Gas smelting quartz glass lump and high-purity quartz sand melting process thereof
By improving the generation of multiple uniform flames and ring array orifice plates for auxiliary heating, the problem of uneven temperature gradient of quartz glass weight is solved, the uniformity and processing efficiency of glass weight is improved, and the power consumption and device complexity are reduced. .
Patent Information
- Application Number
- CN202411487501.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-24
- Publication Date
- 2025-01-03
- Estimated Expiration
- 2044-10-24
AI Technical Summary
In the prior art, the temperature gradient of the quartz glass weight is uneven, resulting in poor structural uniformity of the glass during deposition, and in the prior art, it is difficult to effectively reduce power consumption and device complexity.
By improving the lamp head of the quartz flame burner, it generates multiple uniformly arranged flames, combined with the auxiliary heating device of the annular array orifice plate, the uniformity of the deposition surface temperature and the uniform transfer of heat are achieved, reducing the surface temperature gradient.
The planarity and optical uniformity of the quartz glass weight are improved, and the requirements for subsequent processing processes such as rounding, milling and polishing are reduced, and the power consumption is simplified.
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Figure CN119241048A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the manufacture of glass, mineral or slag wool, and particularly to a gas-refined quartz glass ingot and a high-purity quartz sand melting process thereof. Background Art
[0002] Quartz glass is known as the "King of Glass" in the industry. It is made of natural crystalline quartz (crystal or high-purity silica) or silicon compounds and is melted at high temperature in a clean environment. Quartz glass originated abroad. In the 1950s, with the surge in the use of quartz glass in semiconductor technology and new electric light sources, the quartz glass industry began to develop. Quartz glass has a series of excellent physical and chemical properties, including extremely low thermal expansion coefficient, excellent temperature resistance, good chemical stability, excellent electrical insulation, low and stable ultrasonic delay, optimal ultraviolet, visible light and near-infrared spectral transmittance, and higher mechanical properties than ordinary glass. The above advantages can be used to make quartz glass ingots, tubes, rods, plates, crucibles, various utensils and devices, as well as quartz glass fibers and fabrics. These products are widely used in various high-tech product production process environments that require high temperature, cleanliness, corrosion resistance, light transmission, filtering, etc., such as aerospace, nuclear laser, semiconductor, optical communication, metallurgy, chemical industry, electric light source and other industries.
[0003] At present, the semiconductor industry is the main application field of quartz glass materials, and other directions mainly include photovoltaics, optical fiber communications and electric light sources. In terms of growth rate, semiconductors and photovoltaics have a higher growth rate and are the main growth engines of the current quartz glass market. It is expected that the market share will further expand in the future. In this regard, quartz glass materials and products such as quartz drawn tubes, quartz ingots and quartz crucibles have also ushered in new development space and opportunities.
[0004] The quartz tube, quartz ingot and quartz crucible are different in the melting of high-purity quartz sand, and the requirements for high-purity quartz sand raw materials are different. The operation method of gas refining to melt transparent quartz glass is to supply gas fuel hydrogen and oxygen to the gas refining lathe quartz blowtorch to ignite a flame to spray and melt natural crystal powder, and use a one-time gas refining molding process to make quartz glass pipes and utensils. Gas-refined quartz glass ingots are also made by this method. Quartz glass ingots are generally used for low-temperature materials, and low-temperature materials are more considered gas-melted quartz glass.
[0005] The paper "Introduction to the Process of Melting Quartz Glass by Gas Refining at Low Pressure" published by Huzhou Quartz Glass Factory in Glass mainly improved the burner lamp head, adopted three oxygen valves, the structural form of each channel, and connected the air inlet stainless steel tube to the tail end of the quartz base rod with a rubber tube. The process is to burn the base rod head first, blow small bubbles, add materials, burn and add materials repeatedly, move the trolley backward and use the support plate to shape while blowing, then burn and add materials... until a transparent quartz glass tube or vessel of a predetermined length and caliber is produced. For gas-refined quartz glass ingots, the existing technology generally uses a flat or curved deposition substrate, which is different from growing on the base rod and shaping by moving the support plate through a trolley. There is no technical solution in the existing technology for improving the lamp head in the gas-refined melting preparation process of quartz glass ingots to achieve uniform combustion.
[0006] Patent with announcement number CN104926088B: A method for preparing a highly uniform synthetic quartz glass ingot, which uses a concave deposition pool to replace the flat or curved deposition substrate in the prior art, thereby avoiding the deposition process requiring a temperature gradient on the deposition ingot surface, and ensuring the stable formation of the quartz glass ingot; on this basis, the temperature of the furnace and the entire deposition ingot surface can be increased, especially the temperature of the edge of the deposition ingot surface, reducing or eliminating the ingot surface temperature gradient, making the ingot surface temperature distribution uniform, and thus allowing the silicon dioxide particles formed by chemical vapor synthesis to be deposited in the concave deposition pool, continue to melt and diffuse under a higher temperature and more uniform temperature field, thereby improving the uniformity of the radial and axial distribution of components such as hydroxyl groups in the quartz glass, thereby improving the structural uniformity of the quartz glass. In order to reduce the temperature gradient of the deposition surface during the deposition process and control the deposition temperature of the deposition surface, a circle of auxiliary heating devices is set around the deposition pool in the furnace of the deposition furnace. However, in order to make the temperature at different positions on the edge of the deposition ingot surface rise evenly, the auxiliary heating device needs to be set up with an isolation structure (just like it sets up a circle of furnace lining). Otherwise, it is difficult to ensure uniform heat transfer. However, this will undoubtedly increase power consumption. However, if the glass quartz ingot is directly auxiliary heated by a resistance heating wire or other auxiliary heating device, it is difficult to control the influence of the auxiliary heating device on the quartz glass ingot.
