advantages of the present invention are as follows: when taking materials, the A-axis 6 drives the workpiece holder 7 to rotate to the horizontal direction and point to the auxiliary vacuum chamber 2. After the Z-axis 5 moves to the set height, the Y-axis 4 drives the workpiece holder 7 through the Z-axis 5 and the A-axis 6 to gradually approach the feeding port of the auxiliary vacuum chamber 2. After reaching the clamping position, the workpiece holder 7 can clamp the workpiece 15. Then the Y-axis 4, the Z-axis 5, and the A-axis 6 move to the processing position according to the numerical control program. At this time, the processing surface of the workpiece 15 faces downward, and the ion source 11 moves to the bottom of the workpiece 15. The orientation of the ion source 11 is adjusted by rotating the B-axis 10, and the position and posture of the workpiece 15 are detected in place by the three-coordinate probe 9 to achieve precise positioning. Thereafter, the ion beam polishing process is performed according to the set process. This kind of ion beam polishing machine reduces the coupling error caused by multi-axis stacking and improves the rigidity of the motion system by decomposing the five motion axes into two groups of independent motion modules of the workpiece 15 and the ion source 11. The A-axis 6 and the B-axis 10 can realize positive and negative 90° rotation, with a large swing amplitude, meeting the requirements of large-angle processing. The ion source 11 is only installed on one swing axis, which reduces the influence of angle coupling error and improves positioning accuracy compared to the structural layout installed on two swing axes. A feeding axis 12 is arranged in the auxiliary vacuum chamber, and a workpiece loading turntable 13 is arranged on it. The workpiece loading turntable 13 can store multiple workpieces, which can realize multi-workpiece transposition processing, which is conducive to automated and efficient production.

[0043] It will be apparent to those skilled in the art that the invention is not limited to the details of the exemplary embodiments described above and that the invention can be implemented in other specific forms without departing from the spirit or essential features of the invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description, and it is intended that all variations falling within the meaning and scope of the equivalent elements of the claims be included in the invention. Any reference numeral in a claim should not be considered as limiting the claim to which it relates.

[0044] In the description of the present invention, unless otherwise specified, "plurality" means two or more than two; the orientations or positional relationships indicated by the terms "upper", "lower", "left", "right", "inner", "outer", "front end", "rear end", "head", "tail", etc. are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operate in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", "third", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0045] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "connected" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

Claims

1. An ion beam polishing machine for realizing large-angle multi-workpiece processing, comprising a main vacuum chamber (1) and a secondary vacuum chamber (2), characterized in that: The main vacuum chamber (1) is provided with a workpiece holder (7), an ion source (11), a five-axis motion mechanism and a three-coordinate measuring head (9); the auxiliary vacuum chamber (2) is provided with a loading mechanism (3), the loading mechanism (3) comprising a workpiece loading turntable (13) and a feeding shaft (12); a Y axis (4) is provided on the rear wall of the main vacuum chamber (1); a Z axis (5) movable in a vertical direction is provided on the Y axis (4); an A axis (6) is provided on the Z axis (5); an X axis (8) is provided on the bottom plate of the main vacuum chamber (1); a B axis (10) is provided on the X axis (8); the ion source (11) is mounted on the B axis (10); and the workpiece loading turntable (13) in the auxiliary vacuum chamber (2) can store a plurality of workpieces (15).

2. The ion beam polishing machine for realizing large-angle multi-workpiece processing according to claim 1, characterized in that: The feeding mechanism (3) comprises a workpiece feeding turntable (13) and a feeding shaft (12).

3. The ion beam polishing machine for realizing large-angle multi-workpiece processing according to claim 1, characterized in that: A Y-axis (4) is fixed on the rear wall of the main vacuum chamber (1); a Z-axis (5) movable in a vertical direction is arranged on the Y-axis (4); an A-axis (6) capable of rotating by positive and negative 90 degrees is arranged on the Z-axis (5); the workpiece holder (7) is mounted on the bottom of the A-axis (6); and the workpiece (15) is clamped and fixed by the workpiece holder (7).

4. The ion beam polishing machine for realizing large-angle multi-workpiece processing according to claim 1, characterized in that: An X-axis (8) is fixed on the bottom plate of the main vacuum chamber (1), a support which can move along its axial direction is arranged on the X-axis (8), a B-axis (10) is installed on the support, and the ion source (11) is fixed on the B-axis (10).

5. The ion beam polishing machine for realizing large-angle multi-workpiece processing according to claim 1, characterized in that: A three-coordinate measuring head (9) is also arranged on the X-axis (8) support, and the three-coordinate measuring head (9) is used for in-situ detection of the position of the workpiece (15).

6. The ion beam polishing machine for realizing large-angle multi-workpiece processing according to claim 1, characterized in that: A Faraday cup (14) is also fixed on the side of the Z axis (5), and the Faraday cup (14) is used to accurately monitor the distribution of the ion beam current.

7. The ion beam polishing machine for realizing large-angle multi-workpiece processing according to claim 1, characterized in that: The feeding port of the main vacuum chamber (1) faces the auxiliary vacuum chamber (2).

8. The ion beam polishing machine for realizing large-angle multi-workpiece processing according to claim 1, characterized in that: The workpiece loading turntable (13) can be rotated and positioned so that the workpiece mounted thereon faces the workpiece holder (7), and the workpiece holder (7) can achieve clamping, fixing and movement positioning of the workpiece (15).

9. The ion beam polishing machine for realizing large-angle multi-workpiece processing according to claim 1, characterized in that: The workpiece loading turntable (13) can move along the feeding shaft (12).

10. The ion beam polishing machine for realizing large-angle multi-workpiece processing according to claim 1, characterized in that: A vacuum pump group (16) is arranged behind the main vacuum chamber (1) and the auxiliary vacuum chamber (2), and the vacuum pump group (16) is used to evacuate the main vacuum chamber (1) and the auxiliary vacuum chamber (2) to meet the working environment requirements of ion beam polishing.

Images