[0007] Patent with publication number CN113683291A: A method for producing large-sized, high-uniformity synthetic quartz glass ingots, which ensures the uniformity of the deposition surface temperature by increasing the number of burners and testing the deposition surface temperature, thereby ensuring that the temperature gradient of the deposition surface is significantly reduced (less than or equal to 10°C). The pressure in the deposition furnace is controlled by micro-negative pressure to reduce the risk of adhesion between the top burner and the furnace body, the airflow control in the furnace body is relatively stable, and the production efficiency is significantly improved. By increasing the dynamic monitoring of the deposition surface temperature and real-time monitoring of the temperature distribution of the deposition surface, the ratio of hydrogen and oxygen in the burner at different layers is dynamically adjusted to ensure the uniformity of the deposition temperature. However, it requires increasing the number of burners, and a large number of test points for the deposition surface temperature test are also required. The entire device has a complex structure and high cost. Summary of the invention
[0008] The purpose of the present invention is to overcome the defects existing in the prior art and provide a gas-refined quartz glass ingot. The central flame of the quartz flame burner originally prepared is transformed into multiple evenly distributed flames through the improvement of the burner lamp holder, so as to achieve uniformity from the burner to better achieve uniform deposition, which is of great help in reducing or eliminating the temperature gradient on the ingot surface.
[0009] To achieve the above purpose, the technical solution of the present invention is to design a gas-refined quartz glass ingot. When preparing the gas-refined quartz glass ingot, several evenly arranged flames react with the fed quartz sand in a deposition furnace through hydrogen and oxygen combustion to generate silicon dioxide particles. The silicon dioxide particles are gradually deposited on a rotating quartz glass target to form a gas-refined quartz glass ingot. The flatness of the gas-refined quartz glass ingot is less than 0.05mm. The central flame of the quartz flame burner in the original preparation is transformed into multiple evenly distributed flames through the improvement of the burner lamp head, so that uniformity is achieved from the burner to better achieve uniform deposition, which is of great help in reducing or eliminating the temperature gradient on the ingot surface.
[0010] A further technical solution is that the density of the gas-refined quartz glass ingot is 2.2-2.3 g / cm 3 , softening point temperature is 1700±30℃, visible light transmittance is above 93%, in the ultraviolet spectrum area, the maximum transmittance is above 80%, Mohs hardness is 7, silicon dioxide content is 99.997%, weight is 50~80kg, diameter is 450~750mm, height is 100~200mm; optical uniformity is 1.0~4.0×10 -6 .
[0011] The present invention also provides a technical solution, which is a high-purity quartz sand melting process for gas-refined quartz glass ingots, comprising the following process steps performed in sequence: S1: Start the heating device of the deposition furnace to preheat the deposition furnace, and gradually raise the quartz glass target to a set height; S2: Put the quartz sand raw material into the raw material feed port, and at the same time, introduce a mixed gas of hydrogen and oxygen through a quartz flame burner to bring the quartz sand raw material into the deposition furnace and deposit it on the quartz glass target sheet; S3: In the deposition furnace, the quartz sand raw material is melted at a uniform speed and slowly deposited on the surface of the quartz glass target. When the material surface rises due to the growth of the quartz sand melt deposition, the quartz glass target gradually descends, and the gas-refined quartz glass ingot is gradually formed; S4: After growing to the set thickness, stop feeding and turn off the quartz flame burner and heating device, and keep the quartz glass target rotating; S5: After natural cooling, the grown gas-refined quartz glass ingot is removed from the deposition furnace; The aforementioned quartz flame burner is provided with a plurality of air inlet pipes, and the air inlet pipes are arranged in a circular array with the rotation axis of the barrel-shaped body of the quartz flame burner, and one of the two air inlet pipes arranged opposite to each other is used as an oxygen air inlet pipe and the other is used as a hydrogen air inlet pipe; a flame uniform distribution plate is provided in the middle of the barrel-shaped body of the quartz flame burner, and through holes are arranged in a circular array on the flame uniform distribution plate; The deposition furnace comprises a barrel-shaped or square barrel-shaped barrel body, the wall of the deposition furnace is made of heat-insulating material, the inner wall of the lower half of the barrel-shaped body of the deposition furnace is provided with a groove, the middle position of the groove depth of the groove is provided with a heating wire as an auxiliary heating mechanism, a square groove-shaped rock wool board is fixedly provided at the groove mouth, and the outer wall of the groove side of the square groove-shaped rock wool board is fixedly connected to the bottom of the deposition furnace and the wall of the deposition furnace A circular opening is provided in the middle of the square groove-shaped rock wool board, and radial rock wool frame bars arranged in a circular array and annular rock wool frame bars located between the radial rock wool frame bars are provided at the circular opening. An air bag is fixedly connected in each space enclosed by the rock wool frame bars, the annular rock wool frame bars and the circular opening, and the outer wall of the air bag is sealed and connected to the surrounding rock wool frame bars, annular rock wool frame bars or rock wool boards. The temperature for preheating the deposition furnace chamber is 850℃~1100℃, and the preheating time is not less than 24H. The flow rates of hydrogen and oxygen in the quartz flame burner are 200~400L / min and 100~200L / min respectively. The temperature gradient of the deposition surface is less than 20℃. The deposition surface temperature is 1300℃~1800℃. The temperature of the inner wall of the deposition furnace body is increased to 1200℃~1300℃, and the temperature of the quartz glass target is increased to 1800℃. The quartz glass target is in a groove shape and the angle between the side wall and the bottom wall is 90°~150°. The burner lamp head (i.e., the barrel-shaped body of the quartz flame burner) adopts a circular array orifice plate (i.e., a circular array of through holes is set on the flame uniform distribution plate) to ensure It is ensured that hydrogen and oxygen are mixed and sprayed out from a number of evenly distributed through holes, so that multiple evenly distributed flames are generated when hydrogen and oxygen are burned (on the one hand, uniform combustion is achieved to reduce the waste of gas supply; on the other hand, the flame is enlarged to reduce the large temperature difference between the edge and the middle of the deposition ingot surface. The uniformity of the deposition surface temperature is ensured by improving the burner lamp head, which can reduce the increase in the number of burners and the number of deposition surface temperature test points in the prior art; the evenly distributed flame makes the flatness and roughness of the deposited gas-refined quartz glass ingot better, which can reduce the subsequent rounding, milling, surface grinding, grinding and polishing workload for the quartz glass blank, and can even appropriately reduce the aforementioned subsequent processing steps such as surface grinding or grinding).
[0012] A further technical solution is that the heating device is composed of a main heating mechanism located at the air inlet of the quartz flame burner and an auxiliary heating mechanism located in the wall of the barrel-shaped body of the deposition furnace; the auxiliary heating mechanism includes a heating wire located in the wall of the barrel-shaped body of the deposition furnace and a circular array orifice plate arranged at the opening of the inner wall of the barrel-shaped body of the deposition furnace. The main heating mechanism can adopt the heating coil and high-frequency power supply cabinet in the prior art. The main heating mechanism is used to preheat the deposition furnace before starting to work. The setting of the auxiliary heating device makes the temperature of different positions on the edge of the deposition ingot surface rise evenly, directly assists the heating of the glass quartz ingot through the heating wire, and controls the influence of the auxiliary heating device on the quartz glass ingot in the form of the circular array orifice plate, so as to make the heat transfer as uniform as possible. In the process of heat directly transferring to the furnace cavity, due to the setting of the circular array orifice plate, part of the heat is blocked, and part of the heat is directly transferred to the furnace cavity through the through hole of the circular array orifice plate, so that the heat passing through the through hole has a certain transfer action between each other, so the heat is relatively uniform.
[0013] A further technical solution is that the annular array orifice plate is provided with two pieces from the inside to the outside, and the two annular array orifice plates are staggered. Since the two annular array orifice plates arranged inside and outside are staggered, the heat generated by the heating wire can be transferred to the furnace chamber of the deposition furnace more evenly (because the heat generated by the heating wire is first transferred to the furnace chamber through the through holes on the outer annular array orifice plate, and due to the annular array orifice plate staggered inside, the heat transfer direction changes, and the heat is transferred to each other during the change process, so that the heat transferred through the through holes on the inner annular array orifice plate is more uniform, avoiding the problem of uneven heat when the heat generated by the heating wire is directly transferred to the furnace chamber through the through holes on a layer of annular array orifice plates). The annular array orifice plate is made of high-temperature resistant heat-insulating materials, such as rock wool and other high-temperature resistant inorganic heat-insulating materials, so that when the heat is transferred through the two annular array orifice plates, the heat is first transferred to the different holes on the outside to ensure the uniformity of the heat, and then the heat is transferred to the furnace chamber through the inner holes in a more uniform manner. The annular array orifice plate can also be made of materials with good heat conductivity, but only one annular array orifice plate is set, which is set on the outside of the barrel-shaped body wall, while a flat plate made of the same material is set on the inside of the barrel-shaped body wall. The spacing between the flat plate and the annular array orifice plate is much larger than the spacing between two annular array orifice plates made of high-temperature resistant insulation materials. In this way, heat is transferred to the furnace cavity through the inner flat plate, and the annular array orifice plate set on the relatively outer side of the wall, on the one hand, allows the heat to be "mixed" or transferred to each other in the process of transfer from the outside to the inside, and on the other hand, the use of materials with good heat conductivity also reduces the heat loss due to the setting of the annular array orifice plate.
[0014] The advantages and beneficial effects of the present invention are that a central flame of the quartz flame burner originally prepared is transformed into multiple evenly distributed flames through the improvement of the burner lamp holder, so that uniformity is achieved from the burner to better achieve uniform deposition, which is of great help in reducing or eliminating the temperature gradient on the ingot surface.
[0015] The burner lamp holder (i.e., the barrel-shaped body of the quartz flame burner) adopts an annular array orifice plate (i.e., a through hole is arranged in an annular array on the flame uniform distribution plate) to ensure that hydrogen and oxygen are mixed and ejected from a number of uniformly distributed through holes, and to ensure that multiple uniformly distributed flames are generated when hydrogen and oxygen are burned (on the one hand, uniform combustion is achieved and waste of gas supply is reduced; on the other hand, the flame is enlarged and the large temperature difference between the edge and the middle of the deposition ingot surface is reduced. The uniformity of the deposition surface temperature is ensured by improving the burner lamp holder, and the number of burners and the number of deposition surface temperature test points in the prior art can be reduced; the uniformly distributed flame makes the flatness and roughness of the deposited gas-refined quartz glass ingot better, which can reduce the workload of subsequent rounding, milling, surface grinding, grinding and polishing of the quartz glass blank, and can even appropriately reduce the aforementioned subsequent processing steps such as surface grinding or grinding).
[0016] The main heating mechanism is used to preheat the deposition furnace before it starts working. The auxiliary heating device is set to make the temperature of different positions on the edge of the deposition ingot rise evenly. The glass quartz ingot is directly heated by the heating wire. The influence of the auxiliary heating device on the quartz glass ingot is controlled by the form of an annular array orifice plate to make the heat transfer as uniform as possible. In the process of heat being directly transferred to the furnace chamber, part of the heat is blocked due to the setting of the annular array orifice plate, and part of the heat is directly transferred to the furnace chamber through the through holes of the annular array orifice plate. Therefore, there is a certain transfer action between the heat passing through the through holes, so the heat is relatively uniform.
[0017] Since the two annular array orifice plates arranged inside and outside are staggered, the heat generated by the heating wire can be transferred to the furnace chamber of the deposition furnace more evenly (because the heat generated by the heating wire is first transferred to the furnace chamber through the through holes on the outer annular array orifice plate, and the heat transfer direction is changed due to the staggered annular array orifice plate arranged inside, and the heat is transferred to each other during the change process, making the heat transferred through the through holes on the inner annular array orifice plate more uniform, avoiding the problem of uneven heat when the heat generated by the heating wire is directly transferred to the furnace chamber through the through holes on a layer of annular array orifice plate). BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 It is a schematic diagram of a first embodiment of a preparation device involved in a high-purity quartz sand melting process for a gas-refined quartz glass ingot according to the present invention; Figure 2 yes Figure 1 Schematic diagram of a medium quartz flame burner; Figure 3 yes Figure 2 A top view of the flame uniform distribution plate; Figure 4 yes Figure 1 Schematic diagram of the lower end portion of the deposition furnace; Figure 5 yes Figure 4 Schematic diagram of the left part of the deposition furnace; Figure 6 is a schematic diagram of a second embodiment of the present invention; Figure 7 yes Figure 6 Schematic diagram of the lower half of ; Figure 8 This is a schematic diagram of Embodiment 3 of the present invention; Fig. 9 for Figure 8 Schematic diagram of the lower half of ; Fig.10 yes Figure 8 An exploded schematic diagram of the left portion of the lower half of the deposition furnace; Fig.11 yes Fig.10Left view of the rock wool board; Fig.12 yes Fig.11 Schematic diagram after removing the rock wool frame strips and annular rock wool frame strips; Fig.13 yes Fig.11 Schematic diagram of the middle opening; Fig.14 yes Fig.10 Left view of the rotating plate; Fig.15 yes Fig.14 A schematic diagram showing the rock wool frame bar and the annular rock wool frame bar with the spokes removed is added; Fig.16 is a schematic diagram of a fourth embodiment of the present invention; Fig.17 yes Fig.16 A schematic diagram of the lower half of ; Fig.18 yes Fig.17 Schematic diagram of the torsion spring and its adjacent components; Fig.19 yes Fig.18 Schematic diagram of the medium temperature variable component; Fig. 20 yes Fig.19 A top view of one section of the middle and outer parts; Fig.21 yes Fig. 20 A bottom view of an air bag and an outer component.
[0019] In the figure: 1. deposition furnace; 2. quartz glass target; 3. raw material feed port; 4. quartz flame burner; 5. gas-refined quartz glass ingot; 6. air inlet pipe; 7. flame uniform distribution plate; 8. through hole; 9. heating wire; 10. annular array orifice plate; 11. exhaust port; 12. column; 13. annular groove; 14. connecting shaft; 15. reduction motor; 16. groove; 17. rock wool board; 18. rock wool frame strip; 19. annular rock wool frame strip; 20. air bag; 21. rotating plate; 22. rotating shaft; 23. spokes; 24. torsion spring; 25. inner part; 26. outer part; 27. air bag. DETAILED DESCRIPTION
[0020] The specific implementation of the present invention is further described below in conjunction with the accompanying drawings and embodiments. The following embodiments are only used to more clearly illustrate the technical solution of the present invention, and cannot be used to limit the protection scope of the present invention.
[0021] Embodiment 1: Figures 1 to 5 As shown (for ease of illustration, Figure 1The present invention is a gas-refined quartz glass ingot 5. When preparing the gas-refined quartz glass ingot 5, a plurality of evenly arranged flames react with the fed quartz sand in a deposition furnace 1 through hydrogen and oxygen combustion to generate silicon dioxide particles. The silicon dioxide particles are gradually deposited on the rotating quartz glass target plate 2 to form the gas-refined quartz glass ingot 5. The flatness of the gas-refined quartz glass ingot 5 is less than 0.05 mm. The density of the gas-refined quartz glass ingot 5 is 2.2-2.3 g / cm 3 , softening point temperature is 1700±30℃, visible light transmittance is above 93%, in the ultraviolet spectrum area, the maximum transmittance is above 80%, Mohs hardness is 7, silicon dioxide content is 99.997%, weight is 50~80kg, diameter is 450~750mm, height is 100~200mm; optical uniformity is 1.0~4.0×10 -6 .
[0022] A high-purity quartz sand melting process for gas-refined quartz glass ingot 5 comprises the following process steps performed in sequence: S1: starting the heating device of the deposition furnace 1 to preheat the deposition furnace 1, and gradually raising the quartz glass target plate 2 to a set height; S2: Put the quartz sand raw material into the raw material feed port 3, and at the same time, introduce a mixed gas of hydrogen and oxygen through the quartz flame burner 4 to bring the quartz sand raw material into the deposition furnace 1 and deposit it on the quartz glass target plate 2; S3: In the deposition furnace 1, the quartz sand raw material is melted at a uniform speed and slowly deposited on the surface of the quartz glass target 2. When the material surface rises due to the growth of the quartz sand melt deposition, the quartz glass target 2 gradually descends, and the gas-refined quartz glass ingot 5 is gradually formed; S4: After growing to a set thickness, stop feeding and turn off the quartz flame burner 4 and the heating device, and keep the quartz glass target plate 2 rotating; S5: after natural cooling, the grown gas-refined quartz glass ingot 5 is moved out of the deposition furnace 1; The aforementioned quartz flame burner 4 has four air inlet pipes 6 arranged in a circular array with the rotation axis of the barrel-shaped body of the quartz flame burner 4, and one of the two air inlet pipes 6 arranged opposite to each other is used as an oxygen air inlet pipe 6 and the other is used as a hydrogen air inlet pipe 6; a flame uniform distribution plate 7 is provided in the middle of the barrel-shaped body of the quartz flame burner 4, and a through hole 8 is arranged in a circular array on the flame uniform distribution plate 7. The heating device is composed of a main heating mechanism located at the air inlet of the quartz flame burner 4 and an auxiliary heating mechanism located in the wall of the barrel-shaped body of the deposition furnace 1; the auxiliary heating mechanism includes a heating wire 9 located in the wall of the barrel-shaped body of the deposition furnace 1, and a circular array orifice plate 10 arranged at the opening of the inner wall of the barrel-shaped body of the deposition furnace 1. The circular array orifice plate 10 is provided with two pieces from the inside to the outside, and the two circular array orifice plates 10 are staggered (the staggered here does not mean that the two circular array orifice plates 10 are staggered, but that the through holes 8 on the two circular array orifice plates 10 are staggered). Two exhaust ports 11 are provided on the side of the deposition furnace; a frustum-shaped column 12 is fixedly connected under the quartz glass target, and a conical hole is provided on the bottom wall of the deposition furnace for lifting and lowering the column 12; after such a setting, when the quartz glass target rises, it is driven by a lifting drive mechanism (a common technology, such as a reduction motor driving a lead screw nut mechanism to move, and a slider fixedly connected to the nut is used to realize the lifting of the column, that is, the lifting of the quartz glass target), and when it descends, on the one hand, it is driven by the lifting drive mechanism to descend, and on the other hand, the conical hole adapted to the frustum-shaped column can ensure that the bottom wall of the quartz glass target is horizontal when the quartz glass target descends to the final position (in order to ensure uniform molten deposition of quartz sand, in addition to the lifting drive mechanism, a swing mechanism is generally provided under the lifting drive mechanism. Therefore, in order to facilitate rising {or falling} and swinging at the same time, a conical hole is provided. In addition, the provision of the conical hole not only facilitates swinging and lifting without interference, but also ensures the final position of the quartz glass target). The mechanism for driving the column to rotate, that is, driving the quartz glass target to rotate, can be a reduction motor, the output shaft of the reduction motor is concentrically fixedly connected to the column, and the reduction motor is fixedly connected to the slider.
[0023] Embodiment 2: The difference from Embodiment 1 is that Figure 6 , Figure 7 As shown (for ease of illustration, Figure 6 , Figure 7Only the reduction motor on the left is shown), a circular array orifice plate 10 is provided, the wall of the barrel-shaped body of the deposition furnace is a hollow wall at its lower end, a heating wire 9 is arranged in the hollow part of the wall, an opening is arranged on the inner wall near the furnace cavity, and a circular array orifice plate 10 is rotatably arranged at the opening, the size of the opening is smaller than the size of the circular array orifice plate, an annular groove 13 is arranged on the inner wall near the furnace cavity and extends outward from the periphery of the opening to accommodate the circular array orifice plate, an axial hole is arranged on the outer wall away from the furnace cavity, and a connecting shaft 14 is provided for rotational sealing with the axial hole, the connecting shaft is fixedly connected to the center of the circular array orifice plate, and the connecting shaft extends beyond the outer side of the outer wall away from the furnace cavity and is connected to the output shaft of the reduction motor 15. When the gas-refined quartz glass ingot begins to be made, the reduction motor is started and the auxiliary heating mechanism is started at the same time to make the temperature of different positions on the edge of the deposition ingot surface rise evenly, and the rotating circular array orifice plate, on the one hand, makes the heat directly transferred to reduce power consumption, and on the other hand, it also ensures the uniformity of heat transfer. The auxiliary heating mechanism adopts an annular array orifice plate, and rotates to transfer heat directly, greatly reducing power consumption, and the heat is evenly transferred to ensure that the temperature of the edge of the deposition ball surface reaches the required level (to better implement this embodiment, the original barrel-shaped deposition furnace body can be changed to a square barrel shape, and then four annular array orifice plates are set; or four annular array orifice plates are still set and a cylindrical deposition furnace body is used, but the heat transfer point is only at the annular array orifice plate, and the inner wall of other positions of the deposition furnace is not connected to the furnace chamber, and the thickness of the annular array orifice plate is set to be small, so that the square annular array orifice plate can rotate in the cylindrical deposition furnace body).
[0024] Embodiment 3: The difference from Embodiment 1 is that Figures 8 to 15 As shown (for ease of illustration, Figure 8 , Fig. 9 The reduction motor, rotating shaft and rotating plate on the right side are not shown; Fig.14The rock wool frame strips and the annular rock wool frame strips are not shown), and the two exhaust ports 11 are connected to a negative pressure pump so that there is a certain negative pressure in the furnace chamber to avoid the quartz that has not fallen on the concave quartz glass target piece 2 from being deposited on the wall surface of the deposition furnace as much as possible; the barrel-shaped body of the deposition furnace 1 is a round barrel or a square barrel, and the wall of the deposition furnace is made of a heat-insulating material. The inner wall of the lower half of the barrel-shaped body of the deposition furnace 1 is provided with a groove 16, and the middle position of the groove depth of the groove 16 is provided with a heating wire 9 as an auxiliary heating mechanism, and a square groove-shaped rock wool board 17 is fixedly provided at the groove mouth of the groove, and the outer wall of the groove side of the square groove-shaped rock wool board 17 is fixedly connected to the bottom of the deposition furnace and the wall of the deposition furnace (that is, the bottom wall of the square groove-shaped rock wool board forms the furnace inner wall of the lower half of the barrel-shaped body of the deposition furnace 1). A through circular opening is provided in the middle, and radial rock wool frame strips 18 arranged in a circular array and annular rock wool frame strips 19 between the radial rock wool frame strips 18 are provided at the circular opening. An air bag 20 is fixedly connected in each space surrounded by the rock wool frame strips 18, the annular rock wool frame strips 19 and the circular opening, and the outer wall of the air bag 20 is sealed and connected with the surrounding rock wool frame strips 18, the annular rock wool frame strips 19 or the rock wool board 17 (to ensure that each space surrounded by the rock wool frame strips 18, the annular rock wool frame strips 19 and the circular opening is sealed); the vacuum degree of the gas in the air bag is different, and is divided into five different grades, namely, extremely high vacuum degree, relatively high vacuum degree, medium vacuum degree, relatively low vacuum degree, and extremely low vacuum degree, and the vacuum degrees of adjacent air bags 20 are different. A rotating plate 21 is arranged at a position of the square groove-shaped rock wool board 17 relative to the outside of the furnace cavity but located on the inside of the heating wire. A penetrating circular opening is also arranged on the rotating plate 21. The circular opening is provided with radial rock wool frame strips 18 arranged in an annular array and annular rock wool frame strips 19 located between the radial rock wool frame strips 18. An air bag is fixedly connected in each space surrounded by the rock wool frame strips 18, the annular rock wool frame strips 19 and the circular opening. The outer wall of the air bag is sealed and connected to the surrounding rock wool frame strips 18, the annular rock wool frame strips 19 or the rotating plate 21 (to ensure that each space surrounded by the rock wool frame strips 18, the annular rock wool frame strips 19 and the circular opening is sealed); the vacuum degree of the gas in the air bag is different, and is divided into five different grades, namely, extremely high vacuum degree, relatively high vacuum degree, medium vacuum degree, relatively low vacuum degree, and extremely low vacuum degree, and the vacuum degrees of adjacent air bags are different.A rotating plate 21 is fixedly connected to a side thereof away from the furnace chamber with a plurality of spokes 23 fixedly connected at one end, the other end of the spoke 23 is fixedly connected to the edge of the rotating plate 21, and a rotating shaft 22 is fixedly connected to the same end where the plurality of spokes are fixedly connected, and the connecting shaft extends beyond the outer side of the outer wall away from the furnace chamber and is connected to the output shaft of the reduction motor 15. After such arrangement, when the gas-refined quartz glass ingot begins to be produced, the reduction motor is started and the auxiliary heating mechanism is started at the same time to make the temperature of different positions on the edge of the deposited ingot surface rise evenly, because the air bag with a higher vacuum degree makes very little heat transfer, and the air bag with an extremely high vacuum degree makes even less heat transfer, and the air bag with a lower vacuum degree or an extremely low vacuum degree can transfer part of the heat to avoid too strong thermal insulation performance, and the rotating rotating plate 21 cooperates with the fixedly set square groove-shaped rock wool board 17, so that the air bag on the rotating plate and the air bag on the square groove-shaped rock wool board 17 are always in correspondence with air bags with different vacuum degrees or in correspondence with two air bags on an inner side. The outer air bag is in the situation, so the heat transferred at different positions is different, and because the rotating plate is always rotating, the heat transferred at different positions at different times is different. Through such a disordered process, the purpose of uniform heat transfer is achieved, and the heat transfer is uniform, which can ensure that the temperature of the edge of the deposition wheel surface reaches the required level (the deposition furnace body can be square barrel-shaped, and then four square groove-shaped rock wool boards 17 are set; a cylindrical deposition furnace body can also be used, and the bottom wall of the four square groove-shaped rock wool boards 17 is a curved bottom, and the curved bottom is similar to the deposition furnace body), and this method transfers heat to the furnace chamber of the deposition furnace at intervals (because the air bag is not completely vacuum, the heat is more directly transferred compared to the prior art), so the heat loss is small and the power consumption is low; the method of this embodiment transfers heat very uniformly, adopts the reverse idea, and adopts a method in which the heat transferred at each position and at each time point is different, but the effect of uniform heat transfer is achieved.
[0025] Embodiment 4: The difference from Embodiment 2 is that Figures 16 to 21As shown, a torsion spring 24 made of silicone rubber material is fixedly arranged on the inner wall away from the furnace chamber, and the other end of the torsion spring is fixedly connected to the annular array orifice plate 10. A temperature-changing component is also fixedly arranged on the inner wall away from the furnace chamber to push the torsion spring 24 when the temperature rises to drive the annular array orifice plate 10 to rotate. The temperature-changing component includes an L-shaped titanium-rich Ti-Ni shape memory alloy inner component 25 and an outer component 26 wrapped around the outer periphery of the inner component 25 (the outer component can be made of a heat-insulating material such as a rock wool board). The outer component 26 is used to block part of the heat (but also transfers a small amount of heat to ensure that the temperature environment of the inner component is the phase change temperature of the titanium-rich Ti-Ni shape memory alloy). The outer component 26 is used to block part of the heat (but also transmits a small amount of heat to ensure that the temperature environment of the inner component is the phase change temperature of the titanium-rich Ti-Ni shape memory alloy). 6 is composed of two hinged sections so that when the inner section 25 is deformed, the outer section 26 is also deformed. A plurality of holes are arranged at intervals on each section of the outer section 26. At least two air bags 27 are arranged in sequence from the inside to the outside of the holes. The air bags 27 are made of heat-insulating materials. The air bags 27 contain high vacuum gas or low vacuum gas. In this way, the two or more air bags arranged from the inside to the outside make the transferred heat isolated by the gas with vacuum degree. Since the gas in the air bags from the inside to the outside is not all high vacuum gas or extremely high vacuum gas, some heat can still be transferred. In this way, the temperature environment required by the inner section can be achieved by setting the vacuum degree of the gas in the air bags. After such arrangement, when the gas-refined quartz glass ingot begins to be produced, the auxiliary heating mechanism (i.e., the heating wire 9) is simultaneously started to make the temperature of different positions on the edge of the deposited ingot surface rise evenly, and the start of the auxiliary heating mechanism also makes the internal part 25 of the temperature change assembly reach the phase change temperature and deform (due to the arrangement of the air bag 27 on the outer part 26, the inner part 25 transfers part of the heat to the inner part 25, so the temperature environment of the inner part 25 is basically not too high, thus ensuring the normal operation of the inner part of the phase change material). Since the outer part is hinged in two sections, the outer part 26 is also deformed accordingly. The torsion spring 24 is pushed by the temperature-changing component to rotate the annular array orifice plate 10, and the torsion spring will rebound to a certain extent after being rotated by force, so the annular array orifice plate 10 gradually rotates in a smaller and smaller range after several cycles of forward and reverse rotation (equivalent to the attenuation of the operating situation), and finally the annular array orifice plate 10 stops rotating after the deformation force of the temperature-changing component and the torsion force of the torsion spring are balanced. During the several cycles of forward and reverse rotation of the annular array orifice plate 10, the heat of the heating wire 9 is also mixed when the heat is transferred through the through holes on the annular array orifice plate 10, so that the transferred heat is more uniform. The setting of this embodiment uses the temperature itself as the energy to drive the annular array orifice plate 10, and there is no need to set up an additional driving mechanism such as a reduction motor, etc., fewer components are required, the cost of the entire process is lower, and the structure is more streamlined.
[0026] Silicone rubber springs have excellent high temperature resistance and can be used for a long time in a high temperature environment of 1500°C. Since the phase change temperature of the titanium-rich Ti-Ni shape memory alloy is relatively high, specifically 80-110°C, and since the working temperature of the furnace chamber of the deposition furnace is 1300~1800°C, the auxiliary heating device is generally set below 1500°C, and the outer part 26 covering the outer periphery of the inner part 25 is set so that the inner part is thermally blocked to a greater extent, reaching the phase change temperature required by the inner part without exceeding too much (ensuring normal temperature change and shape recovery of the inner part).
[0027] The above is only a preferred embodiment of the present invention. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the technical principles of the present invention. These improvements and modifications should also be regarded as the scope of protection of the present invention.
Claims
1. A gas-refined quartz glass ingot, characterized in that: When preparing the gas-refined quartz glass ingot, a plurality of evenly arranged flames react with the fed quartz sand in a deposition furnace through the combustion of hydrogen and oxygen to generate silicon dioxide particles. The silicon dioxide particles are gradually deposited on a rotating quartz glass target to form a gas-refined quartz glass ingot. The flatness of the gas-refined quartz glass ingot is less than 0.05 mm.
2. A gas-refined quartz glass ingot according to claim 1, characterized in that: The density of the gas-refined quartz glass ingot is 2.2-2.3 g / cm 3 , softening point temperature is 1700±30℃, visible light transmittance is above 93%, in the ultraviolet spectrum area, the maximum transmittance is above 80%, Mohs hardness is 7, silicon dioxide content is 99.997%, weight is 50~80kg, diameter is 450~750mm, height is 100~200mm; optical uniformity is 1.0~4.0×10 -6 .
3. A high-purity quartz sand melting process for gas-refined quartz glass ingots, characterized in that: It consists of the following process steps performed in sequence: S1: Start the heating device of the deposition furnace to preheat the deposition furnace, and gradually raise the quartz glass target to a set height; S2: Put the quartz sand raw material into the raw material feed port, and at the same time, introduce a mixed gas of hydrogen and oxygen through a quartz flame burner to bring the quartz sand raw material into the deposition furnace and deposit it on the quartz glass target sheet; S3: In the deposition furnace, the quartz sand raw material is melted at a uniform speed and slowly deposited on the surface of the quartz glass target. When the material surface rises due to the growth of the quartz sand melt deposition, the quartz glass target gradually descends, and the gas-refined quartz glass ingot is gradually formed; S4: After growing to the set thickness, stop feeding and turn off the quartz flame burner and heating device, and keep the quartz glass target rotating; S5: After natural cooling, the grown gas-refined quartz glass ingot is removed from the deposition furnace; The aforementioned quartz flame burner is provided with a plurality of air inlet pipes, and the air inlet pipes are arranged in a circular array with the rotation axis of the barrel-shaped body of the quartz flame burner, and one of the two air inlet pipes arranged opposite to each other is used as an oxygen air inlet pipe and the other is used as a hydrogen air inlet pipe; a flame uniform distribution plate is provided in the middle of the barrel-shaped body of the quartz flame burner, and through holes are arranged in a circular array on the flame uniform distribution plate; The deposition furnace comprises a barrel-shaped or square barrel-shaped barrel body, the wall of the deposition furnace is made of heat-insulating material, the inner wall of the lower half of the barrel-shaped body of the deposition furnace is provided with a groove, the middle position of the groove depth of the groove is provided with a heating wire as an auxiliary heating mechanism, a square groove-shaped rock wool board is fixedly provided at the groove mouth, and the outer wall of the groove side of the square groove-shaped rock wool board is fixedly connected to the bottom of the deposition furnace and the wall of the deposition furnace A circular opening is provided in the middle of the square groove-shaped rock wool board, and radial rock wool frame bars arranged in a circular array and annular rock wool frame bars located between the radial rock wool frame bars are provided at the circular opening. An air bag is fixedly connected in each space enclosed by the rock wool frame bars, the annular rock wool frame bars and the circular opening, and the outer wall of the air bag is sealed and connected to the surrounding rock wool frame bars, annular rock wool frame bars or rock wool boards.
4. The high-purity quartz sand melting process for gas-refined quartz glass ingot according to claim 3, characterized in that: The heating device is composed of a main heating mechanism located at the air inlet of the quartz flame burner and an auxiliary heating mechanism located in the wall of the barrel-shaped body of the deposition furnace; the auxiliary heating mechanism includes a heating wire located in the wall of the barrel-shaped body of the deposition furnace and a ring array orifice plate arranged at the opening of the inner wall of the barrel-shaped body of the deposition furnace.
5. The high-purity quartz sand melting process for gas-refined quartz glass ingot according to claim 4, characterized in that: The annular array orifice plate is provided with two pieces from the inside to the outside, and the two annular array orifice plates are staggered.
Citation Information
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